Synchronous bus controller of step scanning projection photo etching machine and synchronous control system

A technology of step-scan and synchronous bus, which is applied in transmission system, digital transmission system, microlithography exposure equipment, etc.

Active Publication Date: 2005-08-03
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF0 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] (1) Scanning must be done within t...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Synchronous bus controller of step scanning projection photo etching machine and synchronous control system
  • Synchronous bus controller of step scanning projection photo etching machine and synchronous control system
  • Synchronous bus controller of step scanning projection photo etching machine and synchronous control system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] The synchronous bus controller is the core controller of the synchronous control of the step-scan projection lithography machine. After all subsystems participating in the synchronous scanning process are negotiated under the exposure control software, the synchronous bus controller implements real-time synchronous control on the hardware of the entire scanning process.

[0039] The structural block diagram of the synchronous control process is as follows: figure 2 As shown, the synchronous bus controller is the core of the real-time synchronous control process, providing a unified time reference for all sub-modules and motion control cards involved in scanning exposure. The exposure control software transmits the scanning parameters to the synchronous bus controller through the VME bus interface of the CPU board of the industrial computer, and the synchronous bus controller controls the workpiece table motion control card, mask table motion control card, workpiece Th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The synchronous bus controller adopts internal self-defined sync bus, outer sync signal, and minimum time unit data transmitting period of sync bus as the sync time base, produces precise time control point with data transmission period FIFO queue and 'time-command' FIFO queue, to realize the strict sync course of the submodules in stepped scan projecting photoetching machine. The sync control system includes upper computer, industrial control computer CPU board, motion control card, laser counter card, alignment control system and lighting control system. The sync bus controller sends real-time sync information to the motion control card and sends sync triggering signal to the alignment control system and the lighting control system via the sync bus to ensure the complete sync among the workpiece table, the mask table, the exposure dosage and slit motion in continuous exposure and scanning control.

Description

technical field [0001] The invention relates to a synchronous control technology of a step-scan projection lithography machine, in particular to a synchronous bus controller and a synchronous control system of a step-scan projection lithography machine. Background technique [0002] In a step-and-scan lithography machine, the exposure process is different from that in a step-and-repeat machine. The light beam passes through a slit and is projected onto the mask surface through the illumination system, and the mask passes through the light beam at a set constant speed. Simultaneously, the wafer moves in opposite directions beneath the lens. Compared with the step-and-repeat lithography machine, this step-and-scan lithography machine has lower deformation and a larger image field; at the same time, both the workpiece table carrying the silicon wafer and the mask table carrying the mask can realize The high-speed movement makes the step-and-scan lithography machine have high ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/20G06F13/42H04L12/00
Inventor 刘世元陈勇辉池蜂周畅韦学志
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap