2results about How to "Reduce imaging errors" patented technology

The invention provides a photoetching proximity effect correction method and system based on a curve mask, and relates to the technical field of semiconductor manufacturing, and the method comprises the steps: building curvilinear representation of a mask pattern based on to-be-processed layout data, and obtaining a curve boundary and a curve control quantity set thereof; determining a process condition set comprising a plurality of working conditions; aiming at each working condition, calculating an imaging error corresponding to the curve boundary based on a photoetching process model to obtain an error index of each working condition; updating information of the curve control quantity set is generated according to the error index and is iteratively updated, and adaptive adjustment is executed on iteration updating according to the difference between the updating information of different working conditions; and generating a corrected curve mask pattern according to the updated curve control quantity set, and outputting corrected mask data, so that the convergence stability of correction under multiple working conditions and the adaptability to a whole process window are improved.

The application discloses a multi-condition compensator parameter calculation method, system, medium and program product. Mainly related to the field of lithography technology, by reconstructing the discrete measurement data, it can meet the stability needs of the compensator transmittance solution, and ensure the comparability of the light intensity after mapping to the unified grid under the multi-condition condition. Then the compensating transmittance distribution considering all conditions is calculated according to the transmittance distribution under the multi-condition. Different from the traditional single-condition compensation design, the application regards multiple conditions as coupling constraints, so that the designed compensator can maintain high uniformity improvement effect under different conditions. Further, the application also proposes to use a clamping tool assembly with elastic positioning blocks, which can effectively reduce the imaging error caused by assembly stress and temperature change, and the stress interference caused by different working conditions, and maintain the geometric stability of the compensator in the optical system.