12results about How to "Small feature size" patented technology

The invention relates to the field of semiconductor packaging, and provides a semiconductor packaging structure and a forming method thereof, and the method comprises the steps: providing a glass substrate which is provided with a plurality of discrete glass through hole interconnection structures; an inorganic dielectric layer and a first interconnection structure located in the inorganic dielectric layer are formed on the upper surface of a glass substrate through the BEOL technology in the front-end manufacturing process of a semiconductor, and the density of the formed first interconnection structure is larger than that of a second interconnection structure formed on the lower surface of the glass substrate subsequently. The feature size of the first interconnection structure is smaller than that of a subsequently formed second interconnection structure; forming an organic passivation layer and a second interconnection structure located in the organic passivation layer on the lower surface of the glass substrate by adopting an RDL process in a semiconductor back-end process; and mounting at least one first semiconductor chip on the upper surface of the inorganic dielectric layer. The method improves the wiring density of the first interconnection structure on the upper surface of the glass substrate.

The invention relates to the technical field of microelectronic devices, and provides a flexible self-supporting vertical optical waveguide array and a preparation method and application thereof. According to the flexible self-supporting vertical optical waveguide array and the preparation method thereof, an ultraviolet-curable SU-8 polymer is used as an optical waveguide material, a vertical optical waveguide array is prepared on a substrate by using simple coating, photoetching and ICP etching processes, then a flexible supporting layer is prepared, and the substrate is removed, so that the flexible self-supporting vertical optical waveguide array is obtained. The flexible self-supporting vertical optical waveguide array provided by the invention can solve the photoelectric crosstalk problem of an image sensor, improves the detection sensitivity in a weak light environment, has excellent flexibility, and can realize conformal fitting with the surface of the image sensor; moreover, the flexible self-supporting vertical optical waveguide array does not depend on the pixel size of the image sensor, the preparation process is independent of the preparation process of the image sensor, the universality is high, and the flexibility is good.

The invention provides a lens-free dynamic imaging system and a lens-free dynamic imaging method with distinguishable motion. The system comprises a laser light source, a binary optical mask, an image sensor and image processing equipment, coherent light emitted by the laser light source is coded and modulated by the binary optical mask and then propagated to the image sensor, the image sensor collects multiple frames of diffraction images of a moving sample and transmits the collected images to the image processing device, and the image processing device reconstructs the images through a neural network method. According to the image reconstruction method, physical priori knowledge of a lensless diffraction propagation model is fused into implicit neural representation, and a space-time priori loss and bidirectional memory training method is designed for network training, so that artifacts and blur generated by moving target imaging can be effectively reduced, and a high-resolution and high-quality imaging result can be obtained.

The present invention relates to the field of photoresist technology, and in particular, to a photoresist, a photoresist combination product and a method for patterning a photoresist. The photoresist comprises an organic solvent, a photoacid generator and a zirconium oxide nanoparticle film-forming resin, and the zirconium oxide nanoparticle film-forming resin is prepared by mixing zirconium propoxide and an unsaturated organic carboxylic acid and heating. The photoacid generator can induce the agglomeration of the zirconium oxide nanoparticle film-forming resin and has a structure shown in Formula I and / or Formula II, wherein R1 to R8 are independently selected from -H, -CH3, methoxy, ethoxy or hydroxyethoxy. The photoresist has a fast photolithography molding rate and the characteristic size of the processed pattern can reach the nanometer level. The present invention also provides a photoresist combination product comprising the photoresist and a method for patterning a photoresist. #imgabs0#.

The electrochemical reaction device comprises a plurality of electrochemical reaction units which are sequentially connected in series; the electrochemical reaction unit comprises a vertical cylindrical first reaction part and a U-shaped cylindrical second reaction part; the upper end and the lower end of each electrochemical reaction unit are provided with connecting pieces connected with the screen plate, and the connecting pieces are used for fixing the outer electrode and the inner electrode and are hermetically connected with the first reaction part and the second reaction part; an automatic exhaust valve is arranged above the second reaction part connected in each electrochemical reaction unit; gas in the electrolysis system is discharged out of the reaction system; attachments on the surface of the electrode are easy to clean and convenient to disassemble; installation is simple and fast; catalytic layers for electro-catalytic reaction are prepared on the inner wall of the outer electrode and the outer wall of the inner electrode of each electrochemical reaction unit; and catalyst layer materials on the surfaces of the positive and negative electrodes can be timely repaired.

The additive manufacturing method of the optical element provided in the application comprises the following steps: calculating the structure parameters of an axial gradient refractive index lens; establishing a UG three-dimensional model according to the structure parameters; adopting the forming slurry to perform light curing forming on the UG three-dimensional model; performing debinding treatment on the UG three-dimensional model after the light curing forming; performing sintering treatment on the green body after the debinding; and cleaning the sintered green body to obtain the lens with variable refractive index. The additive manufacturing method of the optical element provided in the application realizes the processing and manufacturing of the variable refractive index lens through DLP light curing 3D printing, improves the processing speed under the premise of ensuring the processing precision, and has the advantages of fast forming speed, small feature size and macro-micro cross-scale forming capability.

The invention discloses a high-voltage vacuum arc-extinguishing unit based on asymmetric arc-extinguishing chambers, which comprises two asymmetric vacuum arc-extinguishing chamber parts which are connected back to back, and comprises a static end, a movable end, a shielding cover and a shell, and is characterized in that the static end comprises a static end plate, a conductive core and a static contact; the moving end comprises a moving contact, a moving end plate and a conducting rod; the shielding case is connected with the shell, the static end and the moving end to form a closed structure; a conductive core is arranged on one surface of the static end plate; the other surface of the static end plate is connected with the static contact and the shielding cover; one end of the conducting rod is connected with the moving contact, and the other end of the conducting rod penetrates through the moving end plate and is connected with an external operating structure; according to the high-voltage vacuum arc-extinguishing chamber, a static conducting rod used in conventional design is replaced, the distance between the movable conducting rod and the static conducting rod is reduced, the characteristic size of the arc-extinguishing unit is reduced, and the manufacturing cost is greatly reduced; and the manufacturing difficulty and the engineering cost caused by geometric amplification of the single arc extinguish chamber can be reduced exponentially.

The present application discloses a method, device, equipment and storage medium for detecting watermarks in text, wherein the method comprises: extracting the sentiment feature mask of the text to be processed; obtaining the ciphertext watermark of the text to be processed when it is determined that the text to be processed has a watermark mark, wherein the ciphertext watermark is formed by embedding the sentiment feature mask into the text to be processed according to a conversion rule; determining the matching degree between the sentiment feature mask and the ciphertext watermark; and performing ciphertext watermark detection on the text to be processed according to the matching degree. The embodiments provided in the present application solve the problem that the ciphertext watermark detection technology for digital text has shortcomings in terms of security, transparency, robustness, etc., and cannot achieve a good balance in performance.

The invention relates to a method for preparing a magnetic metal nickel gradually-thinned nanowire, which comprises the following steps of: (1) irradiating and sensitizing a polymer template by using a fast heavy ion beam to obtain a polymer template with a latent track; (2) sputtering a gold conductive layer on one side of the polymer template of the latent track, and depositing a copper conductive layer on the surface of the gold conductive layer by using electrochemical deposition; (3) etching one side, without the gold-copper conductive layer, of the polymer template of the latent track by adopting an etching solution to obtain a polymer template with a gradually-thinned linear pore channel; (4) electrochemically depositing a magnetic metal nickel gradually-thinned nanowire on one side, without the gold-copper conductive layer, of the polymer template with the gradually-thinned linear pore channel; and (5) stripping the gold-copper conductive layer to obtain the magnetic metal nickel gradually-thinned nanowire. The method is simple and efficient, controllable preparation of the magnetic metal nickel gradually-thinned nanowire array is achieved for the first time, and the small-size magnetic metal nickel gradually-thinned nanowire array with excellent microwave absorption performance is successfully prepared.

This invention discloses a special grating photolithography method and its resist replenishment system. Based on laser direct writing technology, this invention utilizes the characteristic that the printed grating has different resolution requirements in different dimensions. The printed structure is rotated in coordinates to ensure that the system's high-resolution projection matches the high-resolution requirements of the printed structure, achieving high-quality printing. Furthermore, to enable long-term writing and printing, this invention also provides a device for continuous resist replenishment during extended writing processes. This device can also be used for in-situ development and optical imaging.

The application is suitable for the field of modulation devices, and provides an ultrafast tunable spatial phase modulator for 6G communication and a manufacturing method. The tunable spatial phase modulator is used for receiving terahertz waves and a terahertz wave modulation device. The terahertz wave modulation device comprises a field source capable of generating an acting field acting on the tunable spatial phase modulator. The tunable spatial phase modulator comprises a seat body and a modulation part arranged on the seat body. The modulation part comprises a subwavelength structure and a modulation layer. The subwavelength structure is arranged on the seat body in a spiral pattern along a direction from close to far from the seat body. The highest height of the subwavelength structure is equal to the central wavelength of the terahertz wave. The modulation layer is arranged on the surface of the subwavelength structure far from the seat body. The modulation layer is used for receiving the terahertz wave and the acting field to modulate the phase of the terahertz wave. By adopting the subwavelength structure, the terahertz wave can be modulated in a wider range of wave bands.

The application provides an optical anti-counterfeiting element and an anti-counterfeiting product. The optical anti-counterfeiting element comprises a substrate, and a code pattern, wherein a part of a side surface of the substrate is provided with the code pattern, the code pattern reproduces preset information through decoding, the code pattern comprises a first part and a second part, the first part and the second part are arranged in mutual embedding, the first part is transparent, and at least a local characteristic size of the first part is not greater than 5 microns, the second part comprises an optical microstructure and a plating layer covering the optical microstructure on a side surface away from the substrate, when a light beam is incident on the first part and the second part, the second part provides a line optical anti-counterfeiting feature in a reflection light direction and near the reflection light direction visible to a human eye, the first part generates a transmission light field, and the transmission light field reproduces the preset information. The application solves the problem that the optical anti-counterfeiting element in the prior art is difficult to simultaneously consider concealment and security.