4 results about "Reactive material" patented technology

The method for forming an electrode according to an exemplary embodiment includes a shielding pattern formation process, a loading process, and a conductive layer formation process. In the shielding pattern formation process, a shielding pattern is formed on a surface of a substrate using a shielding material to expose a localized area of ​​that surface. The shielding material is a polymer comprising ends having at least one bond structure having covalent and double bonds. In the loading process, the substrate on which the shielding pattern is formed is loaded into a chamber. In the conductive layer formation process, a copper-containing source material and a reactive material reacting with the source material are alternately sprayed into the chamber using atomic layer deposition to form a copper-containing conductive layer on the exposed surface of the substrate. Therefore, according to the method for forming an electrode according to the exemplary embodiment, a thin film made of the material used to form the electrode is not formed on the surface of the shielding pattern. No residue is left when the shielding pattern is removed, preventing defects caused by residue.

The disclosed subject matter relates to photoelectrodes and methods of making and use thereof. Disclosed herein are photoelectrodes comprising: an insulator layer disposed on a light absorbing layer; a plurality of protrusions arranged in an ordered array, wherein each protrusion penetrates through the insulator layer to the light absorbing layer; and a plurality of particles disposed on the insulator layer, wherein a least a portion of a particle is in physical and electrical contact with at least a portion of a protrusion. Also disclosed herein are methods of making said photoelectrodes, comprising: patterning a reactive material in an ordered array on the insulator layer; annealing such that the reactive material reacts with and diffuses through the insulator layer, thereby forming a plurality of spikes comprising the reactive material which penetrate through the insulator layer to the light absorbing layer; subsequently removing the reactive material; and subsequently depositing the catalyst material.

A method for processing an optically reactive material, particularly for manufacturing or structuring of an object. The method can include optically processing a starting material in a working volume by irradiating light of a first wavelength and light of a second wavelength different from the first wavelength, wherein at least one material property of the starting material is changed by the optical processing. The optical processing can include irradiating a first partial volume of the working volume at least partially filled with the starting material using the light of the first wavelength; irradiating the first partial volume of the working volume using the light of the second wavelength, wherein the light of the second wavelength is projected into the working volume; and irradiating a second partial volume of the working volume at least partially filled with the starting material, which is different from the first partial volume.