27 results about "Zone plate" patented technology

The invention discloses a space customization three-dimensional column vector light beam array generation method based on a metasurface, and belongs to the field of micro-nano optics, diffraction optics and structured light field regulation and control. The implementation method comprises the following steps of: independently regulating and controlling left-hand circular polarization and right-hand circular polarization components of incident light based on geometric and propagation phase joint modulation of the metasurface; a metasurface, a phase distribution coding lens factor of a polarization channel, a Dammann vortex grating with opposite basic topological charges and a spiral Dammann zone plate are independently optimized, and left-handed and right-handed circular polarization components generate a three-dimensional vortex beam array with opposite spatial topological charges in a near-field Fresnel domain; the left-handed circular polarization vortex array and the right-handed circular polarization vortex array with opposite topological charges are coherently superposed to form a spatially customized three-dimensional column vector light beam array, and the vector characteristic of each light beam in the array depends on the amplitude ratio, the phase difference and the topological charges of the left-handed circular polarization component and the right-handed circular polarization component on each diffraction order. According to the invention, the regulation dimension of the column vector light beam can be expanded.

The present invention relates to a reactor and a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor includes a reaction chamber containing a showerhead, a submount, and at least one base support. The showerhead includes at least one gas outlet configured to provide a gas flow of at least one material or a gas flow of at least one component of the at least one material. The abutment is rotatable about an abutment axis of rotation. At least one substrate support is disposed on the submount and configured to rotate the substrate about a substrate axis of rotation. In particular, the substrate holder is configured to rotate the substrate about a substrate axis of rotation, where the abutment axis of rotation and the substrate axis of rotation are inclined relative to each other. The invention also relates to an X-ray microscope for generating an enlarged image of an object using X-rays.

The invention belongs to the technical field of micro-nano processing, and particularly relates to a Pt-HSQ-based high-resolution X-ray Fresnel zone plate and a preparation method thereof. According to the X-ray Fresnel zone plate, a Pt-HSQ metal-inorganic material system is adopted, a diffraction structure with a large aspect ratio and Pt material quasi-periodic dense stripes specially needed by an X-ray zone plate lens is formed through electron beam lithography and an ALD process, and diffraction focusing from a soft X-ray wave band to a hard X-ray wave band and imaging with an amplification function are achieved. The wave zone plate has excellent mechanical stability, and the irradiation resistance and morphology retentivity of the wave zone plate under high-energy irradiation are remarkably improved. And high-resolution X-ray focusing elements with different energy wavebands and different focal lengths can be prepared according to geometric design and material selection of the wave zone plate. The lens is suitable for microscopic imaging, coherent diffraction imaging, X-ray spectrum, nanometer detection and other scenes of a synchrotron radiation or off-line laboratory X-ray light source, and has wide popularization value and application prospect.

The present invention relates to the field of laser alignment measurement and monitoring technology, and in particular to a multi-hole coding mark and measurement method for laser alignment monitoring, wherein the coding mark includes a mark body, a laser alignment hole is provided on the mark body, and no less than two coding holes are provided around the laser alignment hole. The laser alignment hole and the coding hole have a certain geometric position relationship, and the coding holes include a first type of coding hole and multiple second type of coding holes. Compared with traditional laser alignment marks, when using this multi-hole coding mark for position measurement, this multi-hole coding mark does not need to be tilted after adjustment and fixation, eliminating the repeatability error caused by the traditional tilted wave zone plate, and multiple marks do not affect each other when used at the same time, and can realize one-time monitoring and measurement of all monitoring points, and obtain the two-dimensional coordinate values of the monitoring points at the same time, which greatly improves efficiency and is suitable for the field of high-precision laser online alignment measurement.

The invention discloses a double-end observation method of a vacuum wave zone plate method laser alignment displacement measuring device, which comprises the following steps of: installing a vacuum laser alignment displacement measuring device at the top of a super-long building; the device is composed of a laser emission device, a measuring point box (including a wave zone plate), a vacuum pipeline (including a vacuum pump and corollary equipment), a laser connection automatic measurement and control device and the like. Meanwhile, a laser receiving device is arranged at the laser emitting device at the left end of the original system, and a laser emitting device is arranged at the laser receiving device at the right end of the original system; according to the invention, reliable application of the vacuum zone plate method laser alignment displacement measurement device in an environment with an ultra-long measurement distance (greater than or equal to 1000m) can be realized, the effective measuring ranges of all measurement points are guaranteed, the difficulty and complexity of system design and implementation are reduced, and the engineering investment can be reduced.

The present disclosure provides a method for preparing a zone plate, a zone plate, and an optical lens. The method includes determining a preset radius of each annular zone at a preset position based on a compensation phase difference and an optical path formula, wherein the compensation phase difference is determined based on a preset phase, a wavelength of light, and the optical path corresponding to the annular zone; the compensation phase difference is used to ensure that the optical path lengths of light passing through the same annular zone to reach an imaging point are equal, while the optical path length difference of light passing through different annular zones to reach the imaging point is an integer multiple of the wavelength of light, and the optical path formula characterizes the relationship between the radius parameter of each annular zone and the optical path length; determining a preset thickness of each annular zone at a preset position based on the complex refractive index of the zone plate and the compensation phase difference; and preparing an annular zone of a preset radius and preset thickness at the preset position of the zone plate for each annular zone, wherein the preset thickness ensures that the phase of light passing through all positions of the zone plate is synchronized at the imaging point.

The utility model discloses a temperature control variable-focus zone plate device which comprises a variable-focus zone plate body, the variable-focus zone plate body comprises a sapphire substrate and a plurality of concentric rings arranged on the sapphire substrate at intervals, and each concentric ring is composed of two concentric ring bodies which are connected in a sleeved mode. The two concentric ring bodies are respectively made of a VO2 material and an Au material from inside to outside, when the temperature of the variable-focus zone plate body is higher than 353 K, a main focus is located at (0, 0 and f1), when the temperature of the variable-focus zone plate body is lower than 353 K, the focus is located at (0, 0 and f2), and f2 is equal to 2f1. According to the utility model, each concentric ring is formed by sleeving a concentric ring body made of a VO2 material and a concentric ring body made of an Au material, when the temperature of the zoom zone plate body is higher / lower than 353 K, the VO2 material shows metallic / dielectric property, the width of the light-proof / light-transmitting concentric ring body in the zoom zone plate body is increased, and the focus is located at the position of (0, 0, f1) / (0, 0, f2), thereby realizing zooming.

The present invention discloses a system and method for implementing Fresnel incoherent correlation holography super-resolution microscopy using a multiplexed SLM. The system comprises a microscope module, a polarization module, a spatial light modulation module, a holographic detection module, and an image processing module. The microscope module uses a light source to illuminate a sample and collects the sample light. The polarization module includes a lens and a polarization unit to generate polarized sample light. The spatial light modulation module includes a spatial light modulator and a conversion unit to input the second modulated sample light into the holographic detection module. The holographic detection module includes a second quarter-wave plate, an imaging lens unit, and a polarization camera. The image processing module acquires and processes the polarized image set to produce a reconstructed image. This method maintains the integrity of the zone plate pattern, solves the problems of random errors and reduced image quality in existing Fresnel incoherent correlation holography technology, and improves the flexibility of the system.

Disclosed is a substrate comprising at least one target, the target comprising: a reference substructure in a top layer; and a buried substructure in a buried layer below the top layer. The buried substructure includes a non-constant pitch, such as a zone plate, in at least one direction that causes a reflected wave reflected from the substructure to be focused at least partially toward a focus as a result of a measurement of the target.

A system may comprise a selectively transparent projection device for projecting an image toward an eye of a viewer from a projection device position in space relative to the eye of the viewer, the projection device being capable of assuming a substantially transparent state when no image is projected; an occlusion mask device coupled to the projection device and configured to selectively block light traveling toward the eye from one or more positions opposite of the projection device from the eye of the viewer in an occluding pattern correlated with the image projected by the projection device; and a zone plate diffraction patterning device interposed between the eye of the viewer and the projection device and configured to cause light from the projection device to pass through a diffraction pattern having a selectable geometry as it travels to the eye.

The invention discloses a cell three-dimensional imaging device and method based on optical fiber vortex optical tweezers, and relates to the technical field of cell three-dimensional imaging. An optical fiber vortex optical tweezers module in the device comprises a capture light source, an optical fiber isolator, an optical fiber coupler, a power meter and an optical fiber focusing vortex light generator; the optical fiber focusing vortex light generator is composed of a combined optical fiber and a spiral wave zone plate prepared at one end of the combined optical fiber, and one end with the spiral wave zone plate extends into the sample pool; incident laser is modulated by the combined optical fiber and the spiral wave zone plate to form a tightly focused vortex light beam; the tightly-focused vortex light beam forms a light trap at a focal point and is used for capturing a single cell; the vortex light beam carries orbital angular momentum and is used for driving captured cells to rotate; the high-speed microscopic imaging module is used for collecting projections of the rotating cells at different angles; and the image processing module is used for constructing a three-dimensional tomographic image of the single cell according to the projection at different angles.

The invention provides a defect detection system based on zone plate array imaging. The defect detection system comprises a light source, a zone plate array and an image acquisition component, wherein the wave zone plate array is formed by arranging a plurality of wave zone plate units, and imaging areas of different wave zone plate units are separated from one another; multiple beams of light emitted by the light source pass through an object to be measured and then enter each zone plate unit on the zone plate array to form a convergent light field, and the convergent light field corresponding to each zone plate unit is transmitted to the image acquisition component to be received and imaged. Compared with the prior art, the zone plate array is adopted for imaging, the field of view of the object space is effectively increased while high-resolution imaging precision is obtained, the defect detection yield can be greatly improved, and therefore the requirement of the industry for the defect detection yield is met.

Device for characterizing a mask for microlithography, with • at least one light source (105, 405, 605) which emits coherent light; • an illumination optics (110, 410, 610) which has a zone plate (111, 411, 611) and generates a diffraction-limited light spot on the mask (120, 320, 420, 620) from the coherent light of the at least one light source (105, 405, 605) in a predetermined diffraction order; • a scanning device via which a scanning movement of the diffraction-limited light spot relative to the mask (120, 320, 420, 620) can be carried out; • a sensor unit (130, 430, 630); and • an evaluation unit for evaluating the light incident on the sensor unit (130, 430, 630) from the mask (120, 320, 420, 620); characterized in that the device is configured such that light emanating from the zone plate (111, 411, 611) in a diffraction order that does not correspond to the predetermined diffraction order is eliminated by at least 90% from the useful beam path leading to the sensor unit (130, 430, 630); wherein the zone plate (411, 511) is arranged in an off-axis configuration such that a beam bundle running from the light source (405) to the zone plate (411, 511) only impinges on a partial area (512) of the optically usable surface of the zone plate (411, 511).

This invention provides a transmission-type EUV lithography system that has high transmittance and, as a result, very high light efficiency. [Solution] The present invention relates to a transmission-type EUV lithography apparatus, wherein the lithography apparatus is configured to include an EUV light source, a first membrane-type diffractive optical element that transmits EUV light output from the EUV light source to provide illumination light, a transmission-type EUV mask that generates pattern light to be patterned on a wafer with EUV light transmitted through the first membrane-type diffractive optical element, and a second membrane-type diffractive optical element for exposing the wafer with the pattern light generated by the transmission-type EUV mask. The EUV light source is composed of a 13.5 nm wavelength EUV light source generated by a plasma reaction via a lithium or lithium alloy target. The first membrane-type diffractive optical element and the second membrane-type diffractive optical element are zone plate lenses.

The invention belongs to the technical field of safety monitoring of water conservancy and hydropower engineering, and particularly relates to an auto-collimation observation method for a vacuum laser collimation displacement measurement device. According to the invention, the laser collimation measurement thought of a wave zone plate method is thoroughly abandoned, and collimation measurement is realized by adopting a collimation line method. According to the technology, a laser at a transmitting end is required to have an extremely small divergence angle (less than or equal to 0.01 mrad), so that the diameter of a light spot is not too large after a laser beam is transmitted to a receiving end in vacuum, and the requirement of long-distance laser collimation measurement is met; according to the method provided by the invention, reliable application of the vacuum laser alignment displacement measuring device in an environment with an ultra-long measuring distance (greater than or equal to 1000m) and parts, such as the top of an arch dam and the top of a ship lock, which are likely to twist and incline can be realized, and the effective measuring ranges of all measuring points are increased to the same maximum value; the difficulty and complexity of system design and implementation are reduced, and the project investment can be reduced.

The invention provides a diffraction partition coding element modeling method, element and device, and a snapshot hyperspectral imaging method, and the modeling method comprises the steps: carrying out the polar coordinate partitioning of a diffraction optical element, generating a DPE matrix, carrying out the rotation transformation of the DPE matrix into an initial height map, carrying out the iterative optimization of a full-precision height map, and obtaining an initial height map; each round of optimization comprises the following steps: quantifying the height map based on the learnable depth and introducing a manufacturing error to obtain a simulated manufacturing height map; calculating a spread function (PSF) set of each wavelength point; the PSF and an original hyperspectral image are subjected to convolution, and a coded image is generated in combination with sensor response; processing the coded image and the PSF through a reconstruction network to obtain a reconstructed image; and calculating the total loss to update the full-precision height map, learn the depth and reconstruct the network, and outputting a DPE modeling result and a target hyperspectral image reconstruction model after iteration is completed. The problems of low coding efficiency, large influence of quantization noise and manufacturing errors, low spatial resolution and the like in an existing diffraction hyperspectral imaging system can be solved.

This invention relates to the field of optical element fabrication technology and discloses a system for fabricating microstructured optical elements. The system includes a light source, a beam shaping assembly, a beam splitting assembly, a spatial light modulator, an optical lens assembly, and a photosensitive material. After beam expansion or shaping, the incident light from the light source is split by the beam splitting assembly and then shines onto the spatial light modulator. The spatial light modulator loads a zone plate image or a digital analog optical element image, modulating the incident light to form a specific wavefront. This specific wavefront is spatially mapped by the optical lens assembly to form a wavefront associated with the optical element at a specific location. After exposing the photosensitive material at an appropriate position and performing corresponding processing, a microstructured optical element with the same or similar function as the optical element can be obtained. In the context of the rapid development of digital technology, microstructured optical elements, as an important type of optical element, have broad application prospects.

Optical system (9; 21) for a metrology system (1) for measuring an object (2), - with an object holder (14) for holding the object (2) in an object plane (13), - with a transmissive optical focusing component (11) arranged in the beam path of illumination light (4) between a light source (5) of the metrology system (1) and an object field (12) in the object plane (13), to generate an illumination focus (16; 16') in the area of ​​the object field (12), - with a dispersive optical component (18) in the beam path of the illumination light (4) after the object field (12) for at least partial spatial separation of at least two wavelength components (4 i ) of the illumination light (4), - with a detection device (6) with at least two sensor elements (6 i ) for at least partially separate detection of the different wavelength components (4 i) of the illumination light (4) in the beam path after the dispersive optical component (18), - wherein the transmissive optical focusing component (11) is designed as a zone plate.

The invention provides a zone plate type scanning transmission X-ray microscope system and a fluorescence detection method, and belongs to the field of X-ray microscopic imaging, and the system comprises a radiation light source which is configured to emit X-rays; the zone plate is configured to focus the X-rays to form focused X-rays; the fluorescence detector is provided with a central through hole, so that the focused X-rays can penetrate through the fluorescence detector through the central through hole; the grading diaphragm is fixed on the surface, opposite to the to-be-detected sample, of the fluorescence detector and is configured to perform light beam limitation on the focused X-ray to form an adjusting X-ray, and the adjusting X-ray is configured to irradiate the to-be-detected sample so that the to-be-detected sample can excite a fluorescence signal under the action of the adjusting X-ray; wherein the fluorescence detector is configured to detect a fluorescence signal to obtain the element content of the to-be-detected sample.

An X-ray backscatter device (10 / 100 / 109) for non-destructive inspection of a part (110) is described herein. The apparatus comprises an X-ray emitter (12) and a zone plate (102). The X-ray emitter (12) includes an X-ray shield (24), a vacuum tube (28), a cathode (30), and an anode (32). The X-ray shield (24) has an emission aperture (26). The vacuum tube (28) is within the X-ray shield (24). The cathode (30) and the anode (32) are enclosed within a vacuum tube (28). The cathode (30) generates an electron emission. An anode (32) is disposed relative to the cathode (30) to receive the electron emission and convert the electron emission to a rigid X-ray emission, and the anode (32) is disposed relative to the emission aperture (26) to direct at least a portion of the rigid X-ray emission through the emission aperture. A zone plate (102) is disposed outside the X-ray shield (24) and opposite the emission aperture (26) to receive the portion of the rigid X-ray emission and focus the portion as a focused rigid X-ray emission.

The present invention provides a method for designing a zone plate for focusing in the extreme ultraviolet band, comprising: determining a preset object distance p; determining a preset image distance q; determining an extreme ultraviolet wavelength λ; and obtaining the radius r of the nth zone according to the following formula when the value of p+q is less than 750nλ and the value of q is less than 50nλ. n : When the value of p+q is greater than or equal to 750nλ and the value of p+q is greater than or equal to 50nλ, the radius of the nth ring zone r is obtained according to the following formula n :According to r n The radii of each zone of the EUV zone plate are designed based on the preset diameter and outermost ring width of the EUV zone plate, as well as the radii of each zone. The zone plate designed using the method of the present invention has higher diffraction efficiency and imaging quality by establishing two judgment conditions.

A system may comprise a selectively transparent projection device for projecting an image toward an eye of a viewer from a projection device position in space relative to the eye of the viewer, the projection device being capable of assuming a substantially transparent state when no image is projected; an occlusion mask device coupled to the projection device and configured to selectively block light traveling toward the eye from one or more positions opposite of the projection device from the eye of the viewer in an occluding pattern correlated with the image projected by the projection device; and a zone plate diffraction patterning device interposed between the eye of the viewer and the projection device and configured to cause light from the projection device to pass through a diffraction pattern having a selectable geometry as it travels to the eye.

A high-performance EUV microscope with a free form illumination system, includes: an EUV light source that outputs EUV light; one spherical mirror, which receives and reflects the EUV light outputted from the EUV light source and includes a two-axis drive part for controlling reflection direction of incident light through two-axis angle scan; one plane mirror, which receives the reflected light reflected from the spherical mirror and provides illumination light to a measurement target, and in which a plurality of mirror cells are arranged at each angle; a zone plate lens for focusing measurement light, which is the illumination light formed through the plane mirror and incident on the measurement target and then reflected; and a photodetector for receiving the measurement light focused by the zone plate lens, wherein a reflection angle of the spherical mirror and a reflection angle of the plane mirror are selectively controlled, respectively.

The utility model discloses a novel anti-high overload double differential torsion micro accelerometer structure, which relates to the technical field of micro accelerometers, and comprises an outer frame, the top side of the outer frame is fixedly connected with two zone plates, the top sides of the two zone plates are both provided with substrates, the middle part of the top side of each substrate is provided with a plurality of mass blocks, and the mass blocks are arranged in the middle of the top side of each substrate. Stress grooves are formed in the peripheries of the outer walls of the mass blocks, and supporting beams I are fixedly connected between the two mass blocks on the left side and the right side. The micro-accelerometer has the advantages that through arrangement of the release blocks and the release grooves, deformation of the supporting beams I and the supporting beams II can be reduced under the condition that the working state of the micro-accelerometer is not affected, and the stability of the micro-accelerometer is improved; the rigidity and the structural rigidity of the first supporting beam and the second supporting beam are improved, so that the micro-accelerometer can show more excellent stability and reliability in a high overload environment, and finally the overload resistance of the micro-accelerometer is improved.

An optical system (8) for a metrology system (1) is used to measure an object (2). An optical focusing component (10) is arranged in the beam path of illuminating light (4) between a light source (5) and an object field (12) and is used to generate an illuminating focus (14). A detection device (6) is used to detect the illuminating light (4) in the beam path downstream of the object field (12). The optical focusing component (10) is designed as a zone plate with at least two zones. Portions of the illuminating light (4) that strike the zones interact with one another through diffraction.Depending on the design of the zone plate, the zones of the zone plate are arranged such that the zone plate is chromatically corrected for the illumination light (4), such that the zone plate is aspherically corrected for the illumination light (4), such that the zones of the zone plate are reflective for the illumination light (4), and / or such that the zones of the zone plate are arranged such that at least one diffraction order of the illumination light (4) is preferred as the default diffraction order compared to at least one other diffraction order with regard to the useful illumination light intensity guided by the zone plate. The result is an optical system in which the possibilities of a zone plate design of the optical focusing component are optimized to improve application possibilities of the metrology system.

This invention proposes an edge enhancement method for a lensless imaging system, applicable to edge detection fields such as fingerprints, gestures, license plates, and industrial parts. The edge enhancement method based on a helical zone plate lensless imaging system reconstructs high-contrast, high-signal-to-noise-ratio edge-enhanced images of the object. Compared to traditional lens systems, this invention features a smaller system size, simpler structure, lower cost, and lighter weight. The imaging effect more prominently highlights the detected subject and enhances edge contours, while reducing background and noise interference. This system can also perform lensless imaging, achieving multimodal imaging for both imaging and edge enhancement. The method is highly feasible and widely applicable, suitable for computational imaging such as holographic imaging and FINCH (Fresnel incoherent correlation holography).

The invention belongs to the technical field of micro-nano, and particularly relates to a high-resolution Kinform combined zone plate lens and a design method thereof. The lens provided by the invention is formed by coaxially combining an inner-ring Kinoform flat plate zone plate area and an outer-ring rectangular multiple periodic zone plate area; wherein the inner ring area close to the center of the lens is composed of a Kinforming wave zone plate of a continuous parabola side wall, and the inner diameter and the outer diameter of each stage of wave zone meet the periodic relation of the Fresnel wave zone plate; the wave zone height is continuously changed in the radial direction to form refractive phase delay, so that the focusing efficiency close to the theoretical limit is realized in the + 1-level diffraction direction; a wave zone structure with a rectangular section is adopted in an outer ring area from two thirds of the radius to the outside, and on the premise that the radial period relation is kept, multiple period selection is conducted on wave zones, one or more effective wave zones are reserved every other effective wave zone, the other wave zones are emptied, and the outer ring wave zone equivalently works at a high diffraction order; the design can obtain an effective resolution equivalent to the original outermost ring width.