94results about "Gamma-ray/x-ray microscopes" patented technology

The invention relates to a reflection optical unit (1) for focusing electromagnetic radiation (300) onto a focal plane (100), comprising at least the following components: - a central stop (12) which is arranged on an optical axis (200) of the reflection optical unit (1) and is designed to prevent electromagnetic beams (300) that are radiated into the reflection optical unit (1) along the optical axis (200) from propagating parallel to the optical axis (200), - an X-ray lens (11) having a tube (11-1) which extends at least between the central stop (12) and the focal plane (100) along the optical axis (200) of the reflection optical unit (1) and delimits a first volume (V1) radially around the optical axis (200), such that electrons (e-) generated by electromagnetic radiation in the first volume (V1) are shielded, wherein the tube (11-2) together with the central stop (12) forms a ring-shaped aperture (18), and - a solid window (13) which delimits the first volume (V1) toward the focal plane (100) and which peripherally terminates flush with the tube (11-2), wherein the solid window (13) is configured such that electrons generated by electromagnetic radiation in the first volume (V1) are shielded from the focal plane (100) by the solid window (13).

An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane, and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector includes a long X-ray receiver.

A method and system for correcting detector defects in an X-ray microscope system based on deep learning. Normal geometry projections and offset geometry projections are collected for a given detector, mappings between defective regions and healthy regions are created, and a machine learning system is trained using these projections. The trained neural network system is then used to correct the tomographic projection dataset, thereby improving the image quality of the resulting reconstructed tomographic image volume set.

The present invention relates to a reactor and a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor includes a reaction chamber containing a showerhead, a submount, and at least one base support. The showerhead includes at least one gas outlet configured to provide a gas flow of at least one material or a gas flow of at least one component of the at least one material. The abutment is rotatable about an abutment axis of rotation. At least one substrate support is disposed on the submount and configured to rotate the substrate about a substrate axis of rotation. In particular, the substrate holder is configured to rotate the substrate about a substrate axis of rotation, where the abutment axis of rotation and the substrate axis of rotation are inclined relative to each other. The invention also relates to an X-ray microscope for generating an enlarged image of an object using X-rays.

To remove all unwanted heat from a source coil.SOLUTION: An electron beam B is typically dynamically steered on its path to a target 500 after generation. The steering is performed by one or more source coils 132N and 132S. These coils create a magnetic field outside a vacuum vessel 112 and allow air / water / oil cooling to remove unwanted heat. The magnetic field is then picked up within the vacuum vessel with a pole piece and directed toward a region where the magnetic field is needed to steer the electron beam.SELECTED DRAWING: Figure 1

A user interface presented on a display of the microscope system includes a motion control for moving the object stage subsystem, the source subsystem, and the detector subsystem, and a simulation area; the simulation area displays a resolution curve and a flux curve generated by a zoom tool and displayed on a graphical user interface of the system.

A multi-aperture array for manipulating a plurality of charged first single-particle beams, comprising: a base body with a plurality of apertures, wherein, during operation of the multi-aperture array, one of the charged first single-particle beams passes through each aperture; at least a plurality of first electrodes, wherein one of the first electrodes is arranged at each of the apertures to individually influence the first single-particle beam passing through the aperture, and wherein each of the first electrodes is connected to a control unit; wherein the base body has a first depth TG in a z-direction along which the first apertures extend through the base body; wherein the first electrodes each have a depth TE in the z-direction that is less than the depth TG, i.e., TE < TG;wherein the first electrodes are each embedded in the base body such that they are exposed in an area adjacent to and forming the aperture, and are otherwise embedded directly in the base body and thus without an electrical insulating layer; and wherein the material of the base body is glass or consists of glass.

An X-ray imaging system is disclosed, comprising: a target; an electron beam source configured to provide an electron beam that interacts with the target to generate X-ray radiation; electron optics configured to alternately direct the electron beam to at least first and second locations on the target; an X-ray detector array configured to receive the X-ray radiation generated at the first and second locations on the target; a sample location area for receiving a sample exposed to the generated X-ray radiation; the sample location area positioned in a region where the X-ray radiation generated at the first location overlaps with the X-ray radiation generated at the second location; and a processing unit coupled to the X-ray detector array, the processing unit configured to generate an image of the sample positioned in the sample location area based on the X-ray radiation originating from the first and second locations. The electron beam is moved between locations such that the time between successive exposures of the first and second locations is less than 10 μs, thereby reducing thermally induced mechanical stress. Corresponding methods are also disclosed.

An X-ray beam scanning optical system (10) is provided with: an X-ray source (11) that outputs an X-ray beam (R1) toward a semiconductor device (100); a first capillary lens (12) that converts an X-ray beam (R1) outputted from the X-ray source (11) into an X-ray beam (R2) that is parallel X-rays; a second capillary lens (13) that focuses the X-ray beam (R2) that has passed through the first capillary lens (12) on a semiconductor device (100); and a shield member (14) disposed between the X-ray source (11) and the semiconductor device (100). Furthermore, the inspection device (1) is provided with: a drive unit (which is a shield member (14) in this case) that moves the second capillary lens (13); and a drive control unit (15) that controls the shield member (14) such that the second capillary lens (13) is moved such that the X-ray beam focused on the semiconductor device (100) is scanned while the optical axis at the emission end (12b) of the first capillary lens (12) and the optical axis at the incidence end (13a) of the second capillary lens (13) are maintained in parallel.

The invention relates to an imaging method and an imaging system for carrying out this method. The object of the invention is to provide an improved multispectral ptychographic imaging method and a corresponding system. To this end, the imaging method of the invention comprises the following process steps: generation of at least partially coherent electromagnetic radiation (3) containing spectral components at at least two different wavelengths; spatial separation of the spectral components of the electromagnetic radiation, in particular by angular dispersion; generation of structured illumination beams (9) by selecting one of the spectral components at a time using a structured aperture (8a, 8b, 8c); and movement of an object (6) in a direction transverse to the path of the illumination beams (9) into a plurality of positions.Detecting an intensity pattern for each of the positions, wherein the intensity patterns are generated by scattering and / or diffraction of the illumination rays (9) at the object (6) in a detection plane; and reconstructing an image of the object (6) from the detected intensity patterns, wherein an image of the object (6) is calculated for each of the at least two wavelengths using a ptychographic reconstruction algorithm.

[Problem statement] Provision of a technology relating to a window holding section, an X-ray generator, an X-ray analyzer, a control method for an X-ray generator and a control system for an X-ray generator, wherein the technology is such that it is not necessary to provide an X-ray observation section in a vacuum area and that it is not necessary to use any part of the X-rays used for the measurement of the X-ray analysis. [SOLUTION] According to one embodiment of the present invention, an X-ray generator (20) is provided. The X-ray generator (20) is equipped with an X-ray generating unit (203a) and an X-ray transmission window. The X-ray generating unit (203a) is configured to generate X-rays by receiving an electron beam from an external source. The X-ray transmission window comprises a first X-ray transmission window (204a) and a second X-ray transmission window (205a). The first X-ray transmission window (204a) is configured to transmit first X-rays (L1) directed in a first direction (D1) among the X-rays. The first X-rays (L1) fall onto an X-ray observation section (21) that is arranged on the optical axis of the first X-rays and that can observe the X-ray focal point of the X-rays.The second X-ray transmission window (205a) is arranged such that it transmits second X-rays (L2) from the X-rays, which are oriented in a second direction (D2) that differs from the first direction (D1).

A deep learning based method and system to correct for detector defects in X-ray microscopy systems. Normal geometry projections and shifted geometry projections are collected for a given detector, creating a mapping between defective region and healthy region and a machine learning system is trained using these projections. The trained neural network system is then used to correct tomographic projection datasets improving the image quality of resultant reconstructed tomographic image volume sets.

An x-ray illumination system for use in x-ray based metrology of a sample, the x- ray illumination system includes x-ray energy adjustable optics that comprises a plurality of subsets of one or more x-ray optical elements, different subsets are associated with different x-ray energies out of multitude of selectable and monochromatic x-ray energies; wherein the x-ray energy adjustable optics is arranged to (a) receive an input x-ray beam that is polychromatic or partially monochromatic, and (b) generate a focused monochromatic x-ray beam having a selected x-ray energy, using a selected subset that is associated with the selected x-ray energy, the selected x-ray energy belongs to the multitude of selectable and monochromatic x-ray energies.

In order to improve the resolution of a light-emitting substance image excited by X-rays, provided is a microscope (100) provided with an X-ray irradiation unit and an observation optical system. The X-ray irradiation unit (10) generates a patterned X-ray sheet beam (1) for illuminating an object to be observed (7). The patterned X-ray sheet beam has an intensity pattern (2) in which the intensity varies repeatedly with respect to a position in a certain direction included in the spread in a partial region (32) in the sheet region (3) having the spread. The observation optical system (50) receives radiation having an observation wavelength from an observation region (4) disposed so as to include at least a part of the partial region. The embodiment of the invention also provides a shooting method of the light-emitting substance image.

A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

A control unit of a radiation imaging device according to the present invention includes: an exposure time control unit for controlling a sub-frame exposure time of an image sensor such that focused fluorescence at the depth of field, generated by radiation that reaches a scintillator, and unfocused fluorescence away from the depth of field are imaged discretely, for each radiation particle, on a light receiving surface of an image sensor; a focused signal discriminating unit for discriminating between sensor signals from a light receiving pixel group corresponding to spots of the focused fluorescence included discretely in each sub-frame, and sensors signal from a light receiving pixel group corresponding to spots of unfocused fluorescence; and an image signal processing unit for generating an image by overlaying sub-frame data based on the sensor signals from the light receiving pixel group corresponding to the spots of focused fluorescence.

The present invention relates to a collision avoidance system and method for an X-ray CT microscope, which processes image data of an object at different angles and generates a model of the object. The model is then used to configure the microscope for operation and can avoid collisions between the microscope and the object.

A mirror device (10) comprises: a first mirror (12) having a first reflective surface (22) on which a light ray (20) falls; and a second mirror (14) disposed away from the first reflective surface (22) in the normal direction to the first reflective surface (22). The second mirror (14) has a second reflective surface (24) on which the light ray (20) falls and a surface (26) opposite to the second reflective surface (24). The opposite surface (26) faces the first reflective surface (22), and the second reflective surface (24) is variable in shape.

An x-ray illumination system for use in x-ray based metrology of a sample, the x- ray illumination system includes x-ray energy adjustable optics that comprises a plurality of subsets of one or more x-ray optical elements, different subsets are associated with different x-ray energies out of multitude of selectable and monochromatic x-ray energies; wherein the x-ray energy adjustable optics is arranged to (a) receive an input x-ray beam that is polychromatic or partially monochromatic, and (b) generate a focused monochromatic x-ray beam having a selected x-ray energy, using a selected subset that is associated with the selected x-ray energy, the selected x-ray energy belongs to the multitude of selectable and monochromatic x-ray energies.

In order to improve the resolution of an image of a luminescent material excited by X-rays, an embodiment of the present disclosure provides a microscope 100 comprising an X-ray irradiation unit and an observation optical system. The X-ray irradiation unit 10 generates a patterned X-ray sheet beam 1 for illuminating an object to be observed 7. This patterned X-ray sheet beam has an intensity pattern 2 whose intensity varies repeatedly within a partial region 32 of a sheet area 3 having spread, with respect to a position in a direction within the spread of the partial region. The observation optical system 50 is arranged to receive radiation of an observation wavelength from an observation area 4, the observation area including at least a portion of the partial region. An embodiment of the present disclosure also provides a method for capturing an image of a luminescent material.

A method for extracting an evaluation target region of a biological sample in three dimensions based on two images that are matched: an image of the biological sample embedded in a wax block captured by an X-ray microscope using X-rays having an energy of 4-12 keV and an image of a same measurement point of the same biological sample captured by a light microscope after the X-ray microscopy imaging, the method comprising the steps of: extracting a region of interest, including the evaluation target region, from the image of the X-ray microscope that has been matched with the image of the light microscope; and binarizing the region of interest to further extract the evaluation target region from the region of interest by using the image information of the light microscope and the X-ray microscope in a complementary manner.

This inspection device for inspecting an object to be inspected comprises: an X-ray generation tube that has a target having an X-ray generation unit for generating an X-ray upon being irradiated with an electron beam and that radiates an X-ray towards the object to be inspected; and a plurality of X-ray detectors. Each of the plurality of X-ray detectors detects an X-ray that has been: radiated from foreign matter present on an inspected surface of the object to be to inspected irradiated with the X-ray from the X-ray generation unit; and totally reflected by the inspected surface.

An X-ray imaging system is disclosed, comprising an X-ray source; a sample position; a detector arranged to detect X-ray radiation downstream of said sample position; wherein said X-ray source comprises an electron source arranged to provide an electron beam; a target arranged to produce X-ray radiation upon impact by said electron beam, the target comprising a substrate and a target layer at least partly covering said substrate, wherein said target layer is arranged to produce X-ray radiation upon impact by said electron beam; means for directing the electron beam to a first position on said target layer and a second position selected from a position on said target at which the electron beam impacts directly upon the substrate and a position on an electron beam dump arranged so that substantially no X-ray radiation created by interaction between the electron beam and the electron beam dump reaches the detector; a controller arranged to record, using said detector, a first image with the electron beam directed to said first position, and a second image with the electron beam directed to said second position, and generate a difference image between the first image and the second image. A method for X-ray imaging is also disclosed.

This inspection dvice for inspecting a surface to be inspected that is disposed on an inspection surface comprises an X-ray generation tube having a target including an X-ray generation unit for generating X-rays due to being irradiated with an electron beam, the X-ray generation tube emitting X-rays toward the inspection surface; and an X-ray detector for detecting X-rays that are emitted from foreign matter present on the surface to be inspected, which is irradiated with the X-rays from the X-ray generation unit, and that are totally reflected by the surface to be inspected, the X-ray detector having a long X-ray capture unit.

A semiconductor inspection apparatus, semiconductor inspection system, and semiconductor inspection method capable of locally inspecting a microstructure inside a semiconductor by obtaining an enlarged image with sufficient intensity with a size that can be stored in a laboratory are provided. A semiconductor inspection apparatus using an enlarged X-ray image comprises an X-ray source having a micro focus and high output, an X-ray irradiation unit having a condenser mirror for condensing and irradiating emitted X-rays toward a sample of semiconductor, a sample holder for holding the sample, a reflecting mirror type X-ray lens unit for forming an image with an X-ray transmitted through the sample and an imaging unit for acquiring the formed X-ray image, and each mirror constituting the condenser mirror and the reflecting mirror type X-ray lens unit has a reflective surface that is formed of a multilayer film having a high reflectivity for X-rays with a specific wavelength.

An apparatus includes at least one x-ray source configured to generate x-rays and at least one capillary x-ray focusing optic configured to receive and focus at least some of the generated x-rays into a focused x-ray beam. The apparatus further includes at least one x-ray optical component configured to receive the generated x-rays and / or the focused x-ray beam such that a focus size δ1 of the focused x-ray beam is smaller than a focus size δ0 of the focused x-ray beam without the at least one x-ray optical component.

According to the present invention, an inspection device for inspecting an object under inspection comprises an x-ray generation tube, an x-ray detector, and an adjustment mechanism. The x-ray generation tube: has a target that includes an x-ray generator that generates x-rays as a result of being irradiated with an electron beam; and emits x-rays toward an inspected surface of the object under inspection. The x-ray detector detects x-rays that have undergone total reflection at the inspected surface after being emitted from contaminants at the inspected surface as irradiated with x-rays from the x-ray generator. The adjustment mechanism adjusts the relative positions of the inspected surface and the x-ray detector.

The invention relates to an X-ray optical unit (1) for focusing X-ray radiation (300) into a focal plane (100), comprising at least one diffractive X-ray lens (2), a diffraction order filter aperture (3), OSA, wherein the diffractive X-ray lens (2) and the diffraction order filter aperture (3) are arranged along an optical axis (200) of the X-ray optical unit (1), wherein the X-ray optical unit (1) has a holding device (12) running along the optical axis (200), and a first shielding device (11) running along the optical axis (200), wherein the holding device (12) is connected to the diffractive X-ray lens (2), wherein the first shielding device (11) is designed as a first shielding device (11) surrounding the optical axis (200), and is connected to the diffraction order filter aperture (3) and thus delimits a first volume (V1) in which both the holding device (12) and the diffractive X-ray lens (2) are circumferentially shielded such that electrons (e-) generated by X-ray radiation (300) in the first volume (V1) are shielded by way of the first shielding device (11).