59 results about "Plasma parameter" patented technology

The invention relates to the technical field of test analysis, and discloses a probe device for plasma parameter measurement, which comprises a probe assembly, a cooling assembly, a heat dissipation seat and a fixed seat, a cooling cavity in a heat sink column connected with a probe and a heat dissipation channel in a heat dissipation base are connected with a water inlet pipe and a water outlet pipe respectively, so that heat dissipation and cooling can be achieved through the cooling cavity and the heat dissipation channel when the probe is subjected to heat load from plasma, accumulated heat of the probe is taken away, the heat dissipation efficiency is improved, and the service life of the probe is prolonged. Therefore, the probe can bear a thermal load for a longer time, so that the normal operation of the measurement work is ensured. Besides, by arranging the at least two probes, parameter measurement can be carried out on at least two positions at the same time, and the probes can also be integrated for measurement, so that part of system errors can be eliminated or the central position of the plasma can be found through the collected at least two groups of parameters, and a more accurate measurement result can be obtained.

The invention discloses a radial multi-needle-number probe for plasma boundary physical research, and relates to the technical field of plasma parameter measurement. Comprising a plurality of probe bodies; the first mounting plate is made of a ceramic material and is provided with a plurality of needle penetrating holes, and the needle penetrating holes are used for penetrating through the detection ends of the detection needle bodies; the second mounting plate is made of a ceramic material, one side surface of the second mounting plate is provided with a cable penetrating groove, the cable penetrating groove is provided with a plurality of cable penetrating holes, the cable penetrating holes and the needle penetrating holes are arranged in a one-to-one correspondence manner, and the cable penetrating holes are used for penetrating cables of the probe body; the third mounting plate is made of a ceramic material and can cover the cable penetrating groove; wherein the first installation plate, the second installation plate and the third installation plate are sequentially installed in a stacked mode, in the installation state, the detection section of the detection needle body protrudes out of the first installation plate, and a cable of the detection needle body is arranged in the cable penetrating groove. The requirement for parameter measurement of the magnetic confinement plasma device is met.

The invention discloses a Tokamak plasma multi-parameter cooperative configuration analysis method, and relates to the technical field of plasma multi-parameter cooperative configuration analysis, and the method comprises the following steps: constructing a parameter database to store plasma parameters; performing normalization processing on the plasma parameters to obtain normalized parameters of the plasma parameters; whether correlation exists between the two plasma parameters or not is analyzed, and an independent incidence relation is obtained; analyzing whether the plasma parameters are simultaneously influenced by more than two plasma parameters, and analyzing a comprehensive association relationship between the plasma parameters; when the configuration of the plasma is regulated and controlled, plasma parameters are cooperatively regulated and controlled based on the independent incidence relation and the comprehensive incidence relation; the plasma multi-parameter cooperative configuration analysis method is used for solving the problem that better cooperative control and analysis cannot be carried out on plasmas due to the fact that correlation analysis of different plasma parameters is not comprehensive enough in an existing plasma multi-parameter cooperative configuration analysis technology.

The invention discloses a vacuum circuit breaker closing electric breakdown multi-physical field coupling simulation calculation method, which comprises the following steps of: performing simulation analysis on an electric field on the surface of a single micro-bulge by constructing a geometric model of a micro-bulge on the surface of a contact of a vacuum circuit breaker to obtain the electric field intensity of the micro-bulge surface and the current density of field emission in the closing process of the vacuum circuit breaker; the critical opening range of field emission is determined; obtaining metal vapor pressure distribution characteristics of the contact material at different moments by taking a critical opening range of field emission as an initial condition; and according to the metal vapor pressure distribution characteristics, obtaining the electron density in the breakdown process of the vacuum circuit breaker so as to determine the evolution rule of the microcosmic plasma parameters and obtain the closing breakdown characteristics. According to the method, the electric breakdown characteristics under different contact surface structures can be accurately analyzed, and an initial plasma condition can be provided for pre-breakdown equilibrium arc modeling, so that the modeling precision is greatly improved.

Method for operating a lithography system (1) comprising an optical system (100) with an optical element (102), comprising the steps: a) providing (S1) a plasma (108) in an environment (110) of an optically active surface (104) of the optical element (102) for modifying the optically active surface (104), b) Determining (S2) an actual value (F IST ) at least one parameter (F) of the optically active surface (104), and c) controlling (S4) the at least one parameter (F) of the optically active surface (104) based on the determined actual value (F IST ) and a predetermined target value (F SOLL ) by adjusting at least one plasma parameter (P1) of the provided plasma (108).

The invention relates to the technical field of electric propulsion, in particular to a plasma parameter diagnosis system in a vacuum chamber, which comprises a vacuum chamber, a plasma confinement acceleration device, a laser emitting device, a laser receiving device, a probe array, a microwave horn antenna array and a fixed bracket guide rail, wherein the plasma confinement acceleration device is arranged in the vacuum chamber; the laser emitting device is arranged on the fixed bracket guide rail on one side through a first adjusting bracket; the laser receiving device is arranged on the fixed support guide rail on the other side through a second adjusting support. The probe array is arranged in front of the plasma confinement acceleration device through the movable bracket; and the microwave horn antenna array is arranged on the side of the plasma confinement acceleration device. According to the invention, the synchronous measurement of the plasma state in multiple diagnosis modes can be realized, the plasma diagnosis time can be effectively saved, and the plasma performance can be measured and analyzed through multiple dimensions.

The application provides a kind of electric thruster beam plasma parameter characteristic diagnostic system and method, it is related to plasma diagnostic field, the system includes vacuum chamber, for accommodating electric thruster and providing vacuum environment;Optical fiber signal acquisition module is set to the inside of vacuum chamber, for from multiple angles acquisition optical signal of the beam plasma generated by electric thruster;Image acquisition module is set to the outside of vacuum chamber, with optical fiber signal acquisition module light path connection, for receiving optical signal and converting into two-dimensional image time sequence;Data processing module is connected with communication with image acquisition module, for processing two-dimensional image time sequence, to reconstruct the four-dimensional distribution of the parameter of beam plasma.The application realizes low disturbance, low cost multi-parameter synchronous diagnosis by means of calibration optical fiber, light splitting filter and inversion process, improves efficiency and resolution.

This application relates to the fields of plasma applications and automation technology. It discloses a plasma parameter control system, method, equipment, and medium. The system includes: plasma, a plasma parameter acquisition device, a control module, and a modular power supply. The modular power supply and the plasma are electrically connected. The plasma parameter acquisition device is used to acquire plasma load state parameters. The plasma parameter acquisition device and the control module are electrically connected. The control module and the modular power supply are electrically connected. The control module is used to adjust the number of power supply modules in the modular power supply based on the plasma load state parameters fed back by the plasma parameter acquisition device. This application enables real-time control of the number of power supply modules in the modular power supply, achieving dynamic adjustment of the power supply during plasma operation, ensuring that the plasma load state continuously meets the process target requirements.

The application provides a kind of management and control chemical fast LIBS classification identification model construction method, medium and system, belongs to management and control chemical technical field, the application is by collecting mercury argon reference lamp spectrum to carry out wavelength calibration, according to atomic spectrum database extraction management and control element characteristic transition wavelength window and compressed to low-dimensional feature space by sparse self-encoder, with hydrogen line starker broadening and Boltzmann graph slope method real-time inversion electron density and electron temperature and to compressed characteristic matrix is physically normalized, calculates plasma drift index to adaptively adjust plasma parameter decoupling double-flow condition graph network update strategy, the normalized characteristic matrix and physical diagnostic value are input into the artificial intelligence network to output element concentration vector and class prediction probability, solve the technical problems that plasma parameter fluctuation leads to laser-induced breakdown spectroscopy classification feature instability, classification accuracy significantly decreases under the condition of cross-instrument and cross-matrix.

This invention provides a method for diagnosing parameters of non-uniform plasmas based on the local microwave penetration effect. This method relates to the fields of electromagnetics and plasma diagnostics, and includes a combined diagnosis of the electron density distribution and collision frequency of a plasma profile. The method models the plasma to the left of the peak layer by layer and iteratively optimizes the distribution results. The method also uses the maximum reflection coefficient amplitude slope to derive the plasma electron density peak. For the plasma to the right of the peak, the method models multiple distribution models, determining the model using the attenuation coefficient. Furthermore, the method uses the maximum reflection coefficient amplitude to diagnose the collision frequency. This method addresses the problem of diagnosing parameters of non-uniform plasma profiles.

The application relates to a method and device for calculating the development process of series vacuum gap breakdown. The method comprises the following steps: constructing a series vacuum gap equivalent circuit model according to a plurality of vacuum gap parallel circuits; determining a flow conductance coefficient of the vacuum gap based on the series vacuum gap equivalent circuit model, plasma parameters of cathode plasma and an electric field calculation model of the vacuum gap; determining a vacuum gap equivalent resistance based on the series vacuum gap equivalent circuit model, a plasma expansion radius of the cathode plasma and the flow conductance coefficient of the vacuum gap; determining a vacuum gap breakdown voltage based on the series vacuum gap equivalent circuit model and vacuum gap breakdown data; and calculating the development process of the series vacuum gap breakdown based on the vacuum gap equivalent resistance and the vacuum gap breakdown voltage. The method can reduce the application risk of the series vacuum gap at high voltage.

Various example embodiments relate to a plasma parameter measurement device comprising: an upper plate and a lower plate, the upper plate and the lower plate comprising a first material; a semiconductor device includes an upper plate including a semiconductor substrate to be subjected to plasma, a first sensor including a first collector, the first collector including a first material, and the first material being included in the semiconductor substrate to be subjected to plasma, and a first insulating structure surrounding a side surface of the first collector in a first hole in the upper plate and exposing at least a portion of an upper surface of the first collector. And a second sensor including a second collector including the first material and a second insulating structure surrounding a side surface of the second collector in a second hole in the upper plate and exposing at least a portion of an upper surface of the second collector.

The application discloses a kind of tokamak plasma multi-parameter collaborative configuration analysis method, it is related to plasma multi-parameter collaborative configuration analysis technical field, including the following steps: constructing parameter database to store plasma parameter;Plasma parameter is normalized, and the normalized parameter of plasma parameter is obtained;Analysis whether there is relevance between two plasma parameters and obtains independent correlation;Analysis whether plasma parameter is simultaneously influenced by more than two plasma parameters, and analysis their comprehensive correlation;When the configuration of plasma is regulated, based on independent correlation and comprehensive correlation, plasma parameter is cooperatively regulated;The application is used to solve the existing plasma multi-parameter collaborative configuration analysis technique still exists between different plasma parameters The relevance analysis is not comprehensive enough, leading to unable to better cooperatively control and analyze plasma.

The invention relates to the technical field of plasmas, and discloses a multi-sample plasma irradiation sample table and an irradiation sample fixing bracket thereof. The irradiation sample fixing support comprises a base, an installation assembly, a probe and a cooling assembly, the base is provided with a plurality of installation faces which are sequentially arranged around a rotating axis and connected, and the base can rotate around the rotating axis so that the different installation faces can directly face plasma beams. Therefore, a probe or different samples installed on the base through the first installation assembly or the second installation assembly can directly face the plasma beam, and plasma irradiation is achieved. Multiple samples can be irradiated without repeatedly destroying vacuum, so that the experiment efficiency is improved; meanwhile, plasma parameters of an irradiation area can be measured through the probe, and the experiment accuracy is improved. The multi-sample plasma irradiation sample table comprises a rotating mechanism and an irradiation sample fixing support, and the rotating mechanism drives the base to rotate so that the probe or different samples can directly face plasma beams.

The invention discloses a Tokamak vertical instability control method which comprises the following steps: constructing a power supply model and carrying out parameter calibration according to experimental data to obtain a calibrated power supply model; constructing a plasma-conductor model and carrying out parameter calibration according to experimental data to obtain a calibrated plasma-conductor model; a controller model is constructed, the controller model comprises one or more of an MPC controller model, an LQR controller model and an H-infinity controller model, and the calibrated power supply model, the calibrated plasma-conductor model and the controller model are combined to form a closed-loop model; the feed-forward value is input into the calibrated power supply model, plasma parameters are output after the feed-forward value is processed by the power supply model and the plasma-conductor model, the plasma parameters are input into the controller model for prediction to obtain a prediction result, and the controller model optimizes the feed-forward value according to the prediction result. Different controller models are adopted to adapt to control of different complex scenes of Tokamak vertical instability.

The invention discloses a method for measuring the service life of a first wall boron film of a Tokamak device, and belongs to the technical field of high-temperature plasma diagnos.The method comprises the steps that in the operation stage of a Tokamak plasma experiment, the mass change of a material is monitored in real time through a quartz crystal microbalance system located in a magnetic shadow area; based on monitoring data of the quartz crystal microbalance system, an evolution curve of accumulated mass change along with accumulated discharge time is drawn; performing local fitting and slope inspection on the slope of the evolution curve of the cumulative mass change along with the cumulative discharge time, and when the local fitting slope is remarkably changed, extracting plasma parameters under corresponding discharge conditions and confirming that the plasma parameters are in a stable state; and judging the end-of-life point of the first wall boron film based on the slope characteristic of the evolution curve of the cumulative mass change along with the cumulative discharge time. According to the invention, in-situ, real-time and accurate life measurement can be realized in the plasma discharge process.

The invention provides an electric thruster beam plasma parameter characteristic diagnosis system and method, and relates to the field of plasma diagnosis, and the system comprises a vacuum chamber which is used for accommodating an electric thruster and providing a vacuum environment; the optical fiber signal acquisition module is arranged in the vacuum bin and is used for acquiring optical signals of beam plasma generated by the electric thruster from a plurality of angles; the image acquisition module is arranged outside the vacuum bin, is in light path connection with the optical fiber signal acquisition module and is used for receiving the optical signal and converting the optical signal into a two-dimensional image time sequence; and the data processing module is in communication connection with the image acquisition module and is used for processing the two-dimensional image time sequence so as to reconstruct four-dimensional distribution of parameters of the beam plasma. By means of optical fiber calibration, light splitting filtering and inversion processes, low-disturbance and low-cost multi-parameter synchronous diagnosis is achieved, and efficiency and resolution are improved.

A neural network-guided method for precise control of material modification, relating to the field of material modification technology, addresses the problem of uneven surface modification caused by the inability of existing plasma modification techniques to precisely control plasma parameters for nonlinear phase transitions in microstructures. This invention first obtains the initial state parameters and target modification parameters of the material to be modified; then, the obtained parameters are input into a pre-trained neural network model to generate preliminary and high-precision plasma control parameters; next, the operating parameters of the plasma device are controlled by a control unit to modify the material; finally, the state parameters of the material are collected in real time during the modification process, and these real-time state parameters are used as feedback input to the neural network model to dynamically update the plasma control parameters. This invention enables precise and adaptive control of plasma material modification to address nonlinear phase transitions in microstructures.

The invention discloses a low-temperature plasma jet flow vibration temperature diagnosis method based on machine learning, and belongs to the crossing field of plasma parameter diagnosis and machine learning technologies. The method comprises the following steps: S1, generating a theoretical spectrum through software, collecting an experimental spectrum, and accurately calibrating a temperature label for the experimental spectrum by adopting an Euclidean and SCM combined algorithm; s2, carrying out normalization processing on all spectral data, and dividing the spectral data into training, verification and test sets; s3, constructing and training two neural network models of BPNN and MLP, and learning a mapping relation between the spectrum and the temperature; step S4, optimizing the model through multiple modes such as verification set expansion, regularization and transfer learning to prevent overfitting, and using the optimized model to carry out rapid and real-time temperature diagnosis on the plasma spectrum; the method can solve the problems that the traditional manual fitting nitrogen molecule radiation spectrum diagnosis method is long in time consumption and highly depends on the experience of an operator.

This invention discloses a device for measuring the 2.45 GHz low-hybrid wave spectrum in plasma. It can be used for experimental research on low-hybrid wave current-driven processes in tokamaks, qualitatively analyzing boundary parasitic effects, such as wave scattering caused by density fluctuations and the influence of parametric decay processes on low-hybrid wave spectral broadening. The device includes a rectangular copper ring antenna, a shielded coaxial cable, an attenuator, a DC blocker, a spectrum analyzer, and a host computer system for data acquisition. The rectangular copper ring antenna is vertically attached to the tokamak glass or PTFE dielectric window to receive the 2.45 GHz low-hybrid wave propagating from the plasma. The signal is then transmitted to the spectrum analyzer via the attenuator and DC blocker, and finally, the host computer acquires the spectral evolution data over time. This invention can measure the low-hybrid wave spectral broadening information under different plasma parameter conditions in low-hybrid wave current-driven experiments, and can be used to qualitatively analyze the relationship between low-hybrid wave driving efficiency and spectral broadening.

The invention discloses a non-uniform plasma parameter inversion method based on a convolutional neural network, and the method comprises the steps: firstly constructing a non-uniform plasma equivalent layering model, and then calculating an electromagnetic wave reflection coefficient and a transmission coefficient under different parameters through a scattering matrix method; and finally, fitting a nonlinear relationship between the amplitudes and phases of the reflection coefficient and the transmission coefficient and the electron density, the collision frequency and the plasma thickness by using a convolutional neural network. The implementation process comprises the following steps: establishing a non-uniform plasma equivalent layering model; calculating a reflection coefficient and a transmission coefficient of the electromagnetic wave by adopting a scattering matrix method to construct a data set; constructing a convolutional neural network; training the convolutional neural network; and verifying the network performance. The convolutional neural network adopted by the invention has very strong feature extraction capability, does not need manual intervention, can directly learn features from original data, is successfully applied to multiple fields, and can effectively reduce the number of parameters, simplify the model complexity and improve the calculation efficiency.

The invention discloses a plasma parameter diagnosis method, system and equipment based on transmission signal wave impedance characteristics and a medium. The method comprises the steps of calculating a reciprocal of a plasma equivalent relative dielectric constant and separating a real part and an imaginary part by collecting attenuation and phase shift generated by a uniform plasma, determining the position of a transmission signal wave impedance invariant point, and determining the impedance invariant point of the transmission signal wave by combining the real part and the imaginary part of the reciprocal of the equivalent relative dielectric constant and the positive and negative properties of a first derivative thereof. Correctness verification and screening are carried out on transmission signal wave impedance invariant points, the electron density and the collision frequency of the uniform plasma are diagnosed, and the result has high accuracy and reliability. The system, the equipment and the medium are used for realizing the method. On the premise that the diagnosis precision is not lost, the working frequency of the adopted incident electromagnetic waves is greatly smaller than that of a traditional microwave transmission method, the frequency band data can be fully utilized, and the cost of diagnosis equipment is saved.

This invention discloses a control method for an ion cyclotron resonance heating system, belonging to the field of radio frequency heating control technology. This invention trains a coupling impedance prediction model using ICRH system operating parameters and plasma parameters, and outputs future coupling impedance prediction results during ICRH system operation to characterize the changing trend of the coupling state between the ICRH system and the plasma. During ICRH system operation, the signals required for the coupling impedance prediction model are acquired in real time to predict the matching state of the ICRH system. When the prediction results indicate a potential mismatch in the future coupling impedance, the impedance matching module in the ICRH system is preemptively adjusted to ensure that the ICRH system is always in an optimal matching state. This solves the technical problems of adjustment lag and transient mismatch inherent in existing technologies.

Various example embodiments relate to, a plasma parameter measurement device comprising an upper plate and a lower plate, comprising a first material, a first sensor including a first collector comprising the first material, and the first material being included in a semiconductor substrate to be subjected to the plasma, and a first insulating structure surrounding a side surface of the first collector and exposing at least a portion of an upper surface of the first collector in a first hole in the upper plate. A second sensor including a second collector comprising the first material, and a second insulating structure surrounding a side surface of the second collector and exposing at least a portion of an upper surface of the second collector in a second hole in the upper plate.

The utility model discloses a cavity plasma detection device, comprising: a support assembly, the support assembly comprises a vertical plate, a bearing plate and a plasma pool, the upper part of the front end of the vertical plate is fixedly connected with the bearing plate, and the lower part of the front end of the vertical plate is fixedly connected with the plasma pool; the flexible detection assembly comprises a rectangular frame, a large-size probe and a small-size probe, the two sides of the front end of the bearing plate are movably connected with the rectangular frame, and the large-size probe and the small-size probe are movably connected into the rectangular frame. According to the utility model, the large-size probe is inserted into the plasma pool, so that macroscopic parameters, such as overall electron density, temperature distribution and the like, of plasma can be detected, and the general state of the plasma can be reflected; the small-size probe can go deep into the microscopic detail part of the plasma to measure the plasma parameter change in the local tiny area, such as the parameter at the edge of the plasma or near the internal tiny structure; the combination of the two improves the detection accuracy.

The present application relates to the technical field of HDI printed circuit board processing, in particular to a processing method for solving the problems of copper surface residual glue and small size of binding PAD in cavity product position, after laser cavity processing, the characteristic vector is input into the trained gradient boosting regression tree (GBRT) model, and the adaptive plasma parameter is output, and the cavity copper surface is treated by adopting the adaptive plasma parameter; the present application realizes the dynamic matching of residual glue characteristics and treatment parameters by adopting the GBRT model to adaptively output the plasma parameter and combining with the sand blasting path planned by the A* algorithm; wherein the prediction error of the GBRT model to the plasma parameter is less than or equal to 5%, the priority coverage of the region to be optimized is ensured, the path overlap rate is less than or equal to 5%, the final residual glue removal rate is improved to more than 98%, and the problem of incomplete treatment of traditional fixed parameters is solved.

The invention provides a fusion reactor platform base turbulence behavior prediction method, system and device and a storage medium, and relates to the technical field of magnetic confinement turbulence behavior prediction. The method comprises the following steps: acquiring turbulence data of a fusion reactor platform base region under different plasma collision rate conditions; compressing the fusion reactor base turbulence data by using a preset compression neural network to obtain fusion reactor base turbulence compression data; inputting the fusion reactor base turbulence compression data into a pre-trained time sequence prediction module, and outputting a time sequence prediction sequence; and decompressing the time sequence prediction sequence by using a preset decompression neural network to obtain fusion reactor platform base region turbulence prediction results under different collision rate conditions. According to the method, the prediction results of the turbulence under different plasma collision rate conditions can be efficiently obtained while relatively high plasma important parameter precision is ensured, and the method has good generalization ability.

The invention relates to the technical field of plasma detection, in particular to a dual-channel transient plasma parameter measurement system. A dual-channel transient plasma parameter measurement system comprises an axial Faraday probe and a plurality of energy level selection probes distributed in the circumferential direction, the Faraday probe is used for measuring the total current of ions, each energy level selection probe sequentially comprises an inner shielding electrode, a collector and an outer shielding electrode from inside to outside in the radial direction, and the inner shielding electrode, the collector and the outer shielding electrode are not connected. Positive bias voltage is applied to the inner shielding electrode and the outer shielding electrode, the collecting electrode is connected with the positive bias voltage with the same bias voltage value as the two shielding electrodes outside the collecting electrode, and the positive bias voltage of the multiple energy level selection probes connected in the axial direction is sequentially increased according to an arithmetic progression. According to the embodiment of the invention, the composite probe system which integrates various measurement capabilities and is faster in response can be provided.

The invention discloses a plasma surrounding flow field coating target RCS calculation method and device. The method comprises the following steps: determining each scattering center of a target body and distribution of plasma around a flow field; respectively calculating a transmission path of the electromagnetic wave in the plasma after passing through each scattering center; based on the distribution of the plasma around the flow field, plasma parameters on each transmission path are extracted; calculating attenuation constants and phase shift constants of the electromagnetic waves on the corresponding transmission paths based on the plasma parameters on each transmission path; based on the attenuation constant and the phase shift constant, calculating the scattering field intensity after the electromagnetic wave passes through the plasma; calculating scattering echoes of the target body based on the field intensity of the electromagnetic wave after the electromagnetic wave passes through the plasma; and calculating the RCS of the target body based on the scattering echo of the target body. According to the method, the calculation efficiency is high, and the real-time calculation requirement can be met.

A plasma parameter diagnosis device according to an embodiment of the disclosed invention may comprise: a signal generation unit that generates a voltage; a probe unit inserted into a chamber and configured to apply the voltage generated in the signal generation unit to a plasma sheath in the chamber; a sensing element, one end of which is connected to the probe unit so that a current generated from the plasma flows into the sensing element; and a signal transfer unit configured to transfer the voltage generated from the signal generation unit to the probe unit.