The invention relates to the technical field of optical thin films, and particularly discloses a deep
ultraviolet special-shaped
quartz element antireflection film and a preparation method thereof.The preparation method comprises the steps that a first MgF2 thin film layer is obtained through deposition on the surface of a substrate, and a first
fluorine-doped thin film layer is prepared; preparing an antireflection film layer on the surface of the first
fluorine-doped film layer; and depositing a first MgF2 thin film layer on the surface of the antireflection film layer to prepare a first
fluorine-doped thin film layer, depositing a second MgF2 thin film layer on the surface of the antireflection film layer to prepare a second fluorine-doped thin film layer. According to the deep
ultraviolet special-shaped
quartz element antireflection film provided by the invention, the first fluorine-doped MgF2 thin film layer is deposited on the substrate, so that the intrinsic absorption difficulty of the special-shaped
quartz substrate at 193nm can be effectively solved, and the antireflection rate is improved; and in a 193nm
wave band, the
refractive index of MgF2 is lower than that of the substrate, and as a bottom layer film, the first MgF2 thin film layer can enable incident light to be subjected to reflection and interference on a film
layer interface, reduce reflected light and enable more light to enter the substrate, so that the absorption proportion of the light in the substrate is relatively reduced, the overall light loss of the
system is indirectly reduced, and the anti-reflection rate is improved.