290 results about "Zone plate" patented technology

An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used. This enhances the preferential imaging of the zone plate lens because its diffraction efficiency (percent of incident energy diffracted into the focus) changes rapidly near an absorption line and can be made to peak at the X-ray fluorescence line of the element from which it is fabricated. In another embodiment, a spectral filter, such as a multilayer optic or crystal, is used in the optical train to achieve preferential imaging in a fluorescence microscope employing either a chromatic or an achromatic lens.

An achromatic Fresnel optic that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The AFO has a wide range of potential applications in lithography, microimaging with various contrast mechanisms and measurement techniques.

Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

A method to stabilize planar nanostructures, for example grating and zone plate lenses that are typically used for directing or focusing x-ray radiation, includes the deposition of a top, stabilizing layer. The structures are typically made on a flat substrate, and therefore are only fixed at the bottom. At high aspect ratio, the stability can be poor since small forces such as electrostatic forces and van de Waals forces that are often present can alter the structure. The top coating of a metallic material such as titanium constrains the nanostructures at the top and at the same time eliminates electrostatic forces and reduces any thermal gradient that may be present across the device.

A Micromirror Array Lens comprises a plurality of micromirrors arranged on a flat or a curved surface to reflect incident light. Each micromirror in the Micromirror Array Lens is configured to have at least one motion. The Micromirror Array Lens forms at least one optical surface profile reproducing free surfaces by using the motions of the micromirrors. The free surface can be any two or three-dimensional continuous or discrete reflective surface. The Micromirror Array Lens having the corresponding optical surface profile provides optical focusing properties substantially identical to those of the free surface. The Micromirror Array Lens can forms various optical elements such as a variable focal length lens, a fixed focal length lens, an array of optical switches, a beam steerer, a zone plate, a shutter, an iris, a multiple focal length lens, other multi-function optical elements, and so on.

A light emitting device and a manufacturing method thereof and a display used the light emitting device, in which fine patterning for the light emitting device is realized by a simple process and the light leakage is prevented and the efficiency at extracting light is increased, are provided. The light emitting device provides an organic electroluminescent (EL) device in which electrodes and a luminescent layer are formed, a diffraction grating or a zone plate, and a filter. Light emitted from the luminescent layer transmits through the diffraction grating or the zone plate, which is formed with a designated grating pitch, or is reflected at the diffraction grating or the zone plate. With this, the transmitting or reflecting light is controlled to be in a designated angle region. And when the light is transmitted through the filter, light having different color tone and chromaticity from those of the light emitted from the luminescent layer is extracted.

In a particle-beam projection processing apparatus for irradiating a target by a beam of energetic electrically charged particles, including an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, there is provided at least one plate electrode device, which has openings corresponding to the apertures of the pattern definition system and including a composite electrode composed of a number of partial electrodes being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.