45 results about "Electron flux" patented technology

Ion-induced, UV-induced, and electron-induced sequential chemical vapor deposition (CVD) processes are disclosed where an ion flux, a flux of ultra-violet radiation, or an electron flux, respectively, is used to induce the chemical reaction in the process. The process for depositing a thin film on a substrate includes introducing a flow of a first reactant gas in vapor phase into a process chamber where the gas forms an adsorbed saturated layer on the substrate and exposing the substrate to a flux of ions, a flux of ultra-violet radiation, or a flux of electrons for inducing a chemical reaction of the adsorbed layer of the first reactant gas to form the thin film. A second reactant gas can be used to form a compound thin film. The ion-induced, UV-induced, and electron-induced sequential CVD process of the present invention can be repeated to form a thin film of the desired thickness.

A chemical processing system and a method of using the chemical processing system to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process is described. The chemical processing system comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential greater than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Further, the chemical processing system comprises a substrate holder configured to position a substrate in the second plasma chamber.

A combination of chemical agents reduces reductive stress by limiting the accumulation of high-energy electrons potentially available to the electron transport chain. A method of metabolic uncoupling therapy comprises: analyzing a specific physiologic process involving reductive stress; identifying a plurality of MUT agents that modulate metabolic pathways by influencing electron flux; and formulating a combination of MUT agents that limits the accumulation of high-energy electrons potentially available to the electron transport chain.

Systems and methods include improved techniques for patterning substrates, including improvements to double patterning techniques. Direct current superposition plasma processing is combined with photolithographic patterning techniques. An electron flux or ballistic electron beam from a plasma processing system can induce cross linking in a given photoresist, which alters the photoresist to be resistant to subsequent light exposure and/or developer treatments. Plasma processing is also used to add a protective layer of oxide on exposed surfaces of a first relief pattern, thereby protecting the photoresist from a developing acid. By protecting an initial photoresist relief pattern from developing acid, a second pattern can be applied on and/or between the first photoresist relief pattern thereby doubling an initial pattern or otherwise increasing pattern density. This combined pattern can then be used for subsequent microfabrication such as transferring the combined pattern into one or more underlying layers.

The invention provides a charging effect simulation method at a tail region of a spacecraft. The method comprises the following steps: establishing a fitting expression of a polar region precipitated electron spectrum, which is the relation for the variation of aurora electron flux phi with energy E, wherein the relation is expressed through superposition of power law distribution phip (E), maxwellian distribution phim (E) and Gaussian distribution phiG (E), and fitting the polar region precipitated electron spectrum; establishing an ion distribution characteristic spectrum in a background plasma environment; testing secondary electron emission spectrums of different surface materials of the spacecraft; performing process simulation of the charging effect at the tail region of the spacecraft by using a Particle-In-Cell (PIC) method based on the three-category spectrum. The method has the advantages that the simulation process is clear, the simulation result conforms to the actual monitored charging situation and the like.

The invention discloses a method for controlling an electrification effect on the surface of a spacecraft in orbit. The method for controlling the electrification effect on the surface of the spacecraft in orbit comprises the steps that firstly, a flux threshold value and a temperature threshold value are obtained based on the relationship between an electron flux and a spacecraft surface potential and the relationship between a plasma temperature and the spacecraft surface potential and according to a potential threshold value borne by the spacecraft surface; and in real-time control, the electron flux and an electron temperature are monitored in real time so that a potential active controller switch can be controlled to achieve the purpose of surface potential control. Since the electronflux and the plasma temperature are observed, whether the spacecraft surface can reach the potential threshold value or not is predicted and the surface potential control is carried out instead of carrying out the surface potential control after electrons and plasmas accumulate on the spacecraft surface to reach the potential threshold value, so that the response speed can be improved, and stability and accuracy of active control over spacecraft surface electrification can be improved.

A control circuit (20) for controlling electrostatic discharge in an electric component includes a heater (28) that is thermally coupled to the component. A sensor (30) is used for sensing a sensed condition. A controller is coupled to the heater and the sensor. The controller (24) heats the component in response to the sensed condition. The sensor (30) may include an electron flux level near the component or a surface potential of the component itself.

Embodiments include a chemical processing apparatus and method of using the chemical processing apparatus to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process which is comprised of a substantially anisotropic beam of neutral particles. The chemical processing apparatus comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential greater than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Further, the chemical processing apparatus comprises an ungrounded dielectric (insulator) neutralizer grid configured to expose a substrate in the second plasma chamber to the substantially anisotropic beam of neutral particles traveling from the neutralizer grid.

A process for coating a substrate comprising condensing a radiation curable material on a substrate and curing it using an electron flux 6′ with energy between 6.5 eV and 300 eV. The electron flux 6′ is directed at the substrate (2) either simultaneously or sequentially with delivery of the curable material (5′). Curing is preferably initiated spatially and temporally concurrently with delivery of the material to the substrate. The electron flux is preferably generated using a low pressure gas plasma source with a driving voltage negative relative to the local voltage conditions. The low pressure gas plasma (6′) is preferably magnetically enhanced and, for example, incorporates a magnetron.

The invention discloses an empirical mode decomposition-based establishment method for an hour prediction model of energetic electron flux. The method includes the following steps: step 1. simplifyinga time coefficient of the energetic electron flux by an empirical orthogonal function; step 2. performing reconstruction expansion on the empirical orthogonal function of the time coefficient of theenergetic electron flux by employing a first order primary function of the empirical orthogonal function; step 3. obtaining the time coefficient of the electron flux by using the known electron flux and primary function; step 4, selecting an input parameter; step 5. decomposing the time coefficient by using an empirical mode decomposition EMD algorithm; and step 6. performing fitting on each of components of the time coefficient. The method overcomes the prediction difficulty of the energetic electron flux caused by non-stationary, a decomposed data sequence is stronger in regularity than an original data sequence of the time coefficient, and the prediction accuracy can be significantly improved.

A method for evaluating the risk of charging effect on the surface of a spacecraft in-orbit surface which is based on the real-time monitoring of electron temperature and electron flux in the space environment of spacecraft in orbit, real-time intervention (active potential control) and emergency plan (shutdown of sensitive stand-alone) can be carried out to avoid serious failure caused by surfacecharging effect of spacecraft, which is of great significance to improve the safe and reliable operation of spacecraft in orbit. The in-orbit surface charging effect risk evaluation methods can be made according to different types of spacecraft, different orbit spacecraft, or different sensitive parts of spacecraft (such as solar cell array, etc.), so that the method has wider application range.

The invention relates to a method for treating a gaseous medium containing contaminating particles, such as microorganisms, bacteria, or viruses. The inventive method consists of generating an accelerated electron flux; the electron flux interacting with the gaseous medium, whereby the particles are broken or destroyed by ionization as a result of the interaction and the gaseous medium is sterilized. The invention can be used to treat the atmospheres of refrigerated vessels in refrigerators.

The invention provides a method for establishing a SOFC/SOEC electrode microstructure electrochemical model. The method comprises the following steps: identifying a three-phase boundary line at the intersection of yttrium oxide-stabilized zirconium oxide, nickel and a gaseous phase in an anode microstructure grid unit; establishing a coupling relationship among gas, ion and electron diffusion equations; applying a constant ion and electron flux boundary condition to the boundary of a current collector and an electrolyte, applying a constant gas concentration boundary condition near the current collector, and finally, using a separated solver to carry out steady-state solving to obtain the electrochemical characteristics of the microelectrode. By adopting the technical scheme, the electrochemical model with fully coupled gas, ion and electron diffusion equations is established, and a series of simulation results such as electrochemical potential distribution, ion current and electron current distribution, gas concentration distribution condition and relation between overpotential and input current density in the YSZ can be obtained according to the calculation result of the model; and the invention has certain guiding significance on electrode structure optimization and engineering design.

A system and method for improving the survivability of space systems following a High Altitude Nuclear Explosion (HANE) incident resulting in energetic electrons being trapped in the inner radiation belt of Earth is disclosed. The ULF electromagnetic waves is generated by space or ground based transmitters and the frequency range is selected such that the injected waves are in gyrofrequency resonance with trapped energetic particles. The Radiation Belt Remediation (RBR) depends on the wave-number of the injected waves and the wave-number of the injected waves increases along their propagation path when they approach the cyclotron frequency of the dominant or minority ions 0⁺, He⁺ and H⁺.