534 results about "Single bond" patented technology

The present invention uses a resist composition that contains a base material component that has a structural unit derived from a compound represented by general formula (a0-1). In formula (a0-1), W01 represents a polymerizable group–containing group, La01 represents a divalent linking group or a single bond, and I represents an iodine atom. Ra02 represents a substituent other than an iodine atom. Ya01 represents a divalent linking group or a single bond. Va01 represents a single bond, an alkylene group, or a fluorinated alkylene group. Ra01 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group. Mm+ is an m-valent cation.

To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.SOLUTION: The salt is represented by formula (I) [where Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R1 and R2 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; X1 and X2 each represent -CO-O-, -O-CO-, -O-CO-O- or -O-; L1 represents a single bond or a substituted / unsubstituted hydrocarbon group; A1 represents an optionally substituted lactone ring; L2 represents a single bond or an alkanediyl group; R3 represents an aliphatic hydrocarbon group having an iodine atom, wherein a hydrogen atom contained in the group may be substituted with a fluorine atom or an alkyl group; and Z+ represents an organic cation].SELECTED DRAWING: None

The present invention discloses a liquid crystal alignment agent, including a polyamic acid-polyimide copolymer and an organic solvent. The block polymer in the polyamic acid-polyimide copolymer is prepared by a diamine component comprising a structure shown in the following formula (1) and at least one dianhydride component selected from cyclobutane tetracarboxylic dianhydride shown in the following formula (3-1) and 1,3-dimethylcyclobutane tetracarboxylic dianhydride shown in the following formula (3-2); In formula (1), X1 and X2 each independently represent a single bond or an alkyl group with 1 to 6 carbon atoms; Y1 and Y2 each independently represent one or more of -NHCO-, -CONH-, -OCO-, -COO-; Ar is a nitrogen-containing heterocyclic structure. The present invention can provide a liquid crystal alignment film for a lateral electric field driven liquid crystal display element endowed with high mechanical strength and high transmittance and a liquid crystal display element having the liquid crystal alignment film.

To provide a compound capable of improving the emission efficiency of an organic electroluminescent device.SOLUTION: The invention provides a compound represented by the formula (2), where: Ar2 is a substituted or unsubstituted aryl group having 6-50 ring-forming carbon atoms, or a substituted or unsubstituted heterocyclic group having 5-50 ring-forming atoms; L2 is a single bond, a substituted or unsubstituted arylene group having 6-50 ring-forming carbon atoms, or a divalent substituted or unsubstituted heterocyclic group having 5-50 ring-forming atoms; and D21 is a group represented by the formula (20) in the figure.SELECTED DRAWING: None

Disclosed is a liquid crystal composition. The liquid crystal composition includes liquid crystal molecules including at least one of a liquid crystal compound having an alkenyl group and a liquid crystal compound having an alkoxy group, and a first stabilizer including a compound having a structure represented by Formula 1:where n is 0 or 1; m is 0 or 1; k is 0 or 1; Z1, Z2, and Z3 are each independently a single bond, —C═C—, —OCO—, —COO—, —CF2O—, or a C1 to C5 alkylene group; X1, X2, X3, and X4 are each independently hydrogen or halogen; Y is hydrogen, an alkylene group, an alkoxy group, a hydroxyl group, —NHCOCH3, or ═O; and A and B are cyclic compounds.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:wherein Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X1 and X2 each represent *—CO—O—, *—O—CO—, etc.; L1 represents a single bond or a hydrocarbon group which may have a substituent; A1 represents a group having a lactone structure which may have a substituent; L2 and L3 each represent a single bond or an alkanediyl group; R1 represents an iodine atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z+ represents an organic cation.

Disclosed is an organic EL element material represented by the following general formula (1):wherein, in the general formula (1), any one of X1 to X3 is a nitrogen atom, and others are methine groups; L1 is a substituted or unsubstituted phenylene group, a substituted or unsubstituted naphthylene group, or substituted or unsubstituted anthrylene group; L2 is single bond, a substituted or unsubstituted phenylene group, a substituted or unsubstituted naphthylene group, or a substituted or unsubstituted anthrylene group, in which when these groups are substituted, the substituent is an alkyl group or an alkoxy group; A is a phenyl group or a pyridyl group; and n is 0 or 1. An organic EL element excellent in luminance efficiency and durability life is provided.

A photosensitive surface treating agent containing a compound represented by the following Formula (M1). In Formula (M1), R1 is a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, Y1 is a linear or branched alkylene group having 1 to 4 carbon atoms or a single bond, and the terminal carbon atom of the alkyl group for R1 may be bonded to a carbon atom constituting the alkylene group for Y1, and R1 and Y1 may form a ring. R2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, R3 and R4 are each independently an alkyl group having 1 to 3 carbon atoms, n0 is an integer of 0 or more, and X is a halogen atom or an alkoxy group.

This resist composition contains: a resin component (A1), the solubility of which in a developer solution changes due to the action of an acid; and a compound (D0) represented by general formula (d0-1). In the formula, Ar is an aromatic ring; OH is a hydroxy group; Xd01 is an iodine atom, a fluorine atom, a bromine atom, or a fluorinated alkyl group; Ld is a single bond or a divalent linking group; Z+ is S+ or I+; and Xd02 is an iodine atom, a fluorine atom, a bromine atom, or a fluorinated alkyl group. [Chemical formula 1]

The purpose of the present invention is to provide a photoelectric conversion element that shows excellent photoelectric conversion characteristics and has low variation.　A photoelectric conversion element 10 according to one mode of the present invention has a structure in which a first electrode 12, a hole transport layer 13, a photoelectric conversion layer 14, an electron transport layer 15, and a second electrode 16 are layered in that order. The photoelectric conversion layer 14 includes a perovskite compound. The hole transport layer 13 includes an insulating compound and a monomolecular hole transport material. The hole transport material includes a compound represented by the chemical formula (I). (I): Ar1–(L1–X1)n. In the chemical formula (I), Ar 1 is a structure that includes an aromatic ring, atoms that constitute the aromatic ring may include heteroatoms, and Ar1 may have a substituent other than –L1–X1. n is an integer 1 or greater, and if n is 2 or greater, the structures represented by –L1–X1 may be mutually identical or different. L1 is a divalent linking group linking Ar1 and X1 or is a single bond. X1 is a group capable of chemical bonding or hydrogen bonding with a p-type metallic oxide semiconductor.

This organic silicon compound is characterized by being represented by structural formula (1), and has good reactivity while having a monoalkoxysilyl group.(In the formula, X represents a monovalent to trivalent organic group including a polyoxyalkylene structure, an alkylene group having 1-20 carbon atoms, O, S, N, or the like, R1 and R2 each independently represent an alkyl group or the like having 1-10 carbon atoms, Y represents a single bond, O, S, or the like, A1, A2, A3, A4, and A5 each represent a single bond, or a divalent linking group such as a divalent hydrocarbon group having 1-20 carbon atoms, and n represents a number of 1-3.)

A liquid crystal composition, which is a material used for an element for electromagnetic wave signal control in a frequency range of 1 GHz to 10 THz, satisfies at least one of characteristics such as a wide temperature range of a nematic phase and a large refractive index anisotropy and a small dielectric loss tangent (tan δ) in the frequency region used for control, and has an excellent balance of characteristics, and an element containing the composition. A liquid crystal composition including: at least one compound selected from the group consisting of compounds represented by Formula (1). For example, R1 is C1-12 alkyl; Z11 is a single bond; L11, L12, L13 and L18 are hydrogen; L17 is methyl; Y11 and Y22 are hydrogen; and a, b, and c are respectively 0, 1, and 0.

The invention belongs to the technical field of photoelectric materials, and relates to a nitrogen-containing heterocyclic compound and an organic electroluminescent element containing the nitrogen-containing heterocyclic compound. The compound has a structure represented by formula (1): wherein L is selected from a single bond, a substituted or unsubstituted C6-C60 arylene group, and a substituted or unsubstituted C3-C60 heteroarylene group, o is an integer from 1 to 3, and when o is 2 or greater, L are the same as or different from each other. The organic electroluminescent element prepared from the compound has higher current efficiency and longer service life, and can be used as an N-type charge generation layer material for preparing the organic electroluminescent element.

Provided is a charge-transporting varnish that provides a charge-transporting thin film having excellent hole injection properties and also has excellent storage stability, the charge-transporting varnish comprising SiO2 nanoparticles surface-treated with a silane coupling agent represented by formula (S1), a charge-transporting substance, and an organic solvent, wherein the residual silane coupling agent has been removed from the charge-transporting varnish. (Rv1 to Rv3 each independently represents a hydrogen atom, a chlorine atom, a hydroxy group, or an alkoxy group or the like which may have a substituent; at least one of Rv1 to Rv3 represents a hydrogen atom, a chlorine atom, a hydroxy group, or an alkoxy group which may have a substituent; L represents a single bond or a C1-10 alkylene group; and Rv4 represents a C1-10 alkyl group which may have at least one kind of substituent selected from halogen atoms or the like. When Rv4 is a C1-10 alkyl group which may have a substituent, L is a single bond.)

Disclosed herein are compounds of Formula (I) or pharmaceutically acceptable salts thereof: wherein R1 and R2 independently represent a hydrogen atom or a deuterium atom; r3'and R3 ''independently represent a hydrogen atom, a methyl group, a methoxyl group, a chlorine atom, a fluorine atom, or a cyano group; r4 represents a hydrogen atom or a fluorine atom; r5 and R5'independently represent a hydrogen atom or a fluorine atom; y represents-CH2-,-CH =,-CR9 =,-O-or-NH-wherein R9 represents a fluorine atom or a (C1-C3) alkyl group; represents a single bond or a double bond; p is 0 or 1; x represents-CH =,-N = or-CR ''= wherein R'' represents a (C1-C3) alkyl or halogen atom, a cyano group, or a (C1-C3) fluoroalkyl group; r7 independently represents a (C1-C3) alkyl group, a halogen atom, a cyano group, or a (C1-C3) fluoroalkyl group; n is 0, 1 or 2; and R6 represents a (C1-C6) alkyl group, said alkyl group being optionally substituted; r8 represents a hydrogen atom, a (C1-C3) alkyl group, a-CH2F group, a-CHF2 group, a-CF3 group, or a (C3-C4) cycloalkyl group. Further disclosed are processes for preparing the same, pharmaceutical compositions comprising the same and the compounds of formula (I) for use as inhibitors and degrading agents of estrogen receptors, in particular for use in the treatment of ovulation dysfunction, cancer, endometriosis, osteoporosis, benign prostatic hyperplasia or inflammation. # imgabs0 #

To provide a resin and a resist composition which allow a resist pattern having a good focus margin to be produced.SOLUTION: There are provided: a resin containing a structural unit represented by formula (I) and a structural unit having an acid-labile group; and a resist composition. [In the formula, R10 represents an H atom, a halogen atom or the like; X10 represents a single bond, -O-, -CO-X20- or the like, X20 represents -O- or -NR21-, and R21 represents an H atom or an alkyl group; L10 represents a single bond or a substituted / unsubstituted hydrocarbon group; and X1 represents a single bond, -CO-O-, -O-CO- or the like.]SELECTED DRAWING: None

Provided are: a radiation-sensitive composition capable of exhibiting excellent sensitivity, CDU performance, DOF performance, pattern circularity, LWR performance, pattern rectangularity, and development defect suppression when forming a pattern; a pattern formation method; and an onium salt. This radiation-sensitive composition contains an onium salt represented by formula (1) (hereinafter, also referred to as an "onium salt (1)"), a polymer containing a structural unit (I) having an acid-dissociable group, and a solvent. (In formula (1), Ar1 is an (a1 + b1 +1)-valent aromatic ring. Ar2 is an (a2 + b2 +1)-valent aromatic ring. X1 and X2 are each independently a monovalent organic group having 1-20 carbon atoms, a cyano group, a nitro group, or a halogen atom. When multiple X1 and multiple X2 are present, the multiple X1 and the multiple X2 are each identical to or different from each other. Y1 is a monovalent organic group having 4-20 carbon atoms and bonded via Ar1 and -O-, -S-, or-SO2-, or a monovalent perfluoroalkyl group having 1-20 carbon atoms. When multiple Y1 are present, the multiple Y1 are identical to or different from each other. Y2 is a monovalent organic group having 4-20 carbon atoms and bonded via Ar2 and -O-, -S-, or -SO2-, or a monovalent perfluoroalkyl group having 1-20 carbon atoms. When multiple Y2 are present, the multiple Y2 are identical to or different from each other. L is a single bond or a divalent linking group having 1-5 carbon atoms. a1, a2, b1, and b2 are each independently an integer of 0-5. When the aromatic ring of Ar2 is a benzene ring, b1 + b2 ≥ 1.)

To provide a photosensitive composition capable of further improving diffraction characteristics.The present technology provides a photosensitive composition including: at least a compound represented by the following general formula (1); a binder resin; and a photoinitiator.In the general formula (1), X1 represents an oxygen atom, a nitrogen atom, a phosphorus atom, a caron atom, or a silicon atom.Y1 and Y2 each represent a benzene ring or a naphthalene ring, and both Y1 and Y2 do not represent benzene rings.R1 to R3 each represent a hydrogen or a substituent group represented by *—Z1(R4)d (* represents a bonding site).Z1 represents a single bond, a saturated hydrocarbon group having a valence of 2 or higher, or an unsaturated hydrocarbon group having a valence of 2 or higher, and the saturated hydrocarbon group or the unsaturated hydrocarbon group may have an ether bond and / or a thioether bond.R4 represents a hydrogen or a polymerizable substituent group.

The present invention discloses an organic electron acceptor containing a carbazole side chain and its application in solar cells. The organic electron acceptor containing a carbazole side chain has a structure shown in the following formula: #imgabs0# wherein R1 and R2 are independently a linear or branched alkyl group containing 1-18 carbon atoms, and A is an electron-withdrawing functional group. The present invention uses a non-fully fused ring structure based on trithiophene as the central conjugated skeleton of the organic electron acceptor, introduces a carbazole group as a side chain, prevents excessive elevation of the molecular HOMO energy level, and inhibits the internal rotation between the trithiophene rings connected by single bonds through its rigid large steric effect, thereby ensuring the planarity of the acceptor molecule, regulating the stacking between molecules, and simultaneously inhibiting the aromatic amine group from inducing the molecular skeleton to form a quinone structure, thereby improving the molecule's resistance to photooxidation.

The invention relates to an organic compound, application of the compound and an organic electroluminescent device containing the compound. The organic compound disclosed by the invention has a structure as shown in a formula (1-1) or a formula (1-2), wherein a ring A, a ring B, a ring C, a ring D and a ring E independently represent one of C5-C60 aromatic rings and C5-C60 heteroaromatic rings; y and Z each independently represent a single bond, a double bond, O, CO, SO2, S, NR1, CR2R3, or SiR4R5; w represents a single bond; x represents N or C; n1, n2 and n3 are respectively and independently selected from 0 or 1. After the compound disclosed by the invention is prepared and applied to the organic electroluminescent device, the device has good performances of high color purity and high luminous efficiency and also has extremely long service life.

To provide an acid generator, a resist composition and the like which allow a resist pattern having a good pattern collapse margin to be produced.SOLUTION: The acid generator contains a salt represented by formula (I) [where Lb1 and Lb2 each represent a single bond or a substituted / unsubstituted hydrocarbon group; R3 represents a halogen atom, a haloalkyl group or a substituted / unsubstituted hydrocarbon group; m3 represents an integer of 0-4; nb1 represents an integer of 1-6; R4-R7 each represent an H atom or a substituted / unsubstituted hydrocarbon group, -CH2- contained in the group may be substituted with -O-, -S- or the like, R3 and R4, or R3, R4 and R5 may be bonded together to form a cyclic hydrocarbon group which may have a double bond, the cyclic hydrocarbon group may have double bonds between one or more pairs of two adjacent carbon atoms, and -CH= contained in the cyclic hydrocarbon group may be substituted with -N=; and Z+ represents an organic cation].SELECTED DRAWING: None

To provide a resin and a resist composition which allow a resist pattern having good CD uniformity to be produced.SOLUTION: There are provided: a resin containing a structural unit represented by formula (I) and a structural unit having an acid-labile group; and a resist composition. [In the formula, R10 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; X10 represents a single bond, -O-, -CO-X20-, -O-CO-X20- or the like; and X20 represents -O- or -NR21-.]SELECTED DRAWING: None

Provided is a resist composition which generates an acid upon exposure to light, and the solubility of which with respect to a developer solution is changed by the action of the acid. The present invention employs the resist composition containing a compound (D0) that is represented by general formula (d0). In the formula, Rar represents an aromatic ring which may have a substituent. R01 represents a chain saturated hydrocarbon group having 1 to 10 carbon atoms. R02 represents a hydrogen atom or an optionally substituted chain saturated hydrocarbon group having 1 to 10 carbon atoms. R03 represents a halogen atom. j represents an integer of 1 or more, valence permitting. k represents an integer of 1 or more, valence permitting. Yd0 represents a divalent linking group or a single bond. m represents an integer of 1 or more, and Mm+ represents an organic cation having a valence of m.

The invention discloses a single-bond polymer irradiation damage calculation method, device, equipment and medium, and relates to the technical field of polymer irradiation damage calculation, and the method comprises the following steps: determining the microscopic section type of gamma ray and single-bond polymer; the irradiation damage of the gamma ray to the single-bond polymer is equivalent to the action probability of the gamma ray to the covalent bond; according to the bond forming structure data of the different covalent bonds, the bond breaking probability of the gamma ray to the different covalent bonds is obtained; and obtaining the initial free radical concentration according to the total deposition energy and the bond breaking probabilities of different covalent bonds. According to the method, the action probability of gamma rays on extranuclear electrons of nuclide atoms forming covalent bonds in the single-bond polymer is established, distribution of irradiation damage of the gamma rays in the polymer on various covalent bonds can be calculated, and the probability of covalent bond breaking caused by the irradiation damage can be accurately calculated; and the quantitative relation between the free radical concentration and the material absorbed dose is obtained.

The embodiment of the invention provides a metal organic material, the structural formula of which is as shown in the formula (I): # imgabs0 #, in the formula (I), X1, X2, X7, X8, X9 and X10 are respectively and independently CH or N, and X3, X4, X5 and X6 are respectively and independently CH, C or N; each R1, R2, R3, R4, R5, R6 independently represents a hydrogen atom, a deuterium atom, a halogen atom, a substituted or unsubstituted alkyl group, or the like; each R7 is independently a hydrogen atom, a deuterium atom, a halogen atom, a substituted or unsubstituted alkyl group, or the like; z1 and Z2 are respectively connected with X3 and X4, or X4 and X5, or X5 and X6, one of Z1 and Z2 is a single bond, and the other is oxygen, sulfur, selenium or a divalent atomic group. The metal organic material can be applied to the organic electroluminescent device as a luminescent material, and the luminescent color purity, the device efficiency and the device stability of the organic electroluminescent device are improved.

To provide a resist composition and the like having improved sensitivity while maintaining good roughness.SOLUTION: A resist composition generates an acid upon exposure to light and changes its solubility in a developer by the action of an acid. The resist composition comprises: a base component (A) which changes its solubility in a developer by the action of an acid; and a compound (D0) represented by formula (d0). (Ar01 represents an aromatic ring; X01 represents a halogen atom; Rd01 represents a substituent (excluding a halogen atom and a hydroxy group); Rx0 represents a group represented by formula (Rx0-1); m01 and n01 represent integers of 0 or more, valence permitting; Mm+ represents an m-valent cation; Ar02 represents an aromatic ring; X02 represents a halogen atom; Ld01 represents a single bond or an alkylene group; Ld02 represents an alkylene group; and Rd02 represents a substituent other than a halogen atom.)SELECTED DRAWING: None

To provide a polyether ether ketone compound that offers easy synthesis and excellent processability, produces a resin composition containing the same with excellent dielectric characteristics (low relative dielectric constant and low dielectric loss tangent), and exhibits high heat resistance and low moisture absorption.SOLUTION: The present invention provides a polyether ether ketone compound represented by formula (1). In formula (1), R1 and R2 independently represent a substituted or unsubstituted aromatic group, R' independently represents a hydrogen atom, a C1-6 alkyl group or a halogen atom, A1 and A2 independently represent a single bond or a C1-4 alkylene group, and n represents a number of 1-100.SELECTED DRAWING: None

A PARP1 inhibitor compound has a structure of: Formul (i) A dotted line represents a single bond or a double bond, y is 0, 1, or 2. Each XD is selected from C, O, and N. No more than one XD is O. When an XD is O or N, ring D is non-aromatic. Each R1 is absent, H, or an organic group. Each R4 is absent; H; a halogen; C(R9)o-3; OR9; or S(R9)1-5. Each R9 is H or an organic group. R2 and R3 are each H or an organic group. L is: Formul (ii) Each X1, X3, X4 and X5 is C or N. Each X2 is C, N, O, or S. n+m and r+s are 2 to 5. p and q are each 1 to 3. p+q is 2 to 5. Each R5A, R5B, R5C, and R6 is absent, H, or an organic group. Q1 and Q2 are each independently a bond or linking group.

The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a resist film that can exhibit sensitivity and CDU at satisfactory levels when next-generation technology is applied and can suppress development defects; and a pattern formation method. The purpose of the present invention is also to provide a radiation-sensitive acid generator that can be applied to said radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing: a polymer (A) containing a structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator (B) represented by formula (1); and a solvent (C). (In formula (1): A is an (n1+n2+n3+1)-valent aromatic ring; R1 is a nitro group, a cyano group, a hydroxy group, an amino group, or a monovalent organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; n1 is an integer of 1-5; n2 is an integer of 1-5; n3 is an integer of 0-5; m2 is an integer of 1-3; L is a single bond or an (m2+1)-valent linking group; Rf1 and Rf2 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; Rf3 and Rf4 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1-20 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; when there are multiple Rf3s and multiple Rf4s, the multiple Rf3s and the multiple Rf4s may each be the same or different from one another; m1 is an integer of 0-10; and M+ is a monovalent onium cation.

Disclosed herein are compounds of Formula (I) or pharmaceutically acceptable salts thereof: wherein R1 and R2 independently represent a hydrogen atom or a deuterium atom; r3 represents a hydrogen atom or a-COOH group; r3'represents a hydrogen atom, a methyl group, a methoxy group, a chlorine atom, a fluorine atom, a cyano group, or a-COOH group; r3 ''represents a hydrogen atom, a methyl group, a methoxy group, a chlorine atom, a fluorine atom, or a cyano group; with the proviso that one but not both of R3 and R3'represents a-COOH group, and R3 and R3 'do not represent a hydrogen atom at the same time; r4 represents a hydrogen atom or a fluorine atom; r5 and R5'independently represent a hydrogen atom or a fluorine atom; y represents-CH2-,-CH =,-CR9 =,-O-or-NH-wherein R9 represents a fluorine atom or a (C1-C3) alkyl group; represents a single bond or a double bond; p is 0 or 1; x represents-CH =,-N = or-CR ''= wherein R'' represents a (C1-C3) alkyl or halogen atom such as fluorine or chlorine atom, cyano, or a (C1-C3) fluoroalkyl group such as trifluoromethyl; r7 independently represents a (C1-C3) alkyl group such as a methyl group, a halogen atom such as a fluorine atom, a cyano group, or a (C1-C3) fluoroalkyl group such as a trifluoromethyl group; n is 0, 1 or 2; and R6 represents an optionally substituted (C1-C9) alkyl group, and R8 in particular represents a (C1-C6) alkyl group. Further disclosed are processes for their preparation, pharmaceutical compositions comprising them and the compounds of formula (I) for use as inhibitors and degradation agents of estrogen receptors, in particular in the treatment of ovulation dysfunction, cancer, endometriosis, osteoporosis, benign prostatic hyperplasia or inflammation. # imgabs0 #