40 results about "Continuous exposure" patented technology

The invention relates to the technical field of digital photoetching equipment, in particular to an LDI machine image segmentation and exposure splicing method, which comprises the following steps: carrying out primary segmentation on an original complex graph, and carrying out segmentation again after refinement processing; in the exposure process, periodically collecting a gray histogram of an exposure pattern, aligning the exposure images of adjacent areas to form a continuous exposure image, and dynamically adjusting exposure parameters by a light beam modulator according to the characteristics of each second segmentation area to realize closed-loop control on the exposure quality; all exposed images are spliced through a search algorithm and a multi-frame fusion technology, smooth transition of image edges is realized, discontinuity of local features is effectively avoided, the overall consistency and integrity of the spliced images are ensured, the imaging quality and precision are further improved, finally, the spliced images are verified, and the image quality is improved. And seamless splicing of each segmented region is ensured, so that high-quality graphic output is generated.

The invention belongs to the technical field of intelligent fragrance control, and discloses an intelligent fragrance control system and method based on olfaction perception self-adaption, multi-dimensional data such as exhaled gas fragrance residue and skin electroreaction are captured in real time through a multi-mode olfaction fatigue monitoring unit, and 1-5 olfaction fatigue levels are accurately judged in combination with an LSTM-attention model; and then the dynamic release control unit is matched with a layering strategy, for example, short-time pulse stimulation is started in light fatigue, fragrant cross-modulation switching and concentration zeroing are triggered in heavy fatigue, and local high-concentration pseudo fatigue is avoided synchronously through a distributed space probe. By means of the design, fragrance release is always matched with the real-time olfaction state of a user, the problem that the fragrance cannot be effectively perceived after continuous exposure is thoroughly solved, it is ensured that the user can stably perceive the fragrance in different use periods, and the use experience is remarkably improved; and a complete logic chain with multi-mode monitoring, double-target sensing and cooperative control is constructed.

The invention relates to the technical field of optical waveguide preparation, and discloses an optical waveguide mother set splicing-free preparation method based on a DMD dynamic mask, and the method comprises the steps: obtaining the layout data of an optical waveguide mother set as initial design information, and generating a mask pattern sequence which comprises a plurality of partition mask patterns; establishing a pixel mapping relationship between the on-off state of the micro-mirror unit and the partition mask pattern; driving the transparent substrate to execute partition positioning movement on the platform, and controlling the current exposure area of the photosensitive material layer to be aligned with the projection area of the partition mask pattern; on the basis of the pixel mapping relation and the partition positioning movement result, activating the mask pattern, and carrying out non-interval continuous exposure to form a full-page latent image pattern; the whole latent image pattern is subjected to developing treatment, the embossment structure of the optical waveguide master mask is treated and transferred into the transparent substrate, a waveguide core layer pattern is formed, the effects of non-interval continuous exposure and no segmented splicing are achieved, the preparation period of the surface embossment optical waveguide master mask is shortened, and the processing efficiency and the batch preparation yield are improved.

The invention discloses an exposure method and exposure equipment, and relates to the technical field of semiconductors, the exposure method comprises the following steps: arranging photomasks on two sides of a base material, and attaching the photomasks on two sides to the base material to form a closed area; the closed area is vacuumized, so that the vacuum degree meets the requirement of exposure treatment; performing trial exposure on the base material to obtain a trial exposure pattern; detecting position deviation data of the trial exposure pattern, and calculating an adjustment parameter B and an adjustment parameter F of the base material; adjusting the base material according to the adjusting parameters, and continuously exposing the base material; the exposure method is executed through exposure equipment, the exposure equipment comprises a feeding device used for conveying a base material, the feeding device adjusts the balance of the base material in the width direction through a balance mechanism, the adjustment parameter B is a balance motor value of the balance mechanism, and the adjustment parameter F is a tension value applied to the base material by the feeding device. According to the exposure method provided by the invention, the quality and the yield of the FMM finished product are improved.

A radiation detector that suppress a double count which occurs by detecting a single pulse duplicately with a plurality of counters in counter switching, and can acquire highly accurate data, is configured to detect radiation in continuous exposure, comprises a sensor for generating a pulse when a particle of radiation is detected, a plurality of counters provided for counting the pulses, a setting holding circuit for holding a setting of an off-time for turning off any of the plurality of counters, and a control circuit for switching the counter performing counting the pulses after a lapse of the off-time with respect to a trigger signal.

The present disclosure provides a video generation method, device, system, electronic device, and readable storage medium. The method includes: obtaining a first short-exposure image frame, a long-exposure image frame, and a second short-exposure image frame captured in sequence by an image capture device, wherein the first short-exposure image frame and the second short-exposure image frame are short-exposure image frames obtained in a first coded exposure mode, and the long-exposure image frame is a single-frame coded long-exposure image frame obtained by superimposing a plurality of image frames obtained by continuous exposure in a second coded exposure mode different from the first coded exposure mode; reconstructing the long-exposure image frame to obtain a plurality of pre-reconstruction frames; for each pre-reconstruction frame in the plurality of pre-reconstruction frames, fusing the first short-exposure image frame, the second short-exposure image frame, and each pre-reconstruction frame to generate a reconstruction frame; and generating a reconstruction video based on a plurality of reconstruction frames corresponding to the plurality of pre-reconstruction frames.

A new (lithographic) method of forming a feature on a substrate (e.g. a wafer) comprises performing a plurality of sequential exposures, each of the plurality of exposures comprising forming an image of the feature in the vicinity of the substrate. A focal position of the image relative to the substrate is different for at least two of the plurality of exposures. There is a range of focal positions of the image relative to the substrate that is not used during any of the plurality of exposures and which lies between the focal positions of the image relative to the substrate for two of the plurality of exposures. The method according to the first aspect of the present disclosure is particularly advantageous for forming isolated features on a substrate such as isolated contacts and isolated spaces.

The utility model discloses a safety alarm equipment that sandstone aggregate mine is used belongs to mine aggregate sandstone mining technical field, and it is designed to solve the prior art whether equipment is in the running work mode, all directly with the outside environment contact, on one hand, the complex environment of outdoor existence fly rock impact, mechanical collision risk etc, extremely easy to cause the sensing component of detection device head, optical lens etc. Key structure damage, influence instrument normal operation, on the other hand, the continuous exposure makes the monitoring instrument surface extremely easy to stick a large amount of dust, gravel etc. Particle pollutants generated in the mine, not only will block the sampling channel of detection device, also can form dirt layer on the surface of sensing probe, interfere with the normal play of light scattering, charge induction etc. Detection principle in the dust concentration detection process, thereby can cause certain influence to the detection result problem. Including the outer shell, the upper side of outer shell is equipped with mounting mechanism.

The invention provides an exposure control method and device of a photoetching machine, equipment and a storage medium, and relates to the technical field of semiconductor manufacturing. The method comprises the following steps: before exposure is started, controlling a preheating device to heat a photomask of a photoetching machine, so that the photomask reaches a maximum deformation value after being heated; transferring the heated photomask into a photoetching machine, and exposing the test wafer by adopting the heated photomask according to preset exposure parameters; obtaining a pattern size deviation between an exposure pattern on the test wafer and a preset pattern of the photomask; adjusting a preset exposure parameter according to the pattern size deviation; and in the exposure process, exposing the wafer to be processed by adopting the heated photomask according to the adjusted exposure parameters. The invention ensures that the dimensional deviation between the wafer exposure pattern and the photomask preset pattern is stable and controllable, improves the process stability, and does not need to pause to wait for the photomask to cool in continuous exposure, thereby shortening the exposure time of each wafer and improving the productivity of a photoetching machine.

The application discloses an image continuous exposure printing method, device, equipment and storage medium, and relates to the field of inkjet printing technology. The method obtains a reduced image and an expanded image according to a to-be-printed original image; obtains a decimal pixel value of the original image, and determines a printing order of the reduced image and the expanded image according to the decimal pixel value; and finally, inkjet printing is performed on the reduced image and the expanded image according to the printing order. The pixel size of the reduced image and the expanded image is an integer pixel, and the pixel size is reduced or increased relative to the pixel size of the original image. The reduced image and the expanded image are spliced and combined for printing according to the printing order, so that the image size error caused by continuous exposure printing of multiple original images can be eliminated, and the continuous exposure printing quality is improved.

A system for determining soil attributes includes a fluid intake mounted on a moving implement and configured for continuous exposure to soil fluids in soil during movement of the moving implement; a fluid sensor in fluid communication with the fluid intake and operable for measuring fluid concentration levels in the soil fluids during movement of the fluid intake with the moving implement; a GPS unit operable to identify a position of the fluid intake corresponding to the measured fluid concentration during movement of the moving implement and while the fluid sensor receives soil fluids from the fluid intake and measures fluid concentration levels; and a controller in communication with the fluid sensor and the GPS unit and configured to map each measured fluid concentration level relative to the corresponding fluid intake position. Associated methods are also described.

The invention provides a turbulence degradation image synthesis method based on continuous exposure time. Turbulence degradation is decomposed into two types of mutually independent physical processes of distortion and blurring. Aiming at the exposure dependence of turbulence blur, an exposure time modulation transfer function is used, and a pure blur point spread function is constructed through inverse Fourier transform, so that continuous transition of blur degradation in an interval from short exposure to long exposure is realized. Meanwhile, the fuzzy width distribution conforming to the statistical law is generated through the spatial random field, so that the generated fuzzy has the characteristic of spatial non-uniformity and is closer to the real turbulence imaging process. The fuzzy model is combined with an independently constructed geometric distortion field, so that turbulence images or videos which show physical consistency and diversity under different exposure conditions can be generated. According to the invention, the turbulence degradation difference caused by exposure time change in a real scene can be effectively simulated, and a reliable high-fidelity data source is provided for a turbulence removal algorithm, imaging system evaluation and data set construction.

An illumination device irradiates a field of view with pulsed illumination light. In a multi-tap type image sensor, one pixel has a plurality of FD (floating diffusion) regions. A camera controller controls a light emission timing of the illumination device and an exposure timing of the image sensor. A pulse exposure region, which is one of the plurality of FD regions, is allocated to generation of a slice image, and a continuous exposure region, which is another one of the plurality of FD regions, is allocated to generation of a normal image. The image sensor generates the slice image by performing multiple exposure of reflected light of the pulsed illumination light from the field of view using the pulse exposure region, and generates the normal image by performing exposure using the continuous exposure region in a section where the pulse exposure region is not used.

The invention provides a high-calcium-ash light-cured toughened SiC ceramic based on polycarbosilane modification and a preparation method of the high-calcium-ash light-cured toughened SiC ceramic. The preparation method comprises the following steps: carrying out ball-milling composite treatment on low-alkalinity high-calcium ash and PCS, and adding a catalyst at the same time, so that PCS uniformly wraps low-alkalinity high-calcium ash particles to obtain PCS encapsulated and modified high-calcium ash composite powder; uniformly mixing the high-calcium ash composite powder and SiC powder, adding photosensitive resin, a photoinitiator, a dispersing agent, a surfactant and an anti-settling agent, uniformly stirring, and ball-milling to obtain ceramic slurry; a three-dimensional printer is used for conducting printing forming on the ceramic slurry, the printing process is conducted in a continuous exposure pre-curing mode, and a light-cured biscuit is obtained; and carrying out pyrolysis treatment on the photocuring biscuit in an atmosphere furnace, then carrying out sintering treatment in a pressure furnace, and carrying out corrosion treatment through a hydrofluoric acid solution to obtain the SiC ceramic. Through precursor molecular packaging and photocuring microstructure regulation and control, component stability and defect repair are realized, and the performance of the SiC ceramic material is improved.

The present application relates to the field of industrial vision detection and automatic manufacturing of clothes, and particularly to a shirt automatic sewing detection system based on industrial vision; comprising: a motion phase monitoring module, a time sequence synchronization control module, a multi-partition directional lighting module, an image acquisition module, a normal vector calculation module and an abnormality discrimination module; monitoring the phase signal of the mechanical mechanism, extracting the target object's stationary time window, and generating a time-sharing trigger signal in the window to activate the independent lighting sectors of different spatial orientations in turn, synchronously executing continuous exposure to obtain multi-orientation illumination images of the same cloth area; based on the photometric stereo algorithm, calculating the surface normal vector data, extracting the three-dimensional topological features, and outputting the abnormality discrimination results of forms such as broken lines, missing seams, wrinkles, floating lines or bulges; the present application realizes high signal-to-noise ratio three-dimensional form detection of the same color and same quality shirt sewing area under high-speed sewing conditions.

A kit for acute kidney injury detection belongs to the technical field of kidney injury detection. In order to solve the problems of complicated steps in batch detection of multiple patients, continuous exposure of reagents by manual operation, and safety hazards caused by possible pathogens in blood and urine samples, the application comprises a main box and a replacement mechanism. The replacement mechanism is arranged in the middle of the inner side of the main box. The replacement mechanism can complete the seamless connection of separation, replacement and next detection preparation after detection through one-step operation. Especially in batch detection, the operation is less troublesome, the problems of errors and mistakes caused by continuous manual operation are avoided, the risk of manual operation on exposed reagents is greatly reduced, the risk of infection caused by excessive contact or detection of exposed reagents is avoided, and the detection operation is safer.

The invention discloses an in-situ characterization device and method for liquid-liquid interfacial polymerization, and the method comprises the following steps: during an experiment, adding a water-phase solution into a reaction container through a first injection capillary until the liquid level is higher than the reaction container, and dropwise adding an organic solution onto the liquid level of the water-phase solution through a second injection capillary; moving the interface of the two solutions to a pre-adjusted X-ray light spot, so that X-rays are grazing-incident to the interface at a total reflection angle; starting a continuous exposure mode of an SAXS instrument, carrying out real-time characterization on the formation and evolution of the nano-film structure in the interfacial polymerization process, keeping the interface position unchanged in real time in the experimental process, and controlling the process and rate of the interfacial polymerization reaction. According to the invention, a real-time and high-resolution characterization means is provided for the formation and evolution of the nano-film in the liquid-liquid interfacial polymerization process.

The application discloses a high-speed cone beam CT control method and device for continuous angle tracking, and the control method comprises the following steps: controlling a high-voltage generator to start a continuous exposure mode, and controlling a flat panel detector to start a continuous perspective mode; synchronously acquiring perspective image data with time stamps of the flat panel detector and angle data with time stamps of a CT rotating mechanism; determining integral angle intervals of each row according to the perspective image data and the angle data; performing back projection algorithm processing on perspective image data corresponding to the integral angle intervals of each row; and reconstructing to obtain cone beam CT images. The application adopts a mode of continuous exposure of a high-voltage generator and continuous perspective image acquisition of a flat panel detector, synchronously acquires relatively dense time-angle sequences, and performs preprocessing and back projection reconstruction on the cone beam CT reconstruction algorithm in units of rows, thereby removing the synchronous control logic required by pulse exposure, reducing or eliminating the frame interval of cone beam CT perspective images, improving the overall acquisition efficiency of the cone beam CT, and reducing the system complexity.

The portable digital X-ray photography system comprises a host, a wireless panel detection module, a mobile control terminal and a three-dimensional positioning tracking module, and a high-energy density battery, a high-frequency high-voltage generator, a beam limiting device, a wireless communication module, a pre-exposure attenuation analysis module and an exposure control module are integrated in the host. The host supports switching between a battery power supply mode and a network power supply mode; by integrating the high-energy-density battery to support continuous exposure for more than or equal to 50 times, grid power / battery dual-mode power supply is realized, the limitation of a fixed machine room is eliminated, and the animal transfer stress risk is reduced; the target space coordinates are constructed in real time through the three-dimensional positioning module, the dual cameras and the distance detector; the linkage control host and the panel detection module are dynamically aligned with the target part, repeated exposure caused by animal movement is reduced, rapid and accurate imaging is comprehensively achieved, and the operation threshold and the radiation exposure risk are reduced.

The application provides a 3D printing method for controlling crystal specific orientation, a control system and equipment thereof, by setting a point exposure area in a laser scanning path to divide the laser scanning path into a pass scanning area and the point exposure area; controlling the laser beam to perform continuous pass scanning in the x-y plane on each layer of material corresponding to the pass scanning area to construct a part body; and controlling the laser beam to perform continuous exposure on each layer of material corresponding to the point exposure area to form a columnar crystal growing along the z axis in the point exposure area. By setting a separate exposure area, the orientation growth of the crystal grains in the x-y plane in the traditional pass scanning process is blocked, so that the growth mode of the crystal grains is changed, and the microstructure beneficial to the strength improvement of the part is arranged in a specific area in the part.

The invention provides a self-assembled nitrogen-doped carbon nanotube Pt2Mo catalyst as well as preparation and application thereof, and belongs to the technical field of catalysts. According to the invention, the ultrafine Pt2Mo alloy nanoparticles are combined with the ordered N-CNT carrier, the synergistic enhancement of structure and performance is realized on the nanoscale, the highly ordered bamboo-like N-CNT skeleton provides a support frame with stable structure and good electronic conductivity, the uniform dispersion of the Pt2Mo alloy nanoparticles is promoted, and efficient electron and mass transmission is realized. The three-dimensional structure can reduce agglomeration of nanoparticles, ensure continuous exposure of active sites and accelerate ORR kinetics. In addition to carrier optimization, Pt and Mo are accurately alloyed to form a clear Pt2Mo structure, so that the catalytic activity can be further improved. Different from a surface doping system, the Pt2Mo alloy nanoparticles show lattice shrinkage and electron reconstruction, the d band center of Pt is effectively adjusted, and adsorption of an oxygen intermediate is weakened. The modification of the structures and the electron level jointly accelerates the ORR process and improves the durability of the catalyst.

The invention relates to the field of exposure equipment, in particular to infinite-length reel-to-reel photoetching equipment which comprises a rack, an unwinding device, a winding device and an exposure device are arranged on the rack, a conveying guide roller for conveying a film material is further arranged on the rack, an exposure head of the exposure device does not move, and the exposure head of the exposure device is arranged on the rack. The rack is also provided with a vacuum adsorption roller provided with a driving structure, the vacuum adsorption roller is used for adsorbing a film material and driving the film material to move, and the vacuum adsorption roller is close to the exposure position of the exposure device and is located in the movement direction of the film material at the exposure position. A fixed exposure structure is adopted to be matched with a reel-to-reel structure, and uniform-speed conveying of a film material is realized through a vacuum adsorption roller, so that continuous exposure of the whole reel of film material can be realized without an exposure platform, and exposure of an ultra-long film material can be completed while the exposure efficiency is improved.

The application provides an image reconstruction method and device, electronic equipment and storage medium, and relates to the technical field of automatic driving sensor synchronization. The method comprises the following steps: acquiring a point cloud and a plurality of continuous exposure images for a target scene; the point cloud is collected by a laser radar at a first frame rate within a unit time; the plurality of continuous exposure images are collected by a camera at a second frame rate within a unit time; a target pixel base block corresponding to each point in the point cloud is acquired from the plurality of continuous exposure images based on a first exposure time of each point in the point cloud; a difference between a second exposure time of the target pixel base block and the first exposure time is smaller than a difference between an exposure time of other pixel base blocks in the plurality of continuous exposure images and the first exposure time; and a target image is reconstructed based on the target pixel base block corresponding to each point in the point cloud. Thus, an image closer to the actual physical situation can be obtained, and the time error between the point cloud collected by the laser radar and the image collected by the camera is minimized as much as possible.

The application belongs to the technical field of photoelectric detection, and particularly relates to a high-dynamic-range photoelectric detector and a photoelectric image sensor. Mainly comprising: a photodiode (PPD), a diffusion node (FD), a reset switch (RST) and a charge transfer switch (TX). A control device controls these switches to generate initial linear mode (LIN) and logarithmic mode (LOG) response signals of the photoelectric detection element. The control device performs two consecutive exposures on the photodiode with two different working parameters, and a calculation device receiving corresponding signals generates a unified logarithmic response signal by considering the slopes (K1; K2) of the responses and the offsets (OS1; OS2) between the signals.

The embodiment of the application discloses a shooting method and an electronic device, comprising: in response to a starting operation acting on a first camera mode, the electronic device displays a preview picture of the first camera mode, the preview picture displays an image frame collected by continuous exposure of a camera of the electronic device; the first camera mode is one of a shooting mode, a video recording mode and a movie mode; in the case that a scene recognition function is started, the electronic device performs scene recognition processing on the image frame; starting from a first image frame, the electronic device determines a first shooting scene based on a first scene recognition condition when the first scene recognition condition is met; and judges whether all the image frames meet the first scene recognition condition within a first stable frame duration; in the case of meeting, the electronic device collects the image frame based on a shooting mode of the first shooting scene. The embodiment of the application can improve the stability and accuracy of the shooting mode and the picture display.

This application relates to the field of cryo-electron microscopy and discloses a method for acquiring beam image migration data based on continuous exposure recording by a camera. The method includes: determining the total exposure time for continuously capturing multiple target points in a single exposure; controlling the camera to continuously capture multiple target points in a single exposure based on the total exposure time; during the continuous capture of multiple target points in a single exposure, applying beam-image migration technology to switch the target points, and initiating electron beam blocking during the switching process; acquiring a multi-point, multi-frame file containing image information of multiple target points and electron beam blocking information during the switching process; and extracting imaging data of each target point from the multi-point, multi-frame file based on the position of the electron beam blocking information. This application improves data acquisition efficiency.

The application relates to the technical field of optical waveguide preparation, and discloses an optical waveguide master plate non-splicing preparation method based on a DMD dynamic mask, layout data of an optical waveguide master plate is acquired as initial design information, a mask pattern sequence is generated, and the mask pattern sequence comprises a plurality of partition mask patterns; a pixel mapping relationship between micro-mirror unit switching states and the partition mask patterns is established; a transparent substrate is driven to perform partition positioning movement on a platform, a current exposure area of a photosensitive material layer is controlled to be aligned with a projection area of the partition mask patterns; based on the pixel mapping relationship and a partition positioning movement result, the mask patterns are activated, non-interval continuous exposure is carried out, and a whole-page latent image pattern is formed; the whole-page latent image pattern is developed, a surface relief structure of the optical waveguide master plate is processed, and the surface relief structure is transferred to the inside of the transparent substrate to form a waveguide core layer pattern, the effect of non-interval continuous exposure and no segmentation splicing is realized, the preparation period of the surface relief optical waveguide master plate is shortened, and the processing efficiency and the batch preparation yield are improved.

The invention relates to a high-power short-pulse ray source phase control synchronization system and method, relates to the technical field of X-ray detection, and solves the technical problems of motion blur, insufficient ray power and inaccurate synchronization control caused by continuous exposure in the prior art. The system comprises an upper computer, a phase control time sequence unit, a motion machine, a pulse X-ray source, a digital flat panel detector, an image processing module and an image output module. According to the high-power short-pulse radiation source phase control synchronization system and method disclosed by the invention, non-fuzzy and high-resolution online detection of a thick-wall large piece on a high-speed assembly line is realized for the first time. Through time, pulse and image quality three-closed-loop control, the detection precision and stability are remarkably improved, and a system-level solution capable of being popularized is provided for modern industrial nondestructive detection.

The invention discloses an automatic production line for continuous exposure and development, which belongs to the technical field of etching and comprises a frame body, a conveying mechanism is arranged on the frame body, and a photoetching unit, a developing unit and a drying unit are sequentially arranged above the conveying mechanism along the conveying direction; the photoetching unit is used for photoetching the workpieces on the conveying mechanism, and the drying unit is used for blowing hot air to the workpieces; the developing unit comprises a liquid supply assembly and a developing spraying box body fixedly connected to the frame body, a spraying cavity is formed in the bottom of an inner cavity of the developing spraying box body, a plurality of spraying holes are evenly distributed in the bottom of the spraying cavity, a flow dividing assembly is arranged in the developing spraying box body, and the liquid supply assembly supplies developing liquid into the flow dividing assembly; and the diversion assembly uniformly distributes the developing solution into the spraying cavity and sprays the developing solution to the workpiece through the plurality of spraying holes. The steps of photoetching, developing and drying can be automatically carried out, manual intervention is not needed, the automation degree is high, diffusive and durable spraying is achieved in the developing process, the spraying uniformity of the developing solution is improved, and the developing effect is improved.

An apparatus and method for event-based image surround exposure are provided. The device comprises an image camera and an event camera. The image camera captures one or more images with a fixed camera arrangement. The setting of the image camera changes rapidly, and the event camera records an event. The acquired one or more images and a portion of the surrounded exposure event are then fused to generate a composite image. The composite image may be an image having a desired camera setting, or an image having attributes that the image camera cannot capture at any setting, such as a full focus image. The distance of the sharpest focus setting may also be determined from the surrounded exposure event. The focus of the image camera is then set to this determined distance.