659 results about "Single exposure" patented technology

A digital camera includes a CCD imager having an interline transfer scheme. A first charge produced due to first exposure is read from light receiving elements positioned vertically intermittently. A second charge produced due to second exposure is also read from the same light receiving elements to vertical transfer regions. Here, the first charge is vertically moved simultaneously with or prior to reading out the second charge. The moving distance, at this time, is equal to or greater than a distance that the light receiving elements continue in the vertical direction. As a result of this, the second charge will not be mixed with the first charge. The first and second charges are subjected to a compositing process to display a composite image on an LCD.

An exposure apparatus and photo-mask of the exposure apparatus can form a perpendicular line/space circuit pattern through only a single exposure process. The photo-mask includes a first line/space pattern oriented in a first direction, a second line/space pattern oriented in a second direction and lattice patterns, operating as polarizers, occupying the spaces of the line/space patterns. The exposure apparatus also includes a modified illuminating system. The modified illuminate system may be a composite polarization illuminating system having a shielding region, and a plurality of light transmission regions defined within the field of the shielding region. The light transmission regions are implemented as polarizers that polarize the light incident thereon in the first and second directions, respectively.

The images sensor includes a readout circuit capacitatively coupled to a memory circuit. The readout circuit includes: (i) a photon detector to receive a plurality of photons and to provide a charge signal corresponding to the received photons, (ii) a resettable integrator that is reset multiple times over a single exposure time and provides an analog representation of the incident photons during the last integration cycle, and (iii) a comparator that monitors the integrator output and generates a reset pulse when the integrator reaches a built-in threshold value. The memory circuit includes: (i) a receiver circuit that detects the output of the digital driver in the front-end readout circuit via capacitive coupling and generates a digital voltage pulse for each received signal, and (ii) a digital counting memory to count the received pulses to provide a coarse digital representation of how many times the integrator is reset.

A method for resolution enhancement of a still-image made by a digital imaging device. The method allows the use of high-aperture-ratio sensing arrays that produce resolution-enhancement, independent of the angle of view. Resolution-enhancement is achieved using a multiple-exposure technique of a sub-pixel overtap in conjunction with a whole-pixel shift. The method suppresses color-aliasing in a multiple-exposure native-resolution mode and enables the use of a single camera for single-exposure and multiple-exposure modes.

A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity of an outer circumference of the substrate during a detecting operation. The control system controls the stage system to perform the detecting operation with the first stage, while performing a first exposure operation on the substrate held by the second stage. After the first exposure operation, a second exposure operation for the substrate held on the first stage is performed, in which a shot area in the vicinity of the outer circumference of the substrate is exposed by moving the first stage while adjusting a position of the substrate surface held by the first stage using the detected focusing information.

A method for constructing a final image using adaptive exposure control in multiple exposure photography, comprising: (a) capturing an exposure; (b) analyzing the exposure at least to determine deficiencies in the exposure; (c) setting exposure parameters for at least one next exposure adapted to construct the final image with ameliorated deficiencies; (d) capturing the at least one next exposure using the set exposure parameters; and, (e) constructing a final image utilizing portions of at least the two exposures.

The present invention relates to radiographic imaging apparatus for taking X-ray images of an object. In various two-panel radiographic imaging apparatus configurations, a front panel and back panel have substrates, arrays of signal sensing elements and readout devices, and passivation layers. The front and back panels have scintillating phosphor layers responsive to X-rays passing through an object produce light which illuminates the signal sensing elements to provide signals representing X-ray images. The X-ray apparatus has means for combining the signals of the X-ray images to produce a composite X-ray image. Furthermore, the composition and thickness of the scintillating phosphor layers are selected, relative to each other, to improve the diagnostic efficacy of the composite X-ray image. Alternatively, a radiographic imaging apparatus has a single panel having arrays of signal sensing elements and readout devices and scintillating phosphor layers that are disposed on both sides of a single substrate. The present invention further relates to various embodiments of indirect dual-screen DR flat-panel imager apparatus that provide single-exposure dual energy imaging.

The surface shape of a three-dimensional object is acquired with an optical sensor. The sensor, which has a projection device and a camera, is configured to generate three-dimensional data from a single exposure, and the sensor is moved relative to the three-dimensional object, or vice versa. A pattern is projected onto the three-dimensional object and a sequence of overlapping images of the projected pattern is recorded with the camera. A sequence of 3D data sets is determined from the recorded images and a registration is effected between subsequently obtained 3D data sets. This enables the sensor to be moved freely about the object, or vice versa, without tracking their relative position, and to determine a surface shape of the three-dimensional object on the fly.

A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects on a layer-by-layer basis by selectively exposing layers of material to prescribed synergistic stimulation including forming portions of a lamina using a first exposure, allowing a time delay, and then applying a second exposure. The time delay is sufficient to allow shrinkage of the material to occur that results from the first exposure. It is preferred that the solidified portion resulting from the first exposure does not adhere to the previously formed lamina. It is also preferred that the portion solidified by this first exposure does not adhere to any boundary region that may have been exposed and adhered to the previously formed lamina. The time delay associated with a given cross-sectional region may be occupied by exposing other cross-sectional regions. The delay may occur between two exposures of overlaying hatch or fill vectors. The delay may alternatively occur between exposure of hatch vectors and boundary vectors. The time delay may be determined by a clock, or alternatively, the time delay may be considered to have lapsed upon certain physical conditions being met, such as detecting the amount of shrinkage and determining that it has progressed far enough for the second exposure to occur.

A method of imaging a pattern in a microlithographic exposure apparatus includes performing two exposures, each with a different mask, the superposition of the images defined by the two masks produces the complete circuit pattern. A dipolar illumination mode is used for each exposure, the dipoles of the two exposures being mutually perpendicular. The dipolar illumination mode of the first exposure is used to image mask features parallel to a first direction, and the dipolar illumination mode of the second exposure is used to image mask features perpendicular to the first direction.

Disclosed herein is a method that relates to identifying a microorganism. The method comprising, diffracting laser light through a microorganism, combining a reference beam with the diffracted light on a single axis, and recording the combined light holographically as a three-dimensional image with a single exposure on a detector array. The method further comprising, reconstructing the holographic image and matching the reconstructed image with reference images of known microorganisms. Further disclosed herein is an apparatus for identifying a microorganism. The apparatus comprising, an interferometer to record an image of an unknown microorganism using single-exposure on-line (SEOL) digital holography, a means for reconstructing the recorded image, and a means for matching the reconstructed image with images of known microorganism.

A photomask for use in photolithography has substrate, a main pattern at one side of the substrate, and a transparency-adjusting layer at the other side of the substrate. The transparency-adjusting layer has a characteristic that allows it to change the intensity of the illumination incident on the main pattern during the exposure process accordingly. In manufacturing the photomask, a first exposure process is carried out on a wafer using just the substrate and main pattern. The critical dimensions of elements of the pattern formed on the wafer as a result of the first exposure process are measured. Differences between these critical dimensions and a reference critical dimension are then used in designing a layout of the transparency-adjusting layer in which the characteristic of the layer is varied to compensate for such differences.

Methods and apparatuses for correcting image artifacts in a high dynamic range image formed by combining a plurality of exposures taken at different integration periods. A determination is made as to whether there is motion between the exposures. If motion is detected, pixel signal values chosen are replaced with pixel signal values from another exposure.

The invention provides an incoherent digital holography three-dimensional dynamic microscopic imaging system and method and belongs to the field of an optical diffraction imaging and incoherent digital holography technology. Three-dimensional microscopic imaging of dynamic samples is achieved through adoption of a single exposure phase shift technology based on a phase spatial light modulator on the condition of incoherent light illumination. In a hologram shooting light path, incident light is incoherent light transmitted or reflected by the samples, is subjected to convergence of a collimation lens and modulation of the spatial light modulator, and is received by an image sensor. The image sensor and the spatial light modulator are respectively connected with a computer. Diffraction spectroscopic phase mask patterns which are made and generated in the computer are loaded on the spatial light modulator. In order to enable a plurality of phase holograms to be recorded by the system through one-time exposure, a phase loading method on the spatial light modulator needs to be adjusted to a regional phase shift loading method. The incoherent digital holography three-dimensional dynamic microscopic imaging system and method can be used for simultaneously recording the plurality of incoherent digital holograms through one-time exposure, and can be used for carrying out real-time three-dimensional imaging with low requirements for coherence of light sources. Moreover, any moving components or scanning components are not needed in the system.

A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selectively modified by reactive ion etch (RIE). The protective layer is photosensitive and anti-reflective. An extremely thin photoresist layer is coated on top of the protective layer. The stack of the films is selectively exposed to actinic radiation at a wavelength determined by the sensitivities of the protective layer and photoresist layer. The latent images on the photoresist and protective layers resulting from the exposure are developed with a common alkaline developer. The three dimensional patterns of photoresist and underlying protective layer are formed simultaneously by the single exposure and single development. When the underlying substrate is etched by RIE, the protective layer is the masking layer, not the photoresist.

The invention provides a method and a system of time-domain optical coherence tomography without depth scan. On the basis of a time-domain optical coherence tomography method, the method of the invention comprises substituting convex lens with cylindrical surface for focusing lens interfering with a reference arm to form linear reference light, introducing continuous light path difference in a linear length direction of the reference light through tilting a reference planar mirror of the reference arm, substituting a one-dimensional detector array for a point photoelectric detector, acquiring interference signals of a sample to be measured at continuous different depth of a same detecting point, carrying out a Hilbert transformation analysis on the interference signals in the linear length direction of the reference light after removing direct current background, and finally obtaining a tomographic profile of the sample to be measured. The method and the system of the invention can realize one-dimensional optical coherence tomography with single exposure, and have the advantages of a simple structure, a high imaging speed, no parasitic image, and insensitivity to motion blur. In a situation of not sacrificing a system signal-to-noise ratio, time-domain optical coherence tomography without depth scan can be realized.

An imprint method, in which pattern forming is performed by having a light curable material applied on a sample face of a substrate being a processing target hardened by being exposed to light in a state where the light curable material and a pattern formed surface of a template contact each other, the pattern formed surface having a concave-convex pattern formed thereon; wherein in one exposure performed with respect to a predetermined shot of the light curable material, an exposure amount at a light curable material on a first region which contacts a pattern formed region including the concave-convex pattern of the template is greater than an exposure amount at a light curable material on a second region which at least contacts a part of a pattern periphery region of the template, the pattern periphery region existing in a periphery of the pattern formed region of the template.

The process forms a pattern by applying a resist composition onto a substrate to form a resist film, baking, exposure, post-exposure baking, and development. The resist composition comprises a polymer comprising recurring units having an acid labile group and substantially insoluble in alkaline developer, a PAG, a PBG capable of generating an amino group, a quencher for neutralizing the acid from PAG for inactivation, and an organic solvent. A total amount of amino groups from the quencher and PBG is greater than an amount of acid from PAG. An unexposed region and an over-exposed region are not dissolved in developer whereas only an intermediate exposure dose region is dissolved in developer. Resolution is doubled by splitting a single line into two through single exposure and development.

The invention provides a manufacturing method of a TFT (Thin Film Transistor) substrate structure. According to the manufacturing method of the TFT substrate structure, via holes and a groove are formed in a planarization layer through single exposure by utilizing a halftone photomask, and half-exposure is realized through half-light-transmitting patterns on the halftone photomask; the groove with smaller depth is formed in the planarization layer of a fan-out area, so that the slope of the groove in the planarization layer of the fan-out area is decreased, the phenomenon of residue of a transparent conductive layer at corners of the groove caused by non-thorough photoresist exposure at the corners of the groove during photoresist exposure developing is avoided, and the phenomenon of short circuit between metal lines of the fan-out area is further avoided; meanwhile, the aperture ratio of an effective display area is not influenced, and the display quality of a liquid crystal display panel is greatly improved; moreover, by widening the groove in the planarization layer of the fan-out area, the phenomenon of reduction of an adhesion force of a frame sealing adhesive caused by decrease of the slope of the groove and reduction of the depth of the groove is avoided, and the adhesion property of the frame sealing adhesive in the liquid crystal display panel is further protected from being influenced.

The present invention provides an optical modeling method capable of inhibiting distortion in an object to be modeled and modeling with higher precision. A square exposure region is divided into a plurality of pixels which are further divided into first and second pixel sub-groups, the first pixel sub-group is exposed such that neighboring pixels or more are not exposed at one time, and then unexposed pixels incorporated in the second pixel sub-group are exposed two neighboring pixels or more are not exposed at one time. A photo-curable resin is exposed twice, and then cured in an amount of one photo-curable resin layer. Accordingly, the neighboring pixels are not exposed at one time, the producing of curing shrinkage is limited within one pixel, and distortion due to the curing shrinkage does not spread to the pixels neighboring the one pixel, whereby distortion in the object to be modeled can be inhibited significantly, and modeling with higher precision is made possible.

Apparatus for storing an optical image of an object comprises an imaging device having a multiplicity of pixels, each pixel including a light sensor and a multiplicity of storage cells coupled to the sensor. A lens system focuses light from the object onto the imaging device. Within each pixel a first one of its storage cells is configured to store data corresponding to a first exposure of its sensor to light from the object, and a second one of its storage cells is configured to store data corresponding to a second exposure of its sensor to light from the object. In a preferred embodiment, the pixels are arranged in an array extending along a first direction, and during the time interval between the first and second exposures, a translator is configured to produce, in a second direction, a relative translation or shift between the imaging device and the focal point of the lens system. In one embodiment, the second direction is traverse to the first direction. In a preferred embodiment, each pixel comprises a photosensitive region, and the pixels are shifted by a distance that is approximately equal to one half the pitch of the photosensitive regions as measured in the second direction. In this fashion, the invention increases the spatial resolution by increasing the effective number of pixels of the sensor without increasing the actual number of pixels. In alternative embodiment of the invention, the dynamic range of the sensor is enhanced.

An exposure controller of a digital camera, using an image pick-up device, includes a photometering sensor, and a control device. The control device calculates a first exposure time in accordance with a photometering value obtained via the photometering sensor, and performs a pre-exposure in which a sensitive surface of the image pick-up device is exposed at a second exposure time shorter than the first exposure time. Thereafter, the control device performs a main exposure in which the sensitive surface of the image pick-up device is exposed at a third exposure time obtained by changing the value of one of the first exposure time and the second exposure time in accordance with a picture signal output from the image pick-up device, the picture signal being output when the image pick-up device is exposed at the second exposure time by the pre-exposure.

An image-capturing apparatus includes an image-capturing optical system; a sensor unit having line sensors that receive light fluxes of an object, which have been transmitted through a pair of partial areas in an exit pupil of the image-capturing optical system; image-capturing elements having a pixel arrangement capable of generating an image signal and a focus detection pixel sequence, in which two or more pairs of pixels that receive the light fluxes of an object, are arranged in a predetermined direction; a continuous image-capturing unit configured to perform continuous image capturing of actually exposing the image-capturing elements; a signal generation unit configured to perform another exposure for the sensor unit; a first focus detection unit configured to perform focus detection of a phase-difference detection method; a second focus detection unit configured to perform focus detection; and a focus adjustment unit configured to perform focus adjustment.