155results about "Gamma-ray/x-ray microscopes" patented technology

The invention relates to a reflection optical unit (1) for focusing electromagnetic radiation (300) onto a focal plane (100), comprising at least the following components: - a central stop (12) which is arranged on an optical axis (200) of the reflection optical unit (1) and is designed to prevent electromagnetic beams (300) that are radiated into the reflection optical unit (1) along the optical axis (200) from propagating parallel to the optical axis (200), - an X-ray lens (11) having a tube (11-1) which extends at least between the central stop (12) and the focal plane (100) along the optical axis (200) of the reflection optical unit (1) and delimits a first volume (V1) radially around the optical axis (200), such that electrons (e-) generated by electromagnetic radiation in the first volume (V1) are shielded, wherein the tube (11-2) together with the central stop (12) forms a ring-shaped aperture (18), and - a solid window (13) which delimits the first volume (V1) toward the focal plane (100) and which peripherally terminates flush with the tube (11-2), wherein the solid window (13) is configured such that electrons generated by electromagnetic radiation in the first volume (V1) are shielded from the focal plane (100) by the solid window (13).

The present disclosure is directed to an additive manufacturing system (100) configured to generate an electron beam (105) directed toward a target (120) to generate multidirectional x-ray flux (108). The multidirectional x-ray flux (108) is directed toward a component (126) as x-ray flux (109) after being directed through at least one plate (122) defining a pinhole (124) therethrough . Interactions between the component (126) and the x-ray flux (109) generate x-ray radiation (111). At least one detector (128) is configured to detect the x-ray radiation (111). An analysis component (190) is configured to generate an image comprising a three-dimensional component based on the x-ray radiation (111) detected by the at least detector (128).

An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane, and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector includes a long X-ray receiver.

A method and system for correcting detector defects in an X-ray microscope system based on deep learning. Normal geometry projections and offset geometry projections are collected for a given detector, mappings between defective regions and healthy regions are created, and a machine learning system is trained using these projections. The trained neural network system is then used to correct the tomographic projection dataset, thereby improving the image quality of the resulting reconstructed tomographic image volume set.

The present invention relates to a reactor and a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor includes a reaction chamber containing a showerhead, a submount, and at least one base support. The showerhead includes at least one gas outlet configured to provide a gas flow of at least one material or a gas flow of at least one component of the at least one material. The abutment is rotatable about an abutment axis of rotation. At least one substrate support is disposed on the submount and configured to rotate the substrate about a substrate axis of rotation. In particular, the substrate holder is configured to rotate the substrate about a substrate axis of rotation, where the abutment axis of rotation and the substrate axis of rotation are inclined relative to each other. The invention also relates to an X-ray microscope for generating an enlarged image of an object using X-rays.

To remove all unwanted heat from a source coil.SOLUTION: An electron beam B is typically dynamically steered on its path to a target 500 after generation. The steering is performed by one or more source coils 132N and 132S. These coils create a magnetic field outside a vacuum vessel 112 and allow air / water / oil cooling to remove unwanted heat. The magnetic field is then picked up within the vacuum vessel with a pole piece and directed toward a region where the magnetic field is needed to steer the electron beam.SELECTED DRAWING: Figure 1

Provided are a semiconductor inspection device, a semiconductor inspection system, and a semiconductor inspection method that can inspect a microstructure inside a semiconductor for each part by obtaining a magnified image with sufficient strength and a size that can be housed in a laboratory. A semiconductor inspection device using an amplified X-ray image is provided with: an X-ray irradiation unit comprising a micro-focus and high-output X-ray source (120) and a convergent mirror (130) that condenses and irradiates emitted X-rays toward a semiconductor sample; a sample holding unit that holds the sample; a mirror-type X-ray lens unit (150) that forms an image of the X-rays that have passed through the sample; and an imaging unit (190) for acquiring an X-ray image, in which each mirror constituting the convergent mirror (130) and the mirror-type X-ray lens unit (150) has a reflective surface on which a multilayer film having a high reflectance with respect to X-rays having a specific wavelength is formed.

A user interface presented on a display of the microscope system includes a motion control for moving the object stage subsystem, the source subsystem, and the detector subsystem, and a simulation area; the simulation area displays a resolution curve and a flux curve generated by a zoom tool and displayed on a graphical user interface of the system.

A multi-aperture array for manipulating a plurality of charged first single-particle beams, comprising: a base body with a plurality of apertures, wherein, during operation of the multi-aperture array, one of the charged first single-particle beams passes through each aperture; at least a plurality of first electrodes, wherein one of the first electrodes is arranged at each of the apertures to individually influence the first single-particle beam passing through the aperture, and wherein each of the first electrodes is connected to a control unit; wherein the base body has a first depth TG in a z-direction along which the first apertures extend through the base body; wherein the first electrodes each have a depth TE in the z-direction that is less than the depth TG, i.e., TE < TG;wherein the first electrodes are each embedded in the base body such that they are exposed in an area adjacent to and forming the aperture, and are otherwise embedded directly in the base body and thus without an electrical insulating layer; and wherein the material of the base body is glass or consists of glass.

An X-ray imaging system is disclosed, comprising: a target; an electron beam source configured to provide an electron beam that interacts with the target to generate X-ray radiation; electron optics configured to alternately direct the electron beam to at least first and second locations on the target; an X-ray detector array configured to receive the X-ray radiation generated at the first and second locations on the target; a sample location area for receiving a sample exposed to the generated X-ray radiation; the sample location area positioned in a region where the X-ray radiation generated at the first location overlaps with the X-ray radiation generated at the second location; and a processing unit coupled to the X-ray detector array, the processing unit configured to generate an image of the sample positioned in the sample location area based on the X-ray radiation originating from the first and second locations. The electron beam is moved between locations such that the time between successive exposures of the first and second locations is less than 10 μs, thereby reducing thermally induced mechanical stress. Corresponding methods are also disclosed.

To prevent a reduction in the optical output of a semiconductor light emitting device.SOLUTION: A variable shape mirror 10A comprises: a first substrate 14 that has a first surface 24 and a second surface 26 on the opposite side of the first surface 24, and is formed of a piezo single crystal material; a first electrode that is provided on the first surface 24 and has a reflection surface 12; a plurality of second electrodes that are provided on the second surface 26; a second substrate 16 that has a third surface 28 joined to the plurality of second electrodes and a fourth surface 30 on the opposite side of the third surface 28, and is formed of the piezo single crystal material; a third electrode that is provided on the fourth surface 30; and a power supply 22A that applies voltage between the first electrode and the plurality of second electrodes and between the plurality of second electrodes and the third electrode.SELECTED DRAWING: Figure 5

An X-ray beam scanning optical system (10) is provided with: an X-ray source (11) that outputs an X-ray beam (R1) toward a semiconductor device (100); a first capillary lens (12) that converts an X-ray beam (R1) outputted from the X-ray source (11) into an X-ray beam (R2) that is parallel X-rays; a second capillary lens (13) that focuses the X-ray beam (R2) that has passed through the first capillary lens (12) on a semiconductor device (100); and a shield member (14) disposed between the X-ray source (11) and the semiconductor device (100). Furthermore, the inspection device (1) is provided with: a drive unit (which is a shield member (14) in this case) that moves the second capillary lens (13); and a drive control unit (15) that controls the shield member (14) such that the second capillary lens (13) is moved such that the X-ray beam focused on the semiconductor device (100) is scanned while the optical axis at the emission end (12b) of the first capillary lens (12) and the optical axis at the incidence end (13a) of the second capillary lens (13) are maintained in parallel.

The invention relates to an imaging method and an imaging system for carrying out this method. The object of the invention is to provide an improved multispectral ptychographic imaging method and a corresponding system. To this end, the imaging method of the invention comprises the following process steps: generation of at least partially coherent electromagnetic radiation (3) containing spectral components at at least two different wavelengths; spatial separation of the spectral components of the electromagnetic radiation, in particular by angular dispersion; generation of structured illumination beams (9) by selecting one of the spectral components at a time using a structured aperture (8a, 8b, 8c); and movement of an object (6) in a direction transverse to the path of the illumination beams (9) into a plurality of positions.Detecting an intensity pattern for each of the positions, wherein the intensity patterns are generated by scattering and / or diffraction of the illumination rays (9) at the object (6) in a detection plane; and reconstructing an image of the object (6) from the detected intensity patterns, wherein an image of the object (6) is calculated for each of the at least two wavelengths using a ptychographic reconstruction algorithm.

[Problem statement] Provision of a technology relating to a window holding section, an X-ray generator, an X-ray analyzer, a control method for an X-ray generator and a control system for an X-ray generator, wherein the technology is such that it is not necessary to provide an X-ray observation section in a vacuum area and that it is not necessary to use any part of the X-rays used for the measurement of the X-ray analysis. [SOLUTION] According to one embodiment of the present invention, an X-ray generator (20) is provided. The X-ray generator (20) is equipped with an X-ray generating unit (203a) and an X-ray transmission window. The X-ray generating unit (203a) is configured to generate X-rays by receiving an electron beam from an external source. The X-ray transmission window comprises a first X-ray transmission window (204a) and a second X-ray transmission window (205a). The first X-ray transmission window (204a) is configured to transmit first X-rays (L1) directed in a first direction (D1) among the X-rays. The first X-rays (L1) fall onto an X-ray observation section (21) that is arranged on the optical axis of the first X-rays and that can observe the X-ray focal point of the X-rays.The second X-ray transmission window (205a) is arranged such that it transmits second X-rays (L2) from the X-rays, which are oriented in a second direction (D2) that differs from the first direction (D1).

A deep learning based method and system to correct for detector defects in X-ray microscopy systems. Normal geometry projections and shifted geometry projections are collected for a given detector, creating a mapping between defective region and healthy region and a machine learning system is trained using these projections. The trained neural network system is then used to correct tomographic projection datasets improving the image quality of resultant reconstructed tomographic image volume sets.

An x-ray illumination system for use in x-ray based metrology of a sample, the x- ray illumination system includes x-ray energy adjustable optics that comprises a plurality of subsets of one or more x-ray optical elements, different subsets are associated with different x-ray energies out of multitude of selectable and monochromatic x-ray energies; wherein the x-ray energy adjustable optics is arranged to (a) receive an input x-ray beam that is polychromatic or partially monochromatic, and (b) generate a focused monochromatic x-ray beam having a selected x-ray energy, using a selected subset that is associated with the selected x-ray energy, the selected x-ray energy belongs to the multitude of selectable and monochromatic x-ray energies.

In order to improve the resolution of a light-emitting substance image excited by X-rays, provided is a microscope (100) provided with an X-ray irradiation unit and an observation optical system. The X-ray irradiation unit (10) generates a patterned X-ray sheet beam (1) for illuminating an object to be observed (7). The patterned X-ray sheet beam has an intensity pattern (2) in which the intensity varies repeatedly with respect to a position in a certain direction included in the spread in a partial region (32) in the sheet region (3) having the spread. The observation optical system (50) receives radiation having an observation wavelength from an observation region (4) disposed so as to include at least a part of the partial region. The embodiment of the invention also provides a shooting method of the light-emitting substance image.

A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

A control unit of a radiation imaging device according to the present invention includes: an exposure time control unit for controlling a sub-frame exposure time of an image sensor such that focused fluorescence at the depth of field, generated by radiation that reaches a scintillator, and unfocused fluorescence away from the depth of field are imaged discretely, for each radiation particle, on a light receiving surface of an image sensor; a focused signal discriminating unit for discriminating between sensor signals from a light receiving pixel group corresponding to spots of the focused fluorescence included discretely in each sub-frame, and sensors signal from a light receiving pixel group corresponding to spots of unfocused fluorescence; and an image signal processing unit for generating an image by overlaying sub-frame data based on the sensor signals from the light receiving pixel group corresponding to the spots of focused fluorescence.

The present invention relates to a collision avoidance system and method for an X-ray CT microscope, which processes image data of an object at different angles and generates a model of the object. The model is then used to configure the microscope for operation and can avoid collisions between the microscope and the object.

The present invention relates to a reactor and to a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor comprises a reaction chamber accommodating a showerhead, a base stage and at least one substrate holder. The showerhead comprises at least one gas outlet that is configured for providing a gas stream of the at least material or of at least one component of the at least one material. The base stage is rotatable around a base stage rotation axis. The at least one substrate holder is arranged on the base stage and configured for rotating the substrate around a substrate rotation axis. In particular, the substrate holder is configured for rotating the substrate around a substrate rotation axis in such a way that the base stage rotation axis and the substrate rotation axis are inclined with respect to each other. The present invention also relates to an X-ray microscope for producing a magnified image of an object using X-rays.

A mirror device (10) comprises: a first mirror (12) having a first reflective surface (22) on which a light ray (20) falls; and a second mirror (14) disposed away from the first reflective surface (22) in the normal direction to the first reflective surface (22). The second mirror (14) has a second reflective surface (24) on which the light ray (20) falls and a surface (26) opposite to the second reflective surface (24). The opposite surface (26) faces the first reflective surface (22), and the second reflective surface (24) is variable in shape.

A system, comprising: a target layer (112), a support layer (114), and a radiation detector (120). The system is configured to generate an electron beam (152) toward the target layer (112). The target layer (112) is configured to generate X-rays in response to the electron beam (152) hitting the target layer (112). The support layer (114) is configured to dissipate heat from the target layer (112). The support layer (114) is not opaque to the X-rays. The support layer (114) and the target layer (112) have different chemical compositions. The support layer (114) is between the target layer (112) and the radiation detector (120). The support layer (114) is between the target layer (112) and a sample (190). The radiation detector (120) is configured to capture an image of the sample (190) based on an interaction between the sample (190) and the X-rays.

An x-ray illumination system for use in x-ray based metrology of a sample, the x- ray illumination system includes x-ray energy adjustable optics that comprises a plurality of subsets of one or more x-ray optical elements, different subsets are associated with different x-ray energies out of multitude of selectable and monochromatic x-ray energies; wherein the x-ray energy adjustable optics is arranged to (a) receive an input x-ray beam that is polychromatic or partially monochromatic, and (b) generate a focused monochromatic x-ray beam having a selected x-ray energy, using a selected subset that is associated with the selected x-ray energy, the selected x-ray energy belongs to the multitude of selectable and monochromatic x-ray energies.

In order to improve the resolution of an image of a luminescent material excited by X-rays, an embodiment of the present disclosure provides a microscope 100 comprising an X-ray irradiation unit and an observation optical system. The X-ray irradiation unit 10 generates a patterned X-ray sheet beam 1 for illuminating an object to be observed 7. This patterned X-ray sheet beam has an intensity pattern 2 whose intensity varies repeatedly within a partial region 32 of a sheet area 3 having spread, with respect to a position in a direction within the spread of the partial region. The observation optical system 50 is arranged to receive radiation of an observation wavelength from an observation area 4, the observation area including at least a portion of the partial region. An embodiment of the present disclosure also provides a method for capturing an image of a luminescent material.

A method for extracting an evaluation target region of a biological sample in three dimensions based on two images that are matched: an image of the biological sample embedded in a wax block captured by an X-ray microscope using X-rays having an energy of 4-12 keV and an image of a same measurement point of the same biological sample captured by a light microscope after the X-ray microscopy imaging, the method comprising the steps of: extracting a region of interest, including the evaluation target region, from the image of the X-ray microscope that has been matched with the image of the light microscope; and binarizing the region of interest to further extract the evaluation target region from the region of interest by using the image information of the light microscope and the X-ray microscope in a complementary manner.

To provide a technique which is advantageous in detecting foreign matter present on a surface under inspection with high sensitivity.SOLUTION: An inspection device for inspecting an inspection target surface placed on an inspection surface is provided, comprising an X-ray generator tube having a target including an X-ray generator configured to generate an X-ray when irradiated with an electron beam, the X-ray generator tube being configured to radiate the X-ray toward the inspection surface; and an X-ray detector configured to detect the X-ray that is radiated from foreign matter present on the inspection target surface irradiated with the X-ray from the X-ray generator and totally reflected by the inspection target surface.SELECTED DRAWING: Figure 1

This inspection device for inspecting an object to be inspected comprises: an X-ray generation tube that has a target having an X-ray generation unit for generating an X-ray upon being irradiated with an electron beam and that radiates an X-ray towards the object to be inspected; and a plurality of X-ray detectors. Each of the plurality of X-ray detectors detects an X-ray that has been: radiated from foreign matter present on an inspected surface of the object to be to inspected irradiated with the X-ray from the X-ray generation unit; and totally reflected by the inspected surface.