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Continuous scanning synchronous control method and system for step scanning photoetching machine

A technology of scanning synchronization and step-by-step scanning, which is used in microlithography exposure equipment, photolithography process exposure devices, etc. to improve production efficiency and achieve continuous effects.

Active Publication Date: 2005-03-02
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] (1) Scanning must be done within the same time period for all involved submodules

Method used

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  • Continuous scanning synchronous control method and system for step scanning photoetching machine
  • Continuous scanning synchronous control method and system for step scanning photoetching machine
  • Continuous scanning synchronous control method and system for step scanning photoetching machine

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Embodiment Construction

[0047] For a better understanding of the present invention, using the negotiation mechanism, queuing mechanism and synchronous control system structure proposed by the present invention, we propose a specific embodiment to realize the continuous exposure and scanning synchronous control of the step-and-scan projection lithography machine. The scope of protection is not limited to the scope determined in this embodiment.

[0048] Such as Figure 5 As shown, as a preferred embodiment, the control system is composed of a host computer 100 and several subsystem control units. The upper computer 100 adopts a workstation or an industrial control PC, and uses operating systems such as Unix or Windwos; the main control CPU board of the sub-system control unit, such as the workpiece table mask table control unit and the lighting control unit, use such as VxWorks, pSOS, RTLinux, WinCE, etc. A real-time operating system; the upper computer 100 and the subsystem control unit are intercon...

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PUM

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Abstract

This invention provides synchronization control means of steps caned projection mask aligner, it based on negotiation mechanism and alignment mechanism, the negotiation mechanism obtained required parameters of next scanning in forthright scanning execute phase; the alignment mechanism put the required parameters of next scanning which obtained by negotiating into sweeping column of subschema, in security for extend multiple sweeping, by organic combining of these two mechanism, thereby it achieves synchronization control of successive exposure sweeping of mask aligner system. This invention also offers synchronization control system of steps caned projection mask aligner to carry out above-mentioned means, the system includes rocator and several subsystem, synchronous control card sends synchronizing information to work head control card and mask motion control card real time through internal bus, in the mean time, it sends synchronous triggering order to dose control card of lighting control unit and slit motion control card, which guarantees work head, mask, exposure dosage and slit motion in the control of successive exposure synchronize completely.

Description

field of invention [0001] The present invention relates to a method and system for synchronous control of a step-scan projection lithography machine, and furthermore, to a method for controlling continuous exposure and scanning of a step-scan projection lithography machine based on a negotiation mechanism and a queue mechanism, and an exposure The control system of the step-scan projection lithography machine is composed of the control module, the scan control module and each sub-control module, utilizes the real-time interface between each sub-control module to work together, and realizes the above-mentioned control method. Background technique [0002] Lithography machine is the most critical equipment in the process of integrated circuit processing. Foreign countries have proposed the concept of next-generation lithography many years ago, and have conducted a lot of research on technologies such as extreme ultraviolet lithography, electron beam projection lithography, and...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 刘世元裴辛哲周畅陈勇辉
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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