514 results about "Electron gun" patented technology

The invention belongs to the technical field of vacuum coating, and particularly relates to a vacuum coating machine electron gun control method and system.The control method comprises the steps that in the coating process, key real-time parameters reflecting the working state of an electron gun and the evaporation process are continuously collected and fused, and the current coating state is evaluated in real time based on the key real-time parameters; and in combination with preset coating process requirements, an electron beam control target instruction set of a next control period is dynamically generated through a built-in decision mechanism and is sent to a power controller, a focusing coil controller and a scanning coil controller of the electron gun, and the electron gun is driven to adjust the power output, the focusing state and the scanning motion of the electron gun in real time. Through accurate and stable control of the evaporation rate, material characteristic changes are effectively coped with through a strong closed loop of power and the evaporation rate; the dynamically planned scanning path can actively compensate the non-uniformity of the thermal field of the crucible, and beam spot energy distribution is optimized in combination with focusing adjustment, so that the uniformity of the thermal field is remarkably improved.

Provided is a pattern inspection system, including a scanning electron microscope (SEM) including an electron gun configured to generate a first electron beam and emit the generated first electron beam toward a first wafer, a detector configured to detect electrons emitted from the first wafer based on the first electron beam emitted toward the first wafer, and at least one processor configured to generate a first SEM image including a plurality of pixels based on the detected electrons, and determine, based on a period of a pattern extracted from the first SEM image, a pixel size of a second SEM image to be generated by the SEM with respect to a second wafer.

A cathode-ray tube ultraviolet light source includes a metal housing provided with a light-transmissive window, a heatsink disposed within the metal housing, a phosphor having a first surface and an opposing second surface, wherein the second surface of the phosphor is in thermal contact with the heatsink, and an electron gun capable of developing an electron beam to impinge upon the first surface of the phosphor, whereby light emitted from the second surface of the phosphor is directed through the light-transmissive window.

The invention discloses an ion pump power supply circuit. The circuit comprises a voltage regulation output module, a control module and a current-voltage conversion module, the input end of the voltage regulation output module receives low-voltage direct-current input voltage; the high-voltage output end of the voltage regulation output module is connected with the anode of the ion pump; the ion pump shell is electrically connected with the input end of the current and voltage conversion module through the electron gun shell; the output end of the current-voltage conversion module is electrically connected with the control module; the grounding end of the current-voltage conversion module is connected with the signal ground; the voltage regulation output module converts the low-voltage direct-current input voltage and outputs high-voltage direct-current voltage to the anode of the ion pump, so that working current is generated in the cavity of the ion pump and returns to the current-voltage conversion module through the shell of the ion pump and the shell of the electron gun; the current and voltage conversion module detects working current in the ion pump cavity and converts the working current into a voltage signal; and the control module determines the vacuum degree in the ion pump cavity according to the voltage signal.

The invention discloses electronic gun assembling and welding automatic production equipment. The electronic gun assembling and welding automatic production equipment comprises a marble platform rack, a feeding and discharging robot assembly, a feeding and discharging tray assembly, an assembling table assembly, a press pressing assembly and a welding robot assembly. The feeding and discharging robot assembly is matched with the multiple feeding and discharging clamping jaw assemblies to place the part positioning mold and the electronic gun parts on the assembling platform according to the assembling sequence. The press pressing assembly is used for applying preset pressure to the electronic gun part in the assembling process; the welding robot assembly is matched with the assembling platform to weld electronic gun parts to form an electronic gun assembly, the feeding robot places the welded electronic gun assembly into a circular groove in the feeding and discharging tray assembly, the electronic gun parts can be automatically assembled and welded, the requirement of automatic production can be met, and the production efficiency is improved. Efficient and automatic assembly of the electronic gun assembly is achieved, and the problems that when the electronic gun assembly is manually assembled in a traditional mode, operation is tedious, efficiency is low and cost is high are solved.

The invention discloses an evaporation process multi-parameter trend analysis and anomaly recognition method and system, and the system comprises a process data collection and preprocessing module, a process modeling and mode recognition module, and a closed-loop anomaly detection and response module. According to the system, a plurality of key parameters such as coating rate, heating power, film thickness, vacuum degree, electron gun current and temperature are collected in real time through a sensor array, data alignment and multi-dimensional feature vector construction are carried out based on a unified time reference, and a normal working condition parameter distribution model is established by adopting a clustering modeling method; multi-parameter coupling type anomaly detection and grading early warning and real-time recording of abnormal events and parameter states are achieved through a mahalanobis distance mode and the like, a historical report is generated for tracing and analysis, the anomaly recognition accuracy and response speed of the technological process are improved, and the system is suitable for evaporation equipment quality monitoring in the fields of semiconductors, optics, photovoltaics and the like.

The invention relates to an ultrafast electron microscopic imaging device and an imaging method thereof, in particular to a multi-mode multi-dimensional ultrafast electron microscopic imaging device and an imaging method thereof, and solves the problem that the existing electron microscopic imaging technical scheme is difficult to simultaneously meet the measurement requirements of high time-space-energy-momentum resolution and material diversification. The device comprises a sample cabin, an electron gun, a laser generation module, a secondary electron detector, an STEM detector, an in-cabin plug-in detection assembly, a plug-in camera and an energy filtering electron microscope assembly which are arranged below the sample cabin, and a vacuum system, a hollow sample table is arranged in the sample cabin, and at least two ultrafast pumping laser introduction windows are arranged on the cabin wall of the sample cabin; an ultrafast detection laser introduction window is arranged on the electronic gun shell; the secondary electron detector is arranged obliquely above the sample table; the STEM detector is arranged on the side cabin wall of the sample cabin and is positioned below the sample table; and the in-cabin plug-in detection assembly is arranged below the STEM detector.

The invention belongs to the technical field of vacuum coating, and relates to an electron gun and ion source collaborative evaporation coating method, a control method and a control system. The electronic gun and ion source collaborative evaporation coating control method comprises the steps that key parameters in the coating process are continuously collected, and an electronic gun beam initial value and an ion source gas flow initial value are dynamically generated according to state diagnosis results of all the parameters; the beam current value of the electron gun and the gas flow value of the ion source are corrected in real time to inhibit the disturbance of the ion source to the beam current of the electron gun, and the electron gun and the ion source are cooperatively regulated and controlled to ensure the precise control of the coating uniformity; the invention further discloses an electron gun and ion source collaborative evaporation coating method, local hot spot compensation and global uniformity compensation are carried out by adopting a film thickness compensation mechanism so as to accurately control the film thickness. According to the invention, the cooperative control of the electron gun evaporation and ion bombardment process is realized, the film adhesion is enhanced, the evaporation coating rate is improved, and the film thickness uniformity is improved.

Provided is a superconducting cryo module that can be made more compact. A superconducting cryo module according to the present disclosure comprises: a superconducting accelerating cavity that has a cell part accelerating electrons, a beam pipe part extending from the cell part to an electron incidence side, and an extraction part of the electrons which were accelerated by the cell part; and an electron gun that is located in the interior of the beam pipe part of the superconducting accelerating cavity, is located on the same axis as a beam axis BA of the superconducting accelerating cavity, and emits electrons into the cell part.

This inspection system 100 comprises: an electron source 102 which irradiates a sample 200 with an inspection beam; a detector 105 which detects secondary electrons obtained by irradiating the sample 200 with the inspection beam and outputs a detection signal; a laser device 107 which emits an action laser that changes the amount of secondary electrons; an electron gun 106 which emits an action electron beam that changes the amount of secondary electrons; and a computer system 140 which generates an image of the sample 200 on the basis of the detection signal. The computer system 140 generates an inspection image I1 related to the emission of the inspection beam, acquires the dimensions and the like related to a pattern on the sample 200 on the basis of the inspection image I1, generates an inspection image I2 related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern on the basis of the inspection image I2, generates an inspection image I3 related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern on the basis of the inspection image I3.

The invention provides a planar distribution multi-beam electron gun, and relates to the technical field of microwave electric vacuum, and the planar distribution multi-beam electron gun comprises a housing; the cathode assembly is arranged in the shell, the cathode assembly comprises a cathode head, the surface of the cathode head is provided with a plurality of emitting surfaces which are arranged in a common plane in parallel at intervals, and the emitting surfaces are configured to escape electrons after being heated; the anode is arranged in the shell, and an electric field is formed between the anode and the emitting surfaces so as to accelerate escaped electrons, so that a plurality of electron beams are formed; the focusing electrode is arranged between the cathode head and the anode, an opening is formed in the focusing electrode, a plurality of grid wires are arranged on the opening, a grid gap between every two adjacent grid wires is aligned with the multiple emission surfaces in the emission direction of the electron beams, and the multiple grid wires are constructed to control beam diameters and divergence angles of the multiple electron beams; each electron beam passes through the gate slot aligned with the emission surface on which the electron beam is formed and enters the anode.

The invention relates to an electron source, a preparation method of the electron source, an electron gun and application of the electron source. The electron source comprises an optical fiber and an electron emission layer, the optical fiber comprises a fiber core used for transmitting laser and a wrapping layer wrapping the fiber core, and the end face of the light outlet end of the optical fiber and the extending direction of the fiber core are arranged at an angle. The electron emission layer is arranged on the end face of the light emitting end of the optical fiber, and the electron emission layer at least comprises an electron excitation layer covering the fiber core. The electron excitation layer comprises at least one of a zero-dimensional material, a one-dimensional material and a two-dimensional material. Low-dimensional materials such as zero-dimensional materials, one-dimensional materials or two-dimensional materials are adopted as materials of the electron excitation layer, the low-dimensional materials have the atomic-scale thickness, back-incident electrons can be emitted without in-vivo transmission, and the electron emission efficiency is high; and the low-dimensional material has the characteristics of no dangling bond, stable property, high melting point, difficulty in damage, good stability, long service life and the like.

An object is to provide an electron beam applicator suitable for an electron gun having a photocathode and an electron beam emission method in the electron beam applicator. The object can be achieved by an electron beam applicator including: an electron gun section; a main body section; and a control unit. The electron gun section includes a light source, a photocathode that emits an electron beam in response to receiving excitation light emitted from the light source, and an anode. The main body section includes an objective lens that converges an electron beam emitted from the electron gun section. The control unit controls at least convergence power of the objective lens in accordance with a size of an electron beam emitted from the photocathode.

The invention discloses a novel electronic gun for a cyclotron wave protector, and relates to the technical field of vacuum electronic devices. The electron gun comprises a cathode assembly, an anode assembly, a supporting assembly and a permanent magnet system. Wherein the cathode assembly adopts a planar cold cathode structure; the anode assembly comprises an anode main body and an electron beam channel in the anode main body; the cathode and the anode are fixedly connected through a supporting assembly; the permanent magnet system provides a uniform magnetic field. The cold cathode is adopted to replace a traditional hot cathode to generate high-quality strip-shaped electron beams, and the device has the advantages of being simple in structure, easy to integrate, rapid to start, long-acting, reliable, low in consumption and energy-saving.

The invention relates to the technical field of in-situ electrics, and provides an in-situ electrical property real-time analysis system based on an environmental scanning electron microscope, comprising: an environmental atmosphere simulation module; an electron gun pole shoe is arranged on the top side of the electron microscope chamber, a low-temperature sample table is arranged in the electron microscope chamber, and the electron microscope chamber is communicated with the environment atmosphere simulation module; the low-temperature Dewar is connected with the low-temperature sample table; the electrical probe is arranged on the inner wall of the electron microscope chamber, and the source meter is used for monitoring electrical signals. An environment atmosphere is simulated through an environment atmosphere simulation module, an electron gun pole shoe is arranged on the top side of an electron microscope chamber and used for imaging, a low-temperature sample table is arranged in the electron microscope chamber and used for bearing a to-be-tested sample, a low-temperature Dewar provides a low-temperature environment for the low-temperature sample table, and an electrical probe in a resistance analysis module conducts electrical monitoring on the sample. And electrical signals are monitored through a source meter, so that in-situ real-time online analysis of electrical properties of a scanning electron microscope observation machine on the surface of the material under different environment atmospheres is realized.

The application discloses a 200kV direct-current type high-voltage photoelectron gun, wherein a cathode electrode and an anode electrode adopt a multi-section curved surface structure design, and the front surface structures are symmetrically distributed, so that the risk of vacuum breakdown caused by local field enhancement of the direct-current high-voltage electron gun is reduced; a displacement adjusting structure is installed on the anode electrode, so that the distance between the anode electrode and the cathode electrode can be adjusted, and then the working voltage of the electron gun can be adjusted within 50-200kV; a photocathode transfer device is installed in the cathode electrode, and is used for replacing different types of photocathodes or damaged photocathodes; meanwhile, transmission and reflection type two photocathode working modes are arranged, and in the reflection type working mode, a detection laser can realize 15° and 45° two angle incidences, so that the direct-current type high-voltage electron gun has higher expansibility, and can be expanded to more application fields.

The invention provides a simple measurement device for electron beam trajectory parameters of a traveling wave tube, belongs to the technical field of electron beam measurement, and solves the problems that an electron beam analyzer is used for measurement in the prior art, the use is relatively complex, the price is high, and the traveling wave tube is inconvenient to develop. The device comprises a base, a mounting cylinder is arranged on the base, a traveling wave tube is mounted on the mounting cylinder, corrugated pipes sleeve the outer side of the mounting cylinder at intervals, one end of each corrugated pipe is connected with the base, the other end of each corrugated pipe is connected with a sealing cover, a collector is arranged on the sealing cover, and the sealing cover is connected with an adjusting mechanism. The position of the collector is adjusted by the adjusting mechanism, so that the radial distance and the axial distance between the collector and the traveling wave tube are changed, the current density of different points in an electron beam is measured, and other track parameters are obtained; the measuring device is simple and convenient in structure and easy to operate, is an effective tool for developing a new traveling wave tube, and is also suitable for characteristic testing of various electron guns of other vacuum devices.

The utility model discloses an electronic gun shell assembly tool which comprises a positioning column, limiting fences and a lower pressing block, an electronic gun shell is arranged on the positioning column in a sleeved mode, the lower pressing block is installed at the upper end of the positioning column for pressing and positioning, and the limiting fences are oppositely arranged on the periphery of the gun shell. A groove is formed in the limiting fence and used for positioning a ceramic ring and a lead-out ring of the gun shell, the inner side of the limiting fence is arranged to be in an arc shape corresponding to the outer circle of the ceramic ring, and the gun shell is sequentially provided with a first ceramic lining ring, a first lead-out ring, a first ceramic ring, a second lead-out ring, a second ceramic ring, a third lead-out ring and a second ceramic lining ring from bottom to top. By using the tool, all parts of the gun shell can be quickly assembled and positioned, and fixation is formed for subsequent welding to prevent welding deformation.

The present invention provides a multi-directional connection hub including a plurality of openings to which an anode adapter made of a metal material is connected through an insulation tube and an electron gun which emits electrons to the anode adapter to generate X-rays is connected, wherein the openings include a plurality of side openings to which the electron gun is connected and an upper opening through which the X-rays generated by the electrons, which are provided from the electron gun through the side opening and collide with the anode adapter, are emitted, and an emission direction of the X-rays is changed toward another side opening of the plurality of side openings or the upper opening according to a type of the anode adapter and a type or installation location of the electron gun.

A radiation dose rate control method, which relates to the technology of radiation, and an accelerator (100). The control method is used for an electron linear accelerator (100) comprising a microwave source, an electron gun (102) and an accelerating tube (104). The control method comprises: when an electron linear accelerator (100) outputs a beam, monitoring a first event used for indicating a change of a beam output parameter (S610), wherein the beam output parameter comprises a pulse of an electron gun (102) and a microwave power of a microwave source, and the first event is determined by means of radiation protection requirements; and in response to monitoring the first event, cutting off the pulse of the electron gun (102), and switching a first microwave power of the microwave source to a second microwave power, so that the leakage dose rate of a radiation safety boundary is less than or equal to a first preset threshold (S620), wherein the level of dark current in an accelerating tube (104) under the second microwave power is less than or equal to a second preset threshold. Further provided are a radiation dose rate control apparatus, an accelerator (100), and a radiation apparatus.

The invention relates to the field of high-frequency electronics, and discloses an ultra-wideband traveling wave tube which comprises a focusing control electron gun, a slow wave system and a three-stage depressed collector. The focusing control electron gun is used for providing stable electron beams and realizing effective focusing and acceleration of the electron beams through a cathode assembly, a heating wire, a bunching electrode and an anode assembly which are accurately designed; the slow wave system is composed of an input high frequency and an output high frequency, high-efficiency energy exchange between an input signal and an electron beam is ensured through a conical spiral line and a composite tube shell structure, and therefore signal amplification is achieved. The three-stage depressurization collector effectively recovers residual electron beams through a step-by-step depressurization design, energy loss is reduced, and the total efficiency of the traveling wave tube is improved. The traveling wave tube can provide output power exceeding 100 W in the frequency band of 2-18 GHz, the gain is larger than 25 dB, and the total efficiency is larger than 30%. Due to the excellent performance, the method can be widely applied to the fields of communication, radar, electronic countermeasures and the like.

The invention discloses a vacuum coating system and a coating method thereof.The coating method comprises the following steps that S1, a target material is dried, naturally cooled and then placed in a crucible, and then a lower shell is sealed; s2, a single crystal germanium sheet and an optical glass sheet are used as substrates to be placed on the flange at the bottom end of the placing cylinder, and the upper shell is sealed; s3, the lower shell and the upper shell are vacuumized; and S4, an electron gun corresponding to the crucible is started, the electron gun generates a high-energy electron beam to heat the target material to the evaporation temperature, and the target material moves upwards in the form of particles after being evaporated and is deposited on the surface of the substrate. According to the invention, the plurality of crucibles are distributed along the vertical direction and share the same axis, so that the evaporation direction of the target material in each crucible is ensured to be consistent. The target material in the crucible moves upwards in the vertical direction of the substrate after being heated to the evaporation temperature, so that frequent adjustment of the position of the substrate is avoided, the operation of the coating process is simplified, the uniformity and efficiency of coating are improved, and the requirements of multi-layer and complex coating are met.

The utility model belongs to the field of additive manufacturing technology discloses an additive manufacturing equipment. The additive manufacturing equipment includes support frame, vacuum chamber and electron gun subassembly. Vacuum chamber and support frame are independently arranged; Electron gun subassembly includes flexible connection module and electron gun of detachable support frame, and the emission end of electron gun is connected with one end of flexible connection module, and the other end of flexible connection module is connected with vacuum chamber, and the electron beam of electron gun emission can enter vacuum chamber through flexible connection module, and flexible connection module is used for preventing the deformation transmission of vacuum chamber to electron gun. Through the utility model, the position precision of electron gun can be avoided to be influenced by the thermal deformation of vacuum chamber, so as to improve the precision of printing and improve the printing quality.

The invention relates to the technical field of electronic scanning imaging, in particular to a scanning electron microscope and an electron optical structure thereof. According to the scheme, the anode of the electron gun is arranged behind the focusing lens and in front of the scanning coil, and the acceleration structure is arranged between the cathode and the anode, so that the acceleration structure is connected with the power supply during application, the acceleration structure is used as the acceleration electrode, and electrons can be accelerated between the cathode and the acceleration electrode after being emitted from the cathode, so that the acceleration effect is improved. The electron optical structure is arranged between the accelerating electrode and the anode, the electron decelerates between the accelerating electrode and the anode, high energy is kept in the accelerating structure, it is guaranteed that electrons are kept at a high speed in the propagation process, and unexpected deflection of the electrons in the electron optical structure is reduced; therefore, the electron beam falling on the surface of the sample has relatively low energy, so that the anti-interference performance of the electron beam in the propagation process can be ensured, and the low-voltage imaging of the electron beam on the surface of the sample can also be ensured.

The present invention discloses a method for controlling the surface potential of an insulating material under high vacuum, which uses an ultraviolet light source to irradiate an insulating material sample to generate radiation-induced conductivity, and discharges the charge by discharging the charge to the ground. In the present invention, an ultraviolet light source is used to irradiate an insulating material sample to generate radiation-induced conductivity, and discharges the charge by discharging the charge to the ground, which can effectively eliminate the surface potential formed by the accumulated charge on the surface of the insulating material sample, without the need to additionally equip expensive equipment such as electron guns and ion sources, thereby reducing the cost of potential control, eliminating complex external circuit design, and increasing test reliability; ultraviolet irradiation is used to achieve surface potential control of the insulating material under high vacuum conditions, and the surface potential neutralization operation can be completed without contacting the sample surface, thereby avoiding damaging the sample surface morphology and thus affecting its secondary electron emission characteristics, increasing test stability, and improving the accuracy of secondary electron emission coefficient measurement.

The invention discloses a fixing device applied to assembling and welding of a whole gyrotron. The fixing device comprises an assembling mechanism and a welding mechanism. The assembling mechanism comprises a frame body, vertical sliding rails are arranged on the two sides of the frame body, and a first sliding module used for clamping and pressing a collector, a second sliding module used for clamping a high-frequency component and a third sliding module used for clamping an electronic gun are sequentially arranged on the two vertical sliding rails from top to bottom in a sliding mode. The first sliding module, the second sliding module and the third sliding module are in transmission connection with the first driving mechanism, the second driving mechanism and the third driving mechanism respectively, and a rotating module used for clamping an electronic gun and driving the electronic gun to rotate is arranged at the bottom of the frame body; a coaxiality detection mechanism and an air tightness detection mechanism are arranged on the assembling mechanism; according to the scheme, the modular integrated design is adopted, all functional units work cooperatively, the assembling and welding requirements of gyrotron of multiple specifications are met, and the assembling and welding precision and efficiency are high.

A cathode-ray tube ultraviolet light source includes a metal housing provided with a light-transmissive window, a heatsink disposed within the metal housing, a phosphor having a first surface and an opposing second surface, wherein the second surface of the phosphor is in thermal contact with the heatsink, and an electron gun capable of developing an electron beam to impinge upon the first surface of the phosphor, whereby light emitted from the second surface of the phosphor is directed through the light-transmissive window.

The invention discloses an automatic process control method and an automatic process control system for an evaporator, which are suitable for a thin film deposition process under various materials and multi-process conditions. The system comprises a process initialization module, a coating control execution module and a post-processing and data feedback module. The process initialization module is used for parameter configuration, environment preparation and starting condition confirmation before an evaporation task is completed, and it is ensured that the system has basic operation conditions for entering a coating stage; the coating control execution module is used for completing electronic gun power control, plating pot rotating speed adjustment, film thickness real-time detection and thickness closed-loop adjustment in the evaporation process, and dynamic accurate control over the coating thickness is achieved; the post-processing and data feedback module is used for automatically turning off an electronic gun, cooling a substrate, breaking vacuum of a cavity, recording process data and updating control parameters after the coating task is finished, so as to ensure the safe shutdown of equipment and the continuous optimization capability of the system; the system can automatically complete preparation before evaporation, coating execution and post-treatment operation.

The present application relates to the technical field of electron-optical imaging, and particularly relates to a backscattered electron scintillator detector device and a detection method, which comprises a backscattered electron receiving sensor, an optical condensing group, an optical transmission group, a photoelectric conversion system and a detector protection mechanism. By using a scintillator as a sensor, a backscattered electron signal generated by an industrial electron gun electron beam is received, and then the electronic information carried by the backscattered electron is converted into an optical signal and transmitted to an area far away from the workpiece. Finally, a high signal-to-noise ratio voltage analog signal is formed by the photoelectric conversion system, avoiding the influence of spatial noise and other interference signals on weak signal transmission in the existing analog signal transmission process. For detailed topographic features, a backscattered electron image with high resolution can be displayed.

The present invention discloses a method for acquiring the generated posture of field-emission electrons in a microwave electron gun, belonging to the technical field of electronic components. The positioning method comprises: measuring the actual target posture of the field-emission electrons on a fluorescent screen; the field-emission electrons are generated and emitted inside the microwave electron gun, and are focused and projected onto the fluorescent screen via a preset magnetic field path; establishing a mapping relationship between the initial possible postures of the field-emission electrons generated inside the microwave electron gun and the target reference posture when they arrive at the fluorescent screen; using each of the initial possible postures of the field-emission electrons and the mapping relationship, obtaining the target reference posture of each field-emission electron when it arrives at the fluorescent screen; and selecting the most accurate generated posture of the field-emission electrons from multiple initial possible postures, thereby accurately determining the specific position and emission phase of the field-emission current when it is generated inside the microwave electron gun.