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4 results about "One shot" patented technology

A side frame swing bolster inspection production automatic production line

The utility model discloses a side frame swing bolster check production automatic production line, by tray feeding area, first removal and loading buffer area, water flow sand cleaning area, cutting area, gas planing area, second removal and loading buffer area, one shot shot blasting machine, two -layer platform buffer area, side frame polishing area, swing bolster polishing area, welding repair area, first stereoscopic warehouse, normalizing area, second stereoscopic warehouse, secondary shot blasting machine, one shot magnetic particle flaw detection area, secondary polishing area, third stereoscopic warehouse, secondary magnetic particle flaw detection area, size detection area, repair area and storage area constitute, can realize automatic production, and efficiency improves greatly, and manual cost reduces greatly, and can enter side frame polishing area or swing bolster polishing area according to side frame or swing bolster respectively, do not influence each other, and greatly improve the scope of application, adopt two magnetic particle flaw detection simultaneously, if there is a problem, can all automatically move to secondary polishing area and handle to guarantee product quality, and need not manual intervention, and efficiency improves greatly.
Owner:NANTONG GAOTENG INTELLIGENT TECH CO LTD

Injection mold for forming different shapes of products in one shot and two shots

ActiveCN117584368BDomestic articlesStructural engineeringOne shot
The application discloses an injection mold for product forming one-shot and two-shot different glue position shapes, which comprises an upper mold plate, a rotating plate and a lower mold plate, a sliding block and shovel base mechanism is arranged in a fixed groove, at least one one-shot shovel and at least one two-shot shovel are arranged at corresponding positions of both ends of the bottom of the upper mold plate; the sliding block and shovel base mechanism comprises an outer sliding block capable of horizontally sliding, an inner sliding block horizontally slidably connected with the inner side of the outer sliding block and two sliding block pressing strips respectively arranged on both sides of the outer sliding block, the front end of the outer sliding block is fixed with an outer insert, the front end of the inner sliding block is fixed with an inner insert, the front end of the outer insert can extend into a cavity formed between a male mold plate and a female mold plate, and the inner insert is horizontally connected with the outer insert. The mold combines the design scheme of two independent sliding block mechanisms into the design scheme of one outer sliding block and one inner sliding block to realize the existing requirements, the development cost of the mold is obviously reduced, and the production efficiency of the product is obviously improved.
Owner:PRIVALLEY TECH (CHANGSHU) CO LTD

Multi-charged particle beam lithography method and multi-charged particle beam lithography apparatus

This provides a drawing method that can reduce the total amount of on-beam current that is turned on simultaneously. [Solution] The multi-charged particle beam drawing method of the present invention is characterized by comprising the steps of: assigning a plurality of groups of irradiation unit regions, which are unit regions to which each beam of the multi-charged particle beam is irradiated, such that the groups of irradiation unit regions in each set are different from each other, and that the plurality of irradiation unit regions irradiated by each shot of the multi-charged particle beam include irradiation unit regions of different groups; assigning a subshot that is pre-set according to the irradiation time set for the irradiation unit region or a value obtained based on the irradiation time, from among a plurality of subshots of a plurality of sub-irradiation times obtained by dividing the maximum irradiation time for one shot; and assigning a subshot to an irradiation unit region to which another group of the plurality of groups is assigned, which includes a subshot other than the subshot pre-set for one group of the same set.
Owner:NUFLARE TECH INC