Continuous scanning synchronous control method and system for step scanning photoetching machine

A scanning synchronization, step-scanning technology, applied in microlithography exposure equipment, semiconductor/solid-state device manufacturing, photolithography process exposure devices, etc., to achieve the effect of improving production efficiency

Active Publication Date: 2006-06-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] (1) Scanning must be done within the same time period for all involved submodules

Method used

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  • Continuous scanning synchronous control method and system for step scanning photoetching machine
  • Continuous scanning synchronous control method and system for step scanning photoetching machine
  • Continuous scanning synchronous control method and system for step scanning photoetching machine

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Embodiment Construction

[0047] For a better understanding of the present invention, using the negotiation mechanism, queuing mechanism and synchronous control system structure proposed by the present invention, we propose a specific embodiment to realize the continuous exposure and scanning synchronous control of the step-and-scan projection lithography machine. The scope of protection is not limited to the scope determined in this embodiment.

[0048] Such as Figure 5 As shown, as a preferred embodiment, the control system is composed of a host computer 100 and several subsystem control units. The upper computer 100 adopts a workstation or an industrial control PC, using operating systems such as Unix or Windwos; the main control CPU board of the sub-system control unit, such as a real-time operating system such as WinCE; the upper computer 100 and the sub-system control unit through industrial Ethernet, industrial Communication methods such as fieldbus are interconnected. Between the internal bo...

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Abstract

The present invention firstly provides a synchronous control method for a step-and-scan projection lithography machine. The method is based on a negotiation mechanism and a queue mechanism. The negotiation mechanism is used to obtain the parameters required for the next scan in the current scan execution phase; The next scan parameters are put into the scan queue of the sub-module to ensure that multiple scans can be performed continuously. Through the organic combination of these two mechanisms, the continuous exposure scan synchronization control of the lithography machine system is realized. The present invention also provides a synchronous control system for a step-scan projection lithography machine for realizing the above method, the system includes a host computer and several subsystems, and the synchronous control card moves to the workpiece table motion control card and mask table in real time through the internal bus The control card issues synchronization information and simultaneously sends synchronous trigger commands to the dose control card and slit motion control card of the illumination control unit to ensure complete synchronization of the workpiece table, mask table, exposure dose, and slit motion during continuous exposure scanning control.

Description

technical field [0001] The present invention relates to a method and system for synchronous control of a step-scan projection lithography machine, and furthermore, to a method for controlling continuous exposure and scanning of a step-scan projection lithography machine based on a negotiation mechanism and a queue mechanism, and an exposure The control system of the step-scan projection lithography machine is composed of the control module, the scan control module and each sub-control module, utilizes the real-time interface between each sub-control module to work together, and realizes the above-mentioned control method. Background technique [0002] Lithography machine is the most critical equipment in the process of integrated circuit processing. Foreign countries have proposed the concept of next-generation lithography many years ago, and have conducted a lot of research on technologies such as extreme ultraviolet lithography, electron beam projection lithography, and io...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00G03F7/20
Inventor 刘世元裴辛哲周畅陈勇辉
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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