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193 results about "Single bond" patented technology

In chemistry, a single bond is a chemical bond between two atoms involving two valence electrons. That is, the atoms share one pair of electrons where the bond forms. Therefore, a single bond is a type of covalent bond. When shared, each of the two electrons involved is no longer in the sole possession of the orbital in which it originated. Rather, both of the two electrons spend time in either of the orbitals which overlap in the bonding process. As a Lewis structure, a single bond is denoted as AːA or A-A, for which A represents an element (Moore, Stanitski, and Jurs 329). In the first rendition, each dot represents a shared electron, and in the second rendition, the bar represents both of the electrons shared in the single bond.

Liquid crystal composition, and liquid crystal display including the same

InactiveUS20160230091A1Improve advancedHigh-rate response characteristicLiquid crystal compositionsNon-linear opticsHalogenSingle bond
Disclosed is a liquid crystal composition. The liquid crystal composition includes liquid crystal molecules including at least one of a liquid crystal compound having an alkenyl group and a liquid crystal compound having an alkoxy group, and a first stabilizer including a compound having a structure represented by Formula 1:where n is 0 or 1; m is 0 or 1; k is 0 or 1; Z1, Z2, and Z3 are each independently a single bond, —C═C—, —OCO—, —COO—, —CF2O—, or a C1 to C5 alkylene group; X1, X2, X3, and X4 are each independently hydrogen or halogen; Y is hydrogen, an alkylene group, an alkoxy group, a hydroxyl group, —NHCOCH3, or ═O; and A and B are cyclic compounds.
Owner:SAMSUNG DISPLAY CO LTD

Organic compound, application thereof and organic electroluminescent device containing organic compound

The invention relates to an organic compound, application of the compound and an organic electroluminescent device containing the compound. The organic compound disclosed by the invention has a structure as shown in a formula (1-1) or a formula (1-2), wherein a ring A, a ring B, a ring C, a ring D and a ring E independently represent one of C5-C60 aromatic rings and C5-C60 heteroaromatic rings; y and Z each independently represent a single bond, a double bond, O, CO, SO2, S, NR1, CR2R3, or SiR4R5; w represents a single bond; x represents N or C; n1, n2 and n3 are respectively and independently selected from 0 or 1. After the compound disclosed by the invention is prepared and applied to the organic electroluminescent device, the device has good performances of high color purity and high luminous efficiency and also has extremely long service life.
Owner:TSINGHUA UNIVERSITY

Organic compound, application thereof and organic electroluminescent device adopting organic compound

The invention relates to an organic compound, application of the compound and an organic electroluminescent device containing the compound. The organic compound disclosed by the invention has a structure as shown in a formula (1), wherein a ring A, a ring B, a ring C, a ring D and a ring E independently represent one of C6-C60 aromatic rings and C5-C60 heteroaromatic rings; w1, W2 and W3 are respectively and independently selected from a single bond, O, CO, SO2, S, Se, NR1, CR2R3 or SiR4R5; and m1, m2 and m3 are respectively and independently 0 or 1. After the compound disclosed by the invention is prepared and applied to the organic electroluminescent device, the device has good performances of high color purity and high luminous efficiency and also has extremely long service life.
Owner:TSINGHUA UNIVERSITY

Optical polymer and lens including same

ActiveUS12534575B2MountingsPhotovoltaic energy generationOptical polymersPolymer
A lens includes an optical polymer represented by:where R1 to R3 are each independently hydrogen, deuterium, halogen, or organic group comprising any one selected from substituted or unsubstituted C1-C60 alkyl group, substituted or unsubstituted C3-C60 cycloalkyl group, substituted or unsubstituted C1-C60 alkoxy group, substituted or unsubstituted C6-C60 aryl group, and substituted or unsubstituted C2-C60 heteroaryl group having at least one hetero atom selected from group consisting of N, O, and S, A1 is a single bond, an oxygen atom, or a sulfur atom, A2 is an oxygen atom or sulfur atom, B1 and B2 are each independently a single bond or an organic group represented by -al-D-al-, and n represents an integer of 5 or more and 500 or less, where al is a C1-C8 alkylene group, and D is —S(═O)2—X—, —X—S(═O)2—, —S(═O)2—X—S(═O)2—, —C(═O)—X—, —X—C(═O)—, —C(═O)—X—C(═O)—, carbonyl, alkenylene, alkynylene, ester, or ether, where X is a C6-C60 arylene group.
Owner:SAMSUNG ELECTRO MECHANICS CO LTD +1

Photosensitive resin composition, resin film having pattern and method for producing same, and semiconductor circuit board

PendingUS20260202742A1PhotosensitizerOrganic group
A photosensitive resin composition contains an alkali-soluble polymer (A), a photosensitizer (B), a crosslinking compound (C) having a crosslinkable group that reacts with a component (D) below by heat, a compound (D) represented by formula (1), and a solvent (E). X11 represents, for example, a nitrogen atom, R11 represents a hydrogen atom or a group represented by formula (2). L21 represents, for example, a single bond, R21 represents, for example, a hydrogen atom, R22 represents a monovalent organic group, and n21 to n23 represent an integer of 0 or more. At least one of three R11's is represented by formula (2), and in at least one group represented by formula (2), n21 is an integer of 1 or more, and at least one R21 is a hydrogen atom.
Owner:JSR CORPORATION

A boron-nitrogen compound based on a double-heteroanthracene fused ring aromatic hydrocarbon and an electroluminescent device thereof

The present application relates to the technical field of organic electroluminescence, and discloses a boron-nitrogen compound based on a double-heteroanthracene fused ring arene and an electroluminescent device thereof.The compound has a structure represented by HU, wherein H has a structure of formula 1-1, and U is selected from a structure of formula 2, wherein any two adjacent single bonds in the structure formula U are connected with the '' in the structure formula H, X and Y are the same or different at each occurrence and are selected from a single bond, O, S, Se, NR', CR''R''' or SiR''R'''', and combinations thereof.The OLED device prepared by using the compound has a low starting voltage, high luminous efficiency and a more optimal service life.
Owner:SOUTH CHINA UNIV OF TECH

Resist composition, resist pattern formation method, compound, and polymer compound

PCT designated stageWO2026141175A1SolubilityPolymer science
Disclosed is a resist composition that generates an acid upon exposure to light, and of which the solubility in a developer solution is changed by the action of the acid, the resist composition comprising a resin component (A1) of which the solubility in a developer solution is changed by the action of the acid, and the resin component (A1) having a constituent unit (a0) derived from a compound represented by general formula (a0). In the formula, W0 represents a polymerizable group-containing group; X0 represents a hydrogen atom or an alkyl group; Ar01 represents an arylene group that may have a substituent; L01 represents a single bond or a divalent linking group; Rpg0 represents an acid-dissociable group; and n0 represents an integer of 2 or greater as long as permitted by the valence.
Owner:TOKYO OHKA KOGYO CO LTD

Onium salt, photoacid generator, chemically amplified resist composition, and pattern forming method

The invention relates to an onium salt, a photoacid generator, a chemically amplified resist composition and a pattern forming method. The present invention is an onium salt represented by general formula (A). Thereby, provided is an onium salt used in a chemically amplified resist composition having excellent lithography performance such as high sensitivity, CDU, MEEF, and LWR in optical lithography using high-energy rays. In the formula, m1 is an integer of 1-4. And m2 is 1 or 2. R1 represents an electron-withdrawing group such as a hydrogen atom, a hydrocarbon group, or a cyano group; lA and LB each represents a single bond, a carbonyl group, an ether bond, an ester bond, an amide bond, a sulfonate bond, a sulfonamide bond, a carbonate bond, a urethane bond, or a hydrocarbylene group. W1 is a hydrocarbylene group containing an alicyclic structure, and a carbon atom forming the alicyclic structure has two atomic bonds. And W2 is a hydrocarbon group containing an alicyclic structure. Z + is an onium cation.
Owner:SHIN ETSU CHEMICAL CO LTD

Salt, acid generator, resist composition and method for producing resist pattern

Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:wherein, in formula (I), R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—; and AI− represents an organic anion.
Owner:SUMITOMO CHEM CO LTD

Resist composition, method for manufacturing a resist pattern, and salt

Provided are a salt capable of producing a resist pattern having good CD uniformity and a resist composition containing the same. 【Solution means】A resist composition containing a salt represented by formula (I). TIFF2026059011000159.tif53158 [In the formula, Q 1 , Q 2 , Q 11 , Q 12 , R 1 , R 2 , R 11 and R 12 are each a hydrogen atom, a fluorine atom, a perfluoroalkyl group, etc.; z and z1 are each an integer from 0 to 6; X 0 and X 01 are each -O-, -CO-, etc.; mm1 and mm2 are each 0 or 1; L 1 and L 01 are each a single bond or a substituted / unsubstituted hydrocarbon group.]
Owner:SUMITOMO CHEM CO LTD

Base material and method for producing structure containing phase-separated structure

To provide a base material capable of forming a phase separation structure excellent in horizontal orientation, and a method for manufacturing a structure including the phase separation structure.SOLUTION: A base material used for phase-separating a layer containing a block copolymer, the base material containing a block copolymer (A) having a block (a1) having a constitutional unit represented by Formula (a1) and a block (A2) having a constitutional unit represented by Formula (A2), in which a proportion of the number of moles of the constitutional unit constituting the block (A2) is more than 0% by mole and 40% by mole or less. In Formula (a1), Ra11 is hydrogen or the like, Ra12 is a substitution group, n is an integer of 0 or more and 5 or less, in Formula (a2), Ra21 is hydrogen or the like, L1 is a single-bond or the like, and Y1 is a divalent linking group having a carbon number of 1 or more and 15 or less.SELECTED DRAWING: None
Owner:TOKYO OHKA KOGYO CO LTD

Dibenzothiophenium salt compound, method for producing same, and application of compound

The present invention provides a novel dibenzothiophenium salt compound and a method for producing the same. The present invention also provides a photoacid generator containing the dibenzothiophenium salt compound, a resist composition containing the photoacid generator, a method for forming a resist pattern using the resist composition, and the like. The present invention relates to a compound represented by chemical formula (I), a photoacid generator containing the compound, a resist composition containing the photoacid generator, and a method for forming a resist pattern using the resist composition. (In the formula, R1 and R2 are the same or different and each represent a hydrogen atom, a halogen atom, -CF3, -SO2R3, an alkyl group having 1-10 carbons, -OH, a polymerizable group selected from formula (S-1) to formula (S-4), or an acid-reactive group selected from formula (R-1) to formula (R-7). R3 represents -CF3, -CF2CF3, an alkyl group having 1-10 carbons, or a phenyl group. [A]- represents a trifluoromethanesulfonic acid anion (TfO-) or a halide ion.) (In the formulae, R1a represents a hydrogen atom or a methyl group, and Y represents a single bond or an alkylene group having 1-3 carbons.) (In the formulae, Y is as described above. R51 to R53 may be the same or different, and each represent a hydrogen atom, an alkyl group having 1-20 carbons, an alkenyl group having 2-8 carbons, or an aromatic group having 4-18 carbons, or R 51 and R52 may be linked to each other to form, together with the carbon atoms to which these are bonded, an aliphatic hydrocarbon ring having 3-20 carbons. R54 and R55 are the same or different, and each represent a hydrogen atom or an alkyl group having 1-6 carbons. R56 represents an alkyl group having 1-20 carbons or an alicyclic hydrocarbon group having 3-20 carbons. -CH2- contained in the alkyl group, the aliphatic hydrocarbon ring, and the alicyclic hydrocarbon group may be substituted with -O- or -S-, and d represents an integer from 0 to 4. A case in which R51 to R53 are all hydrogen atoms in formula (R-1), formula (R-3), and formulae (R-5) to (R-7) is excluded.)
Owner:SHIKOKU CHEM CORP

A polyboron-nitrogen derivative and a deep blue light-emitting device and a light-emitting apparatus

The present application provides a polyboron-nitrogen derivative, a deep blue light-emitting device and a light-emitting apparatus, the polyboron-nitrogen derivative having a structure of formula (I), wherein R 1 , R 2 each independently represent a C1-C36 alkyl or aryl substituent; R 3 , R 4 , R 5 , R 6 , R 7 , R 8 each independently represent hydrogen or a C1-C36 substituent; the C1-C36 substituent is substituted in a single bond or in a ring; A1, A2 each independently represent oxygen, sulfur, selenium, a sulfoxide group, a sulfone group, a carbon substituent of a C1-C36 alkyl or aryl substituent, a nitrogen substituent of a C1-C36 alkyl or aryl substituent, or are not present. The polyboron-nitrogen derivative used in the present application has the characteristics of high light-emitting efficiency, high color purity, and suitability for solution process devices.
Owner:SUZHOU INSTITUTE OF RENEWABLE ENERGY & PHOTOELECTRONICS CO LTD +1

Composition of matter for use in organic light-emitting diodes

The present disclosure relates to compounds of Formula I) as useful materials for OLED's. X1, X2 and X3 are N or C(R5); Ar1 and Ar2 are aryl, heteroaryl or cyano; L1 is single bond, arylene or heteroarylene; and R1, R2, R3 and R4 are diarylamino, carbazolyl, heteroaryl, H or alkyl.
Owner:KYULUX INC

Nonionic photoacid generator, photoresist composition, and pattern forming method

PendingJP2026137059APolymer sciencePhotoacid
Provided are a nonionic photoacid generator, a photoresist composition, and a patterning method. 【Solution means】 A nonionic photoacid generator compound represented by formula (1) or (2). TIFF2026137059000028.tif63166 (In the formula, ring A 1 is a monocyclic C 3~60 aromatic group, a polycyclic C 3~60 aromatic group, a C 3~15 monocyclic alicyclic group, or a C 3~15 polycyclic alicyclic group; each L 1 is a single bond or one or more linking groups, L 1 does not contain fluorine; each L 2 is a single bond or one or more divalent linking groups; P is a polymerizable group.)
Owner:DUPONT ELECTRONIC MATERIALS INT LLC

Compound, surface treatment agent, article, and method for producing article

The purpose of the present invention is to provide: a compound capable of forming a surface layer having excellent oil repellency; a surface treatment agent; an article having a surface layer formed from the compound; and a method for producing the article. This compound is represented by the formula: (Rf)n-L3-L4-L1-(T1)x1. Rf is -OCF3 or the like; n is an integer of 2 or more; L3 is an (n+1)-valent group having no fluorine atom and no organosiloxane residue, or an (n+1)-valent group having no organosiloxane residue, and including a cyclic hydrocarbon group that may contain an oxygen atom or a nitrogen atom as a ring member atom, in which at least one hydrogen atom is substituted with a fluorine atom; L4 is a divalent hydrocarbon group which may have a group such as -O-; L1 is a single bond or a trivalent or higher (1+x1)-valent group; T1 is a reactive group excluding a specific group; and x1 is an integer of 1-10.
Owner:AGC INC

Composition for forming electrode and additive

Provided is an electrode-forming composition which is suppressed in thickening and gelling by a simple method, has improved storage stability, and is capable of increasing the concentration of solid content, said electrode-forming composition containing a heterocyclic ring-containing compound, a positive electrode active material, a binder, and a solvent, the heterocyclic ring-containing compound is represented by formula (1). (each Ra is independently a hydrogen atom, a carboxyl group, a hydroxyl group, an amino group, an optionally substituted alkyl group having 1-6 carbon atoms, an optionally substituted alkenyl group having 2-6 carbon atoms, or an optionally substituted aryl group having 6-12 carbon atoms, each L is independently a single bond, a carbonyl group, an ether bond, an ester bond, or an amide bond, and each L is independently a hydrogen atom, a carboxyl group, a hydroxyl group, an amino group, an optionally substituted alkyl group having 1-6 carbon atoms, an optionally substituted alkenyl group having 2-6 carbon atoms, or an optionally substituted aryl group having 6-12 carbon atoms. Each Xa independently represents a hydrogen atom, a lithium atom, a sodium atom, an optionally substituted alkyl group having 1-6 carbon atoms, or an optionally substituted aryl group having 6-12 carbon atoms)
Owner:NISSAN CHEM CORP

Onium-salt-type monomer, monomeric photo-acid generator, polymer, chemically-amplified resist compostion, and patterning process

An onium-salt-type monomer is represented by the formula (a), where “n1” is 0 or 1, “n2” is 1 to 4, “n3” is 0 to 2, “n4” is 0 or 1, “n5” is 0 to 4, and “n6” is 0 to 2; RA is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; RAL is an acid-labile group; R1 is a halogen atom, a nitro group, a cyano group; R2 is a halogen atom other than a fluorine atom, a nitro group, a cyano group; RF is a fluorine atom, a fluorinated saturated hydrocarbyl group, a fluorinated saturated hydrocarbyloxy group, or a fluorinated saturated hydrocarbylthio group having 1 to 6 carbon atoms; LA and LB are each a single bond, an ester bond; XL is a single bond or a hydrocarbylene group; and Z+ is an onium cation.
Owner:SHIN ETSU CHEMICAL CO LTD

Particles, composition, molded article, and low-dielectric material

PCT designated stageWO2026116463A1DielectricPolymer science
The present disclosure provides: particles with which a fluororesin can be finely dispersed in a matrix resin; a composition; a molded body; and a low-dielectric material. The present disclosure relates to particles containing: a fluororesin; a compound (I) that has a plurality of groups (A) and is represented by formula (I); and a compound (II) that is capable of reacting with the compound (I) (In the formula, R1 and R2 are the same or different, are each hydrogen or an organic group, and may bond to each other to form a ring structure; and the double line represented by a solid line and a broken line represents a single bond or a double bond.).
Owner:DAIKIN INDUSTRIES LTD +1

Compound and application thereof

The invention discloses a compound and application thereof, and belongs to the technical field of display. The chemical structural formula of the compound is as follows: Ar1-Ar2 is C6-C30 aryl or C3-C30 heteroaryl, and Ar3 is one of the following chemical structural formula a-e: chemical formula a, chemical formula b, chemical formula c, chemical formula d and chemical formula e; at least one of Z1-Z3 is N, and the balance is CH; each of L1 and L2 is a single bond, a C6-C30 arylene group or a C3-C30 heteroarylene group; l3 is a single bond, O, S, Se or; r1 to R8 are respectively and independently hydrogen, deuterium, fluorine, alkyl of C1 to C10 or aryl of C6 to C30; the ring A, the ring B and the ring C are C6-C30 arylene groups or C3-C30 heteroarylene groups; and n is an integer of 0-4. The compound can be used as an electron transport material and a hole blocking material, so that the voltage, the efficiency and the cycle life of an OLED (Organic Light Emitting Diode) device are improved.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD +1

Composition for forming protective film, protective film, method for manufacturing substrate, and method for manufacturing semiconductor device

PCT designated stageWO2026141539A1Hydrogen atomDevice material
A composition for forming a protective film, the compositing comprising: a polymer having a repeating unit represented by formula (1) and a repeating unit represented by formula (2); and a solvent. (In formula (1), R1 represents a hydrogen atom or a C1-4 alkyl group. X1 represents -O- or -NH-. R11 represents a single bond or a C1-30 divalent group. n represents an integer from 2 to 5. In formula (2), R2 represents a hydrogen atom or a C1-4 alkyl group. X2 represents -O- or -NH-. R21 represents a C1-20 divalent group, provided that the OH group bonded to R21 is bonded to a nonaromatic carbon atom of R21.)
Owner:NISSAN CHEM CORP

Liquid crystal composition, cured product, film, and compound

The first problem of the present invention is to provide a liquid crystal composition capable of forming a film having excellent liquid crystal compound alignment properties and little unevenness in visual recognition. A second problem of the present invention is to provide a cured product and a film formed using the liquid crystal composition. The third problem of the present invention is to provide a compound that can be used in the liquid crystal composition. This liquid crystal composition contains a compound represented by formula (1) and a liquid crystal compound. In formula (1), A1 to A3 each independently represent a divalent aromatic ring group or a divalent aliphatic ring group. Each of Z1 to Z3 independently represents a single bond and a divalent linking group; and n1 represents an integer of 0 or more. And B represents a monovalent aromatic ring group substituted with one or more monovalent substituent groups T having a siloxane structure containing three or more silicon atoms. W represents a monovalent substituent group that does not contain a hydrogen atom or a silicon atom. In addition, when n1 represents an integer of 2 or more, the plurality of Z3 and the plurality of A3 may be the same as or different from each other. B-Z1-A1-Z2-A2-(Z3-A3) n1-W (1)
Owner:FUJIFILM CORP

Etching liquid, etching method, and method for manufacturing semiconductor device

PendingUS20260182282A1Device materialActive agent
The present disclosure relates to an etching liquid comprising: an alkaline compound (A); and at least one compound (B) selected from the group consisting of a thiol compound (B1) and a nonionic surfactant (B2) represented by Formula (1) below, wherein ER110 / ER100≥0.5, where ER110 is an etching rate of a (110) plane of a silicon crystal, and ER100 is an etching rate of a (100) plane of the silicon crystal, R1XO—(CmH2mO)n—R2 (1), where R1 is an alkyl group having 7 or more carbons, R2 is a hydrogen atom or an alkyl group, X is a single bond or a phenylene group, m is an integer of 1 to 6, and n is from 4 to 25.
Owner:MITSUBISHI CHEM CORP

UV-curable composition capable of inkjet printing

Disclosed is a composition that is substantially solvent-free, UV curable, has a viscosity of from 10 mPa * s to less than 25 mPa * s at 25 DEG C, and contains: (a) an aromatic (meth) acrylate-based material having the structure (I): H2C = C (R1) C (O)-O-R2-CH2-R (I) wherein: R is a biphenyl or naphthyl group; r1 is hydrogen or a methyl group; r2 is a single bond, a C2-10 divalent hydrocarbon, a C2-10 polyethylene or a C3-10 polypropylene; (b) from 10 wt% to 25 wt% of a bifunctional methyl acrylate having the structure (II): H2C = C (CH3) C (O)-O-R3-O-C (O) C (CH3) = CH2 (II) wherein R3 is a single bond, a C2-10 divalent hydrocarbon, a C2-10 polyethylene or a C3-10 polypropylene; (c) ZrO2 nanoparticles having a concentration of 1 nm to 20 nm in the range defined by (i) 1.23 (wt% bifunctional methyl acrylate (b)) + 1.60 wt%; and (ii) 1.09 (wt% of a bifunctional methyl acrylate (b)) + 26.02 wt%; (d) 0.1 wt% to 6.0 wt% of a photoinitiator; (e) from 0 wt% to 6.0 wt% of a trifunctional methyl acrylate; and (f) from 0 wt% to 1.0 wt% of a surfactant; wherein the wt% is relative to the weight of the composition.
Owner:DOW GLOBAL TECHNOLOGIES LLC +1

Compounds and their applications

This invention discloses a compound and its application, belonging to the field of display technology. The chemical structural formula of the compound is shown below: ; wherein, Ar1 and Ar2 are both; or, one of Ar1 and Ar2 is, and the other of Ar1 and Ar2 is a substituted or unsubstituted C6-C12 aryl, substituted or unsubstituted C3-C12 heteroaryl; Ar3 is a halogen, cyano, substituted or unsubstituted C6-C12 aryl, substituted or unsubstituted C3-C12 heteroaryl, substituted or unsubstituted C1-C60 alkyl or alkoxy; A is O, S or Se; L represents a single bond, a substituted or unsubstituted C6-C12 arylene, or a substituted or unsubstituted C3-C12 heteroarylene; Z1 to Z4 are each independently N or CR5. OLED devices prepared based on this compound have lower operating voltage, higher efficiency, and longer cycle life.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD +1

Photoacid generator compound, photoresist compositions including the same, and pattern formation methods

PCT designated stageWO2026142865A1ArylSulfonate
A photoacid generator compound comprising an anion and an iodonium or sulfonium cation, wherein the anion is represented by Formula (1): (1) wherein, in Formula (1), ring Cy1 is a C3-15 monoalicyclic group or a C6-15 polyalicyclic group,; each L1 is independently a single bond or one or more linking groups, wherein L1 is free of fluorine; each X1 is independently -O-, -S-, -N(R2)-, -C(O)-, -S(O)R2-, or -S(O2)R2-, wherein R2 is independently chosen from substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C1-20 heteroalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; each Z1 independently comprises an anion stabilizing group, wherein at least one Z1 is configured to form an intramolecular non-covalent bond with the sulfonate anion group to form a ring having from 5 to 8 ring atoms, wherein the remaining substituents are as provided herein.
Owner:DUPONT ELECTRONIC MATERIALS INT LLC

Polypropylene composition containing a new charge-stabilizing agent for electret melt blown webs

A polypropylene composition (PC) comprising: a. from 95.0 to 99.99 wt.-%, of a polypropylene (PP), preferably a propylene homopolymer (HPP); and b. from 0.01 to 5.0 wt.-%, of a compound according to Formula (I), wherein each R is independently selected from C1 to C6 alkylene, C2 to C6 alkenylene and a single bond, each R′ is independently selected from H and C1 to C6 alkyl, each R″ is independently selected from H and C1 to C22 alkyl, wherein each alkylene, alkenylene and alkyl group may optionally be substituted by deuterium or fluorine, and the two substituents on the central benzene ring may be either positioned in an ortho, meta or para relationship; wherein the polypropylene composition (PC) has an MFR2 of from 400 to 5000 g / 10 min and a melting temperature Tm of from 140 to 170° C.
Owner:BOREALIS AG

Onium salt compounds

To provide an onium salt compound having excellent solvent compatibility and excellent storage stability. 【Solution means】General formula (1): JPEG2026049542000097.jpg49119 (In the formula, R A represents a C1-15 alkyl group which may have a substituent, etc. R 4 represents a hydrogen atom, etc. R 5 and R 6 are the same or different and represent a hydrogen atom, etc.; alternatively, the said R 5 and R 6 may be bonded to each other together with the two adjacent carbon atoms to form a saturated or unsaturated carbon ring. The said saturated or unsaturated carbon ring may further have a substituent. The dotted line represents a single bond or a double bond. X - represents a boron anion containing a fluorine-containing aromatic ring, etc.). An onium salt compound represented by the formula.
Owner:SANSHIN CHEM IND

Pigment, method for producing the same, solution, method for evaluating metal hydroxyl group amount, method for evaluating metal hydroxyl treatment rate

ActiveCN118765310BThio-Single bond
The pigment of the present application is a compound represented by the following general formula (1) or the following general formula (2). (In the following formulae, M is Sn or Ge, X is C or N, R1 is an alkyl group or a phenyl group, Y1 and Y2 are each hydrogen, a halogen group, a methyl group, an alkoxy group, a phenyl group, a diphenyl amido group, a thio phenyl group, or a phenyl ethynyl group, Z is represented by a single bond or the following formula (3). R2 is an alkyl group or a phenyl group.)
Owner:SUMITOMO OSAKA CEMENT CO LTD +1