151 results about "Atomic mass" patented technology

A method of depositing a silica glass insulating film over a substrate. In one embodiment the method comprises exposing the substrate to a silicon-containing reactant introduced into a chamber in which the substrate is disposed such that one or more layers of the silicon-containing reactant are adsorbed onto the substrate; purging or evacuating the chamber of the silicon-containing reactant; converting the silicon-containing reactant into a silica glass insulating compound by exposing the substrate to oxygen radicals formed from a second reactant while biasing the substrate to promote a sputtering effect, wherein an average atomic mass of all atomic constituents in the second reactant is less than or equal to an average atomic mass of oxygen; and repeating the exposing, purging/evacuating and exposing sequence a plurality of times until a desired film thickness is reached.

A method for post-etch copper cleaning uses a hydrogen plasma with a trace gas additive constituting about 3-10 percent of the plasma by volume to clean a copper surface exposed by etching. The trace gas may be atomic nitrogen or other species having an atomic mass of 15 or greater. The trace gas adds a sputtering aspect to the plasma cleaning and removes polymeric etch by-products and polymeric and other residuals formed during the deposition of dielectric materials or etch stop layers over the copper surface. An anti-corrosion solvent may be used to passivate the copper surface prior to formation of the dielectric materials or etch stop layers.

The invention provides a medical implant or medical implant part comprising a body and a surface layer, wherein the surface layer comprises a mixture comprising at least one hydrophilic polymer and ultrahigh molecular weight polyethylene having a weight average molecular weight of about 400,000 atomic mass units or more. The invention also provides a method for producing such a medical implant or medical implant.

The invention provides a medical implant or medical implant part comprising porous ultrahigh molecular weight polyethylene having a weight average molecular weight of about 400,000 atomic mass units or more and a porosity of about 15% to about 65%. The invention further provides a process for producing a medical implant or medical implant part.

Methods and apparatuses for analyzing proteins and other biological materials and xenobiotics within a sample. A specimen is generated, which may include an energy absorbent matrix. The specimen is struck with laser beams such that the specimen releases proteins. The atomic mass of the released proteins over a range of atomic masses is measured. An atomic mass window of interest within the range of atomic masses is analyzed to determine the spatial arrangement of specific proteins within the sample, and those specific proteins are identified as a function of the spatial arrangement. By analyzing the proteins, one may monitor and classify disease within a sample.

A method for determining an expression of human epidermal growth factor receptor 2 (HER2) of a subject. The method includes providing a sample from the subject; measuring one of (i) amounts of two or more proteins in the sample, each protein having a molecular weight substantially equal to 4740, 8404, 8419, 8435, 8450, 8455, 8465, 8570, 8607 or 8626 atomic mass units, and (ii) amounts of at least one of human cystein-rich intestinal protein 1 (CRIP1), one or more variants of the human cystein-rich intestinal protein 1 (CRIP1 variants), and proteolytic digestion products thereof in the sample; and comparing the amounts of the proteins to control amounts, which control amounts are determinative of the expression of the human epidermal growth factor receptor 2.

The invention provides a detection method and a test device for catalytic properties of a heatproof material based on an emission spectrum. The test device comprises a plasma power supply, an air inlet valve, an infrared temperature measurement window, a double-colorimetric thermodetector, an emission piston, an induction heating power supply, a reaction cavity, a resistance vacuum gauge, a vacuum flange, an induction coil, a zirconium oxide support frame, a single-shaft electric stepping machine, a long-focus focusing lens and a short-focus focusing lens. According to an 'atom-dissipation' laboratory representation method based on emission spectrum diagnosis disclosed by the invention, the disturbance of the surface of the material to gas-phase atoms is quantitatively analyzed by an actinic ray strength method, and the recombination coefficient of the gas-phase atoms at the surface of the material is calculated according to mathematic models of gas-phase diffusion and object surface atomic mass conservation conditions. The test device has the advantages that the operation is simple; based on a catalytic mechanism and by virtue of an emission spectrum diagnosis technique, the surface catalysis coefficients of conductive heatproof materials in a temperature range of 600-3000 DEG C can be obtained through measuring the concentration change of oxygen atoms at the surfaces of the materials to represent the surface catalytic properties of the materials based on catalysis principles and diffusion equations.

A magneto-resistive device is improved in characteristics by removing a surface oxide film to reduce the resistance and reducing an ion beam damage. The magneto-resistive device has a magneto-resistive layer which comprises a tunnel barrier layer, an underlying pinned layer, and an overlying free layer. A non-magnetic layer is formed on the free layer for protection. A composite-layer film comprised of an insulating layer and a damage reducing layer is formed in contact with an effective region which is effectively involved in detection of magnetism in the magneto-resistive layer without overlapping with the effective region. The damage reducing layer is made of a material which includes at least one element, the atomic weight of which is larger than that of silicon. The insulating layer and damage reducing layer do not constitute a magnetic domain control layer for applying a biasing magnetic field to the free layer.

A method for inhibiting formation of hydrocarbon hydrates in mixtures of water and a hydrate-forming guest molecule has been discovered that involves adding a composition to the mixtures in an amount that is effective in inhibiting formation of the hydrocarbon hydrates under conditions otherwise effective to form the hydrocarbon hydrates in the absence of the reaction product. The composition includes at least one dendrimeric compound having a number average molecular weight of at least 1,000 atomic mass units (amu); and at least one small molecular weight species having less than 1,000 amu, selected from the group consisting of polyalkyleneimine, polyallylamine, starch, sugars, and polymers or copolymers of vinyl alcohol or allyl alcohol; and, optionally, at least one surfactant.

The present invention relates to a high intensity fragrance composition for use in a cosmetic, toiletry, personal care, personal cleansing product or adsorbent article, which comprises by weight: a) 75% to 100% of at least 2 fragrance ingredients where each fragrance ingredients must contain only atoms of carbon, hydrogen, oxygen and nitrogen, comprise an ester functional group, an alcohol functional group or an aldehyde functional group, have boiling points between 100° C. and 300° C. at a pressure of 760 mm of mercury, have molecular weights within the range of 70 atomic mass units to 175 atomic mass units, and have ClogP values between 0.00 and 4.00; b) 0 to 25% of an essential oil; and c) 0 to 25% of a fragrance ingredient other than the fragrance ingredients in category a), wherein the sum of a), b) and c) equals 100%.

The amount of atoms diffused into a substrate may be made uniform or the thickness of a thin film may be made uniform in a low species utilization process by stopping the flow of gas into a reaction chamber during the low species utilization process. Stopping the flow of gas into a reaction chamber may entail closing the gate valve (the valve to the vacuum pump), stabilizing the pressure within the reaction chamber, and maintaining the stabilized pressure while stopping the gas flowing into the chamber. Low species utilization processes include the diffusion of nitrogen into silicon dioxide gate dielectric layers by decoupled plasma nitridation (DPN), the deposition of a silicon dioxide film by rapid thermal processing (RTP) or chemical vapor deposition (CVD), and the deposition of silicon epitaxial layers by CVD.

A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapour deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterised in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

Optical multilayer thin-film filters (OMTFFs) are disclosed. An exemplary filter includes a transparent substrate, a multilayer film (MF) on a surface of the substrate, and a top layer. The MF is of alternatingly laminated layers of a high-refractive-index (HRI) material and a low-refractive-index (LRI) material. The top layer is on an uppermost layer of the MF and is of a material having atoms of lower atomic weight than atoms of either the HRI or LRI materials. The OMTFFs are made in a vacuum environment by alternatingly laminating respective thin films of the HRI and LRI materials on the substrate. The top layer is formed on the MF. Between forming the MF and top layer is a suppression step in which the newly formed MF is exposed to moisture by briefly venting the vacuum to atmosphere. The moisture inhibits migration of the low-molecular-weight atoms into the HRI and LRI materials.

A multipurpose ion implanter beam line configuration constructed for enabling implantation of common monatomic dopant ion species and cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass- selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight.

Apparatus for delivering ions to a mass analyzer. The apparatus includes a time of flight ion guide, a pulsing device for receiving a continuous ion stream containing ions of different atomic mass and for delivering pulses of ions to the ion guide wherein ions in each of the pulses of ions exit the ion guide in ascending order of their atomic mass, and a gating device at the exit end of the ion guide for allowing ions of a predetermined atomic mass to pass to the mass analyzer.

Methods for the detection and measurement of tagged (labeled) biologically active materials in a sample are described. The tagged biologically active materials are detected using an atomic mass or optical spectrometer having a source of atoms or atomic ions. Element-labeled biologically active materials, comprising antibodies, antibody Fab′ fragments, antigens, aptamers, protein complexes, growth factors, hormones, receptors and other biologically active materials attached to a stable elemental tag, can be used in specific binding assays and measured by elemental spectroscopic detection. Also described are methods for the determination of metals in samples of interest using specific antibodies to isolate the target metals and elemental spectroscopy for detection and quantitation. Kits are provided comprising reagents to detect and measure labeled biologically active materials or labeled competition analytes.

The invention discloses a seed breeding method of moso bamboo by physical and chemical composite mutagenesis. The seed breeding method comprises the following five steps of: (1) collection of the moso bamboo seeds, wherein the purity of the seeds is more than or equal to 90%, the thousand seed weight is more than or equal to 28g, the moisture content is 10%-14%, and after being sealed, the seeds are stored for later use at the temperature of 4 DEG C; (2) irradiation ray selection of caesium Gamma rays with the atomic weight being 137 as an irradiation source, and selection of two types of mutagen treating liquid; (3) preparation of the two types of mutagen treating liquid; (4) physical and chemical composite mutagenesis treatment, wherein the radiation dose rate is 1Gy/min, the radiation dose is 30Gy, the seeds are soaked for tens of hours with warm water, after water-absorbing paper absorbs the surface water of the seeds completely, the seeds are soaked and mutagenized for eight hours by using a sodium azide solution (NaN3) or ethylmethane sulfonate (EMS) solution with the concentration of 0.04mmol/L, and after being taken, the seeds are cleaned repeatedly for 2 hours by using clean water to obtain the moso bamboo seeds treated by composite mutagenesis; and (5) germination test of the seeds, verification of mutagenic effect and determination of mutagenesis dose. The seed breeding method disclosed by the method has the advantages that the mutants in mutagenesis are more in quantity, the character mutation is diversified, and the selection range of excellent characters needed in seed breeding is large.

A polyurethane foam is prepared from a reaction mixture that includes an aromatic isocyanate compound, and blowing agent, and a polyol that itself includes a poly(phenylene ether) having a number average molecular weight of 600 to 2000 atomic mass units and an average of 1.5 to 3 hydroxyl groups per molecule. Use of the poly(phenylene ether) is associated with faster formation of polyurethane, and increased compression force deflection. The polyurethane is useful for forming articles including bedding, furniture, automotive interiors, mass transportation interiors (seating, padding, instrument panels, door panels, steering wheels, armrests, and headrests), flooring underlay (foam, rebond binder), packaging, textiles, lining and gasketing applications, acoustic dampening materials, and weather stripping.

The present invention provides a negative image recording material for use in a thermal exposure system, comprising (A) an infrared absorber comprising a cyanine dye having a substituent containing an atom having an atomic weight of at least 28, such as a halogen atom , or substituents containing non-shared electron pairs such as carbonyl, (B) radical generators and (C) radical polymerizing compounds, and imaging on it requires exposure to infrared radiation.

A fatty acid metal salt used for forming ultrafine metal particles satisfying at least one of that:

(i) the water content is 200 ppm or less;

(ii) the volume-cumulative particle diameter D90 is 80 μm or smaller as measured by the particle size distribution measuring method of the laser diffraction/scattering type; or

(iii) a metal of an atomic weight of 50 to 200 is contained, and the amount of the unreacted substance or the by-product is 4.0 mol % or less when the fatty acid metal salt is formed. The fatty acid metal salt can be favorably used for forming ultrafine metal particles in a resin, or for forming a resin composition, a coating, a dispersion solution or a molded article containing the ultrafine metal particles.

Disclosed is a lithographic printing plate support obtainable by subjecting an aluminum plate to an electrochemical graining treatment with an aqueous solution containing hydrochloric acid, anodizing treatment and alkali metal silicate treatment at least, wherein: a surface of the support has a grained shape in which large pits with a mean aperture diameter of 2 to 10 μm and small pits with a mean aperture diameter of 0.05 to 0.8 μm overlap with each other, with the mean ratio of depth to aperture diameter of the small pits being 0.2 to 0.6; a surface area difference ΔS⁵⁰ defined by equation (1):

ΔS⁵⁰=(S_x⁵⁰−S₀⁵⁰)/S₀⁵⁰×100 (%)   (1)

in which S_x⁵⁰ is the actual area of a 50 μm square region of the surface as determined by three-point approximation from three-dimensional data obtained by measuring the region with an atomic force microscope at 512×512 points and S₀⁵⁰ is the geometrically measured area of the same region, is 20 to 40%; the alkali metal silicate treatment is performed using an aqueous solution of pH 11.5 to 13.0 which contains an alkali metal silicate; and an amount of Si atoms deposited to the surface is 3.0 to 15.0 mg/m². The presensitized plate according to the present invention allows not only the press life but also the resistance to scumming by ink spreading, resistance to scumming by leaving and resistance to scumming by failed deletion, and the water visibility as well, to be excellent, even if an FM screen is used for halftone.

The present invention relates to an ultraviolet diode and an atomic mass analysis ionization source collecting device using an MCP. In the manufacturing of a portable atomic mass analyzer, an object of the present invention is to use an MCP electron multiplier plate, whereby ultraviolet photons emitted from an ultraviolet diode are irradiated on a front surface plate of the MCP electron multiplier plate to induce primary electrons, an amplified electron beam is collected from the electrons, and an electron beam is generated at a low temperature and low power and having a discharge time that is accurately controlled. The atomic mass analysis ionization source collecting device using an ultraviolet diode and an MCP according to the present invention comprises: an ultraviolet diode emitting ultraviolet rays by means of supplied power; an MCP electron multiplier plate inducing and amplifying primary electron discharge from ultraviolet photons from the ultraviolet diode, and collecting a large amount of electron beams from an MCP reverse surface plate; an electron condenser lens condensing the electron beam amplified through the MCP electron multiplier plate; an ion trap atomic mass separator ionizing gas sample molecules by means of an electron beam injected through the electron condenser lens; and an ion detector performing detection of ions separated from the ion trap atomic mass separator, by means of an atomic mass spectrum.