The invention relates to a seamless splicing
grating, in particular to a method for manufacturing a seamless splicing
grating based on a dynamic straight-edge diaphragm, which comprises the following steps of: aligning the edge of the dynamic straight-edge diaphragm with a splicing seam position mark on one side of a substrate, performing
simple harmonic motion on the dynamic straight-edge diaphragm along the direction vertical to the splicing seam, realizing dynamic scanning and completing first interference
exposure; the edge of the dynamic straight-edge diaphragm is aligned with the abutted seam position mark on the other side of the substrate, stripe locking is carried out by utilizing the
grating latent image reserved by the first
exposure, so that the dynamic straight-edge diaphragm carries out
simple harmonic motion in the direction perpendicular to the abutted seam, dynamic scanning is realized, and second interference
exposure is completed; carrying out unified development on the exposed substrate to obtain a
photoresist grating
mask without splicing seams, and transferring a grating structure on the
mask to a
dielectric substrate; according to the technical scheme, the defects that in the prior art, due to abutted seam modulation, the
laser damage resistance is poor, and the
machining difficulty is large can be effectively overcome.