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542 results about "Acceptor" patented technology

In semiconductor physics, an acceptor is a dopant atom that when added to a semiconductor can form a p-type region. For example, when silicon (Si), having four valence electrons, needs to be doped as a p-type semiconductor, elements from group III like boron (B) or aluminium (Al), having three valence electrons, can be used. The latter elements are also called trivalent impurities. Other trivalent dopants include indium (In) and gallium (Ga).

Optically detectable label and marker

An optically detectable label (102, 500) is provided comprising a nucleic acid backbone (108, 504) comprising multiple attachment positions (306, 308, 506a, 506b, 506c, 506d) including at least a first attachment position and a second attachment position. The optically detectable label (102, 500) further comprises multiple labelling moieties (106a, 106b, 106c, 106d, 106e, 310, 312, 502a, 502b, 502c, 502d), including at least a first labelling moiety and a second labelling moiety, each labelling moiety (106a, 106b, 106c, 106d, 106e, 310, 312, 502a, 502b, 502c, 502d) attached to a different one of the attachment positions (306, 308, 506a, 506b, 506c, 506d) of the nucleic acid backbone (108, 504). The first labelling moiety and the second labelling moiety are configured to form an energy transfer donor and acceptor pair. Further, the nucleic acid backbone (108, 504) has at least a first spatial state (300, 500a) and a second spatial state (322, 500b), wherein in the first spatial state the attachment position to which the first labelling moiety and the attachment position to which the second labelling moiety are attached to, are in proximity in order to enable an energy transfer between the first labelling moiety and the second labelling moiety. Moreover, the nucleic acid backbone (108, 504) is in the first spatial state (300, 500a) when a first staple strand (302, 510, 512) is bound to the nucleic acid backbone (108, 504). In further aspects, a marker (100) comprising the optically detectable label (102, 500) is provided and a method for analysing a biological sample.
Owner:LEICA MICROSYSTEMS CMS GMBH

Dimeric electron acceptor, preparation method thereof and organic photovoltaic device comprising dimeric electron acceptor

The invention discloses a dimeric electron acceptor, which has one of the following structural formula: # imgabs0 #, in which R1 and R2 are respectively and independently selected from C1-C100 alkyl groups; x comprises H, F, Cl, I, NO2 or CN. According to the dimeric electron acceptor, a 3, 4-ethylenedioxythiophene or 3, 4-dimethoxythiophene unit serves as a connecting unit, an alkoxy side chain is connected to an outer side chain, the open-circuit voltage Voc of a solar cell device with the dimeric electron acceptor as an acceptor material can reach 1.02 V, the energy conversion efficiency PCE is 15.1%, and the dimeric electron acceptor is Vocgt reported at present; and the maximum value of PCE in a dimer acceptor system of 1V. The invention also provides a preparation method of the dimer electron acceptor and an organic photovoltaic device containing the dimer electron acceptor.
Owner:NANKAI UNIV

Aggregation-induced emission material, nanoparticle and preparation method and application thereof

The invention relates to the technical field of luminescent materials, and discloses an aggregation-induced emission material, nanoparticles as well as a preparation method and application thereof, the structural general formula of the aggregation-induced emission material is as follows: # imgabs0 #, R is selected from one of the following structures: # imgabs1 # aggregation-induced emission material takes a pyridine group as an acceptor unit, and the acceptor unit is selected from one of the following structures: 1 # imgabs2 # aggregation-induced emission material; a carbon-carbon double bond and a thiophene unit are used as pi bridges, and diphenylamine, bis (4-ethylphenyl) amine and bis (4-(tert-butyl) phenyl) amine are used as strong electron donors. The donors not only provide strong electron supply ability, but also become efficient rotors due to highly twisted molecular conformation, and endow the aggregation-induced emission material with long emission wavelength and aggregation-induced emission activity.
Owner:SHENZHEN UNIV

Organic solar cell based on halogenated additive and preparation method thereof

The invention relates to the technical field of preparation of organic solar cells, in particular to an organic solar cell based on a halogenated additive, and the structure level of a forward device of the solar cell sequentially comprises a transparent conductive substrate, a hole transport layer, an organic active layer, an electron transport layer and a metal electrode from bottom to top, the organic active layer comprises a polymer donor PM6, a non-fullerene electron acceptor L8-BO and a halogenated additive DFBB. Through addition of a halogenated additive DFBB, strong non-covalent bonding is formed by unique sigma-hole interaction of the halogenated additive DFBB and a receptor L8-BO, and meanwhile, the molecular stacking orientation of the active layer can be accurately regulated and controlled by the polymer electrostatic potential extreme value of the halogenated additive DFBB. The halogenated additive DFBB preferentially generates strong sigma-hole interaction with acceptor molecules, ordered accumulation of L8-BO is remarkably enhanced, meanwhile, the crystallization behavior of the donor PM6 is balanced through the synergistic halogen effect, a bicontinuous interpenetrating network structure is formed, and the photo-generated exciton yield is improved.
Owner:SHANGHAI SECOND POLYTECHNIC UNIVERSITY

High hole injection efficiency GaN-based light emitting diode epitaxial structure and preparation method thereof

PendingCN120640843AAcceptorElectron hole
The invention relates to a GaN-based light emitting diode epitaxial structure with high hole injection efficiency and a preparation method thereof. The epitaxial structure sequentially comprises a first semiconductor layer, an active layer, a low-temperature P-type layer and a second semiconductor layer which are arranged on the substrate, and the low-temperature P-type layer is arranged between the active layer and the P-type GaN and sequentially comprises a hole expansion layer, a hole storage layer and a hole layer. The hole expansion layer is composed of a periodic structure formed by AlN layers and low-doped Mg-GaN layers alternately. The hole storage layer is of a periodic structure composed of a GaN layer, an InGaN layer and a low-doped Mg-AlGaN layer. The hole layer is of a periodic structure of a P-type AlInGaN layer and an MgN layer and is formed in an Mg source pulse deposition mode. According to the structure, the multi-cycle heterogeneous layer design is combined with doping regulation and deposition process optimization, the Mg acceptor activation rate and the hole injection efficiency are improved, the defect density and the electron leakage are reduced, and the structure is suitable for being applied to a small-current Micro LED.
Owner:JUCAN PHOTOELECTRIC TECH (SUQIAN) CO LTD

Semiconductor device and method of use

PendingCN120456583AAcceptorDevice material
The invention discloses a semiconductor device and a use method, the semiconductor device comprises a substrate, a storage function area and a control function area, and the substrate comprises a substrate, a buffer layer, a channel layer and a barrier layer which are stacked in sequence; the storage function region is arranged on one side, away from the substrate, of the barrier layer, the storage function region comprises a source electrode, a grid control electrode and a drain electrode which are arranged at intervals in the first direction, and the grid control electrode comprises a first cap layer, a first ohmic electrode and a grid electrode which are stacked in the thickness direction of the substrate; the first cap layer and the barrier layer are arranged in a contact mode, the first cap layer is acceptor type doping, and the first ohmic electrode and the grid electrode are arranged in an insulated mode; the control function area is arranged on the side, away from the substrate, of the barrier layer and comprises a first electrode and a second electrode which are arranged at intervals in the first direction, the first electrode is electrically connected with the source electrode, and the second electrode is electrically connected with the first ohmic electrode.
Owner:PEKING UNIV

D-A type green light TADF material and application thereof in OLEDs

The invention belongs to the technical field of luminescence and display, and particularly relates to a D-A type green light TADF material and application thereof in OLEDs. The luminescent material comprises an oxygen bridge triphenylboron acceptor unit and oxygen bridge triphenylamine which are used as donor units, and a green light TADF material is constructed through simple coupling. The rigid large plane structure of the material limits rotation of a benzene ring, vibration relaxation of a condensed ring structure is reduced, and the photoluminescence efficiency as high as 90% is obtained. Research results show that the maximum emission peak of the device is 518 nm and the maximum external quantum efficiency (EQE) of the device is 37.8% under different doping concentrations when the OLEDs are processed by the solution, especially under the doping concentration of 5-100%, the electrogenerated emission peak change of the device is small, the EQE of 30% or above is kept, the excellent concentration quenching inhibition performance is shown, and the application prospect is attractive.
Owner:CHANGZHOU UNIV

Deep ultraviolet laser epitaxial structure and epitaxial growth method thereof

According to the deep ultraviolet laser epitaxial structure and the epitaxial growth method thereof provided by the invention, the Al component of the first waveguide layer is linearly and progressively increased from the side close to the electron injection layer to the side close to the quantum well active layer; or the Al component of the second waveguide layer is linearly and progressively decreased from the side close to the quantum well active layer to the side close to the hole injection layer to form refractive index distribution which takes the barrier layer of the quantum well active layer as the highest refractive index point and gradually decreases towards one side (the n-type side or the p-type side), so that the light field is firmly bound near the quantum well active layer, and the light limiting capability is remarkably enhanced; meanwhile, high-low Al components of the p-type side (the second waveguide layer) gradually change to generate a strong polarization electric field, ionization of a p-type doped acceptor (such as Mg) can be promoted, two-dimensional hole gas (2DHG) can be induced, and the hole concentration is improved; the low-high Al components of the n-type side (the first waveguide layer) are gradually changed, so that two-dimensional electron gas can be induced, and the electron concentration is improved.
Owner:WUHAN YOUWEIXIN TECH CO LTD

Method for producing a substrate comprising a deposited buried oxide layer or a deposited buried nitride layer

ActiveDE112008000394B4AcceptorPhysical chemistry
A method for producing a substrate comprising a buried oxide layer (1, 10, 20) or a buried nitride layer for the production of electronic components, comprising at least one step for depositing an oxide layer (1, 10, 20) or a nitride layer on a donor substrate (2, 11, 21) and / or an acceptor substrate, and a step for establishing contact between the donor substrate and the acceptor substrate (9, 14, 22), further comprising at least: a first heat treatment of the oxide layer (1, 10, 20) or the nitride layer deposited on the donor substrate (2, 11, 21) and / or the acceptor substrate (9, 14, 22) before connecting the donor substrate (2, 11, 21) with the Acceptor substrate (9, 14, 22) and a second heat treatment of the substrate, which consists of the acceptor substrate (9, 14, 22), the oxide layer (1, 10, 20) or the nitride layer and the entire donor substrate (2, 11, 21) or a part thereof, at a temperature,which is the same as or higher than the temperature applied in the first heat treatment, wherein the second heat treatment is a compression heat treatment, wherein the first heat treatment consists of applying a temperature of 600 to 1000 °C for a period of a few minutes to a few hours in a non-oxidizing inert gas or a mixture of inert gases.
Owner:SOITEC SA

Intelligent vision system based on photon-modulated electrochemical doping

PCT designated stage expiredWO2025165381A2AcceptorComputational physics
An intelligent vision system, including a training array of photonic-organic electrochemical transistor (POECT) devices, each including a substrate, three terminals including a gate, a drain, and a source disposed over the substrate, wherein space between the drain and the source forms a channel, an electrolyte in fluid and electrical communication with the gate and the channel, wherein the channel is formed of a photoactive layer composed of donor-acceptor bulkheterojunction interfaces, each POECT device of the training array provides a memory feature when exposed to light, wherein an image to be recognized is imprinted on the training array by exposing the training array with light corresponding with the image to be recognized, and a discriminator configured to compare the training array with a test model associated with an image to be tested against the image to be recognized, wherein the discriminator signals a match or a mismatch based on a comparison.
Owner:PURDUE RES FOUND

Asymmetric donor material with different fluorine contents as well as preparation method and application of asymmetric donor material

The invention relates to the technical field of organic photoelectric materials, in particular to asymmetric donor materials with different fluorine contents as well as a preparation method and application of the asymmetric donor materials, and discloses organic small molecule donor materials with different fluorine atom-containing asymmetric two-dimensional side chains, Z-2F for short, the structural formula of the organic small molecule donor materials is shown as a formula 1, and a preparation method of the donor materials. The application of the donor material in preparation of functional energy devices including solar cells, organic light-emitting diodes and flexible displays, including application in the field of water surface photovoltaics, the designed fluorine atom-containing micromolecule donor material and the acceptor material L8-BO form a proper energy level difference, and the functional energy devices can be applied to the field of water surface photovoltaics. Therefore, exciton dissociation is facilitated, and better photovoltaic performance and wider water surface photovoltaic application are achieved in organic solar cell testing.
Owner:JIANGHAN UNIVERSITY

Organic semiconductor material and organic field effect transistor

The invention relates to the technical field of photosensitive sensing, and discloses an organic semiconductor material and an organic field effect transistor, the organic semiconductor material comprises a main body transmission material and a photosensitive doping material, the photosensitive doping material comprises a donor and an acceptor, the lowest unoccupied molecular orbital energy level of the main body transmission material is higher than the highest occupied molecular orbital energy level of a donor of the photosensitive doping material; the lowest unoccupied molecular orbital energy level of the main body transmission material is lower than the lowest unoccupied molecular orbital energy level of an acceptor of the photosensitive doped material; the highest occupied molecular orbital energy level of the host transport material is lower than the highest occupied molecular orbital energy level of the donor of the photosensitive doped material. The organic semiconductor material has a light negative response characteristic.
Owner:TSINGHUA UNIVERSITY

Tin atom-containing asymmetric donor material as well as preparation method and application thereof

The invention relates to the technical field, in particular to an asymmetric donor material containing tin atoms and a preparation method and application of the asymmetric donor material, the structural formula of the asymmetric donor material is shown in the formula 1, and in the structural formula # imgabs0,-X is a fluorine atom or a chlorine atom; the tin atom-containing small molecule donor material designed by the invention can form a proper energy level difference with an acceptor material L8-BO, which is beneficial to exciton dissociation, and has better photovoltaic performance in the test of organic solar cells, and the small molecule has a clear molecular structure in the full-small molecule organic solar cells, so that the application range of the small molecule donor material is widened, and the application range of the small molecule donor material is widened. And the difference between the material and the device batch is very small, so that the method has unique advantages in the commercialization aspect. The method is of great significance for constructing a high-efficiency organic solar cell system.
Owner:JIANGHAN UNIVERSITY

Multi-layer release stack for light induced transfer of components

ActiveUS20250204119A1AcceptorLight beam
A method and system for light induced transfer of components (15) from a donor substrate (10) to an acceptor substrate (20). The donor substrate (10) comprises a transparent carrier (11) configured to carry the components (15) facing the acceptor substrate (20), and a release stack (S). The release stack (S) comprises a light-absorbing layer (12), a decomposition layer (16), a melt layer (13), and an adhesive layer (14). The light-absorbing layer (12) has a high absorption coefficient for absorbing the light beam (L) causing heat conduction to the melt layer (13). The light-absorbing layer (12) remains solid while the melt layer (13) is melted. The adhesive layer (14) adheres the components (15) to the melt layer (13) while the melt layer (13) is solid and releases adhesion when the melt layer (13) is melted (M). The decomposition layer (16) has an evaporation temperature above the melting temperature of the melt layer, and forms a bubble (17) stimulating the release and transfer when the melt layer 913) is liquid.
Owner:NEDERLANDSE ORG VOOR TOEGEPAST NATUURWETENSCHAPPELIJK ONDERZOEK TNO

Organic electroluminescent materials and devices

The invention relates to organic electroluminescent materials and devices. An organic light emitting device (OLED) is provided, which sequentially comprises an anode; a hole transport layer; an emission region; an electron transport layer; and a cathode. In the OLED, the emission region comprises a compound S1 and a compound A1, where the compound S1 is an organometallic sensitizer that transfers energy to the compound A1, and the compound A1 is an acceptor that is an emitter; the compound A1 has an emission starting point greater than 750 nm; and the PLQY of the emission region containing both compound S1 and compound A1 is greater than the PLQY of the equivalent emission region not containing compound A1. Also provided are consumer products containing the OLEDs.
Owner:UNIVERSAL DISPLAY CORP

Biasing and readout methods for high-speed resistive gate sensor

Photon or electron detectors may include polycrystalline silicon resistive gates with voltage gradients applied to reduce lag and improve operating speeds. The polycrystalline silicon resistive gates may be doped polycrystalline silicon which is heavily doped with donor atoms or acceptor atoms and ion-implanted with an electrically inactive species. The electrically inactive species may be implanted in a pattern to form multiple ion-implanted regions with different resistivities. The ion-implanted regions are formed in select patterns to control the resistivity of the polycrystalline silicon resistive gates and to modify the lateral electric field across the differentially-biased polycrystalline silicon resistive gate. The X-ray detectors may also include a circuit element with a current-mode differential connection to improve clock feedthrough and power dissipation characteristics.
Owner:KLA CORP

Compound, preparation method thereof and electronic device

The invention discloses a compound and a preparation method thereof and an electronic device, the molecular structure general formula of the compound is shown in the specification, R is selected from one of the following structures, X1-X2 are respectively and independently selected from one of oxygen atoms, sulfur atoms, selenium atoms and nitrogen atoms, and X is a positive integer. X < 3 > to X < 4 > are respectively and independently selected from one of the following structures; and X < 5 > to X < 6 > are respectively and independently selected from any one of alkyl groups. According to the compound provided by the invention, the electron pushing and pulling capability in the compound is adjusted by changing the structures of a donor and an acceptor, so that the purpose of regulating and controlling molecular electron cloud distribution and energy level is achieved, and key physical properties such as emission wavelength, radiative transition rate (kr) and backlash crossing rate (kRISC) of a material are systematically regulated and controlled. The compound as a guest material of a luminescent layer has good comprehensive performance when being applied to organic electroluminescent devices for solution processing and vacuum evaporation.
Owner:SHENZHEN UNIV

Semiconductor device and method for manufacturing the same

A nitride-based semiconductor device includes a substrate, a buffer, a first nitride-based semiconductor layer, a second nitride-based semiconductor layer, a S / D electrode, a second S / D electrode, and a gate electrode. The buffer is disposed over the substrate and includes at least one layer of a nitride-based semiconductor compound doped with an acceptor at a top-most portion of the buffer. The first and second nitride-based semiconductor layers are disposed over the buffer. The first S / D electrode is disposed over the second nitride-based semiconductor layer, in which the first S / D electrode extends downward to a position lower than the first nitride-based semiconductor layer, so as to form at least one first interface with the top-most portion of the buffer, making contact with the at least one layer of the nitride-based semiconductor compound. The second S / D electrode and the gate electrode are disposed over the second nitride-based semiconductor layer.
Owner:INNOSCIENCE (SUZHOU) TECH CO LTD

Metal complex type non-fullerene electron acceptor material, preparation method and application

The invention discloses a metal complex type non-fullerene electron acceptor material, a preparation method and application, and relates to the technical field of organic photovoltaic devices, the novel metal complex type non-fullerene electron acceptor material is designed and synthesized by introducing metal ions into non-fullerene acceptor molecules. By reasonably designing the structure of the metal complex, the extinction coefficient of the material is remarkably improved, so that the material has higher light absorption capacity under unit thickness, and the light capture efficiency is improved. Heavy metal elements in the metal complex have relatively long excited state life and relatively strong carrier migration characteristics, so that the life of a photon-generated carrier is effectively prolonged, the recombination loss is reduced, and the photoelectric conversion efficiency is further improved. By introducing the metal complex, the charge transmission performance of a non-fullerene receptor is enhanced, the problems of short exciton diffusion distance and high exciton recombination rate in a traditional organic semiconductor material are solved, and photon-generated carriers can be effectively separated and migrated in a thin active layer.
Owner:SHANDONG UNIV

A thin film with epsilon phase gallium oxide heteroepitaxial structure and a preparation method thereof

The application provides a thin film with an epsilon phase gallium oxide hetero-epitaxial structure and a preparation method thereof, which comprises, from bottom to top, a substrate layer, a first gallium oxide layer and a second gallium oxide layer; the first gallium oxide layer is an epsilon phase gallium oxide layer doped with magnesium Mg, and the magnesium Mg doping acts as an acceptor type trap in the epsilon phase gallium oxide, effectively compensates for the donor type defects of the epsilon phase gallium oxide, and improves the overall resistivity of the epsilon phase gallium oxide thin film. The preparation method adopts a metal organic chemical vapor deposition method, and the growth temperature of the second gallium oxide layer is higher than that of the first gallium oxide layer; and the molar flow ratio of the magnesium source to the gallium source is controlled to be 0.0001-0.1 during preparation. The application introduces appropriate Mg doping through a nucleation layer stage, so that the Mg acts as an acceptor type trap to compensate for donor type defects, while improving the crystal nucleation quality, reducing dislocations and leakage channels, and realizing the dual optimization of the crystal quality and electrical performance of the epsilon phase gallium oxide thin film, thereby effectively reducing the thin film leakage current and improving the resistivity.
Owner:SUN YAT SEN UNIV

An organic ferroelectric eutectic material, a preparation method and application thereof

ActiveCN121554483BCrystal systemAcceptor
This invention provides an organic ferroelectric eutectic material, its preparation method, and its applications, relating to the field of ferroelectric materials technology. The organic ferroelectric eutectic material constructs a crystal system with "rigid constraint and flexible adaptation coexisting, dipole order and controllable polarization synchronously" through "molecular selection-supramolecular assembly-crystal structure regulation," achieving a synergistic effect of high Curie temperature, strong polarization characteristics, and excellent flexibility. The preparation method of the organic ferroelectric eutectic material utilizes a simplified "solvent dissolution-solvent evaporation" process, leveraging the mediating effect of the solvent to promote the supramolecular self-assembly of donor and acceptor molecules. This achieves the preparation of an organic ferroelectric eutectic material possessing both high Curie temperature, strong polarization characteristics, and excellent flexibility. The preparation method has multiple advantages, including "stable process, low cost, and suitability for large-area processing," making it a simple, efficient, and universally applicable preparation method suitable for large-scale industrial production.
Owner:NINGBO INST OF MATERIALS TECH & ENG CHINESE ACAD OF SCI

Method for producing perovskite-type single crystal, and perovskite-type single crystal

The invention relates to a method for producing a perovskite-type single crystal, and a perovskite-type single crystal. Provided are: a single crystal which exhibits a high electromechanical coupling coefficient and a high coercive field when used in a piezoelectric element; and a method for producing the single crystal. The method is a method for producing a perovskite-type single crystal, in which a first single crystal of a perovskite type is prepared by firing a raw material containing an acceptor in an air atmosphere, a step (2) including firing the first single crystal in a reducing atmosphere, and a step (3) including firing the single crystal prepared in step (2) in an air atmosphere, in this order, a perovskite-type single crystal having a higher coercive field value than a first single crystal is prepared.
Owner:CANON KK

Metal complex acceptor material, exciplex thereof and application

The invention relates to a metal complex acceptor material, an exciplex thereof and application. The invention relates to a metal complex acceptor material, which is a compound with a structure as shown in a formula (I), the metal complex acceptor material is matched with an organic donor material to form an exciplex luminescent material, the exciplex luminescent material is applied to an organic light-emitting diode, the driving voltage is lower, the luminous efficiency is higher, and the service life of a device can be prolonged. The compound has potential to be applied to the field of organic electroluminescent devices. # imgabs0 #
Owner:ZHONGKAI UNIV OF AGRI & ENG

Method for manufacturing piezoelectric layer on substrate

The invention relates to a method for producing a piezoelectric layer (10) on a substrate (11), characterized in that it comprises the following steps:-forming a pseudo-seed layer (102) of a first piezoelectric material on a donor substrate (100) by a first epitaxy; -transferring the seed layer (102) and a portion (103) of the donor substrate (100) onto the acceptor substrate (110) via at least one electrically insulating layer and / or at least one electrically conductive layer (105) adapted to allow relaxation of the seed layer; -removing the transferred portion (103) of the donor substrate (100) in order to expose the surface of the seed layer (102); -forming a single crystal layer (104) of a second piezoelectric material on the seed layer (102).
Owner:SOITEC SA

Donor-receptor complementary co-doped hafnium oxide-based ferroelectric film material and preparation method thereof

The embodiment of the invention discloses a donor-receptor complementary co-doped hafnium oxide-based ferroelectric film material and a preparation method thereof. The method comprises the following steps: according to the composition of the donor-receptor complementary co-doped hafnium oxide-based ceramic target material, mixing raw material powder to obtain mixed raw material powder; calcining the mixed raw material powder under a preset condition; pressing and molding the calcined product into a target material green body; and sintering the target material green body to obtain the donor-receptor complementary co-doped hafnium oxide-based ceramic target material. Wherein the composition of the donor-acceptor complementary co-doped hafnium oxide-based ceramic target material is expressed as AxByHf (1-x-y) O2, A is a donor and comprises elements niobium and tan, and B is an acceptor and comprises elements yttrium and lanthanum; x is more than 0.01 and less than 0.05, and y is more than 0.01 and less than 0.05; the raw material powder containing the donor comprises niobium oxide and tantalum oxide, and the raw material powder containing the acceptor comprises yttrium oxide and lanthanum oxide; and taking the donor-acceptor complementary co-doped hafnium oxide-based ceramic target material as a sputtering target, and obtaining the donor-acceptor complementary co-doped hafnium oxide-based ferroelectric material film by using a pulse laser deposition method.
Owner:UNIV OF SCI & TECH BEIJING

Optically detectable label and marker

An optically detectable label (102, 500) is provided comprising a nucleic acid backbone (108, 504) comprising multiple attachment positions (306, 308, 506a, 506b, 506c, 506d) including at least a first attachment position and a second attachment position. The optically detectable label (102, 500) further comprises multiple labelling moieties (106a, 106b, 106c, 106d, 106e, 310, 312, 502a, 502b, 502c, 502d), including at least a first labelling moiety and a second labelling moiety, each labelling moiety (106a, 106b, 106c, 106d, 106e, 310, 312, 502a, 502b, 502c, 502d) attached to a different one of the attachment positions (306, 308, 506a, 506b, 506c, 506d) of the nucleic acid backbone (108, 504). The first labelling moiety and the second labelling moiety are configured to form an energy transfer donor and acceptor pair. Further, the nucleic acid backbone (108, 504) has at least a first spatial state (300, 500a) and a second spatial state (322, 500b), wherein in the first spatial state the attachment position to which the first labelling moiety and the attachment position to which the second labelling moiety are attached to, are in proximity in order to enable an energy transfer between the first labelling moiety and the second labelling moiety. Moreover, the nucleic acid backbone (108, 504) is in the first spatial state (300, 500a) when a first staple strand (302, 510, 512) is bound to the nucleic acid backbone (108, 504). In further aspects, a marker (100) comprising the optically detectable label (102, 500) is provided and a method for analysing a biological sample.
Owner:LEICA MICROSYSTEMS CMS GMBH

SiC LDMOS device, manufacturing method and chip

PendingCN121586275ALDMOSAcceptor
The embodiment of the invention provides a SiC LDMOS device, a manufacturing method and a chip. The SiC LDMOS device comprises a P-type substrate; the N-type buried layer is located in the P-type substrate; the N-type epitaxial layer is located on the surface of the P-type substrate and the surface of the N-type buried layer; the P-type injection layer is located in the N-type epitaxial layer, and the bottom of the P-type injection layer is connected with part of the surface of the N-type buried layer; the P-type body region is located in the N-type epitaxial layer and extends into the P-type substrate; and the N-type buffer layer is located in the P-type injection layer and extends into the N-type buried layer. When the device is in a reverse withstand voltage state, the drift region is depleted, ionization donors in the P-type injection layer and the P-type substrate emit power lines and point to ionization acceptors of the N-type buried layer and the N-type epitaxial layer, the N-type epitaxial layer and the N-type buried layer are mutually overlapped, electric field distribution in the drift region of the device can be effectively adjusted, an electric field peak is introduced to the surface of the drift region of the device, and the device is prevented from being damaged. And the overall electric field of the drift region is lifted, so that the voltage resistance of the device is improved.
Owner:GREE ELECTRIC APPLIANCE INC OF ZHUHAI

Nitride semiconductor device

To reduce an on-resistance while maintaining a gate-drain breakdown voltage, in a bidirectional switch.SOLUTION: A nitride semiconductor device 10 includes a bidirectional switch 12. The bidirectional switch 12 includes a semiconductor substrate 40, a first nitride semiconductor layer 42, a second nitride semiconductor layer 44 having a bandgap larger than that of the first nitride semiconductor layer 42, a first drain electrode 28 and a second drain electrode 30 which contact the second nitride semiconductor layer 44, a third nitride semiconductor layer 50 containing acceptor-type impurities, and a gate electrode 26 located above the third nitride semiconductor layer 50. The third nitride semiconductor layer 50 includes a ridge part 54 contacting the gate electrode 26 and an extension part 56 thinner than the ridge part 54. The extension part 56 includes a first extension region 56A extending from the ridge part 54 toward the first drain electrode 28, and a second extension region 56b extending from the ridge part 54 toward the second drain electrode 30.SELECTED DRAWING: Figure 5
Owner:ROHM CO LTD

Novel ferroelectric nematic liquid crystal materials and compositions thereof

The present application relates to ferroelectric nematic liquid crystal (FNLC) compounds characterized by chemical structures having electron donor–acceptor chromophores connected via linkers. The compounds have a general structure of A1–L1–A2–L2–(Ax–Ly)n–B, where A and B are aryl or heteroaryl groups, and L are linkers selected to promote spontaneous polar alignment in the nematic phase. The FNLCs enable enhanced second-order nonlinear optical properties and electro-optic coefficients (r33), with values exceeding, e.g., 30 pm / V in some embodiments. The FNLC compounds also exhibit absorption maxima above 400 nm, indicating extended π-conjugation and strong intramolecular charge transfer. The present application also includes compositions and mixtures of such compounds, which may form glassy ferroelectric nematic phases suitable for integration into nonlinear optical devices.
Owner:POLARIS ELECTRO-OPTICS INC

Laser-assisted heterogeneous bonding stripping method, heterogeneous bonding structure and optical element

PendingCN121925047AAcceptorLaser scanning
The invention relates to a laser-assisted heterogeneous bonding stripping method, a heterogeneous bonding structure and an optical element, and the method comprises the following steps: preparing an acceptor substrate and a donor substrate which is provided with a first surface and a second surface which are opposite to each other; bonding the to-be-bonded surface of the receptor substrate with the second surface; focusing laser on a preset stripping surface in the donor substrate from the first surface, and performing laser scanning so as to sequentially form a plurality of modified points on the preset stripping surface; after the laser scanning is completed, stripping the donor substrate along the preset stripping surface to obtain a heterogeneous bonding structure comprising an acceptor substrate and a donor film bonded on the acceptor substrate, and the residual donor substrate; the heterogeneous bonding structure is prepared by the laser-assisted heterogeneous bonding stripping method. The optical element comprises the heterogeneous bonding structure. The method provided by the invention has the effect of realizing high-efficiency, high-quality and low-cost manufacturing of a normal-temperature, high-efficiency and lossless heterogeneous bonding structure.
Owner:MOLDNANO (HANGZHOU) TECHNOLOGY CO LTD