187results about "Handling using diffraction/refraction/reflection" patented technology

Metamaterial optics are integrated with vacuum-boundary walls of ultra-high-vacuum (UHV) cells to manipulate light in a manner analogous to various bulk optical elements including lenses, mirrors, beam splitters, polarizers, waveplate, wave guides, frequency modulators, and amplitude modulators. For example, UHV cells can have metasurface lenses formed on interior and / or exterior surfaces on one or more of their vacuum-boundary walls. Each metasurface lens can include a plurality of mesas with the same height and various cross-sectional dimensions. The uses of metasurface lenses allows through-going laser beams to be expanded, collimated or focused without using bulky refractive optics. Each metasurface lens can be formed on a cell wall using photolithographic or other techniques.

The invention relates to a reflection optical unit (1) for focusing electromagnetic radiation (300) onto a focal plane (100), comprising at least the following components: - a central stop (12) which is arranged on an optical axis (200) of the reflection optical unit (1) and is designed to prevent electromagnetic beams (300) that are radiated into the reflection optical unit (1) along the optical axis (200) from propagating parallel to the optical axis (200), - an X-ray lens (11) having a tube (11-1) which extends at least between the central stop (12) and the focal plane (100) along the optical axis (200) of the reflection optical unit (1) and delimits a first volume (V1) radially around the optical axis (200), such that electrons (e-) generated by electromagnetic radiation in the first volume (V1) are shielded, wherein the tube (11-2) together with the central stop (12) forms a ring-shaped aperture (18), and - a solid window (13) which delimits the first volume (V1) toward the focal plane (100) and which peripherally terminates flush with the tube (11-2), wherein the solid window (13) is configured such that electrons generated by electromagnetic radiation in the first volume (V1) are shielded from the focal plane (100) by the solid window (13).

X-ray optics comprising: (i) achromatic collimation optics adapted to collimate an input X-ray beam to provide a collimated X-ray beam; (ii) an adjustable diffraction unit adapted to: (a) receive the collimated X-ray beam while being configured according to a current configuration associated with a current wavelength selected from among the different wavelengths, the current configuration being selected from among the different configurations associated with the different wavelengths; and (b) filtering the collimated X-ray beam to provide a filtered collimated X-ray beam of a current wavelength; and (iii) achromatic focusing optics configured to focus the filtered collimated X-ray beam to provide a focused filtered X-ray beam.

The present invention relates to a reactor and a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor includes a reaction chamber containing a showerhead, a submount, and at least one base support. The showerhead includes at least one gas outlet configured to provide a gas flow of at least one material or a gas flow of at least one component of the at least one material. The abutment is rotatable about an abutment axis of rotation. At least one substrate support is disposed on the submount and configured to rotate the substrate about a substrate axis of rotation. In particular, the substrate holder is configured to rotate the substrate about a substrate axis of rotation, where the abutment axis of rotation and the substrate axis of rotation are inclined relative to each other. The invention also relates to an X-ray microscope for generating an enlarged image of an object using X-rays.

The light source includes a linear accelerator for accelerating electron bunches to relativistic energies. The light source further includes a first grating downstream of the linear accelerator, which is positioned so that electron bunches pass through it to produce a diffraction pattern. The light source further includes an emittance exchange device downstream of the first grating, which rotates the diffraction pattern in a direction substantially parallel to the propagation direction of the electron bunches. The light source further includes a laser that generates light pulses. The light source is configured such that the light pulses from the laser interact with the electron bunches in an overtaking geometry at an interaction point downstream of the emittance exchange device, while the diffraction pattern is substantially parallel to the propagation direction of the electron bunches to produce light via inverse Compton scattering.

The invention belongs to the technical field of micro-nano processing, and particularly relates to a Pt-HSQ-based high-resolution X-ray Fresnel zone plate and a preparation method thereof. According to the X-ray Fresnel zone plate, a Pt-HSQ metal-inorganic material system is adopted, a diffraction structure with a large aspect ratio and Pt material quasi-periodic dense stripes specially needed by an X-ray zone plate lens is formed through electron beam lithography and an ALD process, and diffraction focusing from a soft X-ray wave band to a hard X-ray wave band and imaging with an amplification function are achieved. The wave zone plate has excellent mechanical stability, and the irradiation resistance and morphology retentivity of the wave zone plate under high-energy irradiation are remarkably improved. And high-resolution X-ray focusing elements with different energy wavebands and different focal lengths can be prepared according to geometric design and material selection of the wave zone plate. The lens is suitable for microscopic imaging, coherent diffraction imaging, X-ray spectrum, nanometer detection and other scenes of a synchrotron radiation or off-line laboratory X-ray light source, and has wide popularization value and application prospect.

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 µm-1 or more and 20 µm-1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 µm × 10 µm with an atomic force microscope.

The application provides a deformable mirror assembly, comprising: a deformable mirror mirror body, a back surface of which is provided with a telescopic piezoelectric actuator, which comprises a plurality of linearly arranged actuating units; a pad, which is arranged on the back surface of the deformable mirror mirror body; a control system, which is used for providing an actuating alternating voltage to the telescopic piezoelectric actuator, so that the sinusoidal vibration of different actuating units adopts random amplitude and random phase; the peak-to-valley maximum amplitude of the mirror surface of the deformable mirror mirror body caused by the sinusoidal vibration overcomes the Rayleigh criterion, and the periodicity of the spatial frequency is destroyed through the randomness of the phase of the actuating unit, so that the homogenization of the light beam speckle is realized when the deformable mirror mirror body is used for light beam deflection. The application also provides a corresponding two-dimensional optical system. The deformable mirror assembly of the application improves the speckle homogeneity in the imaging process and reduces the influence of the speckle.

A reflective mask blank has a substrate; and a multilayer reflective film provided on the substrate and configured to reflect exposure light. The multilayer reflective film has a periodic layered structure portion including a low refractive index layer and a high refractive index layer. The low refractive index layer contains ruthenium (Ru), and further contains one or both of carbon (C) and silicon (Si).

To provide a loading assembly configured for providing atomic objects to a nuclear object containment device.SOLUTION: In a loading assembly 200 including one or more ovens 205A and 205B having oven nozzles 208A and 208B that generate respective atomic fluxes of atomic species, when optical beams are provided to a mirror array 214 and a magnet array 212, a two-dimensional magneto-optical trap (2DMOT) configured to generate substantially parallel beams of atoms from their respective atomic fluxes is generated and a differential exhaust tube 230 provides a substantially parallel atomic beam along a beam path 235. Each oven nozzle 208 A, 208 B is offset from a beam path axis 250, and 2DMOT is configured to provide an atomic beam substantially parallel to the beam path axis 250.SELECTED DRAWING: Figure 3

The invention described herein is a spectrometer having components allowing remote orientation of crystal analyzer and detector.

To provide a target supply system that suppresses generation of a defective target formation.SOLUTION: A target supply system comprises: a target generating part which fuses a solid target substance inside thereof to generate a liquid target substance, and ejects the liquid target substance; a loading mechanism which loads the solid target substance into the target generating part; a heater which is arranged for the target generating part; a sensor which detects the temperature of the target generating part; and a processor which controls loading timing at which the solid target substance is loaded into the target generating part, feedback-controls the heater on the basis of the current temperature detected by the sensor, and feed-forward controls the heater on the basis of the loading timing while feedback-controlling the heater.SELECTED DRAWING: Figure 14

The invention discloses an X-ray focusing optical system based on coupling of a single capillary tube and a refraction lens and a manufacturing method, and belongs to the technical field of X-ray focusing optical devices. Comprising an X-ray light source, a single-capillary X-ray lens and a two-dimensional diamond refraction lens, the two-dimensional diamond refraction lens is arranged between the X-ray light source and the single-capillary X-ray lens, and the focal points of the single-capillary X-ray lens and the two-dimensional diamond refraction lens coincide; the single-capillary X-ray lens is a paraboloid type single-capillary X-ray lens or an ellipsoid type single-capillary X-ray lens, and the two-dimensional diamond refraction lens is of a revolution paraboloid structure. The two-dimensional diamond refraction lens is adopted to replace a traditional light beam stopper, the design that the focus of the single-capillary X-ray lens and the focus of the two-dimensional diamond refraction lens coincide is combined, double focusing regulation and control of X-rays are achieved, and optical loss is greatly reduced.

Provided is a beam shaping body (131) for a neutron capture therapy system (100), comprising: a retarder (1312) used for decelerating neutrons of a neutron beam (N) to epithermal neutrons; a reflector (1313) surrounding the retarder (1312) and used for reflecting neutrons deviating from the neutron beam (N) back to the neutron beam (N) so as to improve the intensity of the neutron beam (N); and an epithermal neutron flux enhancer (1316) used for improving an epithermal neutron flux in the neutron beam (N) and provided in the retarder (1312) and / or in the reflector (1313) and / or between the retarder (1312) and the reflector (1313). Further provided is the neutron capture therapy system (100) comprising the beam shaping body (131), the epithermal neutron flux enhancer (1316) is provided in the beam shaping body (131) to increase the epithermal neutron flux in the neutron beam (N), so that the flux and quality of a neutron source are improved.

The present invention is directed to a method for printing a micro-scaled or nano-scaled XUV and / or X-ray Diffractive optic (1), including the following steps: a) providing a material (2) with a first component (2a) being photo-sensitive and being polymerizable by two-photon-absorption, b) providing data (3) of a desired geometrical structure (4) of the optic (1) and creating at least one trajectory (8) corresponding to the data (3) of the desired structure (4) of the optic (1), c) providing a high-intensity energy beam (5), in particular a laser beam, wherein the beam (5) comprises a focus (F) having a position being adjustable to a plurality of positions (F1, F2, <, Fp) being coincident with the at least one trajectory (8), d) polymerization of the material (2) by two-photon-absorption at a first position (Fn) of the focus (F), thereby creating a first voxel (vn1n2n3) of the structure (4) of the optic (1), adjusting the position of the focus (F) from the first position (Fn) to a subsequent position (Fn+1) of the focus (F) along the at least one trajectory (8) and repeating step d) at the subsequent position (Fn+1) of the focus (F), wherein a distance (d) between each of the positions (F1, F2, <, Fp) of the focus (F) and at least one of the rest of the positions (F1, F2, <, Fp) of the focus (F) is smaller than a mean diameter (vd) of the voxels produced at these positions with respect to their dimension parallel to the distance (d).

To provide an extreme ultraviolet light generation apparatus capable of suppressing a decrease in reliability.SOLUTION: An extreme ultraviolet light generation apparatus may include: a chamber; a housing extending from the internal space to outside of the chamber, surrounding the plasma generation region except on a trajectory of the droplet target at the internal space and on an optical path of the laser light to the plasma generation region at the internal space, and including a first opening through which extreme ultraviolet light generated from the plasma passes; a light concentrating mirror arranged in a first space outside the housing at the internal space and configured to reflect the extreme ultraviolet light having passed through the first opening in a direction different from an incident direction of the extreme ultraviolet light; a gas supply port provided in the chamber and configured to supply a gas from outside of the chamber to the first space; and a gas exhaust port provided at the housing outside the chamber and configured to exhaust the gas flowing from the first space to a second space inside of the housing through the first opening to the outside of the chamber, wherein an optical axis of the laser light when being radiated to the droplet target may be along a direction in which the gas flows in the plasma generation region.SELECTED DRAWING: Figure 7

The invention discloses a single-capillary X-ray lens for soft X-ray regulation and control and a manufacturing method thereof, and the lens specifically comprises an inner reflection layer which is a thin film arranged on the inner wall of the lens and is used for total reflection transmission of soft X-rays; the supporting layer is a metal shell layer arranged on the outer wall of the inner reflecting layer and is used for providing structural support for the lens; wherein the inner reflecting layer and the supporting layer jointly form an ellipsoid-shaped hollow inner cavity channel, one end of the ellipsoid-shaped hollow inner cavity channel is an inlet end, and the other end of the ellipsoid-shaped hollow inner cavity channel is an outlet end. The problems that in the prior art, a hollow blank is deformed due to uneven heat transfer, and single thermal separation is low in efficiency and prone to deformation are solved, the supporting layer and the inner reflection layer are designed to be of a composite structure, the supporting layer and the inner reflection layer are firmly combined and cooperatively matched, the soft X-ray tube has the advantages of being compact in structure, excellent in optical performance and good in mechanical stability, and meanwhile efficient regulation and control over soft X-rays are achieved.

The present disclosure relates to a low-stress thin film comprising a number of bilayers, wherein a bilayer comprises a first layer comprising M, and a second layer comprising X; and wherein at least one of the first layer and the second layer comprises at least one of 11B4C, 10B4C, B4C, 11B, 10B, B and C. The present disclosure 5 also relates to use and a method of producing said low-stress thin film.

Provided in the present disclosure is a real-time manipulation device for microscopic particles, comprising: a first laser, configured to generate a first laser beam; an optical tweezer array generation assembly, comprising: a spatial light modulator configured to modulate a wavefront of the first laser beam on the basis of received intermediate holograms to obtain a first modulated laser beam and modulate the wavefront of the first laser beam on the basis of a received target hologram to obtain a second modulated laser beam, and a focusing assembly configured to focus the first modulated laser beam to produce an intermediate optical tweezer array and configured to focus the second modulated laser beam to produce a target optical tweezer array; and a real-time processing assembly, configured to simultaneously determine a plurality of intermediate holograms on the basis of respective initial positions and respective final positions of a plurality of target microscopic particles, the real-time processing assembly is further configured to transmit the plurality of intermediate holograms to the optical tweezer array generation assembly in a time sequence, and the real-time processing assembly is further configured to transmit the target hologram to the optical tweezer array generation assembly.

The invention relates to a system for converting an electron beam into a photon beam, the system comprising: an electron accelerator (1) configured to generate an electron beam (10) of accelerated electrons along an irradiation axis (Z), a scanning unit (2), a focusing unit (3) for forming a focused beam (10f) converging towards a first focus point (Fx) located on the irradiation axis (Z), a conversion unit (4) located between the focusing unit (3) and the first focus point (Fx) and comprising one or more bremsstrahlung converters (4 .1‑4.n), the one or more bremsstrahlung converters being configured to convert the focused beam (10f) into a photon beam (11x), a target holder (5h), the target holder being configured to hold a target (5), characterised in that the one or more bremsstrahlung converters (4.1‑4.n) are curved so that an intersection angle (α) at ​​which the focused beam (10f) intersects each of the one or more bremsstrahlung converters (4.1‑4.n) is between 65° and 115° at all points, preferably between 75° and 105° at all points.

The invention relates to a polycapillary optical unit, in particular for X-ray radiation, consisting of a bundle of capillaries (32), with the capillaries (32) each having a length which is a multiple of a diameter of the capillary (32), having an entry side (34) for a radiation to be coupled in from a radiation source, having an exit side (36) which is opposite the entry side (34), from where the input-coupled radiation arrives at the exit side (36) by way of total-internal reflection off the respective inner wall, and which is where said input-coupled radiation exits, wherein the capillaries (32) are curved toward the exit side (36) such that the exiting radiation is focused on a focus (37) at a focal length (f2), wherein the at least one capillary (32) has a capillary portion (38) oriented toward the exit side (36), the inner wall (31) of the at least one capillary (32) having a surface (33) that prevents total-internal reflection at least in sections along said capillary portion.

In order to improve the resolution of a light-emitting substance image excited by X-rays, provided is a microscope (100) provided with an X-ray irradiation unit and an observation optical system. The X-ray irradiation unit (10) generates a patterned X-ray sheet beam (1) for illuminating an object to be observed (7). The patterned X-ray sheet beam has an intensity pattern (2) in which the intensity varies repeatedly with respect to a position in a certain direction included in the spread in a partial region (32) in the sheet region (3) having the spread. The observation optical system (50) receives radiation having an observation wavelength from an observation region (4) disposed so as to include at least a part of the partial region. The embodiment of the invention also provides a shooting method of the light-emitting substance image.

The invention relates to an optical system, in particular for microlithography, having at least one optical element (100, 200, 300, 400) that comprises a substrate (105, 205, 305, 405) and at least one optically effective layer system (110, 210, 310, 311, 410) situated on this substrate (105, 205, 305, 405), and at least one monitoring unit (120, 220, 240, 320, 340) for monitoring a degradation state of this layer system (110, 210, 310, 311, 410), wherein the monitoring unit (120, 220, 240, 320, 340) comprises a detector (121, 221, 241, 321, 341) for detecting non-directed radiation (130, 230, 330, 430) that emanates from the optical element (100, 200, 300, 400) during the operation of the optical system, wherein the non-directed radiation (130, 230, 330, 430) detected by the detector comprises fluorescence radiation that is caused or modified in the event of an interaction of the layer system of the optical element with used light pre-sent during the operation of the optical system.

An optical trap for laser cooling and trapping atoms without needing a magnetic field. Three pairs of parallel counterpropagating laser beams are directed to cross in a vacuum chamber to form a trapping volume. Rather than having a mutually orthogonal arrangement in which the optical axes of each beam pair forms an angle χ of 45° to a reference axis, z, these angles are instead between 5° ≤ χ ≤ 40° to form a tripod-like arrangement. The beam pairs each have a significant overlap between their counter-propagating beams within the trapping volume which can be defined by the sum of the beam half-widths of the beams of each pair not exceeding twice the beam pair separation distance. Moreover, for good trap formation, at least one of the parallel beam pairs should be sufficiently separated, having a beam half-width sum of at least a quarter of the separation distance.

One aspect of the present invention relates to a beam shaper (131) used in a neutron capture therapy system (100). The beam shaper (131) includes a moderator (1312), a reflector (1313), and an epithermal neutron flux increaser (1316), where the moderator (1312) moderates neutrons of a neutron beam (N) into epithermal neutrons, the reflector (1313) surrounds the moderator (1312) and reflects neutrons that deviate from the neutron beam (N) back into the neutron beam (N) to increase the intensity of the neutron beam (N), and the epithermal neutron flux increaser (1316) increases the epithermal neutron flux in the neutron beam (N) and is installed within the moderator (1312) and / or the reflector (1313) and / or between the moderator (1312) and the reflector (1313). Another aspect of the present invention relates to a neutron capture therapy system (100) including the beam shaper (131). By installing an epithermal neutron flux increaser (1316) within the beam shaper (131), the epithermal neutron flux in the neutron beam (N) is increased to improve the flux and quality of the neutron source.

The invention described herein is a spectrometer having components allowing remote orientation of crystal analyzer and detector.

A multi-mirror laser sustained plasma broadband light source is disclosed.SOLUTION: The light source may include a gas containment structure for containing a gas. The light source includes a pump source 202 configured to generate pump illumination 204 and a first reflector element 206 configured to direct a portion of the pump illumination 204 into a gas to sustain a plasma. The first reflector is configured to collect a portion of the broadband light emitted from the plasma. The light source also includes one or more additional reflector elements 214 disposed opposite the first reflector. The one or more additional reflector elements 214 are configured to reflect unabsorbed pump illumination 204 and broadband light not collected by the first reflector element 206 back to the plasma.SELECTED DRAWING: Figure 2A

The invention provides a multilayer film reflector with an 8keV energy point and a preparation method of the multilayer film reflector, and belongs to the technical field of optical thin film manufacturing. Aiming at the energy point of 8keV, proper W layer and Si layer materials are selected, a genetic algorithm and film layer optimization are combined to carry out film system design, and the designed film layer is prepared by using magnetron sputtering equipment. Angle broadening is carried out in the 8keV field, and technical breakthrough is achieved. Through the thought of changing efficiency through optical design, the angle broadening acceptance range of the multi-layer film is enlarged by three times, and the core contradiction that luminous flux loss and light beam divergence are not matched in X-ray optics is directly solved.