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Device and method for detecting ion current of vacuum discharge plasma

A plasma and vacuum discharge technology, which is applied in the field of plasma diagnosis, can solve the problems such as the inability to effectively measure and analyze metal ions in vacuum discharge, and achieve the effects of effective ion current, high measurement accuracy and simple method.

Active Publication Date: 2012-08-01
BEIJING JIAOTONG UNIV
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, the TOF method has limitations and cannot effectively measure and analyze the characteristics of vacuum discharge metal ions.

Method used

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  • Device and method for detecting ion current of vacuum discharge plasma
  • Device and method for detecting ion current of vacuum discharge plasma
  • Device and method for detecting ion current of vacuum discharge plasma

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Embodiment Construction

[0030] The content of the present invention will be described in detail below in conjunction with the drawings and specific embodiments.

[0031] A vacuum discharge plasma ion flow detection device, its structure is divided into the following two situations:

[0032] 1) if Figure 1a As shown, the cylindrical object 4 and the tube 1 have the same diameter, the cylindrical object 4 is installed at the left end of the tube 1, and both are horizontally aligned, the control grid G1 is arranged at the front end of the cylindrical object 4, and the accelerating electrode G2 is arranged At the front end of the tube 1, the collecting plate 2 is installed on the right side of the accelerating electrode G2, and the first grid Ga and the second grid Gb are sequentially installed in front of the collecting plate 2; the plasma source, the cylindrical object 4 and the tube 1 are all In the vacuum chamber, the control grid G1 is connected to the common node of the fourth capacitor C4, the ni...

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Abstract

The invention discloses a device and a method for detecting ion current of vacuum discharge plasma, which belong to the technical field of plasma diagnosis. The device and the method are mainly characterized in that a grid mesh applied with negative potential is used for controlling the plasma. The device for detecting the ion current of the vacuum discharge plasma is structurally characterized in that the control grid mesh is arranged at the front end of a cylindrical object, an accelerating electrode and a collection plate are arranged at two ends of a pipe, a first grid mesh and a second grid mesh are sequentially mounted in the front of the collection plate, a plasma source and the pipe are positioned in a vacuum chamber, the control grid mesh is connected with a control signal generator, and the accelerating electrode is connected with an accelerating voltage waveform generator. The device and the method have the advantages that 1) space transmission characteristics of the discharge plasma can be conveniently analyzed; 2) an optional section of plasma can be measured; 3) on and off of the plasma can be controlled by means of applying proper barrier potential; and 4) the device is simple in structure and high in measuring precision and interference resistance, and the strength of the ion current can be effectively detected.

Description

technical field [0001] The invention belongs to the technical field of plasma diagnosis, and in particular relates to a vacuum discharge plasma ion flow detection device and method. Background technique [0002] In the plasma generation process, there are a large number of process variables in the plasma, such as plasma diffusion speed, plasma density, electron temperature, ion energy, and various ion excited groups. They all affect the physical and chemical process of the interaction between the plasma and the material, and determine the final material structure and performance, and these variables are determined by the macroscopic parameters and conditions of the plasma, such as pressure, power, frequency, flow, etc. . Therefore, the experimental diagnosis of plasma can obtain the confidence and microscopic mechanism of discharge parameters affecting the plasma state, establish the correlation between material structure, performance and plasma characteristics, and seek th...

Claims

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Application Information

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IPC IPC(8): H01J37/244H01J37/02
Inventor 刘文正孔飞张德金
Owner BEIJING JIAOTONG UNIV
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