58 results about "Electron gun" patented technology

The utility model discloses a kind of cathode heater subassemblies for klystron electron gun, it is characterized in that, including: cathode base, heater sleeve, heater and detachable heat shield assembly, the upper and lower two end surfaces of cathode base are respectively provided with emitting surface and mounting groove, heater sleeve is detachably fixed in mounting groove, and the end surface of heater sleeve back to cathode base is equipped with accommodating groove;Heater is installed in accommodating groove, and the part of heater in accommodating groove is wrapped with insulating layer;Heat shield assembly includes outer heat shield and inner heat shield, outer heat shield is sleeved in cathode base, and inner heat shield is installed in outer heat shield and covers heater sleeve and heater.The utility model can realize reversibility dismounting and maintenance, and heater material volatilization can be avoided directly deposited on the emitting surface of cathode base, help to maintain the emitting surface cleanliness of cathode base, to improve electron emission efficiency, high-temperature solder can also be reduced in use, reduce cost.

A kind of plating experiment device and method for preparing high bonding force copper plating layer on aluminum-based heat sink surface, it relates to material processing technical field.Plasma chamber is provided with heater, motion control mechanism can carry out public self-rotating compound motion and is connected bias power supply, evaporation source includes crucible, electron gun, deflection coil and ion source, so that the inside of plasmaplasma chamber forms pure strong current ion flushing area and strong current ion enhanced electron beam evaporation plating area, vacuum and gas supply system connects plasmaplasma chamber and carries out vacuumizing, and respectively with plasmaplasma chamber and ion source connection supply reaction gas and working gas.By the spatial partition layout of plasmaplasma chamber cooperation motion control mechanism public self-rotating compound motion, workpiece is periodically alternated through two functional areas in film forming process, utilizes the ion beam mixing effect of high-energy ion to realize film densification and eliminate interface stress, ensure the bonding force and reliability of the deposited copper plating layer, multiple workpieces can be simultaneously loaded to improve production efficiency.

The application discloses a kind of for gyro device coil magnet and electron gun collaborative optimization design method, belong to microwave millimeter wave technical field.The application first establishes the mapping relationship between multi-coil configuration parameter and three-dimensional magnetic field distribution;Then establish the potential distribution in the two-dimensional plane of electron gun, solve electron beam trajectory under given magnetic field distribution;Establish the mapping relationship between electron gun electrode structure parameter and electron beam performance parameter;Again establish the mapping relationship between electron gun performance parameter and electron gun electrode shape and solenoid configuration parameter;Finally, establish the fitness function of evaluating electron beam quality, introduce global optimization algorithm to realize the optimization design of electron gun performance.The application has high design freedom, high universality, can realize high-performance comprehensive design, and also has the advantages of fast calculation speed, high precision, good numerical calculation stability.

The application discloses a preset time control multi-electron gun cooperative scanning optimization method and system, relates to the technical field of industrial process control and optimization, and comprises the following steps: S1, a dynamic coupling model is constructed, and multi-electron gun system parameters and a communication topology are initialized; S2, a leadership comprehensive score is dynamically calculated, and a main leader and an auxiliary leader are elected; S3, the main leader solves a local constraint optimization problem, and a global energy reference trajectory is generated; S4, each electron gun independently generates a control instruction through a respective preset time distributed optimal controller based on the global energy reference trajectory, and converges a tracking error; S5, the control instruction of each electron gun is subjected to constraint processing, and is executed; and S6, system performance is monitored, and adaptive adjustment is performed; the preset time control multi-electron gun cooperative scanning optimization method and system provided by the application solve the problems of serious interference between electron guns and poor anti-disturbance robustness in the prior art.

This invention discloses a miniaturized high-repetition-rate pulsed photocathode electron gun, comprising a laser, a shaping optical path, and a photocathode electron gun arranged sequentially. The photocathode electron gun includes a front electrode and a quaternary electronic lens group. The laser serves as the light source for the shaping optical path, which precisely and stably transmits the laser beam to the photocathode surface. The cathode of the front electrode of the photocathode electron gun generates photoelectrons, and the front electrode controls the intensity of the emitted electron beam. The quaternary electronic lens group of the photocathode electron gun adjusts the uniformity of the emitted electron beam. This invention achieves high-quality electron beams while possessing advantages such as compact structure and miniaturization.

A drill head (1) and corresponding method for drilling a borehole (2) into a sub-surface formation (3) comprises at least one drill housing (4) configured to be arranged sub-surface, and at least one gyrotron (5, 5a, …). The gyrotron (5, 5a, …) comprises an electron gun (6) configured to produce an electron beam, at least one magnet (7) configured to produce a magnetic field, and a cavity (8) configured to receive the electron beam and to generate microwaves by a resonance coupling between the electron beam and the magnetic field produced by the magnet (7). The microwaves are injectable into the sub-surface formation (3) for drilling the borehole (2). The gyrotron (5, 5a, …) is at least partially arranged in the drill housing (4) such, that the microwaves are generated sub-surface.

The application belongs to the technical field of high-voltage power supply sampling monitoring, and provides an ultrahigh-voltage electron gun power supply photoelectric isolation sampling circuit and a sampling method. In view of the problems of low sampling accuracy, poor surge resistance and difficult maintenance of the existing electron gun power supply under a 150kV floating high-voltage environment, the application adopts three groups of signal processing and isolation channels with the same structure, which correspond to the output of the main high-voltage, the auxiliary high-voltage and the filament in a floating cascade structure. Each channel independently completes sampling and isolation under the corresponding floating potential. The circuit includes a power supply circuit, a sampling connection circuit, a current and voltage sampling base plate with an integrated multi-stage overvoltage clamping network, and a detachable and plug-in sampling processing circuit board, a photoelectric conversion circuit board and an optocoupler signal transmission plugboard. Through photoelectric isolation and modular design, the circuit effectively suppresses the spark surge interference, realizes high-precision and high-reliability sampling, supports plug-and-play, and significantly improves the system maintenance convenience and operation stability.

This invention relates to the field of facial tissue sterilization technology and discloses a sterilization device for facial tissue production. The device includes a first support frame, a material moving component in the middle of which holds packaging boxes containing facial tissues, and an electron irradiation gun for sterilizing the packaging boxes by irradiation above the first support frame. It also includes a feeding mechanism and a discharging mechanism. The feeding mechanism includes a second support frame located at the feeding end of the first support frame, with a box arrangement component and a material transfer component sequentially arranged on the side of the second support frame near the first support frame. This invention automatically organizes randomly arriving packaging boxes into a single-layer, single-row, tightly packed array using the box arrangement component, allowing them to pass through the irradiation area at a uniform speed in a spread-out manner. This ensures that the irradiation distance of each packaging box is highly consistent with the radiation environment. While meeting sterilization standards, the electron gun's set intensity can be reduced, effectively preventing excessive irradiation from causing strength damage or yellowing of the facial tissues.

A charged particle wire device is characterized by comprising: a charged particle source (202) consisting of a single crystal needle (204), a filament (205) connected to the single crystal needle, and an insulator (207) for holding the filament; a plurality of non-evaporating getter materials (201); an extraction electrode (203); and a housing (209) arranged around the axis of the electron wire emitted from the charged particle source; wherein a heater (212) for heating the plurality of non-evaporating getter materials is disposed at the extraction electrode, the plurality of non-evaporating getter materials are arranged side by side in the housing, the housing is connected to the extraction electrode, and an elastic member (250) is disposed between the non-evaporating getter materials and the housing, the elastic member (250) being configured to push the non-evaporating getter materials. This charged particle beam device comprises: a charged particle source 202 composed of a single crystal needle 204, a filament 205 connected to the single crystal needle, and an insulator 207 that holds the filament; a plurality of non-evaporation getter materials 201; a lead-out electrode 203; and a housing 209 disposed so as to surround the axis of an electron beam emitted by the charged particle source, the charged particle beam device being characterized in that a heater 212 for heating the plurality of non-evaporation getter materials is disposed in the lead-out electrode, the plurality of non-evaporation getter materials in the housing are disposed side by side, the housing is connected to the lead-out electrode, and elastic members 250 configured to press the non-evaporation getter materials are disposed between the non-evaporation getter materials and the housing.

This application discloses a scanning electron microscope device, comprising: an electron gun, the cavity of which is electrically connected to a first reference voltage terminal; a detector disposed inside the cavity of the electron gun and electrically connected to the first reference voltage terminal; an amplifier, the input terminal of which is electrically connected to the output terminal of the detector and electrically connected to the first reference voltage terminal; and an analog-to-digital converter (ADC), the input terminal of which is electrically connected to the output terminal of the amplifier, a first terminal of the ADC's power supply being electrically connected to the ADC, and a second terminal of the ADC's power supply being electrically connected to a second reference voltage terminal. The aforementioned scanning electron microscope device can improve the quality of semiconductor images generated by the scanning electron microscope.

The application discloses a multi-electron gun smelting furnace energy distribution optimization control method based on a Harris eagle optimization algorithm and belongs to the technical field of industrial process optimization control. The method comprises the following steps: embedding the upper limit of the electron gun power, the scanning range and the full coverage constraint of the molten pool geometry into the optimization process by constructing a multi-objective function containing power and angle decision variables and a physical feasible manifold; designing an improved Harris eagle algorithm based on a boundary projection operator, actively mapping the out-of-bound trajectory to the boundary of the feasible domain when the population is updated, and combining a prey escape energy adaptive mechanism and a constraint dominance criterion to guide the optimization in the feasible manifold; and finally adopting a TOPSIS method to screen the optimal parameters from the Pareto solution set and issuing the optimal parameters to a control system. The application realizes the multi-objective collaborative optimization of the energy distribution, significantly improves the search efficiency and the physical executability of the solution, and effectively improves the smelting quality.

The application discloses a gold source pre-melting purification method for electron beam evaporation, which comprises the following steps: dividing the gold source into N batches, wherein the volume of each batch of gold source accounts for 1 / 5-1 / 3 of the volume of the crucible; putting the first batch of gold source into the crucible, heating to complete melting under a vacuum of ≤8*10 ‑4 10%-30% of the rated power of the electron gun under a vacuum of Pa, and keeping for 1-3 minutes; taking out after cooling, wiping the surface of the gold ingot with a dust-free cloth dipped in an alcoholic solvent; putting the wiped gold ingot back into the crucible, adding the second batch of gold source, and repeating the above heating, cooling and wiping steps until all batches are processed; melting the finally obtained gold ingot and using it for electron beam evaporation coating. The application can effectively remove the black substances appearing on the surface of the gold source after melting, and significantly improve the quality of the gold film.

The application belongs to the technical field of non-ferrous metal purification, and particularly discloses a method for preparing 5N high-purity copper by electron beam reduction and induced directional solidification, which comprises the following steps: loading pretreated 4N cathode copper into an electron beam smelting furnace feeding mechanism and independently vacuumizing each part of the furnace body; starting a high-voltage power supply and an electron gun preheating, and heating and melting the 4N cathode copper by No.1 electron gun at 150-200 kW and 0.5-1 kV and then flowing into a crystallizer; when the copper liquid fills 2 / 3 of the crystallizer, starting No.2 and No.3 electron guns and keeping the copper liquid in the crystallizer molten at 50-100 kW and 20-40 kV; after the copper liquid fills the crystallizer, reducing the power of No.3 electron gun to 5 kW; when the melt in the crystallizer starts to crystallize, slowly pulling the ingot into a cooling area; after the cast ingot enters the cooling area completely, cutting off the impurity enrichment area of the cast ingot to obtain 5N high-purity copper. The application has the characteristics of simple process, short production cycle, small impurity enrichment area and low oxygen and hydrogen content.

The application discloses a kind of based on multi-arc ion plating and ion beam enhanced electron beam evaporation coating device and method, it is related to material processing technical field.Coating chamber is equipped with heater, ion beam enhanced electron beam evaporation assembly includes multiple groups of matched arrangement crucible, electron gun, deflection coil and high-current ion source, multi-arc ion plating assembly includes cathode arc evaporation source array, workpiece motion control mechanism is connected bias power supply, vacuum and gas supply system carries out vacuumizing and gas supply, water supply and power supply system carries out water cooling and heat dissipation and provides operating power supply for each component, control system is respectively connected with each component Signal is used for real-time control and adjustment of each process parameter in deposition process.Integrated structure design and process synergy can complete multi-arc ion cleaning, multi-arc priming and high-current ion enhanced electron beam deposition composite coating full process in coating chamber, simplify operation process, improve coating efficiency and quality.

A radiation dose rate control method, which relates to the technology of radiation, and an accelerator (100). The control method is used for an electron linear accelerator (100) comprising a microwave source, an electron gun (102) and an accelerating tube (104). The control method comprises: when an electron linear accelerator (100) outputs a beam, monitoring a first event used for indicating a change of a beam output parameter (S610), wherein the beam output parameter comprises a pulse of an electron gun (102) and a microwave power of a microwave source, and the first event is determined by means of radiation protection requirements; and in response to monitoring the first event, cutting off the pulse of the electron gun (102), and switching a first microwave power of the microwave source to a second microwave power, so that the leakage dose rate of a radiation safety boundary is less than or equal to a first preset threshold (S620), wherein the level of dark current in an accelerating tube (104) under the second microwave power is less than or equal to a second preset threshold. Further provided are a radiation dose rate control apparatus, an accelerator (100), and a radiation apparatus.

The utility model provides a kind of mobile power supply system for electron beam scanning electron microscope ion pump.The mobile power supply system includes box, the power supply core being set in the box, charging interface and at least one discharge interface.Charging interface is used to connect external power supply and power supply system, to charge power supply system;Each discharge interface is used to connect power supply core and an ion pump, to discharge ion pump.The mobile power supply system of the utility model integrates multiple functions, is easy to operate, and has complete safety measures, which can ensure that the internal vacuum degree of the electron gun deteriorates during transportation, and maintain the high vacuum state of the electron gun by supplying power to the ion pump to vacuumize the electron gun.The mobile power supply system is installed in the electron gun transport cabinet in the form of a module, which is small in size and easy to install.When the entire module fails, efficient maintenance can be achieved by replacing the module, reducing maintenance time and cost.

The present application relates to a method for compressing the divergence angle of electron beam by using a ring-shaped electron gun, which produces a peripheral ring-shaped electron beam by using a hollow ring-shaped cathode electron gun, and realizes effective control of the divergence angle of the electron beam by using the Coulomb repulsion of the inner electron beam, and can realize different compression amounts of the divergence angle by changing the current, energy and transmission distance of the outer electron beam.

The application provides a microwave electron gun, a method for generating an electron cyclotron resonance region and an ion implanter, wherein the microwave electron gun comprises: a plasma chamber; the plasma chamber has a first end and a second end; the first end is used for passing in microwaves; the second end is used for passing in gas; an escape region is arranged on the sidewall of the plasma chamber, and the particle escape efficiency of the escape region gradually decreases from the first end to the second end, wherein the particles include electrons and / or gas molecules / atoms. The microwave electron gun provided by the technical scheme reduces the leakage degree of the gas in the plasma chamber and improves the working performance of the microwave electron gun.

Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.

An electron beam control device and an electron accelerator, which relate to the field of electron accelerators. The electron accelerator comprises a first electrode sheet (201), a second electrode sheet (202), an electron gun (204) and a high-voltage end (203), wherein the high-voltage end (203) is connected to the first electrode sheet (201); and a cathode of the electron gun (204) is arranged between the first electrode sheet (201) and the second electrode sheet (202). The electron beam control device comprises a first hydraulic cylinder (301) and a control switch (302), wherein the control switch (302) is connected between the high-voltage end (203) and the second electrode sheet (202); and the first hydraulic cylinder (301) is connected to a hydraulic pump by means of a liquid delivery pipe, a piston of the first hydraulic cylinder (301) is connected to the control switch (302), and the piston drives the control switch (302) to open and close. The instant closing and opening of an electron beam can be realized, thereby greatly improving the production efficiency of irradiation processing, improving the irradiation efficiency, and improving the usage safety of an apparatus.

To provide a radioactive isotope production apparatus that can stably produce radioactive isotopes while miniaturizing superconducting accelerators. [Solution] The above problem can be solved by a radioactive isotope manufacturing apparatus comprising an electron gun that outputs an electron beam E, an accelerator that accelerates the electron beam E by superconductivity, a cooling unit that cools the accelerator, a manufacturing unit that receives the electron beam E accelerated by the accelerator to produce a radioactive isotope, and a high-frequency source R that inputs high frequency to the accelerator, wherein the accelerator is equipped with a high-frequency cavity that receives high frequency from the high-frequency source to provide acceleration energy to the electron beam, and the cooling unit is equipped with a conduction cooling attachment that conductionally cools the entire cavity body 21 between an expander and the cavity body 21 of the high-frequency cavity.

An X-ray generating apparatus includes an X-ray generating tube including an electron gun, and including a target configured to generate X-rays upon receiving an electron beam emitted from the electron gun; a deflector that deflects the electron beam; a drive circuit that applies an acceleration voltage between a cathode of the electron gun and the target; and an adjustment section for adjusting the deflection of the electron beam by the deflector in accordance with the acceleration voltage or a change amount of the acceleration voltage, to reduce a change in an incident position of the electron beam on the target due to a change in the acceleration voltage.

An X-ray tube (1) according to the invention comprises a housing (2); an electron gun (3) that emits an electron beam (B) in the housing (2); and a target (4) that generates an X-ray beam (R) when the electron beam (B) strikes the target (4) in the housing (2). The electron gun (3) comprises a cathode (32) that emits electrons and a focusing electrode (34) that focuses the electrons as an electron beam (B) onto the target (4). The focusing electrode (34) has a tubular shape with an inner surface (51) and an outer surface (52). The inner surface (51) comprises a first region and a second region located on the target side with respect to the first region. The average roughness of the second region is lower than the average roughness of the first region.

This invention discloses a method for ensuring the coaxiality of a high-energy electron gun body, belonging to the field of high-energy electron guns. The method includes: (1) first assembling the flange connector, Kovar ring I, Kovar ring II, and ceramic tubing onto an argon arc welding fixture I, and then using argon arc welding to weld Kovar ring I to the flange connector and flange to obtain a flange ceramic assembly; (2) milling the installation reference surface after welding; (3) argon arc welding the square cavity weldment; (4) machining the square cavity weldment after welding; (5) ion beam welding the anode plate; (6) ion beam welding the square cavity weldment; (7) brazing the ceramic tubing to Kovar ring I and Kovar ring II. By rationally arranging the welding and milling processes using this method, the coaxiality of the gun body can be ensured, thereby improving the assembly accuracy of the high-energy electron gun and the performance of the electron beam. This invention provides a method for the processing and manufacturing of a high-energy electron gun body, and this method also has guiding significance for the production and manufacturing of electron guns.

The application provides a fluorescence real-time navigation cryogenic focused ion beam processing device and method. The fluorescence real-time navigation cryogenic focused ion beam processing device comprises: a sample fixing assembly for carrying and moving a cryogenic sample containing a fluorescent marker; an electron gun for electron beam imaging of the cryogenic sample; an ion gun for ion beam processing of the cryogenic sample; and a fluorescence imaging system for fluorescence imaging of the cryogenic sample emitting an excitation light beam to monitor the processing of the ion beam in real time through a fluorescence image. The processing device optimizes the position of the fluorescence imaging system so that the sample fixing assembly does not interfere with the fluorescence imaging system, and major redesign of the chamber and sample fixing assembly is not required due to interference problems, thereby maximizing compatibility with existing mainstream cryogenic dual-beam scanning electron microscope structures, avoiding high-cost, complex and potentially unstable modifications.

This invention relates to the field of metal smelting technology and discloses a method and system for ingot receiving during interrupted EB furnace smelting. The method includes: monitoring the EB furnace smelting process to determine if smelting has been interrupted; increasing the current of the remaining second-part electron guns in response to an interruption in the crystallization zone of the EB furnace; increasing the current of the first-part electron guns based on images captured by a camera in response to troubleshooting the first-part electron guns; monitoring the ingot receiving status in real time; and adjusting the current of the second-part electron guns to the smelting state in response to ingot receiving completion. The solution of this invention monitors the EB furnace smelting process and, when the first-part electron gun is interrupted, increases the current of the second-part electron guns to maintain the ingot temperature and the vacuum level of the EB furnace. After troubleshooting, the current of each electron gun is adjusted to resume the EB furnace smelting process, thereby improving the ingot receiving success rate while ensuring product quality and reducing material waste.

The application discloses a rapid directional solidification device and a rapid directional solidification method. The device comprises a material placing bin, a plurality of electron gun heat sources, a fixing assembly and a driving assembly. In the working process, the material to be grown is placed in the material placing bin, the material is positioned and clamped through the fixing assembly, and the driving assembly is started to stably rotate the material. The plurality of electron gun heat sources arranged at intervals in the circumferential direction of the material placing bin are turned on, and the high-energy beam uniformly heats the rotating material, so that the specified area of the material is gradually melted to form a stable melting zone. Then, the driving assembly moves the material downward, and the melting zone shape and temperature field are kept stable under the synergistic action of the electron gun heat source and the liquid metal cooling, and the crystal growth process is completed. The rapid directional solidification device can realize controllable rapid directional solidification in a very wide cooling rate range (10 1 ~10 6 K / s order of magnitude), and the rapid directional solidification method can prepare single crystal and oriented polycrystal materials with non-equilibrium structures.

The application discloses a kind of multi-source multi-beam electron beam lithography system structures, belong to parallel electron beam lithography technical field;With the core architecture of electron emission function and beam switch function decoupling is adopted, the architecture is mainly composed of upper micro-nano electron gun array, lower array beam gate system.It is as follows: upper micro-nano electron gun array as electron emission core component, keep normal development emission state in the whole process of system work, its only function is to stably generate each way sub-electron beam, does not participate in any beam switch and pattern modulation related operation;Lower array beam gate system and each way sub-electron beam generated by electron gun array are one-to-one corresponding layout, its core function is to realize beam switch control, can be accurately independently gated or off control to each way sub-electron beam according to lithography pattern demand, to complete the preliminary modulation of lithography pattern.