The invention provides a method for manufacturing triangular groove echelon gratings with 90-degree vertex angles. Each triangular groove echelon
grating is composed of a
silicon grating structure (1),
photoresist (3) and a
metal film (4). A manufactured
grating groove is a triangle with the vertex angle being 90 degrees, so that the
diffraction efficiency higher than that of an echelon grating with the vertex angle being not 90 degrees can be achieved. Each grating structure is produced in an obliquely-
cut monocrystalline
wafer, the shining angles of the gratings are determined by an obliquely-
cut angle for
cutting each
silicon wafer, and gratings with any blazing angles can be manufactured; according to the 90-degree vertex angles, grooves of
silicon gratings with the vertex angles being not 90 degrees are filled with
photoresist, then photoetching is conducted again, and the original silicon gratings with the vertex angles being not 90 degrees are converted into the triangular groove gratings with the vertex angles being 90 degrees. According to the manufactured grating structure, the shining face of each grating is a smooth monocrystal silicon <111> grate plane, scattering can be effectively lowered, and the
diffraction efficiency of each grating is improved. The purpose that all the gratings have high
diffraction efficiency on a
broadband is achieved according to the fact that using wave bands can choose to be coated with various different reflecting film
layers on the surfaces of the gratings.