403 results about "Aperture array" patented technology

In a three-dimensional image display apparatus provided with a shading mask with a minute aperture array in front of a color display device, the minute apertures are provided with color filters, a setting is provided so that the visual angles between the respective centers of the red-light transmitting part, green-light transmitting part, and blue-light transmitting part of the color filters become equal, in an identical parallax image pixel region, to the visual angles between the respective centers of the red, green, and blue sub-pixels of the color display device, the respective red, green, and blue sub-pixels are made so as to be always displayed in a lighted condition at a fixed area ratio, thus color reproduction wherein brightness ratio of the three primary colors in respective parallax image pixels is maintained at an appointed value is carried out.

The dual synthetic aperture array system processes returns from the receiving arrays. The two identical receiving arrays employing displaced phase center antenna techniques subtract the corresponding spectrally processed data to cancel clutter. It is further processed that a moving target is detected and its velocity, angular position and range is measured, in or out of the presence of clutter. There are many techniques presented in the disclosure. These techniques are basically independent but are related based on common set of fundamental set of mathematical equations, understanding of radar principles and the implementations involved. These many techniques may be employed singly and/or in combination depending on the application and accuracy required. They are supported by a system that includes, optimization of the number of apertures, pulse repetition frequencies, DPCA techniques to cancel clutter, adaptive techniques to cancel clutter, motion compensation, weighting function for clutter and target, and controlling the system in most optimum fashion to attain the objective of the disclosure.</PTEXT>

Improvements have been made for collecting, focusing, and directing of ions and/or charged particles generated at atmospheric or near atmospheric pressure sources, such as but not limited to, electrospray; atmospheric pressure discharge ionization, chemical ionization, photoionization, and matrix assisted laser desorption ionization; and inductively coupled plasma ionization. A multiple-aperture laminated structure is place at the interface of two pressure regions. Electric fields geometries and strengths across the laminated structure and diameters of the apertures; all of which act to optimize the transfer of the ions from the higher pressure region into the lower pressure region while reducing the gas-load on the lower pressure region. Embodiments of this invention are methods and devices for improving sensitivity of mass spectrometry when coupled to atmospheric, near atmospheric, or higher pressure ionization sources by reducing the gas-load on the vacuum system.

A method for forming a layer on a surface in making a device, including providing a distribution member for receiving vaporized material, the distribution member having one or more walls defining a polygonal two-dimensional pattern of apertures is formed in a wall, which deliver vaporized material in a molecular flow onto the surface; providing the polygonal two-dimensional pattern of apertures to have at least four vertices, with a first set of apertures disposed at the vertices, a second set of edge apertures disposed between the apertures of the first set and defining the edges of the polygonal two-dimensional pattern, and a third set of interior apertures disposed within the periphery of the polygonal two-dimensional pattern defined by the first and second sets of apertures; and dimensioning the apertures to obtain a desired flow rate.

An approach is provided that uses diversity to compensate fading of free-space optical (FSO) signals propagating through an environment characterized by atmospheric scintillation. One embodiment involves collecting at least one FSO beam, demultiplexing the beam by wavelength into at least two sub-beams, detecting each sub-beam to produce an electrical output therefrom, and recovering a signal using complementary information from at least two of the electrical outputs. Another embodiment involves collecting the FSO beam onto an array of spatially separated sub-apertures, detecting the light entering each sub-aperture to produce an electrical output therefrom, and recovering a signal using complementary information from at least two of the electrical outputs. This second embodiment enables both electronic adaptive processing to coherently integrate across the sub-apertures and in the case of multiple transmit apertures a free space optical Multiple Input Multiple Output (MIMO) system.

The invention discloses a stereoscopic three-dimensional display based on multi-screen splicing. The stereoscopic three-dimensional display comprises a two-dimensional display array, a projection lens array, an aperture array and a directional scattering screen. By utilizing a two-dimensional display pixel region segmentation mode and ensuring each display region of the display array to form a projector together with an aperture and a projection lens which is directly in front of the region, all projectors are staggered in vertical direction and project the images corresponding to the display regions to a same position on the directional scattering screen so as to form an image in front of an arc-shaped screen; and the images displayed in each display region are spliced by the images of a three-dimensional object from different visual angles according to a specific segmentation and recombination method. The stereoscopic three-dimensional display provided by the invention has the advantages of achieving high image resolution and high visual angle resolution and realizing observation of an exquisite three-dimensional image with a horizontal parallax. Compared with the single naked-eye display, stereoscopic three-dimensional display provided by the invention has the advantages that the multi-screen splicing settings ensures that the extension of visual angles is realized, and the spatial scale and viewing range of the three-dimensional images are increased.

An exemplary system and method for detecting at least one analyte in a sample comprises inter alia a source of radiation (300), a near-field aperture array (315), a chromatographic field (330), a detector (350), and a data processor (370). Disclosed features and specifications may be variously controlled, adapted or otherwise optionally modified to improve detection of any sub-diffraction-limited scale phenomena. Exemplary embodiments of the present invention representatively provide for improved S/N, increased sample throughput, refined spectral resolution and enhanced detection sensitivity.

Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array (111) includes plural aperture patterns. A deflector (109) for selecting an aperture pattern through which a primary beam passes is disposed at the position of a charged particle source image created between an electron gun (102), i.e., a charged particle source, and the aperture array (111). At the time of charge-control beam illumination and at the time of signal-detection beam illumination, an aperture pattern of the aperture array (111) is selected, and conditions of a lens array (112), surface electric-field control electrode (118) and the like are switched in synchronization with each beam scanning. Thus, the charges are controlled and the signals are detected at different timings under suitable conditions, respectively.

A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of nxm beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.

A drawing apparatus for drawing on a substrate by a plurality of charged particle beams includes: an aperture array, a blanker array, a scanning mechanism, and a controller. The aperture array specifies the dimension of each of the plurality of charged particle beams on the substrate. The blanker array carries out blanking of the plurality of charged particle beams independently. The scanning mechanism performs a relative scanning between the plurality of charged particle beams and the substrate in each of the first direction and a second direction which cross each other. The controller controls the blanker array at a predetermined pitch on the substrate. The dimension and the pitch are smaller in one of the first direction and the second direction than in the other.

A thin monolithic image sensor of the invention is comprised of a laminated solid package composed essentially of an optical layer and an image-receiving layer placed on the top of the optical layer. The optical layer also comprises a laminated structure composed of at least an optical microlens-array sublayer and an aperture-array sublayer. The image-receiving layer is a thin flat CCD/CMOS structure that may have a thickness of less than 1 mm. The image digitized by the CCD/CMOS structure of the sensor can be transmitted from the output of the image-receiving layer to a CPU for subsequent processing and, if necessary, for displaying. A distinguishing feature of the sensor of the invention is that the entire sensor along with a light source has a monolithic structure, and that the diaphragm arrays are located in planes different from the plane of the microlens array and provide the most efficient protection against overlapping of images produced by neighboring microlenses.

A method for virtual aperture array radar tracking includes: transmitting first and second probe signals; receiving a first reflected probe signal at a radar array; receiving a second reflected probe signal at the radar array; calculating a target range from at least one of the first and second reflected probe signals; corresponding signal instances of the first reflected probe signal to physical receiver elements of the radar array; corresponding signal instances of the second reflected probe signal to virtual elements of the radar array; calculating a first target angle by performing beamforming from the signal instances of the first and second reflected probe signals; and calculating a position of the tracking target relative to the radar array from the target range and first target angle.

A charged particle multi-beamlet system for exposing a target (11) using a plurality of beamlets. The system comprises a charged particle source (1) for generating a charged particle beam (20), a beamlet aperture array (4D) for defining groups of beamlets (23) from the generated beam, a beamlet blanker array (6) comprising an array of blankers for controllably blanking the beamlets (23), a beam stop array (8) for blanking beamlets (23) deflected by the blankers, the beam stop array (8) comprising an array of apertures, each beam stop aperture corresponding to one or more of the blankers, and an array of projection lens systems (10) for projecting beamlets on to the surface of the target. The system images the source (1) onto a plane at the beam stop array (8), at the effective lens plane of the projection lens systems (10), or between the beam stop array (8) and the effective lens plane of the projection lens systems (10), and the system images the beamlet aperture array (4D) onto the target (11).

An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a blanking aperture array in a particle-optical lithography apparatus which has a finite number of defects, said desired pattern being composed of a multitude of image elements within an image area on the target: A list of defective blanking apertures is provided, comprising information about the type of defect of the defective blanking apertures; from the desired pattern a nominal exposure pattern is calculated as a raster graphics over the image elements disregarding the defective blanking apertures; the “compromised” image elements (1105) are determined which are exposed by aperture images of defective blanking apertures; for each compromised element (1105), a set of neighboring image elements is selected as “correction elements” (1104); for each compromised element, corrected dose values are calculated for the correction elements, said corrected dose values minimizing an error functional of the deviation of the dose distribution including the defects from the nominal dose distribution, under the constraint that each of the corrected dose values falls within the allowed doses; and a corrected exposure pattern (1103) is generated by substituting the corrected dose values for the nominal dose values at the correction elements.

A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.