4270 results about "Microscope objective" patented technology

A method and apparatus for three dimensional optical microscopy is disclosed which employs dual opposing objective lenses about a sample and extended incoherent illumination to provide enhanced depth or Z.Iadd.-.Iaddend.direction resolution. In a first embodiment, observed light from both objective lenses are brought into coincidence on an image detector and caused to interfere thereon by optical path length adjustment. In a second embodiment, illuminating light from an extended incoherent light source is detected to the sample through both objective lenses and caused to interfere with a section of the sample by adjusting optical path lengths. Observed light from one objective lens is then recorded. In a third embodiment, which combines the first two embodiments, illuminating light from an extended incoherent light source is directed to the sample through both objective lenses and caused to interfere within a section of the sample by adjusting optical path lengths. The observed light from both lenses is caused to interfere on the image detector by the same optical path length adjustment. .Iadd.In a fourth embodiment of the invention, further spatial structure is introduced into the illumination light. Computational processing is used to enhance lateral or XY resolution as well as depth or Z resolution..Iaddend.

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.

The invention relates to a superwide-angle lens optical system having a long back-focus lens arrangement and comprising a relay lens group. The optical system is constructed of, in order from an object side thereof, an objective lens group Ob having positive refracting power, a primary image-formation plane formed by the objective lens group Ob and a relay lens group R1 having positive refracting power. A field stop FS is positioned at or near the primary image-formation plane, and condition (1-1) is satisfied.

h/f_o>1.8  (1-1)

Here f_o is the focal length of the objective lens group Ob, and h is the diameter of an image circle on the primary image-formation plane.

A digital still camera includes an image pickup device positioned on a lens optical axis. A camera body has a substantially tubular shape, contains the image pickup device, and has a peripheral surface disposed to surround the lens optical axis. A flexible display unit of an organic ELD has a sheet form, is changeable between a widely spread state and a protecting state for protection, and displays an image when widely spread. The display unit is bent on and about the peripheral surface when in the protecting state. Furthermore, a light entrance opening is formed in the camera body. A photographing optical system includes an objective optical element, namely an achromatic prism, positioned inside the light entrance opening. The display unit is opposed to a front side of the light entrance opening when in the protecting state.

The invention belongs to the precise instrument manufacturing and detecting technology, especially relates to the bidimensional photoelectric self-alignment equipment and method based on dynamic differentiation compensation method. The equipment comprises the light source, the calibrated board, the CCD image sensor, the beam splitter prism, the aligning object lens, the measuring reflecting lens and the beam splitter between the aligning object lens and the reflecting lens. The two faces of the beam splitter are separately plated with the splitting film and the reflection reducing coating; the surface coarseness of the photic base plate is more than 0.08 um, and paralleling degree of the two faces is smaller than 10'; the light splitting ratio is 52/48 is less than or equal to T/R is less than or equal to 72/28 and the reflection reducing coefficient alpha is greater than or equal to 99%. The invention improves the stability and the repetition of the measuring.

The invention discloses a near-infrared laser scanning confocal imaging system, which comprises a light path scanning unit and a control unit which adopt a confocal structure, wherein the light path scanning unit comprises a near-infrared laser source, a collimation and extension module, a laser optical filter, a dichroic reflector, a scanning galvanometer, an f-theta lens, a tube lens, an imaging objective lens, a fluorescent optical filter, a convergent lens, a pinhole, a detector and the like, the control unit comprises a motion control module used for controlling the scanning galvanometer, a data acquisition module used for acquiring an output signal of the detector, a data processing module connected with the motion control module and the data acquisition module, and the like. The method matched with the system is characterized in that a sample is marked with near-infrared quantum dots with the fluorescence emission spectrums between 932nm and 1250nm, and then the sample is detected by the near-infrared laser scanning confocal imaging system. According to the system disclosed by the invention, deep-level imaging of samples such as biological tissues can be accurately and efficiently realized, and the system has a simple structure and is easy to operate.

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.

There is provided a projection objective for wavelengths of <=193 nm for imaging an object field in an object plane into an image field, in an image plane. The projection objective includes a first reflective optical element, a second reflective optical element, a third reflective optical element, a fourth reflective optical element, a fifth reflective optical element, and a sixth reflective optical element, and a refractive optical element. The reflective and refractive optical elements each have an off axis segment with a diameter. The projection objective has an image-side numerical aperture >=0.65, and the off axis segment of the refractive optical element has a diameter that is less than 1/3<rd >of the distance from the object plane to the image plane.