4results about How to "Reduce imaging errors" patented technology

The invention discloses a multi-view MIMO radar correlated imaging radiation field design method based on image entropy, which considers the fluctuation of the scattering intensity of each resolution unit of a target in an imaging scene under a multi-view condition, carries out statistical modeling on the scattering intensity of each resolution unit of the target, and starts from the whole process of transmitting, receiving and processing a signal. By constraining the condition number of a radiation field Gram matrix and the image entropy of imaging and through continuous iterative optimization, an array type of an MIMO radar transmitting waveform and a transmitting array which have a good suppression effect on target grid energy dissipation and are stable in imaging is found, and the correlation between a radiation field reference matrix and signal echoes is improved. According to the method, radar correlated imaging can be carried out on the target with fluctuating scattering intensity of each resolution unit by using the optimized emission signal waveform and the array of the emission array, the randomness of a radiation field is enhanced, the energy dissipation degree of a target grid is reduced, the imaging error is reduced, and a better radar imaging result can be obtained.

The invention discloses equipment for analyzing different vertical bone surface type lower jawbone body morphologies based on cone beam CT data and application, and relates to the technical field of stomatology. The image preprocessing module is connected with the image acquisition module and used for processing the original data to reduce image artifacts, and the image preprocessing module adopts a metal artifact correction algorithm based on projection data preprocessing and a motion artifact correction algorithm based on image registration; the image reconstruction module is connected with the image preprocessing module and used for reconstructing the processed image data into a three-dimensional image; a data analysis module; a display and interaction module; in the CBCT-based analysis technology image preprocessing stage, a motion artifact correction algorithm accurately distinguishes physiological motion from abnormal motion by means of a high-precision real-time motion monitoring device, preprocessing efficiency and quality are improved, and image errors are reduced.

The invention provides a photoetching proximity effect correction method and system based on a curve mask, and relates to the technical field of semiconductor manufacturing, and the method comprises the steps: building curvilinear representation of a mask pattern based on to-be-processed layout data, and obtaining a curve boundary and a curve control quantity set thereof; determining a process condition set comprising a plurality of working conditions; aiming at each working condition, calculating an imaging error corresponding to the curve boundary based on a photoetching process model to obtain an error index of each working condition; updating information of the curve control quantity set is generated according to the error index and is iteratively updated, and adaptive adjustment is executed on iteration updating according to the difference between the updating information of different working conditions; and generating a corrected curve mask pattern according to the updated curve control quantity set, and outputting corrected mask data, so that the convergence stability of correction under multiple working conditions and the adaptability to a whole process window are improved.

The application discloses a multi-condition compensator parameter calculation method, system, medium and program product. Mainly related to the field of lithography technology, by reconstructing the discrete measurement data, it can meet the stability needs of the compensator transmittance solution, and ensure the comparability of the light intensity after mapping to the unified grid under the multi-condition condition. Then the compensating transmittance distribution considering all conditions is calculated according to the transmittance distribution under the multi-condition. Different from the traditional single-condition compensation design, the application regards multiple conditions as coupling constraints, so that the designed compensator can maintain high uniformity improvement effect under different conditions. Further, the application also proposes to use a clamping tool assembly with elastic positioning blocks, which can effectively reduce the imaging error caused by assembly stress and temperature change, and the stress interference caused by different working conditions, and maintain the geometric stability of the compensator in the optical system.