75 results about "Wave aberration" patented technology

The invention belongs to the technical field of optical detection, and particularly relates to a global power wave aberration prediction-based Ritchey-Common detection method and system, and the method comprises the steps: firstly building a three-dimensional optical model through the parameters of a standard spherical mirror, a to-be-detected plane mirror and an interferometer, and combining a preset Ritchey angle and an out-of-focus / astigmatism coefficient, injecting vibration and temperature noise by using Monte Carlo simulation to generate an enhanced training data space; secondly, constructing a phase error adjustment model based on an adversarial network, and decoupling a mapping relation between an adjustment error and wave aberration distortion through a multi-scale attention mechanism and a radial basis function network to realize adaptive correction of sub-aperture phase data; and finally, splicing sub-aperture phases by using a graph neural network and fusing multi-angle full-aperture measurement data to accurately reconstruct the surface shape of the plane mirror to be measured. According to the invention, through confrontation training and dynamic error compensation of physical constraints, the detection efficiency and reliability of the large-aperture optical element are significantly improved.

The invention relates to the technical field of optical design, and particularly provides an optical system polarization aberration compensation method, computer equipment and a storage medium, at least one plane mirror is additionally arranged in a to-be-compensated optical system, the plane mirror is arranged in front of an image plane of the optical system, and the spatial attitude of each plane mirror is used as a free variable to compensate the polarization aberration of the optical system. In the optional range of the spatial attitudes of the plane mirrors, the spatial attitude of each plane mirror is adjusted, and the compensated polarization aberration of the optical system meets the preset requirement by optimizing the spatial attitude of the iterative plane mirrors, so that the polarization aberration of the optical system can be compensated on the premise of not changing the wave aberration of the optical system and not occupying the degree of freedom of design. And the polarization aberration of the optical system is greatly reduced.

The invention provides a performance prediction and control method for a multi-physics-field coupled high-energy laser system, and relates to the technical field of laser systems, and the method comprises the steps: obtaining optimized environment parameters; configuring laser system parameters; determining turbulence compensation parameters and laser energy distribution data; determining turbulence compensation control parameters at the current moment; controlling a deformable mirror of the high-energy laser system based on the turbulence compensation control parameters; determining optical element temperature field data, optical element deformation and wave aberration variation based on the laser system parameters and the laser energy distribution data; determining task feasibility of the current task based on the optical element temperature field data; under the condition that the task feasibility is feasible, determining a target dynamic damage threshold; and determining a performance prediction result of the high-energy laser system. According to the technical scheme, control and performance prediction are carried out on the high-energy laser system based on multi-parameter cooperation in the coupled physical field, the environmental adaptability and the parameter configuration efficiency are improved, and closed-loop compensation can be carried out in real time.

The invention provides a large-aperture optical system focal plane position measuring device and a measuring method, and solves the problems that a traditional method based on small detector scanning is difficult to fully cover and accurately butt joint a focal plane of a large-aperture optical system, so that local focusing is accurate but the whole is deviated; and the imaging performance of the large-aperture optical system is influenced. According to the invention, two functions of wave aberration detection and focal plane position measurement are integrated, one set of platform covers detection of two types of key optical parameters through switchable test path and detector configuration, the equipment utilization rate is improved, and the experiment cost is reduced. The six-degree-of-freedom adjusting table and the two-dimensional rotary table are used in cooperation, high-precision fine adjustment of the detected optical system in the space attitude and the position of the detector is achieved, searching and positioning of the focal plane can be rapidly completed, and the focusing efficiency is high.

The invention relates to an off-axis three-reflector system design method and system based on a vector aberration theory. The method comprises the following steps: determining the focal length of an off-axis three-reflector system; determining the distance between the mirrors and the distance between the three reflectors and the image surface; according to the design requirements of the coaxial three-reflector system, calculating the curvature radiuses and quadric surface coefficients of the three reflectors; calculating the pupil radius of the pupil off-axis front three-reflector system according to the relationship between the pupil radius before and after the pupil off-axis and the pupil eccentric vector, and determining a wave aberration expression of the pupil off-axis rear three-reflector system; based on a paraxial ray tracing method and a vector aberration theory, establishing analytic expressions of a visual axis error, an increased coma error and an increased astigmatic aberration on a primary imaging surface about an inclination amount and an eccentricity amount; by taking optical axis error, coma error minimization and astigmatic aberration minimization as constraint conditions, optimally solving inclination amounts and eccentricity amounts of the three reflectors; structural parameters of the three-mirror system are optimized through optical simulation software. The efficient and reliable design method and system are achieved.

The invention relates to the technical field of spaceflight optical remote sensors, and particularly discloses a calibration method and system for a secondary mirror gasket of a high-resolution space camera, and the method comprises the following steps: 1, carrying out the calibration of a secondary mirror gasket to be repaired in a state that the secondary mirror gasket to be repaired is assembled in the high-resolution space camera; obtaining a first reference point test result of a measurement plane of a secondary mirror installation and adjustment auxiliary tool connected with the secondary mirror structure; 2, when the high-resolution space camera is in the optimal wave aberration state, obtaining a second reference point test result of the measurement plane of the secondary mirror installation and adjustment auxiliary tool connected with the secondary mirror structure; 3, comparing the first reference point test result with the second reference point test result, and calculating to obtain the required grinding thickness of the secondary mirror gasket; and fourthly, the secondary mirror gasket to be repaired is corrected based on the obtained grinding thickness of the secondary mirror gasket. The method is high in calibration efficiency, high in calibration precision and wide in application scene.

The present invention discloses a wave aberration reconstruction method, apparatus, electronic device, and storage medium, relating to the technical field of optical detection. The wave aberration reconstruction method includes: obtaining a corresponding initial Zernike coefficient set based on a pre-acquired actual point spread function image and a first training network; optimizing the initial Zernike coefficient set by using a second training network based on the principle that the target point spread function image is the same as the actual point spread function image to obtain a corresponding target Zernike coefficient set; and obtaining a corresponding target wave aberration based on the target Zernike coefficient set and a pre-configured optical system basis function. The present invention solves the problems that wave aberration reconstruction requires multiple measurements and calibrations, resulting in inconvenient operation and low accuracy in the prior art, thereby simply and conveniently completing the process of wave aberration reconstruction, saving manpower and time, and improving the reconstruction accuracy.

A kind of telescope active optical correction system correction accuracy testing device, including laser interferometer, multidimensional adjusting table, wave aberration measurement component and plane mirror, laser interferometer is placed in the outside of optical telescope for emitting test light to the inside of optical telescope, to detect the wave aberration data of multiple fields of view;Multidimensional adjusting table is used to adjust the position, angle of optical element in optical telescope, to simulate the situation that telescope imaging quality drops;Wave aberration measurement component is set at the image plane of telescope for measuring the wave aberration after optical telescope imaging quality drops, and plane mirror is used to reflect test light.The present application relates to a kind of telescope active optical correction system correction accuracy testing method, the displacement amount and rotation angle of optical element when comparing when simulating image quality drop and when correcting judge the correction accuracy of active optical correction system, compare wave aberration before simulating image quality drop and after correction, judge whether the image quality after correction reaches the image quality before simulating image quality drop.

The application discloses an artificial intelligence anti-disturbance lithography objective wave aberration measurement method, and relates to the field of lithography objective wave aberration measurement algorithms. In the application, a U-shaped neural network structure based on physical information is used in a general U-NET neural network model, the overall encoder-decoder structure is retained, and the pooling layer is removed. Compared with the traditional four-step phase shifting (or five-step phase shifting), the application has the following innovative points: (1) on the hardware, the piezoelectric phase shifter only needs to be moved once, and only two-step phase shifting is needed. Compared with the traditional phase shifting wave aberration measurement system, the application has faster measurement speed. (2) on the hardware, the traditional wave aberration measurement system needs an ultrahigh-precision piezoelectric phase shifter, while the application only needs a low-precision standard (the precision is better than 50 nm) piezoelectric phase shifter. (3) on the algorithm, the application can accurately measure the lithography objective wave aberration from two interference patterns. (4) on the wave aberration reconstruction precision, the application has higher precision due to the reduction of environmental interference.

The invention discloses a convex spherical lens optical axis and interferometer system optical axis alignment method, a concave spherical lens is arranged behind a convex spherical lens, the convex spherical lens and the concave spherical lens form an interference cavity at a confocal position, and the interference cavity is adjusted to zero fringes; the concave spherical mirror is moved in the direction of increasing the optical path of the optical axis, and cat eye-like stripes of the convex spherical mirror lens can be observed after the concave spherical mirror is moved to a designated position; the cat eye-like stripes of the convex spherical lens are adjusted to be concentric circles, and when the tilt term of the wave aberration of the measured phase result is approximately zero, alignment is completed. The curvature radius of the standard surface of the concave spherical mirror is larger than that of the reference surface of the convex spherical mirror. The device can align the convex spherical lens with the optical axis of the interferometer system, is not limited by the F number of the spherical lens, and has the advantages of simple structure and high measurement precision.

This invention discloses a method for field-of-view deconvolution image restoration of an imaging system based on wavefront aberration reconstruction, belonging to the field of wavefront aberration measurement and computational imaging technology. The method includes: measuring the wavefront aberration of the optical system under test in an imaging system containing detection markers; setting the measured wavefront aberration as the wavefront aberration of the optical system under test in an imaging system containing pinhole arrays, and simulating and generating point spread functions corresponding to different field-of-view blocks; replacing the detection markers with imaging samples, and acquiring the actual image of the imaging samples through the optical system under test as the image to be restored; dividing the image to be restored into field-of-view partitions, performing deconvolution restoration on each block using the corresponding point spread function, and then stitching the restored block images together to obtain a complete restored image. This invention decouples wavefront aberration measurement from image restoration, achieving effective correction of spatially varying aberrations in a large field of view without increasing hardware complexity, significantly improving the restoration accuracy, efficiency, and consistency of the entire field-of-view image.

The invention discloses a liquid lens wavefront detection device and method based on a background schlieren method. The detection device comprises a first reference wavefront beam generation assembly, a double-side telecentric lens and a camera, and a reference wavefront beam emitted from the first reference wavefront beam generation assembly enters a liquid lens to be detected, enters the double-side telecentric lens after being transmitted by the liquid lens to be detected, and is collected by the camera after being transmitted by the double-side telecentric lens. The detection device is used for collecting a reference image and a dynamic image of the to-be-detected liquid lens, so that background displacement is obtained, wavefront slope distribution is further obtained, and finally wavefront distribution and wave aberration of the to-be-detected liquid lens are obtained after integral reconstruction is conducted on the wavefront slope distribution. The telecentric background schlieren method is adopted for liquid lens wave aberration detection, and the problems that in a traditional Shack-Hartmann wavefront detection technology, a microlens array needs to be used for dividing wavefront to be detected into a plurality of wavelets, and the spatial resolution is limited by the microlens size and the duty ratio are solved.

The invention discloses an optical system wave aberration acquisition method based on a generalized pupil function, and belongs to the technical field of imaging quality detection of optical systems. The problems that in the prior art, due to the fact that exit pupil deformation adaptability is insufficient, off-axis view field wave aberration calculation deviation is large, and it is difficult to be suitable for on-axis and off-axis view field wave aberration calculation at the same time are solved. The method comprises the following steps: acquiring an incident wavelength and a field angle of a to-be-detected optical system; obtaining entrance pupil and exit pupil parameters, and determining an entrance pupil position, an entrance pupil diameter and a corresponding exit pupil position by using a paraxial ray tracing algorithm; determining the working F number TFNO in the meridian direction and the F number SFNO in the sagittal direction under the wavelength and the field angle; obtaining a normalized pupil plane according to the TFNO and the SFNO; further generating an incident light array; tracing the incident ray array to an image surface according to an actual ray tracing algorithm; determining a virtual reference spherical surface parameter; and optical system wave aberration is obtained. The method can be applied to the technical field of optical system design.

The present application relates to a kind of computer-aided alignment denoising methods for high-precision optical system, first, build the simulation model of misalignment optical system, calculate sensitivity matrix by difference method, construct imaging quality evaluation objective function;Interferometer multiple field multiple acquisition system wave aberration is used, constructs multiple aberration matrix and is spliced to generate observation matrix;Observation matrix is sequentially implemented dense noise denoising, matrix row average processing, spliced to further complete sparse noise denoising after full field aberration matrix is obtained;Compensation amount is solved relying on sensitivity matrix, effective compensation amount is screened in combination with objective function and is carried out system alignment, after alignment, test imaging quality, not meet the index then repeat wave aberration measurement and denoising process iterative correction.The advantage is that: it can effectively reduce the negative influence of interferometer measurement noise on alignment accuracy, improve the alignment accuracy of high-precision optical system, and the method can maintain stable denoising performance under different noise intensity.

The application discloses a large numerical aperture lithography projection objective wave aberration splicing and stitching device and method, which comprises the following in sequence along the illumination direction of an illumination system: a mask, a mask table, a large numerical aperture lithography projection objective, a Shack-Hartmann sensor for aligning an actual image point on an imaging surface after magnification of a mask pattern by the large numerical aperture lithography projection objective, a sensor motion table capable of six-dimensional motion for bearing the Shack-Hartmann sensor, and an interferometer measurement system for measuring alignment position coordinate information and returning three-dimensional coordinates of the alignment position. The sensor motion table is used to align the Shack-Hartmann sensor with the actual image point and scan the large numerical aperture lithography projection objective wavefront information in the form of a Hadamard measurement matrix code along an I-shaped beam, differential measurement is used to separate measurement errors caused by translation and tilt adjustment errors, wavelet transform is used to improve signal sparsity, and a compressed sensing algorithm is used to reconstruct an actual wavefront, so that the large numerical aperture wave aberration splicing and stitching technology is realized.

The application discloses a wave aberration sensor compatible with high precision and large dynamic range, and belongs to the field of optical precision measurement and detection. The wave aberration sensor comprises a projection module, an array structured light chip and a detection module. The core idea of the wave aberration sensor is that different characteristic phases are encoded in each sub-aperture based on an array structured light chip, so that a plurality of structured light spots with obvious characteristics can be generated in the focal plane, and the different sub-aperture light spots can be distinguished. Based on the array structured light chip, the wave aberration sensor can realize measurement with a larger dynamic range without sacrificing the measurement precision. The wave aberration sensor can realize measurement of various laser wavefronts and wave aberration detection of various lenses. Therefore, the wave aberration sensor has important practical value in the fields of laser processing, laser surgery, ophthalmic detection and optical imaging.

The present invention relates to a tolerance analysis method for a computational imaging system based on restored image performance, comprising: constructing a universal optical element machining error model; determining the parameter boundaries of the error model based on a given root mean square value of the machining surface shape error, generating machining error parameters, and importing them into optical design software for ray tracing. The system obtains wave aberrations of each field of view to obtain point spread functions of each field of view, superimposes a noise image to obtain a degraded image, thereby constructing a restored image, and evaluating the MTF values ​​of each field of view of the system, using the machining tolerance limits of each optical element; multiplying the machining tolerance limits of each optical element by a proportionality coefficient Ra, and repeatedly executing the above steps, gradually increasing the proportionality coefficient until the machining error boundaries of each optical element in the system are obtained. Compared with the prior art, the present invention can implement tolerance analysis of computational imaging systems and determine the machining tolerance boundaries of optical elements, which has important guiding significance for the machining of optical elements in the system.

A curvature radius measurement method and system can realize high-precision detection of curvature radius by using shorter guide rails, greatly increase the measurement range of the interference method, and reduce the test cost. The method comprises the following steps: (1) building a detection light path, measuring the aperture of a to-be-detected mirror, and moving the to-be-detected mirror to a confocal position; (2) pushing the to-be-detected mirror to move along the optical axis direction, acquiring an axial displacement distance in a displacement measurement interferometer, and acquiring a defocus wave front in a phase measurement interferometer; (3) performing Zernike fitting on the defocus wave front to obtain a defocus coefficient; and (4) accurately modeling the test light path in optical design software, taking the defocus coefficient in system wave aberration as an optimization target of the system, taking the curvature radius of the to-be-detected mirror as an optimization variable, and performing optimization by using the optimization function of the optical design software until the system wave aberration obtained by the software is consistent with the system wave aberration actually measured and obtained, so that the curvature radius of the to-be-detected mirror is obtained.

The present application relates to the technical field of optical design, and particularly provides an optical system polarization aberration compensation method, a computer device and a storage medium, at least one plane mirror is added in the optical system to be compensated, the plane mirror is arranged before an image plane of the optical system, and a spatial pose of each plane mirror is taken as a free variable, the spatial pose of each plane mirror is adjusted in a selectable range of the spatial pose of the plane mirror, the spatial pose of the plane mirror is iteratively optimized, polarization aberration of the compensated optical system meets preset requirements, and the polarization aberration of the optical system is greatly reduced under the premise that the wave aberration of the optical system is not changed and no design freedom is occupied.

The application provides a wide-temperature miniaturized coherent telescope system, which comprises a spacer ring, a pressing ring, a first lens, a second lens, a secondary mirror pressing ring, a secondary mirror seat, a third lens, an adjusting sleeve and a fiber flange. The application comprehensively considers factors such as telescope performance, size, weight and environmental adaptability, and selects H-ZF6, H-K9L and H-ZK3 as the optical lens, adopts TC4 titanium alloy material as the structure, compensates each other between the change of the refractive index, the curvature radius and the thickness of the optical element with the temperature and the thermal deformation of the structure, realizes stable work without temperature control at-40~60 DEG C, re-distributes the tolerance sensitivity of the optical element by using a unique optical design form, only the secondary mirror needs to be centered and adjusted among the three lenses, which greatly shortens the adjustment period and difficulty, through the additional receiving field of view of ±0.03 DEG, the focal point can still meet the system wave aberration requirement of 1 / 20 lambda within the range of 0.13 mm radius, avoids a complex fiber adjusting mechanism, and is applied to the field of coherent wind measurement laser radar.

The invention discloses an object space telecentric projection optical system with a long working distance. The projection optical system sequentially comprises an object plane, vacuum window glass, a first lens to a fourth lens, an aperture diaphragm, a fifth lens to a sixth lens, an interference filter, a beam splitter prism and an image plane from one side of the object plane in the optical axis direction of the object plane, the rear focus of the combined system of the vacuum window glass and the first to fourth lenses is located at the central point of the aperture diaphragm to form an object space telecentric optical structure; the axial distance between the vertex of the front surface of the first lens and the object plane is 640 mm, namely the object space working distance is 640 mm. Aberration such as wave aberration and distortion can be effectively corrected, and good imaging quality is achieved. The long-working-distance object space telecentric projection optical system completely meets the technical requirements for measuring parameters such as the position, the shape and the speed of liquid drops in a vacuum bin.

The invention provides a beam shaping method and system of a laser, and relates to the technical field of bar packaging, the method adopts a curved surface shaping piece with one surface being a free-form surface to shape a fast axis beam of the bar laser, and the molded surface of the curved surface shaping piece is fitted by adjusting a Zernike polynomial, so that the fast axis beam of the bar laser is shaped. And the wave aberration of the curved surface shaping piece after fitting accords with a preset value, so that the square light spots generated by the bars of the shaped stacked laser have uniform light intensity distribution and sharp edges, and the problems that in the prior art, the quality of light beams of the stacked laser is poor, and an existing optical shaping method needs multiple times of shaping and is high in difficulty are solved.

This application provides an optical parameter detection system for detecting the optical parameters of an objective lens under test, comprising: a wavefront sensor that transmits and receives test light; a light guiding assembly including a turntable and a deflector mirror disposed on the turntable; the turntable rotation drives the deflector mirror to rotate to reflect the test light to the objective lens under test at different angles, and to reflect the test light at the objective lens under test to the wavefront sensor at different angles; and a spherical mirror, the detection position of the objective lens under test being located between the light guiding assembly and the spherical mirror, the spherical mirror being located on the image side of the objective lens under test and movable along the optical axis of the objective lens under test, used to reflect the test light emitted from the objective lens under test back to the objective lens under test; the wavefront sensor detects the wavefront aberration of the objective lens under test in different fields of view based on the rotation angle of the turntable and obtains the optical parameters of the objective lens under test based on the wavefront aberration and the displacement of the spherical mirror. This application also provides an optical parameter detection method.

The invention relates to the technical field of wavefront measurement, and provides a wave aberration measuring device and method of a finite conjugate objective lens. The collimation module is used for collimating divergent light beams emitted by the light source into parallel light beams; the mask is arranged at the downstream of the collimation module; at least one small hole with the aperture smaller than 1 micrometer is formed in the mask; the focusing lens is used for focusing the parallel light beams and enabling the parallel light beams to pass through the small holes in the mask; a wavefront measurement module; and the computer is connected with the wavefront measurement module and is used for controlling the wavefront measurement module to carry out data acquisition and processing, storing and outputting the acquired data. Compared with the prior art in which an interferometer is adopted to measure the wave aberration of the limited conjugate objective lens, the wave aberration measuring device of the limited conjugate objective lens provided by the invention does not need to use an expensive interferometer, is lower in cost, can measure objective lenses with different wavelengths, and is better in universality.

The application discloses a kind of continuous zoom complex optical system alignment method, including the following steps: S1: the eccentricity, tilt detection of each lens in focusing group, zoom group, compensation group and rear fixed group, and complete lens correction in each mirror group component;S2: the corrected each mirror group component is loaded into the main lens barrel of continuous zoom optical system, and the air gap between each mirror group component is measured accurately, and the initial installation of continuous zoom optical system is completed;S3: the initial installation of continuous zoom optical system is completed and is placed in the wave aberration detection light path of interferometer and plane mirror group, the detection of optical system wave aberration in long, short focus two extreme positions is completed, and the aberration type is confirmed according to wave aberration detection result, so as to realize optical system aberration correction.The application can quantify the aberration type and change amount in alignment process, so that alignment personnel can carry out targeted alignment, and then the alignment efficiency and precision of continuous zoom optical system are improved.

The invention discloses an extrasolar planetary imaging coronagraph structure with a detection function, the extrasolar planetary imaging coronagraph structure comprises a main frame, and an optical assembly, a visible light imaging camera, a high-order wave aberration correction box, a wavefront detection camera, a scientific data processing electric box and a tilt correction box which are mounted in a sealed cavity in the main frame, and the optical assembly is provided with a light inlet hole. According to the invention, the main frame is made of a high-strength carbon fiber composite material, and through optimized mechanical architecture design and material combination, the structural strength is obviously improved on the basis of light weight, larger load and a harsh working environment can be borne, rigid body displacement or deformation of an internal optical instrument is prevented, and the service life is prolonged; meanwhile, innovative materials and structural design of the pre-embedded aluminum bee layer are adopted, the overall weight is greatly reduced on the premise that the functional integrity is guaranteed, material consumption is effectively reduced, and the installation efficiency of the product is improved; it is guaranteed that the coronagraph structure and internal components can bear the dynamic environment when a rocket is launched.

The invention relates to the technical field of optical detection, and discloses a microscopic objective image difference testing method and system based on a Shack-Hartmann sensor. The system comprises an illumination module, an objective lens module and a detection module. In the method, the illumination module generates a standard point light source divergent spherical wave, and the position of each module is adjusted to enable the modules to be parallel to and coaxial with an objective lens to be measured; driving the objective lens to rotate around the Z axis to a plurality of preset angles through the theta Z turntable, and acquiring a wavefront intensity distribution image by using a Shack-Hartmann wavefront sensor at each angle; performing Zernike polynomial decomposition on the image to obtain wave aberration information and a Zernike coefficient sequence; and then periodic function fitting is carried out on a tilt item and a defocus item, an error aberration item introduced by mechanical runout of the rotary table is separated, and the error aberration item is deducted from measured wave aberration information, so that corrected real wave aberration information is obtained. According to the invention, high-precision, stable and reliable measurement of the image difference of the microscopic object is realized.

The invention discloses a star sensor calibration method based on a Zernike wave aberration model. The method comprises the following steps: collecting starlight calibration points based on a star sensor, a fixed star simulator and a two-axis turntable; establishing a Zernike wave aberration model, and calculating the image distortion of the starlight calibration point based on the Zernike wave aberration model; and iteratively calculating and calibrating model parameters of the Zernike wave aberration model based on a multi-order sequence optimization strategy. The invention also discloses a corresponding system and device. The device comprises a star sensor composed of an optical lens, an image detector and an imaging driver; wherein the optical lens is used for focusing starlight in a certain view field range and imaging the starlight on the surface of the image detector; the image detector is used for sensing starlight energy and collecting starlight images; the imaging driver is used for collecting starlight images; the fixed star simulator is used for simulating fixed star starlight; the two-axis turntable is used for changing the attitude of the star sensor; and the information processor is used for calculating the mass center position of the star point and the model parameters of the Zernike wave aberration model.

A method for solving the wave aberration of an optical system by ray tracing, belonging to the technical field of optical design, includes: Step 1, determining the relevant parameters of a virtual reference spherical surface; Step 2, calculating the optical path that the light beam emitted from the object point travels from the object point to the virtual reference spherical surface; Step 3, calculating the optical path that the chief ray travels from the object point to the exit pupil plane; Step 4, solving the wave aberration of the optical system by using the optical paths obtained in Step 2 and Step 3. The method for solving the wave aberration of an optical system by ray tracing of the present invention provides a relatively simple solution method for the detection and measurement of the wave aberration of an optical system. Compared with the existing detection devices or detection systems, it has the advantages of simple calculation and small amount of calculation, and at the same time reduces the research and design costs of subsequent optical design software.

The present invention discloses a liquid lens wavefront detection device and method based on a background schlieren method. The detection device includes a first reference wavefront beam generating component, a bilateral telecentric lens, and a camera. The reference wavefront beam emitted from the first reference wavefront beam generating component is incident on the liquid lens to be tested, is incident on the bilateral telecentric lens after being transmitted by the liquid lens to be tested, and is then collected by the camera after being transmitted by the bilateral telecentric lens. The present invention uses the detection device to collect reference images and dynamic images of the liquid lens to be tested, thereby obtaining background displacement, and then obtaining a wavefront slope distribution. Finally, after integral reconstruction of the wavefront slope distribution, the wavefront distribution and wave aberration of the liquid lens to be tested are obtained. The present invention uses the telecentric background schlieren method to perform liquid lens wave aberration detection, which overcomes the problem that the traditional Shack-Hartmann wavefront detection technology requires the use of a microlens array to divide the wavefront to be tested into several sub-waves, and the spatial resolution is limited by the size and duty cycle of the microlens.