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8568 results about "Manufacturing cost reduction" patented technology

Wide-angle irradiation feed source device with parasitic matched media and microwave antenna

The invention relates to a wide-angle irradiation feed source device with parasitic matched media and a microwave antenna. The wide-angle irradiation feed source device with the parasitic matched media comprises components such as guided wave media, the parasitic matched media, metal reflecting surfaces, reflective matching steps and the like. The parasitic matched media are arranged on the lateral surfaces of the guided wave media. The metal reflecting surfaces are formed on the upper surfaces of the guided wave media. The reflective matching steps are positioned at the bottom ends of the metal reflecting surfaces. Primary reflecting regions are positioned between the guided wave media and the parasitic matched media. Secondary reflecting regions are positioned outside the parasitic matched media, and are parallel to the primary reflecting regions. One end of each circular waveguide is inserted between the corresponding guided wave medium and the corresponding parasitic matched medium. The microwave antenna comprises a paraboloid and the wide-angle irradiation feed source device with the parasitic matched media. One end of the wide-angle irradiation feed source device with the parasitic matched media is fixed at the top end of the paraboloid. The feed source device provided by the invention is in fit with the short-focus paraboloid to realize the high-performance and low-profile microwave antenna, and the manufacturing cost is effectively reduced.
Owner:赵铭

Rectangular contact lithography for circuit performance improvement and manufacture cost reduction

An optical lithography method is disclosed that uses double exposure of a reusable template mask and a trim mask to fabricate regularly-placed rectangular contacts in standard cells of application-specific integrated circuits (ASICs). A first exposure of the reusable template mask with periodic patterns forms periodic dark lines on a wafer and a second exposure of an application-specific trim mask remove the unwanted part of the dark lines and the small cuts of the dark lines left form the rectangular regularly-placed contacts. All contacts are placed regularly in one direction while unrestrictedly in the perpendicular direction. The regular placement of patterns on the template mask enable more effective use of resolution enhancement technologies, which in turn allows a decrease in manufacturing cost and the minimum contact size and pitch. Since there is no extra application-specific mask needed comparing with the conventional lithography method for unrestrictedly-placed contacts, the extra cost is kept to the lowest. The method of the invention can be used in the fabrication of standard cells in application-specific integrated circuits (ASICs) to improve circuit performance and decrease circuit area and manufacturing cost.
Owner:THE UNIVERSITY OF HONG KONG

Blower

The object of the present invention is to provide a blower including a bearing structure wherein the number of components is reduced, the cost for manufacturing can be reduced, and the diameter of the shaft can be increased. The bearing structure is good at its durability, eliminates or reduces the rotational run out, and provides superior quietness. The blower of the present invention having an impeller adapted to be rotated upon energizing the blower comprising; a bearing device for supporting a rotational center portion of the impeller, the bearing device including; a sleeve, a stepped shaft including a larger diameter portion and a reduced diameter portion provided at one end thereof, the first inner raceway groove formed at an appropriate position around the outer peripheral surface of the larger diameter portion, the first outer raceway groove formed on an inner peripheral surface of the sleeve so as to correspond with the first inner raceway groove, balls of the first row interposed between the first and second grooves, an inner ring slidably fit over the reduced diameter portion, the second inner raceway groove formed around an outer peripheral surface of the inner ring, the second outer raceway groove formed on the inner peripheral surface of the sleeve so as to correspond with the second inner raceway groove, balls of the second row interposed between the second inner and outer raceway grooves, a stop ring provided around the inner periphery of the distal end of the reduced diameter portion, and a pre-loading spring interposed between the stop ring and an end surface of the inner ring to provide a suitable amount of pre-loading force to the inner ring.
Owner:MINEBEA CO LTD

Ink cartridge and printer using the same

In an ink jet printer of the present invention, in order to reduce the manufacturing cost, an inexpensive EEPROM enabling only sequential accesses is applied for storage elements incorporated in a black ink cartridge and a color ink cartridge. The data array of a memory cell included in each of the storage elements mounted on the ink cartridges is determined in such a manner that a second storage area, in which rewritable data, for example, data on remaining quantities of inks in the ink cartridge, are stored, is accessed prior to a first storage area, in which read only data are stored. This configuration enables the rewritable data to be securely written into the second storage area even after a power-off operation. The second storage area has two memory divisions allocated to each ink, that is, a first ink remaining quantity memory division and a second ink remaining quantity memory division. Latest data on the remaining quantity of each ink is alternately written into these two memory divisions. Alternatively, the latest data on the remaining quantity of each ink is written into these two memory divisions in a duplicated manner. Each ink remaining quantity memory division has a write complete flag to determine whether or not a writing operation has been completed normally in the ink remaining quantity memory division. This arrangement enables the remaining quantities of the respective inks to be monitored accurately and continuously.
Owner:SEIKO EPSON CORP

Bead-chain driven double-glazed built-in shutters

The invention discloses a bead chain driving type double-layer hollow glass built-in louver and belongs to the technical field of sunshade hollow glass products. The louver comprises a window body, a curtain piece turning mechanism, a venetian blind, an inner control mechanism, an outer control mechanism and a venetian blind lifting traction rope. The window body comprises an upper window body transverse tube, a lower window body transverse tube, a left window body longitudinal tube, a right window body longitudinal tube, inner glass and outer glass. The louver is characterized in that the inner control mechanism comprises a box body, a box cover, a synchronous belt pulley, a synchronous belt and a lifting traction rope driving wheel. The outer control mechanism comprises a protective cover, a friction plate, a bead chain wheel shaft, a bead chain wheel shaft hub, a bead chain and a bead chain wheel shaft base. The protective cover forms a protective cover cavity. The friction plate is arranged in the protective cover cavity. The bead chain wheel shaft hub is supported by a shaft hub cavity. The bead chain wheel shaft is arranged in the middle of the bead chain wheel shaft hub. One end of the bead chain is arranged on the bead chain wheel shaft hub in a sleeving mode. The other end of the bead chain forms a suspending end. The bead chain wheel shaft base is matched with the protective cover. One end of the venetian blind lifting traction rope is in driving connection with a lifting traction rope driving wheel. Manufacturing cost is reduced; labor is saved during operation; service life is long, and the using effect is good; resource-saving economy is reflected.
Owner:CHANGSHU ZHONGQIN BUILDING MATERIAL
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