87 results about "Wave aberration" patented technology

The invention belongs to the technical field of optical detection, and particularly relates to a global power wave aberration prediction-based Ritchey-Common detection method and system, and the method comprises the steps: firstly building a three-dimensional optical model through the parameters of a standard spherical mirror, a to-be-detected plane mirror and an interferometer, and combining a preset Ritchey angle and an out-of-focus / astigmatism coefficient, injecting vibration and temperature noise by using Monte Carlo simulation to generate an enhanced training data space; secondly, constructing a phase error adjustment model based on an adversarial network, and decoupling a mapping relation between an adjustment error and wave aberration distortion through a multi-scale attention mechanism and a radial basis function network to realize adaptive correction of sub-aperture phase data; and finally, splicing sub-aperture phases by using a graph neural network and fusing multi-angle full-aperture measurement data to accurately reconstruct the surface shape of the plane mirror to be measured. According to the invention, through confrontation training and dynamic error compensation of physical constraints, the detection efficiency and reliability of the large-aperture optical element are significantly improved.

The invention relates to the technical field of space telescope image processing, and particularly provides a large-view-field spliced space telescope image high-precision restoration method, which comprises the following steps of: constructing a distribution relation of wavefront aberrations with different frequencies along with a view field according to optical parameters of a telescope; based on the relation between the intensity two-dimensional matrix of any field-of-view image plane PSF image and the wave aberration of the corresponding field-of-view, an image plane PSF image of a specific field-of-view is actually measured through a wavefront sensor arranged on the telescope, and the wave aberration of the specific field-of-view is calculated based on the actually measured image plane PSF image; the PSF of any view field is derived according to the distribution rule of wavefront aberrations with different frequencies along with the view field and the relation between the intensity two-dimensional matrix of the image plane PSF image and the wave aberration, and the PSF of any view field derived from the actually measured PSF is utilized to realize the high-precision restoration of the spliced space telescope image through an image block restoration method. According to the method, the actually-measured PSF is adopted for image restoration, the defect that estimation PSF is adopted during traditional non-blind deconvolution is overcome, and the restoration precision is improved.

The invention relates to the technical field of optical design, and particularly provides an optical system polarization aberration compensation method, computer equipment and a storage medium, at least one plane mirror is additionally arranged in a to-be-compensated optical system, the plane mirror is arranged in front of an image plane of the optical system, and the spatial attitude of each plane mirror is used as a free variable to compensate the polarization aberration of the optical system. In the optional range of the spatial attitudes of the plane mirrors, the spatial attitude of each plane mirror is adjusted, and the compensated polarization aberration of the optical system meets the preset requirement by optimizing the spatial attitude of the iterative plane mirrors, so that the polarization aberration of the optical system can be compensated on the premise of not changing the wave aberration of the optical system and not occupying the degree of freedom of design. And the polarization aberration of the optical system is greatly reduced.

The invention provides a performance prediction and control method for a multi-physics-field coupled high-energy laser system, and relates to the technical field of laser systems, and the method comprises the steps: obtaining optimized environment parameters; configuring laser system parameters; determining turbulence compensation parameters and laser energy distribution data; determining turbulence compensation control parameters at the current moment; controlling a deformable mirror of the high-energy laser system based on the turbulence compensation control parameters; determining optical element temperature field data, optical element deformation and wave aberration variation based on the laser system parameters and the laser energy distribution data; determining task feasibility of the current task based on the optical element temperature field data; under the condition that the task feasibility is feasible, determining a target dynamic damage threshold; and determining a performance prediction result of the high-energy laser system. According to the technical scheme, control and performance prediction are carried out on the high-energy laser system based on multi-parameter cooperation in the coupled physical field, the environmental adaptability and the parameter configuration efficiency are improved, and closed-loop compensation can be carried out in real time.

The invention provides a large-aperture optical system focal plane position measuring device and a measuring method, and solves the problems that a traditional method based on small detector scanning is difficult to fully cover and accurately butt joint a focal plane of a large-aperture optical system, so that local focusing is accurate but the whole is deviated; and the imaging performance of the large-aperture optical system is influenced. According to the invention, two functions of wave aberration detection and focal plane position measurement are integrated, one set of platform covers detection of two types of key optical parameters through switchable test path and detector configuration, the equipment utilization rate is improved, and the experiment cost is reduced. The six-degree-of-freedom adjusting table and the two-dimensional rotary table are used in cooperation, high-precision fine adjustment of the detected optical system in the space attitude and the position of the detector is achieved, searching and positioning of the focal plane can be rapidly completed, and the focusing efficiency is high.

The invention relates to an off-axis three-reflector system design method and system based on a vector aberration theory. The method comprises the following steps: determining the focal length of an off-axis three-reflector system; determining the distance between the mirrors and the distance between the three reflectors and the image surface; according to the design requirements of the coaxial three-reflector system, calculating the curvature radiuses and quadric surface coefficients of the three reflectors; calculating the pupil radius of the pupil off-axis front three-reflector system according to the relationship between the pupil radius before and after the pupil off-axis and the pupil eccentric vector, and determining a wave aberration expression of the pupil off-axis rear three-reflector system; based on a paraxial ray tracing method and a vector aberration theory, establishing analytic expressions of a visual axis error, an increased coma error and an increased astigmatic aberration on a primary imaging surface about an inclination amount and an eccentricity amount; by taking optical axis error, coma error minimization and astigmatic aberration minimization as constraint conditions, optimally solving inclination amounts and eccentricity amounts of the three reflectors; structural parameters of the three-mirror system are optimized through optical simulation software. The efficient and reliable design method and system are achieved.

The invention discloses a phase measurement system and a super-lens detection method, and belongs to the technical field of super-lens wavefront detection method.The phase measurement system comprises a light source, a spectroscope, a beam compressor, a beam splitter, a detection optical assembly and an image acquisition device.The beam splitter is used for dividing detection light passing through the beam compressor into a reference light beam and a detection light beam; the detection optical assembly comprises an objective lens and a detection platform, the detection platform is used for supporting a to-be-detected optical element or a reference element, and the image acquisition device is used for generating a first aberration signal according to the first detection light beam and the reference light beam and generating a second aberration signal according to the second detection light beam and the reference light beam; the wavefront aberration of the super lens can be obtained through the difference between the first aberration signal and the second aberration signal, so that the interference problem of the objective lens aberration in the detection process can be effectively solved, the high-precision measurement of the wave aberration of the super lens is realized, and the performance evaluation of the imaging quality of the super lens can be carried out.

The invention relates to the technical field of holographic lithography systems, and discloses a plane wave-based illumination system and exposure equipment, and the plane wave-based illumination system comprises a first lens group and a second lens group which are sequentially arranged along an optical axis direction; the first lens group is used for expanding the laser output by the light source; the second lens group is used for collimating the expanded laser and outputting plane wave laser to the direction of the holographic mask; the distance between the first lens group and the second lens group is the sum of the effective focal length of the first lens group and the effective focal length of the second lens group. The light beam is expanded by the first lens group, then the light beam is collimated by the second lens group, and the wave aberration of the illumination system can be reduced by adopting the form of the lens group, so that the photoetching resolution is improved; and compared with a traditional projection photoetching illumination system and a holographic mask illumination system based on spherical waves, the number of used lenses can be reduced, and the manufacturing cost is reduced.

The invention relates to an assembling method of an optical system, in particular to a precise assembling method of an off-axis three-mirror optical system, and solves the problems that an existing off-axis three-mirror optical system has non-rotational symmetry and optical axes of all components are not on the same axis, so that asymmetric wave aberration exists in the off-axis three-mirror optical system; and high-precision assembly cannot be realized. The precise assembly method of the off-axis three-mirror optical system comprises the following steps: 1) roughly positioning the primary mirror assembly, the secondary mirror assembly and the three-mirror assembly respectively until the angular deviation of each mirror group is less than or equal to 10 ''and the eccentric tolerance is less than or equal to 0.05 mm; the method comprises the steps of (1) analyzing the wave aberration of the off-axis three-mirror optical system and screening the freedom degree according to the wave aberration to carry out image quality correction, (3) calculating the misalignment amount M of a secondary mirror and a third mirror, and (4) precisely adjusting the angles of the secondary mirror and the third mirror according to the misalignment amount M to enable the full-view-field wave aberration of the off-axis three-mirror optical system to be smaller than a threshold value, and completing precise assembly of the off-axis three-mirror optical system.

The invention relates to the technical field of spaceflight optical remote sensors, and particularly discloses a calibration method and system for a secondary mirror gasket of a high-resolution space camera, and the method comprises the following steps: 1, carrying out the calibration of a secondary mirror gasket to be repaired in a state that the secondary mirror gasket to be repaired is assembled in the high-resolution space camera; obtaining a first reference point test result of a measurement plane of a secondary mirror installation and adjustment auxiliary tool connected with the secondary mirror structure; 2, when the high-resolution space camera is in the optimal wave aberration state, obtaining a second reference point test result of the measurement plane of the secondary mirror installation and adjustment auxiliary tool connected with the secondary mirror structure; 3, comparing the first reference point test result with the second reference point test result, and calculating to obtain the required grinding thickness of the secondary mirror gasket; and fourthly, the secondary mirror gasket to be repaired is corrected based on the obtained grinding thickness of the secondary mirror gasket. The method is high in calibration efficiency, high in calibration precision and wide in application scene.

The present invention discloses a wave aberration reconstruction method, apparatus, electronic device, and storage medium, relating to the technical field of optical detection. The wave aberration reconstruction method includes: obtaining a corresponding initial Zernike coefficient set based on a pre-acquired actual point spread function image and a first training network; optimizing the initial Zernike coefficient set by using a second training network based on the principle that the target point spread function image is the same as the actual point spread function image to obtain a corresponding target Zernike coefficient set; and obtaining a corresponding target wave aberration based on the target Zernike coefficient set and a pre-configured optical system basis function. The present invention solves the problems that wave aberration reconstruction requires multiple measurements and calibrations, resulting in inconvenient operation and low accuracy in the prior art, thereby simply and conveniently completing the process of wave aberration reconstruction, saving manpower and time, and improving the reconstruction accuracy.

A kind of telescope active optical correction system correction accuracy testing device, including laser interferometer, multidimensional adjusting table, wave aberration measurement component and plane mirror, laser interferometer is placed in the outside of optical telescope for emitting test light to the inside of optical telescope, to detect the wave aberration data of multiple fields of view;Multidimensional adjusting table is used to adjust the position, angle of optical element in optical telescope, to simulate the situation that telescope imaging quality drops;Wave aberration measurement component is set at the image plane of telescope for measuring the wave aberration after optical telescope imaging quality drops, and plane mirror is used to reflect test light.The present application relates to a kind of telescope active optical correction system correction accuracy testing method, the displacement amount and rotation angle of optical element when comparing when simulating image quality drop and when correcting judge the correction accuracy of active optical correction system, compare wave aberration before simulating image quality drop and after correction, judge whether the image quality after correction reaches the image quality before simulating image quality drop.

The application discloses an artificial intelligence anti-disturbance lithography objective wave aberration measurement method, and relates to the field of lithography objective wave aberration measurement algorithms. In the application, a U-shaped neural network structure based on physical information is used in a general U-NET neural network model, the overall encoder-decoder structure is retained, and the pooling layer is removed. Compared with the traditional four-step phase shifting (or five-step phase shifting), the application has the following innovative points: (1) on the hardware, the piezoelectric phase shifter only needs to be moved once, and only two-step phase shifting is needed. Compared with the traditional phase shifting wave aberration measurement system, the application has faster measurement speed. (2) on the hardware, the traditional wave aberration measurement system needs an ultrahigh-precision piezoelectric phase shifter, while the application only needs a low-precision standard (the precision is better than 50 nm) piezoelectric phase shifter. (3) on the algorithm, the application can accurately measure the lithography objective wave aberration from two interference patterns. (4) on the wave aberration reconstruction precision, the application has higher precision due to the reduction of environmental interference.

The invention discloses a convex spherical lens optical axis and interferometer system optical axis alignment method, a concave spherical lens is arranged behind a convex spherical lens, the convex spherical lens and the concave spherical lens form an interference cavity at a confocal position, and the interference cavity is adjusted to zero fringes; the concave spherical mirror is moved in the direction of increasing the optical path of the optical axis, and cat eye-like stripes of the convex spherical mirror lens can be observed after the concave spherical mirror is moved to a designated position; the cat eye-like stripes of the convex spherical lens are adjusted to be concentric circles, and when the tilt term of the wave aberration of the measured phase result is approximately zero, alignment is completed. The curvature radius of the standard surface of the concave spherical mirror is larger than that of the reference surface of the convex spherical mirror. The device can align the convex spherical lens with the optical axis of the interferometer system, is not limited by the F number of the spherical lens, and has the advantages of simple structure and high measurement precision.

This invention discloses a method for field-of-view deconvolution image restoration of an imaging system based on wavefront aberration reconstruction, belonging to the field of wavefront aberration measurement and computational imaging technology. The method includes: measuring the wavefront aberration of the optical system under test in an imaging system containing detection markers; setting the measured wavefront aberration as the wavefront aberration of the optical system under test in an imaging system containing pinhole arrays, and simulating and generating point spread functions corresponding to different field-of-view blocks; replacing the detection markers with imaging samples, and acquiring the actual image of the imaging samples through the optical system under test as the image to be restored; dividing the image to be restored into field-of-view partitions, performing deconvolution restoration on each block using the corresponding point spread function, and then stitching the restored block images together to obtain a complete restored image. This invention decouples wavefront aberration measurement from image restoration, achieving effective correction of spatially varying aberrations in a large field of view without increasing hardware complexity, significantly improving the restoration accuracy, efficiency, and consistency of the entire field-of-view image.

The invention discloses a liquid lens wavefront detection device and method based on a background schlieren method. The detection device comprises a first reference wavefront beam generation assembly, a double-side telecentric lens and a camera, and a reference wavefront beam emitted from the first reference wavefront beam generation assembly enters a liquid lens to be detected, enters the double-side telecentric lens after being transmitted by the liquid lens to be detected, and is collected by the camera after being transmitted by the double-side telecentric lens. The detection device is used for collecting a reference image and a dynamic image of the to-be-detected liquid lens, so that background displacement is obtained, wavefront slope distribution is further obtained, and finally wavefront distribution and wave aberration of the to-be-detected liquid lens are obtained after integral reconstruction is conducted on the wavefront slope distribution. The telecentric background schlieren method is adopted for liquid lens wave aberration detection, and the problems that in a traditional Shack-Hartmann wavefront detection technology, a microlens array needs to be used for dividing wavefront to be detected into a plurality of wavelets, and the spatial resolution is limited by the microlens size and the duty ratio are solved.

The invention discloses an optical system wave aberration acquisition method based on a generalized pupil function, and belongs to the technical field of imaging quality detection of optical systems. The problems that in the prior art, due to the fact that exit pupil deformation adaptability is insufficient, off-axis view field wave aberration calculation deviation is large, and it is difficult to be suitable for on-axis and off-axis view field wave aberration calculation at the same time are solved. The method comprises the following steps: acquiring an incident wavelength and a field angle of a to-be-detected optical system; obtaining entrance pupil and exit pupil parameters, and determining an entrance pupil position, an entrance pupil diameter and a corresponding exit pupil position by using a paraxial ray tracing algorithm; determining the working F number TFNO in the meridian direction and the F number SFNO in the sagittal direction under the wavelength and the field angle; obtaining a normalized pupil plane according to the TFNO and the SFNO; further generating an incident light array; tracing the incident ray array to an image surface according to an actual ray tracing algorithm; determining a virtual reference spherical surface parameter; and optical system wave aberration is obtained. The method can be applied to the technical field of optical system design.

The present application relates to a kind of computer-aided alignment denoising methods for high-precision optical system, first, build the simulation model of misalignment optical system, calculate sensitivity matrix by difference method, construct imaging quality evaluation objective function;Interferometer multiple field multiple acquisition system wave aberration is used, constructs multiple aberration matrix and is spliced to generate observation matrix;Observation matrix is sequentially implemented dense noise denoising, matrix row average processing, spliced to further complete sparse noise denoising after full field aberration matrix is obtained;Compensation amount is solved relying on sensitivity matrix, effective compensation amount is screened in combination with objective function and is carried out system alignment, after alignment, test imaging quality, not meet the index then repeat wave aberration measurement and denoising process iterative correction.The advantage is that: it can effectively reduce the negative influence of interferometer measurement noise on alignment accuracy, improve the alignment accuracy of high-precision optical system, and the method can maintain stable denoising performance under different noise intensity.

The present invention is applicable to the field of optical detection technology, and provides an optical detection method. The optical detection method comprises the following steps: obtaining the coordinates of a two-dimensional photoelectric sensor and an optical element to be measured, and constructing a mapping relationship between rectangular plane coordinates; respectively obtaining shearing interference patterns in the x and y directions of the two-dimensional photoelectric sensor, and respectively selecting 18 interference fringe patterns for phase extraction; unwrapping the phase extraction results, respectively obtaining differential wavefronts in the x and y directions, and reconstructing shearing interference wavefronts to obtain the wavefront of the optical system to be measured. The optical detection method of the present invention measures the wave aberration of the optical system to be measured, eliminates the influence of multi-order parasitic interference generated by the 0th order and the first ±19th order diffraction during the Ronchi shearing interferometer detection process, and improves the wave aberration detection accuracy of the optical system to be measured. The detection accuracy is at least 20 times higher than that of the existing eight-step phase shift method.

The invention provides an image quality analysis method and device based on circular truncated cone geometric constraint and negative feedback regulation and control. The method comprises the steps that S1, the vertical axis chromatic aberration, the axial chromatic aberration and the wave chromatic aberration of a multi-conjugate catadioptric zoom system are acquired; s2, solving the wave aberration of the multi-conjugate catadioptric zoom system after wavelength modulation; s3, determining the position of a characteristic aberration node according to the wave aberration, and calculating the diameter of an RMS light spot near a central view field; and S4, carrying out negative feedback regulation and control on the node position of the characteristic aberration by using the geometric constraint of a circular truncated cone, taking the abbe number of the material as a variable in a vertical-axis chromatic aberration and axial chromatic aberration correction mode so as to inhibit the influence of chromatic aberration, and comprehensively analyzing the imaging quality of the multi-conjugate catadioptric zoom system. The image quality comprehensive analysis method is suitable for image quality comprehensive analysis of a multi-conjugate refraction and reflection type zoom system, and particularly has a wide application prospect in a refraction and reflection type zoom optical system which realizes a high-performance zoom function and relatively wide spectral imaging through a deformation device.

The present invention relates to a wavefront correction system, and in particular to a data processing system and a wavefront correction method for wavefront correction of a space-based telescope, which solves the technical problem that the existing wavefront correction data processing system has a low control bandwidth and is difficult to realize dynamic and high-frequency correction of wave aberrations of a space-based telescope. The present invention utilizes the Shack-Hartmann principle, embeds a wavefront correction algorithm into a heterogeneous model of a combined processing FPGA+data processing FPGA+CPU, adopts a parallel processing structure of a combined processing FPGA, a data processing FPGA and a CPU, improves bandwidth and speed, and matches the optimal hardware resources according to different processing tasks, so that the wavefront correction process reaches the optimal design, thereby achieving the global optimal processing effect, and can be used to process complex optical data. The control unit reaches the thousand-unit level, the data bandwidth reaches 100M, the operation speed is fast, and the dynamic and high-frequency correction of wave aberrations of a space-based telescope can be realized.

The application discloses a large numerical aperture lithography projection objective wave aberration splicing and stitching device and method, which comprises the following in sequence along the illumination direction of an illumination system: a mask, a mask table, a large numerical aperture lithography projection objective, a Shack-Hartmann sensor for aligning an actual image point on an imaging surface after magnification of a mask pattern by the large numerical aperture lithography projection objective, a sensor motion table capable of six-dimensional motion for bearing the Shack-Hartmann sensor, and an interferometer measurement system for measuring alignment position coordinate information and returning three-dimensional coordinates of the alignment position. The sensor motion table is used to align the Shack-Hartmann sensor with the actual image point and scan the large numerical aperture lithography projection objective wavefront information in the form of a Hadamard measurement matrix code along an I-shaped beam, differential measurement is used to separate measurement errors caused by translation and tilt adjustment errors, wavelet transform is used to improve signal sparsity, and a compressed sensing algorithm is used to reconstruct an actual wavefront, so that the large numerical aperture wave aberration splicing and stitching technology is realized.

The application discloses a wave aberration sensor compatible with high precision and large dynamic range, and belongs to the field of optical precision measurement and detection. The wave aberration sensor comprises a projection module, an array structured light chip and a detection module. The core idea of the wave aberration sensor is that different characteristic phases are encoded in each sub-aperture based on an array structured light chip, so that a plurality of structured light spots with obvious characteristics can be generated in the focal plane, and the different sub-aperture light spots can be distinguished. Based on the array structured light chip, the wave aberration sensor can realize measurement with a larger dynamic range without sacrificing the measurement precision. The wave aberration sensor can realize measurement of various laser wavefronts and wave aberration detection of various lenses. Therefore, the wave aberration sensor has important practical value in the fields of laser processing, laser surgery, ophthalmic detection and optical imaging.

The present invention relates to a tolerance analysis method for a computational imaging system based on restored image performance, comprising: constructing a universal optical element machining error model; determining the parameter boundaries of the error model based on a given root mean square value of the machining surface shape error, generating machining error parameters, and importing them into optical design software for ray tracing. The system obtains wave aberrations of each field of view to obtain point spread functions of each field of view, superimposes a noise image to obtain a degraded image, thereby constructing a restored image, and evaluating the MTF values ​​of each field of view of the system, using the machining tolerance limits of each optical element; multiplying the machining tolerance limits of each optical element by a proportionality coefficient Ra, and repeatedly executing the above steps, gradually increasing the proportionality coefficient until the machining error boundaries of each optical element in the system are obtained. Compared with the prior art, the present invention can implement tolerance analysis of computational imaging systems and determine the machining tolerance boundaries of optical elements, which has important guiding significance for the machining of optical elements in the system.

A curvature radius measurement method and system can realize high-precision detection of curvature radius by using shorter guide rails, greatly increase the measurement range of the interference method, and reduce the test cost. The method comprises the following steps: (1) building a detection light path, measuring the aperture of a to-be-detected mirror, and moving the to-be-detected mirror to a confocal position; (2) pushing the to-be-detected mirror to move along the optical axis direction, acquiring an axial displacement distance in a displacement measurement interferometer, and acquiring a defocus wave front in a phase measurement interferometer; (3) performing Zernike fitting on the defocus wave front to obtain a defocus coefficient; and (4) accurately modeling the test light path in optical design software, taking the defocus coefficient in system wave aberration as an optimization target of the system, taking the curvature radius of the to-be-detected mirror as an optimization variable, and performing optimization by using the optimization function of the optical design software until the system wave aberration obtained by the software is consistent with the system wave aberration actually measured and obtained, so that the curvature radius of the to-be-detected mirror is obtained.

The present application relates to the technical field of optical design, and particularly provides an optical system polarization aberration compensation method, a computer device and a storage medium, at least one plane mirror is added in the optical system to be compensated, the plane mirror is arranged before an image plane of the optical system, and a spatial pose of each plane mirror is taken as a free variable, the spatial pose of each plane mirror is adjusted in a selectable range of the spatial pose of the plane mirror, the spatial pose of the plane mirror is iteratively optimized, polarization aberration of the compensated optical system meets preset requirements, and the polarization aberration of the optical system is greatly reduced under the premise that the wave aberration of the optical system is not changed and no design freedom is occupied.

The application provides a wide-temperature miniaturized coherent telescope system, which comprises a spacer ring, a pressing ring, a first lens, a second lens, a secondary mirror pressing ring, a secondary mirror seat, a third lens, an adjusting sleeve and a fiber flange. The application comprehensively considers factors such as telescope performance, size, weight and environmental adaptability, and selects H-ZF6, H-K9L and H-ZK3 as the optical lens, adopts TC4 titanium alloy material as the structure, compensates each other between the change of the refractive index, the curvature radius and the thickness of the optical element with the temperature and the thermal deformation of the structure, realizes stable work without temperature control at-40~60 DEG C, re-distributes the tolerance sensitivity of the optical element by using a unique optical design form, only the secondary mirror needs to be centered and adjusted among the three lenses, which greatly shortens the adjustment period and difficulty, through the additional receiving field of view of ±0.03 DEG, the focal point can still meet the system wave aberration requirement of 1 / 20 lambda within the range of 0.13 mm radius, avoids a complex fiber adjusting mechanism, and is applied to the field of coherent wind measurement laser radar.

The invention discloses an object space telecentric projection optical system with a long working distance. The projection optical system sequentially comprises an object plane, vacuum window glass, a first lens to a fourth lens, an aperture diaphragm, a fifth lens to a sixth lens, an interference filter, a beam splitter prism and an image plane from one side of the object plane in the optical axis direction of the object plane, the rear focus of the combined system of the vacuum window glass and the first to fourth lenses is located at the central point of the aperture diaphragm to form an object space telecentric optical structure; the axial distance between the vertex of the front surface of the first lens and the object plane is 640 mm, namely the object space working distance is 640 mm. Aberration such as wave aberration and distortion can be effectively corrected, and good imaging quality is achieved. The long-working-distance object space telecentric projection optical system completely meets the technical requirements for measuring parameters such as the position, the shape and the speed of liquid drops in a vacuum bin.

The invention relates to a wavefront correction system, in particular to a data processing system for wavefront correction of a space-based telescope and a wavefront correction method, and solves the technical problems that an existing wavefront correction data processing system is relatively low in control bandwidth, and dynamic and high-frequency correction of wave aberration of the space-based telescope is difficult to realize. According to the method, the Shack-Hartmann principle is utilized, a wavefront correction algorithm is embedded into a heterogeneous model of the combination processing FPGA + the data processing FPGA + the CPU, a parallel processing structure of the combination processing FPGA, the data processing FPGA and the CPU is adopted, the bandwidth and the speed are improved, optimal hardware resources are matched according to different processing tasks, the wavefront correction process achieves the optimal design, and the method has the advantages of being simple in structure, convenient to operate and high in practicability. The method can be used for processing complex optical data, the control unit reaches the thousand-unit level, the data bandwidth reaches 100 M, the operation speed is high, and dynamic and high-frequency correction of the wave aberration of the space-based telescope can be achieved.

The invention provides a beam shaping method and system of a laser, and relates to the technical field of bar packaging, the method adopts a curved surface shaping piece with one surface being a free-form surface to shape a fast axis beam of the bar laser, and the molded surface of the curved surface shaping piece is fitted by adjusting a Zernike polynomial, so that the fast axis beam of the bar laser is shaped. And the wave aberration of the curved surface shaping piece after fitting accords with a preset value, so that the square light spots generated by the bars of the shaped stacked laser have uniform light intensity distribution and sharp edges, and the problems that in the prior art, the quality of light beams of the stacked laser is poor, and an existing optical shaping method needs multiple times of shaping and is high in difficulty are solved.