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Vacuum discharge plasma parameter measuring device and method

A technology of plasma and vacuum discharge, which is applied in the field of ion plasma diagnosis, can solve problems such as ineffective measurement and analysis of plasma, and achieve the effects of easy implementation, high measurement accuracy and simple structure

Active Publication Date: 2015-07-22
BEIJING JIAOTONG UNIV
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

When this method is applied to continuous discharge (DC, continuous pulse, etc.) conditions, the plasma generated by the discharge passes through the probe system continuously, and the dual-probe method cannot be used to measure the diffusion rate of the plasma and the kinetic energy of the metal ions generated by the discharge. Measurement. This method has limitations and cannot effectively measure and analyze all the characteristics of the plasma

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  • Vacuum discharge plasma parameter measuring device and method
  • Vacuum discharge plasma parameter measuring device and method
  • Vacuum discharge plasma parameter measuring device and method

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Embodiment Construction

[0026] Below in conjunction with accompanying drawing, the present invention is described in further detail:

[0027] Such as figure 1 As shown, the plasma source discharge produces plasma (the anode of the plasma source is grounded), and the plasma is transmitted in the plasma transmission channel. The net G, the first probe P1 and the second probe P2 are sequentially installed on the plasma transmission channel, the plasma transmission channel is located inside the cylindrical object 2, and both the plasma source and the cylindrical object 2 are located in the vacuum chamber , the grid G ​​is connected to the common node of C4 capacitor, R6 resistor and L inductor in the control signal generator through shielded wire 1, the first probe P1 is connected to the common node of DC1 DC power supply and C1 capacitor through shielded wire 1, and the second probe P2 is connected to the common node of DC2 DC power supply and C2 capacitor through shielded wire 1; GND ground potential ...

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Abstract

The invention discloses a vacuum discharge plasma parameter measuring device and method, falling in the technical field of plasma diagnosis. The invention is characterized by adopting a grid, to which a negative potential is applied, to control plasma. The device structurally comprises the grid, a first probe and a second probe sequentially mounted on a plasma transmission channel. The grid is connected with a control signal generator, the first probe is connected with the common node of a direct current power supply DC1and a capacitor C1, and the second probe is connected with the common node of a direct current power supply DC2 and a capacitor C2. The invention can perform diagnosis on characteristics of plasma generated by discharge of a single pulse or continuous pulses and distributed in different spaces or at different time points; can realize on / off control on the plasma by applying a proper barrier potential; facilitates analysis of transmission characteristics of the plasma in a space; and has the characteristics of simple structure, high measurement precision and strong interference resistance.

Description

technical field [0001] The invention belongs to the technical field of plasma diagnosis, in particular to a device and method for measuring vacuum discharge plasma parameters. Background technique [0002] In the process of vacuum discharge plasma generation, there are a large number of process variables in the plasma, such as plasma diffusion speed, plasma density, electron temperature, ion energy and various ion excited groups, etc. They all affect the physical and chemical process of plasma-material interaction, and determine the final material structure and performance. Therefore, it is of great significance to carry out experimental diagnosis on plasma characteristic parameters. [0003] In the existing techniques for measuring the parameters of the vacuum discharge plasma, the Langmuir probe method is mainly used to measure the parameters of the single pulse vacuum discharge plasma. When this method is applied to continuous discharge (DC, continuous pulse, etc.) cond...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32
Inventor 刘文正孔飞张德金
Owner BEIJING JIAOTONG UNIV
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