10 results about "Langmuir probe" patented technology

This invention discloses a Langmuir probe fixing assembly for a vacuum chamber, relating to the field of nuclear fusion device technology. The probe fixing assembly includes a probe array disk and an insulating mounting structure. An array aperture platform is provided in the center of the probe array disk, and the array aperture platform is used to pass through corresponding probe array needles. One end face of the probe array disk is detachably connected to one end of the insulating mounting structure, and the other end of the insulating mounting structure is used to be fixedly connected to the inner wall of the vacuum chamber. This allows for changes in the layout of the probe array according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters. A plasma measurement assembly includes a probe array box and the aforementioned Langmuir probe fixing assembly for a vacuum chamber. One end of the probe array box is provided with probe array needles, and the end of the probe array box with the probe array needles is fixedly connected to the probe array disk.

The present application provides a method and system for inferring an electron temperature from a hollow cathode plume color, applicable to diagnosis and inference of the electron temperature distribution of the hollow cathode under in-orbit or other vacuum environments. The method includes extraction of plume color data of the hollow cathode, two-dimensional processing of the plume color data, establishment of a correlation database between gridded colors and electron temperatures, and inference of the electron temperature distribution using the gridded colors. The inferred data of the electron temperature obtained in the present application exhibits trends consistent with measurement data obtained using a Langmuir probe, with diagnostic deviations within 30%. Based on the present application, researchers can directly leverage hollow cathode plume images to perform rapid, non-contact diagnosis of the electron temperature distribution characteristics.

The present application relates to a kind of Langmuir probe structure and its preparation method, the Langmuir probe structure includes the tungsten probe being arranged from inside to outside along the radial direction, composite ceramic tube and heat shield;Between the composite ceramic tube and tungsten probe, and between composite ceramic tube and heat shield respectively independently copper-based brazing filler metal layer is arranged;The composite ceramic tube includes ceramic tube and transition layer being arranged in the inner and outer surface of ceramic tube;The Langmuir probe structure provided by the present application is a kind of tungsten probe-copper-based brazing filler metal layer-transition layer-ceramic tube-transition layer-copper-based brazing filler metal layer-heat shield structure, transition layer powder contains more than 75wt% tungsten component, forms tungsten skeleton in preparation process, it is convenient for brazing filler metal to infiltrate into tungsten skeleton and form dense connection, simultaneously with the effect of wetting tungsten material.The Langmuir probe provided by the present application has the advantages of high structural strength, strong high-temperature load resistance.

The invention discloses a load modeling and system control method considering an annular plasma source under multi-physics field coupling in the technical field of plasma sources. According to the method, plasma impedance Zp is equivalent to a series circuit model of nonlinear impedance Rp and inductive reactance Lp, a polynomial fitting relational expression of impedance and inductive reactance is established by constructing a multi-physical field coupling mathematical model, then a simulation model of the impedance Zp is constructed, and the model can predict Zp values under different physical parameters. The predicted value participates in control of a driving power supply, and a basis is provided for constant current / constant power mode switching of the system. The load modeling method is non-invasive high-precision measurement, invasive limitation of a Langmuir probe is avoided, the error of the predicted impedance parameter is small, and the plasma source is accurately and stably controlled in a complex environment. Meanwhile, according to the system control method, full-load-range ZVS conduction is achieved through dynamic intercept prediction, reactive power is restrained, and system efficiency and stability are improved.

The application discloses a Langmuir probe detection method and system, and relates to the technical field of plasma detection; the application is improved on the basis of the existing Langmuir probe detection method; in the process of detecting plasma by using three probes in a three-probe mode, the working state of the three probes is monitored in real time to determine whether the working state is abnormal; the measurement mode of each probe is switched according to the abnormal working state of the three probes, so that the probe with a normal working state can continuously detect; when some probes are damaged due to plasma ablation or other reasons, the remaining probes can still measure the plasma parameters as much as possible, and resource waste is avoided.

A non-optical sensor system tracks and detects an endpoint of various photoresist processes. Photoresist processes may include deposition, development, bevel edge and / or backside clean, bake, etch, and chamber clean operations. Chamber clean may involve one or both of a thermal clean and a plasma clean of unintended metal-containing material. Endpoint detection of the thermal clean or remote plasma clean uses a throttle valve sensor that measures a position of a throttle valve over time. Alternatively, endpoint detection of the thermal clean or remote plasma clean uses a chamber manometer that tracks chamber pressure while the throttle valve is held constant. Endpoint detection of the plasma clean uses a non-optical sensor that can include an RF matching network, a temperature sensor, a heater control sensor, a Langmuir probe, or an RF harmonics sensor.

The invention discloses a directional electronic probe system suitable for a star simulator magnetic confinement fusion device. The directional electronic probe system comprises a stainless steel base, an insulating shell, a fast electronic probe assembly, a Langmuir probe assembly and a ceramic base. A plurality of Langmuir probes are distributed at the front end of the probe system, and a plurality of fast electron probes are symmetrically and uniformly distributed on two side surfaces along two mutually perpendicular directions and are used for collecting electron current. The fast electron probe and the Langmuir probe respectively comprise a graphite probe, a copper binding post, a wire and other parts, and are reliable in connection and resistant to high temperature. The whole probe adopts a three-inclined layout and is used for adapting to a complex three-dimensional environment of a star simulator magnetic field. According to the fast electron probe, the Larmor radius of electrons in magnetic confinement plasma is far smaller than that of ions, and the ions can be effectively repelled and the electrons can be collected by setting the width and depth of small holes. The device can work in a high-temperature environment in the magnetic confinement fusion device, and is stable in mechanical performance, reliable in signal, high in spatial resolution and small in occupied space.

The invention provides the two-stage anode layer electric thruster simulation test device which is convenient for plasma measurement in the discharge chamber in the circumferential tangential direction. The problems that an axially-arranged discharge chamber of an existing two-stage anode layer Hall thruster is complex and narrow, and plasma parameters in the discharge chamber are difficult to measure are solved. A radial discharge two-stage anode layer ion source with the same working principle and similar working characteristics as a two-stage anode layer Hall thruster is proposed to simulate the discharge and acceleration process of the two-stage anode layer Hall thruster. The test device comprises a radial discharge two-stage anode layer ion source, a power supply, a working medium supply system, a controller, optical image acquisition equipment, a Langmuir probe or an emission spectrum optical fiber probe. The test device can realize simulation of discharge and acceleration processes of the two-stage anode layer electric thruster, so that measurement of plasma parameters can be conveniently carried out in the open circumferential tangential direction, and support is provided for research and optimization of the electric thruster.

The present application relates to the technical field of ion source detection, and particularly relates to an ion source detection device and a detection method, aiming to solve the problem of probe interference detection accuracy of the existing detection device.The ion source detection device provided by the present application comprises a radial movement assembly, an axial movement assembly and Langmuir probes; a plurality of Langmuir probes are installed on the radial movement assembly and are annularly and uniformly distributed around the axis of the ion beam, and the radial movement assembly is installed on the axial movement assembly; the axial movement assembly is used to drive the radial movement assembly to move along the axial direction, and the radial movement assembly is used to drive the Langmuir probes to move along the radial direction to approach or move away from the axis of the ion beam.The present application ensures comprehensive detection of the ion beam through the annular array of Langmuir probes, and moving the annular array of Langmuir probes to different positions for detection through the axial movement assembly can avoid mutual interference of the Langmuir probes arranged along the length direction of the ion beam, thereby avoiding the problem of probe interference detection accuracy.

The invention provides a Langmuir probe and a detection system. The Langmuir probe includes a first insulating layer, a collector, and a ground conductor. The first end of the collector is arranged in the first insulating layer, and the second end of the collector extends out of the first insulating layer. The grounding conductor is arranged on the outer side of the first insulating layer, one end of the grounding conductor is electrically contacted with plasma, and the other end is electrically connected with a grounding end of the data acquisition system to form a grounding loop. When the collector of the Langmuir probe is in contact with the low-density plasma, a local backflow channel is formed between the collector and the grounding conductor, so that voltage division and measurement distortion caused by overlarge resistance of the sheath layer of the cavity wall are effectively avoided, the resistive voltage division influence between the plasma and the cavity wall is reduced, and the measurement accuracy is improved. The method is suitable for accurate diagnosis in a low-density and weak-conductance plasma environment.