231 results about "Pattern generation" patented technology

Efficient generation of multi-platform compatible source code and test code with consistency and quality in software development SOLUTION: The schema-driven development system includes a user input unit, a schema generation unit, and a code generation unit, wherein the user input unit acquires data in various formats such as a natural language and a CSV file, the schema generation unit converts the acquired data into a schema, and the code generation unit generates a source code and a test code based on the generated schema.SELECTED DRAWING: Figure 1

The invention provides a mask pattern generation method, a mask, a semiconductor structure and a manufacturing method thereof. The mask pattern generation method comprises the following steps: acquiring a mask pattern template comprising a cutting channel region and a reference mark pattern comprising a graphic pattern; the reference mark pattern is divided into a plurality of reference mark areas; extracting contours of partial graphic patterns in each reference mark area by using the auxiliary graphs to obtain a plurality of auxiliary mark patterns, and arranging the auxiliary mark patterns in the cutting channel area; and respectively intercepting a part of the graphic pattern in each reference mark area to obtain a plurality of local mark patterns, and arranging the local mark patterns at the positions of the corresponding auxiliary mark patterns in the cutting channel area to obtain a target mask pattern, the plurality of local mark patterns transferred to the semiconductor structure are combined into an alignment mark pattern matched with the graphic pattern in the cutting channel of the semiconductor structure. According to the embodiment of the invention, the alignment precision in the processing process of the packaging technology is improved.

The invention provides a photoetching overlay pattern generation method and system for semiconductor manufacturing, and relates to the technical field of semiconductor photoetching. According to the method, an overlay performance target, measurement tool parameters and process parameters are unified as nominal conditions, layout dimensions and manufacturing constraints are unified as a constraint library, and a process chain joint model covering exposure, development, etching and measurement links is established; simulation and multi-target iterative optimization are carried out on the parameterized overlay mark under nominal conditions and disturbance conditions, an optimal mark with high measurement sensitivity, low measurement uncertainty and small system deviation is obtained, and association with design input is realized to support production chip casting and measurement.

The invention discloses a wavy feathering method and system of a digital direct injection printer for flag cloth and electronic equipment, the method abandons a traditional gradual feathering mode, and adopts a wavy distorted feathering pattern, and the method comprises the following steps: firstly, analyzing the permeability characteristic of the cloth; according to the method, a two-way complementary template is finally generated by setting morphological parameters, creating an S-shaped fluctuation track, filling ink dots and leaving white space, so that adjacent PASS patterns can be occluded in an interlocking manner at a seam; and finally controlling the nozzle to spray ink according to the pattern. The system correspondingly comprises a pattern analysis module, a pattern generation module and a printing control module, through irregular ink dot distribution of wavy patterns, smooth gradual change is formed through natural permeation of ink, the contrast ratio of a feathering area and a non-feathering area is effectively reduced, accurate alignment of joints can be ensured through real-time error compensation, accordingly, PASS channels are eliminated, and the printing quality is improved. And the overall quality and the front and back color consistency of a flag cloth printing image are improved.

The invention relates to the technical field of intangible cultural heritage protection, in particular to an intelligent pattern generation and material adaptation system and method for an intangible cultural heritage technology, and the system comprises a knowledge graph construction module, a hierarchical perception adversarial network module, a material adaptation module, a digital manufacturing module and a virtual prototype module. A knowledge graph containing pattern features, material attributes and association relationships thereof is constructed by collecting non-abandoned process pattern data, intelligent patterns conforming to non-abandoned aesthetics are generated, a material adaptation module analyzes feature parameters of the intelligent patterns and predicts adaptive material parameters, a digital manufacturing module generates a digital manufacturing instruction, and the digital manufacturing instruction is sent to the digital manufacturing module. According to the method, a complete digital link from pattern design to material manufacturing is established, the problem of systematic storage and application of traditional process knowledge is solved, and inheritance and development of non-abandoned processes are promoted.

The invention discloses an intelligent clothing design and template generation method and system, and relates to the technical field of clothing intelligent plate making, and relates to multi-physics field modeling, dynamic simulation, reverse optimization and iterative output technologys.The method comprises the steps that a biomechanical human body model containing skeletal muscle groups and a multi-physics field coupling model of initial clothing piece templates and fabric parameters are constructed; defining a target pressure curve; driving a human body to execute preset actions, and calculating a dynamic pressure field and a wrinkle discomfort index through explicit dynamics; constructing a loss function fusing the pressure goodness of fit and the wrinkle index, solving a gradient by using an adjoint method, and accelerating reverse optimization in combination with a physical information neural network agent model; the system comprises corresponding function modules, parameters can be automatically adjusted according to the motion posture, it is ensured that the dynamic pressure is always close to a target curve, and the functionality and comfort level of clothes are improved.

The invention relates to the technical field of personal privacy protection, in particular to a glasses system for face privacy protection. The system comprises a glasses body and a bearing and pattern presenting component. The physical shell is detachably mounted on the spectacle frame and printed with a cured pattern, the first display module is arranged on the outer surface of the spectacle frame, and the second display module is arranged on the outer side of the lens. Wherein the presented antagonistic interference pattern is generated by a pattern generation module through a joint optimization algorithm, the algorithm takes minimization of the feature similarity of the face recognition model as an antagonistic loss target and takes an approximate preset style image feature as a style loss target, and displayable constraints can be added to ensure the physical realizability of the pattern. According to the invention, by presenting the specific optimized pattern in the key area of the glasses, the face recognition of an external camera can be effectively resisted in a non-interference manner, and the privacy is guaranteed while the beauty and practicability are achieved.

The Mongolian intangible cultural heritage display system based on AI and virtual reality is provided, comprising a user intention analysis module, a behavior generation module, a pattern generation module, an exhibition content fusion module and a virtual reality display module.A unified expression and scheduling mechanism from semantic driving to exhibition execution is constructed, the key problems of disconnection between behavior and pattern generation, cultural mismatch of display timing, and difficulty in real-time feedback of user input in the existing system are solved, and the expression accuracy, generation flexibility and interactive response capability of intangible cultural heritage in a virtual environment are significantly improved.

The invention provides a semiconductor photoetching device based on an RCWA improved algorithm and a photoetching simulation optimization method, and belongs to the field of semiconductor photoetching, the semiconductor photoetching device comprises a photoetching optical system, a wafer motion platform, a mask mechanism, a far-field imaging simulation system and a controller; the photoetching simulation optimization method comprises the steps of system modeling, near-field electric field distribution obtaining through RCWA calculation, far-field imaging calculation and far-field electric field distribution obtaining, photoresist model calculation and graph generation, error evaluation and parameter optimization and photoetching scheme output. According to the method, the RCWA improved algorithm for matrix index calculation is operated by the GPU calculation cluster module based on CPU coordinated allocation, so that the speed of multilayer structure field calculation is increased; according to the scheme, the light source parameters and the mask plate parameters are simulated and optimized, and the final photoetching scheme is determined, so that the overall photoetching precision and efficiency are improved, and popularization and application in the photoetching processing field are facilitated.

Systems, methods, and computer program products for generating data according to patterns of missing data. A method for automatically identifying patterns of missing data and generating data accordingly may comprise reading a plurality of values, each associated a subject and a variable; determining a count of missing values for each variable; selecting one or more variables of the plurality of variables based on their respective counts of missing values; identifying a pattern type characterizing a pattern of missing values for each of the one or more selected variables; and generating simulated data for each of the one or more selected variables based on the identified pattern types.

The invention discloses a laser powder bed sheet pattern distortion real-time correction system and method based on a phase type light valve, and relates to the technical field of metal additive manufacturing. The system comprises a polarization laser, a beam expanding and collimating unit, a reflecting mirror, a phase-type spatial light modulator, a reflecting mirror, a relay optical system, a galvanometer / field lens system, a movable spectroscope, a reference plane mirror and a forming cylinder. A double-loop correction system with a position sensitive detector as an absolute reference and a wavefront sensor as direct feedback is constructed, information of the position sensitive detector and the wavefront sensor is unified in a phase domain through a frequency domain fusion algorithm, and a comprehensive compensation phase diagram capable of completing pattern generation and distortion correction at the same time is generated. And loading to a phase type light valve to carry out high-power laser patterning modulation, and melting metal powder of a powder bed.

Provided are a system and a method for generating a garment pattern simulation drawing. The system includes an input device configured for inputting a standardized design drawing and a design drawing contour; a contour type identification module configured for identifying a type of the design drawing contour; a definition module configured for defining the number of human body blocks and joints corresponding to the design drawing contour; a pattern generation module configured for calculating a combination number of garment technical drawings; a garment technical and simulation drawing module configured for generating a garment technical drawing and plotting a garment simulation drawing on the design drawing contour according to the garment technical drawing; and a garment pattern simulation drawing module configured for generating a one-piece garment pattern simulation drawing according to the garment simulation drawing.

The application is specifically a naked eye 3D virtual reality display system and method, and relates to the technical field of naked eye 3D display and virtual reality, comprising: a test pattern generation module; a photoelectric signal acquisition module; a signal phase analysis module; and a rendering parameter compensation module.In the application, the traditional external camera acquisition scheme is abandoned, a photosensitive sensor is attached to the inner side of a display module glass cover plate through optical glue, and a light shielding film and a frame wrapping design are matched, so that external environmental light can be isolated, signal distortion caused by environmental light reflection can be eliminated from the hardware structure; at the same time, a preprocessing circuit and the sensor are integrated at a zero distance, a tunable gain transimpedance amplifier band-pass filter is used to effectively filter out power frequency and high frequency noise, and a sinusoidal gray scale stripe design reduces spectral aliasing.

The invention discloses a dynamic self-adaptive garment pattern generation method and system based on soft tissue deformation and multi-posture human body measurement, and belongs to the field of intelligent garment design. The method comprises the steps of multi-posture human body data acquisition, data preprocessing and database construction, soft tissue layering mechanical modeling, dynamic version parameter calculation, version automatic adjustment, cloth simulation verification, iterative optimization and feedback correction. The system comprises a data acquisition module, a human body deformation modeling module, an automatic model optimization module and the like, the modules are connected through a specific communication mode, a layered mechanical model is established by acquiring three-dimensional data and soft tissue deformation data of six typical postures of a human body, and cloth physical simulation and feedback correction are combined, so that the model is optimized. According to the method, automatic optimization of garment cutting pieces, stitches and elastic areas is achieved, the fitness and comfort of the garment in a dynamic posture are ensured, the intelligent and personalized level of garment design is improved, and the method has remarkable practical value and popularization prospects.

Provided are computer-implemented methods for generating embeddings for objects which may include receiving heterogeneous network data associated with a plurality of objects in a heterogeneous network; selecting at least one pattern of objects; determining instances of each pattern of objects based on the heterogeneous network data; generating a pattern matrix for each pattern of objects based on the instances of the pattern of objects; generating pattern sequence data associated with a portion of each pattern matrix; generating network sequence data associated with a portion of the heterogeneous network data; and combining the pattern sequence data and the network sequence data into combined sequence data. In some non-limiting embodiments or aspects, methods may include generating a vector for each object of the plurality of objects based on the combined sequence data. Systems and computer program products are also provided.

Systems and procedures can perform sequential automatic test pattern generation (on parallel memory units). In one example, an array of logic gates (330-335) can output enable signals to cause multiple memory units (360, 361) to be enabled in parallel. The test pattern generation and test control logic (210) can perform forward path checking, backward path checking, and any other suitable check on the enabled memory units (360, 361). The systems and procedures can then move on to another group of memory units, enabling and testing them in parallel.

Safety mechanisms are embedded into a System on a Chip (SoC) and are operable to detect faults present in the logic circuitry in the SoC. Various types of faults in logic circuitry can occur, for example, a bit stuck at 0 or 1, or a transient or temporary fault due to radiation impacting the SoC. SoC devices are required to meet certain automotive safety integrity standards. The most stringent automotive safety integrity level requires that 90% of random latent faults are detected in all relevant logic, including all safety mechanism. Examples disclosed include hardware based checkers and hardware or software based pattern generation methods that achieve high online fault coverage in safety mechanism circuitry used for functional safety. A hardware based safety mechanism monitors the logic circuitry during operation. Any time the safety mechanism detects any faults in the logic circuitry, a fault notification is propagated to upstream logic.

The invention discloses a Tibetan costume pattern generation method and system based on big data analysis, and relates to the technical field of Tibetan costume image generation, and the method comprises the steps: obtaining user text description and plateau atmosphere data, and generating candidate patterns through a generative adversarial network; calculating an environment expression vector by combining the atmosphere data, and obtaining an environment expression stability index by adopting a data discrete model; after the stable candidate patterns are screened out, calculating the height difference influence index of each pattern through a visual influence model based on the environment expression vector and the plateau atmosphere data of the stable candidate patterns; and outputting a high-quality pattern after screening again. The problems of color distortion, fuzzy details and the like caused by the fact that a traditional method is difficult to adapt to plateau complex optical conditions are solved, and the environment adaptability and the culture integrating degree of generated patterns are remarkably improved. By quantifying the influence of environmental factors on pattern visual performance, automatic generation and screening of patterns which can keep Tibetan cultural characteristics and have excellent environmental adaptability in a plateau complex environment are realized.

From a collection of subsurface scan data gathered by a sensor on a mobile machine, a multitude of detection points are identified. Based on a pattern emerging from these detection points, a predicted utility segment is generated. This predicted utility segment is incorporated into a subsurface feature model. A component of the mobile machine is then controlled using this subsurface feature model to perform an operation.

The present application provides a cutting support device, a cutting pattern generation method, and a cutting system that generate a cutting pattern for cutting a plurality of plate-shaped members from a plate-shaped member in a case where a shoe mold is produced by assembling the plurality of plate-shaped members. The cutting support device (100) includes an input unit (106) that receives shoe mold data, a storage unit (110) that stores shapes and types of the plurality of plate-shaped members, a processor (102) that generates a cutting pattern for cutting the plurality of plate-shaped members from a plate-shaped member of a predetermined size based on the shoe mold data and the shapes of the plurality of plate-shaped members, and an output unit (108) that outputs the cutting pattern. The processor (102) divides regions of the plate-shaped members arranged on the plate-shaped member into a plurality of regions according to the types of the plate-shaped members that constitute the shoe mold, and generates the cutting pattern in each region by finding positions of the plurality of plate-shaped members arranged in the region according to arrangement conditions.

The application discloses a bridge scouring form generation method based on a generative adversarial network, and relates to the technical field of image processing.The method comprises the following steps: S01, obtaining multiple groups of bridge scouring pit sample data; S02, constructing a generative adversarial network model, wherein the model comprises at least one generator and one discriminator; S03, performing adversarial training on the generative adversarial network model by using a training data set to obtain an optimized adversarial network model; S04, inputting a bridge pile mask image to be predicted and corresponding environmental parameters into the optimized adversarial network model to obtain a predicted two-dimensional depth distribution heat map of a scouring pit around the bridge pile; and S05, performing image processing on the two-dimensional depth distribution heat map output in the step S04 to extract and generate an isobathic line map of the scouring pit.The application converts bridge and water flow information into a two-dimensional scouring pit form map and an isobathic line containing depth distribution and range through the generative adversarial network.

To achieve high key performance. [Solution] The lock system according to the embodiment comprises a light source, a spectral pattern generation unit, a sensor, and an unlocking determination unit. The light source generates light. The spectral pattern generation unit generates incident light of a spectral pattern defined for a spectral pattern based on one spectral pattern selected from a plurality of spectral pattern generation patterns, based on the light generated from the light source. The sensor has one structural pattern selected from a plurality of structural patterns, and when incident light of the spectral pattern is incident on it, it outputs a different current value according to the selected one structural pattern. The unlocking determination unit determines, based on the output of the sensor when the incident light is incident, whether the combination of the one spectral pattern generation pattern and the one structural pattern of the sensor is an expected combination.

A test pattern generation method includes: obtaining design data about a circuit under test (CUT); generating, based on the design data, a first test pattern for detecting transition delay (TD) faults and a pre-detection fault list (PDFL) including fixed type (SA) faults respectively corresponding to detectable TD faults included in the detectable TD fault list and detectable by simulation; and generating a second test pattern for detecting the SA fault based on the design data and the PDFL.

The invention provides a preparation method of a micro-groove array. The preparation method comprises the following steps: growing a mask layer on the surface of a silicon substrate; carrying out patterning processing on the mask layer; corroding the silicon substrate to obtain a first groove; forming a protective layer on the surface of the first groove; removing the mask layer, and corroding the surface of the silicon substrate which is not covered by the protective layer to form a second groove; and removing the protective layer to form a micro groove array comprising the first groove and the second groove on the silicon substrate. According to the method disclosed by the invention, the step-by-step etching and protection layer technology is adopted, so that the generation of the pattern is accurately controlled on the nanoscale, and the micro-groove array structure of which the size is less than 100nm can be effectively manufactured.

The invention provides a pattern generation method of a spiral inductor manufactured by a semiconductor process, which comprises the following steps of: setting the number of turns of a coil of the spiral inductor to be M, and setting the shape of a single-turn coil to be an N-sided polygon; the center of an N-polygon where an inner ring is located serves as an X-axis and Y-axis coordinate center original point, N areas are correspondingly divided, the first area is provided with a starting point edge and an ending point edge which are parallel to an X axis or a Y axis, and the other N-1 areas correspond to one edge of the N-polygon respectively, the difference between the distance between the starting point edge and the ending point edge and the distance between the starting point edge and the original point is S, the distance between the N + 1 sides and the original point is the following expression: r1 is the inner diameter of the N-sided coil; i = 1, 2, 3... N + 1; step is equal to S / N, and S is the sum of the line width and the line distance of the N-polygon coil; and respectively listing linear relational expressions corresponding to the areas where the N edges are located, solving an intersection point coordinate of two adjacent edges as a vertex coordinate of the N-polygon, obtaining other vertex coordinates in this way, and drawing a single-turn coil of the spiral inductor.

The application discloses a chaotic frequency hopping pattern generation quantization method, device and equipment and a storage medium. The method collects chaotic sequence samples offline and sorts them, obtains a quantization threshold value based on uniform segmentation calculation, generates chaotic sequences online, compares the chaotic sequences with the quantization threshold value, and obtains a frequency hopping frequency point sequence. The frequency hopping frequency point sequence is input into a wide interval processing unit to generate a final frequency hopping pattern. The randomicity and long-periodicity characteristics of the chaotic sequence can be effectively maintained, potential periodicity distribution is broken, and a system is prevented from staying in an easily disturbed frequency point for a long time. Finally, a frequency hopping pattern with high uniformity, strong randomicity and excellent anti-interference capability is generated, comprehensive requirements of a high-speed frequency hopping system on real-time performance, uniform distribution and anti-blocking interference are met, the uniformity and long periodicity of the frequency hopping pattern after quantization are ensured on the premise that the randomicity of the chaotic sequence is not damaged, and the speed and efficiency of chaotic frequency hopping pattern generation quantization are improved.

A memory device comprises a storage component for Logic Built-In Self-Test (LBIST) pattern seed information and an In-System Test (IST) controller. The IST controller receives a host command to initiate self-test, loads pattern seed information, triggers test execution, and provides status information to the host. The storage component may be random access memory, allowing dynamic modification of test patterns. This on-demand LBIST architecture enables fault detection during device operation and allows flexible test pattern generation that can adapt to changing requirements.

A lithography pattern generation system (1) and method configured to generate a pattern (51) of features (f) on a pattern target (5), wherein the system (1) comprises; - a mask (4) comprising through holes (3) configured to be arranged in an incoming particle beam (21), wherein the lithography pattern generation system (1) is configured to generate the pattern (51) a target distance (L2) from the mask (4) on the opposite side of the incoming particle beam (21), wherein the target distance L2 is sufficiently small to allow a majority of the intensity from transmitted beam fractions from one or more of the holes (3) to participate in creation of the features (f).

The invention discloses a method for generating color semantic consistency of digital printing patterns modulated by cross attention. The method specifically comprises the following steps: step 1, constructing a digital printing pattern data set; step 2, taking a stable diffusion model as a trunk network, and training on the data set in the step 1 to obtain a model training weight; step 3, sampling reasoning is performed by using the weight trained in the step 2, two noise predictions are included in each denoising step in the reasoning process, and in the first noise prediction, the color cross attention weight is extracted and a cross attention color modulation module is constructed; step 4, calculating color loss for the color cross attention weight extracted in the step 3; 5, updating the noise image z < t > to z < t '> through step-by-step color loss minimization and gradient descent, and carrying out noise prediction and denoising for the second time, and 6, generating a clear printing pattern through multi-step iteration denoising. The method solves the problem that an existing pattern generation method is poor in pattern color semantic consistency.

The present application relates to the technical field of integrated circuit layout detection, and particularly relates to a curve layout test pattern generation method and system based on machine learning, comprising: obtaining historical curve layout data and preprocessing to obtain an effective data set; extracting geometric and defect correlation features, and obtaining a feature matrix through correlation analysis and dimension reduction; generating a defect mode label by K-means clustering combined with contour coefficient correction clustering number; inputting the feature matrix and the label into a classification model to output parameters to generate an initial test pattern, and obtaining an optimized test pattern through redundancy and coverage optimization; importing a test system for verification, and if the verification does not meet the standard, the model is retrained, and if the verification meets the standard, the final pattern is output. The present application realizes accurate identification of defect modes with the aid of machine learning, balances detection accuracy and efficiency, improves the applicability of test patterns, and is suitable for integrated circuit curve layout detection.