The invention belongs to the technical field of preparation of inorganic non-
metallic materials, and particularly relates to a preparation method of high-purity opaque
quartz glass. The method comprises the following steps: by taking high-purity silica
sol with
impurity content of less than 1ppm as a
raw material, compounding silica
sol with various particle sizes in proportion, concentrating under reduced pressure until the content of
silicon dioxide is 40-60%, adding an
acrylamide gel enhancing
system into the compounded
sol, controlling the temperature to gelatinize the compounded sol, and preserving heat to improve the
gel strength; and
drying the wet gel at a low temperature of 60-80 DEG C and a
relative humidity of 80-95% until the
moisture content is less than 5%, then carrying out normal pressure
dehydration,
organic matter removal and presintering treatment on the dried gel blank, placing the presintered blank in a
graphite container, and melting and preserving heat at 1400-1650 DEG C under the protection of
nitrogen for 2-8 hours to obtain the non-
quartz glass. And the pore size and density can be controlled by regulating and controlling the
melting temperature and the heat preservation time. The total
impurity content of the
quartz glass prepared by the method is less than 5ppm, the structure is uniform, the density can be adjusted in a range of 1.8-2.1 g / cm < 3 >, and the quartz glass has good shading and heat-insulating properties.