9 results about "Field point" patented technology

The application relates to a kind of asteroid surface escape velocity calculation method considering rotation and terrain influence, comprising: obtaining the three-dimensional shape model of target asteroid and carrying out discrete, reading the vertex set and triangular facet set of polyhedron, carrying out gravity field modeling, establishing standard polyhedral gravity model;Define the logarithmic kernel function of each edge of each triangular facet, to determine the gravitational potential of target asteroid on any field point;Establish star-fixed coordinate system in standard polyhedral gravity model, determine the rotation speed of any point on the surface of target asteroid, thereby define the effective potential upper bound and the inertial system speed of the release instant of the particle on the surface of target asteroid;Based on the minimum escape condition that the kinetic energy of the particle on the surface of target asteroid is equal to the corresponding effective potential upper bound, determine the minimum normal escape velocity of the particle. Compared with the prior art, the application can quickly obtain accurate minimum escape velocity and corresponding escape direction at any surface point.

The invention relates to a method and a device for determining wavefront aberrations caused by an optical system. Within the scope of a method according to the invention, in the optical system, an object field that is illuminated by way of an illumination system and situated in an object plane is imaged into an image field that is situated in an image plane by use of a projection lens, wherein, for at least one field point in the image plane, a plurality of measurements of the respective wavefront aberration generated at this field point are taken, with these measurements differing from one another in terms of the respective effective exit pupil of the beam path.

A wafer inspection tool including: an illumination system providing ultraviolet illumination light with wavelengths 2 below 300 nm and configured to direct light towards an object to be inspected; a detector array having a pixel pitch; one or more anti-aliasing (AA) elements; an objective having a numerical aperture (NA) and configured to collect light provided by the illumination system and returning from a plurality of field points on the object and to onwardly transmit a light beam formed from the returning light which has been collected towards the detector array via the one or more AA elements; a processor configured to: receive imaging requirements; control a NA of the objective; control, when the pixel pitch is larger than λ / (4*NA), position of the one or more anti-aliasing elements, based on the pixel pitch, the NA, and the imaging requirements.

The application discloses a kind of mobile light well point precipitation systems in the field of building construction technology, including water collecting component, sedimentation component, partition component, sludge discharge component;Water collecting component includes several well point precipitation pipes distributed around foundation pit, water collecting main pipe connected with each well point precipitation pipe, water collecting pump for pumping water connected with water collecting main pipe.The present application is set by mobile sedimentation tank, when facing multiple foundation pit dewatering or long-distance dewatering, the position of sedimentation tank can be flexibly adjusted according to the needs of field point, all can be delivered to sedimentation tank through drainage belt, convenient management, can be reused, the operation cost is lower, and the closed sedimentation tank blocks sludge from mixing with clean water again through partition component when scraping mud and moving, sludge is not easy to flow out with clean water, there is no risk of personnel falling, and the environmental protection and safety performance are improved.

The application discloses a robot welding track control method and system based on three-dimensional visual identification, which is applied to automatic welding production of automobile key parts. The method adopts a double-view field hierarchical acquisition architecture, first completes workpiece global registration through a first view field point cloud, solves pose deviation and corrects a global welding path to obtain a coarse positioning track; in a welding process, a second view field with higher resolution is used to collect weld seam point clouds in front of a welding gun in real time, instantaneous shape features of the weld seam are extracted, a target welding posture is matched with process parameters, a track correction amount is solved and a dynamic welding track is generated and executed synchronously. The application can improve welding track control precision and weld seam forming consistency, and adapt to strict requirements of automobile key part mass production welding.

The application discloses a far-field wavelet acquisition method and device, electronic equipment and a storage medium, and relates to the field of geophysical exploration. The method comprises the following steps: acquiring corresponding frequency domain detection data according to near-field detection data of a near-field detector; acquiring an imaginary wavelet of each frequency sampling point according to distances between a sub-source and each near-field detector, distances between a virtual source and each near-field detector, and the frequency domain detection data of the near-field detector; and acquiring a far-field wavelet of a target far-field point at each frequency sampling point according to distances between the sub-source and the target far-field point, distances between the virtual source and the target far-field point, and the imaginary wavelet of each frequency sampling point. The technical scheme of the embodiment of the application not only realizes the calculation and acquisition of the far-field wavelet, improves the accuracy of the calculation result, but also reduces the time consumption of the calculation of the far-field wavelet and improves the calculation efficiency of the far-field wavelet.

The application discloses a kind of angle-distance joint parameter estimation methods based on new system radar, comprising: after receiving echo signal, echo signal is sequentially down-converted, digitally mixed and matched filtering, and output signal vector is obtained;And beam weight vector, angle difference beam weight vector and distance difference beam weight vector are calculated, and the element data in output signal vector is weighted respectively, and sum-difference beam is obtained;Based on sum-difference beam, angle dimension single-pulse ratio curve and distance dimension single-pulse ratio curve are generated respectively;According to output signal vector, and beam weight vector and angle difference beam weight vector \ distance difference beam weight vector, angle dimension sum-difference ratio \ distance dimension sum-difference ratio is calculated;The angle of far-field point target is estimated from angle dimension single-pulse ratio curve, and the distance of far-field point target is estimated from distance dimension single-pulse ratio curve.The application not only can improve the accuracy of target positioning, but also can realize the measurement of target distance, and it is also easier to realize in engineering.

The invention relates to a method and a device for determining wavefront aberrations caused by an optical system. In a method according to the invention, an object field (101) located in an object plane and illuminated by an illumination system is projected by a projection lens (100) onto an image field (105) located in an image plane, wherein for at least one field point in the image plane, a plurality of measurements of the wavefront aberration generated at that field point are carried out, these measurements differing from one another with respect to the respective effective exit pupil of the beam path.

The invention relates to a method and a device for determining wavefront aberrations caused by an optical system. In a method according to the invention, an object field (101) located in an object plane and illuminated by an illumination system is projected by a projection lens (100) onto an image field (105) located in an image plane, wherein for at least one field point in the image plane, a plurality of measurements of the wavefront aberration generated at that field point are carried out, these measurements differing from one another with respect to the respective effective exit pupil of the beam path.