406results about "Handling using diffraction/refraction/reflection" patented technology

An apparatus includes a plurality of stacked flat Bragg diffractors having at least a first flat Bragg diffractor and a second flat Bragg diffractor. The first and second flat Bragg diffractors are positioned sequentially along an x-ray propagation axis of an x-ray beam. The x-ray beam includes x-rays and has an angular beam divergence less than 30 mrad in at least one direction.

A real-time manipulating device for microscopic particles comprises a first laser suitable for generating first laser light; the optical tweezer array generation assembly comprises a spatial light modulator which is suitable for modulating the wavefront of the first laser according to the received middle hologram to obtain a first modulated laser and modulating the wavefront of the first laser according to the received target hologram to obtain a second modulated laser; the focusing assembly is suitable for focusing the first modulated laser to generate an intermediate optical tweezers array, and is suitable for focusing the second modulated laser to generate a target optical tweezers array; the real-time processing assembly is suitable for simultaneously determining a plurality of middle holograms according to respective initial positions and respective final positions of the plurality of target microscopic particles, and is also suitable for transmitting the plurality of middle holograms to the optical tweezer array generation assembly according to a time sequence; the real-time processing assembly is also suitable for transmitting the target hologram to the optical tweezers array generation assembly.

The invention discloses a weak-rigidity free-form surface monocrystalline silicon reflecting lens and a processing method thereof. The method comprises the following steps: obtaining a monocrystalline silicon block; cutting into blocks; diamond wire cutting; precisely grinding the back surface; performing slicing; the free-form surface sucker adsorbs the lens; precisely grinding the front surface into a cylindrical surface; polishing the magnetorheological elastomer; releasing the lens; the cylindrical sucker adsorbs the lens; precisely grinding and thinning the back surface; releasing the lens; cutting edges and carrying out wet etching on the back surface; and carrying out ion beam modification processing to achieve the final surface shape precision of the free-form surface. According to the X-ray reflecting lens machining method, the free-form surface weak-rigidity reflecting mirror is clamped and deformed into the cylindrical surface for machining, the whole process is ultra-precision grinding and polishing of the cylindrical surface, the machining method is simple and mature, the manufacturing cost is extremely low, dependence on an ultra-high-precision multi-axis linkage machine tool is completely eliminated, and the machining precision is greatly improved. And the machining efficiency is greatly improved, and the method is suitable for mass production of reflectors.

An optical bench system is provided. The optical bench system includes an array of beam-customized optical components, wherein the array of beam-customized optical components comprises a plurality of beam-customized optical components; and a relay component. Each beam-customized optical component of the plurality of beam-customized optical components is configured to control optical properties of a respective optical beam of a plurality of optical beams to provide a plurality of property-controlled optical beams. The relay component is configured to relay the plurality of property-controlled optical beams to respective target locations of an array of target locations.

The utility model discloses a holographic optical tweezers device for eliminating zero-order diffraction, and the device comprises a laser which is used for emitting a first laser beam; the beam expanding and collimating module is used for controlling the diameter of the first laser beam to obtain a third laser beam; the spatial light modulator is used for carrying out light field modulation on the third laser beam, and the modulated light field is formed after focusing; and the reflection filtering module is used for filtering zero-order diffraction light interference and adjusting a light path. Zero-order diffraction light interference is filtered through the reflection filtering module, meanwhile, the occupied space of an optical path system is effectively reduced, the problems that an optical tweezers system is too large in occupied space and inconvenient to carry in the aspect of optical path construction, an optical path is interfered by zero-order diffraction light, optical path equipment is inconvenient to finely adjust and the like are solved, and the operation process of the optical tweezers is optimized.

A mirror, a mirror substrate, a method for producing are provided. The mirror substrate is made of a material having a coefficient of mean linear thermal expansion of less than or equal to 1*10−6 / K. The mirror substrate includes at least one feature selected from a group consisting of: a ratio of a lateral dimension to a maximum thickness of at least 100, a ratio of the lateral dimension to the maximum thickness of at least 150, a ratio of the lateral dimension to the maximum thickness of at least 200, a ratio of the lateral dimension to the maximum thickness of at least 300, a weight per unit area of 100 kg / m2 or less, a weight per unit area of 50 kg / m2 or less, a weight per unit area of 30 kg / m2 or less, a weight per unit area of 15 kg / m2 or less, a mirror surface with a roughness (Ra) of at most 3.5 μm, and a mirror surface with a roughness (Ra) of less than 1.2 μm.

Metamaterial optics are integrated with vacuum-boundary walls of ultra-high-vacuum (UHV) cells to manipulate light in a manner analogous to various bulk optical elements including lenses, mirrors, beam splitters, polarizers, waveplate, wave guides, frequency modulators, and amplitude modulators. For example, UHV cells can have metasurface lenses formed on interior and / or exterior surfaces on one or more of their vacuum-boundary walls. Each metasurface lens can include a plurality of mesas with the same height and various cross-sectional dimensions. The uses of metasurface lenses allows through-going laser beams to be expanded, collimated or focused without using bulky refractive optics. Each metasurface lens can be formed on a cell wall using photolithographic or other techniques.

A micro-fabricated device (400A) for controlling trapped ions includes a first ion trap module (2A) including first electrodes configured to trap ions in a zone above the first electrodes and a second ion trap module laterally arranged next to the first ion trap module (2B, 2C) and including second electrodes configured to trap ions in a zone above the second electrodes. The first ion trap module and the second ion trap module are mechanically connected. The first electrodes and the second electrodes are aligned relative to each other so as to be configured to provide a shuttling of ions between the first ion trap module and the second ion trap module along the first electrodes and the second electrodes.

A controlled environment chamber is provided. The controlled environment chamber includes a chamber housing and a window component that is secured to the chamber housing. The window component includes a window plate having a first surface that faces away from an interior of the controlled environment chamber and a second surface that faces toward the interior of the controlled environment chamber. The window plate comprises at least one signal manipulation element.

The invention relates to a reflection optical unit (1) for focusing electromagnetic radiation (300) onto a focal plane (100), comprising at least the following components: - a central stop (12) which is arranged on an optical axis (200) of the reflection optical unit (1) and is designed to prevent electromagnetic beams (300) that are radiated into the reflection optical unit (1) along the optical axis (200) from propagating parallel to the optical axis (200), - an X-ray lens (11) having a tube (11-1) which extends at least between the central stop (12) and the focal plane (100) along the optical axis (200) of the reflection optical unit (1) and delimits a first volume (V1) radially around the optical axis (200), such that electrons (e-) generated by electromagnetic radiation in the first volume (V1) are shielded, wherein the tube (11-2) together with the central stop (12) forms a ring-shaped aperture (18), and - a solid window (13) which delimits the first volume (V1) toward the focal plane (100) and which peripherally terminates flush with the tube (11-2), wherein the solid window (13) is configured such that electrons generated by electromagnetic radiation in the first volume (V1) are shielded from the focal plane (100) by the solid window (13).

An optics-integrated confinement apparatus is provided. The optics-integrated confinement apparatus includes a first substrate, a plurality of electrical components formed on the first substrate, and an on-chip beam delivery system. The plurality of electrical components define a confinement apparatus configured / operable to confine one or more quantum objects. The on-chip beam delivery system includes a waveguide, a coupler, and an optical element. The coupler is configured to couple an optical beam out of the waveguide and toward the optical element. The optical element is configured to modify a polarization of the optical beam and direct the optical beam toward a target location defined by the optics-integrated confinement apparatus.

An X-ray irradiation apparatus (100) comprises an X-ray source device (110) for creating X-rays (2) with a polychromatic spectrum and an X-ray optic device (120) with a beam axis (3) that is longitudinal, wherein the X-ray optic device (120) comprises a reflector device (121) that is polycrystalline having a reflector geometry, a reflector mosaicity and a reflector thickness and the reflector device (121) is arranged for receiving a portion of the X-rays (2) within an acceptance angle of the reflector device (121) and for creating an X-ray beam (4) by Bragg reflection, which is directed along the beam axis (3) towards a focal position thereof and has a spectral distribution determined by the polychromatic spectrum of the X-rays (2), the reflector geometry, the reflector mosaicity and the reflector thickness, and wherein the X-ray irradiation apparatus (100) further comprises a spectral filter aperture device (122) that is arranged downstream from the reflector device (121) for creating a filter gap (123) transmitting a first spectral portion (4A) of the spectral distribution of the X-ray beam (4) and blocking a second spectral portion (4B) and a third spectral portion (4C) of this spectral distribution, wherein the first spectral portion (4A) has higher energies than the second spectral portion (4B) and lower energies than the third spectral portion (4C), wherein the reflector device (121) has an acceptance solid-angle of at least 100 micro-steradian, and wherein the reflector geometry, the reflector mosaicity, the reflector thickness and the acceptance angle of the reflector device (121) are selected such that simultaneously a radiation flux in the first spectral portion (4A) is at least 1% of an incoming flux of the same spectral portion of the X-rays (2) received by the reflector device (121) with a peak reflectivity of at least 1%, the first spectral portion (4A) has a spectral bandwidth of at most 15%, the second and third spectral portions (4B, 4C) have a flux reduced by at least three orders of magnitude compared with the flux in the first spectral portion (4A), and the X-ray beam (4) has a focal spot size of less than 1.5 mm in both transverse dimensions relative to the longitudinal beam axis. Furthermore, an X-ray fluorescence imaging apparatus (200) and a method of using the X-ray irradiation apparatus (100) are described.

A flow through photochemistry apparatus and methods of use are disclosed in the present application. One or more reactant materials are passed through a reaction chamber and are exposed to electromagnetic radiation. The reaction chamber has reflective walls arranged to reflect electromagnetic radiation across the volume of the chamber a plurality of times, thereby increasing the probability of the electromagnetic radiation interacting with the reactive materials. The reaction chamber may be used for sterilization and photochemistry applications.

X-ray optics comprising: (i) achromatic collimation optics adapted to collimate an input X-ray beam to provide a collimated X-ray beam; (ii) an adjustable diffraction unit adapted to: (a) receive the collimated X-ray beam while being configured according to a current configuration associated with a current wavelength selected from among the different wavelengths, the current configuration being selected from among the different configurations associated with the different wavelengths; and (b) filtering the collimated X-ray beam to provide a filtered collimated X-ray beam of a current wavelength; and (iii) achromatic focusing optics configured to focus the filtered collimated X-ray beam to provide a focused filtered X-ray beam.

To provide a neutron convergence device that can be produced in a short time and a manufacturing method.SOLUTION: There is provided a neutron convergence device in which a plurality of units are connected in an axial direction and which includes a neutron supermirror having a predetermined rotational curved surface shape. Each of the plurality of units includes: a plurality of mirror segments having mirror parts constituting a portion of the neutron supermirror with the predetermined curved surface shape; a vacuum chamber; and a coupling flange to which the plurality of mirror segments and the vacuum chamber are attached. Each of the plurality of mirror segments has a flange part at one end, and the vacuum chamber has a first flange part at one end and a second flange part at the other end.SELECTED DRAWING: Figure 4

The monochromator crystal adjusting mechanism comprises a base, a flexible hinge wheel, a first driving mechanism and a second driving mechanism, the flexible hinge wheel comprises an inner wheel, an outer wheel and a plurality of flexible hinge joints, the inner wheel is located in the outer wheel, the two ends of each flexible hinge joint are connected with the inner wheel and the outer wheel respectively, and the flexible hinge joints can elastically deform under the action of external force; the inner wheel and the first driving mechanism are both fixed to the base, and the first driving mechanism is connected with the outer wheel and used for applying Z-direction force to the outer wheel so that the outer wheel can rotate around the X axis relative to the inner wheel. A rotating piece is arranged on the outer wheel, is rotationally connected with the outer wheel and can rotate around the Y axis relative to the outer wheel; the second driving mechanism is fixed to the outer wheel, connected with the rotating piece and used for driving the rotating piece to rotate around the Y axis. And a clamping mechanism is fixed on the rotating piece and is used for fixing the monochromator crystal. The adjusting mechanism of the monochromator crystal is more compact in structure, and the space utilization rate in a monochromator can be improved to a great extent.

The invention discloses a cold atom regulation and control chip device based on a composite waveguide holographic grating, and the structure is mainly composed of a silicon nitride waveguide disposed on a silicon dioxide substrate, and the silicon nitride waveguide comprises a group of x-direction waveguides and two groups of y-direction waveguides. A composite waveguide holographic grating G1 and a composite waveguide holographic grating G2 are respectively etched in the crossed area of the waveguides; the port of the y-direction waveguide is diffracted by the composite waveguide holographic grating G1 and the composite waveguide holographic grating G2 to generate two beams of vortex light, and the two beams of vortex light are intersected above the chip to form an optical dipole trap for trapping cold atoms; the x-direction waveguide is diffracted by the composite waveguide holographic grating G1 through the port Pin to generate Gaussian light, and the Gaussian light is focused and aligned with the center of the optical dipole trap. According to the invention, the functions of atom capture, atom internal state excitation and fluorescence detection can be realized on the chip, and the problem of contradictory integration compatibility of a device for regulating and controlling a plurality of cold atoms in the existing photon-atom chip is solved.

The utility model provides a large-size curved-surface thin-wall neutron beam window structure, which is applied to a high-resolution neutron diffractometer and aims to provide a high-vacuum environment for an experimental sample and a scattered neutron channel and ensure high transmittance of neutrons and mechanical strength and stability of a device at the same time. The neutron beam window structure is an integrated curved surface type structure, and the thickness of the beam window is 1.5 mm. According to the technical scheme, through strict quality detection and fatigue test, the stability and durability of the neutron beam window in actual use are ensured. In addition, potential problems can be found and processed in time through regular performance state monitoring, so that the service life of the beam window is prolonged, the maintenance cost is reduced, and more reliable and efficient support is provided for scientific research activities such as neutron diffraction experiments.

The present invention relates to a reactor and a method for depositing one or more atomic layers of at least one material onto a substrate. The reactor includes a reaction chamber containing a showerhead, a submount, and at least one base support. The showerhead includes at least one gas outlet configured to provide a gas flow of at least one material or a gas flow of at least one component of the at least one material. The abutment is rotatable about an abutment axis of rotation. At least one substrate support is disposed on the submount and configured to rotate the substrate about a substrate axis of rotation. In particular, the substrate holder is configured to rotate the substrate about a substrate axis of rotation, where the abutment axis of rotation and the substrate axis of rotation are inclined relative to each other. The invention also relates to an X-ray microscope for generating an enlarged image of an object using X-rays.

The light source includes a linear accelerator for accelerating electron bunches to relativistic energies. The light source further includes a first grating downstream of the linear accelerator, which is positioned so that electron bunches pass through it to produce a diffraction pattern. The light source further includes an emittance exchange device downstream of the first grating, which rotates the diffraction pattern in a direction substantially parallel to the propagation direction of the electron bunches. The light source further includes a laser that generates light pulses. The light source is configured such that the light pulses from the laser interact with the electron bunches in an overtaking geometry at an interaction point downstream of the emittance exchange device, while the diffraction pattern is substantially parallel to the propagation direction of the electron bunches to produce light via inverse Compton scattering.

The invention belongs to the technical field of micro-nano processing, and particularly relates to a Pt-HSQ-based high-resolution X-ray Fresnel zone plate and a preparation method thereof. According to the X-ray Fresnel zone plate, a Pt-HSQ metal-inorganic material system is adopted, a diffraction structure with a large aspect ratio and Pt material quasi-periodic dense stripes specially needed by an X-ray zone plate lens is formed through electron beam lithography and an ALD process, and diffraction focusing from a soft X-ray wave band to a hard X-ray wave band and imaging with an amplification function are achieved. The wave zone plate has excellent mechanical stability, and the irradiation resistance and morphology retentivity of the wave zone plate under high-energy irradiation are remarkably improved. And high-resolution X-ray focusing elements with different energy wavebands and different focal lengths can be prepared according to geometric design and material selection of the wave zone plate. The lens is suitable for microscopic imaging, coherent diffraction imaging, X-ray spectrum, nanometer detection and other scenes of a synchrotron radiation or off-line laboratory X-ray light source, and has wide popularization value and application prospect.

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 µm-1 or more and 20 µm-1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 µm × 10 µm with an atomic force microscope.

A method for evaluating a sample, the method includes (a) illuminating a liquid metal jet alloyed with aluminum with an electron beam to provide a first x-ray beam; (b) spectral filtering, by a filtering unit, the first x-ray beam to provide a second x-ray beam; (c) illuminating a sample with the second x-ray beam; and (e) detecting x-ray radiation emitted from the sample as a result of the illuminating of the sample.

The application provides a deformable mirror assembly, comprising: a deformable mirror mirror body, a back surface of which is provided with a telescopic piezoelectric actuator, which comprises a plurality of linearly arranged actuating units; a pad, which is arranged on the back surface of the deformable mirror mirror body; a control system, which is used for providing an actuating alternating voltage to the telescopic piezoelectric actuator, so that the sinusoidal vibration of different actuating units adopts random amplitude and random phase; the peak-to-valley maximum amplitude of the mirror surface of the deformable mirror mirror body caused by the sinusoidal vibration overcomes the Rayleigh criterion, and the periodicity of the spatial frequency is destroyed through the randomness of the phase of the actuating unit, so that the homogenization of the light beam speckle is realized when the deformable mirror mirror body is used for light beam deflection. The application also provides a corresponding two-dimensional optical system. The deformable mirror assembly of the application improves the speckle homogeneity in the imaging process and reduces the influence of the speckle.

The utility model provides an ion trap device and quantum computing equipment comprising the ion trap device, and the ion trap device comprises an ion trap; the cavity is used for sealing the ion trap; the plane window is arranged on the side wall of the cavity; the spherical reflector is arranged in the cavity and is concave towards the plane window, the curvature radius of the spherical reflector is twice of the focal length of the spherical reflector, and ions trapped in the ion trap are arranged at the curvature center of the spherical reflector; the diffraction limit aspherical lens is arranged on the side, close to the plane window, in the cavity, and the spherical reflector, the ion and the diffraction limit aspherical lens are coaxially arranged. By using the ion trap device provided by the utility model, the fluorescence collection efficiency of the ion trap can be improved without using an objective lens, and for quantum computing equipment, more accurate, more reliable and more efficient quantum computing can be realized.

Radiation emitted by a radiation source (208, 408) along a projected path P0 can be diverted by a divergence angle by a lens (234, 434) in the projected path P0 with a first surface (236, 436) and a second surface (240, 440) spaced apart along the projected path P0 with the second surface (240, 440) farther from the radiation source (208, 408) than the first surface (236, 436). The first surface (236, 436) can be curved and have a normal point perpendicular to a line parallel to the projected path P0 and offset from the projected path P0 by an eccentricity. Radiation striking the first surface (236, 436) can be diverted by a first angle relative to the projected path P0 and can continue to strike the second surface (240, 440), which diverts the radiation by a second angle. The sum of the first and second angles is the divergence angle. The apparatus can be used in a probe assembly (200) to determine tip clearance of a turbine blade (120) during operation of a gas turbine engine (50).

A reflective mask blank has a substrate; and a multilayer reflective film provided on the substrate and configured to reflect exposure light. The multilayer reflective film has a periodic layered structure portion including a low refractive index layer and a high refractive index layer. The low refractive index layer contains ruthenium (Ru), and further contains one or both of carbon (C) and silicon (Si).

In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.

The present invention belongs to the field of nuclear physics and nuclear technology application, in particular to a large curved thin-walled neutron beam window for a high-resolution neutron diffractometer in spallation neutron source technology and a manufacturing method thereof; the neutron beam window is designed as an integrated curved structure, the thickness of the beam window is designed to be 1.5 mm, and a transverse rib is provided in the middle of the neutron beam window to enhance structural stability without affecting neutron penetration; the present invention is designed as a thin-walled curved structure, so that the neutron beam window can more effectively penetrate neutrons, reduce neutron attenuation during transmission, thereby improving neutron utilization and accuracy of experimental data; at the same time, compared with a traditional planar structure, the curved surface design has better stress distribution, can effectively reduce stress concentration and mechanical deformation, improve the pressure bearing capacity and fatigue life of the neutron beam window, and ensure safe and stable operation of the experimental device.

The invention relates to a method for manufacturing an EUV mirror component (M1-M6, 40), in which method a multilayer coating system (31) is applied to a surface of a mirror body substrate (30, 37) in order to form an optical surface that is highly reflective for EUV radiation. A temporary protective layer structure (36) is created on the multilayer coating system (31). The protective layer structure (36) comprises a protective layer (35) and a sacrificial layer (34) located between the protective layer (35) and the multilayer coating system (31). The sacrificial layer (34) is a layer produced by oxidising a layer of the multilayer coating system (31). The temporary protective layer structure (36) is removed before the EUV mirror component is put into operation. The invention also relates to an intermediate product of an EUV mirror component.