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3773results about "Gamma-ray/x-ray microscopes" patented technology
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Testing apparatus using charged particles and device manufacturing method using the testing apparatus
ActiveUS20050045821A1Material analysis using wave/particle radiationElectric discharge tubesAtomic physicsPhysics
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25••1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.
Owner:EBARA CORP
Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
ActiveUS20160085003A1Improve reflectivitySpread the wordMaterial analysis using wave/particle radiationRadiation/particle handlingPhotonicsUltraviolet
Nanostructured photonic materials, and associated components for use in devices and systems operating at ultraviolet (UV), extreme ultraviolet (EUV), and / or soft Xray wavelengths are described. Such a material may be fabricated with nanoscale features tailored for a selected wavelength range, such as at particular UV, EUV, or soft Xray wavelengths or wavelength ranges. Such a material may be used to make components such as mirrors, lenses or other optics, panels, lightsources, masks, photoresists, or other components for use in applications such as lithography, wafer patterning, astronomical and space applications, biomedical applications, biotech or other applications.
Owner:JAISWAL SUPRIYA
Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations
ActiveUS8716662B1Material analysis using wave/particle radiationElectric discharge tubesScanning tunneling microscopeElectron
One embodiment relates to a method of reviewing defects using a scanning electron microscope (SEM). A defect location having a defect for review is selected, and the SEM is configured to be in a first imaging configuration. The selected defect location is imaged using the SEM to generate a first SEM image of the selected defect location. A determination is made as to whether the defect is visible or non-visible in the first SEM image. If the defect is non-visible in the first SEM image, then the SEM is configured to be into a second imaging configuration, the selected defect location is imaged using the SEM to generate a second SEM image of the selected defect location, and a further determination is made as to whether the defect is visible or non-visible in the second SEM image. Other embodiments, aspects and features are also disclosed.
Owner:KLA TENCOR TECH CORP
Overlay alignment measurement of wafers
InactiveUS6079256AMaterial analysis using wave/particle radiationSemiconductor/solid-state device testing/measurementControl systemEngineering
The present invention is a method and apparatus that uses a microscopic height variation positioned relative to a semiconductor device to scan a target on the device to produce an electrical signal representative of height variations of first and second periodic structures of the target in a selected path across the device, and a computing and control system to provide translation between the microscopic height variation detector and the target on the device in a selected path, and to calculate any offset between the first periodic structure and the second periodic structure of the target from the electrical signals from the microscopic height variation detector. The first periodic structure of the target is on a first layer of the device, and the second periodic structure, that complements the first periodic structure, is on a second layer of the device at a location that is adjacent the first periodic structure.
Owner:KLA INSTR
Charged particle beam apparatus and method for operating the same
ActiveUS7045781B2Less spaceLow costMaterial analysis using wave/particle radiationElectric discharge tubesLight beamParallel imaging
A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
Owner:ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUER HALBLEITERPRUEFTECHNIK GMBH
Inspection system by charged particle beam and method of manufacturing devices using the system
InactiveUS20020028399A1Efficiently and accurately inspecting objectAccurately inspect an objectMaterial analysis using wave/particle radiationElectrode and associated part arrangementsBeam sourceSecondary electrons
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
Owner:EBARA CORP +1
Method for inspecting substrate, substrate inspecting system and electron beam apparatus
InactiveUS20020130262A1Improve throughputImprove reliabilityMaterial analysis using wave/particle radiationElectric discharge tubesControl systemIrradiation
The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.
Owner:EBARA CORP
Methods and systems for providing illumination of a specimen for a process performed on the specimen
ActiveUS7705331B1Improve isolationConvenient lightingMaterial analysis using wave/particle radiationPhotomechanical apparatusElectrodeless lampLaser
Methods and systems for providing illumination of a specimen for a process performed on the specimen are provided. One system configured to provide illumination of a specimen for a process performed on the specimen includes a laser configured to generate excitation light. The system also includes focusing optics configured to focus the excitation light to a plasma in an electrodeless lamp such that the plasma generates light. The system is also configured such that the light illuminates the specimen during the process.
Owner:KLA TENCOR TECH CORP
Biomarker generator system
ActiveUS7476883B2Efficient dosingEfficient productionMaterial analysis using wave/particle radiationIsotope delivery systemsChemical synthesisMicroreactor
A biomarker generator system for producing approximately one (1) unit dose of a biomarker. The biomarker generator system includes a small, low-power particle accelerator (“micro-accelerator”) and a radiochemical synthesis subsystem having at least one microreactor and / or microfluidic chip. The micro-accelerator is provided for producing approximately one (1) unit dose of a radioactive substance, such as a substance that emits positrons. The radiochemical synthesis subsystem is provided for receiving the radioactive substance, for receiving at least one reagent, and for synthesizing the approximately one (1) unit dose of a biomarker.
Owner:BEST ABT INC
Particle beam processing system
InactiveUS6838676B1Decreased beam sizeLow costStability-of-path spectrometersMaterial analysis by optical meansParticle beamParticle physics
A method for slowing and controlling a beam of charged particles includes the steps of superimposing at least one magnetic field on a mass and passing the beam through the mass and at least one magnetic field such that the beam and the mass slows but does not stop the particles. An apparatus for slowing and controlling a beam of charged particles includes a bending magnetic field superimposed on a focusing magnetic field within a mass.
Owner:HBAR TECH LC
Autonomous Sensing Module, a System and a Method of Long-Term Condition Monitoring of Structures
InactiveUS20100271199A1Sufficient protectionEasy to useMaterial analysis using wave/particle radiationAnti-theft devicesPower Management UnitDependability
A system and a method of long-term condition monitoring of structures are based on use of autonomous sensing modules, centers for storing and processing data and software for data analysis. An autonomous sensing module contains a set of sensors for measurements of parameters related to the condition of a monitored structure, a non-volatile memory, a wireless data transfer unit, a controller, a clock circuit, a battery, an energy harvesting device and a power management unit. The autonomous sensing module provides a very long-term (40 years or more) functionality and reliability due to both use of at least near hermetic packages for the controller, the non-volatile memory, the battery, the clock circuit and the power management unit and choosing the duration of periods when the sensing module works in active mode in such a way that the average energy consumed by the autonomous sensing module is fully compensated by the average energy harvested by the energy harvesting device.
Owner:KOLOS INT
Fully automatic rapid microscope slide scanner
InactiveUS6917696B2Television system detailsMaterial analysis by optical meansMicroscope slideContinuous scanning
Apparatus for and method of fully automatic rapid scanning and digitizing of an entire microscope sample, or a substantially large portion of a microscope sample, using a linear array detector synchronized with a positioning stage that is part of a computer controlled microscope slide scanner. The invention provides a method for composing the image strips obtained from successive scans of the sample into a single contiguous digital image. The invention also provides a method for statically displaying sub-regions of this large digital image at different magnifications, together with a reduced magnification macro-image of the entire sample. The invention further provides a method for dynamically displaying, with or without operator interaction, portions of the contiguous digital image. In one preferred embodiment of the invention, all elements of the scanner are part of a single-enclosure that has a primary connection to the Internet or to a local intranet. In this embodiment, the preferred sample type is a microscope slide and the illumination and imaging optics are consistent with transmission mode optics optimized for diffraction-limited digital imaging.
Owner:LEICA BIOSYST IMAGING
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
ActiveUS7244949B2High accuracy of focusingMaintain propertiesStability-of-path spectrometersSemiconductor/solid-state device testing/measurementSecondary electronsAtomic physics
An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
Owner:CARL ZEISS MICROSCOPY GMBH +1
Particle-Optical Component
ActiveUS20090114818A1Reduce rateThermometer detailsMaterial analysis using wave/particle radiationEngineeringMechanical engineering
The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.
Owner:APPL MATERIALS ISRAEL LTD +1
Fourier Ptychographic Imaging Systems, Devices, and Methods
ActiveUS20140118529A1Increase depth of focusAberration correctionColor television detailsClosed circuit television systemsImage resolutionHigh resolution image
Owner:CALIFORNIA INST OF TECH
Method for inspecting substrate, substrate inspecting system and electron beam apparatus
InactiveUS7109483B2Improve throughputImprove reliabilityMaterial analysis using wave/particle radiationElectric discharge tubesControl systemIrradiation
Owner:EBARA CORP
Charged particle beam irradiation equipment and control method thereof
InactiveUS6881970B2Short timeIrradiation time can be shortenedThermometer detailsStability-of-path spectrometersParticle physicsElectrical current
A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
Owner:HITACHI LTD
Precise metrology with adaptive milling
ActiveUS8222599B1Material analysis using wave/particle radiationSemiconductor/solid-state device testing/measurementMetrologyEngineering
A method of measuring a three-dimensional device in a wafer is provided. The method comprises the step of forming a trench in the wafer. The trench has a facet passing through the three-dimensional device a predetermined offset from a desired image position. The method further comprises iteratively, until a remaining distance between the facet and the desired image position is less than a predetermined threshold, adjusting one or more parameters of a polishing beam based on the remaining distance, polishing the facet with the polishing beam to position the facet closer to the desired image position, and measuring the remaining distance.
Owner:WESTERN DIGITAL TECH INC
Super-resolution microscope system and method for illumination
InactiveUS6667830B1High resolutionReducing diffractive limitPhotometryLuminescent dosimetersElectronic statesExcited state
A microscope system comprising an adjusted specimen and a microscope body, wherein the adjusted specimen is dyed with molecule which has three electronic states including at least a ground state and in which an excited wavelength band from the first electron excited state to the second electron excited state overlaps a fluorescent wavelength band upon deexcitation through a fluorescence process from the first electron excited state to a vibrational level in the ground state. There is provided a novel microscope system which is enabled to condense an erase light for exciting a molecule in the first electron excited state to the second electron excited state in an excellent beam profile by using a simple, compact optical system and which has high stability and operability and an excellent super-resolution.
Owner:JAPAN SCI & TECH CORP
Metrology and 3D reconstruction of devices in a wafer
InactiveUS8097846B1Material analysis using wave/particle radiationSemiconductor/solid-state device testing/measurementMetrologyEngineering
A method for measuring three-dimensional devices in a wafer comprises the step of obtaining a plurality of cross-sectional images of a corresponding plurality of three-dimensional devices in the wafer. The plurality of three-dimensional devices have essentially identical geometries. Each cross-sectional image is obtained from a plane in the corresponding three-dimensional device at a predetermined distance from a fiducial mark thereof. The predetermined distance is different for each of the plurality of cross-sectional images. The method further comprises the step of determining the geometries of the plurality of three-dimensional devices based on the cross-sectional images thereof.
Owner:WESTERN DIGITAL TECH INC
Testing apparatus using charged particles and device manufacturing method using the testing apparatus
ActiveUS7138629B2Material analysis using wave/particle radiationElectric discharge tubesIlluminanceBeam source
Owner:EBARA CORP
Multi-beam multi-column electron beam inspection system
InactiveUS6844550B1Material analysis using wave/particle radiationRadiation/particle handlingSystems designData stream
A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafer stage with six degrees of freedom of movement, and image storage and processing systems capable of handling multiple simultaneous image data streams. Each electron optical column is enhanced with an electron gun with redundant field emission sources, a voltage contrast plate to allow voltage contrast imaging of wafers, and an electron optical design for high efficiency secondary electron collection.
Owner:MULTIBEAM CORP
Laser trim motion, calibration, imaging, and fixturing techniques
InactiveUS20050205778A1Optimal lasing procedureOptimal procedureMaterial analysis using wave/particle radiationPrinted circuit aspectsBiomedical engineeringLaser trimming
A system for probing circuit elements, includes a panel fixture, probe holder and stage. The fixture has a platen surface to support a work piece having work piece surface. The work piece surface is substantially parallel to the platen surface and has a target element thereon. The probe holder is configured to support a probe for detecting a characteristic of the target element. A stage rotates the probe holder about an axis substantially orthogonal to the platen surface, to align the probe with probe locations associated with the circuit element, so that the characteristic of the circuit element can detected by the probe. Fixturing motion can be optimized for efficient work piece manufacturing. Calibration and vision subassemblies are also provided.
Owner:THE GSI GRP LLC
High throughput sem tool
ActiveUS20100320382A1Material analysis using wave/particle radiationElectric discharge tubesHigh fluxLight beam
A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
Owner:CARL ZEISS SMT GMBH +1
Charged particle beam irradiation equipment having scanning electromagnet power supplies
InactiveUS6903351B1Irradiation time can be shortenedShort timeThermometer detailsStability-of-path spectrometersExcitation currentElectrical current
A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
Owner:HITACHI LTD
Examination systems for biological samples
InactiveUS20050051723A1Improve concentrationBioreactor/fermenter combinationsBiological substance pretreatmentsBiochemistryLiving cell
Examination systems, including methods and apparatus, for automated assay of biological samples, such as live cells.
Owner:ESSEN INSTR
Objective lens for an electron microscopy system and electron microscopy system
InactiveUS6855938B2Reduced space requirementsThermometer detailsStability-of-path spectrometersIon beam processingElectron microscope
Owner:CARL ZEISS NTS GMBH
Charged particle beam irradiation equipment and control method thereof
InactiveUS6900446B2Irradiation time can be shortenedShort timeStability-of-path spectrometersStatic indicating devicesParticle physicsElectrical current
Owner:HITACHI LTD
Apparatus and method for a scanning probe microscope
InactiveUS7022985B2Easy to modifyImprove measurement stabilityNanotechMaterial analysis using wave/particle radiationScanning electron microscopeScanning probe microscopy
The invention relates to an apparatus and a method for a scanning probe microscope, comprising a measuring assembly which includes a lateral shifting unit to displace a probe in a plane, a vertical shifting unit to displace the probe in a direction perpendicular to the plane, and a specimen support to receive a specimen. A condenser light path is formed through the measuring assembly so that the specimen support is located in the area of an end of the condenser light path.
Owner:JPK INSTR
Device and method for analyzing an organic sample
ActiveUS8263933B2Easy to analyzeHigh resolutionMaterial analysis using wave/particle radiationMaterial analysis by optical meansImage resolutionHigh spatial resolution
A device and method for analyzing an organic sample provide high spatial resolution. A focused ion beam is directed onto the organic sample. Fragments detached from the sample are examined using mass spectroscopy.
Owner:CARL ZEISS SMT GMBH
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