Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

735 results about "Nitrogen atom" patented technology

Nitrogen is atomic number 7, which means each nitrogen atom has 7 protons. Its element symbol is N. Nitrogen is odorless, tasteless, and colorless gas at room temperature and pressure.

Photobase generator, compound, photoreactive composition, and reaction product

A photobase generator includes a compound including: first skeletons represented by the following formula (a); and a second skeleton including nitrogen atoms bonding to bonding positions of the first skeletons to form amide groups, wherein, in a molecule, a number of the first skeletons is two or more, a number of the nitrogen atoms, configuring the amide groups, in the second skeleton is the same as the number of the first skeletons, and at least one of the nitrogen atoms configuring the amide groups is converted into a nitrogen atom configuring a secondary amine or a tertiary amine by light irradiation. In the formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.
Owner:TOKYO UNIVERSITY OF SCIENCE

Magnetic code disc film material and preparation method and application thereof

The invention provides a magnetic code disc film material and a preparation method and application thereof. By introducing the TiN layer, a proper amount of nitrogen atoms can enter lattice gaps of iron, electron cloud distribution of iron atoms is changed, and the magnetic moment of the iron atoms is changed; the magnetic moment of Fe atoms can be influenced by N atoms and crystal structures, an alpha-Fe8N phase is formed in FeCoCr through introduction of N ions, the average magnetic moment of each Fe atom in the alpha-Fe8N phase is 2.4 mu B, alpha-Fe8N is a metastable phase, a sample can finally form stable gamma '-Fe4N through annealing, and the magnetic moment of the stable gamma'-Fe4N is generally about 2.5 mu B-2. 7 mu B and is higher than the magnetic moment 2.2 mu B of the Fe atoms in metal Fe; besides, Ti forms a Ti-Fe weak magnetic phase pinning magnetic domain wall in the FeCoCr thin film, and the coercive force and residual magnetism of the FeCoCr layer can be effectively improved at the same time through the method.
Owner:JIHUA LAB

Polymers and products or articles comprising or consisting of such polymers

The present invention relates to a polymer having a main chain, wherein the main chain comprises linear amide bonds and a heteromonocyclic moiety containing a nitrogen atom, wherein the main chain does not contain peptide bonds, or wherein, based on the total number of linear amide bonds in the main chain, the proportion of peptide bonds in the main chain is at most 30%, and wherein, based on the total weight of the polymer, the proportion of the heteromonocyclic moiety containing a nitrogen atom is from 5% by weight to 25% by weight. The present invention also relates to a product or article and the use of the polymer for manufacturing or producing the product or article.
Owner:B4 ADHESIVE MATERIAL CO +1

Paste and conductive film and their production methods

A paste that includes particles of a layered material in an ammonia aqueous solution. The particles include one or plural layers, the layers having a layer body represented by MmXn, wherein M is at least one metal of Group 3, 4, 5, 6, or 7, X is a carbon atom, a nitrogen atom, or a combination thereof, n is not less than 1 and not more than 4, and m is more than n but not more than 5, and a modifier or terminal T exists on a surface of the layer body, wherein T is at least one selected from the group consisting of a hydroxyl group, a fluorine atom, a chlorine atom, an oxygen atom, and a hydrogen atom, wherein the paste has a viscosity of 1 Pa·s or more at a shear velocity of 1 / s when the paste has a solid content concentration of 1.0% by mass.
Owner:DREXEL UNIV +1

Polishing liquid, polishing liquid set, polishing method, component production method, and semiconductor component production method

A polishing liquid containing: abrasive grains; an additive; and water, in which the additive includes (A1) a polyglycerol having a weight average molecular weight of 350 to 2800 and (B) a compound having two or more nitrogen atoms to which a hydroxyalkyl group is bonded. A polishing liquid containing: abrasive grains; an additive; and water, in which the additive includes (A2) a polyglycerol having a hydroxyl value of 800 to 1000 mgKOH / g and (B) a compound having two or more nitrogen atoms to which a hydroxyalkyl group is bonded.
Owner:RESONAC CORP

Multi-metal active site covalent organic framework material, preparation method thereof and application of multi-metal active site covalent organic framework material in activating PMS to degrade pollutants

The invention discloses a multi-metal active site covalent organic framework material, a preparation method thereof and application of the multi-metal active site covalent organic framework material in activating PMS to degrade pollutants, the multi-metal active site covalent organic framework material comprises metalloporphyrin and bipyridine groups, when porphyrin loads metal, metal atoms are connected through coordination of two nitrogen sources of bipyridine, the metal atoms are connected through coordination of two nitrogen sources of bipyridine, and therefore the multi-metal active site covalent organic framework material is obtained. Multi-metal active sites are formed; the metal active sites are increased, and the distance between metals is adjusted, so that the framework material shows excellent catalytic activity. The covalent organic framework material is prepared through a solvothermal reaction, the covalent organic framework material continues to react with a metal precursor to load metal, the preparation method is simple, a complex reaction process and harsh reaction conditions are not needed, and large-scale preparation can be achieved.
Owner:GUANGDONG UNIV OF TECH

Novel dual-emission dissimilar metal MOFs, preparation method thereof and application of novel dual-emission dissimilar metal MOFs as ratio type fluorescence temperature sensor

The invention discloses novel dual-emission dissimilar metal MOFs, the chemical formula of which is [Eu2 (na) 6 (CH3OH) 2 (Cu4I4)], and na-is a nicotinic acid radical ion. The MOFs have two secondary structural units: a cubic alkane [Cu4I4] cluster and a 1D inorganic-organic chain [Eu (na) 3] n, each [Cu4I4] cluster serves as a four-connection node, and the 1D [Eu (na) 3] n chain is connected through a nitrogen atom of a na-ligand, so that a three-dimensional skeleton structure is expanded. Tests show that at room temperature, when the compound is excited by 338 nm ultraviolet light, the compound shows two emission centers, a wide emission peak at 557 nm belongs to cluster center triplet emission of a [Cu4I4] cluster, and emission of sharp peaks at 591, 611 and 701 nm corresponds to characteristic emission of Eu < 3 + >. Particularly, the intensity ratio of two fluorescence emission peaks of the compound at 567 nm and 610 nm in the temperature range of 125-300 K and the temperature have a good linear relation, the compound is a sensitive ratio type fluorescence temperature sensing material, and a new thought is provided for application of the ratio type fluorescence temperature sensing material.
Owner:ANYANG NORMAL UNIV

Resin composition and semiconductor device

The present disclosure provides a resin composition that can improve the fluidity of the resin composition and enhance the crack resistance of a cured product. The resin composition contains a liquid epoxy compound (A), a liquid aromatic amine compound (B), an inorganic filler (C), and an aluminum complex (d1) having nitrogen atoms and oxygen atoms. The viscosity of the resin composition at 25°C is 400 Pa·s or less.
Owner:PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD

Redox cyclable molecules for energy storage

This disclosure provides redox cyclable molecules for energy storage. These molecules belong to either the 4H-pyran-4-ylidene family or include a six-membered aromatic ring with one nitrogen atom at position 1 (pyridinium family) or two nitrogen atoms at positions 1 and 4 (pyrazinium family) or at positions 1 and 3 (pyrimidinium family). Molecules in these families are used as analytes in redox flow batteries.
Owner:MICROSOFT TECHNOLOGY LICENSING LLC

Light emitting element and monoamine compound for the same

A light emitting element of an embodiment includes a first electrode, a second electrode facing the first electrode, and functional layers disposed between the first electrode and the second electrode. At least one functional layer among the functional layers includes a monoamine compound of an embodiment thereby showing high efficiency and long life characteristics. The monoamine compound includes a substituted or unsubstituted phenanthryl group directly bonded to a nitrogen atom, a substituted or unsubstituted dibenzoheterole group directly bonded to the nitrogen atom, and a substituted or unsubstituted naphthyl group bonded to the nitrogen atom via a linker.
Owner:SAMSUNG DISPLAY CO LTD

Photosensitive composition, hologram recording medium using the same, hologram optical element, and method of forming hologram diffraction grating

To provide a photosensitive composition capable of further improving diffraction characteristics.The present technology provides a photosensitive composition including: at least a compound represented by the following general formula (1); a binder resin; and a photoinitiator.In the general formula (1), X1 represents an oxygen atom, a nitrogen atom, a phosphorus atom, a caron atom, or a silicon atom.Y1 and Y2 each represent a benzene ring or a naphthalene ring, and both Y1 and Y2 do not represent benzene rings.R1 to R3 each represent a hydrogen or a substituent group represented by *—Z1(R4)d (* represents a bonding site).Z1 represents a single bond, a saturated hydrocarbon group having a valence of 2 or higher, or an unsaturated hydrocarbon group having a valence of 2 or higher, and the saturated hydrocarbon group or the unsaturated hydrocarbon group may have an ether bond and / or a thioether bond.R4 represents a hydrogen or a polymerizable substituent group.
Owner:SONY GROUP CORP

Disilylamine precursors and related methods

A composition comprising a disilylamine precursor, the disilylamine precursor comprising a functional group attached to a nitrogen atom of the disilylamine precursor, the functional group comprising alkyl, alkenyl, alkynyl, cycloalkyl, aryl, or benzyl. Related methods are provided, including methods for forming the disilylamine precursor, and methods for vapor deposition.
Owner:ENTEGRIS INC

Resin composition derived from used sanitary article containing excrement

To provide a resin composition derived from a used sanitary article containing excrement which has improved moldability, workability, flame retardance and sanitation and safety, and is usable for various applications suitable for material recycling and thermal recycling.SOLUTION: A resin composition derived from a used sanitary article containing excrement contains a soluble component and an insoluble component. The ratio of the soluble component is 80 to 90 mass%. The ratio of the insoluble component is 10 to 19 mass%. The ratio of the nitrogen atom contained in the resin composition is less than 0.5 mass%.SELECTED DRAWING: Figure 1
Owner:UNI CHARM CORP

Derivative of benzobipyrrole compound, preparation method and application thereof, hydrogen storage method and hydrogen release method

The invention relates to the technical field of hydrogen storage of organic aromatic hydrocarbon molecules, in particular to a derivative of a benzopyrrole compound, a preparation method and application of the derivative, a hydrogen storage method and a hydrogen release method. The chemical structural formula of the derivative is selected from one of M1, M2, M3, M4, M5R and M5S, wherein when the chemical structural formula of the derivative is M1, M2, M3, M5R or M5S, A is selected from a saturated alkyl chain with the carbon number of 1-6 or an unsaturated alkyl chain with the carbon number of 2-6; when the chemical structural formula of the derivative is M4, A is selected from a saturated alkyl chain with the carbon number of 1-6, an unsaturated alkyl chain with the carbon number of 2-6 or boron. Compared with azacyclo-organic molecular materials (carbazoles and indoles) which exist in the field of organic hydrogen storage and are massively researched, the azacyclo-aromatic organic molecular material containing the double nitrogen atoms, which can generate a bridging structure between the double nitrogen atoms and can be used for hydrogen storage, is provided for the first time; and the material is large in hydrogen storage capacity and low in melting point.
Owner:QINGDAO BOLIU INNOVATION TECHNOLOGY CO LTD

High-purity tin composition, methods for storing and producing the same, and tin hydrolysate, tin hydrolysate solution, and tin hydrolysate thin film using the same

A high-purity tin composition that can maintain high purity for a long time, in which decomposition of a triaminotin compound is suppressed and high purity of the triaminotin compound is maintained, is provided. The tin composition contains 95 mol % or more of a triaminotin compound having formula (1) in terms of tin atoms, and 0.001 to 0.5 mol % of a tetraaminotin compound having formula (2) in terms of tin atoms:R is a hydrocarbon group having 1 to 30 carbon atoms which is optionally substituted with a halogen, an oxygen atom, or a nitrogen atom, and R's are each a hydrocarbon group having 1 to 10 carbon atoms and may be identical or different from each other; two R's on the same nitrogen atom may be bonded to each other to form a 3- to 7-membered ring containing nitrogen.
Owner:MITSUBISHI CHEM CORP +1

Composition including monomer with a carboxylic acid group, monomer with a hydroxyl group, an alkyl monomer, and crosslinker and related article and method

The composition includes an acrylic monomer having a carboxylic acid group, an acrylic monomer having a hydroxyl group, at least one of an alkyl acrylate or alkyl methacrylate, and from 15 to 22 percent by weight of a compound composed of divalent segments L and at least two X groups. The divalent segments L are represented by formula L. Each segment L is independently directly bonded to two secondary N atoms, two tertiary N atoms, or a secondary and a tertiary N atom. Each R1 represents an alkylene group having from 1 to 4 carbon atoms, and at least some of the R1 groups are —CH2—CH2—CH2—CH2—. Each X group is independently represented by the formula CH2═C(R)—C(O)—O—V—W—C(O)—. Articles and methods using the composition are also described.
Owner:3M INNOVATIVE PROPERTIES CO

Method for synthesizing ammonia through photo-thermal-electric multi-field coupling concerted catalysis

The method comprises the following steps: firstly, putting a catalyst into a reaction system, and introducing a nitrogen source and a hydrogen source; wherein the catalyst comprises a carrier and a heterojunction material loaded on the surface of the carrier; and then illuminating, heating and applying an electric field to the reaction system at the same time, so that the N = N bond or N = O bond in the reaction system is adsorbed and cracked, and the ammonia is catalytically synthesized. The heterojunction material has a metal property, a thermoelectric property and heterojunction interface double active sites, and photoproduction local oscillation photoproduction of the metal heterojunction is precisely enriched at the interface double active sites under the thermoelectric synergistic effect, so that the charge density of the interface double active sites is remarkably improved; a traditional activation mode of single nitrogen atom in a single site adsorption N = N bond or N = O bond is changed, heterojunction interface charge-rich double-site synergistic adsorption and splitting of the N = N bond or N = O bond are realized, and a nitrogen source activation energy barrier is reduced, so that the yield of synthesis ammonia is remarkably improved.
Owner:FOSHAN XIANHU LAB

Compound, preparation method thereof and electronic device

The invention discloses a compound and a preparation method thereof and an electronic device, the molecular structure general formula of the compound is shown in the specification, R is selected from one of the following structures, X1-X2 are respectively and independently selected from one of oxygen atoms, sulfur atoms, selenium atoms and nitrogen atoms, and X is a positive integer. X < 3 > to X < 4 > are respectively and independently selected from one of the following structures; and X < 5 > to X < 6 > are respectively and independently selected from any one of alkyl groups. According to the compound provided by the invention, the electron pushing and pulling capability in the compound is adjusted by changing the structures of a donor and an acceptor, so that the purpose of regulating and controlling molecular electron cloud distribution and energy level is achieved, and key physical properties such as emission wavelength, radiative transition rate (kr) and backlash crossing rate (kRISC) of a material are systematically regulated and controlled. The compound as a guest material of a luminescent layer has good comprehensive performance when being applied to organic electroluminescent devices for solution processing and vacuum evaporation.
Owner:SHENZHEN UNIV

Monolayer with improved adhesion strength on metallized surfaces

The invention concerns a monolayer comprising a fluoropolymer, a silicon-sulfur compound, and a vinyl polymer consisting in carbon and hydrogen atoms, and optionally oxygen and / or nitrogen atoms, an assembly comprising a substrate and said monolayer, a method for preparing said monolayer, a component comprising said monolayer and a device comprising said component.
Owner:ARMOR SMART FILMS

Aryl oxadiazole compound, and agricultural and horticultural plant disease control agent

To provide a superior agricultural and horticultural plant disease control agent.SOLUTION: The present invention provides an aryl oxadiazole compound represented by general formula [I] or a salt thereof, and an agricultural and horticultural plant disease control agent comprising the same as an active ingredient [where A1, A2, A3, and A4 each independently represent a nitrogen atom, CH, or C-R4; Y represents an oxygen atom or a sulfur atom; X represents a halogen atom; Z represents a C1-C6 alkyl group, a C1-C6 alkoxy group, or the like; R1 and R2 represent a hydrogen atom, a C1-C6 alkyl group, or the like; and R3 represents a C1-C6 alkyloxycarbonyl group, a phenyl group (the group being substituted with one or more substituents selected from R5 substituents), a C10-C12 aryl group (the group optionally being substituted with one or more substituents selected from R5 substituents), or a 5-12-membered heteroaryl group (the group optionally being substituted with one or more substituents selected from R5 substituents)].SELECTED DRAWING: None
Owner:KUMIAI CHEM IND CO LTD

Polishing liquid, polishing liquid set, polishing method, component manufacturing method, and semiconductor component manufacturing method

A polishing liquid containing: abrasive grains; an additive; and water, in which the additive includes (A1) a compound having two or more nitrogen atoms to which a hydroxyalkyl group is bonded and (B) a 4-pyrone-based compound represented by General Formula (1) below. A polishing liquid containing: abrasive grains; an additive; and water, in which the additive includes (A2) a polyglycerol and (B) a 4-pyrone-based compound represented by General Formula (1) below.[In the formula, X11, X12, and X13 are each independently a hydrogen atom or a monovalent substituent.]
Owner:RESONAC CORP

Compound, light-emitting element material, organic electroluminescent element, and electronic device

A compound having a structure represented by general formula (1). In general formula (1), R101 to R121 are each independently a hydrogen atom or a substituent, where R101 to R121 are not a substituted or unsubstituted N-carbazolyl group. The structure represented by general formula (1) has at least one group represented by general formula (2). In general formula (2), at least one of X1-X5 is represented by a nitrogen atom.
Owner:TORAY INDUSTRIES INC

Electrode, electrochemical device, layered material, electrode material for electrochemical device, and method for producing layered material

An electrode 1a comprises a layered material 15. The layered material 15 includes a layer 15a and phosphonium 15p. The layer 15a includes a body 15b and an end 15c. The body 15b has a composition of MmXn. The end 15c is present on the surface of the body 15b. As regards the body 15b, M is at least one selected from the group consisting of Group 3 elements, Group 4 elements, Group 5 elements, Group 6 elements, and Group 7 elements. X includes at least one selected from the group consisting of carbon atoms and nitrogen atoms.
Owner:PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD

Cutting tool

PCT designated stageWO2025248671A1Milling cuttersWorkpiecesCrystal structureSilicon
A cutting tool comprising a base material and a coating film disposed on the base material, wherein: the coating film includes a first layer; the first layer is formed of a plurality of hard particles; the hard particles are each formed of titanium, silicon, carbon, and nitrogen; the hard particles have a cubic crystal structure; the first layer has a columnar structure; in the first layer, the average of the ratio NSi / (NTi+NSi) of the number NSi of silicon atoms with respect to the total of the number NTi of titanium atoms and the number NSi of silicon atoms is 0.01-0.10; in the first layer, the average of the ratio NC / (NC+NN) of the number NC of carbon atoms with respect to the total of the number NC of carbon atoms and the number NN of nitrogen atoms is 0.60-0.85; the hard particles each have a laminate structure in which a first unit layer and a second unit layer are alternately laminated; the first unit layer and the second unit layer are each formed of the titanium, the silicon, the carbon, and the nitrogen; the ratio x1 of the number of silicon atoms with respect to the total of the number of titanium atoms and the number of silicon atoms in the first unit layer is greater than the ratio x2 of the number of silicon atoms with respect to the total of the number of titanium atoms and the number of silicon atoms in the second unit layer; and the ratio y1 of the number of carbon atoms with respect to the total of the number of carbon atoms and the number of nitrogen atoms in the first unit layer is greater than the ratio y2 of the number of carbon atoms with respect to the total of the number of carbon atoms and the number of nitrogen atoms in the second unit layer.
Owner:SUMITOMO ELECTRIC INDUSTRIES LTD

Cutting tap after nitriding treatment and method for manufacturing the same

A cutting tap is provided which suppresses breakage and wear of a blade during tapping and has high durability. In a nitriding treatment step (P2), a nitrogen diffusion layer in which nitrogen atoms contained in an atmosphere gas diffuse from the surface of a tool base material of the cutting tap under heating is formed, and then, in a honing treatment step (P3), an abrasive particle is made to collide with a cutting blade portion of the tool base material of the cutting tap to round the cutting blade portion and remove a blade tip. The cutting blade portion is made to have a thick nitrogen diffusion layer in advance by diffusion from a rear clearance face and diffusion from a front rake face, and the nitrogen concentration and hardness of the blade tip of the cutting blade portion are relatively high and mechanically brittle. Therefore, by removing the mechanically brittle blade tip, wear and breakage of the cutting blade portion of the cutting tap are reduced, and a tool performance capable of maintaining good cutting performance for a long period of time can be obtained.
Owner:OSG

Polishing liquid for CMP, polishing liquid set for CMP, and polishing method

A polishing liquid for CMP, the polishing liquid containing abrasive grains, a nitrogen-containing compound, and water, in which the abrasive grains include cerium-based particles, and the nitrogen-containing compound includes a compound A1 having a fused ring (a fused ring having an aromatic five-membered ring with one nitrogen atom), a compound A2 having a quinoline ring and one hydroxy group bonded to the quinoline ring, a compound A3 having an aromatic ring and a hydroxy group bonded to a nitrogen atom, or a compound A4 having a nitrogen-containing aromatic ring to which at least one selected from the group consisting of a hydroxy group and an amino group is bonded.
Owner:RESONAC CORP

Endotoxin adsorbent

An endotoxin adsorbent comprising a silica monolith having a nitrogen atom-containing cationic group has a sufficient ET adsorption capacity in practice. The silica monolith may have through-holes interconnected therein, and the ends of the through-holes are open to the outside of the silica monolith. The nitrogen atom-containing cationic group is bonded to the silica monolith through or without a spacer or a crosslinking agent.
Owner:DPS INC +1

Organic compound and organic light-emitting element

The present disclosure is characterized by being represented by general formula G1. In general formula G1, ring C is an aromatic hydrocarbon ring or a heteroaromatic ring. A11-A15 and A21-A25 are each independently selected from the group consisting of CRA and a nitrogen atom. RA represents a hydrogen atom or a substituent of various types. When RA exists in a quantity of more than one, the plurality of RAs may be the same or different from each other. X1 and X2 are each independently selected from the group consisting of an oxygen atom, a sulfur atom, a tellurium atom, a selenium atom, and NRB. RB represents a hydrogen atom or a substituent of various types. When RB exists in a quantity of more than one, the plurality of RBs may be the same or different from each other. RAs adjacent to each other or RA and RB adjacent to each other are optionally bonded to form a ring.
Owner:CANON KK