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Vacuum discharge plasma parameter measuring device and method

A plasma and vacuum discharge technology, applied in the field of plasma diagnosis, can solve problems such as inability to effectively measure and analyze plasma, and achieve the effects of easy implementation, high measurement accuracy and simple structure

Active Publication Date: 2012-07-25
BEIJING JIAOTONG UNIV
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Problems solved by technology

When this method is applied to continuous discharge (DC, continuous pulse, etc.) conditions, the plasma generated by the discharge passes through the probe system continuously, and the dual-probe method cannot be used to measure the diffusion rate of the plasma and the kinetic energy of the metal ions generated by the discharge. Measurement. This method has limitations and cannot effectively measure and analyze all the characteristics of the plasma

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  • Vacuum discharge plasma parameter measuring device and method
  • Vacuum discharge plasma parameter measuring device and method
  • Vacuum discharge plasma parameter measuring device and method

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Embodiment Construction

[0026] The present invention will be described in further detail below in conjunction with the accompanying drawings:

[0027] Such as figure 1 As shown, the plasma source discharges to generate plasma (the anode of the plasma source is grounded), and the plasma is transmitted in the plasma transmission channel. The structure of the measurement device for the plasma parameter of the next vacuum discharge in the plasma transmission channel is as follows: The net G, the first probe P1, and the second probe P2 are sequentially installed on the plasma transmission channel, the plasma transmission channel is located inside the cylindrical object 2, and the plasma source and the cylindrical object 2 are both located in the vacuum chamber , The grid G ​​is connected to the common node of the C4 capacitor, R6 resistor and L inductance in the control signal generator through the shielded wire 1. The first probe P1 is connected to the common node of the DC1 DC power supply and the C1 capaci...

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Abstract

The invention discloses a vacuum discharge plasma parameter measuring device and method, falling in the technical field of plasma diagnosis. The invention is characterized by adopting a grid, to which a negative potential is applied, to control plasma. The device structurally comprises the grid, a first probe and a second probe sequentially mounted on a plasma transmission channel. The grid is connected with a control signal generator, the first probe is connected with the common node of a direct current power supply DC1and a capacitor C1, and the second probe is connected with the common node of a direct current power supply DC2 and a capacitor C2. The invention can perform diagnosis on characteristics of plasma generated by discharge of a single pulse or continuous pulses and distributed in different spaces or at different time points; can realize on / off control on the plasma by applying a proper barrier potential; facilitates analysis of transmission characteristics of the plasma in a space; and has the characteristics of simple structure, high measurement precision and strong interference resistance.

Description

Technical field [0001] The invention belongs to the technical field of plasma diagnosis, and particularly relates to a measuring device and method for vacuum discharge plasma parameters. Background technique [0002] In the process of vacuum discharge plasma generation, there are a large number of process variables in the plasma, such as plasma diffusion speed, plasma density, electron temperature, ion energy, and various ion excitation groups. They all affect the physical and chemical processes of plasma and material interaction, and determine the final material structure and performance. Therefore, the experimental diagnosis of plasma characteristic parameters is of great significance. [0003] In the existing vacuum discharge plasma parameter measurement technology, the Langmuir probe method is mainly used to measure the single pulse vacuum discharge plasma parameter. When this method is applied to the conditions of continuous discharge (DC, continuous pulse, etc.), the plasma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32
Inventor 刘文正孔飞张德金
Owner BEIJING JIAOTONG UNIV
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