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339 results about "Pattern generation" patented technology

Ancient textile image restoration system based on artificial intelligence

The invention discloses an ancient textile image restoration system based on artificial intelligence. The system comprises a multi-source image acquisition module, a damaged area detection module, a pattern generation module, a color restoration module, a texture synthesis module and a multi-scale fusion module. The system introduces a wavelet guidance-frequency domain attention mechanism and a rotation invariant Haar wavelet basis function to realize accurate identification and classification of a damaged area; a saliency-guided wavelet decomposition control and self-adaptive threshold denoising method is combined, so that the perception capability of slant textures and edge details is improved; the texture synthesis module constructs a hierarchical modeling strategy fusing Gram style loss, Wasserstein style loss and a total variation regular term, and realizes generation of high-quality textures with unified styles and smooth edges; the system can be widely applied to cultural relic digital repair and display scenes.
Owner:NINGXIA HUI AUTONOMOUS REGION MUSEUM

Clothing pattern personalized customization system and method based on improved Stable Diffusion model

The invention discloses a garment pattern personalized customization system and method based on an improved Stable Diffusion model, the system comprises an input module, a core processing module and an output module, the input module receives multi-modal user input and fuses the multi-modal user input; the core processing module generates an initial pattern by using an improved Stable Diffusion model, realizes accurate adaptation and parameterization control of the pattern and a clothing model through a TPS algorithm, CLIP semantic analysis, Perlin noise and the like, and reduces feedback delay in combination with 3D real-time rendering; the method comprises the steps of multi-modal pattern generation, dynamic adaptation and parameter control and production file output, the full-link bottleneck of'design-adaptation-production 'of garment customization is broken through, normal form transition from manual leading to AI driving is achieved, and the production efficiency is improved. And personalized and industrial production standards are considered.
Owner:ZHEJIANG SCI-TECH UNIV +1

Internet of Things equipment topological relation identification method based on graph neural network

The invention discloses an Internet of Things equipment topological relation identification method based on a graph neural network, and the method comprises the steps: capturing a time sequence evolution mode of historical connection and communication states of equipment through fusion of a time sequence attention mechanism and a self-adaptive time sequence attenuation factor, and constructing an initial equipment relation graph; carrying out incremental learning by adopting a quantum heuristic optimization algorithm, and dynamically updating the topological structure of the equipment; extracting a cross-protocol communication mode by using a meta-path guided graph convolution operation, and generating a graph structure fingerprint irrelevant to a protocol; a zero sample learning framework is combined to map into a standardized embedded vector; and deploying a hierarchical federated learning framework to execute topological reasoning on edge equipment, and dynamically outputting an equipment relation confidence score. According to the method, the real-time performance and compatibility of topological relation identification are improved, and the method is suitable for a heterogeneous Internet of Things environment.
Owner:GUANFENG INTERNET OF THINGS TECHNOLOGY (SUZHOU) CO LTD

AI diffusion model pattern generation platform and generation method

The invention discloses an AI diffusion model pattern generation platform and method, the generation platform comprises a visual interaction module, an image generation module and a pattern mapping module, and the image generation module comprises a training sub-module and a reasoning sub-module; the generation method comprises the following steps: preprocessing a text input by a user and an optional structure image, and outputting standardized data; a semantic embedding vector is generated through text coding; carrying out LoRA fine tuning to obtain a style weight module; a ControlNet structure condition is injected; performing diffusion sampling to generate candidate patterns; performing CLIP scoring to screen an optimal pattern; and outputting the optimal pattern and previewing the carrier map. According to the platform and the method provided by the invention, the LoRA low-rank fine tuning, the ControlNet structure condition control and the CLIP similarity evaluation algorithm are fused, so that the effects of customizing the special style pattern with a small number of samples at low cost and accurately controlling the structure and style of the pattern are realized.
Owner:SHANGHAI UNIV

Unmanned aerial vehicle performance pattern generation method and device, computer equipment and storage medium

The invention discloses an unmanned aerial vehicle performance pattern generation method and device, computer equipment and a storage medium, and the method comprises the steps: collecting historical unmanned aerial vehicle performance patterns, and carrying out the text marking of the historical unmanned aerial vehicle performance patterns, so as to construct a training data set; training a text graph model and a corresponding control model by using the training data set so as to construct a pattern generation model; and generating a corresponding unmanned aerial vehicle performance pattern by using the pattern generation model based on a set pattern generation requirement. According to the method, historical unmanned aerial vehicle performance patterns are collected and text marking is carried out to construct a training data set, the data set is utilized to train a text graph model and a control model thereof, a pattern generation model is constructed, and finally patterns are generated through the model pattern generation model according to set pattern generation requirements. In this way, the process of manual direct design or repeated adjustment can be reduced, the generation period of the unmanned aerial vehicle performance pattern is remarkably shortened through automatic model generation, and the generation efficiency is improved.
Owner:SHENZHEN DAMO DAZHI CONTROL TECH CO LTD

Large model query generation system and method combining graph structure analysis and execution

The invention discloses a large model query generation system and method combining graph structure analysis and execution, and the system comprises a graph mode standardization module which converts a description file into a unified structured representation; the large language model module is used for screening out nodes, edges and sub-graph modes required by query statements according to the natural language problem and the structured representation of the user; the graph mode detection module is used for detecting and modifying the screened nodes, edges and sub-graph modes through scripts; the large language model module generates an initial query statement according to a natural language problem of a user and detected and modified nodes, edges and subgraph modes; the query statement detection module is used for detecting the initial query statement through a script and generating an error report; and the large language model module generates a modified query statement. According to the large model query generation system and method combining graph structure analysis and execution, the accuracy of graph mode selection is remarkably improved through the thinking ability of the large language model and the script error detection ability, and therefore the quality of graph database query statement generation is improved.
Owner:ZHEJIANG CHUANGLIN TECH CO LTD

Full stack schema-driven development system and method

Efficient generation of multi-platform compatible source code and test code with consistency and quality in software development SOLUTION: The schema-driven development system includes a user input unit, a schema generation unit, and a code generation unit, wherein the user input unit acquires data in various formats such as a natural language and a CSV file, the schema generation unit converts the acquired data into a schema, and the code generation unit generates a source code and a test code based on the generated schema.SELECTED DRAWING: Figure 1
Owner:株式会社SHIELD

Beverage garland track generation method and system based on specific pattern

The invention relates to the technical field of automatic pattern generation and execution, and provides a beverage garland track generation method based on a specific pattern, which can be widely applied to the fields of beverage garland, food decoration, artistic creation and the like, and comprises the following steps: S1, receiving pattern input; s2, analyzing the pattern input to obtain control parameters; s3, generating an execution path based on the control parameters; and S4, generating a control track according to the execution path and executing the control track. Through the basic geometric primitive combination, the pattern formula system and the user input conversion pipeline, the preset garland pattern and user-defined input are adapted, accurate and stable reproduction and flexible expansion of the garland pattern are realized, and the personalized creation capability of the automatic coffee machine is improved. The system is compatible with multiple types of executing mechanisms such as 4-7-axis mechanical arms, breaks through traditional input limitation, supports multi-mode interaction such as natural languages and gestures, can autonomously learn and evolve, constructs open creative ecology, and has four innovation points.
Owner:SHANGHAI HI DOLPHIN ROBTICS CO LTD

Standardizing enterprise software code through LLMs

A computer-implemented method and system standardize code patterns within enterprise software environments. A code modernization system utilizes a Large Language Model (LLM) and a specialized prompt library. The library includes pattern recognition prompts to guide the LLM in identifying specific code patterns within selected software code, potentially using enterprise-specific context. It also includes standardized solution prompts to guide the LLM in generating replacement code conforming to predefined enterprise standards for the identified patterns. The system orchestrates communication, transmitting code and relevant prompts to the LLM and receiving identified patterns and subsequently the generated standardized replacement code. This automated approach facilitates improved code quality, consistency, maintainability, and can support code translation efforts within the enterprise.
Owner:MORGAN STANLEY SERVICES GROUP INC

Mask pattern generation method, mask, semiconductor structure and manufacturing method thereof

The invention provides a mask pattern generation method, a mask, a semiconductor structure and a manufacturing method thereof. The mask pattern generation method comprises the following steps: acquiring a mask pattern template comprising a cutting channel region and a reference mark pattern comprising a graphic pattern; the reference mark pattern is divided into a plurality of reference mark areas; extracting contours of partial graphic patterns in each reference mark area by using the auxiliary graphs to obtain a plurality of auxiliary mark patterns, and arranging the auxiliary mark patterns in the cutting channel area; and respectively intercepting a part of the graphic pattern in each reference mark area to obtain a plurality of local mark patterns, and arranging the local mark patterns at the positions of the corresponding auxiliary mark patterns in the cutting channel area to obtain a target mask pattern, the plurality of local mark patterns transferred to the semiconductor structure are combined into an alignment mark pattern matched with the graphic pattern in the cutting channel of the semiconductor structure. According to the embodiment of the invention, the alignment precision in the processing process of the packaging technology is improved.
Owner:NEXCHIP SEMICON CO LTD

Photoetching overlay pattern generation method and system for semiconductor manufacturing

The invention provides a photoetching overlay pattern generation method and system for semiconductor manufacturing, and relates to the technical field of semiconductor photoetching. According to the method, an overlay performance target, measurement tool parameters and process parameters are unified as nominal conditions, layout dimensions and manufacturing constraints are unified as a constraint library, and a process chain joint model covering exposure, development, etching and measurement links is established; simulation and multi-target iterative optimization are carried out on the parameterized overlay mark under nominal conditions and disturbance conditions, an optimal mark with high measurement sensitivity, low measurement uncertainty and small system deviation is obtained, and association with design input is realized to support production chip casting and measurement.
Owner:CANGZHOU SUNHEAT CHEM

SRAF graph generation method and system based on large language model

The invention discloses an SRAF graph generation method and system based on a large language model, and the method comprises the steps: carrying out the preprocessing of multi-modal sample data collected in advance, converting the sample data into word vectors which can be recognized by the large language model, the sample data comprises an SRAF graph, a target layout pattern for generating the SRAF graph and a process description in a text form; inputting the preprocessed training data into a large language model for training to obtain an SRAF generation model capable of automatically generating an SRAF graph according to the target layout pattern and the process description; and inputting the preprocessed pattern and process description of the target layout into the SRAF generation model, and automatically generating an SRAF graph of the target layout. By adopting the technical method provided by the invention, the generation efficiency of the SRAF graph can be improved.
Owner:SHENZHEN GOUWEIXIN TECH CO LTD

Pattern generation and development integration method for paper-cut cultural and creative products

The invention discloses a pattern generation and development integration method for paper-cut cultural and creative products, which comprises the following steps of: performing input acquisition and semantic prompt generation, and constructing a semantic vector by using an NLP (Network Length Polymorphism) and a paper-cut style template; generating a paper-cut style pattern based on the transformed model; extracting a contour and optimizing a structure through algorithms such as edge detection and binarization, and outputting a vector format; matching a text and creation product template, and recommending materials and colors; a user is supported to feed back local modification; the method can solve the problems that traditional paper-cut creation is low in efficiency, difficult to industrialize and the like, and has the technical advantages that creation efficiency and style diversity are improved, non-abandoned paper-cut cultural creation industrialization adaptability is enhanced, cultural inheritance and innovation are promoted, and the method is suitable for digital development and industrial conversion of paper-cut cultural creation products.
Owner:MINJIANG UNIVERSITY +1

Wavy feathering method and system of digital direct injection printer for banner cloth and electronic equipment

The invention discloses a wavy feathering method and system of a digital direct injection printer for flag cloth and electronic equipment, the method abandons a traditional gradual feathering mode, and adopts a wavy distorted feathering pattern, and the method comprises the following steps: firstly, analyzing the permeability characteristic of the cloth; according to the method, a two-way complementary template is finally generated by setting morphological parameters, creating an S-shaped fluctuation track, filling ink dots and leaving white space, so that adjacent PASS patterns can be occluded in an interlocking manner at a seam; and finally controlling the nozzle to spray ink according to the pattern. The system correspondingly comprises a pattern analysis module, a pattern generation module and a printing control module, through irregular ink dot distribution of wavy patterns, smooth gradual change is formed through natural permeation of ink, the contrast ratio of a feathering area and a non-feathering area is effectively reduced, accurate alignment of joints can be ensured through real-time error compensation, accordingly, PASS channels are eliminated, and the printing quality is improved. And the overall quality and the front and back color consistency of a flag cloth printing image are improved.
Owner:GUANGZHOU SENYANG ELECTRONIC TECH CO LTD

Pattern generation method, system and device for structured light three-dimensional reconstruction based on anti-diffraction

The invention relates to an anti-diffraction-based structured light three-dimensional reconstruction pattern generation method, system and device, and the method comprises the steps: S1, generating simulation stripes projected to an object plane, recording the simulation stripes as an image I1, enabling the bit depth of the image I1 to be b, enabling the width and height of the image I1 to be A times of the DMD resolution, and enabling A to be greater than or equal to 2; and S2, selecting an anti-diffraction function according to the optical system to perform anti-diffraction processing on the pattern. And S3, performing one-time deconvolution operation on the image I1 and the anti-diffraction function to obtain an image I2. And S4, carrying out downsampling operation on the image I2 to obtain an image I3 with the resolution consistent with that of the DMD. And S5, carrying out local binarization processing on the image I3 to obtain an image I4 with the bit depth of 1 bit. And S6, replacing the original image I1 with the image I4. According to the invention, by simulating the anti-diffraction process and calculating the 1-bit image on the DMD, the 1-bit image achieves the same effect as an 8-bit image, so that the projection efficiency is improved by dozens of times, and the existing technical problem is solved.
Owner:SUZHOU MINGJIAN IMAGING TECHNOLOGY CO LTD

Intelligent pattern generation and material adaptation system and method for non-abandoned technology

The invention relates to the technical field of intangible cultural heritage protection, in particular to an intelligent pattern generation and material adaptation system and method for an intangible cultural heritage technology, and the system comprises a knowledge graph construction module, a hierarchical perception adversarial network module, a material adaptation module, a digital manufacturing module and a virtual prototype module. A knowledge graph containing pattern features, material attributes and association relationships thereof is constructed by collecting non-abandoned process pattern data, intelligent patterns conforming to non-abandoned aesthetics are generated, a material adaptation module analyzes feature parameters of the intelligent patterns and predicts adaptive material parameters, a digital manufacturing module generates a digital manufacturing instruction, and the digital manufacturing instruction is sent to the digital manufacturing module. According to the method, a complete digital link from pattern design to material manufacturing is established, the problem of systematic storage and application of traditional process knowledge is solved, and inheritance and development of non-abandoned processes are promoted.
Owner:SICHUAN VOCATIONAL & TECHN COLLEGE

Classical music semantic extraction method oriented to AIGC large model application

The invention provides an AI GC large model application-oriented classical music semantic extraction method, which comprises the following steps of: aiming at a first feature set, extracting a local time-frequency mode by adopting a convolutional neural network, and generating a second feature set containing note and chord correlation; aiming at the fourth feature set, a variational auto-encoder is adopted to decouple emotion and structural semantics, and an independent fifth feature set is generated; extracting transferable semantic representations from the sixth feature set, and mapping the transferable semantic representations to literature and drawing modalities by adopting a transfer learning method to generate a cross-modal seventh feature set; driving a generation model through the seventh feature set, and generating a literature text or a painting image by adopting a diffusion model to obtain final artistic creation content; and if the artistic score of the generated content is lower than a preset threshold value, optimizing the generated model parameters through reinforcement learning to obtain optimized artistic creation content.
Owner:UNIV OF SCI & TECH BEIJING

Mongolian intangible cultural heritage display system based on AI and virtual reality

The invention provides a Mongolian intangible cultural heritage display system based on AI and virtual reality. The Mongolian intangible cultural heritage display system comprises a user intention analysis module, a behavior generation module, a pattern generation module, an exhibition content fusion module and a virtual reality display module. By constructing a unified expression and scheduling mechanism from semantic driving to exhibition execution, the key problems that in an existing system, behaviors and pattern generation are disjointed, an exhibition time sequence cannot be subjected to culture matching, and user input is difficult to feed back in real time are solved; and the expression accuracy, the generation flexibility and the interaction response capability of the non-genetic culture in the virtual environment are remarkably improved.
Owner:INNER MONGOLIA UNIV OF TECH

Intelligent costume design and template generation method and system

The invention discloses an intelligent clothing design and template generation method and system, and relates to the technical field of clothing intelligent plate making, and relates to multi-physics field modeling, dynamic simulation, reverse optimization and iterative output technologys.The method comprises the steps that a biomechanical human body model containing skeletal muscle groups and a multi-physics field coupling model of initial clothing piece templates and fabric parameters are constructed; defining a target pressure curve; driving a human body to execute preset actions, and calculating a dynamic pressure field and a wrinkle discomfort index through explicit dynamics; constructing a loss function fusing the pressure goodness of fit and the wrinkle index, solving a gradient by using an adjoint method, and accelerating reverse optimization in combination with a physical information neural network agent model; the system comprises corresponding function modules, parameters can be automatically adjusted according to the motion posture, it is ensured that the dynamic pressure is always close to a target curve, and the functionality and comfort level of clothes are improved.
Owner:GUANGZHOU MEIMAO CLOTHING TECHNOLOGY CO LTD

Glasses system for facial privacy protection

The invention relates to the technical field of personal privacy protection, in particular to a glasses system for face privacy protection. The system comprises a glasses body and a bearing and pattern presenting component. The physical shell is detachably mounted on the spectacle frame and printed with a cured pattern, the first display module is arranged on the outer surface of the spectacle frame, and the second display module is arranged on the outer side of the lens. Wherein the presented antagonistic interference pattern is generated by a pattern generation module through a joint optimization algorithm, the algorithm takes minimization of the feature similarity of the face recognition model as an antagonistic loss target and takes an approximate preset style image feature as a style loss target, and displayable constraints can be added to ensure the physical realizability of the pattern. According to the invention, by presenting the specific optimized pattern in the key area of the glasses, the face recognition of an external camera can be effectively resisted in a non-interference manner, and the privacy is guaranteed while the beauty and practicability are achieved.
Owner:START BEIDOU (SHENZHEN) TECHNOLOGY CO LTD

Mongolian intangible cultural heritage display system based on ai and virtual reality

The Mongolian intangible cultural heritage display system based on AI and virtual reality is provided, comprising a user intention analysis module, a behavior generation module, a pattern generation module, an exhibition content fusion module and a virtual reality display module.A unified expression and scheduling mechanism from semantic driving to exhibition execution is constructed, the key problems of disconnection between behavior and pattern generation, cultural mismatch of display timing, and difficulty in real-time feedback of user input in the existing system are solved, and the expression accuracy, generation flexibility and interactive response capability of intangible cultural heritage in a virtual environment are significantly improved.
Owner:INNER MONGOLIA UNIV OF TECH

Semiconductor photoetching device based on RCWA improved algorithm and photoetching simulation optimization method

The invention provides a semiconductor photoetching device based on an RCWA improved algorithm and a photoetching simulation optimization method, and belongs to the field of semiconductor photoetching, the semiconductor photoetching device comprises a photoetching optical system, a wafer motion platform, a mask mechanism, a far-field imaging simulation system and a controller; the photoetching simulation optimization method comprises the steps of system modeling, near-field electric field distribution obtaining through RCWA calculation, far-field imaging calculation and far-field electric field distribution obtaining, photoresist model calculation and graph generation, error evaluation and parameter optimization and photoetching scheme output. According to the method, the RCWA improved algorithm for matrix index calculation is operated by the GPU calculation cluster module based on CPU coordinated allocation, so that the speed of multilayer structure field calculation is increased; according to the scheme, the light source parameters and the mask plate parameters are simulated and optimized, and the final photoetching scheme is determined, so that the overall photoetching precision and efficiency are improved, and popularization and application in the photoetching processing field are facilitated.
Owner:SIXING SEMICON

Missing pattern generation in a data simulation system

Systems, methods, and computer program products for generating data according to patterns of missing data. A method for automatically identifying patterns of missing data and generating data accordingly may comprise reading a plurality of values, each associated a subject and a variable; determining a count of missing values for each variable; selecting one or more variables of the plurality of variables based on their respective counts of missing values; identifying a pattern type characterizing a pattern of missing values for each of the one or more selected variables; and generating simulated data for each of the one or more selected variables based on the identified pattern types.
Owner:INTERNATIONAL BUSINESS MACHINE CORPORATION

Laser powder bed sheet pattern distortion real-time correction system and method based on phase type light valve

The invention discloses a laser powder bed sheet pattern distortion real-time correction system and method based on a phase type light valve, and relates to the technical field of metal additive manufacturing. The system comprises a polarization laser, a beam expanding and collimating unit, a reflecting mirror, a phase-type spatial light modulator, a reflecting mirror, a relay optical system, a galvanometer / field lens system, a movable spectroscope, a reference plane mirror and a forming cylinder. A double-loop correction system with a position sensitive detector as an absolute reference and a wavefront sensor as direct feedback is constructed, information of the position sensitive detector and the wavefront sensor is unified in a phase domain through a frequency domain fusion algorithm, and a comprehensive compensation phase diagram capable of completing pattern generation and distortion correction at the same time is generated. And loading to a phase type light valve to carry out high-power laser patterning modulation, and melting metal powder of a powder bed.
Owner:AIR FORCE UNIV PLA

System and method for generating garment pattern simulation drawing

Provided are a system and a method for generating a garment pattern simulation drawing. The system includes an input device configured for inputting a standardized design drawing and a design drawing contour; a contour type identification module configured for identifying a type of the design drawing contour; a definition module configured for defining the number of human body blocks and joints corresponding to the design drawing contour; a pattern generation module configured for calculating a combination number of garment technical drawings; a garment technical and simulation drawing module configured for generating a garment technical drawing and plotting a garment simulation drawing on the design drawing contour according to the garment technical drawing; and a garment pattern simulation drawing module configured for generating a one-piece garment pattern simulation drawing according to the garment simulation drawing.
Owner:JEN CATHOLIC UNIV

Naked eye 3D virtual reality display system and method

The application is specifically a naked eye 3D virtual reality display system and method, and relates to the technical field of naked eye 3D display and virtual reality, comprising: a test pattern generation module; a photoelectric signal acquisition module; a signal phase analysis module; and a rendering parameter compensation module.In the application, the traditional external camera acquisition scheme is abandoned, a photosensitive sensor is attached to the inner side of a display module glass cover plate through optical glue, and a light shielding film and a frame wrapping design are matched, so that external environmental light can be isolated, signal distortion caused by environmental light reflection can be eliminated from the hardware structure; at the same time, a preprocessing circuit and the sensor are integrated at a zero distance, a tunable gain transimpedance amplifier band-pass filter is used to effectively filter out power frequency and high frequency noise, and a sinusoidal gray scale stripe design reduces spectral aliasing.
Owner:XIXIAN TECH CO LTD

Confrontation pattern generation method and device, equipment, medium and product

The invention discloses an adversarial pattern generation method and device, equipment, a medium and a product, and relates to the technical field of adversarial attacks, and the method comprises the steps: collecting environment data through a sensor; inputting the environment data into a pre-constructed confrontation pattern generation model, performing pattern generation based on the environment data through the confrontation pattern generation model to obtain a confrontation pattern, the confrontation pattern generation model being obtained by distilling an initial confrontation pattern generation model, and the confrontation pattern generation model being obtained by distilling an initial confrontation pattern generation model; the initial confrontation pattern generation model is constructed based on a final generative confrontation network, a task pool and an attention module. Therefore, the problem that the generated confrontation pattern cannot meet the camouflage requirement in allusion to a multi-modal fusion recognition system is solved, and the generation efficiency of the confrontation pattern is improved.
Owner:BEIJING DAWEN TECHNOLOGY CO LTD

Method and system for etch pattern generation

An etch pattern generation system (1) and method comprising-an incident particle beam (21) having a most probable wavelength (lambda) from a particle source (2); and-a reticle (4) comprising through-holes (3) arranged in the incident particle beam (21). The etch pattern generation system (1) generates a single nano feature size pattern (51), and wherein the through-holes (3) are arranged aperiodically in the reticle. A computer-implemented method for generating a model of an etch reticle (4) is also disclosed.
Owner:VESTLANDETS INNOVASJONSSELSKAP AS

Dynamic self-adaptive garment pattern generation method and system based on soft tissue deformation and multi-posture human body measurement

PendingCN122056436AGeometric CADDesign optimisation/simulationHuman bodyDeformation modeling
The invention discloses a dynamic self-adaptive garment pattern generation method and system based on soft tissue deformation and multi-posture human body measurement, and belongs to the field of intelligent garment design. The method comprises the steps of multi-posture human body data acquisition, data preprocessing and database construction, soft tissue layering mechanical modeling, dynamic version parameter calculation, version automatic adjustment, cloth simulation verification, iterative optimization and feedback correction. The system comprises a data acquisition module, a human body deformation modeling module, an automatic model optimization module and the like, the modules are connected through a specific communication mode, a layered mechanical model is established by acquiring three-dimensional data and soft tissue deformation data of six typical postures of a human body, and cloth physical simulation and feedback correction are combined, so that the model is optimized. According to the method, automatic optimization of garment cutting pieces, stitches and elastic areas is achieved, the fitness and comfort of the garment in a dynamic posture are ensured, the intelligent and personalized level of garment design is improved, and the method has remarkable practical value and popularization prospects.
Owner:MINJIANG UNIVERSITY

System, method, and computer program product for generating embeddings for objects

ActiveUS12632847B2FinancePayment architecturePattern sequenceObject based
Provided are computer-implemented methods for generating embeddings for objects which may include receiving heterogeneous network data associated with a plurality of objects in a heterogeneous network; selecting at least one pattern of objects; determining instances of each pattern of objects based on the heterogeneous network data; generating a pattern matrix for each pattern of objects based on the instances of the pattern of objects; generating pattern sequence data associated with a portion of each pattern matrix; generating network sequence data associated with a portion of the heterogeneous network data; and combining the pattern sequence data and the network sequence data into combined sequence data. In some non-limiting embodiments or aspects, methods may include generating a vector for each object of the plurality of objects based on the combined sequence data. Systems and computer program products are also provided.
Owner:VISA INTERNATIONAL SERVICE ASSOCIATION