The invention belongs to the field of lasers, and discloses a growth method for reducing
laser Ith through N
grating burying, which subversively adopts an N-type
grating structure, uses a built-in P-N junction formed by the N-type
grating structure and a subsequent P-type buried layer as a natural and efficient current
blocking layer, and structurally eliminates a current leakage path. Afterwards, in the heating stage, trace
arsine is introduced to carry out atomic-scale protection on the sensitive grating morphology, at the optimal
mass transport temperature, the high mobility characteristic of
indium atoms is utilized to carry out shape-preserving filling on grating grooves, flawless preliminary planarization is achieved, and through variable-temperature thickening growth and high-temperature annealing in the pure
phosphorus atmosphere, the high-temperature-resistant grating is obtained. And performing
quality optimization and
defect repair on the buried layer and the key interface. The series of linked steps ensure that the
indium phosphide buried layer with flat atomic scale and complete
crystal lattice can grow on the fragile N-type grating, and ensure that a high-quality covering layer and an active region grow on the N-type grating.