277results about "Handling using diffraction/refraction/reflection" patented technology

Metamaterial optics are integrated with vacuum-boundary walls of ultra-high-vacuum (UHV) cells to manipulate light in a manner analogous to various bulk optical elements including lenses, mirrors, beam splitters, polarizers, waveplate, wave guides, frequency modulators, and amplitude modulators. For example, UHV cells can have metasurface lenses formed on interior and / or exterior surfaces on one or more of their vacuum-boundary walls. Each metasurface lens can include a plurality of mesas with the same height and various cross-sectional dimensions. The uses of metasurface lenses allows through-going laser beams to be expanded, collimated or focused without using bulky refractive optics. Each metasurface lens can be formed on a cell wall using photolithographic or other techniques.

The invention relates to a reflection optical unit (1) for focusing electromagnetic radiation (300) onto a focal plane (100), comprising at least the following components: - a central stop (12) which is arranged on an optical axis (200) of the reflection optical unit (1) and is designed to prevent electromagnetic beams (300) that are radiated into the reflection optical unit (1) along the optical axis (200) from propagating parallel to the optical axis (200), - an X-ray lens (11) having a tube (11-1) which extends at least between the central stop (12) and the focal plane (100) along the optical axis (200) of the reflection optical unit (1) and delimits a first volume (V1) radially around the optical axis (200), such that electrons (e-) generated by electromagnetic radiation in the first volume (V1) are shielded, wherein the tube (11-2) together with the central stop (12) forms a ring-shaped aperture (18), and - a solid window (13) which delimits the first volume (V1) toward the focal plane (100) and which peripherally terminates flush with the tube (11-2), wherein the solid window (13) is configured such that electrons generated by electromagnetic radiation in the first volume (V1) are shielded from the focal plane (100) by the solid window (13).

A flow through photochemistry apparatus and methods of use are disclosed in the present application. One or more reactant materials are passed through a reaction chamber and are exposed to electromagnetic radiation. The reaction chamber has reflective walls arranged to reflect electromagnetic radiation across the volume of the chamber a plurality of times, thereby increasing the probability of the electromagnetic radiation interacting with the reactive materials. The reaction chamber may be used for sterilization and photochemistry applications.

X-ray optics comprising: (i) achromatic collimation optics adapted to collimate an input X-ray beam to provide a collimated X-ray beam; (ii) an adjustable diffraction unit adapted to: (a) receive the collimated X-ray beam while being configured according to a current configuration associated with a current wavelength selected from among the different wavelengths, the current configuration being selected from among the different configurations associated with the different wavelengths; and (b) filtering the collimated X-ray beam to provide a filtered collimated X-ray beam of a current wavelength; and (iii) achromatic focusing optics configured to focus the filtered collimated X-ray beam to provide a focused filtered X-ray beam.

To provide a neutron convergence device that can be produced in a short time and a manufacturing method.SOLUTION: There is provided a neutron convergence device in which a plurality of units are connected in an axial direction and which includes a neutron supermirror having a predetermined rotational curved surface shape. Each of the plurality of units includes: a plurality of mirror segments having mirror parts constituting a portion of the neutron supermirror with the predetermined curved surface shape; a vacuum chamber; and a coupling flange to which the plurality of mirror segments and the vacuum chamber are attached. Each of the plurality of mirror segments has a flange part at one end, and the vacuum chamber has a first flange part at one end and a second flange part at the other end.SELECTED DRAWING: Figure 4

The monochromator crystal adjusting mechanism comprises a base, a flexible hinge wheel, a first driving mechanism and a second driving mechanism, the flexible hinge wheel comprises an inner wheel, an outer wheel and a plurality of flexible hinge joints, the inner wheel is located in the outer wheel, the two ends of each flexible hinge joint are connected with the inner wheel and the outer wheel respectively, and the flexible hinge joints can elastically deform under the action of external force; the inner wheel and the first driving mechanism are both fixed to the base, and the first driving mechanism is connected with the outer wheel and used for applying Z-direction force to the outer wheel so that the outer wheel can rotate around the X axis relative to the inner wheel. A rotating piece is arranged on the outer wheel, is rotationally connected with the outer wheel and can rotate around the Y axis relative to the outer wheel; the second driving mechanism is fixed to the outer wheel, connected with the rotating piece and used for driving the rotating piece to rotate around the Y axis. And a clamping mechanism is fixed on the rotating piece and is used for fixing the monochromator crystal. The adjusting mechanism of the monochromator crystal is more compact in structure, and the space utilization rate in a monochromator can be improved to a great extent.

The invention discloses a cold atom regulation and control chip device based on a composite waveguide holographic grating, and the structure is mainly composed of a silicon nitride waveguide disposed on a silicon dioxide substrate, and the silicon nitride waveguide comprises a group of x-direction waveguides and two groups of y-direction waveguides. A composite waveguide holographic grating G1 and a composite waveguide holographic grating G2 are respectively etched in the crossed area of the waveguides; the port of the y-direction waveguide is diffracted by the composite waveguide holographic grating G1 and the composite waveguide holographic grating G2 to generate two beams of vortex light, and the two beams of vortex light are intersected above the chip to form an optical dipole trap for trapping cold atoms; the x-direction waveguide is diffracted by the composite waveguide holographic grating G1 through the port Pin to generate Gaussian light, and the Gaussian light is focused and aligned with the center of the optical dipole trap. According to the invention, the functions of atom capture, atom internal state excitation and fluorescence detection can be realized on the chip, and the problem of contradictory integration compatibility of a device for regulating and controlling a plurality of cold atoms in the existing photon-atom chip is solved.

The utility model provides a large-size curved-surface thin-wall neutron beam window structure, which is applied to a high-resolution neutron diffractometer and aims to provide a high-vacuum environment for an experimental sample and a scattered neutron channel and ensure high transmittance of neutrons and mechanical strength and stability of a device at the same time. The neutron beam window structure is an integrated curved surface type structure, and the thickness of the beam window is 1.5 mm. According to the technical scheme, through strict quality detection and fatigue test, the stability and durability of the neutron beam window in actual use are ensured. In addition, potential problems can be found and processed in time through regular performance state monitoring, so that the service life of the beam window is prolonged, the maintenance cost is reduced, and more reliable and efficient support is provided for scientific research activities such as neutron diffraction experiments.

The present invention relates to a reactor and a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor includes a reaction chamber containing a showerhead, a submount, and at least one base support. The showerhead includes at least one gas outlet configured to provide a gas flow of at least one material or a gas flow of at least one component of the at least one material. The abutment is rotatable about an abutment axis of rotation. At least one substrate support is disposed on the submount and configured to rotate the substrate about a substrate axis of rotation. In particular, the substrate holder is configured to rotate the substrate about a substrate axis of rotation, where the abutment axis of rotation and the substrate axis of rotation are inclined relative to each other. The invention also relates to an X-ray microscope for generating an enlarged image of an object using X-rays.

The light source includes a linear accelerator for accelerating electron bunches to relativistic energies. The light source further includes a first grating downstream of the linear accelerator, which is positioned so that electron bunches pass through it to produce a diffraction pattern. The light source further includes an emittance exchange device downstream of the first grating, which rotates the diffraction pattern in a direction substantially parallel to the propagation direction of the electron bunches. The light source further includes a laser that generates light pulses. The light source is configured such that the light pulses from the laser interact with the electron bunches in an overtaking geometry at an interaction point downstream of the emittance exchange device, while the diffraction pattern is substantially parallel to the propagation direction of the electron bunches to produce light via inverse Compton scattering.

The invention belongs to the technical field of micro-nano processing, and particularly relates to a Pt-HSQ-based high-resolution X-ray Fresnel zone plate and a preparation method thereof. According to the X-ray Fresnel zone plate, a Pt-HSQ metal-inorganic material system is adopted, a diffraction structure with a large aspect ratio and Pt material quasi-periodic dense stripes specially needed by an X-ray zone plate lens is formed through electron beam lithography and an ALD process, and diffraction focusing from a soft X-ray wave band to a hard X-ray wave band and imaging with an amplification function are achieved. The wave zone plate has excellent mechanical stability, and the irradiation resistance and morphology retentivity of the wave zone plate under high-energy irradiation are remarkably improved. And high-resolution X-ray focusing elements with different energy wavebands and different focal lengths can be prepared according to geometric design and material selection of the wave zone plate. The lens is suitable for microscopic imaging, coherent diffraction imaging, X-ray spectrum, nanometer detection and other scenes of a synchrotron radiation or off-line laboratory X-ray light source, and has wide popularization value and application prospect.

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 µm-1 or more and 20 µm-1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 µm × 10 µm with an atomic force microscope.

A method for evaluating a sample, the method includes (a) illuminating a liquid metal jet alloyed with aluminum with an electron beam to provide a first x-ray beam; (b) spectral filtering, by a filtering unit, the first x-ray beam to provide a second x-ray beam; (c) illuminating a sample with the second x-ray beam; and (e) detecting x-ray radiation emitted from the sample as a result of the illuminating of the sample.

The application provides a deformable mirror assembly, comprising: a deformable mirror mirror body, a back surface of which is provided with a telescopic piezoelectric actuator, which comprises a plurality of linearly arranged actuating units; a pad, which is arranged on the back surface of the deformable mirror mirror body; a control system, which is used for providing an actuating alternating voltage to the telescopic piezoelectric actuator, so that the sinusoidal vibration of different actuating units adopts random amplitude and random phase; the peak-to-valley maximum amplitude of the mirror surface of the deformable mirror mirror body caused by the sinusoidal vibration overcomes the Rayleigh criterion, and the periodicity of the spatial frequency is destroyed through the randomness of the phase of the actuating unit, so that the homogenization of the light beam speckle is realized when the deformable mirror mirror body is used for light beam deflection. The application also provides a corresponding two-dimensional optical system. The deformable mirror assembly of the application improves the speckle homogeneity in the imaging process and reduces the influence of the speckle.

The utility model provides an ion trap device and quantum computing equipment comprising the ion trap device, and the ion trap device comprises an ion trap; the cavity is used for sealing the ion trap; the plane window is arranged on the side wall of the cavity; the spherical reflector is arranged in the cavity and is concave towards the plane window, the curvature radius of the spherical reflector is twice of the focal length of the spherical reflector, and ions trapped in the ion trap are arranged at the curvature center of the spherical reflector; the diffraction limit aspherical lens is arranged on the side, close to the plane window, in the cavity, and the spherical reflector, the ion and the diffraction limit aspherical lens are coaxially arranged. By using the ion trap device provided by the utility model, the fluorescence collection efficiency of the ion trap can be improved without using an objective lens, and for quantum computing equipment, more accurate, more reliable and more efficient quantum computing can be realized.

A reflective mask blank has a substrate; and a multilayer reflective film provided on the substrate and configured to reflect exposure light. The multilayer reflective film has a periodic layered structure portion including a low refractive index layer and a high refractive index layer. The low refractive index layer contains ruthenium (Ru), and further contains one or both of carbon (C) and silicon (Si).

The invention relates to a method for manufacturing an EUV mirror component (M1-M6, 40), in which method a multilayer coating system (31) is applied to a surface of a mirror body substrate (30, 37) in order to form an optical surface that is highly reflective for EUV radiation. A temporary protective layer structure (36) is created on the multilayer coating system (31). The protective layer structure (36) comprises a protective layer (35) and a sacrificial layer (34) located between the protective layer (35) and the multilayer coating system (31). The sacrificial layer (34) is a layer produced by oxidising a layer of the multilayer coating system (31). The temporary protective layer structure (36) is removed before the EUV mirror component is put into operation. The invention also relates to an intermediate product of an EUV mirror component.

A trap for ions or neutral atoms is specified, comprising:- an optical system (1) for collecting a fluorescence emission (2) from trapped ions or trapped neutral atoms (3), wherein- the optical system (1) comprises a substrate (4) with a nanostructured surface (5), and- the nanostructured surface (5) is configured to focus and / or redirect the incident fluorescence emission (2).

To provide a loading assembly configured for providing atomic objects to a nuclear object containment device.SOLUTION: In a loading assembly 200 including one or more ovens 205A and 205B having oven nozzles 208A and 208B that generate respective atomic fluxes of atomic species, when optical beams are provided to a mirror array 214 and a magnet array 212, a two-dimensional magneto-optical trap (2DMOT) configured to generate substantially parallel beams of atoms from their respective atomic fluxes is generated and a differential exhaust tube 230 provides a substantially parallel atomic beam along a beam path 235. Each oven nozzle 208 A, 208 B is offset from a beam path axis 250, and 2DMOT is configured to provide an atomic beam substantially parallel to the beam path axis 250.SELECTED DRAWING: Figure 3

The invention described herein is a spectrometer having components allowing remote orientation of crystal analyzer and detector.

To provide a target supply system that suppresses generation of a defective target formation.SOLUTION: A target supply system comprises: a target generating part which fuses a solid target substance inside thereof to generate a liquid target substance, and ejects the liquid target substance; a loading mechanism which loads the solid target substance into the target generating part; a heater which is arranged for the target generating part; a sensor which detects the temperature of the target generating part; and a processor which controls loading timing at which the solid target substance is loaded into the target generating part, feedback-controls the heater on the basis of the current temperature detected by the sensor, and feed-forward controls the heater on the basis of the loading timing while feedback-controlling the heater.SELECTED DRAWING: Figure 14

The invention discloses an X-ray focusing optical system based on coupling of a single capillary tube and a refraction lens and a manufacturing method, and belongs to the technical field of X-ray focusing optical devices. Comprising an X-ray light source, a single-capillary X-ray lens and a two-dimensional diamond refraction lens, the two-dimensional diamond refraction lens is arranged between the X-ray light source and the single-capillary X-ray lens, and the focal points of the single-capillary X-ray lens and the two-dimensional diamond refraction lens coincide; the single-capillary X-ray lens is a paraboloid type single-capillary X-ray lens or an ellipsoid type single-capillary X-ray lens, and the two-dimensional diamond refraction lens is of a revolution paraboloid structure. The two-dimensional diamond refraction lens is adopted to replace a traditional light beam stopper, the design that the focus of the single-capillary X-ray lens and the focus of the two-dimensional diamond refraction lens coincide is combined, double focusing regulation and control of X-rays are achieved, and optical loss is greatly reduced.

The invention discloses a vacuum adsorption large-size spherical curved crystal monochromator and a preparation method thereof. The crystal diffraction unit comprises a polycarbonate sheet and a plurality of stripes obtained by cutting the crystal diffraction unit, all the strips are bonded to the polycarbonate sheet and cured, and a combined body is obtained; taking the surface with the strip as the upper surface of the assembly; the lower surface of the assembly is placed on the concave spherical surface of a porous ceramic plate, gas between the lower surface of the assembly and the concave spherical surface of the porous ceramic plate is removed through vacuum adsorption, and the assembly is bent to obtain the spherical curved crystal monochromator. According to the invention, the problem of non-uniform stress of the crystal in the bending process is solved, and the problems that the wafer is easy to break and generates microcracks when the germanium crystal is bent to the curvature radius of less than or equal to 0.5 m are avoided; and meanwhile, the problem that vacuum sealing is not easy due to large curvature is solved.

Provided is a beam shaping body (131) for a neutron capture therapy system (100), comprising: a retarder (1312) used for decelerating neutrons of a neutron beam (N) to epithermal neutrons; a reflector (1313) surrounding the retarder (1312) and used for reflecting neutrons deviating from the neutron beam (N) back to the neutron beam (N) so as to improve the intensity of the neutron beam (N); and an epithermal neutron flux enhancer (1316) used for improving an epithermal neutron flux in the neutron beam (N) and provided in the retarder (1312) and / or in the reflector (1313) and / or between the retarder (1312) and the reflector (1313). Further provided is the neutron capture therapy system (100) comprising the beam shaping body (131), the epithermal neutron flux enhancer (1316) is provided in the beam shaping body (131) to increase the epithermal neutron flux in the neutron beam (N), so that the flux and quality of a neutron source are improved.

The present invention is directed to a method for printing a micro-scaled or nano-scaled XUV and / or X-ray Diffractive optic (1), including the following steps: a) providing a material (2) with a first component (2a) being photo-sensitive and being polymerizable by two-photon-absorption, b) providing data (3) of a desired geometrical structure (4) of the optic (1) and creating at least one trajectory (8) corresponding to the data (3) of the desired structure (4) of the optic (1), c) providing a high-intensity energy beam (5), in particular a laser beam, wherein the beam (5) comprises a focus (F) having a position being adjustable to a plurality of positions (F1, F2, <, Fp) being coincident with the at least one trajectory (8), d) polymerization of the material (2) by two-photon-absorption at a first position (Fn) of the focus (F), thereby creating a first voxel (vn1n2n3) of the structure (4) of the optic (1), adjusting the position of the focus (F) from the first position (Fn) to a subsequent position (Fn+1) of the focus (F) along the at least one trajectory (8) and repeating step d) at the subsequent position (Fn+1) of the focus (F), wherein a distance (d) between each of the positions (F1, F2, <, Fp) of the focus (F) and at least one of the rest of the positions (F1, F2, <, Fp) of the focus (F) is smaller than a mean diameter (vd) of the voxels produced at these positions with respect to their dimension parallel to the distance (d).

To provide an extreme ultraviolet light generation apparatus capable of suppressing a decrease in reliability.SOLUTION: An extreme ultraviolet light generation apparatus may include: a chamber; a housing extending from the internal space to outside of the chamber, surrounding the plasma generation region except on a trajectory of the droplet target at the internal space and on an optical path of the laser light to the plasma generation region at the internal space, and including a first opening through which extreme ultraviolet light generated from the plasma passes; a light concentrating mirror arranged in a first space outside the housing at the internal space and configured to reflect the extreme ultraviolet light having passed through the first opening in a direction different from an incident direction of the extreme ultraviolet light; a gas supply port provided in the chamber and configured to supply a gas from outside of the chamber to the first space; and a gas exhaust port provided at the housing outside the chamber and configured to exhaust the gas flowing from the first space to a second space inside of the housing through the first opening to the outside of the chamber, wherein an optical axis of the laser light when being radiated to the droplet target may be along a direction in which the gas flows in the plasma generation region.SELECTED DRAWING: Figure 7

The invention discloses a single-capillary X-ray lens for soft X-ray regulation and control and a manufacturing method thereof, and the lens specifically comprises an inner reflection layer which is a thin film arranged on the inner wall of the lens and is used for total reflection transmission of soft X-rays; the supporting layer is a metal shell layer arranged on the outer wall of the inner reflecting layer and is used for providing structural support for the lens; wherein the inner reflecting layer and the supporting layer jointly form an ellipsoid-shaped hollow inner cavity channel, one end of the ellipsoid-shaped hollow inner cavity channel is an inlet end, and the other end of the ellipsoid-shaped hollow inner cavity channel is an outlet end. The problems that in the prior art, a hollow blank is deformed due to uneven heat transfer, and single thermal separation is low in efficiency and prone to deformation are solved, the supporting layer and the inner reflection layer are designed to be of a composite structure, the supporting layer and the inner reflection layer are firmly combined and cooperatively matched, the soft X-ray tube has the advantages of being compact in structure, excellent in optical performance and good in mechanical stability, and meanwhile efficient regulation and control over soft X-rays are achieved.

The present disclosure relates to a low-stress thin film comprising a number of bilayers, wherein a bilayer comprises a first layer comprising M, and a second layer comprising X; and wherein at least one of the first layer and the second layer comprises at least one of 11B4C, 10B4C, B4C, 11B, 10B, B and C. The present disclosure 5 also relates to use and a method of producing said low-stress thin film.

Provided is a multilayer reflective film-equipped substrate having a multilayer reflective film which has a shallow effective reflection surface and in which it is possible to suppress the phenomenon in which atoms serving as a material are diffused between a low-refractive-index layer and a high-refractive-index layer.　This multilayer reflective film-equipped substrate has a substrate (1) and a multilayer reflective film (2) provided on the substrate and is characterized in that: the multilayer reflective film includes a multilayer film in which a low-refractive-index layer (24) and a high-refractive-index layer (22) including silicon (Si) are alternatingly layered; the multilayer reflective film further includes at least one intermediate layer (26) disposed between the low-refractive-index layer and the high-refractive-index layer; the multilayer reflective film includes at least one added element selected from nitrogen (N), carbon (C), and oxygen (O); and the content of the added element in the multilayer reflective film is no more than 40 at%.