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606 results about "Ion current" patented technology

An ion current is the influx and/or efflux of ions through an ion channel.

Methods and apparatus for self-optimization of electrospray ionization devices

An automated electrospray ionization (ESI) device and related methods to optimize electrospray interface conditions for mass spectrometric analysis. The optimization process can be performed with calibration or optimization solutions that produce expected ESI parameters such as an ESI signal or an ion current. The ESI device may include an input/output (I/O) controller that is coupled to an electrospray assembly including an XYZ stage for positioning an electrospray emitter relative to a mass spectrometer orifice. The I/O controller may be connected to a power supply for applying an adjustable electrospray ionization voltage, and an adjustable flow regulator that alters the flow of solution by modifying applied voltage and/or pressure. A central processing unit instructs the I/O controller to control selectively the electrospray assembly based on the resultant signals from the mass spectrometer or the ion currents within the mass spectrometer in accordance with a predetermined optimization algorithm. The resulting ESI signal or ion currents are monitored and provide feedback to the I/O controller which can automatically instruct selected system components to make adjustments as needed to attain optimal settings that produce expected ESI signals or ion currents in the mass spectrometer for selected solutions.
Owner:NORVIEL VERN

Near-field plume mass-spectroscopic diagnostic E*B probe based on Faraday cup

The invention discloses a near-field plume mass-spectroscopic diagnostic E*B probe based on the Faraday cup and belongs to the technical field of plasma mass-spectroscopic diagnosis. The probe mainly applied to measuring near-field plumes of an ion thruster and of a Hall thruster comprises a central frame, ferrite permanent magnets, a flat electrode plate, an electrode plate holder, a collimator tube, a drift tube, a Faraday cup, six carbon steel shells and an anti-sputtering heat-insulating layer. According to the connectional relation, the central frame is used as a core part, the ferrite permanent magnets are distributed on upper and lower surfaces of the central frame, the electrode plate is fixed in the central frame, and an orthogonal electromagnetic field area is formed. The six carbon steel shells are used for packaging, and the front ends of the shells are coated with an anti-sputtering heat-insulating layer. The collimator tube of stainless steel and the drift tube are fitly fixed to the centers of two ends of the central frame through shaft holes. Ions different in valence are screened by adjusting voltage among the electrode plates, univalent and bivalent ion currents are acquired with the Faraday cup of aluminum, and the ratio of near-field plum bivalent ions is acquired by analytical computing.
Owner:BEIHANG UNIV

Dose cup located near bend in final energy filter of serial implanter for closed loop dose control

An ion implantation system having a dose cup located near a final energy bend of a scanned or ribbon-like ion beam of a serial ion implanter for providing an accurate ion current measurement associated with the dose of a workpiece or wafer. The system comprises an ion implanter having an ion beam source for producing a ribbon-like ion beam. The system further comprises an AEF system configured to filter an energy of the ribbon-like ion beam by bending the beam at a final energy bend. The AEF system further comprises an AEF dose cup associated with the AEF system and configured to measure ion beam current, the cup located substantially immediately following the final energy bend. An end station downstream of the AEF system is defined by a chamber wherein a workpiece is secured in place for movement relative to the ribbon-like ion beam for implantation of ions therein. The AEF dose cup is beneficially located up stream of the end station near the final energy bend mitigating pressure variations due to outgassing from implantation operations at the workpiece. Thus, the system provides accurate ion current measurement before such gases can produce substantial quantities of neutral particles in the ion beam, generally without the need for pressure compensation. Such dosimetry measurements may also be used to affect scan velocity to ensure uniform closed loop dose control in the presence of beam current changes from the ion source and outgassing from the workpiece.
Owner:AXCELIS TECHNOLOGIES
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