This invention relates to an object observation apparatus and
observation method. The object observation apparatus is characterized by including a drivable stage on which a sample is placed, an
irradiation optical
system which is arranged to face the sample on the stage, and emits an
electron beam as a secondary beam, an
electron detection device which is arranged to face the sample, causes to project, as a primary beam, at least one of a secondary
electron, reflected electron, and back-scattering electron generated by the sample upon
irradiation of the electron beam, and generates image information of the sample, a stage driving device which is adjacent to the stage to drive the stage, and a deflector arranged between the sample and the electron detection device to deflect the secondary beam, the electron detection device having a converter arranged on a detection surface to convert the secondary beam into light, an array
image sensing unit which is adjacent to the converter, has pixels of a plurality of lines each including a plurality of pixels on the detection surface, sequentially transfers charges of pixels of each line generated upon reception of light of an
optical image obtained via the converter to corresponding pixels of an adjacent line at a predetermined timing, adds, every transfer, charges generated upon reception of light after the transfer at the pixels which received the charges, and sequentially outputs charges added up to a line corresponding to an end, and a
control unit connected to the array
image sensing unit to output a transfer
signal for sequentially transferring charges of pixels of each line to an adjacent line, and the
control unit having a stage scanning mode in which the array
image sensing unit is controlled in accordance with a variation in projection position of the secondary beam projected on the electron detection device that is generated by movement of the stage device, and a deflector
operation mode in which the array image sensing unit is controlled in accordance with a variation in projection position of the secondary beam projected on the detection device by the deflector.