Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

46 results about "Single bond" patented technology

In chemistry, a single bond is a chemical bond between two atoms involving two valence electrons. That is, the atoms share one pair of electrons where the bond forms. Therefore, a single bond is a type of covalent bond. When shared, each of the two electrons involved is no longer in the sole possession of the orbital in which it originated. Rather, both of the two electrons spend time in either of the orbitals which overlap in the bonding process. As a Lewis structure, a single bond is denoted as AːA or A-A, for which A represents an element (Moore, Stanitski, and Jurs 329). In the first rendition, each dot represents a shared electron, and in the second rendition, the bar represents both of the electrons shared in the single bond.

Liquid crystal composition, and liquid crystal display including the same

InactiveUS20160230091A1Improve advancedHigh-rate response characteristicLiquid crystal compositionsNon-linear opticsHalogenSingle bond
Disclosed is a liquid crystal composition. The liquid crystal composition includes liquid crystal molecules including at least one of a liquid crystal compound having an alkenyl group and a liquid crystal compound having an alkoxy group, and a first stabilizer including a compound having a structure represented by Formula 1:where n is 0 or 1; m is 0 or 1; k is 0 or 1; Z1, Z2, and Z3 are each independently a single bond, —C═C—, —OCO—, —COO—, —CF2O—, or a C1 to C5 alkylene group; X1, X2, X3, and X4 are each independently hydrogen or halogen; Y is hydrogen, an alkylene group, an alkoxy group, a hydroxyl group, —NHCOCH3, or ═O; and A and B are cyclic compounds.
Owner:SAMSUNG DISPLAY CO LTD

Photosensitive resin composition, resin film having pattern and method for producing same, and semiconductor circuit board

PendingUS20260202742A1PhotosensitizerOrganic group
A photosensitive resin composition contains an alkali-soluble polymer (A), a photosensitizer (B), a crosslinking compound (C) having a crosslinkable group that reacts with a component (D) below by heat, a compound (D) represented by formula (1), and a solvent (E). X11 represents, for example, a nitrogen atom, R11 represents a hydrogen atom or a group represented by formula (2). L21 represents, for example, a single bond, R21 represents, for example, a hydrogen atom, R22 represents a monovalent organic group, and n21 to n23 represent an integer of 0 or more. At least one of three R11's is represented by formula (2), and in at least one group represented by formula (2), n21 is an integer of 1 or more, and at least one R21 is a hydrogen atom.
Owner:JSR CORPORATION

Resist composition, resist pattern formation method, compound, and polymer compound

PCT designated stageWO2026141175A1SolubilityPolymer science
Disclosed is a resist composition that generates an acid upon exposure to light, and of which the solubility in a developer solution is changed by the action of the acid, the resist composition comprising a resin component (A1) of which the solubility in a developer solution is changed by the action of the acid, and the resin component (A1) having a constituent unit (a0) derived from a compound represented by general formula (a0). In the formula, W0 represents a polymerizable group-containing group; X0 represents a hydrogen atom or an alkyl group; Ar01 represents an arylene group that may have a substituent; L01 represents a single bond or a divalent linking group; Rpg0 represents an acid-dissociable group; and n0 represents an integer of 2 or greater as long as permitted by the valence.
Owner:TOKYO OHKA KOGYO CO LTD

Particles, composition, molded article, and low-dielectric material

PCT designated stageWO2026116463A1DielectricPolymer science
The present disclosure provides: particles with which a fluororesin can be finely dispersed in a matrix resin; a composition; a molded body; and a low-dielectric material. The present disclosure relates to particles containing: a fluororesin; a compound (I) that has a plurality of groups (A) and is represented by formula (I); and a compound (II) that is capable of reacting with the compound (I) (In the formula, R1 and R2 are the same or different, are each hydrogen or an organic group, and may bond to each other to form a ring structure; and the double line represented by a solid line and a broken line represents a single bond or a double bond.).
Owner:DAIKIN INDUSTRIES LTD +1

Compound and application thereof

The invention discloses a compound and application thereof, and belongs to the technical field of display. The chemical structural formula of the compound is as follows: Ar1-Ar2 is C6-C30 aryl or C3-C30 heteroaryl, and Ar3 is one of the following chemical structural formula a-e: chemical formula a, chemical formula b, chemical formula c, chemical formula d and chemical formula e; at least one of Z1-Z3 is N, and the balance is CH; each of L1 and L2 is a single bond, a C6-C30 arylene group or a C3-C30 heteroarylene group; l3 is a single bond, O, S, Se or; r1 to R8 are respectively and independently hydrogen, deuterium, fluorine, alkyl of C1 to C10 or aryl of C6 to C30; the ring A, the ring B and the ring C are C6-C30 arylene groups or C3-C30 heteroarylene groups; and n is an integer of 0-4. The compound can be used as an electron transport material and a hole blocking material, so that the voltage, the efficiency and the cycle life of an OLED (Organic Light Emitting Diode) device are improved.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD +1

Composition for forming protective film, protective film, method for manufacturing substrate, and method for manufacturing semiconductor device

PCT designated stageWO2026141539A1Hydrogen atomDevice material
A composition for forming a protective film, the compositing comprising: a polymer having a repeating unit represented by formula (1) and a repeating unit represented by formula (2); and a solvent. (In formula (1), R1 represents a hydrogen atom or a C1-4 alkyl group. X1 represents -O- or -NH-. R11 represents a single bond or a C1-30 divalent group. n represents an integer from 2 to 5. In formula (2), R2 represents a hydrogen atom or a C1-4 alkyl group. X2 represents -O- or -NH-. R21 represents a C1-20 divalent group, provided that the OH group bonded to R21 is bonded to a nonaromatic carbon atom of R21.)
Owner:NISSAN CHEM CORP

Etching liquid, etching method, and method for manufacturing semiconductor device

PendingUS20260182282A1Device materialActive agent
The present disclosure relates to an etching liquid comprising: an alkaline compound (A); and at least one compound (B) selected from the group consisting of a thiol compound (B1) and a nonionic surfactant (B2) represented by Formula (1) below, wherein ER110 / ER100≥0.5, where ER110 is an etching rate of a (110) plane of a silicon crystal, and ER100 is an etching rate of a (100) plane of the silicon crystal, R1XO—(CmH2mO)n—R2 (1), where R1 is an alkyl group having 7 or more carbons, R2 is a hydrogen atom or an alkyl group, X is a single bond or a phenylene group, m is an integer of 1 to 6, and n is from 4 to 25.
Owner:MITSUBISHI CHEM CORP

Compounds and their applications

This invention discloses a compound and its application, belonging to the field of display technology. The chemical structural formula of the compound is shown below: ; wherein, Ar1 and Ar2 are both; or, one of Ar1 and Ar2 is, and the other of Ar1 and Ar2 is a substituted or unsubstituted C6-C12 aryl, substituted or unsubstituted C3-C12 heteroaryl; Ar3 is a halogen, cyano, substituted or unsubstituted C6-C12 aryl, substituted or unsubstituted C3-C12 heteroaryl, substituted or unsubstituted C1-C60 alkyl or alkoxy; A is O, S or Se; L represents a single bond, a substituted or unsubstituted C6-C12 arylene, or a substituted or unsubstituted C3-C12 heteroarylene; Z1 to Z4 are each independently N or CR5. OLED devices prepared based on this compound have lower operating voltage, higher efficiency, and longer cycle life.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD +1

Photoacid generator compound, photoresist compositions including the same, and pattern formation methods

PCT designated stageWO2026142865A1ArylSulfonate
A photoacid generator compound comprising an anion and an iodonium or sulfonium cation, wherein the anion is represented by Formula (1): (1) wherein, in Formula (1), ring Cy1 is a C3-15 monoalicyclic group or a C6-15 polyalicyclic group,; each L1 is independently a single bond or one or more linking groups, wherein L1 is free of fluorine; each X1 is independently -O-, -S-, -N(R2)-, -C(O)-, -S(O)R2-, or -S(O2)R2-, wherein R2 is independently chosen from substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C1-20 heteroalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; each Z1 independently comprises an anion stabilizing group, wherein at least one Z1 is configured to form an intramolecular non-covalent bond with the sulfonate anion group to form a ring having from 5 to 8 ring atoms, wherein the remaining substituents are as provided herein.
Owner:DUPONT ELECTRONIC MATERIALS INT LLC

Polypropylene composition containing a new charge-stabilizing agent for electret melt blown webs

A polypropylene composition (PC) comprising: a. from 95.0 to 99.99 wt.-%, of a polypropylene (PP), preferably a propylene homopolymer (HPP); and b. from 0.01 to 5.0 wt.-%, of a compound according to Formula (I), wherein each R is independently selected from C1 to C6 alkylene, C2 to C6 alkenylene and a single bond, each R′ is independently selected from H and C1 to C6 alkyl, each R″ is independently selected from H and C1 to C22 alkyl, wherein each alkylene, alkenylene and alkyl group may optionally be substituted by deuterium or fluorine, and the two substituents on the central benzene ring may be either positioned in an ortho, meta or para relationship; wherein the polypropylene composition (PC) has an MFR2 of from 400 to 5000 g / 10 min and a melting temperature Tm of from 140 to 170° C.
Owner:BOREALIS AG

Pigment, method for producing the same, solution, method for evaluating metal hydroxyl group amount, method for evaluating metal hydroxyl treatment rate

ActiveCN118765310BThio-Single bond
The pigment of the present application is a compound represented by the following general formula (1) or the following general formula (2). (In the following formulae, M is Sn or Ge, X is C or N, R1 is an alkyl group or a phenyl group, Y1 and Y2 are each hydrogen, a halogen group, a methyl group, an alkoxy group, a phenyl group, a diphenyl amido group, a thio phenyl group, or a phenyl ethynyl group, Z is represented by a single bond or the following formula (3). R2 is an alkyl group or a phenyl group.)
Owner:SUMITOMO OSAKA CEMENT CO LTD +1

A Pyrazolo[1,5-a]Pyrimidine compound.

UndeterminedPK141407ABenzeneAryl
The present invention provides a pyrazolo[1,5-a]pyrimidine compound, having CB receptor-antagonizing activity, of the following formula [I]: in which R1 and R2 are the same or different and each an optionally substituted aryl group etc, R0 is hydrogen atom, an alkyl group etc, E is a group of the formula: -C(=0)- or SO2-, R is a group of the following formula [i], [ii] or [iii] etc: Ring A is (a) a C3-8 cycloalkyl group optionally fused to a benzene ring or (b) a benzene ring, Q is a single bond or a methylene group, Ring B is a 4- to 7-membered aliphatic heterocyclic group, said cyclic group binding via its ring-carbon atom to the adjacent nitrogen atom, X is sulfur atom etc, R3 is an alkyl group optionally substituted by an alkylthio group, R4 is hydrogen atom, an alkyl group etc, one of Ra and Rb is an alkyl group etc, and the other is hydrogen atom, an alkyl group etc.
Owner:TANABE PHARMA CORP

A compound, application thereof and an organic electroluminescence device comprising the same

The present application relates to a kind of compound and its application, and organic electroluminescent device comprising the compound, the compound has the following structure, wherein, Z1 and Z2 are not connected, connected by single bond or connected by chemical bond to form ring A, Z3 and Z4 are not connected, connected by single bond or connected by chemical bond to form ring B, the ring A, ring B each independently selected from one of unsubstituted or R' substituted C6-C60 aryl, unsubstituted or R' substituted C3-C60 heteroaryl, R 11 Single substituent represents the maximum allowable number of substituent groups. The device prepared by using the compound of the present application can achieve higher external quantum efficiency, lower turn-on voltage, narrower half-peak width of red light emission and stable device performance. The present application will continue to promote the development of future high light efficiency, high stability, full light color multiple resonance materials and devices.
Owner:TSINGHUA UNIVERSITY

Resist composition, method for forming resist pattern, and acid diffusion control agent

A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition including a resin component whose solubility in a developing solution is changed by the action of the acid, and a compound represented by General Formula (d0) in which Rd01 represents a monovalent organic group, Rd02 represents a monovalent organic group or a hydrogen atom, and Ld01 represents a single bond or a divalent linking group
Owner:TOKYO OHKA KOGYO CO LTD

Composition for forming resist underlayer film

The present invention provides: a composition for forming a resist underlayer film, which makes it possible to form a good resist pattern while improving sensitivity; and others. This composition for forming a resist underlayer film contains a polymer (A) having a structural unit represented by formula (1) and a solvent. The polymer (A) is contained as a main component among film constituent components of the composition for forming a resist underlayer film. (In formula (1), R1 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. R2 represents a single bond or an alkylene group. R3 represents a blocked isocyanate group.)
Owner:NISSAN CHEM CORP

Compound, material for organic electroluminescent element, organic electroluminescent element, and electronic device

A compound is represented by the following general formula (1). X1, X2, and X3 are each independently nitrogen atoms or C(R) atoms. 31 Y represents a single bond, etc., R1~R8, R 11 ~R 18 R 21 ~R 28 and R 31 Each of the following is independently a hydrogen atom or a substituent, and A1 to A4 are independently hydrogen atoms, cycloalkyl groups, or groups with -C(R) respectively. 901B (R) 902B (R) 903B Groups represented by -Si(R) 901A (R) 902A (R) 903A () indicates a group, aryl or heterocyclic group.
Owner:IDEMITSU KOSAN CO LTD

Fragrance composition and consumer product

The present invention relates to a fragrance composition containing a compound represented by the following general formula (1). (In the formula (1), R1 represents a hydrogen atom, a methyl group, or an ethyl group, and R2 represents a hydroxy group, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. The dotted line represents a single bond or a double bond. In a case where the dotted line is a single bond, X represents a methylene group or a carbonyl group. In a case where the dotted line is a double bond, X represents C—R3 (R3 represents a hydrogen atom, a methyl group, or an ethyl group, where R3 represents a methyl group or an ethyl group in a case where R1 is a methyl group).)
Owner:TAKASAGO INTERNATIONAL CORP

A compound, a liquid crystal composition containing the compound, and a liquid crystal display element, a liquid crystal display

Disclosed are a compound, a liquid crystal composition containing the compound, and a liquid crystal display element and a liquid crystal display. The compound is selected from the group consisting of compounds represented by Formula I, wherein c and d each independently represent 1 or 2, and c+d represents 3; Z1 and Z2 represent a straight chain or branched chain alkyl group having 1 to 15 carbon atoms, wherein at least one -CH2- is substituted with -O-; and Z represents a single bond, a straight chain or branched chain alkyl group having 1 to 15 carbon atoms, wherein one or more non-adjacent -CH2- is substituted with -O-. The liquid crystal composition containing the compound has improved stability against ultraviolet rays and stability against heat, and in particular, has stability against high temperature and high humidity, and at the same time, can ensure normal use in a low temperature environment of -40°C. The liquid crystal display element and the liquid crystal display containing the liquid crystal composition also have the properties as described above.
Owner:SHIJIAZHUANG CHENGZHI YONGHUA DISPLAY MATERIALS CO LTD

Electron-blocking material, organic electroluminescent device, and method of preparation

This application discloses an electron blocking material, an organic electroluminescent device, and a preparation method thereof, belonging to the field of display technology. The general formula of the electron blocking material is: at least one of groups A, B, and C is a group M, and the general formula of group M is: X is selected from C or Si; R is selected from C1-39 alkyl, C1-39 cycloalkyl, C2-39 alkenyl, C2-39 alkynyl, C6-39 aryl, C5-60 heteroaryl, C6-60 aryloxy, C1-39 alkoxy, C6-39 arylamino, C3-39 cycloalkyl, C3-39 heterocycloalkyl, C1-39 alkylsilyl, C1-39 alkylboryl, C6-39 arylboryl, C6-39 arylphosphinyl, C6-39 arylsilyl; L1 is a single bond, a C6-C15 arylene, or a C5-C15 heteroarylene; Ar1 ​​is either a group as indicated by group R, or hydrogen or deuterium. This can improve device efficiency and lifespan.
Owner:BOE TECHNOLOGY GROUP CO LTD

An amine-based compound having a benzophenanthrofuranyl group and an organic light emitting device

ActiveCN117946044BImprove stabilityExtended conjugation propertiesOrganic chemistryLuminescent compositionsFuranBenzo(c)phenanthrene
This invention discloses an amino compound with a benzophenanthrene furan group and an organic light-emitting device, selected from compounds of formula 1: Al-A 10 One of the groups is derived from Formula 2, where * represents a bond connected to the basic skeleton in Formula 1. When A2 is derived from a group in Formula 2, L1 is a para-phenylene group, R1 and R2 are derived from single bonds, substituted or unsubstituted C5-C24 aromatic hydrocarbon groups, substituted or unsubstituted C5-C24 heteroaromatic hydrocarbon groups, and Ar1 and Ar2 are derived from C5-C30 aromatic hydrocarbon groups, substituted or unsubstituted C5-C30 heteroaromatic hydrocarbon groups. In this invention, the triarylamine is para-linked to a transition benzene ring with benzo[a]phenanthrenefuran. This benzene ring linkage enhances the overall stability of the target molecule, strengthens the conjugation of the molecule, and increases the stacking property of the molecule in organic light-emitting materials. This invention also sets phenanthrene, naphthyl, or dibenzothiophene groups on the other two substituents of the triarylamine, affecting the electron affinity and electron transport properties of the triarylamine and further extending its lifespan.
Owner:NANJING TOPTO MATERIALS CO LTD

Compounds and their applications

This invention discloses a compound and its applications, belonging to the field of display technology. The chemical structural formula of the compound is as follows: at least one of Z1-Z6 is N, and the remainder is CH; L1, L2, and L3 are single bonds, C6-C30 arylene, or C3-C30 heteroarylene; Ar1-Ar4 are C6-C30 aryl or C3-C30 heteroaryl, and at least one of Ar1-Ar4 is the following chemical structural formula a: R1-R6 are one of hydrogen, deuterium, fluorine, or C1-C10 alkyl; one of B1-B4 is a linking site, and the remainder are one of hydrogen, deuterium, fluorine, methoxy, C1-C10 alkyl, C6-C30 aryl, or C3-C30 heteroaryl; n is an integer from 0 to 4. This compound is advantageous as an electron transport material and hole blocking material to improve the voltage, efficiency, and cycle life of OLED devices.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD +1

Benzopentacyclic compound and application thereof

The invention discloses a benzo pentacyclic compound and application thereof, and belongs to the technical field of display. The chemical structural formula of the compound is shown in the specification, wherein Ar, R1 to R6 are respectively and independently hydrogen, deuterium, halogen, cyano, nitro, alkyl of C1-C18, alkoxy of C1-C12, substituted or unsubstituted aryl of C6-C30 or substituted or unsubstituted heteroaryl of C3-C30, and R1 to R6 are respectively and independently selected from hydrogen, deuterium, halogen, cyano, nitro, alkyl of C1-C18, alkoxy of C1-C12, substituted or unsubstituted aryl of C6-C30 or substituted or unsubstituted heteroaryl of C3-C30; ar1 and Ar2 are respectively and independently a substituted or unsubstituted C6-C30 aryl group or a substituted or unsubstituted C3-C30 heteroaryl group; each of L1 to L3 independently represents a single bond, a substituted or unsubstituted C6-C60 arylene group, or a substituted or unsubstituted C3-C30 heteroarylene group; at least one of Z1 to Z3 is N, and the balance is CH; a is O, S, Se or CR7R8. The compound has excellent electron transmission performance, and is beneficial to improving the voltage, efficiency and service life of a device.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD +1

PARP1 inhibitor compounds

PARP1 inhibitor compounds have the structure of formula (i). Dashed lines represent single or double bonds, and y is 0, 1, or 2. Each X D Selected from C, O, and N. No more than one X. D It is O. When X D When it is O or N, the ring D is non-aromatic. Each R 1 It does not exist; it is an H or organic group. Each R... 4 It does not exist; it is H; halogen; C(R9)0-3; OR 9 ; or S(R) 9 )1-5. Each R 9 It is an H or an organic group. R 2 and R 3 Each is either an H or an organic group. L is formula (ii). Each X 1 X 3 X 4 and X 5 It is C or N. Each X 2 It is C, N, O, or S. n+m and r+s are 2 to 5. p and q are each 1 to 3. p+q is 2 to 5. Each R 5A R 5B R 5C and R 6 It does not exist; it is H or an organic group. Q 1 and Q 2 Each is an independent bond or linking group. (i)(ii)
Owner:DUKE STREET BIO LTD

Polymerizable compound, liquid crystal composition comprising same and liquid crystal display device

The present invention discloses a polymerizable compound, a liquid crystal composition comprising the polymerizable compound, and a liquid crystal display device. The polymerizable compound is a compound represented by the following formula I, wherein Sp represents a single bond or a C1-C5 linear, branched or cyclic alkyl group, and the Sp groups are not both single bonds, wherein any one or more non-adjacent —CH2— can be replaced by —O—, —S—, —CO—, —CH2O—, —OCH2—, —COO—, —OOC—, or an acrylate group in such a manner that O- or S-atoms are not directly connected with each other, one or more H atoms can be independently replaced by F, C1, or G3, and at least one H atom is replaced by G3; G3 represents a C1-C7 tertiary alcohol structure; and X represents —CH2—, —O—, or —S—. In particular, the polymerizable compound has the advantages of good diffusivity, high stability of the formed polymer, and low residue after a UV process. It can be ensured that a display exhibits excellent IS performance under extreme conditions.
Owner:SHIJIAZHUANG CHENGZHI YONGHUA DISPLAY MATERIALS CO LTD

Copolymers, nonlinear optical materials and electro-optical components

The object of this invention is to provide a copolymer with nonlinear optically active sites capable of forming a crack-free film, a nonlinear optical material comprising the copolymer, and an electro-optical element. The copolymer of this invention is characterized by comprising repeating structural units (A) having adamantyl alkyl groups and repeating structural units (B) having nonlinear optically active sites, as represented by formula (1). (Where R...) 1 W represents a hydrogen atom or a methyl group. 1 Indicates -O-, -S-, or -NH-, L 1 This indicates a divalent hydrocarbon group with 1 to 30 carbon atoms that may contain single bonds, ether bonds, and / or ester bonds, or *-L. 2 -NHC(=O)O- (* indicates W) 1 (bonding end), L 2 Ad represents a divalent hydrocarbon group with 1 to 30 carbon atoms that may contain ether bonds and / or ester bonds; Ad represents an adamantyl group that may be substituted by an alkyl group with 1 to 5 carbon atoms; R represents a divalent hydrocarbon group that may contain ether bonds and / or ester bonds. 2 The alkoxy group represents 1 to 10 carbon atoms bonded to any carbon atom constituting the adamantyl alkyl group, where n represents an integer from 1 to 15. (1)
Owner:OSAKA ORGANIC CHEM INDS +1

Radiation-sensitive composition, pattern forming method, and compound

Provided are a radiation-sensitive composition capable of exhibiting LWR and suppression of development defects at sufficient levels at the time of pattern formation, a pattern forming method, and a compound. A radiation-sensitive composition comprising: a compound represented by formula (1); a polymer including a structural unit having an acid-dissociable group; and a solvent. In the formula, W is a condensed ring structure having a substituted or unsubstituted bridged alicyclic ring and two or more substituted or unsubstituted aromatic rings, each of which is condensed with the bridged alicyclic ring. L is a single bond or a divalent linking group. R1 is -CN, -NO2, -F, -SO2Ra, or -CORb. R2 is a hydrogen atom, -CN, -NO2, -F, -CF2H, -SO2Ra, -CORb, or -Rc. When R1 is -F, R2 does not contain fluorine atom. In R1 and R2, Ra, Rb and Rc are each independently a C1-20 monovalent organic group not containing -CF2- or -CF3. Z+ is a monovalent organic cation.
Owner:JSR CORPORATION

Radiation-sensitive composition, pattern formation method, and compound

Provided is a radiation-sensitive composition or the like capable of exhibiting sensitivity, LWR, CDU, EL, DOF, number of development defects, pattern rectangularity, pattern circularity, and MEEF at sufficient levels during pattern formation. The radiation-sensitive composition contains a compound represented by formula (1), a polymer including a structural unit (I) having an acid-dissociable group, and a solvent. (In the formula, Rz is -F, -CN, -SO2Ra, -CF2H, -SF5 or -CF3. Ra is a hydrogen atom or a monovalent organic group having 1-20 carbon atoms. R1 is -H, -CN, -SF5 or a monovalent organic group having 1-10 carbon atoms. Y is -O- or -NRb-. L is a single bond or a divalent organic group. However, when Rz is -F, the divalent organic group has at most four carbon atoms. W is a monovalent condensed cyclic group or a monovalent condensed cyclic group having a substituent. The condensed cyclic group or the substituent has a hetero atom. Z+ is a monovalent organic cation.)
Owner:JSR CORPORATION

Resist underlayer film-forming composition

The composition of the present invention contains a polymer to which there is attached a group represented by the following formula (1):(wherein each of Rx, Sy, and Sz represents a hydrogen atom or a monovalent organic group; each of Ry and Rz represents a single bond or a divalent organic group; each of ring Ary and ring Arz represents a C4 to C20 cyclic alkyl group or a C6 to C30 aryl group, and ring Ary and ring Arz may be linked together to form a new ring structure therebetween; ny is an integer of 0 to the maximum number corresponding to allowable substitution to ring Ary; nz is an integer of 0 to the maximum number corresponding to allowable substitution to ring Arz; and * is a polymer bonding site).
Owner:NISSAN CHEM CORP