Gas discharging type plasma density automatic regulation and control system and device

A plasma and gas discharge technology, applied in the direction of plasma, electrical components, etc., to achieve the effect of improving experimental efficiency and avoiding adjustment errors

Inactive Publication Date: 2017-08-22
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] In order to solve the problem that the current plasma source needs to adjust the discharge voltage by traditional manual means and then adjust and measure the plasma density

Method used

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  • Gas discharging type plasma density automatic regulation and control system and device

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specific Embodiment approach 1

[0039] Specific implementation mode one: combine figure 1 To describe this embodiment,

[0040] A gas discharge type plasma density automatic control system is a system for monitoring discharge parameters and density control of a plasma source. The plasma source (inductively coupled plasma source, ICP) is supplied with gas through a gas source, and the gas The flow controller is set between the gas source and the gas supply end of the plasma source to control the gas source flow of the plasma source; the plasma source is exhausted through a mechanical pump; a Langmuir probe is installed inside the plasma source , the radio frequency power supply supplies power to the discharge electrode of the plasma source;

[0041] The gas discharge type plasma density automatic control system includes:

[0042] The gas flow control unit is used to detect the state of the gas flow controller, and control the gas flow controller to supply gas to the plasma source;

[0043] The Langmuir pro...

specific Embodiment approach 2

[0047] The gas discharge type plasma density automatic control system described in this embodiment also includes:

[0048] The radio frequency power supply electrical characteristic detection unit is used to collect the voltage and current signals of the radio frequency power supply, and judge whether the radio frequency power supply is working normally and the discharge stability of the plasma. The normal voltage and current of the RF power supply can be compared with the voltage and current signals of the collected RF power supply to determine whether the RF power supply is working normally; the discharge stability can be judged by the stability of the current signal of the RF power supply.

[0049] Other units and modules are the same as those in the first embodiment.

specific Embodiment approach 3

[0051] The radio frequency power supply electrical characteristic detection unit described in this embodiment includes:

[0052] The radio frequency power supply voltage detection module is used to detect the voltage signal of the radio frequency power supply;

[0053] The radio frequency power supply current detection module is used to detect the current signal of the radio frequency power supply;

[0054] The electrical characteristic detection module is used for judging the discharge stability of the radio frequency power supply and judging whether the radio frequency power supply is working normally.

[0055] Other units and modules are the same as in the second embodiment.

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Abstract

The invention provides a gas discharging type plasma density automatic regulation and control system and device, and relates to a plasma density automatic regulation and control system and device. The objective of the invention is to solve the problem that plasma density should be adjusted and measured through traditional manual adjustment of discharging voltage for the current plasma sources. The system comprises a gas flow control unit used for controlling a gas flow controller to work to provide gas for a plasma source, a Langmuir probe electric feature parameter detection unit, a plasma density calculating unit, and a PID control unit. The Langmuir probe electric feature parameter detection unit is used for detecting voltage signals imposed on a Langmuir probe and current signals generated by the Langmuir probe when the plasma acts with the Langmuir probe. The plasma density calculating unit is used for calculating density of the plasma in the corresponding plasma source. The PID control unit is used for outputting a radio frequency power supply control signal to control a radio frequency power supply to provide corresponding voltage to the plasma source. The system and the device are suitable for automatic regulation and control of plasma density.

Description

technical field [0001] The invention relates to a plasma density automatic control system and device. Background technique [0002] Plasma is not only the main research object of space physics and fusion nuclear physics, but also plays an extremely important role in people's production and life. In terms of industry, plasma application technology is becoming more and more extensive, including playing an important role in many fields such as material synthesis, coating technology, material surface modification, plasma etching, nanotechnology, and metallurgy technology. For example, large-scale, very large-scale integrated circuits, which are widely used in many consumer electronics products, are produced using plasma etching technology. Similar plasma surface treatment processes also play an important role in other important industrial categories related to the national economy and people's livelihood, such as aerospace, automobile manufacturing, and steel smelting. Because...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/00H05H1/46
CPCH05H1/0081H05H1/46H05H2242/20
Inventor 孙宇飞聂秋月黄瀚霄林伟胜孔繁荣徐广野
Owner HARBIN INST OF TECH
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