601 results about "Electron gun" patented technology

The invention relates to electron beam evaporation coating equipment and an application method thereof. The electron beam evaporation coating equipment comprises an evaporation chamber, an electron gun system, a first vacuumizing system, a heating table mechanism, a sample table mechanism and an ion source system, the sample table mechanism is rotationally connected with the heating table mechanism, and the sample table mechanism comprises a substrate clamping part for clamping a substrate; the ion source system is connected with the top of the evaporation chamber and is used for cleaning the substrate; the first driving system is used for driving the first rotating shaft to rotate; the second driving system is used for driving the second rotating shaft to rotate; the second rotating shaft drives the heating table mechanism and the sample table mechanism to synchronously and integrally overturn; and when the sample table mechanism turns over to enable the substrate clamping part to be opposite to the ion source system, the substrate can be placed, cleaned and turned over. The device can be turned over to a specific angle, the interaction between film bases can be improved through special dip angle film coating, and the binding force is improved. The sample table mechanism can turn over to enable the substrate to directly face the ion source system.

The invention belongs to the technical field of vacuum coating, and particularly relates to a vacuum coating machine electron gun control method and system.The control method comprises the steps that in the coating process, key real-time parameters reflecting the working state of an electron gun and the evaporation process are continuously collected and fused, and the current coating state is evaluated in real time based on the key real-time parameters; and in combination with preset coating process requirements, an electron beam control target instruction set of a next control period is dynamically generated through a built-in decision mechanism and is sent to a power controller, a focusing coil controller and a scanning coil controller of the electron gun, and the electron gun is driven to adjust the power output, the focusing state and the scanning motion of the electron gun in real time. Through accurate and stable control of the evaporation rate, material characteristic changes are effectively coped with through a strong closed loop of power and the evaporation rate; the dynamically planned scanning path can actively compensate the non-uniformity of the thermal field of the crucible, and beam spot energy distribution is optimized in combination with focusing adjustment, so that the uniformity of the thermal field is remarkably improved.

The invention discloses a method for detecting trace elements in a GH4169 high-temperature alloy by using secondary ion mass spectrometry, which specifically comprises the following steps: A1, firstly, carrying out necessary pretreatment on a GH4169 high-temperature alloy sample to remove surface pollution and an oxide layer; a2, selecting a time-of-flight secondary ion mass spectrometer, setting proper analysis parameters, and selecting a double-plasma O2 + ion source. The invention relates to the technical field of metal material trace chemical component analysis. According to the method for detecting the trace elements in the GH4169 high-temperature alloy by using the secondary ion mass spectrometry, a sample pretreatment process of the GH4169 high-temperature alloy is optimized, a double-plasma O2 + ion source and a low-energy electron gun charge compensation system of a time-of-flight secondary ion mass spectrometer are innovatively configured, deep analysis and a three-dimensional reconstruction algorithm are combined, and the trace elements in the GH4169 high-temperature alloy are detected. The sensitivity, the spatial resolution and the data reliability of trace element detection are obviously improved.

The invention discloses an electron linear accelerator for radiotherapy equipment in an X-ray operation. The microwave power source sequentially passes through the circulator and the power divider and then is connected with the first coupler and the second coupler, the first coupler is connected with the first acceleration cavity to provide an independent microwave magnetic field, and the second coupler is connected with the second acceleration cavity to provide an independent microwave magnetic field. An electron gun of the electron linear accelerator is sequentially connected with the first acceleration cavity and the second acceleration cavity and then outputs electron beams; the first coupler inputs the microwave power to the first acceleration cavity, so that the first acceleration cavity optimizes the electron beam energy spectrum monochromaticity; and the second coupler inputs the microwave power into the second acceleration cavity, so that the second acceleration cavity accelerates the electron beam to required energy. According to the electron linear accelerator, the needed electron beam energy can be achieved only through the two cavities, a large amount of energy of the finally obtained electron beam is concentrated on the needed energy through the acceleration mode, and in other words, the energy spectrum monochromaticity is better.

Provided is a pattern inspection system, including a scanning electron microscope (SEM) including an electron gun configured to generate a first electron beam and emit the generated first electron beam toward a first wafer, a detector configured to detect electrons emitted from the first wafer based on the first electron beam emitted toward the first wafer, and at least one processor configured to generate a first SEM image including a plurality of pixels based on the detected electrons, and determine, based on a period of a pattern extracted from the first SEM image, a pixel size of a second SEM image to be generated by the SEM with respect to a second wafer.

A cathode-ray tube ultraviolet light source includes a metal housing provided with a light-transmissive window, a heatsink disposed within the metal housing, a phosphor having a first surface and an opposing second surface, wherein the second surface of the phosphor is in thermal contact with the heatsink, and an electron gun capable of developing an electron beam to impinge upon the first surface of the phosphor, whereby light emitted from the second surface of the phosphor is directed through the light-transmissive window.

The invention discloses an ion pump power supply circuit. The circuit comprises a voltage regulation output module, a control module and a current-voltage conversion module, the input end of the voltage regulation output module receives low-voltage direct-current input voltage; the high-voltage output end of the voltage regulation output module is connected with the anode of the ion pump; the ion pump shell is electrically connected with the input end of the current and voltage conversion module through the electron gun shell; the output end of the current-voltage conversion module is electrically connected with the control module; the grounding end of the current-voltage conversion module is connected with the signal ground; the voltage regulation output module converts the low-voltage direct-current input voltage and outputs high-voltage direct-current voltage to the anode of the ion pump, so that working current is generated in the cavity of the ion pump and returns to the current-voltage conversion module through the shell of the ion pump and the shell of the electron gun; the current and voltage conversion module detects working current in the ion pump cavity and converts the working current into a voltage signal; and the control module determines the vacuum degree in the ion pump cavity according to the voltage signal.

The invention discloses electronic gun assembling and welding automatic production equipment. The electronic gun assembling and welding automatic production equipment comprises a marble platform rack, a feeding and discharging robot assembly, a feeding and discharging tray assembly, an assembling table assembly, a press pressing assembly and a welding robot assembly. The feeding and discharging robot assembly is matched with the multiple feeding and discharging clamping jaw assemblies to place the part positioning mold and the electronic gun parts on the assembling platform according to the assembling sequence. The press pressing assembly is used for applying preset pressure to the electronic gun part in the assembling process; the welding robot assembly is matched with the assembling platform to weld electronic gun parts to form an electronic gun assembly, the feeding robot places the welded electronic gun assembly into a circular groove in the feeding and discharging tray assembly, the electronic gun parts can be automatically assembled and welded, the requirement of automatic production can be met, and the production efficiency is improved. Efficient and automatic assembly of the electronic gun assembly is achieved, and the problems that when the electronic gun assembly is manually assembled in a traditional mode, operation is tedious, efficiency is low and cost is high are solved.

The invention discloses an evaporation process multi-parameter trend analysis and anomaly recognition method and system, and the system comprises a process data collection and preprocessing module, a process modeling and mode recognition module, and a closed-loop anomaly detection and response module. According to the system, a plurality of key parameters such as coating rate, heating power, film thickness, vacuum degree, electron gun current and temperature are collected in real time through a sensor array, data alignment and multi-dimensional feature vector construction are carried out based on a unified time reference, and a normal working condition parameter distribution model is established by adopting a clustering modeling method; multi-parameter coupling type anomaly detection and grading early warning and real-time recording of abnormal events and parameter states are achieved through a mahalanobis distance mode and the like, a historical report is generated for tracing and analysis, the anomaly recognition accuracy and response speed of the technological process are improved, and the system is suitable for evaporation equipment quality monitoring in the fields of semiconductors, optics, photovoltaics and the like.

The invention relates to an ultrafast electron microscopic imaging device and an imaging method thereof, in particular to a multi-mode multi-dimensional ultrafast electron microscopic imaging device and an imaging method thereof, and solves the problem that the existing electron microscopic imaging technical scheme is difficult to simultaneously meet the measurement requirements of high time-space-energy-momentum resolution and material diversification. The device comprises a sample cabin, an electron gun, a laser generation module, a secondary electron detector, an STEM detector, an in-cabin plug-in detection assembly, a plug-in camera and an energy filtering electron microscope assembly which are arranged below the sample cabin, and a vacuum system, a hollow sample table is arranged in the sample cabin, and at least two ultrafast pumping laser introduction windows are arranged on the cabin wall of the sample cabin; an ultrafast detection laser introduction window is arranged on the electronic gun shell; the secondary electron detector is arranged obliquely above the sample table; the STEM detector is arranged on the side cabin wall of the sample cabin and is positioned below the sample table; and the in-cabin plug-in detection assembly is arranged below the STEM detector.

The invention belongs to the technical field of vacuum coating, and relates to an electron gun and ion source collaborative evaporation coating method, a control method and a control system. The electronic gun and ion source collaborative evaporation coating control method comprises the steps that key parameters in the coating process are continuously collected, and an electronic gun beam initial value and an ion source gas flow initial value are dynamically generated according to state diagnosis results of all the parameters; the beam current value of the electron gun and the gas flow value of the ion source are corrected in real time to inhibit the disturbance of the ion source to the beam current of the electron gun, and the electron gun and the ion source are cooperatively regulated and controlled to ensure the precise control of the coating uniformity; the invention further discloses an electron gun and ion source collaborative evaporation coating method, local hot spot compensation and global uniformity compensation are carried out by adopting a film thickness compensation mechanism so as to accurately control the film thickness. According to the invention, the cooperative control of the electron gun evaporation and ion bombardment process is realized, the film adhesion is enhanced, the evaporation coating rate is improved, and the film thickness uniformity is improved.

Provided is a superconducting cryo module that can be made more compact. A superconducting cryo module according to the present disclosure comprises: a superconducting accelerating cavity that has a cell part accelerating electrons, a beam pipe part extending from the cell part to an electron incidence side, and an extraction part of the electrons which were accelerated by the cell part; and an electron gun that is located in the interior of the beam pipe part of the superconducting accelerating cavity, is located on the same axis as a beam axis BA of the superconducting accelerating cavity, and emits electrons into the cell part.

The invention discloses a structure for inhibiting front cavity interaction in a frequency-adjustable high-power gyrotron, which is used for carrying out PIC analogue simulation on the basis of a frequency-adjustable gyrotron developed in a laboratory, and verifying the front cavity interaction by utilizing a gyrotron linear theory and a generalized scattering matrix theory according to a generation principle of the front cavity interaction. And on the basis, adjustment and simulation analysis are carried out on the cavity structure of the gyrotron, a feasible way for inhibiting the interaction of the front cavity is found out, and stable work of the gyrotron during frequency tuning is ensured. The structure is composed of the periodic loading dielectric waveguide from the rear end of the electron gun to the beam-wave interaction front end, the design is simple, the cost is low, and the problems that the overall efficiency of the gyrotron is reduced and the working stability of the gyrotron is damaged due to interaction of the front cavity of the non-interaction section in the existing gyrotron are solved.

This inspection system 100 comprises: an electron source 102 which irradiates a sample 200 with an inspection beam; a detector 105 which detects secondary electrons obtained by irradiating the sample 200 with the inspection beam and outputs a detection signal; a laser device 107 which emits an action laser that changes the amount of secondary electrons; an electron gun 106 which emits an action electron beam that changes the amount of secondary electrons; and a computer system 140 which generates an image of the sample 200 on the basis of the detection signal. The computer system 140 generates an inspection image I1 related to the emission of the inspection beam, acquires the dimensions and the like related to a pattern on the sample 200 on the basis of the inspection image I1, generates an inspection image I2 related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern on the basis of the inspection image I2, generates an inspection image I3 related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern on the basis of the inspection image I3.

The invention provides a planar distribution multi-beam electron gun, and relates to the technical field of microwave electric vacuum, and the planar distribution multi-beam electron gun comprises a housing; the cathode assembly is arranged in the shell, the cathode assembly comprises a cathode head, the surface of the cathode head is provided with a plurality of emitting surfaces which are arranged in a common plane in parallel at intervals, and the emitting surfaces are configured to escape electrons after being heated; the anode is arranged in the shell, and an electric field is formed between the anode and the emitting surfaces so as to accelerate escaped electrons, so that a plurality of electron beams are formed; the focusing electrode is arranged between the cathode head and the anode, an opening is formed in the focusing electrode, a plurality of grid wires are arranged on the opening, a grid gap between every two adjacent grid wires is aligned with the multiple emission surfaces in the emission direction of the electron beams, and the multiple grid wires are constructed to control beam diameters and divergence angles of the multiple electron beams; each electron beam passes through the gate slot aligned with the emission surface on which the electron beam is formed and enters the anode.

The invention relates to an electron source, a preparation method of the electron source, an electron gun and application of the electron source. The electron source comprises an optical fiber and an electron emission layer, the optical fiber comprises a fiber core used for transmitting laser and a wrapping layer wrapping the fiber core, and the end face of the light outlet end of the optical fiber and the extending direction of the fiber core are arranged at an angle. The electron emission layer is arranged on the end face of the light emitting end of the optical fiber, and the electron emission layer at least comprises an electron excitation layer covering the fiber core. The electron excitation layer comprises at least one of a zero-dimensional material, a one-dimensional material and a two-dimensional material. Low-dimensional materials such as zero-dimensional materials, one-dimensional materials or two-dimensional materials are adopted as materials of the electron excitation layer, the low-dimensional materials have the atomic-scale thickness, back-incident electrons can be emitted without in-vivo transmission, and the electron emission efficiency is high; and the low-dimensional material has the characteristics of no dangling bond, stable property, high melting point, difficulty in damage, good stability, long service life and the like.

An object is to provide an electron beam applicator suitable for an electron gun having a photocathode and an electron beam emission method in the electron beam applicator. The object can be achieved by an electron beam applicator including: an electron gun section; a main body section; and a control unit. The electron gun section includes a light source, a photocathode that emits an electron beam in response to receiving excitation light emitted from the light source, and an anode. The main body section includes an objective lens that converges an electron beam emitted from the electron gun section. The control unit controls at least convergence power of the objective lens in accordance with a size of an electron beam emitted from the photocathode.

The invention discloses a novel electronic gun for a cyclotron wave protector, and relates to the technical field of vacuum electronic devices. The electron gun comprises a cathode assembly, an anode assembly, a supporting assembly and a permanent magnet system. Wherein the cathode assembly adopts a planar cold cathode structure; the anode assembly comprises an anode main body and an electron beam channel in the anode main body; the cathode and the anode are fixedly connected through a supporting assembly; the permanent magnet system provides a uniform magnetic field. The cold cathode is adopted to replace a traditional hot cathode to generate high-quality strip-shaped electron beams, and the device has the advantages of being simple in structure, easy to integrate, rapid to start, long-acting, reliable, low in consumption and energy-saving.

The utility model relates to an electron accelerator, two ends of a cylindrical body are respectively connected with a top cover and a base assembly, an accelerating tube is connected with the base assembly in the cylindrical body, electrons injected by a laser electron gun assembly form a high-energy electron beam in the accelerating tube, and the accelerating tube is fixed in a closed space formed by the cylindrical body. The insulating structural member comprises an insulating cover and an insulating cylinder, the insulating cover is in close fit with the top cover in the top cover, the insulating cylinder and the insulating cover are also fixed in the closed space, the insulating cover and the insulating cylinder form an insulating cavity, the accelerating tube is arranged in the insulating cavity, and the remaining space between the accelerating tube and the cylinder body is filled with the insulating glue layer. According to the electron accelerator provided by the utility model, solid insulation is provided through the combination of the insulating structural member and the insulating adhesive layer, compared with a high-pressure gas insulated accelerator in the prior art, the volume is greatly reduced, the breakdown voltage of the accelerator can be greatly improved, the operation is more stable, and the service life is greatly prolonged; and the manufacturing cost is also greatly reduced.

The invention relates to the technical field of in-situ electrics, and provides an in-situ electrical property real-time analysis system based on an environmental scanning electron microscope, comprising: an environmental atmosphere simulation module; an electron gun pole shoe is arranged on the top side of the electron microscope chamber, a low-temperature sample table is arranged in the electron microscope chamber, and the electron microscope chamber is communicated with the environment atmosphere simulation module; the low-temperature Dewar is connected with the low-temperature sample table; the electrical probe is arranged on the inner wall of the electron microscope chamber, and the source meter is used for monitoring electrical signals. An environment atmosphere is simulated through an environment atmosphere simulation module, an electron gun pole shoe is arranged on the top side of an electron microscope chamber and used for imaging, a low-temperature sample table is arranged in the electron microscope chamber and used for bearing a to-be-tested sample, a low-temperature Dewar provides a low-temperature environment for the low-temperature sample table, and an electrical probe in a resistance analysis module conducts electrical monitoring on the sample. And electrical signals are monitored through a source meter, so that in-situ real-time online analysis of electrical properties of a scanning electron microscope observation machine on the surface of the material under different environment atmospheres is realized.

The application discloses a 200kV direct-current type high-voltage photoelectron gun, wherein a cathode electrode and an anode electrode adopt a multi-section curved surface structure design, and the front surface structures are symmetrically distributed, so that the risk of vacuum breakdown caused by local field enhancement of the direct-current high-voltage electron gun is reduced; a displacement adjusting structure is installed on the anode electrode, so that the distance between the anode electrode and the cathode electrode can be adjusted, and then the working voltage of the electron gun can be adjusted within 50-200kV; a photocathode transfer device is installed in the cathode electrode, and is used for replacing different types of photocathodes or damaged photocathodes; meanwhile, transmission and reflection type two photocathode working modes are arranged, and in the reflection type working mode, a detection laser can realize 15° and 45° two angle incidences, so that the direct-current type high-voltage electron gun has higher expansibility, and can be expanded to more application fields.

The invention provides a simple measurement device for electron beam trajectory parameters of a traveling wave tube, belongs to the technical field of electron beam measurement, and solves the problems that an electron beam analyzer is used for measurement in the prior art, the use is relatively complex, the price is high, and the traveling wave tube is inconvenient to develop. The device comprises a base, a mounting cylinder is arranged on the base, a traveling wave tube is mounted on the mounting cylinder, corrugated pipes sleeve the outer side of the mounting cylinder at intervals, one end of each corrugated pipe is connected with the base, the other end of each corrugated pipe is connected with a sealing cover, a collector is arranged on the sealing cover, and the sealing cover is connected with an adjusting mechanism. The position of the collector is adjusted by the adjusting mechanism, so that the radial distance and the axial distance between the collector and the traveling wave tube are changed, the current density of different points in an electron beam is measured, and other track parameters are obtained; the measuring device is simple and convenient in structure and easy to operate, is an effective tool for developing a new traveling wave tube, and is also suitable for characteristic testing of various electron guns of other vacuum devices.

The invention relates to a method for preparing an Hf-Mo-xNb-Ta-Ti-Zr series refractory high-entropy alloy through electron beam refining. The method comprises the steps that S1, raw materials of the Hf-Mo-xNb-Ta-Ti-Zr series refractory high-entropy alloy are pretreated; s2, the Hf-Mo-xNb-Ta-Ti-Zr series refractory high-entropy alloy is refined through electron beams; S21, pollutants in a smelting furnace are pretreated; s22, after charging is completed, vacuum and preheating treatment is carried out; s23, high-entropy mother alloy smelting is conducted through electron gun beam current and high-voltage control; s24, carrying out electron beam annular scanning to carry out alloy refining; s25, the electron beam is increased, the high voltage is closed, and the cast ingot is cooled and solidified; and S26, after cooling is finished, a final solidification zone with inclusions enriched on the surface of the cast ingot is removed, and the high-purity alloy cast ingot is obtained. According to the discharging mode, precise control over alloy components is achieved by calculating the volatilization loss rate of all the metal raw materials in the electron beam melting process.

The utility model discloses an electronic gun shell assembly tool which comprises a positioning column, limiting fences and a lower pressing block, an electronic gun shell is arranged on the positioning column in a sleeved mode, the lower pressing block is installed at the upper end of the positioning column for pressing and positioning, and the limiting fences are oppositely arranged on the periphery of the gun shell. A groove is formed in the limiting fence and used for positioning a ceramic ring and a lead-out ring of the gun shell, the inner side of the limiting fence is arranged to be in an arc shape corresponding to the outer circle of the ceramic ring, and the gun shell is sequentially provided with a first ceramic lining ring, a first lead-out ring, a first ceramic ring, a second lead-out ring, a second ceramic ring, a third lead-out ring and a second ceramic lining ring from bottom to top. By using the tool, all parts of the gun shell can be quickly assembled and positioned, and fixation is formed for subsequent welding to prevent welding deformation.

The invention provides a separated crucible slewing mechanism which comprises an electronic gun device, a crucible body and a slewing mechanism, a connecting plate is arranged on the slewing mechanism, the connecting plate is arranged at the bottom of a bottom plate, a kidney-shaped groove is formed in the bottom plate, the slewing mechanism comprises a rotating shaft and a first motor device, and the rotating shaft penetrates through the kidney-shaped groove and is meshed with the first motor device. The rotating shaft is driven by the first motor device, the position of the rotating shaft in the kidney-shaped groove is adjusted according to an evaporation point when crucibles with different outer diameters are replaced, the crucible body is arranged on the top of the rotating mechanism, the electronic gun device is arranged on one side of the crucible body, and the crucible body is driven to rotate through the rotating mechanism. The top of the electron gun device extends towards the crucible body to be provided with a pair of magnetic pole pieces, the parts, located above the crucible body, of the two magnetic pole pieces are bent towards the center, the magnetic pole pieces restrain and guide the electron beam, the bending angle is adjusted according to the center of the crucible acupoint, the guided electron beam bombards the center of the acupoint, and the bombardment position is accurate.

The present invention provides a multi-directional connection hub including a plurality of openings to which an anode adapter made of a metal material is connected through an insulation tube and an electron gun which emits electrons to the anode adapter to generate X-rays is connected, wherein the openings include a plurality of side openings to which the electron gun is connected and an upper opening through which the X-rays generated by the electrons, which are provided from the electron gun through the side opening and collide with the anode adapter, are emitted, and an emission direction of the X-rays is changed toward another side opening of the plurality of side openings or the upper opening according to a type of the anode adapter and a type or installation location of the electron gun.

A radiation dose rate control method, which relates to the technology of radiation, and an accelerator (100). The control method is used for an electron linear accelerator (100) comprising a microwave source, an electron gun (102) and an accelerating tube (104). The control method comprises: when an electron linear accelerator (100) outputs a beam, monitoring a first event used for indicating a change of a beam output parameter (S610), wherein the beam output parameter comprises a pulse of an electron gun (102) and a microwave power of a microwave source, and the first event is determined by means of radiation protection requirements; and in response to monitoring the first event, cutting off the pulse of the electron gun (102), and switching a first microwave power of the microwave source to a second microwave power, so that the leakage dose rate of a radiation safety boundary is less than or equal to a first preset threshold (S620), wherein the level of dark current in an accelerating tube (104) under the second microwave power is less than or equal to a second preset threshold. Further provided are a radiation dose rate control apparatus, an accelerator (100), and a radiation apparatus.

The invention relates to the field of high-frequency electronics, and discloses an ultra-wideband traveling wave tube which comprises a focusing control electron gun, a slow wave system and a three-stage depressed collector. The focusing control electron gun is used for providing stable electron beams and realizing effective focusing and acceleration of the electron beams through a cathode assembly, a heating wire, a bunching electrode and an anode assembly which are accurately designed; the slow wave system is composed of an input high frequency and an output high frequency, high-efficiency energy exchange between an input signal and an electron beam is ensured through a conical spiral line and a composite tube shell structure, and therefore signal amplification is achieved. The three-stage depressurization collector effectively recovers residual electron beams through a step-by-step depressurization design, energy loss is reduced, and the total efficiency of the traveling wave tube is improved. The traveling wave tube can provide output power exceeding 100 W in the frequency band of 2-18 GHz, the gain is larger than 25 dB, and the total efficiency is larger than 30%. Due to the excellent performance, the method can be widely applied to the fields of communication, radar, electronic countermeasures and the like.

The invention discloses an electron beam accelerating tube and an electron beam accelerator, and relates to the technical field of electron beam accelerators. The electron beam accelerating tube comprises a first cavity and a suppression cavity, a first electromagnetic field can be generated in the first cavity, the first cavity is used for accelerating an electron beam emitted by an electron gun through the first electromagnetic field, and a leakage field is formed in the first electromagnetic field; the suppression cavity is arranged between the first cavity and the electron gun, a second electromagnetic field is built in the suppression cavity through the leakage field, the intensity of the second electromagnetic field is higher than that of the leakage field, and the second electromagnetic field is used for suppressing electrons in the electron beam from moving towards the electron gun. By applying the electron beam accelerating tube disclosed by the invention, the back bombardment phenomenon of electrons to the electron gun can be reduced, and the use performance and the service life of the electron gun are improved.

The invention discloses a vacuum coating system and a coating method thereof.The coating method comprises the following steps that S1, a target material is dried, naturally cooled and then placed in a crucible, and then a lower shell is sealed; s2, a single crystal germanium sheet and an optical glass sheet are used as substrates to be placed on the flange at the bottom end of the placing cylinder, and the upper shell is sealed; s3, the lower shell and the upper shell are vacuumized; and S4, an electron gun corresponding to the crucible is started, the electron gun generates a high-energy electron beam to heat the target material to the evaporation temperature, and the target material moves upwards in the form of particles after being evaporated and is deposited on the surface of the substrate. According to the invention, the plurality of crucibles are distributed along the vertical direction and share the same axis, so that the evaporation direction of the target material in each crucible is ensured to be consistent. The target material in the crucible moves upwards in the vertical direction of the substrate after being heated to the evaporation temperature, so that frequent adjustment of the position of the substrate is avoided, the operation of the coating process is simplified, the uniformity and efficiency of coating are improved, and the requirements of multi-layer and complex coating are met.