138 results about "Continuous exposure" patented technology

For the high spatial resolution imaging of a structure of interest in a specimen, a substance is selected from a group of substances which have a fluorescent first state and a nonfluorescent second state; which can be converted fractionally from their first state into their second state by light which excites them into fluorescence, and which return from their second state into their first state; the specimen's structure of interest is imaged onto a sensor array, a spatial resolution limit of the imaging being greater (i.e. worse) than an average spacing between closest neighboring molecules of the substance in the specimen; the specimen is exposed to light in a region which has dimensions larger than the spatial resolution limit, fractions of the substance alternately being excited by the light to emit fluorescent light and converted into their second state, and at least 10% of the molecules of the substance that are respectively in the first state lying at a distance from their closest neighboring molecules in the first state which is greater than the spatial resolution limit; and the fluorescent light, which is spontaneously emitted by the substance from the region, is registered in a plurality of images recorded by the sensor array during continued exposure of the specimen to the light.

An image processing apparatus includes: a shaking estimating unit configured to estimate the shaking information of an image generated within a predetermined period of time; a short-time-exposure shaking correcting unit configured to correct the shaking of a plurality of short-time-exposure images generated due to intermittent exposure within the predetermined period of time based on the estimated shaking information; a long-time-exposure shaking correcting unit configured to correct the shaking of a long-time-exposure image generated due to consecutive exposure within the predetermined period of time based on the estimated shaking information; and an image synthesizing unit configured to synthesize the corrected short-time-exposure images and the corrected long-time-exposure image.

The invention discloses a full-automatic scanning system and a method for a microscopic section. The system comprises an object stage, a lighting device, an object lens, a Z-axis controller, a scanning camera and a computing device, the scanning camera is provided with a rolling shutter exposure mode and a banded array or banded subarray reading mode, the scanning camera performs a continuous digital imaging scanning for a banded partial area of a section sample which moves at a constant speed along a shutter rolling direction of the scanning camera, under the rolling shutter exposure mode, the scanning camera can perform a parallel exposure for next frame of image before the exposure of a former frame of image is finished, and the computing device can splice each frame of image which is subjected to continuous exposure to form a complete digital section. By means of the technical scheme, the uniform motion speed of the section sample can be improved, simultaneously the motion blurring caused by sample motion during exposure of the scanning camera can be reduced, the image acquisition speed is improved, and the image acquired by the scanning camera is clear and stable.

A method of simultaneously defining a waveguide and grating in a sample of photosensitive material comprises providing a sample of material (24) having a region which is photosensitive to light of a specific wavelength, generating a spot of light (22) at the specific wavelength, the spot having a periodic intensity pattern of high and low intensity fringes, and a width which is related to the width of the channel, positioning the spot within the photosensitive region and causing relative movement between the sample and the light spot along the desired path of the waveguide/grating define a channel of altered refractive index by exposing parts of the photosensitive region to the light spot. Modulation of the light spot to produce multiple exposures produces a grating, while continuous exposure results in a uniform waveguide. These structures can be written in straight lines or around curves, and can be accurately overwritten, so that complex optical devices can be produced in a single fabrication step.

Disclosed herein are degradable sachets useful for enclosing a consumer product, such as, for example, shampoo, conditioner, soap, toothpaste, bar soap, and detergent. The sachets of the invention have a moisture vapor transmission rate (MVTR) of less than about ten grams per square meter per day (g/m²/day) at 37° C. and 90% relative humidity (RH), and can disintegrate into pieces sufficiently small to pass through a one millimeter sieve, within two years after first and continuous exposure to water and microorganisms.

The invention relates to a method and a device for creating pictures and more particularly a method for creating an enhanced picture by means of several consecutive exposures. The exposures are combined to create pictures with enhanced properties, especially better color and light content. Sufficient light is obtained by performing a series of first exposures together with one second exposure in rapid succession. The first exposures are combined to provide sufficient luminance and sharpness. The second exposure is made to collect color information. The first exposures are combined with the second exposure to provide an enhanced picture.

The synchronous bus controller adopts internal self-defined sync bus, outer sync signal, and minimum time unit data transmitting period of sync bus as the sync time base, produces precise time control point with data transmission period FIFO queue and 'time-command' FIFO queue, to realize the strict sync course of the submodules in stepped scan projecting photoetching machine. The sync control system includes upper computer, industrial control computer CPU board, motion control card, laser counter card, alignment control system and lighting control system. The sync bus controller sends real-time sync information to the motion control card and sends sync triggering signal to the alignment control system and the lighting control system via the sync bus to ensure the complete sync among the workpiece table, the mask table, the exposure dosage and slit motion in continuous exposure and scanning control.

The invention discloses a multi-stage exchange system and a multi-stage exchange method for a multi-station silicon wafer stage. The multi-stage exchange system comprises a measurement station, an exposure station and a process treatment station, wherein the process treatment station, the measurement station and the exposure station are all positioned in an air floatation plane or a magnetic suspension plane on the upper surface of a base stage; and a wafer carrying stage is arranged on the upper surface of the base stage through an air floatation bearing or magnetic suspension, carries a silicon wafer and is driven by a linear motor or a planar motor to finish exchange of all stations. By adding the process treatment station, the process treatment of two adjacent exposure procedures can be realized in a photo-etching machine, and an exposure procedure and a process treatment procedure can be concurrently finished in the same photo-etching machine, so continuous exposure is realized in the same photo-etching machine, and requirements for improving productivity and accuracy and reducing cost and using area in a dual-exposure technology or even a multi-exposure technology are met.

An imaging device from which charge signals accumulated in a light receiving part having a pixel array divided into a plurality of fields can be read out is used. In a predetermined image capturing mode such as a MOVE mode, high-speed continuous-exposure mode or live view mode, a captured image is generated only by using charge signals read out from at least one field having a relatively small number of defective pixels.

This invention provides synchronization control means of steps caned projection mask aligner, it based on negotiation mechanism and alignment mechanism, the negotiation mechanism obtained required parameters of next scanning in forthright scanning execute phase; the alignment mechanism put the required parameters of next scanning which obtained by negotiating into sweeping column of subschema, in security for extend multiple sweeping, by organic combining of these two mechanism, thereby it achieves synchronization control of successive exposure sweeping of mask aligner system. This invention also offers synchronization control system of steps caned projection mask aligner to carry out above-mentioned means, the system includes rocator and several subsystem, synchronous control card sends synchronizing information to work head control card and mask motion control card real time through internal bus, in the mean time, it sends synchronous triggering order to dose control card of lighting control unit and slit motion control card, which guarantees work head, mask, exposure dosage and slit motion in the control of successive exposure synchronize completely.

The present invention aims to provide a solar cell in which a decrease in photoelectric conversion efficiency due to continuous exposure to light (photodegradation) is reduced, and a method of producing the solar cell. The present invention relates to a solar cell, including: an electrode; a counter electrode; and a photoelectric conversion layer between the electrode and the counter electrode, the photoelectric conversion layer containing an organic-inorganic perovskite compound represented by the formula R-M-X₃ where R is an organic molecule, M is a metal atom, and X is a halogen atom or a chalcogen atom, the solar cell satisfying the formula (1):

N(T, I)/N(0, I)<5   (1)

where N(0, I) is a carrier density of the organic-inorganic perovskite compound immediately after start of exposure of the solar cell to light at an intensity of I mW/cm², and N(T, I) is the carrier density of the organic-inorganic perovskite compound after continuous exposure of the solar cell to light at an intensity of I mW/cm² for T hour/hours.

The invention claims a direct image exposure device, characterized in that an exposure head assembly (1) has several exposure heads (10, 11, 12, 13) arranged parallel in a space W at a sub-scan direction Y; an exposure table (5) may move along the sub-scan direction Y under the exposure head assembly 1, may remove a printed circuit board (90) on the exposure table (5) under the exposure heads (10, 11, 12, 13), and may continuously expose the printed circuit board (90) by the exposure heads (10, 11, 12, 13); the exposure heads (10, 11, 12, 13) are provided with an array of LED (20) linearly arranged with the same space P; the LED (20) is arranged with space d at a main scan direction X among the exposure heads (10, 11, 12, 13), by which a same position of the sub-scan direction Y is repeatedly exposed, thereby implementing exposure of high position precision.

The present invention provides a process for producing an optical waveguide, comprising the steps of: continuously applying a fluorene derivative layer onto a continuous substrate and curing the layer to thereby form a lower cladding layer; continuously applying a photosensitive fluorene derivative layer onto the lower cladding layer; continuously exposing the applied photosensitive fluorene derivative layer to a light through a photomask having a predetermined pattern; continuously subjecting the exposed photosensitive fluorene derivative layer to post-exposure heating; continuously developing the heated photosensitive fluorene derivative layer to remove the unexposed areas therein, thereby forming into the predetermined pattern; curing the developed photosensitive fluorene derivative layer to thereby form a core layer having the predetermined pattern on the lower cladding layer; and continuously applying a fluorene derivative layer over the lower cladding layer so as to cover the core layer and curing the fluorene derivative layer to thereby form an upper cladding layer.

Greening and decay of potato tubers is inhibited for five or more days of continuous exposure to light, after a treatment mixture comprising effective amounts of natural or ozonated water, food-grade citric acid, food-grade polar lipid or phospholipid emulsifier and food-grade salt has been infused in the potatoes by cyclically dipping and withdrawing the potatoes in a vacuum environment of about 84-90 Kpa less than atmospheric pressure for a time period of about 2-8 minutes.