34 results about "Wave aberration" patented technology

The invention provides a performance prediction and control method for a multi-physics-field coupled high-energy laser system, and relates to the technical field of laser systems, and the method comprises the steps: obtaining optimized environment parameters; configuring laser system parameters; determining turbulence compensation parameters and laser energy distribution data; determining turbulence compensation control parameters at the current moment; controlling a deformable mirror of the high-energy laser system based on the turbulence compensation control parameters; determining optical element temperature field data, optical element deformation and wave aberration variation based on the laser system parameters and the laser energy distribution data; determining task feasibility of the current task based on the optical element temperature field data; under the condition that the task feasibility is feasible, determining a target dynamic damage threshold; and determining a performance prediction result of the high-energy laser system. According to the technical scheme, control and performance prediction are carried out on the high-energy laser system based on multi-parameter cooperation in the coupled physical field, the environmental adaptability and the parameter configuration efficiency are improved, and closed-loop compensation can be carried out in real time.

The invention provides a large-aperture optical system focal plane position measuring device and a measuring method, and solves the problems that a traditional method based on small detector scanning is difficult to fully cover and accurately butt joint a focal plane of a large-aperture optical system, so that local focusing is accurate but the whole is deviated; and the imaging performance of the large-aperture optical system is influenced. According to the invention, two functions of wave aberration detection and focal plane position measurement are integrated, one set of platform covers detection of two types of key optical parameters through switchable test path and detector configuration, the equipment utilization rate is improved, and the experiment cost is reduced. The six-degree-of-freedom adjusting table and the two-dimensional rotary table are used in cooperation, high-precision fine adjustment of the detected optical system in the space attitude and the position of the detector is achieved, searching and positioning of the focal plane can be rapidly completed, and the focusing efficiency is high.

A kind of telescope active optical correction system correction accuracy testing device, including laser interferometer, multidimensional adjusting table, wave aberration measurement component and plane mirror, laser interferometer is placed in the outside of optical telescope for emitting test light to the inside of optical telescope, to detect the wave aberration data of multiple fields of view;Multidimensional adjusting table is used to adjust the position, angle of optical element in optical telescope, to simulate the situation that telescope imaging quality drops;Wave aberration measurement component is set at the image plane of telescope for measuring the wave aberration after optical telescope imaging quality drops, and plane mirror is used to reflect test light.The present application relates to a kind of telescope active optical correction system correction accuracy testing method, the displacement amount and rotation angle of optical element when comparing when simulating image quality drop and when correcting judge the correction accuracy of active optical correction system, compare wave aberration before simulating image quality drop and after correction, judge whether the image quality after correction reaches the image quality before simulating image quality drop.

The invention discloses a convex spherical lens optical axis and interferometer system optical axis alignment method, a concave spherical lens is arranged behind a convex spherical lens, the convex spherical lens and the concave spherical lens form an interference cavity at a confocal position, and the interference cavity is adjusted to zero fringes; the concave spherical mirror is moved in the direction of increasing the optical path of the optical axis, and cat eye-like stripes of the convex spherical mirror lens can be observed after the concave spherical mirror is moved to a designated position; the cat eye-like stripes of the convex spherical lens are adjusted to be concentric circles, and when the tilt term of the wave aberration of the measured phase result is approximately zero, alignment is completed. The curvature radius of the standard surface of the concave spherical mirror is larger than that of the reference surface of the convex spherical mirror. The device can align the convex spherical lens with the optical axis of the interferometer system, is not limited by the F number of the spherical lens, and has the advantages of simple structure and high measurement precision.

This invention discloses a method for field-of-view deconvolution image restoration of an imaging system based on wavefront aberration reconstruction, belonging to the field of wavefront aberration measurement and computational imaging technology. The method includes: measuring the wavefront aberration of the optical system under test in an imaging system containing detection markers; setting the measured wavefront aberration as the wavefront aberration of the optical system under test in an imaging system containing pinhole arrays, and simulating and generating point spread functions corresponding to different field-of-view blocks; replacing the detection markers with imaging samples, and acquiring the actual image of the imaging samples through the optical system under test as the image to be restored; dividing the image to be restored into field-of-view partitions, performing deconvolution restoration on each block using the corresponding point spread function, and then stitching the restored block images together to obtain a complete restored image. This invention decouples wavefront aberration measurement from image restoration, achieving effective correction of spatially varying aberrations in a large field of view without increasing hardware complexity, significantly improving the restoration accuracy, efficiency, and consistency of the entire field-of-view image.

The invention discloses an optical system wave aberration acquisition method based on a generalized pupil function, and belongs to the technical field of imaging quality detection of optical systems. The problems that in the prior art, due to the fact that exit pupil deformation adaptability is insufficient, off-axis view field wave aberration calculation deviation is large, and it is difficult to be suitable for on-axis and off-axis view field wave aberration calculation at the same time are solved. The method comprises the following steps: acquiring an incident wavelength and a field angle of a to-be-detected optical system; obtaining entrance pupil and exit pupil parameters, and determining an entrance pupil position, an entrance pupil diameter and a corresponding exit pupil position by using a paraxial ray tracing algorithm; determining the working F number TFNO in the meridian direction and the F number SFNO in the sagittal direction under the wavelength and the field angle; obtaining a normalized pupil plane according to the TFNO and the SFNO; further generating an incident light array; tracing the incident ray array to an image surface according to an actual ray tracing algorithm; determining a virtual reference spherical surface parameter; and optical system wave aberration is obtained. The method can be applied to the technical field of optical system design.

The present application relates to a kind of computer-aided alignment denoising methods for high-precision optical system, first, build the simulation model of misalignment optical system, calculate sensitivity matrix by difference method, construct imaging quality evaluation objective function;Interferometer multiple field multiple acquisition system wave aberration is used, constructs multiple aberration matrix and is spliced to generate observation matrix;Observation matrix is sequentially implemented dense noise denoising, matrix row average processing, spliced to further complete sparse noise denoising after full field aberration matrix is obtained;Compensation amount is solved relying on sensitivity matrix, effective compensation amount is screened in combination with objective function and is carried out system alignment, after alignment, test imaging quality, not meet the index then repeat wave aberration measurement and denoising process iterative correction.The advantage is that: it can effectively reduce the negative influence of interferometer measurement noise on alignment accuracy, improve the alignment accuracy of high-precision optical system, and the method can maintain stable denoising performance under different noise intensity.

The application discloses a large numerical aperture lithography projection objective wave aberration splicing and stitching device and method, which comprises the following in sequence along the illumination direction of an illumination system: a mask, a mask table, a large numerical aperture lithography projection objective, a Shack-Hartmann sensor for aligning an actual image point on an imaging surface after magnification of a mask pattern by the large numerical aperture lithography projection objective, a sensor motion table capable of six-dimensional motion for bearing the Shack-Hartmann sensor, and an interferometer measurement system for measuring alignment position coordinate information and returning three-dimensional coordinates of the alignment position. The sensor motion table is used to align the Shack-Hartmann sensor with the actual image point and scan the large numerical aperture lithography projection objective wavefront information in the form of a Hadamard measurement matrix code along an I-shaped beam, differential measurement is used to separate measurement errors caused by translation and tilt adjustment errors, wavelet transform is used to improve signal sparsity, and a compressed sensing algorithm is used to reconstruct an actual wavefront, so that the large numerical aperture wave aberration splicing and stitching technology is realized.

A curvature radius measurement method and system can realize high-precision detection of curvature radius by using shorter guide rails, greatly increase the measurement range of the interference method, and reduce the test cost. The method comprises the following steps: (1) building a detection light path, measuring the aperture of a to-be-detected mirror, and moving the to-be-detected mirror to a confocal position; (2) pushing the to-be-detected mirror to move along the optical axis direction, acquiring an axial displacement distance in a displacement measurement interferometer, and acquiring a defocus wave front in a phase measurement interferometer; (3) performing Zernike fitting on the defocus wave front to obtain a defocus coefficient; and (4) accurately modeling the test light path in optical design software, taking the defocus coefficient in system wave aberration as an optimization target of the system, taking the curvature radius of the to-be-detected mirror as an optimization variable, and performing optimization by using the optimization function of the optical design software until the system wave aberration obtained by the software is consistent with the system wave aberration actually measured and obtained, so that the curvature radius of the to-be-detected mirror is obtained.

The application provides a wide-temperature miniaturized coherent telescope system, which comprises a spacer ring, a pressing ring, a first lens, a second lens, a secondary mirror pressing ring, a secondary mirror seat, a third lens, an adjusting sleeve and a fiber flange. The application comprehensively considers factors such as telescope performance, size, weight and environmental adaptability, and selects H-ZF6, H-K9L and H-ZK3 as the optical lens, adopts TC4 titanium alloy material as the structure, compensates each other between the change of the refractive index, the curvature radius and the thickness of the optical element with the temperature and the thermal deformation of the structure, realizes stable work without temperature control at-40~60 DEG C, re-distributes the tolerance sensitivity of the optical element by using a unique optical design form, only the secondary mirror needs to be centered and adjusted among the three lenses, which greatly shortens the adjustment period and difficulty, through the additional receiving field of view of ±0.03 DEG, the focal point can still meet the system wave aberration requirement of 1 / 20 lambda within the range of 0.13 mm radius, avoids a complex fiber adjusting mechanism, and is applied to the field of coherent wind measurement laser radar.

The invention discloses an object space telecentric projection optical system with a long working distance. The projection optical system sequentially comprises an object plane, vacuum window glass, a first lens to a fourth lens, an aperture diaphragm, a fifth lens to a sixth lens, an interference filter, a beam splitter prism and an image plane from one side of the object plane in the optical axis direction of the object plane, the rear focus of the combined system of the vacuum window glass and the first to fourth lenses is located at the central point of the aperture diaphragm to form an object space telecentric optical structure; the axial distance between the vertex of the front surface of the first lens and the object plane is 640 mm, namely the object space working distance is 640 mm. Aberration such as wave aberration and distortion can be effectively corrected, and good imaging quality is achieved. The long-working-distance object space telecentric projection optical system completely meets the technical requirements for measuring parameters such as the position, the shape and the speed of liquid drops in a vacuum bin.

The invention relates to the technical field of wavefront measurement, and provides a wave aberration measuring device and method of a finite conjugate objective lens. The collimation module is used for collimating divergent light beams emitted by the light source into parallel light beams; the mask is arranged at the downstream of the collimation module; at least one small hole with the aperture smaller than 1 micrometer is formed in the mask; the focusing lens is used for focusing the parallel light beams and enabling the parallel light beams to pass through the small holes in the mask; a wavefront measurement module; and the computer is connected with the wavefront measurement module and is used for controlling the wavefront measurement module to carry out data acquisition and processing, storing and outputting the acquired data. Compared with the prior art in which an interferometer is adopted to measure the wave aberration of the limited conjugate objective lens, the wave aberration measuring device of the limited conjugate objective lens provided by the invention does not need to use an expensive interferometer, is lower in cost, can measure objective lenses with different wavelengths, and is better in universality.

The application discloses a kind of continuous zoom complex optical system alignment method, including the following steps: S1: the eccentricity, tilt detection of each lens in focusing group, zoom group, compensation group and rear fixed group, and complete lens correction in each mirror group component;S2: the corrected each mirror group component is loaded into the main lens barrel of continuous zoom optical system, and the air gap between each mirror group component is measured accurately, and the initial installation of continuous zoom optical system is completed;S3: the initial installation of continuous zoom optical system is completed and is placed in the wave aberration detection light path of interferometer and plane mirror group, the detection of optical system wave aberration in long, short focus two extreme positions is completed, and the aberration type is confirmed according to wave aberration detection result, so as to realize optical system aberration correction.The application can quantify the aberration type and change amount in alignment process, so that alignment personnel can carry out targeted alignment, and then the alignment efficiency and precision of continuous zoom optical system are improved.

The invention relates to a wide-spectrum wave aberration detection device and method. The wide-spectrum wave aberration detection device comprises a light source part, a wave aberration measurement part, an alignment light path part and a large-view-field off-axis beam expander, the light source part is used for generating collimated light beams with different wavelengths; the wave aberration measuring part is arranged on an emergent light path of the light source part and comprises a BS prism and a wavefront detection sensor; and the alignment light path part is arranged at the downstream of the light path of the wave aberration measurement part and comprises a spectroscope and an alignment camera. According to the invention, through the optical path system, when the wave aberration of the optical system is measured under multiple wavelengths, the test precision of measurement results under different wavelengths is basically the same; and no diffraction fringes exist in the wave aberration graph obtained in the measurement process, so that the measurement error is reduced, and the test precision is improved.

The utility model discloses a kind of ultra-thin two-way dichroic mirror, the ultra-thin two-way dichroic mirror is no base in light aperture area, only one layer of membrane system structure, total thickness 3.1-3.2 μm of film, film material is composed of titanium dioxide (TiO2) and silicon dioxide (SiO2), in 450nm-800nm wavelength range, when working angle 45°, reflectivity>92%, in 1700nm-3400nm wavelength range, transmissivity>92%.The ultra-thin two-way dichroic mirror is under self weight state, in 243.15K-328.15K temperature range, maximum stress <10^6pa, maximum deformation <10^‑3 μm, under 3g acceleration impact, the order of magnitude of maximum stress and maximum deformation is still consistent with the aforementioned, without big change.The preparation method of the ultra-thin two-way dichroic mirror includes gluing, coating, stripping process.The ultra-thin two-way dichroic mirror removes base, realizes ultra-thin film spectrometer, to reduce wave aberration, improve imaging quality.

The application discloses a kind of small concave Offner spectral imaging systems based on active optics, design method and aberration correction method, belong to spectral imaging technical field.The system includes the concave spherical surface reflection main mirror of ball center coincidence, convex spherical surface grating and deformable concave spherical surface reflection three mirrors;Light beam is shot into by incidence slit, is reflected to grating spectroscopy by main mirror, then is imaged after being reflected by three mirrors.Design method adjusts curvature radius ratio and off-axis amount to make astigmatism meet requirements to determine initial structure, and surface shape coefficient is solved after optimization and surface shape is iteratively adjusted to within range.Aberration correction method is solved by constructing wave aberration matrix and driver response matrix to correct aberration.The application realizes the imaging of super-long slit large field of view at the same time, simple structure, easy to assemble and adjust, can realize the integration of large field of view general survey and local high-resolution detailed survey imaging.

The invention provides a lens wavefront detection method and detection device, and relates to the field of optical detection, and the lens wavefront detection method comprises the steps: carrying out the coherence reduction processing of test laser, and obtaining the shaped test laser; transmitting the shaped test laser along a first light path and converting the shaped test laser into a first polarization state; the test laser in the first polarization state is output to a test channel and is reflected back after passing through a to-be-tested objective lens group in the test channel; converting the polarization state of the reflected and returned test laser into a second polarization state; outputting the test laser in the second polarization state to the wavefront detection assembly along a second light path; and the wavefront detection assembly obtains the wave aberration of the objective lens group to be detected according to the received test laser. By reducing the coherence of the test laser, wavefront detection can be realized without using a high-coherence ultraviolet laser light source, dependence on expensive equipment such as a high-coherence laser and a precision interferometer assembly is avoided, the cost is remarkably reduced, and meanwhile, the requirement on environmental stability is reduced.

The invention discloses a collection system and overlay error measurement equipment, and the collection system comprises an objective lens which is used for obtaining marking light from an object plane and enabling the marking light to be imaged on an image plane, the object plane is used for placing a to-be-detected object, and the marking light is light diffracted after illumination light enters a mark of the to-be-detected object; the first phase modulation element is arranged on a pupil plane of a collection light path of the collection system and is provided with at least two first modulation pixels, and the first modulation pixels are used for modulating the phase of the marking light passing through the first modulation pixels; the driver is connected with the first phase modulation element and is used for respectively controlling the driving voltages of the at least two first modulation pixels; and the detection element is arranged on the image surface and is used for receiving the marking light. The collection system is applied to the overlay error measurement equipment, and can avoid the situation that the imaging quality is influenced by the wave aberration introduced by the equipment error, so that the influence of the wave aberration introduced by the equipment error on the measurement accuracy can be avoided.

The invention discloses an installation and adjustment method for a wide-spectrum wide-width hyperspectral camera system, and the method comprises the steps: building a unified installation and adjustment reference of a high-precision reference prism and a special image plane reference tool, employing a modularized and criterion installation and adjustment process, and sequentially completing the wave aberration optimization installation and adjustment of a main optical telescope and the concentric shaft centering installation and adjustment of a spectrometer. And field separator butt joint, spectrograph butt joint and detector butt joint are completed according to strict quantitative criteria. A scientific installation and adjustment process of reference establishment, module installation and adjustment and assembly butt joint is adopted, a strict quantitative criterion is introduced, and the whole process is driven by objective data, so that the problems of non-uniform reference, difficulty in focal plane positioning, low multi-assembly collaborative installation and adjustment precision and poor efficiency in a traditional method are solved; high-precision, high-efficiency and high-consistency installation and adjustment of the wide-spectrum wide-width hyperspectral camera system are achieved, and powerful technical support is provided for the hyperspectral camera system to stably and efficiently obtain high-quality and high-precision hyperspectral image data.

The invention discloses a focal plane image reconstruction method, device, equipment and medium capable of removing the influence of a collimator, and relates to the technical field of optical testing, and the method comprises the steps: collecting an actual measurement PSF focal plane image and an actual measurement PSF defocus image in a target imaging link, and determining the target relation between the wave aberration of the target imaging link and the PSF; determining a target low-order wave aberration in the target imaging link by using the actually measured PSF focal plane image, the actually measured PSF out-of-focus image and the target relationship; recovering the PSF focal plane image based on the target low-order wave aberration and a predetermined target high-order wave aberration of a target imaging link to obtain a corresponding recovery result, and comparing the recovery result with the actually measured PSF focal plane image to verify the target low-order wave aberration; if the target low-order wave aberration passes verification, PSF focal plane image reconstruction is carried out according to the target low-order wave aberration and the second high-order wave aberration, and a target PSF focal plane image with the influence of the collimator being removed is obtained.

The application discloses a collimation regulation system and method based on wave aberration optimization, relates to the technical field of collimation regulation, and obtains a thermal response time starting point by determining the phase offset trend of a thermal spot appearing instant and the relationship between thermal flow distribution and wavefront distortion; energy section regulation is implemented on a light beam irradiation area according to the time starting point, an intermittent energy release process is established by introducing thermal flow distribution results; on this basis, phase drift of a turning mirror reflection area is tracked, and the angle distribution order of an optical path is adjusted; a phase steady-state maintenance process is constructed in combination with the angle distribution order, the wavefront recovery duration is prolonged; collimation self-balancing regulation of the light beam is implemented in the thermal spot back-falling stage, and the convergence of the phase and the incident angle rhythm is realized. The application establishes a time directional collimation regulation mechanism with the wavefront change as the core, cooperates energy and phase control in the whole process of thermal spot formation and back-falling, suppresses phase mutation and optical axis drift, maintains wavefront continuity and energy center consistency, and realizes long-term stability of the collimation state.

The invention relates to the technical field of optics, and discloses an interference exposure light path wave aberration adjusting method and system so as to reduce diffraction light wave aberration of a prepared product. The method comprises the following steps: coarsely adjusting a light path to enable left-hand circular polarized light of a branch A and right-hand circular polarized light of a branch B to generate an interference pattern at a position C, and preparing a polarization grating D; an interferometer is used for testing + 1-order diffraction light wave aberration output by the linear polarized light vertical incidence polarization grating D and a corresponding interference pattern E; a white screen parallel to the polarization grating D is arranged in the transmission direction of the polarization grating D, and then an interference pattern F only generated by 0-level diffraction light of the branch A and + 1-level diffraction light of the branch B on the white screen is observed through a camera; adjusting a collimating lens in the branch A and / or the branch B to enable the image and wave aberration approximation degree of the interference pattern F and the interference pattern E to meet a preset consistent condition; the polarization grating D is moved out of the light path, and it is determined that the wave aberration of the branch A and the wave aberration of the branch B in the overlapping area are equal.

The application discloses a long working distance object side telecentric projection optical system, which sequentially comprises an object plane, a vacuum window glass, first to fourth lenses, an aperture diaphragm, fifth to sixth lenses, an interference filter, a beam splitting prism and an image plane along the optical axis direction of the object plane; the rear focal point of the combined system of the vacuum window glass and the first to fourth lenses is located at the center point position of the aperture diaphragm, thereby forming an object side telecentric optical structure; and the axial distance between the vertex of the front surface of the first lens and the object plane is 640 mm, that is, the object side working distance is 640 mm. The application can effectively correct wave aberration, distortion and other aberrations, and realizes good imaging quality. The long working distance object side telecentric projection optical system of the application fully meets the technical requirements of measuring the position, shape, speed and other parameters of liquid drops in a vacuum chamber.

This invention belongs to the field of optical device technology and discloses a multi-degree-of-freedom coordinated adjustment method for a non-coaxial optical system. The method includes: installing a non-coaxial optical system and defining all N independently controlled mechanical adjustment degrees of freedom; performing degree-of-freedom perturbation calibration by applying a unit displacement to each degree of freedom, measuring the pupil wavefront and analyzing it to obtain a sensitivity model library; measuring the on-axis field-of-view wavefront of the current state of the non-coaxial optical system and identifying the dominant aberration type through aberration analysis; calculating the total sensitivity of each adjustment degree of freedom to the dominant aberration based on optical design simulation; sorting the total sensitivity in descending order according to the absolute value of the total sensitivity and selecting a subset of key degrees of freedom; if the root mean square value of the on-axis field-of-view aberration is greater than a preset threshold, then adjusting the key degree-of-freedom subset; otherwise, coordinating the adjustment of the key degree-of-freedom subset. This invention significantly improves assembly and adjustment efficiency, first-time success rate, and final image quality.

The invention relates to a wave aberration detection method and a wave aberration detection device. The wave aberration detection method comprises the steps that light output by a light source passes through a hole array plate and a lens to be detected and then irradiates a wavefront detection module, and multiple pieces of interference information are generated; according to the multiple pieces of interference information, wave aberration information of the to-be-detected lens is obtained through analysis; wherein the hole array plate is provided with a plurality of light-transmitting holes, and the plurality of pieces of interference information are in one-to-one correspondence with the plurality of light-transmitting holes. The wave aberration detection method provided by the invention is suitable for detecting the wave aberration of the to-be-detected lens in an incoherent light source scene.

The application belongs to the technical field of optical devices, and discloses a multi-degree-of-freedom cooperative adjustment method of a non-coaxial optical system; the method comprises the following steps: installing the non-coaxial optical system and defining N mechanical adjustment degrees of freedom which are independently controlled; performing degree-of-freedom disturbance calibration by applying a unit displacement to each degree of freedom, measuring a pupil wavefront, and obtaining a sensitivity model library through analysis; measuring an on-axis field wavefront of the current state of the non-coaxial optical system, identifying a dominant aberration type through aberration analysis; calculating the total sensitivity of each adjustment degree of freedom to the dominant aberration based on optical design simulation; sorting the absolute values of the total sensitivity in descending order, and screening a key degree-of-freedom subset; if the root mean square value of the on-axis field wave aberration is greater than a preset threshold, performing degree-of-freedom adjustment on the key degree-of-freedom subset; otherwise, performing cooperative adjustment of the degrees of freedom of the key degree-of-freedom subset; and the application significantly improves the adjustment efficiency, the first success rate and the final image quality.

The invention relates to a wave aberration detection device, which comprises a light source, a hole array plate and a wavefront detection module, and is characterized in that the light source is used for outputting incoherent light; the hole array plate is arranged between the light source and the to-be-detected lens, and the hole array plate is provided with a plurality of light holes; the wavefront detection module is used for detecting wave aberration information of the lens to be detected; light output by the light source can be received by the wavefront detection module after passing through the light hole and the lens to be detected, and interference information is generated. The wave aberration detection device provided by the invention is suitable for detecting the wave aberration of the to-be-detected lens in an incoherent light source scene.

The invention provides a method and system for estimating aerodynamic optical jitter based on a high-order wavefront modality, and the method comprises the steps: building a computational fluid dynamics model according to a flight platform and an optical system three-dimensional structure, carrying out the fluid dynamics simulation through the model, obtaining the fluid density field distribution on a light beam propagation path, and obtaining the aerodynamic optical jitter. Then converting the density field distribution into refractive index field distribution; according to the refractive index field distribution, based on a ray tracing principle, obtaining accumulated introduced wave aberration when the light beam passes through the flow field along a path; expanding the wave aberration on a unit circle to form a standard Zernike polynomial; and according to the standard Zernike polynomial basis function, constructing aerodynamic optical jitter estimation by adopting a minimum mean square error. According to the method, the aero-optical jitter can be estimated through high-order data linear calculation of the Zernike polynomial expanded by the wave aberration, the method does not depend on the intensity of external interference, and the defect that direct test measurement cannot be performed is overcome.

The application provides a precise assembling and adjusting method of a finite conjugate off-axis four-mirror optical system, which is suitable for solving the problems of the existing off-axis multi-mirror optical system assembling and adjusting method, such as difficult control of high-precision relative positions of multiple mirrors, easy generation of large aberration, and difficult calibration and correction of conjugate image points. The method first completes the assembling of the reference mirror of the off-axis multi-mirror optical system by the multi-sensing cooperative measurement and CGH common reference interference control of M2 and M4 mirrors, combines the measurement target ball to position and mark the coordinate position points of the optical system image points, uses the PSM to calibrate the ball center image position and record, and completes the precise positioning of the spherical mirror. According to the real-time detection of the wave aberration, the M3 mirror position is adjusted until the optical indicators completely meet the requirements, and the precise assembling and adjusting of the finite conjugate off-axis four-mirror optical system is completed. The method realizes the high-precision cooperative assembling and adjusting of the off-axis multi-mirror system, reduces the difficulty of assembling and integrating, and significantly improves the assembling and adjusting efficiency and the image quality control ability.

The invention provides an optical system wavefront aberration measuring and adjusting method according to an inverse Hartmann wavefront detection principle. According to the method, a wave aberration detection system is formed by a measurement camera and a display, a sixteen-step phase shift fringe pattern is displayed on the display as a structured light source, the camera collects a deflection fringe pattern emitted by a to-be-detected optical system, phase information is obtained through solving based on sixteen-step phase shift and a three-frequency heterodyne algorithm, and the structured light source is obtained. The slope of the actual emergent light of the optical system can be obtained by changing the posture of the display for multiple times and combining with a sight line calibration method, then the wavefront aberration is obtained, and in-situ adjustment is completed according to aberration expression. The device has the advantages of simple structure, low detection cost, high precision and high resolution.