752 results about "Electron gun" patented technology

The invention discloses an anode potential adjusting device and an electron accelerator, the electron accelerator comprises a first electrode plate, a second electrode plate and a high-voltage end, the high-voltage end is connected with the first electrode plate, the anode potential adjusting device comprises a rheostat and an oil cylinder, and the rheostat is connected with the oil cylinder. The rheostat is connected between the first electrode plate and the second electrode plate; the oil cylinder is connected with a hydraulic pump through a hydraulic oil pipeline, a piston of the oil cylinder is connected with the rheostat, and the piston is used for driving the rheostat to adjust the resistance value. According to the invention, the change condition of the beam current can be observed in real time under the condition that the high voltage and the beam current exist simultaneously, so that the optimal anode resistor can be optimized more easily, and the electron gun can be in the optimal working state.

The invention provides a double-injection-plane magnetic control injection electron gun. The double-injection-plane magnetic control injection electron gun comprises a focusing electrode, two strip-shaped cathodes, an anode and a magnetic field generation assembly. The focusing electrode comprises two inclined surfaces which extend in the Z-axis direction and are oppositely and obliquely arranged, the two strip-shaped cathodes are respectively arranged on the inclined surfaces of the focusing electrode in parallel, clockwise or anticlockwise rotating inclination is introduced on the inclined surfaces, and the cathodes are configured to respectively escape electrons after being heated; an electric field is formed between the anode and the two strip-shaped cathodes, so that escaped electrons are accelerated to form electron beams; the electron beam rotates under the action of the magnetic field generated by the magnetic field generation assembly so as to form two strip-shaped electron beams, and the included angle between the section, on the XY plane, of the motion trail of the two strip-shaped electron beams and the ZX plane is reduced.

The invention relates to electron beam evaporation coating equipment and an application method thereof. The electron beam evaporation coating equipment comprises an evaporation chamber, an electron gun system, a first vacuumizing system, a heating table mechanism, a sample table mechanism and an ion source system, the sample table mechanism is rotationally connected with the heating table mechanism, and the sample table mechanism comprises a substrate clamping part for clamping a substrate; the ion source system is connected with the top of the evaporation chamber and is used for cleaning the substrate; the first driving system is used for driving the first rotating shaft to rotate; the second driving system is used for driving the second rotating shaft to rotate; the second rotating shaft drives the heating table mechanism and the sample table mechanism to synchronously and integrally overturn; and when the sample table mechanism turns over to enable the substrate clamping part to be opposite to the ion source system, the substrate can be placed, cleaned and turned over. The device can be turned over to a specific angle, the interaction between film bases can be improved through special dip angle film coating, and the binding force is improved. The sample table mechanism can turn over to enable the substrate to directly face the ion source system.

The invention belongs to the technical field of vacuum coating, and particularly relates to a vacuum coating machine electron gun control method and system.The control method comprises the steps that in the coating process, key real-time parameters reflecting the working state of an electron gun and the evaporation process are continuously collected and fused, and the current coating state is evaluated in real time based on the key real-time parameters; and in combination with preset coating process requirements, an electron beam control target instruction set of a next control period is dynamically generated through a built-in decision mechanism and is sent to a power controller, a focusing coil controller and a scanning coil controller of the electron gun, and the electron gun is driven to adjust the power output, the focusing state and the scanning motion of the electron gun in real time. Through accurate and stable control of the evaporation rate, material characteristic changes are effectively coped with through a strong closed loop of power and the evaporation rate; the dynamically planned scanning path can actively compensate the non-uniformity of the thermal field of the crucible, and beam spot energy distribution is optimized in combination with focusing adjustment, so that the uniformity of the thermal field is remarkably improved.

The invention discloses a pre-detection system and a pre-detection method for an electronic gun. The pre-detection system comprises a deflection lens cone, a measurement lens cone and a control module, the measuring lens cone and the deflection lens cone are respectively and electrically connected with the control module; during pre-detection, the to-be-detected electron gun lens cone is installed right above the deflection lens cone, and the control module is electrically connected with the electron gun lens cone. The control module is used for controlling the electron gun to emit an electron beam and controlling the electron beam to deflect in a first direction and a second direction through the deflection lens cone, so that the electron beam performs point-by-point scanning on a first scanning range; an electron beam collecting device in the measuring barrel lens is used for collecting a current value corresponding to each scanning point, and the control module is further used for generating a grayscale image based on the current values and adjusting the position of the electron gun according to the position of a hot spot in the grayscale image until the center of the hot spot coincides with the center of the image. The maintenance efficiency of the electron microscope equipment can be improved, the maintenance difficulty is reduced, and the downtime is shortened.

The invention discloses a gyrotron traveling wave tube low-speed scattered magnetic control injection electron gun and a design method, and belongs to the field of vacuum electronic devices. The electron gun comprises a cathode and an anode. The cathode comprises a cathode bottom table, a rear forming pole, an emission band and a front forming pole, the radius of the cathode bottom table is larger than that of the rear forming pole, the generatrix of the emission band is an arc curve, and the overall surface of the front forming pole is an arc surface; besides, in the design of the cathode, through two times of modeling and respective simulation optimization of partial parameters, the parameters in the one-time simulation optimization process are reduced, the optimization target is clearer, the design difficulty is effectively reduced, and the design time is shortened. The problem that the electric field of the gun area of the electron gun is too high due to the fact that the size of the cathode is too small is effectively solved, meanwhile, the adverse effect of the abrupt change structure of the cathode on the surface electric field of an emission band is avoided, and speed scattering of the electron gun is effectively reduced.

The invention discloses a method for detecting trace elements in a GH4169 high-temperature alloy by using secondary ion mass spectrometry, which specifically comprises the following steps: A1, firstly, carrying out necessary pretreatment on a GH4169 high-temperature alloy sample to remove surface pollution and an oxide layer; a2, selecting a time-of-flight secondary ion mass spectrometer, setting proper analysis parameters, and selecting a double-plasma O2 + ion source. The invention relates to the technical field of metal material trace chemical component analysis. According to the method for detecting the trace elements in the GH4169 high-temperature alloy by using the secondary ion mass spectrometry, a sample pretreatment process of the GH4169 high-temperature alloy is optimized, a double-plasma O2 + ion source and a low-energy electron gun charge compensation system of a time-of-flight secondary ion mass spectrometer are innovatively configured, deep analysis and a three-dimensional reconstruction algorithm are combined, and the trace elements in the GH4169 high-temperature alloy are detected. The sensitivity, the spatial resolution and the data reliability of trace element detection are obviously improved.

The invention discloses an electron linear accelerator for radiotherapy equipment in an X-ray operation. The microwave power source sequentially passes through the circulator and the power divider and then is connected with the first coupler and the second coupler, the first coupler is connected with the first acceleration cavity to provide an independent microwave magnetic field, and the second coupler is connected with the second acceleration cavity to provide an independent microwave magnetic field. An electron gun of the electron linear accelerator is sequentially connected with the first acceleration cavity and the second acceleration cavity and then outputs electron beams; the first coupler inputs the microwave power to the first acceleration cavity, so that the first acceleration cavity optimizes the electron beam energy spectrum monochromaticity; and the second coupler inputs the microwave power into the second acceleration cavity, so that the second acceleration cavity accelerates the electron beam to required energy. According to the electron linear accelerator, the needed electron beam energy can be achieved only through the two cavities, a large amount of energy of the finally obtained electron beam is concentrated on the needed energy through the acceleration mode, and in other words, the energy spectrum monochromaticity is better.

The invention relates to the field of sterilization and sterilization technologies, in particular to an electron accelerator real-time monitoring system which comprises an edge calculation module, a monitoring and metering module, an instruction generation module and an instruction execution module. The monitoring and metering module comprises multiple types of sensors and is used for acquiring the operating environment temperature, the radiation intensity and the vacuum degree of an internal related system in real time; a chip and a communication module are integrated in the edge computing module, the edge computing module is connected with the monitoring and metering module, an edge algorithm framework is arranged in the edge computing module, a cloud computing platform is built, data of the monitoring and metering module are received in real time, calculation, analysis and processing are carried out, and a result is sent to the instruction generation module; the instruction generation module operates a related instruction file according to a calculation result of the edge calculation module, generates a control instruction and sends the control instruction to the instruction execution module; and the instruction execution module changes the operation states of an electron gun and an accelerating tube of the electron accelerator. The method has the effect of improving the accuracy and reliability of the electron accelerator monitoring system.

Provided is a pattern inspection system, including a scanning electron microscope (SEM) including an electron gun configured to generate a first electron beam and emit the generated first electron beam toward a first wafer, a detector configured to detect electrons emitted from the first wafer based on the first electron beam emitted toward the first wafer, and at least one processor configured to generate a first SEM image including a plurality of pixels based on the detected electrons, and determine, based on a period of a pattern extracted from the first SEM image, a pixel size of a second SEM image to be generated by the SEM with respect to a second wafer.

The invention provides a pulse power supply method for an electron gun, and the method comprises the steps: collecting at least one working parameter of a target electron gun in real time, and enabling the at least one working parameter to comprise the gun voltage and the gun current of the target electron gun; n pulse signals are transmitted to the target electron gun at intervals to supply power, any two adjacent pulse signals are transmitted at intervals, and N is an integer larger than or equal to 2; wherein at least one of the N pulse signals is obtained by modulation according to the at least one working parameter. The invention further provides a pulse power supply method for the multiple electron guns.

A cathode-ray tube ultraviolet light source includes a metal housing provided with a light-transmissive window, a heatsink disposed within the metal housing, a phosphor having a first surface and an opposing second surface, wherein the second surface of the phosphor is in thermal contact with the heatsink, and an electron gun capable of developing an electron beam to impinge upon the first surface of the phosphor, whereby light emitted from the second surface of the phosphor is directed through the light-transmissive window.

The invention discloses an ion pump power supply circuit. The circuit comprises a voltage regulation output module, a control module and a current-voltage conversion module, the input end of the voltage regulation output module receives low-voltage direct-current input voltage; the high-voltage output end of the voltage regulation output module is connected with the anode of the ion pump; the ion pump shell is electrically connected with the input end of the current and voltage conversion module through the electron gun shell; the output end of the current-voltage conversion module is electrically connected with the control module; the grounding end of the current-voltage conversion module is connected with the signal ground; the voltage regulation output module converts the low-voltage direct-current input voltage and outputs high-voltage direct-current voltage to the anode of the ion pump, so that working current is generated in the cavity of the ion pump and returns to the current-voltage conversion module through the shell of the ion pump and the shell of the electron gun; the current and voltage conversion module detects working current in the ion pump cavity and converts the working current into a voltage signal; and the control module determines the vacuum degree in the ion pump cavity according to the voltage signal.

The invention discloses electronic gun assembling and welding automatic production equipment. The electronic gun assembling and welding automatic production equipment comprises a marble platform rack, a feeding and discharging robot assembly, a feeding and discharging tray assembly, an assembling table assembly, a press pressing assembly and a welding robot assembly. The feeding and discharging robot assembly is matched with the multiple feeding and discharging clamping jaw assemblies to place the part positioning mold and the electronic gun parts on the assembling platform according to the assembling sequence. The press pressing assembly is used for applying preset pressure to the electronic gun part in the assembling process; the welding robot assembly is matched with the assembling platform to weld electronic gun parts to form an electronic gun assembly, the feeding robot places the welded electronic gun assembly into a circular groove in the feeding and discharging tray assembly, the electronic gun parts can be automatically assembled and welded, the requirement of automatic production can be met, and the production efficiency is improved. Efficient and automatic assembly of the electronic gun assembly is achieved, and the problems that when the electronic gun assembly is manually assembled in a traditional mode, operation is tedious, efficiency is low and cost is high are solved.

The invention discloses a method for solving powder collapse in the electron beam printing process, and relates to the technical field of additive manufacturing. Comprising the following steps that firstly, a vacuum bin is vacuumized; step 2, repeatedly preheating the substrate in the forming area by using an electronic gun; step 3, spreading the powder on the heated substrate; 4, continuously heating the graphite plate; fifthly, the powder layer is subjected to secondary preheating through the electron gun; and sixthly, selective forming is conducted on the powder layer in the false sintering state through the focused beam till printing of the current layer is finished, and then the actions of powder laying, graphite plate heating, preheating and selective forming are conducted after one layer descends. According to the method for solving powder collapse in the electron beam printing process, the vacuum heat radiation principle is used for indirectly heating the powder layer, the risk that cold powder particles make direct contact with electron beams in the printing process is completely avoided, and the powder blowing defect is completely eradicated.

The invention discloses an evaporation process multi-parameter trend analysis and anomaly recognition method and system, and the system comprises a process data collection and preprocessing module, a process modeling and mode recognition module, and a closed-loop anomaly detection and response module. According to the system, a plurality of key parameters such as coating rate, heating power, film thickness, vacuum degree, electron gun current and temperature are collected in real time through a sensor array, data alignment and multi-dimensional feature vector construction are carried out based on a unified time reference, and a normal working condition parameter distribution model is established by adopting a clustering modeling method; multi-parameter coupling type anomaly detection and grading early warning and real-time recording of abnormal events and parameter states are achieved through a mahalanobis distance mode and the like, a historical report is generated for tracing and analysis, the anomaly recognition accuracy and response speed of the technological process are improved, and the system is suitable for evaporation equipment quality monitoring in the fields of semiconductors, optics, photovoltaics and the like.

The invention relates to an ultrafast electron microscopic imaging device and an imaging method thereof, in particular to a multi-mode multi-dimensional ultrafast electron microscopic imaging device and an imaging method thereof, and solves the problem that the existing electron microscopic imaging technical scheme is difficult to simultaneously meet the measurement requirements of high time-space-energy-momentum resolution and material diversification. The device comprises a sample cabin, an electron gun, a laser generation module, a secondary electron detector, an STEM detector, an in-cabin plug-in detection assembly, a plug-in camera and an energy filtering electron microscope assembly which are arranged below the sample cabin, and a vacuum system, a hollow sample table is arranged in the sample cabin, and at least two ultrafast pumping laser introduction windows are arranged on the cabin wall of the sample cabin; an ultrafast detection laser introduction window is arranged on the electronic gun shell; the secondary electron detector is arranged obliquely above the sample table; the STEM detector is arranged on the side cabin wall of the sample cabin and is positioned below the sample table; and the in-cabin plug-in detection assembly is arranged below the STEM detector.

The invention discloses a wafer workpiece table and electron beam detection equipment. The wafer workpiece table comprises a base, a driving assembly and a bearing part, the base is provided with a plurality of bearing columns, and the bearing columns are used for transferring wafers; the driving assembly is installed on the base and used for providing driving force. The bearing part is installed on the driving assembly, the bearing part comprises an installation plate and a suction cup, the first side of the installation plate is installed on the driving assembly, an isolation layer is arranged on the second side of the installation plate and used for isolating a high-voltage electric field, and the suction cup is installed on the installation plate. And the sliding assembly is used for sliding along the bearing column under the driving of the driving assembly so as to pick and place the wafer. The bearing column of the wafer workpiece table is fixed, the suction cup is driven by the driving assembly to slide along the bearing column, and the electronic gun does not need to be adjusted; the isolating layer of the mounting plate can enable the wafer workpiece table to be suitable for high-energy electron beam equipment, and the wafer workpiece table has the characteristics of low failure rate, high efficiency and strong universality.

The invention belongs to the technical field of vacuum coating, and relates to an electron gun and ion source collaborative evaporation coating method, a control method and a control system. The electronic gun and ion source collaborative evaporation coating control method comprises the steps that key parameters in the coating process are continuously collected, and an electronic gun beam initial value and an ion source gas flow initial value are dynamically generated according to state diagnosis results of all the parameters; the beam current value of the electron gun and the gas flow value of the ion source are corrected in real time to inhibit the disturbance of the ion source to the beam current of the electron gun, and the electron gun and the ion source are cooperatively regulated and controlled to ensure the precise control of the coating uniformity; the invention further discloses an electron gun and ion source collaborative evaporation coating method, local hot spot compensation and global uniformity compensation are carried out by adopting a film thickness compensation mechanism so as to accurately control the film thickness. According to the invention, the cooperative control of the electron gun evaporation and ion bombardment process is realized, the film adhesion is enhanced, the evaporation coating rate is improved, and the film thickness uniformity is improved.

Provided is a superconducting cryo module that can be made more compact. A superconducting cryo module according to the present disclosure comprises: a superconducting accelerating cavity that has a cell part accelerating electrons, a beam pipe part extending from the cell part to an electron incidence side, and an extraction part of the electrons which were accelerated by the cell part; and an electron gun that is located in the interior of the beam pipe part of the superconducting accelerating cavity, is located on the same axis as a beam axis BA of the superconducting accelerating cavity, and emits electrons into the cell part.

The invention provides a double-pulse free electron laser generating device based on a normal-temperature accelerator. Comprising a driving laser system used for generating double-pulse driving laser, a photocathode electron gun system used for generating a double-pulse electron beam bunch, a normal-temperature linear accelerator system used for accelerating the double-pulse electron beam bunch, and an undulator system used for radiating double-pulse free electron laser, which are arranged in sequence. The invention further provides a corresponding double-pulse free electron laser generation method based on the normal-temperature accelerator. According to the double-pulse free electron laser generating device based on the normal-temperature accelerator, double-pulse driving laser is generated, a double-pulse electron beam bunch is generated in the photocathode electron gun, energy acceleration of the double-pulse electron beam bunch is achieved in flat-topped pulse microwaves, and finally generation of double-pulse free electron laser is achieved in the undulator. And the repetition frequency of device operation is improved.

The invention discloses a structure for inhibiting front cavity interaction in a frequency-adjustable high-power gyrotron, which is used for carrying out PIC analogue simulation on the basis of a frequency-adjustable gyrotron developed in a laboratory, and verifying the front cavity interaction by utilizing a gyrotron linear theory and a generalized scattering matrix theory according to a generation principle of the front cavity interaction. And on the basis, adjustment and simulation analysis are carried out on the cavity structure of the gyrotron, a feasible way for inhibiting the interaction of the front cavity is found out, and stable work of the gyrotron during frequency tuning is ensured. The structure is composed of the periodic loading dielectric waveguide from the rear end of the electron gun to the beam-wave interaction front end, the design is simple, the cost is low, and the problems that the overall efficiency of the gyrotron is reduced and the working stability of the gyrotron is damaged due to interaction of the front cavity of the non-interaction section in the existing gyrotron are solved.

This inspection system 100 comprises: an electron source 102 which irradiates a sample 200 with an inspection beam; a detector 105 which detects secondary electrons obtained by irradiating the sample 200 with the inspection beam and outputs a detection signal; a laser device 107 which emits an action laser that changes the amount of secondary electrons; an electron gun 106 which emits an action electron beam that changes the amount of secondary electrons; and a computer system 140 which generates an image of the sample 200 on the basis of the detection signal. The computer system 140 generates an inspection image I1 related to the emission of the inspection beam, acquires the dimensions and the like related to a pattern on the sample 200 on the basis of the inspection image I1, generates an inspection image I2 related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern on the basis of the inspection image I2, generates an inspection image I3 related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern on the basis of the inspection image I3.

The utility model discloses a feeding position adjusting device of a coating machine, which comprises a vacuum coating machine shell, the inner wall of the top of the vacuum coating machine shell is rotatably connected with a placing bracket, the inner wall of the bottom of the vacuum coating machine shell is rotatably connected with a cold copper disc, the top of the cold copper disc is slotted for placing a crucible, and the top of the cold copper disc is provided with a feeding hole. A crucible is arranged in the vacuum coating machine shell, one side of the vacuum coating machine shell is fixedly connected with an electronic gun, the electronic gun is located on the side of the crucible, a material storage cavity is formed in the inner wall of one side of the vacuum coating machine shell, a raw material barrel is fixedly connected in the material storage cavity, one side of the raw material barrel is connected with a discharging pipe in an inserted mode, and a proportional valve is arranged on the discharging pipe. The placing support is driven by the first driving motor to rotate, so that the substrate is driven to rotate, raw materials are evenly settled on the surface of the substrate, meanwhile, the crucible is driven by the second driving motor to rotate, and various different film materials can be switched.

The invention provides a planar distribution multi-beam electron gun, and relates to the technical field of microwave electric vacuum, and the planar distribution multi-beam electron gun comprises a housing; the cathode assembly is arranged in the shell, the cathode assembly comprises a cathode head, the surface of the cathode head is provided with a plurality of emitting surfaces which are arranged in a common plane in parallel at intervals, and the emitting surfaces are configured to escape electrons after being heated; the anode is arranged in the shell, and an electric field is formed between the anode and the emitting surfaces so as to accelerate escaped electrons, so that a plurality of electron beams are formed; the focusing electrode is arranged between the cathode head and the anode, an opening is formed in the focusing electrode, a plurality of grid wires are arranged on the opening, a grid gap between every two adjacent grid wires is aligned with the multiple emission surfaces in the emission direction of the electron beams, and the multiple grid wires are constructed to control beam diameters and divergence angles of the multiple electron beams; each electron beam passes through the gate slot aligned with the emission surface on which the electron beam is formed and enters the anode.

The invention relates to an electron source, a preparation method of the electron source, an electron gun and application of the electron source. The electron source comprises an optical fiber and an electron emission layer, the optical fiber comprises a fiber core used for transmitting laser and a wrapping layer wrapping the fiber core, and the end face of the light outlet end of the optical fiber and the extending direction of the fiber core are arranged at an angle. The electron emission layer is arranged on the end face of the light emitting end of the optical fiber, and the electron emission layer at least comprises an electron excitation layer covering the fiber core. The electron excitation layer comprises at least one of a zero-dimensional material, a one-dimensional material and a two-dimensional material. Low-dimensional materials such as zero-dimensional materials, one-dimensional materials or two-dimensional materials are adopted as materials of the electron excitation layer, the low-dimensional materials have the atomic-scale thickness, back-incident electrons can be emitted without in-vivo transmission, and the electron emission efficiency is high; and the low-dimensional material has the characteristics of no dangling bond, stable property, high melting point, difficulty in damage, good stability, long service life and the like.

An object is to provide an electron beam applicator suitable for an electron gun having a photocathode and an electron beam emission method in the electron beam applicator. The object can be achieved by an electron beam applicator including: an electron gun section; a main body section; and a control unit. The electron gun section includes a light source, a photocathode that emits an electron beam in response to receiving excitation light emitted from the light source, and an anode. The main body section includes an objective lens that converges an electron beam emitted from the electron gun section. The control unit controls at least convergence power of the objective lens in accordance with a size of an electron beam emitted from the photocathode.

The invention discloses a novel electronic gun for a cyclotron wave protector, and relates to the technical field of vacuum electronic devices. The electron gun comprises a cathode assembly, an anode assembly, a supporting assembly and a permanent magnet system. Wherein the cathode assembly adopts a planar cold cathode structure; the anode assembly comprises an anode main body and an electron beam channel in the anode main body; the cathode and the anode are fixedly connected through a supporting assembly; the permanent magnet system provides a uniform magnetic field. The cold cathode is adopted to replace a traditional hot cathode to generate high-quality strip-shaped electron beams, and the device has the advantages of being simple in structure, easy to integrate, rapid to start, long-acting, reliable, low in consumption and energy-saving.

The invention belongs to the technical field of plate processing, and discloses a composite plate electronic gun coating color separation component which comprises a workbench, an electric sliding rail is fixedly connected to the outer wall of the top end of the workbench, a moving seat is slidably connected to the outer wall of the electric sliding rail, a medicament barrel is arranged on the outer wall of the top end of the moving seat, and a stirring mechanism is arranged on the inner wall of the medicament barrel. A discharging module is arranged on the outer wall of the bottom end of the medicament barrel, a feeding opening is fixedly connected to the outer wall of the medicament barrel, and a fixing mechanism is arranged on the inner wall of the workbench; through cooperation of structures such as clamping plates and rotating shafts, the positions of the four sets of clamping plates can be adjusted by rotating the rotating shafts on the two sides, the clamping plates are attached to the side wall of the composite board, and then the problems that in the operation process, due to the fact that the composite board cannot be well fixed, stability is poor, and the composite board may deviate due to the influence of external force are solved. And the color separation effect is influenced.

The utility model relates to an electron accelerator, two ends of a cylindrical body are respectively connected with a top cover and a base assembly, an accelerating tube is connected with the base assembly in the cylindrical body, electrons injected by a laser electron gun assembly form a high-energy electron beam in the accelerating tube, and the accelerating tube is fixed in a closed space formed by the cylindrical body. The insulating structural member comprises an insulating cover and an insulating cylinder, the insulating cover is in close fit with the top cover in the top cover, the insulating cylinder and the insulating cover are also fixed in the closed space, the insulating cover and the insulating cylinder form an insulating cavity, the accelerating tube is arranged in the insulating cavity, and the remaining space between the accelerating tube and the cylinder body is filled with the insulating glue layer. According to the electron accelerator provided by the utility model, solid insulation is provided through the combination of the insulating structural member and the insulating adhesive layer, compared with a high-pressure gas insulated accelerator in the prior art, the volume is greatly reduced, the breakdown voltage of the accelerator can be greatly improved, the operation is more stable, and the service life is greatly prolonged; and the manufacturing cost is also greatly reduced.