22 results about "Plasma parameters" patented technology

The invention relates to the technical field of space electric propulsion, in particular to an ion thruster discharge chamber magnetic pole optimization method, which obtains an optimized discharge chamber magnetic pole structure by researching plasma generation and evolution behaviors under a specific magnetic pole structure based on a plasma numerical simulation process. On one hand, plasma characteristic parameters which cannot be tested by a test are obtained by using a numerical simulation means and a basic discharge principle of a discharge chamber, and on the other hand, change relationships between electron motion behaviors and the magnetic field intensity of a cathode magnetic pole and the magnetic field intensity of a conical section magnetic field are established; the working process and the working mechanism in the discharge chamber when the ion thruster works are understood more deeply, and data support and technical support are provided for optimization design of the discharge chamber of the ion thruster.

Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.

The invention provides a satellite dynamic thermal control method based on plume imaging feedback, which belongs to a spacecraft thermal control technology, and comprises the following steps of: acquiring plasma plume radiation field distribution in a thruster starting process by utilizing multi-spectrum CMOS imaging, inverting corresponding plasma parameters and flow field velocity distribution, and sending the plasma parameters and the flow field velocity distribution into a thermal control module through a high-speed bus; judging heat flow distribution, and comparing the threshold set with a historical model to evaluate the overheat risk; and if the overheat risk exists, marking as thermal load sudden change, executing a thermal control strategy, adjusting thermal resistance, and changing heat dissipating capacity until the risk is removed. The thermal radiation change process of the electric thruster is associated with the overall thermal control of the satellite, the optical information of the plasma plume is collected by using an optical imaging method, and the corresponding plasma parameters and thermal field information are obtained through inversion, so that the thermal control function of the satellite is actively controlled; thermal control of satellite components and thermal control of the whole satellite are associated, and accurate satellite thermal control is achieved.

This invention belongs to the field of photon counting detector manufacturing technology, specifically relating to a plasma treatment method for the crystal surface of a photon counting detector and the resulting photon counting detector. The treatment method employs a step-by-step plasma surface modification process. First, the crystal wafer surface is bombarded with plasma generated by the ionization of an inert gas. Then, a secondary bombardment is performed using plasma generated by the ionization of reactive gases such as oxygen and hydrogen. Simultaneously, key process conditions such as process gas flow rate, wafer orientation bias, processing time, cavity vacuum, radio frequency power, plasma parameters, and wafer spacing are systematically controlled. This step-by-step modification process achieves nanoscale modification of the crystal surface, effectively repairing surface damage caused by processing and forming a uniformly distributed surface modification layer. Photon counting detectors fabricated using this method can significantly reduce device leakage current, improve withstand voltage performance, optimize energy resolution, and improve photon counting rate and counting stability.

Disclosed herein is a stellarator with two sets of coils: a set of encircling coils that encircle the plasma axis, and a set of shaping coils that do not encircle any other coils or plasma. In some embodiments, the encircling coils include structural elements to maintain their shape under magnetic forces. In some embodiments, the shaping coils are attached to one or more structural elements that, together with the shaping coils, constitute a magnetic field shaping unit. Also disclosed is a controller that can modify the current through one or more subsets of the coils to achieve target plasma parameters. Also disclosed is a method for designing the set of shaping coils by discretizing the surface dipole or current potential distribution.

The invention discloses a multi-branch imaging light path for magnetic confinement plasma. The multi-branch imaging light path comprises a front-end imaging lens, a main light path, a first branch light path and a second branch light path, the front-end imaging lens is connected with the head end of the main light path, and the tail end of the main light path is connected with a first camera; the first branch light path splits light energy from the main light path through a first spectroscope, and the tail end of the first branch light path is connected with a photomultiplier tube array; the second branch light path splits light energy from the first branch light path through a second spectroscope, the front end of the second branch light path is provided with a narrow-band light filter, and the tail end of the second branch light path is connected with a second camera. By integrating plasma high-speed imaging, neutral beam imaging and visible spectrum measurement technologies, important information can be provided for plasma control and safe operation of a device, and plasma parameters with consistent space coordinates are provided for plasma transport research.

This invention discloses a Langmuir probe fixing assembly for a vacuum chamber, relating to the field of nuclear fusion device technology. The probe fixing assembly includes a probe array disk and an insulating mounting structure. An array aperture platform is provided in the center of the probe array disk, and the array aperture platform is used to pass through corresponding probe array needles. One end face of the probe array disk is detachably connected to one end of the insulating mounting structure, and the other end of the insulating mounting structure is used to be fixedly connected to the inner wall of the vacuum chamber. This allows for changes in the layout of the probe array according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters. A plasma measurement assembly includes a probe array box and the aforementioned Langmuir probe fixing assembly for a vacuum chamber. One end of the probe array box is provided with probe array needles, and the end of the probe array box with the probe array needles is fixedly connected to the probe array disk.

The invention provides a calibration device and method for measuring electric propulsion plasma through a spectrum method. The device comprises a main flange and an auxiliary flange which are connected through a bolt; a quartz tube with a single-end opening is arranged on one side of the main flange and is filled with rare gas; a radio frequency coil is arranged outside the closed end of the quartz tube and can excite rare gas to be ionized to form plasma; a T-shaped movable rod is arranged in the auxiliary flange and has an axial degree of freedom; a linear motor is arranged on the outer side of the auxiliary flange and can drive the movable rod to move. The head of the movable rod extends into the quartz tube, is provided with an electrostatic probe, consists of a porous ceramic column, a probe head and an insulating filler, and is used for measuring plasma parameters; the sealing rubber ring and the corrugated pipe achieve device sealing. According to the invention, the electron density and electron temperature of the plasma are measured through the electrostatic probe, and a spectral measurement result can be calibrated. By adopting the design of adjustable radio frequency power and an axial movable probe, the calibration range of plasma parameters is widened, and the reliability of spectral measurement is improved.

The invention discloses a Tokamak device plasma discharge starting method and system, and relates to the technical field of magnetic confinement fusion. The method comprises the following steps: generating initial plasma through the plasma pre-ionization system; the neutral beam injection system injects neutral particles into the initial plasma, and the injection energy is dynamically adjusted according to the plasma density monitored in real time; the electron cyclotron wave heating system injects microwave energy to drive electrons to generate plasma current; the diagnosis system monitors plasma parameters and neutral beam penetration depth in real time, and feeds back the parameters to the injection system and the heating system to adjust the parameters; and after the plasma current reaches the standard and is stable, parameters are optimized to maintain steady-state operation. The system comprises a pre-ionization module, an injection module, a heating module, a diagnosis module and a control module. According to the invention, the volt-second consumption and construction cost are reduced, the starting efficiency and stability are improved, the device is prevented from being damaged, and various magnetic confinement fusion devices are adapted.

The invention discloses a light, heat and cold plasma concerted catalytic reaction device which comprises a gas treatment unit, a cold plasma generation unit, a reaction unit and a control unit, and the gas treatment unit is responsible for gas pretreatment and product separation; the cold plasma generation unit generates dielectric barrier discharge plasma to activate reactants; the reaction unit integrates plasma generation, wide-range temperature control and illumination structures, and can be compatible with flat plate type and tubular reactors suitable for different temperature zones (300-800 DEG C); the control unit performs centralized programming through upper computer software and accurately regulates and controls gas flow, temperature, plasma parameters and illumination conditions, and the device can flexibly combine light, heat and cold plasma energy fields, supports multiple reaction modes such as segmented pre-activation and integrated cooperation, and is suitable for large-scale industrial production. The problems that existing equipment is single in function, limited in working temperature interval and low in intelligent degree are solved, and a standardized platform is provided for multi-field coupling catalysis research.

The present invention discloses a plasma cleaning device for a precision electron microscope analysis instrument, which includes an electron microscope analysis instrument cavity. The electron microscope analysis instrument cavity is respectively connected to a vacuum gauge, an RGA analyzer, a QCM film thickness controller and a vacuum pump. The electron microscope analysis instrument cavity is also connected to a plasma generator. A Langmuir probe is arranged on the connecting pipeline between the output end of the plasma generator and the electron microscope analysis instrument cavity for measuring the plasma parameters generated during the discharge of the plasma generator. A leak valve is arranged at the top of the output end of the plasma generator, and the input end of the plasma generator is connected to a radio frequency source through a radio frequency wire. The plasma cleaning device for the precision electron microscope analysis instrument can select an appropriate discharge power according to the type and size of the cavity to be cleaned, so as to achieve the purpose of cleaning pollutants, and has stronger applicability; the plasma is generated by radio frequency source excitation to clean the inside of the cavity, and the inner wall of the cleaned cavity will not be damaged.

The invention provides a radio frequency power supply control method in double-frequency plasma processing, and belongs to the technical field of semiconductor device processing. The radio frequency power supply control method in the double-frequency plasma processing comprises the steps that real-time power of a high-frequency radio frequency generator and real-time power of a low-frequency radio frequency generator are collected; the actual offset condition of the power in each target process can be obtained, and the power of the corresponding radio-frequency power supply can be adjusted under the condition that the plasma parameters do not meet the processing requirements, so that the radio-frequency power supply can compensate the power fluctuation in time, the plasma parameters can continuously meet the wafer processing requirements, the stability is kept, and the processing efficiency is improved. And control and stability of the machining process are facilitated, and machining defects or quality fluctuation caused by unstable plasma parameters are avoided.

The application relates to the technical field of material surface treatment technology, and discloses a remote plasma source device for thin film deposition, which comprises a plasma generation cavity, a PECVD process cavity and a microwave magnetron, the PECVD process cavity is connected below the plasma generation cavity, the microwave magnetron is arranged outside the plasma generation cavity, and a splash-proof heat dissipation assembly is arranged outside the plasma generation cavity; the device is designed with a layered plasma generation cavity, so that the stability of plasma parameters is ensured, the aluminum alloy outer cavity not only provides stable mechanical support, but also can quickly lead out the heat of the inner cavity, and the plasma parameter drift caused by excessively high temperature is avoided; the processing cavity made of ceramic material has extremely strong plasma corrosion and sputtering resistance, metal particle pollution is prevented from the root, and the thin film purity is obviously improved; in addition, the flexible graphite foil is arranged, and the expansion difference between the ceramic processing cavity and the aluminum alloy outer cavity is absorbed through elastic deformation.

The present application relates to the technical field of plasma analysis, and discloses a dust plasma parameter inversion method, which comprises the following steps: firstly, measuring the attenuation coefficient of dust plasma to microwaves through experimental measurement; secondly, inversely deducing the dielectric coefficient and conductivity of dust plasma from the attenuation coefficient calculation formula; thirdly, substituting the deduced result into the dust plasma dielectric coefficient and conductivity calculation formula to obtain the electron concentration, dust particle concentration and dust particle radius in the dust plasma; and finally, verifying the reliability of the inversion result. The present application is based on the microwave transmission theory and experimental research of dust plasma, verifies and perfects the related theory, and proposes a measurement method of internal parameters of dust plasma, which has practical significance for further exploring the radio physics problems in dust plasma.

The invention provides a method and system to remotely monitor a plasma (3) comprising a magnetic field antenna (2) positioned in the near electromagnetic field of a coupled plasma source wherein the magnetic field antenna is a magnetic loop antenna placed in the near electromagnetic field and measure near field signals emitted from the plasma source. A radio system (1) is utilised to analyse the low power signal levels across a wide frequency band. Plasma parameters such as series, or geometric, resonance plasma and electron-neutral collision frequencies are evaluated via a fitting of resonant features present on higher harmonics of the driving frequency to identify arcing, pump or matching failure events, common in fabrication plasma systems.

The invention discloses a simulation modeling method and device for a trigger breakdown process of a surface flashover type trigger vacuum switch, electronic equipment and a storage medium. The method comprises the following steps: determining a trigger condition of the surface flashover type trigger vacuum switch; according to the trigger condition, performing simulation calculation on the trigger breakdown process of the surface flashover type trigger vacuum switch to obtain the surface discharge characteristic of the surface flashover type trigger vacuum switch; according to the electron current density of the local surface of the anode, performing simulation calculation on the evaporation process of the local surface of the anode in the surface flashover type trigger vacuum switch to obtain the evaporation characteristic of the local surface of the anode under the action of the electron current; according to the evaporation characteristic and the density of the initial electrons diffused into the main gap, performing simulation calculation on the main gap breakdown process of the surface flashover type trigger vacuum switch so as to obtain an evolution rule of microscopic plasma parameters of the surface flashover type trigger vacuum switch; and multi-physics field coupling simulation of the trigger breakdown process of the surface flashover type trigger vacuum switch is realized.

The invention discloses a plasma constrained mode conversion control method based on boundary particle injection assistance, and relates to the technical field of constrained mode conversion control, and the method comprises the steps: calculating an initial set value of a power threshold through a built-in prediction model of a control unit based on the operation parameters of a current plasma, and entering a closed-loop control stage; in the closed-loop control stage, real-time plasma parameters are obtained through a diagnosis module; calculating a real-time power threshold value based on the plasma parameters, and comparing the real-time power threshold value with an initial set value to obtain a comparison result; according to a comparison result, dynamically adjusting injection parameters of a neutral particle injection module for injecting neutral particles into the plasma boundary region and heating power of a heating module for injecting energy into the plasma through a control unit in different control modes; the problems of high power dependence, inaccurate control and unstable conversion in the prior art are solved, and efficient and adaptive L-H conversion is realized.

Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.

A method and device for monitoring the ground ignition process of a Hall thruster relates to the technical field of spacecraft equipment monitoring. To address the technical problem in the prior art that existing Hall thruster ignition process monitoring methods are unable to capture the details and rapid changes in the ignition process, the present invention provides a technical solution: the method includes: collecting the location and spatial evolution of the Hall thruster ignition within a vacuum tank; collecting the light beam during the Hall thruster ignition, separating the light beam according to a preset wavelength range, and collecting the light intensity and time evolution of different wavelengths; collecting the ion current density and beam divergence angle of the Hall thruster far-field plume; and determining the impact of the ignition phenomenon on plasma parameters based on the ignition location and spatial evolution, the light intensity of different wavelengths, and the ion current density and beam divergence angle. This method can be applied to the combined optoelectronic monitoring of the Hall thruster ignition process.

The application provides a method, device and medium for evaluating ion cyclotron resonance heating efficiency of a stellarator. The method comprises the following steps: obtaining plasma parameters of plasma in the stellarator, wave parameters of incident waves used for heating the plasma, and device parameters of the stellarator, calculating single-pass absorption parameters used for evaluating the heating efficiency according to the plasma parameters, the wave parameters and the device parameters, and determining a heating type of ion cyclotron resonance heating according to ion properties of the plasma in the stellarator; determining a single-pass absorption model corresponding to the heating type, and calculating a single-pass absorption rate corresponding to the heating type by using the single-pass absorption model according to the single-pass absorption parameters, the wave parameters and the device parameters; and evaluating the heating efficiency according to the single-pass absorption rate. The heating efficiency evaluation method provided by the application is suitable for a single machine environment, does not consume too much computing power, and has a small error.

The invention relates to the technical field of material surface treatment technology, and discloses a remote plasma source device for thin film deposition, the remote plasma source device comprises a plasma generation cavity, a PECVD process cavity and a microwave magnetron, the PECVD process cavity is communicated below the plasma generation cavity, the microwave magnetron is arranged on the outer side of the plasma generation cavity, and the plasma generation cavity is communicated with the PECVD process cavity. A splash-proof heat dissipation assembly is arranged on the outer side of the plasma generation cavity; according to the device, the stability of plasma parameters is guaranteed through the plasma generation cavity designed in a layered mode, the aluminum alloy outer cavity not only provides stable mechanical support, but also can rapidly lead out heat of the inner cavity, and plasma parameter drift caused by too high temperature is avoided; the processing cavity made of the ceramic material has extremely high plasma corrosion resistance and sputtering resistance, metal particle pollution is prevented from the source, the purity of the thin film is remarkably improved, and in addition, due to the arrangement of the flexible graphite foil, the expansion difference between the ceramic processing cavity and the aluminum alloy outer cavity is absorbed through elastic deformation.

The invention discloses a high-power negative ion source multichannel current filtering magnetic field method, which belongs to the technical field of nuclear fusion neutral beam injection, and comprises the following steps: designing and optimizing a plasma electrode of a high-power negative ion source multichannel current filtering magnetic field device: forming a resistance balance groove in one surface, facing an extraction electrode, of the plasma electrode; designing an independent cooling water path: separating the plasma electrode from a cooling water inlet pipeline and a cooling water return pipeline of other parts, and arranging an independent flow meter and a temperature sensor; and debugging a power supply function and a current control function of a filtering magnetic field power supply of the high-power negative ion source multi-channel current filtering magnetic field device to obtain an optimal filtering magnetic field current parameter under different plasma parameter conditions so as to guide a long pulse operation experiment. According to the invention, a more uniform and stronger filtering magnetic field can be generated, and the electron temperature of the area near the leading-out surface of the high-power negative ion source is effectively reduced.