10 results about "Zone plate" patented technology

The invention discloses a space customization three-dimensional column vector light beam array generation method based on a metasurface, and belongs to the field of micro-nano optics, diffraction optics and structured light field regulation and control. The implementation method comprises the following steps of: independently regulating and controlling left-hand circular polarization and right-hand circular polarization components of incident light based on geometric and propagation phase joint modulation of the metasurface; a metasurface, a phase distribution coding lens factor of a polarization channel, a Dammann vortex grating with opposite basic topological charges and a spiral Dammann zone plate are independently optimized, and left-handed and right-handed circular polarization components generate a three-dimensional vortex beam array with opposite spatial topological charges in a near-field Fresnel domain; the left-handed circular polarization vortex array and the right-handed circular polarization vortex array with opposite topological charges are coherently superposed to form a spatially customized three-dimensional column vector light beam array, and the vector characteristic of each light beam in the array depends on the amplitude ratio, the phase difference and the topological charges of the left-handed circular polarization component and the right-handed circular polarization component on each diffraction order. According to the invention, the regulation dimension of the column vector light beam can be expanded.

The invention belongs to the technical field of micro-nano processing, and particularly relates to a Pt-HSQ-based high-resolution X-ray Fresnel zone plate and a preparation method thereof. According to the X-ray Fresnel zone plate, a Pt-HSQ metal-inorganic material system is adopted, a diffraction structure with a large aspect ratio and Pt material quasi-periodic dense stripes specially needed by an X-ray zone plate lens is formed through electron beam lithography and an ALD process, and diffraction focusing from a soft X-ray wave band to a hard X-ray wave band and imaging with an amplification function are achieved. The wave zone plate has excellent mechanical stability, and the irradiation resistance and morphology retentivity of the wave zone plate under high-energy irradiation are remarkably improved. And high-resolution X-ray focusing elements with different energy wavebands and different focal lengths can be prepared according to geometric design and material selection of the wave zone plate. The lens is suitable for microscopic imaging, coherent diffraction imaging, X-ray spectrum, nanometer detection and other scenes of a synchrotron radiation or off-line laboratory X-ray light source, and has wide popularization value and application prospect.

The invention discloses a double-end observation method of a vacuum wave zone plate method laser alignment displacement measuring device, which comprises the following steps of: installing a vacuum laser alignment displacement measuring device at the top of a super-long building; the device is composed of a laser emission device, a measuring point box (including a wave zone plate), a vacuum pipeline (including a vacuum pump and corollary equipment), a laser connection automatic measurement and control device and the like. Meanwhile, a laser receiving device is arranged at the laser emitting device at the left end of the original system, and a laser emitting device is arranged at the laser receiving device at the right end of the original system; according to the invention, reliable application of the vacuum zone plate method laser alignment displacement measurement device in an environment with an ultra-long measurement distance (greater than or equal to 1000m) can be realized, the effective measuring ranges of all measurement points are guaranteed, the difficulty and complexity of system design and implementation are reduced, and the engineering investment can be reduced.

This invention provides a transmission-type EUV lithography system that has high transmittance and, as a result, very high light efficiency. [Solution] The present invention relates to a transmission-type EUV lithography apparatus, wherein the lithography apparatus is configured to include an EUV light source, a first membrane-type diffractive optical element that transmits EUV light output from the EUV light source to provide illumination light, a transmission-type EUV mask that generates pattern light to be patterned on a wafer with EUV light transmitted through the first membrane-type diffractive optical element, and a second membrane-type diffractive optical element for exposing the wafer with the pattern light generated by the transmission-type EUV mask. The EUV light source is composed of a 13.5 nm wavelength EUV light source generated by a plasma reaction via a lithium or lithium alloy target. The first membrane-type diffractive optical element and the second membrane-type diffractive optical element are zone plate lenses.

The invention belongs to the technical field of safety monitoring of water conservancy and hydropower engineering, and particularly relates to an auto-collimation observation method for a vacuum laser collimation displacement measurement device. According to the invention, the laser collimation measurement thought of a wave zone plate method is thoroughly abandoned, and collimation measurement is realized by adopting a collimation line method. According to the technology, a laser at a transmitting end is required to have an extremely small divergence angle (less than or equal to 0.01 mrad), so that the diameter of a light spot is not too large after a laser beam is transmitted to a receiving end in vacuum, and the requirement of long-distance laser collimation measurement is met; according to the method provided by the invention, reliable application of the vacuum laser alignment displacement measuring device in an environment with an ultra-long measuring distance (greater than or equal to 1000m) and parts, such as the top of an arch dam and the top of a ship lock, which are likely to twist and incline can be realized, and the effective measuring ranges of all measuring points are increased to the same maximum value; the difficulty and complexity of system design and implementation are reduced, and the project investment can be reduced.

The invention provides a diffraction partition coding element modeling method, element and device, and a snapshot hyperspectral imaging method, and the modeling method comprises the steps: carrying out the polar coordinate partitioning of a diffraction optical element, generating a DPE matrix, carrying out the rotation transformation of the DPE matrix into an initial height map, carrying out the iterative optimization of a full-precision height map, and obtaining an initial height map; each round of optimization comprises the following steps: quantifying the height map based on the learnable depth and introducing a manufacturing error to obtain a simulated manufacturing height map; calculating a spread function (PSF) set of each wavelength point; the PSF and an original hyperspectral image are subjected to convolution, and a coded image is generated in combination with sensor response; processing the coded image and the PSF through a reconstruction network to obtain a reconstructed image; and calculating the total loss to update the full-precision height map, learn the depth and reconstruct the network, and outputting a DPE modeling result and a target hyperspectral image reconstruction model after iteration is completed. The problems of low coding efficiency, large influence of quantization noise and manufacturing errors, low spatial resolution and the like in an existing diffraction hyperspectral imaging system can be solved.

This invention relates to the field of optical element fabrication technology and discloses a system for fabricating microstructured optical elements. The system includes a light source, a beam shaping assembly, a beam splitting assembly, a spatial light modulator, an optical lens assembly, and a photosensitive material. After beam expansion or shaping, the incident light from the light source is split by the beam splitting assembly and then shines onto the spatial light modulator. The spatial light modulator loads a zone plate image or a digital analog optical element image, modulating the incident light to form a specific wavefront. This specific wavefront is spatially mapped by the optical lens assembly to form a wavefront associated with the optical element at a specific location. After exposing the photosensitive material at an appropriate position and performing corresponding processing, a microstructured optical element with the same or similar function as the optical element can be obtained. In the context of the rapid development of digital technology, microstructured optical elements, as an important type of optical element, have broad application prospects.

Optical system (9; 21) for a metrology system (1) for measuring an object (2), - with an object holder (14) for holding the object (2) in an object plane (13), - with a transmissive optical focusing component (11) arranged in the beam path of illumination light (4) between a light source (5) of the metrology system (1) and an object field (12) in the object plane (13), to generate an illumination focus (16; 16') in the area of ​​the object field (12), - with a dispersive optical component (18) in the beam path of the illumination light (4) after the object field (12) for at least partial spatial separation of at least two wavelength components (4 i ) of the illumination light (4), - with a detection device (6) with at least two sensor elements (6 i ) for at least partially separate detection of the different wavelength components (4 i) of the illumination light (4) in the beam path after the dispersive optical component (18), - wherein the transmissive optical focusing component (11) is designed as a zone plate.

The invention provides a zone plate type scanning transmission X-ray microscope system and a fluorescence detection method, and belongs to the field of X-ray microscopic imaging, and the system comprises a radiation light source which is configured to emit X-rays; the zone plate is configured to focus the X-rays to form focused X-rays; the fluorescence detector is provided with a central through hole, so that the focused X-rays can penetrate through the fluorescence detector through the central through hole; the grading diaphragm is fixed on the surface, opposite to the to-be-detected sample, of the fluorescence detector and is configured to perform light beam limitation on the focused X-ray to form an adjusting X-ray, and the adjusting X-ray is configured to irradiate the to-be-detected sample so that the to-be-detected sample can excite a fluorescence signal under the action of the adjusting X-ray; wherein the fluorescence detector is configured to detect a fluorescence signal to obtain the element content of the to-be-detected sample.

The invention belongs to the technical field of micro-nano, and particularly relates to a high-resolution Kinform combined zone plate lens and a design method thereof. The lens provided by the invention is formed by coaxially combining an inner-ring Kinoform flat plate zone plate area and an outer-ring rectangular multiple periodic zone plate area; wherein the inner ring area close to the center of the lens is composed of a Kinforming wave zone plate of a continuous parabola side wall, and the inner diameter and the outer diameter of each stage of wave zone meet the periodic relation of the Fresnel wave zone plate; the wave zone height is continuously changed in the radial direction to form refractive phase delay, so that the focusing efficiency close to the theoretical limit is realized in the + 1-level diffraction direction; a wave zone structure with a rectangular section is adopted in an outer ring area from two thirds of the radius to the outside, and on the premise that the radial period relation is kept, multiple period selection is conducted on wave zones, one or more effective wave zones are reserved every other effective wave zone, the other wave zones are emptied, and the outer ring wave zone equivalently works at a high diffraction order; the design can obtain an effective resolution equivalent to the original outermost ring width.