1354results about "Handling using diffraction/refraction/reflection" patented technology

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

The invention concerns an illumination system for wavelengths <=193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system.The illumination system is characterized by the fact that the raster elements of the one or more mirror or lenses are shaped and arranged in such a way that the images of the raster elements cover by means of the optical elements the major portion of the reticle plane and that the exit pupil defined by aperture and filling degree is illuminated.

The invention concerns an illumination system, particularly for microlithography with wavelengths <=193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

A method and device for producing visually sensed images of the internal structure of, particularly, a biological object. When used for diagnostic purposes in medicine the x-ray dosage of tissues surrounding the spot that is being examined is decreased.

X-ray fluorescence (XRF) spectroscopy systems and methods are provided. One system includes a source of x-ray radiation and an excitation optic disposed between the x-ray radiation source and the sample for collecting x-ray radiation from the source and focusing the x-ray radiation to a focal point on the sample to incite at least one analyte in the sample to fluoresce. The system further includes an x-ray fluorescence detector and a collection optic comprising a doubly curved diffracting optic disposed between the sample and the x-ray fluorescence detector for collecting x-ray fluorescence from the focal point on the sample and focusing the fluorescent x-rays towards the x-ray fluorescence detector.

A classification system for systems of n mirrors, whereby systems of mirrors are classified by a number C, is defined as follows:where: ai=1 if the angle of incidence of the chief ray at mirror i is negative,ai=0 if the angle of incidence of the chief ray at mirror i is positive,M is the magnification of the projection system, andindex i numbers the mirrors of the system in series. Four mirror systems, six mirror systems and eight mirror systems in accordance with the present invention are useful in EUV lithography projection systems.

A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and / or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

The object of the present invention is to provide an apparatus capable of X-ray imaging utilizing phase of X-rays with a simple construction. The X-ray imaging apparatus of the present invention is equipped with first and second diffraction gratings and an X-ray image detector. The first diffraction grating is constructed to generate the Talbot effect using X-rays irradiated at the first diffraction grating. The second diffraction grating is configured so as to diffract the X-rays diffracted by the first diffraction grating. The X-ray image detector is configured so as to detect the X-rays diffracted by the second diffraction grating. By diffracting X-rays diffracted by the first diffraction grating, the second diffraction grating is capable of forming image contrast caused by changes in phase of X-rays due to the subject arranged in front of the front surface of the first diffraction grating or between the first diffraction grating and the second diffraction grating. The X-ray image detector is capable of detecting X-rays creating image contrast.

Devices for improving the capturing and utilization of high-energy electromagnetic radiation, for example, x-rays, gamma rays, and neutrons, for use in physical, medical, and industrial analysis and control applications are disclosed. The devices include optics having a plurality of optical crystals, for example, doubly-curved silicon or germanium crystals, arranged to optimize the capture and redirection of divergent radiation via Bragg diffraction. In one aspect, a plurality of optic crystals having varying atomic diffraction plane orientations are used to capture and focus divergent x-rays upon a target. In another aspect, a two- or three-dimensional matrix of crystals is positioned relative to an x-ray source to capture and focus divergent x-rays in three dimensions.

There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

A system includes a plurality of treatment heads, each of the plurality of treatment heads including a radiation source and a radiation-focusing lens. The system also includes a plurality of voltage sources, each of the plurality of voltage sources associated with a respective one of the plurality of treatment heads, and a control device to control an intensity of radiation emitted from each radiation-focusing lens of the plurality of treatment heads in accordance with a treatment plan.

A focus / detector system of an X-ray apparatus and a method for generating projective or tomographic phase contrast recordings, are disclosed. In an embodiment of the system, the system includes a beam source equipped with a focus and a focus-side source grating, arranged in the beam path and generates a field of ray-wise coherent X-rays, a grating / detector arrangement having a phase grating and grating lines arranged parallel to the source grating for generating an interference pattern, and a detector having a multiplicity of detector elements arranged flat for measuring the position-dependent radiation intensity behind the phase grating. Finally, the detector elements are formed by a multiplicity of elongate scintillation strips, which are aligned parallel to the grating lines of the phase grating and have a small period, whose integer multiple corresponds to the average large period of the interference pattern which is formed by the phase grating.

A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

The invention relates to a time-of-flight mass spectrometer for injection of the ions orthogonally to the time-resolving axis-of-flight component, with a pulser for acceleration of the ions of the beam in the axis-of-flight direction, preferredly with a velocity-focusing reflector for reflecting the ion beam and with a flat detector at the end of the flight section. The invention consists of using, both for acceleration in the pulser and for reflection in the reflectors, a gridless optical system made up of slit diaphragms which can spatially focus the ions onto the detector in the direction vertical to the directions of injection and flight axis, but which does not have any focusing or deflecting effect on the other directions. For some reflector geometries it is essential to use an additional cylindrical lens for focusing, and for other reflector geometries the use of such a lens may be advantageous.

An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.

An illumination optical system for illuminating a target plane by using light from a light source includes plural displaceable mirrors that are two-dimensionally arranged at specific positions in said illumination optical system.

Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, a means to translate the second grating G2 relative to the detector. The system may additionally comprise an antiscattering grid to reduce signals from scattered x-rays. Various configurations of dark-field and bright-field detectors are also disclosed.

An X-ray imaging system includes first to third absorption gratings. Initially, the third absorption grating is disposed in a Z axis orthogonal to a detection surface of a FPD, and the position of the third absorption grating is adjusted in θx and θy directions based on a dose of X-rays having passed through the third absorption grating. Then, the first absorption grating is disposed in the Z axis so as to produce a moiré pattern. The position of the first absorption grating is adjusted in the θx and θy directions so that a frequency of the moiré pattern detected by the FPD becomes uniform. Then, the position of the first absorption grating is adjusted in a Z or θz direction so that the FPD loses the detection of the moiré pattern. After that, the second absorption grating is aligned in a like manner as the first absorption grating.

The present invention generally refers to a correction method for grating-based X-ray differential phase contrast imaging (DPCI) as well as to an apparatus which can advantageously be applied in X-ray radiography and tomography for hard X-ray DPCI of a sample object or an anatomical region of interest to be scanned. More precisely, the proposed invention provides a suitable approach that helps to enhance the image quality of an acquired X-ray image which is affected by phase wrapping, e.g. in the resulting Moiré interference pattern of an emitted X-ray beam in the detector plane of a Talbot-Lau type interferometer after diffracting said X-ray beam at a phase-shifting beam splitter grating. This problem, which is further aggravated by noise in the obtained DPCI images, occurs if the phase between two adjacent pixels in the detected X-ray image varies by more than π radians and is effected by a line integration over the object's local phase gradient, which induces a phase offset error of π radians that leads to prominent line artifacts parallel to the direction of said line integration.

X-ray generator devices and methods for operating the same that utilizes anodes comprising thin cylinders to generate characteristic X-ray spectra, which emerges from the cylinders axially, as an intense beam.