Synchronous bus controller of step scanning projection photo etching machine and synchronous control system

A technology of step-scan and synchronous bus, which is applied in transmission system, digital transmission system, microlithography exposure equipment, etc.
CN1648889AActive Publication Date: 2005-08-03SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD

Patent Information

Authority / Receiving Office
CN ยท China
Current Assignee / Owner
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Publication Date
2005-08-03

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Abstract

The synchronous bus controller adopts internal self-defined sync bus, outer sync signal, and minimum time unit data transmitting period of sync bus as the sync time base, produces precise time control point with data transmission period FIFO queue and 'time-command' FIFO queue, to realize the strict sync course of the submodules in stepped scan projecting photoetching machine. The sync control system includes upper computer, industrial control computer CPU board, motion control card, laser counter card, alignment control system and lighting control system. The sync bus controller sends real-time sync information to the motion control card and sends sync triggering signal to the alignment control system and the lighting control system via the sync bus to ensure the complete sync among the workpiece table, the mask table, the exposure dosage and slit motion in continuous exposure and scanning control.
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Description

technical field

[0001] The invention relates to a synchronous control technology of a step-scan projection lithography machine, in particular to a synchronous bus controller and a synchronous control system of a step-scan projection lithography machine. Background technique

[0002] In a step-and-scan lithography machine, the exposure process is different from that in a step-and-repeat machine. The light beam passes through a slit and is projected onto the mask surface through the illumination system, and the mask passes through the light beam at a set constant speed. Simultaneously, the wafer moves in opposite directions beneath the lens. Compared with the step-and-repeat lithography machine, this step-and-scan lithography machine has lower deformation and a larger image field; at the same time, both the workpiece table carrying the silicon wafer and the mask table carrying the mask can realize The high-speed movement makes the step-and-scan lithography machine have high ...

Claims

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