212results about "Emission spectroscopy" patented technology

The invention provides a method for plasma bombardment energy distribution detection and life prediction of a silicon carbide part, and belongs to the technical field of semiconductor processing based on deep learning. The method comprises the following steps: firstly, arranging a magnetic probe array to obtain local electromagnetic parameters, and obtaining plasma luminescence characteristics by using optical imaging and spectrum acquisition equipment; preprocessing the acquired data to obtain multi-source fusion features; designing an energy distribution reconstruction framework based on a generative adversarial network, wherein a generator is used for deducing a three-dimensional energy distribution field of plasma; and inputting the three-dimensional energy distribution field time sequence characteristics into a bombardment dynamic characteristic modeling time sequence depth network, establishing a nonlinear mapping relation between energy distribution and material aging, further obtaining life prediction parameters, and finally obtaining the remaining service life of the silicon carbide part. According to the method, a complex degradation mechanism can be reflected more accurately, and the precision and robustness of life prediction are remarkably improved.

Disclosed herein are scientific instrument support systems, related methods, computing devices and computer-readable media. A method of mitigating distortion of an optical emission spectrum obtained from an optical emission spectrometer is provided. The method may comprise a step of obtaining a spectrum recorded with the spectrometer and a respective one or more condition parameters indicative of an operating condition at a time of recording the spectrum. The method may further comprise a step of providing a model configured to output, in response to the one or more condition parameters, one or more transform parameters of a transformation to be applied to the obtained spectrum. A transformation may be applied in accordance with the obtained one or more transform parameters to the obtained spectrum to mitigate distortion of the spectrum due to a discrepancy between the operating condition and a baseline operating condition.

The disclosure provides an optical system, a semiconductor processing system, and a method for processing a semiconductor wafer. In one example, the optical system includes: (1) a light source configured to provide source light to a source plane to form a plurality of first subbeams, (2) optical elements configured to modify each of the plurality of first subbeams to form a plurality of interrogation spots on a wafer according to a predetermined pattern, wherein the optical elements are further configured to modify each of the plurality of first subbeams upon reflection from the wafer to form a plurality of second subbeams upon an image plane, and (3) a spectrometer configured to receive collected light from the plurality of second subbeams.

The invention is suitable for the field of electrochemical luminescence detection equipment, and provides a dispersion device suitable for electrochemical luminescence detection, which comprises a monochromator body, the monochromator body is composed of a monochromator housing, a reflector assembly, a grating assembly, a collimating mirror assembly, a focus lens assembly, a slit, a flange snap ring and a flange; an M-shaped light path is arranged in the monochromator body, and a slit, a reflector assembly, a collimating mirror M1 in the collimating mirror assembly, a customized blazed grating G1 in the grating assembly and a focusing mirror M2 in the focusing mirror assembly are sequentially arranged in the light propagation direction. The customized blazed grating G1 is designed by adopting specific parameters including the scribed line density, the blazed wavelength, the notch groove depth and the groove width ratio, and primary light energy enhancement and secondary light intensity suppression can be realized; according to the invention, an optical filter is not needed, the diffraction efficiency of a monochromator is improved to 60-86%, the intensity ratio of luminol secondary light to primary light is less than or equal to 1.6%, the detection limit of ruthenium bipyridine is reduced from 100pmol / L to 50pmol / L, and the electrochemical luminescence detection device is suitable for various electrochemical luminescence detection scenes.

Compositions, articles, systems, and methods for sensing and / or authentication using luminescence imaging are generally provided. In some embodiments, the article is associated with an emissive material comprising an emissive species. In some embodiments, the emissive species has a radiative lifetime of at least 10 nanoseconds. A characteristic of the article may be determined by acquiring an image comprising time-dependent information related to the emissive species. In certain cases, the radiative lifetime of the emissive species may be determined from the image. Because the radiative lifetime of an emissive species may be modified by numerous factors, including, but not limited to, binding to or proximity to other molecules, temperature, pH, and radiation exposure, the measured length of the radiative lifetime may provide information regarding a characteristic of the associated article. In some cases, the emissive material comprising one or more emissive species may be used to identify and / or authenticate the associated article.

The present application relates to the field of spectral measurement, in particular to a kind of ultraviolet spectrum measurement method, comprising: fluorescence gradual conversion device is converted into visible light by the ultraviolet light to be measured obtained, and is transmitted to image sensing device;Image sensing device converts the visible light into visible light intensity image, and is transmitted to data processing device;According to the visible light intensity image obtained by data processing device, and according to the preset reconstruction algorithm, the spectrum of the ultraviolet light to be measured is calculated.The present application does not need to use the slit, grating and complex collimating focusing light path of existing spectrometer, the present application uses black and white surface array CCD to receive incident light in large area, and converts the ultraviolet light insensitive to CCD into sensitive visible light, greatly improves the intensity and utilization of optical signal, greatly reduces cost, reduces volume, and can very conveniently improve resolution and conversion measurement range.

The invention provides a multi-size sample emissivity measuring system and measuring method based on a co-heating mechanism, the system comprises the co-heating mechanism, a heating chamber is arranged in the co-heating mechanism, a blackbody cavity and a sample cavity are arranged in the heating chamber in parallel, and the internal temperature of the blackbody cavity and the sample cavity is controlled through the same electric heating assembly; the replaceable positioning assembly is arranged in the sample cavity and is used for adapting to the to-be-tested samples with different sizes; a light path of the spectrograph is switchably aligned with an outlet of the blackbody cavity or the sample cavity; and the positioning adjusting mechanism is used for adjusting the relative position of the co-heating mechanism and the spectrograph, so that the optical axes of the blackbody cavity and the sample cavity coincide with the optical axis of the spectrograph. According to the measuring system, the blackbody cavity and the sample cavity can be heated simultaneously through the co-heating system, temperature consistency is guaranteed, the replaceable positioning assembly is adopted to adapt to samples of different sizes, and high-precision spectral emissivity measurement of the samples of multiple sizes is achieved.

Method (100) of optical spectroscopy for analyzing a sample using an optical spectrometer (10), comprising: Obtaining a sample spectrum (101) of the sample using the optical spectrometer; Obtaining a blank spectrum (102) using the optical spectrometer, wherein the blank spectrum includes structured background radiation that correlates with the sample spectrum; Determining a cross-correlation (103) of the sample spectrum and the blank spectrum; Generating a mapped blind spectrum (105) by mapping the blind spectrum onto the sample spectrum based on cross-correlation; and Subtracting the imaged blank spectrum from the sample spectrum to produce a background-corrected sample spectrum (106).

The invention relates to a sample analysis system. The sample analysis system is provided with a lens demisting device. The sample analysis system includes a plasma torch device (200) including a body defining a plasma chamber (202) and a plasma torch (201) supported by the body in the plasma chamber (202). The plasma torch (201) is electrically coupled to a power source and is operable to form a plasma from the sample fluid in the plasma chamber (202) when energized. The sample analysis system also includes a spectrometer (300) configured to analyze the plasma to measure an analyte of interest in the sample fluid by light emitted by the plasma. The spectrometer (300) comprises a collector tube (301) in visual communication with the plasma chamber (202), the collector tube (301) comprising a proximal end and a distal end, the distal end being equipped with a lens (302) configured to collect light emitted by the plasma. The light collecting tube (301) is at least partially inserted into the central passage (616) of the gas hood (610) such that the distal end of the light collecting tube (301) with the lens (302) is at least partially enclosed by the gas hood (610). A distal end (612) of the gas hood (610) includes a gas outlet port (619) and a gas inlet port (618) fluidly coupled with a source of pressurized gas, the gas hood configured to discharge a stream of gas across an exposed surface of the lens (302) to at least minimize fogging of the lens (302).

The invention relates to an easily adjustable optical emission spectrometer (1), and a method (100) for establishing and operating such a spectrometer (1), the spectrometer (1) comprising a plasma holder (2) for establishing a luminescent plasma from a sample material, and an optical system (3) for measuring the spectrum of light (L) emitted by the plasma, the spectrum being characteristic of the sample material, wherein the optical system (3) comprises at least one light entrance aperture (31), at least one diffraction grating (32) for separating the light (L) coming from the plasma (A) and a method (100) for measuring the spectrum of the light (L). One or more detectors (33) of the optical emission spectrometer (1), wherein the plasma support (2) and the optical system (3) are directly and fixedly mounted on a plasma support flange (2B) and an optical system flange (3B) respectively, which are directly and fixedly connected to each other, and wherein the optical emission spectrometer (1) further comprises an analysis unit (34), which is suitable for analyzing the measured spectrum and compensating for a drift of the spectrum relative to the detector (33) that may be caused by heat transferred from the plasma support (2) to the optical system (3) taking into account thermal expansion of the optical system (3).

A circuit, such as that of a CMOS sensor, is described, having individually addressable transfer transistors and individually addressable reset transistors. Through these individually addressable transistors, pixels of the same or different sizes and / or the same or different exposure times within different regions of interest can be efficiently processed. Different regions of interest can be exposed simultaneously and read out independently.

A device for analyzing the material composition of a sample via plasma spectrum analysis includes a laser assembly configured to emit a beam for plasma spectrum analysis and an optical assembly configured to direct the beam towards a target for plasma spectrum analysis of the target. The optical assembly is configured to collect a plasma emitted light emitted from a plasma and provide the plasma emitted light to a dispersion module. The dispersion module includes a first and second diffraction gratings. The first diffraction grating and second diffraction grating are positioned within the dispersion module such that light received from the optical assembly contacts the first diffraction grating at least two times before being directed out of the dispersion module.

A method for allowing reproducible, precise, and substantially temperature independent quantitative measurements of one or more high vapor pressure elements in a liquid metal or alloy sample using Laser Induced Breakdown Spectroscopy (LIBS). The method introduces one or more selectively reactive species and a substantially inert carrier gas to modify the local environment at and around the LIBS sampling point of the liquid metal or alloy. This results in a significant and immediate reduction of the vapor effects on LIBS signals of high vapor pressure species in metal or alloy melts, partially eliminating the temperature-dependence of the high vapor pressure elements and their dependence on spurious environmental factors, reducing the associated uncertainty in the LIBS measurements.

A spectroscopic device includes: an analysis optical system; a length measurement optical system; and a calculation device. The analysis optical system includes a moving mirror and a first light receiving element. The length measurement optical system includes a second light source configured to emit laser light, a gas cell with a gas that absorbs light of a predetermined wavelength sealed therein and configured to cause the laser light to be incident thereon, an emitted light amount detection unit configured to detect an amount of light emitted from the gas cell and output an emitted light amount detection signal, a light source control unit configured to control a wavelength of the laser light based on the emitted light amount detection signal, and a length measurement unit configured to use the laser light to obtain a displacement signal corresponding to a position of the moving mirror, and the calculation device includes a moving mirror position calculation unit, a light intensity calculation unit, and a Fourier transform unit configured to generate a spectral pattern.

Device (1, 100, 200, 300) for the analysis, fluorescence measurement, luminescence measurement, phosphorescence measurement, Raman scattering measurement or absorption measurement of a small amount, for example a drop, of a liquid sample (P) by means of light which can be guided through the sample (P) and can then be detected or analyzed according to the said measuring methods, wherein the device (1, 100, 200, 300) has an upper sample holder (3, 103, 203, 303) in the use position with a receiving point (4, 304, 304') for applying or dropping the sample (P) and a light inlet (5, 205, 305) for excitation light, which is horizontally oriented in the use position and is located below the sample holder (3, 103, 203, 303), characterized in that the device has a first device (7, 207, 307) located in the beam path behind the light inlet (5, 205, 305) for deflecting the light upwards to a position (Q) provided in the sample holder next to the receiving point (4, 304, 304') and a second light deflection (8, 108, 218, 308) which deflects the light beam coming from below into the sample (P) to be analyzed.

Microscopic imaging devices, systems and methods are provided. A microscopic imaging device includes a lens assembly, a first light source assembly, and one or more detection assemblies. The lens assembly has relatively short working distance, a relatively light weight, and / or multiple optical elements. The first light source assembly is configured to illuminate and / or excite a sample disposed at the working distance of the lens assembly. The one or more detection assemblies are configured to detect the light from the sample. The lens assembly, the first light source assembly, and at least one detection assembly are positioned to form an epiconfiguration.

Calibration device for calibrating the sensitivity of an optical sensor arrangement, wherein the calibration device comprisesa reflecting element with a reflecting region, said reflecting region comprising a multiplicity of reflecting faces varying in their orientation,a light source able to provide light and arranged such that said divergent light from the light source is able to illuminate said reflecting region,the optical sensor arrangement to be calibrated, wherein the optical sensor arrangement has an entrance opening for receiving incoming light and has at least a sensor for detecting light received through the entrance opening, and wherein said entrance opening is oriented towards said reflecting region, anda light tight casing preventing light of origin outside the calibration device from entering said entrance opening. The invention is further directed to a method.

To provide a spectroscopic analyzer capable of improving light utilization efficiency (S / N) of a light source with a relatively simple configuration.SOLUTION: A light source that emits light, a collection-optical-system unit that collects the light from the light source, a first slit that extracts light of a predetermined region from the light collected by the collection-optical-system unit, an excitation-side diffraction element that disperses the light from the collection-optical-system unit, a second slit that extracts monochromatic light of a predetermined wavelength from the light dispersed by the excitation-side diffraction element, and a detector that detects light from a sample irradiated with the monochromatic light, the collection-optical-system unit is disposed between the light source and the excitation-side diffraction element, and includes a mirror having a reflection surface of a non-axisymmetric free-form surface shape.SELECTED DRAWING: Figure 3C

The invention relates to a method for mapping and analysing at least one element of interest included in a sample (150) by means of laser-produced plasma optical emission spectrometry (160), the method comprising: - a step of producing a plasma (160) by focusing a laser beam (120) onto a surface of the sample (150); - a step of collecting an optical emission from the plasma (160) that defines an intensity signal; - a step of processing and analysing the optical emission; and - characterised in that, during the processing and analysing step, the intensity signal is studied over its entire duration in order to identify a maximum intensity value.

The application relates to a ratio type radiation sensing device with nonlinear response to dose rate and a use method thereof, and relates to a scintillator radiation measuring device with nonlinear change of luminous intensity and use method, and aims to solve the technical problems of low measuring precision, complex structure, poor reliability, poor real-time performance and poor applicability of existing radiation sensors. The ratio type radiation sensing device with nonlinear response to dose rate comprises an X-ray excitation module, a mixed sensing probe and a light signal collection module; wherein the mixed sensing probe is a round piece pressed by uniformly mixing NaLuF4:3Pr,5Er nanocrystals and NaLuF4:3Ce nanocrystals. The use method of the device is a standard curve method. The device can realize accurate detection in a wide range of 1.86-14.95 mGy / s, and can be used in the fields of environmental monitoring, biomedical imaging and public security inspection.

Provided are a method for generating a free lime content estimation model for steelmaking slag, by which the free lime content of steelmaking slag can be estimated in a simple, rapid, and highly accurate manner, a method for estimating the free lime content of steelmaking slag, a method for managing shipment of steelmaking slag, and a method for manufacturing iron and steel slag for road construction. The method for estimating the free lime content of steelmaking slag includes: a step of acquiring an emission spectrum by irradiating steelmaking slag with a laser to convert a portion of a surface of the steelmaking slag into plasma and acquiring an emission spectrum from the plasma; and a step of estimating a free lime content by inputting intensities of an emission spectrum including peaks caused by emission lines of Ca, Fe, and Si, within the emission spectrum acquired in the step of acquiring the emission spectrum, into a free lime content estimation model, to output the free lime content of a steelmaking slag irradiated with the laser.

The invention discloses a mechanoluminescence efficiency testing device and method based on an integrating sphere, and the device comprises a standard light source which is used for generating a standard light signal; the integrating sphere is used for collecting optical signals generated by the standard light source and the test sample; the test sample is an elastic film with mechanoluminescence performance, and mechanoluminescence is realized through stretching; the optical fiber spectrometer is used for converting an optical signal output from the integrating sphere into a digital signal; the mechanical load applying device is used for applying tensile acting force to the test sample, so that the test sample is deformed to generate photon emission; in the first working state, the standard light source is arranged in front of the integrating sphere; in the second working state, the standard light source is removed, the test sample is tightly attached right in front of the light inlet hole of the integrating sphere, and the mechanical load applying device is used for applying tensile acting force to the test sample. The mechanoluminescence efficiency testing device and the mechanoluminescence efficiency testing method provided by the invention have universality, and are applicable to different mechanoluminescence materials with stretchability.

: The invention describes a laser device (1) and a method for determining at least one parameter (28, 38, 39) of a laser device (1), in particular laser plotter (2a) or galvo laser (2b), by means of LIBS (Laser Induced Breakdown Spectroscopy) (29) for machining a workpiece (7), in which at least one beam source (4) in the form of a laser (5, 6, 37) is inserted in a housing (3) of the laser device (1), wherein, when the beam source (4) is activated, a laser beam (10) is guided via deflecting elements (11) to a focusing unit (12) or laser head (12). In order to determine the parameter "material" (28), a LIBS process (29) (Laser Induced Breakdown Spectroscopy), in particular a material identification process, is started manually or automatically by the laser device (1) or an external component (22) connected to the laser device (1), in particular laptop (22a), for adjusting the laser device (1), whereupon the workpiece (7) is machined, in particular irradiated, in a known manner by the laser (4, 5, 37), in particular the laser radiation (10), in such a manner that a small amount of material of the workpiece (7) is evaporated, wherein the evaporated material, in particular a plasma (31), is detected via a spectrometer (30) and evaluated, whereupon the material determined is displayed to the user on the laser device (1) or the external component (22), in particular laptop (22a), and / or the material determined is set as the parameter "material" (28), in particular material parameter, or is compared with the set material.

The present invention relates to a method of determining the elemental inhomogeneity of a continuously cast metal by laser-induced breakdown spectroscopy.

A fixture is provided for improving the accuracy of luminescence intensity analysis. The fixture includes: a base; multiple light sources disposed on the base and emitting light of different wavelengths; a control unit disposed on the base and activating or deactivating the multiple light sources based on a given program; and a power supply unit disposed on the base and supplying power to the multiple light sources and the control unit. The fixture is shaped so as to be transportable by a transport device disposed in a transport chamber for transporting substrates to be processed.

This invention discloses a method for measuring one-dimensional transient imaging spectra. Utilizing a high-precision optical plane mirror, a high-precision optical concave coated mirror, a multi-channel oscilloscope, a spectrometer, an ICCD camera, electronic sensors, and a multi-channel digital delay pulse generator, the one-dimensionally distributed light signal is collimated, spatially redirected, and compressed to a specific ratio before being transmitted to a spatial array of detectors. This ensures a one-to-one correspondence between the spatial distribution of the measured light signal and the spatial distribution of the detectors, allowing transient radiation spectral information of different spatial locations of the light source to be obtained through a single detection. This invention is highly practical and functional, and can be widely applied in the field of spectral measurement technology.

Scientific instrument support systems and related methods, computing devices, and computer readable media are disclosed herein. For example, in some embodiments, a computer-implemented method of acquiring a digital image of a spectrum from a time series of image frames of the spectrum imaged onto an image sensor by an optical system of a spectrometer is provided. The method comprises: acquiring a time sequence of image frames of a corresponding spectrum recorded when an imaging spectrum moves relative to an image sensor; transforming the image frame to align the recorded spectrum; and combining the transformed image frames to generate a digital image. In some embodiments, the method may further include upsampling each image frame to generate a corresponding upsampled image frame, and transforming the upsampled image frame to align the recorded spectrum. Upsampling each image frame may include generating an array of interpolated pixels by interpolating the array of pixels, thereby calculating additional pixels between the sensor pixels.