A method for operating a projection
exposure system (1) comprises the following steps: providing a projection
exposure system (1) with a
radiation source (1) for generating illumination
radiation (3), an illumination optic (11) for transferring the illumination
radiation (3) from the radiation source (2) to an
object field (8) extending in a scan direction (y) and a cross-scan direction (x), wherein the illumination optic (11) has at least one faceted mirror (6, 7) with a plurality of individual mirrors, and wherein at least a subset of the individual mirrors is configured such that they only partially illuminate the
object field (8) in the scan direction (y), and a projection optic (10) for imaging a
reticle (12) arranged in the
object field (8) of the illumination optic (11) onto a
wafer (19) arranged in an
image field (17) of the projection optic (10), and specifying a set of at least one element of field-dependent aberrations. (Ai(x, y);i=(1..M)), specification of a target vector (Z(x) = (Z1(x), ..., Z; M (x) T ) for the target values Z i (x) of the aberrations Ai(x, y) after averaging over the scan direction (y), dividing the extent of the object field (8) in the scan direction (y) into j ≥ 2 intervals ([y0; y1], ..., [y j-1 ; y j ]) and determining scan weights (gi(x, y)) which characterize a dependence of an
illuminance at a location x in the cross-scan direction in the object field () on a position in the scan direction (y) such that a deviation of a weighted aberration vector A weighted ( x ) → : = ∑ gi A l → is reduced from the target vector (Z(x)).