Provided are a salt capable of producing a
resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a
resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a
resist composition:wherein, in formula (I), R4, R5, R6, R7, R8 and R9 each represent a
halogen atom, a haloalkyl group, etc.; A1, A2 and A3 each represent a
hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a
single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—; and AI− represents an
organic anion.