[Problem] The objective is to provide a salt, an acid-generating agent, and a
resist composition containing the same, which can produce a
resist pattern having good CD uniformity (CDU). [Solution] A salt, acid-generating agent, and
resist composition represented by Formula (I). [In the formula, R1, R2, and R3 represent a hydroxyl group, -O-R10, -O-CO-O-R10, and -O-L1-CO-O-R10, respectively. R4, R5, R6, R7, R8, and R9 represent a
halogen atom, a hydroxyl group, etc., respectively. L1 represents an alkanedyl group. R10 represents an acid unstable group. X1, X2, and X3 represent an
oxygen atom or a
sulfur atom, respectively. m1 and m7 represent integers from 0 to 5, and m2 to m6 and m8, m9 represent integers from 0 to 4, provided that 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, and 0 ≤ m3 + m9 ≤ 4, and at least one of m1, m2, and m3 represents an integer greater than or equal to 1. X4 represents a
single bond, -CH2-, -O-, -S-, etc. Al- represents an
organic anion.]