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30 results about "Plasma parameter" patented technology
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The plasma parameter is a dimensionless number, denoted by capital Lambda, Λ. The plasma parameter is usually interpreted to be the argument of the Coulomb logarithm, which is the ratio of the maximum impact parameter to the classical distance of closest approach in Coulomb scattering. In this case, the plasma parameter is given by: Λ=4πnλD³ where n is the number density of electrons, λD is the Debye length.
Smart additive manufacturing system (SAMS)
ActiveUS20160052086A1Additive manufacturing apparatusArc welding apparatusEngineeringOptical emission spectrometry
An additive manufacturing process is monitored, in situ, using optical emission spectroscopy to analyze the composition, phase transformation or manufacturing defects. The system or method may include an analysis of contours of the plasma line intensity, or pre-processing of the plasma spectral line including signal-to-noise ratio analysis, baseline removal, line identification, line de-convolution and fitting. Improvements may additionally involve consideration of plasma parameters such as plasma spectral line intensity, line ratio, plasma temperature and electron density using high-resolution optical emission spectroscopy in both visible and ultraviolet regions. Parameters of the plasma may be determined using an intensity ratio of the ions or atoms emission lines, a FWHM of the line profile for electron density estimation, or a Boltzmann plot for plasma temperature estimation. One or more techniques may be used to monitor when there is a lack of deposition.
Owner:MAZUMDER JYOTI +1
Preparation method for superfine spherical stainless steel powder
The invention relates to a stainless steel powder preparation method for metal powder injection molding, in particular to a method for preparing superfine spherical stainless steel powder by plasma spherifying. Stable argon plasmas are constructed, and plasma parameters are adjusted, so that a water-atomized irregular stainless steel powder raw material is heated, and is separated to obtain the superfine spherical stainless steel powder after being cooled and cured, and compared with the original water-atomized irregular stainless steel powder raw material, spherified stainless steel powder has higher flowability, tap density and purity. According to the method, the problems of poor flowability, low apparent density, low operational performance and the like caused by irregular shapes such as a flake shape, a strip shape and a branch shape in the conventional water-atomized stainless steel powder are solved, the quality of the stainless steel powder and the performance of a stainless steel product are improved, the added value and the market competitiveness of the water-atomized stainless steel powder are improved, and the method is low in cost.
Owner:JIANGXI YUEAN SUPERFINE METAL
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
InactiveUS20070080137A1Electric discharge tubesVacuum gauge using ionisation effectsWaferingIon density
The invention involves a method of characterizing a plasma reactor chamber through the behavior of plasma parameters selected from a group comprising ion density, wafer voltage, etch rate, wafer current, as functions of chamber parameters of source power, bias power and chamber pressure. The method begins by performing two steps for each one of the selected chamber parameters. The first step consists of ramping the level of the one chamber parameter while sampling RF electrical parameters at an RF bias power input to said wafer support pedestal and computing from each sample of said RF electrical parameters the values of the plasma parameters. These values are stored with the corresponding levels of the one chamber parameter as corresponding chamber parameter data. The second step consists of deducing, from the corresponding chamber parameter data, a single variable function for each of the plural plasma parameters having said one chamber parameter as an independent variable. The method continues with constructing combinations of these functions that are three variable functions having each of the chamber parameters as a variable. Then, from each three-variable function, the method constructs a set of surfaces, each individual surface corresponding to a respective constant value of the corresponding plasma parameter and defining simultaneous values of all of the selected chamber parameters. These surfaces are stored in memory for later use in controlling the chamber during wafer processing.
Owner:APPLIED MATERIALS INC
Flat-loaded probe device for high-speed flow field plasma parameter diagnosis
PendingCN107817085ASolve insulation problemsImprove fitAerodynamic testingObject structureDiagnostic information
The invention discloses a flat-loaded probe device for high-speed flow field plasma parameter diagnosis. The device comprises a flat-loaded probe. The flat-loaded probe aligns the surface of the probeelectrode with the surface of an insulating sleeve. The structure well solves the problems that in a high-speed flow field plasma, a traditional electrostatic probe is easily damaged in the flow field due to the exposed electrode, and the traditional electrostatic probe protrudes from the surface of a flying object and affects flight safety. In the high-speed flow field plasma environment, the flat-loaded probe can replace the electrostatic probe to better diagnose the parameter information of the plasma. According to the invention, the structure that the surface of the electrode is flush with the surface of the flying object is adopted; and the problem that the exposed electrode of a traditional Langmuir probe is easily insulated and damaged is successfully solved.
Owner:UNIV OF SCI & TECH OF CHINA
Plasma parameter diagnosis method based on broadband reflection coefficient curve curvature analysis
ActiveCN111200896AThe result is accurateImprove accuracyPlasma techniqueBroadbandingElectron density
Owner:XIDIAN UNIV
Method for preparing spherical wolfram carbide powder
InactiveCN102674353ALow costHigh nodularityNanotechnologyTungsten/molybdenum carbidePorosityThermal spraying
The invention relates to a method for preparing novel thermal spraying powder material, in particular to a method for preparing spherical wolfram carbide powder. The method for preparing spherical wolfram carbide powder comprises the following steps: heating casting tungsten carbide powder raw material by establishing a stable argon plasma and adjusting a plasma parameter, and cooling and solidifying the casting tungsten carbide powder raw material to obtain the wolfram carbide powder. Compared with the traditional casting tungsten carbide powder, the obtained wolfram carbide powder has better flowability, purity and surface smoothness of particles, and lower porosity of the powder size. With the method provided by the invention, the problems that the traditional casting tungsten carbide powder has poor flowability, low apparent density, poor use performance and the like because of the shapes of slices, strips, plates and the like are solved, the shapes of the particles are changed, and the pelletizing ratio is high. The performance density and the flowability of the powder are improved, the physical performance of the powder is improved, the service life of the product of the powder is prolonged, the additional value of tungsten products is increased, and the cost is low.
Owner:赣州海盛钨业股份有限公司
Vacuum discharge plasma parameter measuring device and method
ActiveCN102610480ARapid breaking controlEasy to controlElectric discharge tubesCapacitanceMeasurement device
The invention discloses a vacuum discharge plasma parameter measuring device and method, falling in the technical field of plasma diagnosis. The invention is characterized by adopting a grid, to which a negative potential is applied, to control plasma. The device structurally comprises the grid, a first probe and a second probe sequentially mounted on a plasma transmission channel. The grid is connected with a control signal generator, the first probe is connected with the common node of a direct current power supply DC1and a capacitor C1, and the second probe is connected with the common node of a direct current power supply DC2 and a capacitor C2. The invention can perform diagnosis on characteristics of plasma generated by discharge of a single pulse or continuous pulses and distributed in different spaces or at different time points; can realize on / off control on the plasma by applying a proper barrier potential; facilitates analysis of transmission characteristics of the plasma in a space; and has the characteristics of simple structure, high measurement precision and strong interference resistance.
Owner:BEIJING JIAOTONG UNIV
Plasma parameter measurement method based on plasma wind tunnel
InactiveCN112135408AAccurate measurementReduce perturbation errorAerodynamic testingPlasma techniquePlasma particlePhase difference
The invention provides a plasma parameter measurement method based on a plasma wind tunnel. The method comprises the steps of firstly adjusting a transmitting antenna and a receiving antenna to be inthe same phase through a vector network analyzer before laminar plasmas are inputted into the plasma wind tunnel; forming a plasma beam in a wind tunnel between the transmitting antenna and the receiving antenna after plasmas are input; measuring the diameter of the plasma beam and the phase difference between the receiving antenna and the transmitting antenna, and calculating the plasma electrondensity according to the phase difference and the diameter of the plasma beam; and measuring the offset of characteristic spectral lines of the plasma particles through a spectrograph, and calculatingthe beam velocity of the plasmas according to the offset. The measurement error of the electron density and the beam speed of the plasmas measured by the method is less than 0.01mm, the accompanyingresolution is less than 0.5 degree, the comprehensive error is less than 0.16%, the plasma parameters are accurately measured on the premise of not interfering with the plasma beam, and the measurement accuracy is improved.
Owner:BEIJING INST OF SPACECRAFT ENVIRONMENT ENG
Electromagnetic wave time domain fine integration method applied to magnetized plasma calculation
ActiveCN111159637AImprove stabilityImprove computing efficiencyComplex mathematical operationsTime domainComputational physics
The invention provides an electromagnetic wave time domain fine integration method applied to magnetized plasma calculation, and the method comprises the steps: building an auxiliary differential equation among an electric field vector, polarization current density and magnetized plasma parameters based on an auxiliary differential equation technology and a time domain fine integration technology,secondly, establishing a group of ordinary differential equations about time in combination with a control equation satisfied by the electromagnetic field quantity in vacuum, obtaining a time domainrecursion formula of the solution of the ordinary differential equations, then obtaining a high-precision calculation result of an exponential matrix in the ordinary differential equation set based ona fourth-order Taylor expansion formula, and finally, carrying out approximation by adopting a two-point Gaussian integral formula to obtain a discrete iterative recursion formula of an ordinary differential equation set solution. According to the method, various electromagnetic field problems related to magnetized plasma can be solved, the problem that a coefficient matrix is irreversible in theiterative solving process is solved, the complexity of the iterative process is reduced, the time step length of discrete iteration is increased, and the calculation efficiency is improved.
Owner:NORTHWESTERN POLYTECHNICAL UNIV
Multi-channel switching Langmuir probe measurement system
InactiveCN111491432AReduce cost of measurementLow costPlasma techniqueControl systemData acquisition
The invention discloses a multi-channel switching Langmuir probe measurement system which comprises a plasma, a Langmuir probe, a multi-channel switching system, a single-probe scanning measurement circuit, a data acquisition and processing system and a master control system interaction interface. A plurality of Langmuir probes placed in the plasma are connected with a single-probe scanning measurement circuit through a multi-channel switching system, and data processing is carried out by using a current-voltage curve acquired and measured by the data acquisition and processing system so as toobtain corresponding plasma parameter data measured by each probe. According to the invention, the single-probe scanning measurement circuit is used; by switching the Langmuir probes of multiple channels, measurement of plasma parameters at different probe positions is realized, the cost of plasma parameter measurement is reduced, and human-computer interaction operation is simple and convenient;and the system is suitable for monitoring and measuring steady-state plasma discharge parameters at a certain time scale.
Owner:ANHUI UNIV OF SCI & TECH
Space plasma parameter diagnosis device based on four-degree-of-freedom motion mechanism
ActiveCN112530229AEasy to replaceImprove scalabilityCosmonautic condition simulationsNuclear energy generationLinear motionEngineering
The invention discloses a space plasma parameter diagnosis device based on a four-degree-of-freedom motion mechanism, and the device comprises a probe array, the four-degree-of-freedom motion mechanism and a fixing frame, the four-degree-of-freedom motion mechanism is of a four-axis structure and comprises two X axes, a Y axis and a Z axis, and each axis is provided with a linear motion module; the probe array is installed on the Z axis of the four-degree-of-freedom motion mechanism and can rotate around the X axis by 90 degrees; the fixing frame is composed of a welding fixing plate, a supporting column, a vertical adjusting mechanism, a horizontal adjusting mechanism and a datum plate; the four-degree-of-freedom motion mechanism is fixed to the reference plate through an X-axis bottom plate, the Y axis is fixed to an X-axis sliding block, and the Z axis is fixed to a Y-axis sliding block. Through combination of the probe array and the four-degree-of-freedom motion mechanism, large-scale, arrayed and multi-dimensional diagnosis of plasma parameters is realized, and technical support is provided for near-earth space plasma physical research.
Owner:HARBIN INST OF TECH
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
InactiveUS7452824B2Electric discharge tubesVacuum gauge using ionisation effectsIon densityEngineering
The invention involves a method of characterizing a plasma reactor chamber through the behavior of many selected plasma parameters as functions of many selected chamber parameters. The plasma parameters may be selected from a group including ion density, wafer voltage, etch rate and wafer current or other plasma parameters. The chamber parameters are selected from a group including source power, bias power, chamber pressure, magnetic coil current in different magnetic coils, gas flow rates in different gas injection zones and species composition of the gas in different gas injection zones.
Owner:APPLIED MATERIALS INC
Near space plasma environment ground simulation device and simulation method thereof
ActiveCN114019256AOptimizing Structural RelationshipsImprove key parameter indicatorsSustainable transportationElectrostatic field measurementsEngineeringVacuum pump
The invention provides a near space plasma environment ground simulation device and method, and the device comprises a vacuum system, a drawable vacuum microwave anechoic chamber system, a plasma beam generation system, an air inlet system, a water cooling system, an excitation power supply system, a vacuum pump set system, a target bluff body system, a microwave anechoic chamber supporting system, a target bluff body support system, a plasma parameter diagnosis system, a microwave transmission measurement system, a miniaturized antenna group system and a central control system. Electromagnetic communication measurement of a plasma environment can be realized in a frequency band range of 100MHz-40GHz, plasma parameter diagnosis is mutually checked through different diagnosis modes, and plasma beams with high purity and adjustable plasma density and beam size are generated for a long time; the near space plasma environment can be simulated more truly, and microwave transmission measurement and plasma diagnosis means required for carrying out related research in the environment can be provided.
Owner:HARBIN INST OF TECH
Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
InactiveUS7901952B2Semiconductor/solid-state device testing/measurementElectric discharge tubesGas compositionEngineering
The invention concerns a method of processing a wafer in a plasma reactor chamber by controlling plural chamber parameters in accordance with desired values of plural plasma parameters. The method includes concurrently translating a set of M desired values for M plasma parameters to a set of N values for respective N chamber parameters. The M plasma parameters are selected from a group including wafer voltage, ion density, etch rate, wafer current, etch selectivity, ion energy and ion mass. The N chamber parameters are selected from a group including source power, bias power, chamber pressure, inner magnet coil current, outer magnet coil current, inner zone gas flow rate, outer zone gas flow rate, inner zone gas composition, outer zone gas composition. The method further includes setting the N chamber parameters to the set of N values.
Owner:APPLIED MATERIALS INC
Intrusive diagnosis device capable of achieving precision movement and lateral wire leading
PendingCN107680897ARealize spatial radial scanningWide range of applicationsElectric discharge tubesNon magneticScrew thread
The invention discloses an intrusive diagnosis device capable of achieving precision movement and lateral wire leading. The intrusive diagnosis device comprises a lifting motor, wire pulling motors, alateral wire leading flange and a rectangular vacuum chamber, wherein the rectangular vacuum chamber is internally provided with a screw rod, a three-slot internal threaded pipe, an adaptor and a probe. Multiple intrusive probes can be selected for plasma parameter diagnosis, radial parameter scanning of the inside and the boundary of plasma can be achieved through the lifting motor, and lateralleading-in and leading-out of a signal wire can be achieved through the wire pulling motors; operation of the device can be controlled through upper computer software in a visual interactive manner and the operation can be terminated at any time; and the technical gap is filled through a visually controlled lateral wire leading method, the whole device is made of a non-magnetic material, and fastacquisition of a vacuum environment is facilitated through multiple air holes inside. The intrusive diagnosis device is safe, reliable, easy to dismantle, recyclable and convenient and precise to process, and can be widely applied to the field of scientific research, medical treatment and industry, the size is reduced and the price is reduced.
Owner:UNIV OF SCI & TECH OF CHINA
Plasma parameters and skew characterization by high speed imaging
Embodiments of the present disclosure relate to a method and an apparatus for monitoring plasma behavior inside a plasma processing chamber. In one example, a method for monitoring plasma behavior includes acquiring at least one image of a plasma, and determining a plasma parameter based on the at least one image.
Owner:APPLIED MATERIALS INC
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
InactiveUS7470626B2Electric discharge tubesVacuum gauge using ionisation effectsWaferingComputational physics
Owner:APPLIED MATERIALS INC
Method for suppressing unstable high frequency discharge of high-strengty discharge lamp and products thereof
InactiveCN1484479AAvoid oscillationStable high frequency dischargeElectrical apparatusElectric lighting sourcesAlternating currentHigh pressure
A method products for suppressing high density discharging high frequency discharging unstable phenomenon is to provide high frequency discharging current as follow: turning AC or DC to suitable amplitude DC power source and carrying out high frequency alteration to the DC power source to provide it to a high density discharging lamp connected with high voltage generation circuit characterizing in low frequency modulation to its high frequency discharging circuit to control and regulate plasma parameter preventing generation of stable ion vibration to reach the aim of stabilizing high frequency discharge.
Owner:广东雪莱特光电科技股份有限公司
Double-flush probe data processing and correcting method used in high-speed flow field
PendingCN112131674ASolve the problem of online measurementImprove consistencyGeometric CADDesign optimisation/simulationFlight vehicleEngineering
The invention provides a double-flush probe data processing and correcting method used in a high-speed flow field. The method comprises the following steps: step 1, establishing models of different electrode radius parameters of a double-flush probe, and correcting a sheath expansion effect of the double-flush probe; and step 2, establishing a Boehmite speed correction relationship under the collision condition, and correcting the Boehmite speed under the collision condition. The double-flush probe data processing and correcting method solves the problem of online measurement of the high-temperature ablation area of the supersonic aircraft, and provides technical support for the national near space high-speed aircraft to detect plasma parameters.
Owner:UNIV OF SCI & TECH OF CHINA
Data processing method and system for acquiring plasma parameters
PendingCN114491382AThe linear fitting interval is too large or too smallThe linear fit interval is smallDrawing from basic elementsComplex mathematical operationsElectron currentElectron temperature
The invention provides a data processing method and system for acquiring plasma parameters, and the method not only can acquire a plurality of plasma parameters such as plasma space potential, suspension potential, electron saturation collection current and the like, but also can automatically set the fitting point number of a linear fitting interval and find an optimal fitting interval. And finally calculating to obtain the accurate electron temperature and electron density of the plasma. According to the invention, not only can the linear fitting interval of the electron current be effectively prevented from being too large or too small, but also the influence of the ion collection current on the plasma electron temperature and electron density calculation result can be effectively avoided.
Owner:SHANDONG UNIV
Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
InactiveUS7910013B2Semiconductor/solid-state device testing/measurementElectric discharge tubesNuclear engineeringIon density
For each one of plural plasma parameters, such as ion density, wafer voltage, etch rate, wafer current, a relevant surface of constant value is fetched from a memory. The relevant surface of constant value corresponds to a user-selected value of one of the plasma parameters, the surface being defined in a space of which each one of plural, chamber parameters (e.g., source power, bias power and chamber pressure) is a dimension. An intersection of these relevant surfaces is found, the intersection corresponding to a target value of source power, bias power and chamber pressure. The source power, the bias power and the chamber pressure, respectively, are set to their corresponding target values.
Owner:APPLIED MATERIALS INC
Method and system for measuring plasma parameters of femtosecond laser induced gas ionization
ActiveCN113341708ADynamic evolution is simple, fast and preciseAcquisition speed is fastNuclear energy generationPlasma techniquePicosecond laserFemto second laser
The invention discloses a method and a system for measuring plasma parameters of femtosecond laser-induced gas ionization, picosecond laser is used as detection light to detect the dynamic evolution process of plasma obtained by femtosecond laser-induced gas ionization, and a diffraction model is established based on Fraunhofer diffraction and Fresnel diffraction theories; the detected diffraction spectrum is fit with a diffraction spectrum obtained based on a diffraction model to obtain detection light phase shift frequency domain evolution and further obtain time domain evolution of plasma parameters; according to the invention, the space-time evolution process of the plasma can be obtained in single shot measurement, and a delay line in the device does not need to be adjusted for repeated measurement in the measurement process, so that the operation process is greatly simplified, the measurement time is saved, the measurement error is reduced, and the detection accuracy is improved; and moreover, the time domain evolution of the plasma parameters can be calculated and obtained only by fitting the diffraction spectrum for one time, multiple times of extraction and fitting are not needed, and the parameter obtaining speed is improved to a great extent.
Owner:HUAZHONG UNIV OF SCI & TECH
Fusion neutron real-time energy spectrum unfolding method for magnetic confinement device
InactiveCN112925006AGuarantee the accuracy of spectrum resolutionGuaranteed real-timeNeural learning methodsNeutron radiation measurementNuclear engineeringTime spectrum
The invention discloses a fusion neutron real-time spectrum unfolding method for a magnetic confinement device. The fusion neutron real-time spectrum unfolding method for a fusion neutron multi-ball spectrometer of the magnetic confinement device is realized by utilizing a method of combining an artificial neural network and Monte Carlo. The fusion reaction in the current magnetic confinement plasma has the characteristics of short duration and narrow energy interval (0.5-20 MeV), so that compared with a conventional energy spectrum unfolding method of a neutron multi-sphere spectrometer, the real-time energy spectrum unfolding method of the fusion neutron multi-sphere spectrometer has the advantages that more attention is paid to the real-time performance and a specific neutron energy interval: the real-time performance of energy spectrum measurement is ensured by using an artificial neural network; and a lot of fusion neutron training spectra corresponding to plasma parameters are constructed by using Monte Carlo and other calculation methods, so that the energy spectrum unfolding precision of the artificial neural network in a fusion neutron energy range is ensured. The method is mainly applied to fusion neutron energy spectrum real-time measurement of the magnetic confinement plasma.
Owner:SOUTHWESTERN INST OF PHYSICS
Real-time automatic analysis of low temperature plasma laser Thomson scattering diagnostic spectroscopy method
ActiveCN110248456BImprove accuracyImprove processing efficiencyPlasma techniqueRaman scattering spectraLow temperature plasma
The invention relates to the technical field of low-temperature plasma diagnosis and provides a method for automatically analyzing a low-temperature plasma laser Thomson scattering diagnostic spectrum in real time. The method comprises a step 1 of collecting and acquiring spectral data including a Thomson scattering spectrum, a rotational Raman scattering spectrum, a plasma radiation background spectrum and an intensity calibration coefficient; a step 2 of preprocessing the acquired spectral data; a step 3, based on the least square method, theoretically fitting the laser Thomson scattering spectrum by using a Gaussian function; a step 4 of absolutely calibrating the intensity of the laser Thomson scattering spectrum; a step 5 of, based on the least squares method, theoretically fitting the rotational Raman scattering spectrum by using a rotational Raman scattering formula; and a step 6 of calculating a plasma parameter. The method can quickly acquire the electron temperature and the electron density of the low-temperature plasma, and improves the accuracy and efficiency of the laser Thomson scattering spectrum data analysis.
Owner:DALIAN UNIV OF TECH
Multi-channel Langmuir probe diagnostic system for calibration of regional plasma distribution
ActiveCN113179574BTrue real-time distributionAccurately distribute resultsNuclear energy generationPlasma techniqueChannel dataLangmuir probe
Owner:SHANDONG UNIV
Diagnosis device for space plasma parameters based on four-degree-of-freedom motion mechanism
ActiveCN112530229BEasy to replaceImprove scalabilityCosmonautic condition simulationsNuclear energy generationLinear motionFixed frame
Owner:HARBIN INST OF TECH
A ground simulation device and simulation method for near-space plasma environment
ActiveCN114019256BOptimizing Structural RelationshipsImprove key parameter indicatorsSustainable transportationElectrostatic field measurementsEngineeringVacuum pump
The present invention proposes a ground simulation device for plasma environment in adjacent space and its simulation method. The simulation device includes a vacuum system, a drawable vacuum microwave anechoic chamber system, a plasma beam generation system, an air intake system, a water cooling system, and an excitation power supply. system, vacuum pump group system, target blunt body system, microwave anechoic chamber support system, target blunt body support system, plasma parameter diagnosis system, microwave transmission measurement system, miniaturized antenna group system and central control system; Realize the electromagnetic communication measurement of the plasma environment, check the plasma parameter diagnosis through different diagnostic methods, and generate a plasma beam with high purity, adjustable plasma density and beam size in a long period of time; more Realistically simulate the near-space plasma environment, and provide microwave transmission measurement and plasma diagnosis methods required for relevant research in this environment.
Owner:HARBIN INST OF TECH
System and method for diagnosing plasma parameters
PendingCN114222414AImprove diagnostic accuracyNeural learning methodsPlasma techniqueEngineeringPressure data
The invention provides a system and method for diagnosing plasma parameters, and relates to the technical field of plasmas. The system for diagnosing the plasma parameters comprises a vacuum electrode, a data processing device, a data collecting device, a gas environment maintaining device, a Langmuir probe and a glow discharge tube, a vacuum electrode is arranged in the glow discharge tube; the gas environment maintaining device is connected with the glow discharge tube and is suitable for providing a gas environment required by glow discharge; the Langmuir probe is connected to the data processing device through the data collection device; the data collection device is suitable for collecting voltage and air pressure data; the data processing device is suitable for diagnosing plasma parameters through the voltage and the air pressure. According to the technical scheme, plasma parameters are diagnosed through the voltage provided by the Langmuir probe and the air pressure provided by the gas environment maintaining device, an artificial neural network can be combined, a computer data processing method of machine learning and a diagnosis method of the Langmuir probe are combined, and the diagnosis accuracy is improved.
Owner:中国人民解放军军事科学院国防工程研究院工程防护研究所
Method and system for measuring plasma parameters of femtosecond laser-induced gas ionization
ActiveCN113341708BDynamic evolution is simple, fast and preciseAcquisition speed is fastNuclear energy generationPlasma techniquePicosecond laserFemto second laser
The invention discloses a method and system for measuring plasma parameters of femtosecond laser-induced gas ionization. The picosecond laser is used as detection light to detect the dynamic evolution process of the plasma obtained by femtosecond laser-induced gas ionization, and based on the Diffraction model was established by Langhofer diffraction and Fresnel diffraction theory; the detected diffraction spectrum was fitted with the diffraction spectrum based on the diffraction model to obtain the frequency domain evolution of the phase shift of the detection light, and then the time domain evolution of the plasma parameters The present invention can acquire the spatiotemporal evolution process of the plasma in a single shot measurement, and does not need to adjust the delay line in the device to repeat the measurement, which greatly simplifies the operation process, saves the measurement time, reduces the measurement error, and improves the detection accuracy; and, the present invention only needs a single fitting of the diffraction spectrum to calculate and obtain the time domain evolution of plasma parameters, without the need for multiple extraction and fitting, which greatly improves the speed of parameter acquisition.
Owner:HUAZHONG UNIV OF SCI & TECH
Plasma parameter diagnosis method based on BP neural network
PendingCN113657593ATake advantage ofNeural learning methodsPlasma techniqueAdaptive learningPlasma electron
The invention discloses a plasma parameter diagnosis method based on a BP neural network. The plasma parameter diagnosis method comprises the following steps: step 1, collecting data; step 2, preprocessing the data; step 3, importing and dividing the data; step 4, constructing a network model; step 5, training the model; and step 6, testing and evaluating the model Through an Adam gradient descent optimization algorithm, an adaptive learning rate adjustment strategy, cross validation and other methods, all frequency point information is fully utilized, a BP neural network is combined with the plasma electron density, and the electron density is estimated and diagnosed through the reflection coefficient amplitude and phase.
Owner:XIAN UNIV OF TECH +1
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