437 results about "Ion flow" patented technology

A chemical vapor deposition process is carried out in a reactor chamber with an ion shower grid that divides the chamber into an upper ion generation region and a lower process region, the ion shower grid having plural orifices oriented in a non-parallel direction relative to a surface plane of the ion shower grid. A workpiece is placed in the process region facing the ion shower grid, the workpiece having a workpiece surface generally facing the surface plane of the ion shower grid. A gas mixture is furnished comprising deposition precursor species into the ion generation region and the process region is evacuated at an evacuation rate sufficient to create a pressure drop across the ion shower grid from the ion generation region to the process region whereby the pressure in the ion generation region is at least several times the pressure in the process region. A layer of material of a desired thickness is deposited on the workpiece by: (a) applying plasma source power to generate a plasma of the deposition precursor species in the ion generation region, and (b) applying a grid potential to the ion shower grid to create a flux of ions from the plasma through the grid and into the process region.

An asymmetric field ion mobility spectrometer with an ionization source for ionizing a sample media and creating ions. An ion filter is disposed in the analytical gap downstream from the ionization source for creating an asymmetric electric field to filter the ions. An ion flow generator for creating an electric field in a direction transverse to the asymmetric electric field and which propels the ions through the asymmetric electric field towards a detector.

Apparatus and method for generating and controlling flows of positive and negative air ions includes interposing isolated sets of electrodes in a flowing air stream to separately produce positive and negative ions. The rates of separated production of positive and negative ions are sensed to control ionizing voltages applied to electrodes that produce the ions. Variations from a balance condition of substantially equal amounts of positive and negative ions flowing in the air stream are also sensed to alter bias voltage applied to a grid electrode through which the air stream and ions flow.

The present invention relates generally to a multi-reflecting time-of-flight mass spectrometer (MR TOF MS). To improve mass resolving power of a planar MR TOF MS, a spatially isochronous and curved interface may be used for ion transfer in and out of the MR TOF analyzer. One embodiment comprises a planar grid-free MR TOF MS with periodic lenses in the field-free space, a linear ion trap for converting ion flow into pulses and a C-shaped isochronous interface made of electrostatic sectors. The interface allows transferring ions around the edges and fringing fields of the ion mirrors without introducing significant time spread. The interface may also provide energy filtering of ion packets. The non-correlated turn-around time of ion trap converter may be reduced by using a delayed ion extraction from the ion trap and excessive ion energy is filtered in the curved interface.

A system for analyzing one or more ion species of a sample including a first ion mobility filter associated with a first flow path for passing first ions of the sample, a second ion mobility filter associated with a second flow path for passing second ions of the sample, a first outlet from the first flow path for passing a portion of the first ions from the first flow path to the second flow path, and a first outlet from the second flow path for removing neutral particles from the second flow path where the first outlet from the second flow path is upstream of the second ion mobility filter in relation to the ion flow in the second flow path.

Ion manipulation systems include ion repulsion by an RF field penetrating through a mesh. Another comprises trapping ions in a symmetric RF field around a mesh. The system uses macroscopic parts, or readily available fine meshes, or miniaturized devices made by MEMS, or flexible PCB methods. One application is ion transfer from gaseous ion sources with focusing at intermediate and elevated gas pressures. Another application is the formation of pulsed ion packets for TOF MS within trap array. Such trapping is preferably accompanied by pulsed switching of RF field and by gas pulses, preferably formed by pulsed vapor desorption. Ion guidance, ion flow manipulation, trapping, preparation of pulsed ion packets, confining ions during fragmentation or exposure to ion to particle reactions and for mass separation are disclosed. Ion chromatography employs an ion passage within a gas flow and through a set of multiple traps with a mass dependent well depth.

Disclosed are biomedical scaffolds that may be used, for example, for treatment of bone diseases and bone repair. Methods of preparing such scaffolds are also disclosed. These scaffolds permit nutrient and ion flow such that bone regeneration in the area surrounding the scaffold is promoted. Also disclosed are kits that include the scaffolds set forth herein.

A programmable metallization device comprises a first electrode and a second electrode, and a dielectric layer, a conductive ion-barrier layer, and an ion-supplying layer in series between the first and second electrodes. In operation, a conductive bridge is formed or destructed in the dielectric layer to represent a data value using bias voltages having the same polarity, enabling the use of diode access devices. To form a conductive bridge, a bias is applied that is high enough to cause ions to penetrate the conductive ion-barrier layer into the dielectric layer, which then form filaments or bridges. To destruct the conductive bridge, a bias of the same polarity is applied that causes current to flow through the structure, while ion flow is blocked by the conductive ion-barrier layer. As a result of Joule heating, any bridge in the dielectric layer disintegrates.

A fiber spinning apparatus for charging a polymer-containing liquid stream, having at least one electrically charged, point-electrode positioned adjacent the intended path of said liquid stream and creating an ion flow by corona discharge to impart electrical charge to the polymer-containing liquid stream.

An ultracapacitor comprising a first electrode containing mineral microtubules, a second electrode containing mineral microtubules, an electrolyte disposed between the first electrode and the second electrode, and a separator disposed in the electrolyte to provide electrical insulation between the first electrode and the second electrode, while allowing ion flow within the electrolyte. The electrodes may be formed from a paste containing mineral microtubules, or may consist essentially of a conductive polymer containing mineral microtubules, or an aerogel containing the mineral microtubules. The mineral microtubules may be filled with carbon, a pseudocapacitance material, or a magnetoresistive material. The mineral microtubules may also be coated with a photoconductive material.

An ion guide for mass spectrometry comprising an electrode arrangement of at least two electrodes, at least one of which is an RF electrode, arranged adjacent to each other but spaced apart on a planar surface of a dielectric material and arranged at a distance from an ion flow path, wherein a portion of the dielectric surface is exposed between an adjacent pair of the spaced apart electrodes and wherein at least one electrode of said adjacent pair of electrodes is arranged to overhang the exposed portion of surface between them such that there is no direct line of sight from the ion flow path to the exposed portion of dielectric surface. The device enables RF guiding of ions accompanied by much reduced charging-up of dielectric surfaces and reduced amount of collisions of neutral species with electrodes.

The invention discloses an electrospray ion source, which comprises a hollow capillary tube, a vacuum chamber, electrodes and a direct-current power supply. One end of the hollow capillary tube is used as a sampling end, the other end of the hollow capillary tube is used as an electrospray nozzle, the nozzle and the sampling end are arranged in different pressure environments, the nozzle extends into the vacuum chamber, the pressure for the nozzle is lower than the pressure for the sampling end, the electrodes are arranged in the vacuum chamber and behind the nozzle and are provided with a channel for electrospray to pass through, and the direct-current power supply is applied between the hollow capillary tube and the electrodes. The electrospray ion source can be used as a simple ionization device to generate stable ion flow, and is particularly suitable for use as an ion source of a portable mass spectrometer, and the true real-time online field detection and analysis and electrospray ionization can be realized.

A method of tandem mass spectrometry is disclosed. A quasi-continuous stream of ions from an ion source (20) and having a relatively broad range of mass to charge ratio ions is segmented temporally into a plurality of segments. Each segment is subjected to an independently selected degree of fragmentation, so that, for example, some segments of the broad mass range are fragmented whilst others are not. The resultant ion population, containing both precursor and fragment ions, is analyzed in a single acquisition cycle using a high resolution mass analyser (150). The technique allows the analysis of the initial ion population to be optimized for analytical limitations.

A method and apparatus for tandem mass spectrometry is disclosed. Precursor ions are fragmented and the fragments are accumulated in parallel, by converting an incoming stream of ions from an ion source (10) into a time separated sequence of multiple precursor ions which are then assigned to their own particular channel of a multi compartment collision cell (40). In this manner, precursor ion species, being allocated to their own dedicated fragmentation cell chambers (41, 42 . . . 43) within the fragmentation cell (40), can then be captured and fragmented by that dedicated fragmentation chamber at optimum energy and/or fragmentation conditions.

A method of performing physical vapor deposition of copper onto an integrated circuit in a vacuum chamber of a plasma reactor includes providing a copper target near a ceiling of the chamber, placing an integrated circuit wafer on a wafer support pedestal facing the target near a floor of the chamber, introducing a carrier gas into the vacuum chamber, maintaining a target-sputtering plasma at the target to produce a stream comprising at least one of copper atoms and copper ions flowing from the target toward the wafer support pedestal for vapor deposition, and maintaining a wafer-sputtering plasma near the wafer support pedestal by capacitively coupling plasma RF source power to the wafer-sputtering plasma. The frequency of the RF source power is sufficiently high to limit ion energy near the surface of the wafer so that the principal portion of the power provides plasma ion generation. The method further includes maintaining the RF source power at a sufficiently high level to deposit a conformal layer of copper on vertical and horizontal surfaces of the workpiece.