The invention relates to the technical field of photoelectric
cathode manufacturing, and provides a high-purity cesium-based photoelectric
cathode cesium film large-area uniform
molecular beam evaporation deposition method, which adopts a high-purity cesium elementary substance cesium source and is matched with an ultrahigh vacuum establishment and maintenance technology to realize long-acting repeated use of the cesium source; a multi-temperature-zone gradient
evaporation design is combined with an adaptive PID
algorithm and a
thermal coupling compensation mechanism to realize cross-zone temperature cooperative control; through a
thermodynamics-fluid
mechanics dual-mode deposition control strategy,
modes are dynamically switched according to the
deposition rate,
thermal inertia disturbance is inhibited in the high-speed stage,
viscous resistance is corrected in the low-speed stage, and the
beam density stability is guaranteed; a generator and a cesium source chamber, an
evaporator and a spray
pipe mechanism which are connected in series are designed to form continuous and stable
molecular beam deposition; according to the method, the problems of poor film uniformity, rate
instability and end point misjudgment in the traditional process are solved, large-area or single-time multi-substrate cesium film deposition can be realized, and industrial-grade stability, laboratory-grade precision and
mass production-grade efficiency are achieved.