Probe and method for measuring plasma space potential by aid of bias currents
A technology of plasma and bias current, applied in the direction of electrostatic field measurement, etc., to improve the measurement accuracy and avoid the effect of thermal electron emission
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[0041] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0042] Specifically, the probe for measuring plasma space potential using bias current consists of a spherical conductive outer shell 1, a conductive middle shell 2, a conductive inner shell 3, a built-in coupling potential detection circuit 4, and a bias current source Circuit 6, low-pass filter circuit 7, and signal processing unit 5 and so on.
[0043] The probe spherical conductive outer casing 1 is coupled with its surrounding plasma to obtain a relative coupling potential; the coupling potential detection circuit 4 is used to detect the coupling potential of the outer casing 1; the bias current source circuit 6 is used to provide the required applied to The bi...
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