92 results about "Aperture array" patented technology

The invention relates to an optical fiber hydrogen sensor based on a silver film-nanowire hole array structure and a preparation method thereof in the field of photochemical sensors. The optical fiber hydrogen sensor comprises a multimode optical fiber, and a sensing area is formed on the multimode optical fiber; the sensing area is formed by stripping a coating layer with a preset length from the multimode optical fiber, thinning the optical fiber in the area, plating a silver film on the surface of the thinned optical fiber, and adsorbing a nanowire hole array structure which is sequentially and vertically arranged on the surface of the silver film in a liquid level self-assembly manner; the nanowire hole array is of a metal-medium-metal (MIM) structure, a gold-palladium nanowire array is arranged at the bottom, an intermediate medium layer is made of aluminum oxide, and a silver film with a hole array in any shape is arranged at the top. When light is transmitted to a sensing area from a fiber core of the multimode optical fiber, the light and a metal silver film can excite a surface plasmon resonance (SPR) effect, meanwhile, an MIM structure formed by a gold-palladium nanowire, an aluminum oxide dielectric layer and a porous silver film serves as an optical coupling antenna through a local surface plasmon resonance (LSPR) effect at the edge of a top hole, and the optical coupling antenna is used for transmitting the light to the sensing area. Light energy is efficiently converged and excited in an extremely bound gap plasmon (Gap Plasmon) in an aluminum oxide dielectric layer, so that far-unconventional electromagnetic field enhancement is generated in a sensing core area, and the sensitivity of the sensor is greatly improved.

The invention relates to a mobile dipole sound source positioning device and method of a minimum aperture array, the device comprises a vector sound transmission array and a processor, the vector sound transmission array comprises at least three array elements, the distance between the array elements is 1 / 6 lambda, lambda is the wavelength, the vector sound transmission array is used for measuring sound pressure signals, the processor is used for processing the sound pressure signals, and the processor is used for processing the sound pressure signals. And a positioning result of the dipole source is solved through a nonlinear optimization algorithm. The method comprises the following steps: measuring a sound pressure signal within a preset time by using a vector sound transmission array, and converting a measured time domain sound pressure signal into a frequency domain sound pressure signal; calculating a vibration velocity signal according to the frequency domain sound pressure signal, and establishing a dipole sound source propagation model; and performing nonlinear optimization solution on the dipole sound source propagation model to obtain a positioning result of the dipole source. Compared with the prior art, high-precision and real-time positioning of the moving dipole source can be realized.

A rapid-deployment satellite communications (satcom) terminal apparatus includes a base capable of rotation relative to a platform (e.g., a mobile platform or trailer to which the apparatus may be mounted or from which it may be detached), and a passive planar array panel comprising an array of antenna elements or apertures, the passive planar array panel pivotably and slidably attached to the base. The passive planar array panel includes a feed arm and feed antenna, the arm articulable relative to the panel and the antenna articulable relative to the arm. The feed antenna transmits and / or receives EM energy focused by the antenna elements in a beam direction adjustable by an array controller to a desired azimuth and elevation via electromechanical adjustment of, respectively, the rotational orientation of the base and the slant angle of the passive planar array panel relative to the platform.

A multi-aperture array for manipulating a plurality of charged first single-particle beams, comprising: a base body with a plurality of apertures, wherein, during operation of the multi-aperture array, one of the charged first single-particle beams passes through each aperture; at least a plurality of first electrodes, wherein one of the first electrodes is arranged at each of the apertures to individually influence the first single-particle beam passing through the aperture, and wherein each of the first electrodes is connected to a control unit; wherein the base body has a first depth TG in a z-direction along which the first apertures extend through the base body; wherein the first electrodes each have a depth TE in the z-direction that is less than the depth TG, i.e., TE < TG;wherein the first electrodes are each embedded in the base body such that they are exposed in an area adjacent to and forming the aperture, and are otherwise embedded directly in the base body and thus without an electrical insulating layer; and wherein the material of the base body is glass or consists of glass.

The present application relates to the image processing method of optical remote sensing imaging detection, specifically relates to a multi-modal image fusion method and imaging system, in order to solve the existing technical image capture of target scene depends on time-sharing type imaging system or multi-device acquisition, resulting in different modal image registration difficulty, low registration accuracy, image edge details are inconsistent, the deficiency of poor fusion effect, the multi-modal image fusion method of the present application includes the original image and characteristic spectrum of target scene, multi-modal image preprocessing and multi-modal image fusion steps, based on the spectral radiation curve of target scene, spectral image and polarization image realizes multi-modal image fusion.Simultaneously, provide a kind of multi-modal image imaging system, including sub-aperture array compound eye unit, for obtaining the original image of target scene, realize the spectral image and polarization image of target scene are acquired simultaneously.

Systems and methods are described, and one system includes a three-dimensional (3D) geometric tracker connected to a multiband (MB) inverse synthetic aperture array radar (ISAR), and a classification / alarm logic. The MB ISAR includes spatially distributed radar transmitters (TXs) and receivers (RXs), a TX / RX allocation logic, and a tomographic (TM) image logic. The TX / RX allocation logic is configured to receive 3D tracking data from the 3D geometric tracker, indicating subject 3D position and 3D orientation and, in response, dynamically allocate TXs and RXs to maintain MB illumination of and maintain MB reception of multiple scatter angles from subjects. The TM image processor is configured to construct TM images from the scatter angles, using 3D tracking data, for input to the classification and alarm logic. Optionally, the TX / RX resource allocation logic is configured to receive situation feedback data, for feedback adjusting of allocation of TXs and RXs.

The invention relates to the field of infrared thermal imaging, in particular to a miniaturized medium-wave infrared curved surface bionic compound eye optical system which comprises a curved surface multi-aperture array, an optical relay image rotation unit and an infrared detection unit. The curved surface multi-aperture array is of a compound eye structure formed by a plurality of sub-eyes with the same parameters. And the number of the lenses contained in each sub-eye is not more than 3. The optical relay image rotation unit converts a focal curved surface image of the curved surface multi-aperture array into a focal plane image, and the focal plane image is collected to the infrared detection unit. The number of lenses contained in the optical relay image rotation unit is not more than 6, and the optical relay image rotation unit has an object curved surface with the same curvature radius as the curved surface multi-aperture array and is matched with a diaphragm of the infrared detection unit. The system has the advantages of multiple compound eye apertures, light weight, miniaturization, large relative aperture, large target surface size, large field of view, high spatial resolution, cold diaphragm matching and the like, can perform operations such as quick capture, positioning and distance measurement on a moving target, and is particularly suitable for application scenes such as high-altitude over-the-ground wide-area detection, quick moving target positioning and tracking and the like.

A gun lens receives an electron beam or other particle beam, which is then divided into beamlets by an aperture array. Each of the beamlets is telecentric. A global imaging lens receives the beamlets from the aperture array. A micro deflector array on a plane of the global imaging lens includes deflectors configured to be individually controlled.

The embodiment of the invention provides an MEMS chip, an MEMS system and electronic equipment. The MEMS chip comprises a back polar plate, and the back polar plate is provided with a fixed supporting area which is used for being fixedly connected with a supporting structure; the acoustic action region is arranged opposite to the vibrating diaphragm to form an acoustic capacitance structure; wherein the acoustic action area is provided with acoustic through holes, and at least part of the acoustic through holes form a gradually-changed aperture array area; in the gradually-changed aperture array area, the characteristic apertures of the acoustic through holes are continuously and progressively decreased towards the edge direction along the radial direction of the gradually-changed aperture array area; the characteristic aperture is defined as the diameter of a minimum circumcircle determined by taking the geometrical shape of the acoustic through hole as a reference.

A beamlet is generated from an electron beam using an array of apertures downstream of a single global collimating lens. The beamlets are directed through an image lens array downstream of the aperture array in the path of the beamlets, the beamlets being individually focused onto an intermediate image plane using the image lens array. The beamlet is then directed at a workpiece on a stage using a transfer lens array downstream of the image lens array. The paths of the beamlets do not include intersections.

The present embodiment provides a multi-charged particle beam drawing apparatus that suppresses a beam position shift on a sample surface. The charged particle beam drawing apparatus of the present embodiment is a multi-charged particle beam drawing apparatus including: a blanking aperture array substrate provided with a plurality of blankers that perform blanking deflection of a plurality of charged particle beams that constitute a plurality of beams; and a first shielding member disposed on a downstream side of the blanking aperture array substrate in a traveling direction of the plurality of beams, having a cylindrical portion through which the plurality of beams pass inside, and being composed of a high magnetic permeability material.

Provided are a multi-charged particle beam drawing method, a multi-charged particle beam drawing apparatus, and a computer-readable recording medium, which can improve the drawing accuracy of a multi-beam. The multi-charged particle beam drawing method of the present embodiment includes: a data path for inputting control data for controlling the on or off of each beam of a multi-beam to a unit array on a blanking aperture array substrate, dividing, according to each input-output circuit of a plurality of input-output circuits and at least any one of a plurality of wiring groups concentrated based on the inter-wiring distance of a plurality of wirings to the plurality of input-output circuits, into a plurality of first blocks, for each of the plurality of first blocks after the division, calculating a first shift amount of each of the plurality of first blocks of the multi-beam due to at least any one of an electric field and a magnetic field, and a process of correcting the irradiation position or the irradiation amount of the multi-beam based on the first shift amount and irradiating each beam of the multi-beam.

The application discloses a large-aperture array antenna subarray structure adjustment method facing electrical performance, and comprises the following steps: S1, determining maximum gain loss; S2, establishing sensitivity distribution matrix; S3, calculating position tolerance distribution weight; S4, giving initial installation tolerance standard; S5, calculating position tolerance distribution matrix; S6, generating position error random sample; S7, calculating antenna electrical performance; S8, judging whether the position error random sample meets the requirement; S9, calculating new position tolerance standard; and S10, calculating maximum allowed structure adjustment amount. The application can realize the target of taking antenna electrical performance as the target, quantitatively giving the subarray structure adjustment amount of different regions of a large-aperture array antenna, strictly requiring the structure precision of the subarray in the region with high electrical performance sensitivity, appropriately reducing the structure precision requirement in the region with low electrical performance sensitivity, reducing the processing and manufacturing difficulty of the large-aperture array surface, improving the adjustment efficiency of the large-aperture array antenna, and guaranteeing the high performance of the array antenna.

The present invention relates to an applicator for applying a plant treatment agent to a plant via a container, the applicator having: an applicator shell defining an applicator cavity, an applicator cavity inlet end and an applicator cavity outlet end spaced apart from the applicator cavity inlet end by the applicator cavity, and wherein the applicator cavity outlet end defines a linear aperture array, and wherein apertures of the linear aperture array are disposed along an array axis.

This invention provides a metal mask for silicon-based liquid crystal light valve chips, relating to the field of semiconductor optoelectronic device manufacturing technology. It includes a metal substrate and a pixel aperture array, alignment mark area, stress buffer, and reinforced border disposed on the metal substrate, adaptable to mass production evaporation and photolithography processes for LCoS light valve chips. The metal substrate consists of four layers stacked sequentially from bottom to top: a substrate layer, a molybdenum transition layer, a Mo-Ta-N functional pattern layer, and an Al2O3-SiO2 composite passivation layer. The molybdenum transition layer is deposited on the substrate surface using magnetron sputtering, with a surface roughness Ra < 0.15 nm. The Mo-Ta-N functional pattern layer is deposited on the surface of the molybdenum transition layer using reactive magnetron sputtering. The near-vertical, low-roughness aperture sidewalls of this invention result in shadow-free evaporation, uniform electrodes, and clear edges, improving the light utilization and contrast of the LCoS chip. It also increases the utilization rate of the evaporation material and reduces material loss during mass production.

Maintain reading quality. [Solution] The reading head (6) has a substrate (14) on which a plurality of image pickup elements (33) are mounted in the X direction, a lens unit (20) that receives light from the object (4) to be inspected and passes it toward the image pickup elements (33) to converge it, and a holder (12) that supports the substrate (14) and the lens unit (20). The lens unit (20) has a first lens array (22) in which a plurality of first lenses (22L) are arranged in the X direction and on which light is incident, a second lens array (30) in which a plurality of second lenses (30L) are arranged in the X direction so that their optical axes coincide with those of the first lenses (22L) and that converges the light incident from the first lens array (22), and an aperture array (25) in which a plurality of apertures (25A) are arranged in the X direction between the first lens array (22) and the second lens array (30L) so that their optical axes coincide with those of the first lenses (22L) and the second lenses (30L).

The invention relates to a multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, said device being adapted to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming a corresponding number of beamlets, said device comprising an aperture array device in which at least two sets of apertures are realized, an opening array device located downstream of the aperture array device having a plurality of openings configured for the passage of beamlets, said opening array device comprises impact regions, wherein charged impinge upon said impact regions.

This application discloses an optical sensing structure and an optical detector, belonging to the field of integrated optical sensing technology. It aims to achieve on-chip integrated construction and efficient electro-optical control of high-order singular surfaces to improve the signal response intensity and weak signal detection limit of optical sensing. The optical sensing structure includes an optical waveguide, multiple micro-ring resonators, a circular aperture array, and multiple sets of metal electrodes. The optical waveguide and multiple micro-ring resonators are formed by etching optically functional thin films with electro-optic effects. The multiple micro-ring resonators are arranged sequentially along the extension direction of the optical waveguide and are evanescently coupled to it. The circular aperture array is disposed at the end of the optical waveguide to reflect the transmitted optical signal, forming a closed optical loop. Multiple sets of metal electrodes are respectively arranged in pairs on both sides of the optical waveguide and segmented along the waveguide, corresponding to the optical waveguide regions between two adjacent micro-ring resonators and between the micro-ring resonators and the circular aperture array away from the input end of the optical waveguide.

Systems and methods described herein relate to a near-eye display using a pinhole aperture array. In some examples, a near-eye display system includes a ray-limiting structure to provide a pinhole aperture array with a plurality of apertures. The plurality of apertures can each have a shape defined by radially extending elements. Examples also describe extended reality (XR) devices including such a near-eye display system and methods utilizing the near-eye display system.

A modular, multi-height hitch attachment system for skid steer loaders is disclosed. The system includes a lightweight, high-strength frame configured to engage the quick-attach mounting plate of a skid steer without tools, utilizing the machine's integrated locking pin mechanism. The frame comprises a vertically oriented aperture array that permits selective height adjustment of trailer hitches or modular worksite tools. In single-unit use, the system supports accessories such as vises, workbenches, and welding platforms. In dual-unit configuration, two systems operate in tandem to support wide-span or load-bearing implements such as forks or hay spears. The device reduces attachment weight by over 70%, fits within a standard truck toolbox, and offers enhanced visibility and operational versatility. Modular accessories are quickly interchangeable in the field, enabling rapid task transitions and expanding the functional capability of skid steer equipment across construction, agricultural, and industrial applications.

A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-beam charged particle source charged particle paths down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.

The application provides an electric micro-mixing device and method based on asymmetric hole array. The device comprises a PDMS cover layer, a glass substrate layer and an electrode layer. The PDMS cover layer is used for forming a micro-channel structure, and comprises an inlet and outlet area, a channel area and an asymmetric hole area. The glass substrate layer is bonded with the PDMS cover layer. The electrode layer comprises a first electrode plate, a second electrode plate, a third electrode plate, a fourth electrode plate, a fifth electrode plate and a sixth electrode plate. The electrode plates are embedded in the PDMS cover layer and are connected with three pairs of asymmetric micro-holes respectively. The asymmetric micro-holes are arranged on the side wall of the micro-channel and are connected with an external electric field by using electric field driving technology. When the sample solution injected into the main micro-channel passes through the electric field, the flow direction is deflected by the electric field force, and a vortex is formed near the asymmetric micro-holes to promote the mixing of the sample, the mixing efficiency is high, and the mixing effect of the fluid can be flexibly controlled by adjusting the electric field signal, so that samples with different mixing degrees are obtained.

The invention provides a microchannel plate for cathode electron self-focusing in a photocathode X-ray tube and a use method. A micro-channel plate is applied to the technical field of high-performance X-ray tubes, a substrate is a physical substrate of the micro-channel plate and is of a Fresnel lens structure, and the substrate is provided with a plane incident plane and a distorted surface output plane formed by concentric annular belts; a gradient aperture array is distributed on the substrate, and the gradient aperture array is arranged on the plane of the substrate; the radial gradient material is a surface functional coating of the inner wall of the micro-channel; the variable aperture channel is an inner wall surface three-dimensional contour of each independent micro-channel forming the gradient aperture array, and each independent micro-channel in the gradient aperture array is defined. Different secondary electron emission materials are coated on the surface of the inner wall of each micro-channel defined by the gradient aperture array in a partitioned manner along the radial direction. In this way, the problems that in the prior art, an X-ray tube is loose in structure and poor in performance can be solved.

The present invention efficiently and accurately diagnoses abnormalities of blankers. An abnormality diagnosis method for a blanking aperture array substrate according to the present embodiment includes grouping the plurality of individual blankers into a plurality of groups, measuring blanking performance of the individual blankers for each group, and iteratively subdividing any group exhibiting abnormal blanking performance into subgroups to identify an individual blanker having abnormal blanking performance.

The application discloses a ship radiated noise power spectrum measurement method based on frequency difference beam forming, comprising the following steps: obtaining a to-be-measured radiated noise signal received by a base array; constructing a difference frequency signal through the conjugate product of the to-be-measured radiated noise signal and a reference frequency signal; performing beam forming on the constructed difference frequency signal based on the difference frequency, and calculating the amplitude of the beam output signal of the difference frequency signal; correcting the amplitude of the beam output signal of the difference frequency signal by using the amplitude of the reference frequency signal to obtain the amplitude of the to-be-measured radiated noise signal, and calculating the power spectrum of the to-be-measured radiated noise signal. The application converts the signal outside the design frequency band of the base array to the inside of the design frequency band to perform beam forming, improves the array gain, better suppresses the environmental noise, improves the measurement performance of the base array on the radiated noise outside the design frequency band, greatly expands the frequency band width of the ship radiated noise measurement, and can realize the measurement of the radiated noise with a larger bandwidth by using a smaller aperture array.

In one embodiment, an alignment method is for aligning a first aperture array substrate and a second aperture array substrate disposed sequentially. The first aperture array substrate has a plurality of first openings, and the second aperture array substrate has a plurality of second openings. The alignment method includes irradiating a plurality of first openings with a charged particle beam to form a first beam array, measuring, by the first beam array, at least one of an amount of charged particles irradiating the second aperture array substrate, an amount of charged particles irradiating and reflected from or generated at the second aperture array substrate, and an amount of charged particles irradiating the second aperture array substrate and passing through the plurality of second openings, and adjusting a relative position between the first beam array and the plurality of second openings based on a measured charged particle amount.

An upconversion film or device includes a dielectric layer, a gap electrode layer overlying the dielectric layer, and an upconversion material configured to upconvert infrared light to visible light. The gap electrode layer includes an array of discrete apertures between an array of discrete electrodes and a continuous electrode. Each discrete aperture is defined by a capacitive gap at least partially filled by the upconversion material, An example upconversion film includes capacitive gaps that are each less than nanometers. An example upconversion device includes an optically transparent electrode layer underlying the dielectric layer. An example infrared camera includes an imaging layer that includes an array of sensing elements, in which each discrete aperture is aligned with a sensing element. An example method of manufacturing an upconversion film includes forming a passivation layer on the array of discrete electrodes using atomic layer deposition to form the capacitive gap.

The invention discloses an addressing ultrasonic sensor array variable aperture excitation impedance matching method and circuit, and belongs to the technical field of ultrasonic detection. The invention provides a voltage gain compensation method based on an excitation sound field energy attenuation principle according to array element impedance change during addressing array variable aperture excitation and excitation sound field energy distribution difference. According to the method, the waveform parameters of the excitation signals can be automatically adjusted, the energy distribution of the excitation sound field is optimized, and the consistency of the ultrasonic excitation signals is improved, so that the optimal excitation of the array elements of the addressing ultrasonic sensor array under different excitation apertures is realized. According to the invention, distribution characteristics of excitation circuit impedance under different apertures are given, and a variable aperture array element impedance matching circuit is designed. The circuit system comprises an adjustable high-voltage circuit, a driving circuit, a sharp pulse excitation circuit and an array element impedance matching circuit. According to the invention, the addressing ultrasonic sensor array can achieve the optimal impedance matching effect in different aperture array element excitation modes.

A corrugated shadow mask for patterned vapor deposition includes a corrugated membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. The through-apertures are at the apexes of the corrugation and project from the membrane surface surrounding the through-apertures. The shadow mask is particularly suited for forming pixel arrays for OLED displays without color mixing from adjacent pixels.

Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.