24 results about "Langmuir probe" patented technology

The present invention relates to a plasma thruster plume parameter multi-point measurement device and a measurement method, the multi-point measurement device comprises: a vacuum chamber; a vacuum pump unit connected to the vacuum chamber; an industrial control unit connected to the vacuum pump unit, used to provide and maintain the vacuum environment of the vacuum chamber; and a measurement unit; the measurement unit comprises: at least two three-dimensional mobile platforms arranged in the vacuum chamber; a detection structure arranged on the three-dimensional mobile platform; a collection unit connected to the detection structure and used to collect data; the detection structure adopts a Langmuir probe, an RPA probe or a Faraday probe. The present invention can improve the plasma measurement efficiency, can continuously measure the multi-point symmetry of the plume, break the limitation of the use of the Langmuir probe, and shield the error interference in the probe circuit. At the same time, the multi-point measurement device of the present invention has a simple structure, is stable and reliable, and has strong practicality.

The invention discloses a linear power amplifier for Langmuir probe diagnosis and a working method thereof. The linear power amplifier comprises a high-potential power amplifier and a low-potential power amplifier, each of the high-potential power amplifier and the low-potential power amplifier comprises an NPN triode and a PNP triode; base electrodes of two triodes in the high-potential power amplifier are connected to the high-potential driving circuit; base electrodes of two triodes in the low-potential power amplifier are connected to the low-potential driving circuit; the collector electrode of the NPN triode in the high-potential power amplifier and the collector electrode of the NPN triode in the low-potential power amplifier are both connected to a positive power supply, and the collector electrode of the PNP triode in the high-potential power amplifier and the collector electrode of the PNP triode in the low-potential power amplifier are both connected to a negative power supply. The emitting electrodes of the two triodes in the high-potential power amplifier are both connected with the high-potential output end, and the emitting electrodes of the two triodes in the low-potential power amplifier are both connected with the low-potential output end.

This invention discloses a Langmuir probe fixing assembly for a vacuum chamber, relating to the field of nuclear fusion device technology. The probe fixing assembly includes a probe array disk and an insulating mounting structure. An array aperture platform is provided in the center of the probe array disk, and the array aperture platform is used to pass through corresponding probe array needles. One end face of the probe array disk is detachably connected to one end of the insulating mounting structure, and the other end of the insulating mounting structure is used to be fixedly connected to the inner wall of the vacuum chamber. This allows for changes in the layout of the probe array according to different experimental requirements, reducing the workload and economic cost of replacing the entire probe, and improving the probe's ability to measure plasma parameters. A plasma measurement assembly includes a probe array box and the aforementioned Langmuir probe fixing assembly for a vacuum chamber. One end of the probe array box is provided with probe array needles, and the end of the probe array box with the probe array needles is fixedly connected to the probe array disk.

The invention relates to a remote plasma photoresist removing uniformity measurement system and a measurement method thereof. The measurement method comprises the following steps: arranging a remote plasma photoresist removing structure on a wafer to generate plasma; a Langmuir probe is arranged in the remote plasma photoresist removing structure, so that the density of generated plasmas is distributed in the radial direction; setting a treatment process of the remote plasma photoresist removing structure, starting parameter measurement, and respectively measuring the electron density of the plasma on a plurality of point positions distributed in the radial direction; acquiring a plasma non-uniform factor according to the measured electron density of the plasma; and judging the remote plasma photoresist removing uniformity according to the plasma non-uniform factor. The Langmuir probe extends into the reaction cavity of the remote plasma photoresist removing structure, so that the radial uniformity of the remote plasma can be detected in situ, the repeatability is good, the cost is low, the operation is easy, important data support is provided for subsequent process optimization and research, meanwhile, the influence on the sample effect in the treatment process can be reduced, and the detection accuracy is improved. And the treatment process effect is optimized.

The present application provides a method and system for inferring an electron temperature from a hollow cathode plume color, applicable to diagnosis and inference of the electron temperature distribution of the hollow cathode under in-orbit or other vacuum environments. The method includes extraction of plume color data of the hollow cathode, two-dimensional processing of the plume color data, establishment of a correlation database between gridded colors and electron temperatures, and inference of the electron temperature distribution using the gridded colors. The inferred data of the electron temperature obtained in the present application exhibits trends consistent with measurement data obtained using a Langmuir probe, with diagnostic deviations within 30%. Based on the present application, researchers can directly leverage hollow cathode plume images to perform rapid, non-contact diagnosis of the electron temperature distribution characteristics.

The present application relates to a kind of Langmuir probe structure and its preparation method, the Langmuir probe structure includes the tungsten probe being arranged from inside to outside along the radial direction, composite ceramic tube and heat shield;Between the composite ceramic tube and tungsten probe, and between composite ceramic tube and heat shield respectively independently copper-based brazing filler metal layer is arranged;The composite ceramic tube includes ceramic tube and transition layer being arranged in the inner and outer surface of ceramic tube;The Langmuir probe structure provided by the present application is a kind of tungsten probe-copper-based brazing filler metal layer-transition layer-ceramic tube-transition layer-copper-based brazing filler metal layer-heat shield structure, transition layer powder contains more than 75wt% tungsten component, forms tungsten skeleton in preparation process, it is convenient for brazing filler metal to infiltrate into tungsten skeleton and form dense connection, simultaneously with the effect of wetting tungsten material.The Langmuir probe provided by the present application has the advantages of high structural strength, strong high-temperature load resistance.

The present invention discloses a multifunctional measurement circuit applicable to a Langmuir probe and a control method thereof. The circuit at least includes a Langmuir probe, a plurality of relay switches, and a control module. The output end of the first Langmuir probe is connected to the first end of the first voltage sampling module. The second end of the first voltage sampling module is connected to the first end of the second voltage sampling module. The second end of the second voltage sampling module is connected to the output end of the second Langmuir probe. The first end of the first voltage sampling module is further connected to the first end of the current sampling module. The second end of the current sampling module is connected to a scanning power supply or a regulated power supply. The control module is connected to each relay switch and is used to control the on / off of each relay switch so that the circuit can be switched to different circuit modes. The present invention can automatically switch to the corresponding circuit mode according to the number of probes and measurement requirements, effectively improving the operation efficiency of the measurement circuit system and saving maintenance costs and time.

The present invention discloses a plasma cleaning device for a precision electron microscope analysis instrument, which includes an electron microscope analysis instrument cavity. The electron microscope analysis instrument cavity is respectively connected to a vacuum gauge, an RGA analyzer, a QCM film thickness controller and a vacuum pump. The electron microscope analysis instrument cavity is also connected to a plasma generator. A Langmuir probe is arranged on the connecting pipeline between the output end of the plasma generator and the electron microscope analysis instrument cavity for measuring the plasma parameters generated during the discharge of the plasma generator. A leak valve is arranged at the top of the output end of the plasma generator, and the input end of the plasma generator is connected to a radio frequency source through a radio frequency wire. The plasma cleaning device for the precision electron microscope analysis instrument can select an appropriate discharge power according to the type and size of the cavity to be cleaned, so as to achieve the purpose of cleaning pollutants, and has stronger applicability; the plasma is generated by radio frequency source excitation to clean the inside of the cavity, and the inner wall of the cleaned cavity will not be damaged.

In one embodiment, systems and methods include using a Langmuir probe to measure a plasma. The Langmuir probe comprises a housing, wherein the housing comprises an outer diameter and an inner diameter, wherein the inner diameter defines an internal cavity. The Langmuir probe further comprises a plurality of bodies, wherein the plurality of bodies is disposed at least partially within the inner cavity, wherein each of the plurality of bodies comprise a set of internal cavities. The Langmuir probe further comprises a plurality of double Langmuir probes disposed each set of the internal cavities.

The invention discloses a load modeling and system control method considering an annular plasma source under multi-physics field coupling in the technical field of plasma sources. According to the method, plasma impedance Zp is equivalent to a series circuit model of nonlinear impedance Rp and inductive reactance Lp, a polynomial fitting relational expression of impedance and inductive reactance is established by constructing a multi-physical field coupling mathematical model, then a simulation model of the impedance Zp is constructed, and the model can predict Zp values under different physical parameters. The predicted value participates in control of a driving power supply, and a basis is provided for constant current / constant power mode switching of the system. The load modeling method is non-invasive high-precision measurement, invasive limitation of a Langmuir probe is avoided, the error of the predicted impedance parameter is small, and the plasma source is accurately and stably controlled in a complex environment. Meanwhile, according to the system control method, full-load-range ZVS conduction is achieved through dynamic intercept prediction, reactive power is restrained, and system efficiency and stability are improved.

A non-optical sensor system tracks and detects an endpoint of various photoresist processes. Photoresist processes may include deposition, development, bevel edge and / or backside clean, bake, etch, and chamber clean operations. Chamber clean may involve one or both of a thermal clean and a plasma clean of unintended metal-containing material. Endpoint detection of the thermal clean or remote plasma clean uses a throttle valve sensor that measures a position of a throttle valve over time. Alternatively, endpoint detection of the thermal clean or remote plasma clean uses a chamber manometer that tracks chamber pressure while the throttle valve is held constant. Endpoint detection of the plasma clean uses a non-optical sensor that can include an RF matching network, a temperature sensor, a heater control sensor, a Langmuir probe, or an RF harmonics sensor.

The invention discloses a wireless self-powered plasma density testing system and a testing method. The testing system comprises a wireless self-powered device, a langmuir probe and a receiving terminal, the wireless self-powered device comprises a cathode electron collection element and a circuit board. One end of the langmuir probe is mounted in the probe interface of the circuit board, and the other end of the langmuir probe extends into the plasma to be tested; a filtering voltage-stabilizing module, a voltage-reducing module, a main control chip, a voltage-boosting module, an operational amplification module and a current and voltage monitoring module which are electrically connected are sequentially arranged in the circuit board; the input end of the current and voltage monitoring module is connected with the output end of the operational amplification module, and the input end is connected with a langmuir probe through a sampling resistor and a pin header. Passive self-power supply is achieved in the magnetron sputtering cavity, the voltage does not need to be adjusted externally, meanwhile, the measured current value and the measured voltage value are transmitted to the external receiving terminal in a wireless transmission mode, wiring and vacuum cavity customization are not needed in the whole process, and cost is saved.

The invention relates to the technical field of ion source detection, in particular to an ion source detection device and method, and aims to solve the problem that a probe of an existing detection device interferes with the detection precision. The ion source detection device provided by the invention comprises a radial movement assembly, an axial movement assembly and a Langmuir probe, the Langmuir probes are installed on the radial moving assembly and annularly and uniformly distributed around the axis of the ion beam, and the radial moving assembly is installed on the axial moving assembly; the axial movement assembly is used for driving the radial movement assembly to move in the axial direction, and the radial movement assembly is used for driving the Langmuir probe to approach or leave the axis of the ion beam in the radial direction. Comprehensive detection of the ion beam is guaranteed through the Langmuir probes in the annular array, the Langmuir probes in the annular array are moved to different positions for detection through the axial moving assembly, mutual interference of the Langmuir probes arranged in the length direction of the ion beam can be avoided, and the problem that the probes interfere with the detection precision is avoided.

The application discloses a Langmuir probe detection method and system, and relates to the technical field of plasma detection; the application is improved on the basis of the existing Langmuir probe detection method; in the process of detecting plasma by using three probes in a three-probe mode, the working state of the three probes is monitored in real time to determine whether the working state is abnormal; the measurement mode of each probe is switched according to the abnormal working state of the three probes, so that the probe with a normal working state can continuously detect; when some probes are damaged due to plasma ablation or other reasons, the remaining probes can still measure the plasma parameters as much as possible, and resource waste is avoided.

This invention provides a method and system for inverting electron temperature from the optical color of a hollow cathode plume. It is applicable to the inversion and diagnosis of electron temperature distribution in hollow cathodes under on-orbit or other vacuum environments. The method is based on the extraction of optical color data from the hollow cathode plume, the two-dimensional processing of the plume optical color data, the establishment of a gridded optical color correlation database with electron temperature, and the inversion of electron temperature distribution using the gridded optical color. The electron temperature inversion data of this invention shows a trend consistent with Langmuir probe measurement data, with a diagnostic deviation within 30%. Based on this invention, researchers can directly and rapidly diagnose electron temperature distribution characteristics using hollow cathode plume photographs without physical contact.

A non-optical sensor system tracks and detects an endpoint of various photoresist processes. Photoresist processes may include deposition, development, bevel edge and / or backside clean, bake, etch, and chamber clean operations. Chamber clean may involve one or both of a thermal clean and a plasma clean of unintended metal-containing material. Endpoint detection of the thermal clean or remote plasma clean uses a throttle valve sensor that measures a position of a throttle valve over time. Alternatively, endpoint detection of the thermal clean or remote plasma clean uses a chamber manometer that tracks chamber pressure while the throttle valve is held constant. Endpoint detection of the plasma clean uses a non-optical sensor that can include an RF matching network, a temperature sensor, a heater control sensor, a Langmuir probe, or an RF harmonics sensor.

The invention provides an ionospheric sounding rocket test foundation observation combined measurement and calibration data processing system, and relates to the technical field of ionospheric sounding rocket tests, the system comprises a test window forecasting subsystem, a rocket ground data summarization analysis subsystem and a rocket ground data calibration comparison subsystem; the test window forecasting subsystem is used for collecting ionosphere parameters; the rocket-ground data summarization and analysis subsystem is used for reporting critical height of an ionized layer according to the foundation encrypted observation data, and obtaining a standard data product in combination with rocket-borne Langmuir probe detection data and sun and geomagnetic activity data; the rocket-ground data calibration and comparison subsystem is used for calibrating the detection data of the rocket-borne Langmuir probe after comparison analysis and standardization processing to obtain a calibration data product; according to the scheme, the rocket-ground data can be automatically read and analyzed, the rocket-ground joint measurement data can be automatically processed and calibrated, tedious steps and errors caused by manual operation are avoided, and the data processing speed and accuracy are improved.

The invention discloses a directional electronic probe system suitable for a star simulator magnetic confinement fusion device. The directional electronic probe system comprises a stainless steel base, an insulating shell, a fast electronic probe assembly, a Langmuir probe assembly and a ceramic base. A plurality of Langmuir probes are distributed at the front end of the probe system, and a plurality of fast electron probes are symmetrically and uniformly distributed on two side surfaces along two mutually perpendicular directions and are used for collecting electron current. The fast electron probe and the Langmuir probe respectively comprise a graphite probe, a copper binding post, a wire and other parts, and are reliable in connection and resistant to high temperature. The whole probe adopts a three-inclined layout and is used for adapting to a complex three-dimensional environment of a star simulator magnetic field. According to the fast electron probe, the Larmor radius of electrons in magnetic confinement plasma is far smaller than that of ions, and the ions can be effectively repelled and the electrons can be collected by setting the width and depth of small holes. The device can work in a high-temperature environment in the magnetic confinement fusion device, and is stable in mechanical performance, reliable in signal, high in spatial resolution and small in occupied space.

The invention provides a method and a system for hollow cathode plume light color inversion of electron temperature, which are suitable for inversion diagnosis of hollow cathode electron temperature distribution in on-orbit or other vacuum environments. The method is based on hollow cathode plume light color data extraction, two-dimensional processing of plume light color data, establishment of a correlation database of grid light color with respect to electronic temperature, and inversion of electronic temperature distribution by using the grid light color. According to the method, electron temperature inversion data and Langmuir probe measurement data are consistent in trend, the diagnosis deviation is within 30%, and based on the method, researchers can directly use hollow cathode plume pictures to quickly diagnose electron temperature distribution characteristics in a non-contact mode.

Relates to the technical field of plasma diagnosis, in particular to a plasma density detection scanning power supply which comprises a control circuit, a D / A converter, a scanning voltage generating circuit, a sampling circuit, a signal conditioning circuit and an A / D converter. A signal transmission pin of the control circuit is electrically connected with the upper computer, a power input pin of the control circuit is electrically connected with the power supply system, and a scanning signal output pin of the control circuit is electrically connected with the D / A converter; the output end of the D / A converter is electrically connected with the Langmuir probe through the scanning voltage generation circuit; the input end of the sampling circuit is electrically connected with the Langmuir probe, and the output end of the sampling circuit is electrically connected with the A / D converter through the signal conditioning circuit; the A / D converter is electrically connected with an input pin of the control circuit; the power supply is high in scanning speed and accurate in scanning result.

The invention provides the two-stage anode layer electric thruster simulation test device which is convenient for plasma measurement in the discharge chamber in the circumferential tangential direction. The problems that an axially-arranged discharge chamber of an existing two-stage anode layer Hall thruster is complex and narrow, and plasma parameters in the discharge chamber are difficult to measure are solved. A radial discharge two-stage anode layer ion source with the same working principle and similar working characteristics as a two-stage anode layer Hall thruster is proposed to simulate the discharge and acceleration process of the two-stage anode layer Hall thruster. The test device comprises a radial discharge two-stage anode layer ion source, a power supply, a working medium supply system, a controller, optical image acquisition equipment, a Langmuir probe or an emission spectrum optical fiber probe. The test device can realize simulation of discharge and acceleration processes of the two-stage anode layer electric thruster, so that measurement of plasma parameters can be conveniently carried out in the open circumferential tangential direction, and support is provided for research and optimization of the electric thruster.

A non-optical sensor system tracks and detects the endpoints of various photoresist processes. The photoresist process may include deposition, development, bevel edge and / or backside cleaning, baking, etching, and chamber cleaning operations. Chamber cleaning may involve one or both of thermal cleaning and plasma cleaning of an unintended metal-containing material. End point detection of thermal cleaning or remote plasma cleaning uses a throttle valve sensor that measures the position of the throttle valve over time. Alternatively, endpoint detection of thermal cleaning or remote plasma cleaning uses a chamber pressure gauge that tracks the chamber pressure while the throttle valve remains constant. End point detection of plasma cleaning uses a non-optical sensor, which may include an RF matching network, a temperature sensor, a heater control sensor, a Langmuir probe, or an RF harmonic sensor.

The present application relates to the technical field of ion source detection, and particularly relates to an ion source detection device and a detection method, aiming to solve the problem of probe interference detection accuracy of the existing detection device.The ion source detection device provided by the present application comprises a radial movement assembly, an axial movement assembly and Langmuir probes; a plurality of Langmuir probes are installed on the radial movement assembly and are annularly and uniformly distributed around the axis of the ion beam, and the radial movement assembly is installed on the axial movement assembly; the axial movement assembly is used to drive the radial movement assembly to move along the axial direction, and the radial movement assembly is used to drive the Langmuir probes to move along the radial direction to approach or move away from the axis of the ion beam.The present application ensures comprehensive detection of the ion beam through the annular array of Langmuir probes, and moving the annular array of Langmuir probes to different positions for detection through the axial movement assembly can avoid mutual interference of the Langmuir probes arranged along the length direction of the ion beam, thereby avoiding the problem of probe interference detection accuracy.

The invention provides a Langmuir probe and a detection system. The Langmuir probe includes a first insulating layer, a collector, and a ground conductor. The first end of the collector is arranged in the first insulating layer, and the second end of the collector extends out of the first insulating layer. The grounding conductor is arranged on the outer side of the first insulating layer, one end of the grounding conductor is electrically contacted with plasma, and the other end is electrically connected with a grounding end of the data acquisition system to form a grounding loop. When the collector of the Langmuir probe is in contact with the low-density plasma, a local backflow channel is formed between the collector and the grounding conductor, so that voltage division and measurement distortion caused by overlarge resistance of the sheath layer of the cavity wall are effectively avoided, the resistive voltage division influence between the plasma and the cavity wall is reduced, and the measurement accuracy is improved. The method is suitable for accurate diagnosis in a low-density and weak-conductance plasma environment.