69 results about "Plasma particle" patented technology

A process for depositing anti-microbial materials into or onto the surface of a substrate using ionic plasma deposition. The process includes the steps of providing a cathode of target material having anti-microbial potential which is disposed within a partial vacuum, powering the cathode to generate a plasma discharge for ionizing the target material into a plasma of constituent particles. The plasma particles are reacted with ionized gas, and are selected, controlled and directed toward the substrate by electromagnetic fields generated by at least one first anode adjacent to the cathode and at least one second anode positioned adjacent the first anode. Additional anode structures and charged screens provide further control of the plasma constituents. The plasma constituents, comprising the anti-microbial materials, are deposited on the substrate as dispersed ordered structures which form an anti-microbial surface into and onto the substrate.

The invention provides a method and apparatus for creating plasma particles and applying the plasma particles to a liquid. Liquid feedstock (e.g., water and/or hydrocarbons mixed with biomass) is pumped through a pipeline; the single-phase stream is then transformed into a biphasic liquid-and-gas stream inside a chamber. The transformation is achieved by transitioning the stream from a high pressure zone to a lower-pressure zone. The pressure drop may occur when the stream further passes through a device for atomizing liquid. Inside the chamber, an electric field is generated with an intensity level that exceeds the threshold of breakdown voltage of the biphasic medium leading to a generation of a plasma state. Furthermore, the invention provides an energy-efficient highly adaptable and versatile method and apparatus for sanitizing water using plasma particles to inactivate biological agents contaminating water.

A plasma thruster with a cylindrical inner and cylindrical outer electrode generates plasma particles from the application of energy stored in an inductor to a surface suitable for the formation of a plasma and expansion of plasma particles. The plasma production results in the generation of charged particles suitable for generating a reaction force, and the charged particles are guided by a magnetic field produced by the same inductor used to store the energy used to form the plasma.

A plasma processing apparatus having a vacuum vessel and a supporting means for supporting a processing target in the vacuum vessel, the apparatus comprising means for introducing a gas into a plasma generating space, means for feeding electric energy to the gas in the plasma generating space to generate a plasma, a metal member for forming negative ions which is provided on the downstream side of the plasma generating space in such a way that it comes into contact with particles of the plasma, and means for feeding the negative ions to the processing target. Utilizing the electric charge exchange reaction between plasma particles and metal surfaces, negative ions can be formed continuously and in a high density and also the negative ions can be made incident on a processing target to make ashing, etching or cleaning of the processing target to remove unwanted matter therefrom, so that a high processing rate and less charge-up damage can be achieved.

Spiral coils generate very powerful electromagnetic fields by operating with two different but simultaneous resonant behaviors. Quarter-wave resonance is established by adjusting the frequency (and wavelength) of a radiofrequency (RF) voltage source until the length of the spiral conductor is equal to ¼ of the wavelength of the alternating voltage. This generates an electromagnetic standing wave with at least one peak node and at least one null node. Inductive-capacitive (L/C) resonance is established by optimizing the thickness and width of the wire ribbon used to make the spiral coil. When inductance and capacitance are balanced, the current response will synchronize with the voltage input, creating in-phase behavior, minimal total impedance, and maximal power output. If two such coils are placed near each other, they will create an extremely powerful electromagnetic field between them, which can promote chemical and plasma reactions involving charged particles such as ions or plasma particles, possibly including nuclear fusion reactions.

The invention discloses a plasma jet device comprising a shell which is provided with a first inlet and a first outlet. Multiple discharge units are distributed in the shell. The first inlet is used for providing reaction gas to the discharge units. The discharge units are used for performing discharge processing on the reaction gas so as to form plasma jet. The first outlet is used for outputting the plasma jet. According to the plasma jet device, the formed plasmas form a large area of uniform and stable plasma jet through the effect of gas flow, the array plasma jet directly affects a substrate to perform etching on a thin film transistor, and finally the thin film transistor plasma etching technology in which a discharge area and a working area are separated can be realized. The technical scheme has the advantages of being high in plasma particle activity and fast in processing speed so as to realize multi-angle and large area of uniform and stable low temperature thin film transistor surface etching.

The invention provides a plasma parameter measurement method based on a plasma wind tunnel. The method comprises the steps of firstly adjusting a transmitting antenna and a receiving antenna to be inthe same phase through a vector network analyzer before laminar plasmas are inputted into the plasma wind tunnel; forming a plasma beam in a wind tunnel between the transmitting antenna and the receiving antenna after plasmas are input; measuring the diameter of the plasma beam and the phase difference between the receiving antenna and the transmitting antenna, and calculating the plasma electrondensity according to the phase difference and the diameter of the plasma beam; and measuring the offset of characteristic spectral lines of the plasma particles through a spectrograph, and calculatingthe beam velocity of the plasmas according to the offset. The measurement error of the electron density and the beam speed of the plasmas measured by the method is less than 0.01mm, the accompanyingresolution is less than 0.5 degree, the comprehensive error is less than 0.16%, the plasma parameters are accurately measured on the premise of not interfering with the plasma beam, and the measurement accuracy is improved.

High quality GaN films exhibiting strong room temperature blue photoluminescence with negligible impurity emissions are grown by a Pulsed Laser Deposition process in which process parameters are controlled to attain plasma particle energy of a target material plume directed from the target on the substrate structure below 5 eV at the deposition surface. Among the process parameters, a distance between the deposition surface and the target, a pressure level of the reaction gas in the processing chamber, and an energy density of the pulsed laser beam directed to the target are controlled, in combination, to attain the required low plasma particle energy of the plume below 5 eV in vicinity of the deposition surface.

The invention discloses a handheld portable generating device for sliding arc low-temperature plasma. According to the structure, a miniature air pump is connected with an insulating sleeve through a silica gel conduit, the insulating sleeve is located between a high-voltage electrode and a ground electrode, a high-voltage power source supplies power to the high-voltage electrode and the ground electrode, the high-voltage power source, the high-voltage electrode and the ground electrode are embedded in a handle, a hole is formed in the front end of the handle, so that the plasma is sprayed out, and a control switch is arranged on the handle so as to control the high-voltage power source to work. The generating device has the advantages that the length and the temperature of the plasma are changed through adjustment of the voltage, operation is simple and flexible, and the device can be used conveniently by an operator; the device is small in size, convenient to carry, attractive in appearance and low in cost; air or simple substance gas or a mixture of air and simple substance gas or a gaseous compound or gaseous organic matter serves as the working gas and various requirements can be met; other excitation devices are not needed, faults are reduced, and reliability of the device is improved; the generating device is different from a traditional plasma source, a sliding arc is more efficient, the activity of generated plasma particles is better, and the particles are more beneficial to the human body and the material treatment effect.

The invention discloses an LIBS-MS combined substance detection system in a planetary open environment. The LIBS-MS combined substance detection system mainly comprises a main controller, an MS module, an LIBS module, a mass spectrum coupling module an auxiliary module. The LIBS-MS combined substance detection system has the beneficial effects that plasma particles induced by an LIBS laser deviceare efficiently transmitted into an MS by virtue of planetary atmosphere as carrier gas and a siphon effect of a capillary tube and are analyzed; a time-of-flight mass spectrometer structure is adopted in a mass spectrum module, so that the drawback that auxiliary gas is required by an ICP is avoided; and a spectrograph is combined with an ICCD detector through a CT structure, so that weak femtosecond LIBS signals can be detected, and the spectrograph can meet the optical mass spectrum reuse requirement of a femtosecond laser device.

A propulsion system for spacecraft is based on an electric engine that expels propellant to achieve thrust. The propellant is first ionized to generate a plasma. Plasma particles are selectively accelerated via a pulsed laser that accelerates predominantly the electrons in the plasma. The electrons are expelled first, forming a space charge that acts as a virtual cathode to accelerate the positive ions. Interactions between the laser beam and plasma electrons are predominantly through the ponderomotive force.

The invention discloses a double-laser trimming device for a grinding wheel. The trimming device comprises a nanosecond pulse laser, a femtosecond pulse laser, a laser beam expander, a first focusinglens, a second focusing lens and a pulse liquid column flow generator; a laser beam output by the nanosecond pulse laser is subjected to beam expanding treatment by the laser beam expander, then is output by the first focusing lens and acts on the surface of the trimmed grinding wheel, and tangential flattening and radial dressing of the grinding wheel are realized; a laser beam output by the femtosecond pulse laser is focused by the second focusing lens and then acts on the surface of the trimmed grinding wheel, and the grinding wheel is trimmed. The double-laser trimming device which is usedfor the grinding wheel and is based on an auxiliary pulse liquid column flow and the beam expander is put forward, the cost is saved, plasma particles are inhibited from returning to the surface of the grinding wheel, and the phase explosion effect is avoided; in the process of reshaping diamond grits on the surface of the grinding wheel, the defects such as hot cracks, graphite metamorphic layers and the like caused by heat accumulation around the diamond grits are avoided through quick cooling, and thus the trimming efficiency and the trimming quality are greatly improved.

The invention provides a deposition chamber and a film deposition apparatus. The deposition chamber comprises a cavity, a liner encircling the sidewall of the cavity, a target and a substrate, whereinthe target is arranged above the top opening of the liner, and the substrate is arranged below the bottom opening of the liner. The deposition chamber further comprises a shielding member which is fixedly arranged around the periphery of the substrate, wherein the orthographic projection of the shielding member on the target covers the bottom of the substrate. The deposition chamber can prevent plasma particles from falling into the bottom of the cavity and does not need extra pressure ring, thereby avoiding particle contamination caused by falling-off of a deposited film when the pressure ring and a tray are separated from each other after completion of process; and the deposition chamber overcomes the defect of instability of a deposition process due to the setting of the pressure ringand the defect of nonuniformity of the deposited film caused by the setting of the pressure ring, thereby ensuring the stability of the entire process and the uniformity of film deposition.

Provided are an apparatus for photographing plasma particles and a method for detecting an etch endpoint using the apparatus. The method includes: receiving, according to time, a captured image of particles in a plasma chamber in which a thin film on a wafer is being etched; calculating a number of pixels within a predetermined grayscale range in the captured image; calculating, according to points of time, an accumulated average value of the number of pixels up to a current point of time; and detecting an etch endpoint that is a completion time of etching by using the accumulated average value calculated according to points of time.

A method of plasma particle simulation capable of preventing solution divergence. A space within a housing chamber of a plasma processing apparatus is divided into a plurality of cells. A weighting factor corresponding to the number of plasma particles represented by a superparticle is set in each of the divided cells. Superparticles are set in each of the divided cells using plasma particles contained in the divided cell and the set weighting factor. The behavior of the superparticles in each of the divided cells is calculated. The weighting factor becomes smaller as the divided cell is located closer to a solid wall surface of the housing chamber.

The invention relates to a plasma generator (1) for cleaning an object. The plasma generator (1) comprises a plasma chamber (2) and a support structure (6) arranged in the plasma chamber for supporting the object (7) to be cleaned. Further, the plasma generator comprises an electromagnetic shield (5a, 5b, 5c) counteracting a flow of charged plasma particles flowing from a plasma generating region towards the object, and a plasma source (8). In addition, the plasma generator comprises an additional plasma source (9,10) to form a composition of plasma sources that are arranged to generate in the plasma generating region plasmas, respectively, that mutually interact during operation of the plasma generator so as to force plasma particles to flow in a diffusely closed flow path.

The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

The invention discloses an ignition method, structure and manufacturing method for an electric detonator. The surface of an initiating explosive of the electric detonator is provided with a layer of metal thin film in contact with the initiating explosive to serve as a bridge of the electric detonator, and electric pulses from an energy storage system flow through the metal thin film bridge so that the metal thin film bridge can be heated and gasified till the metal thin film bridge is broken through to form plasma. Plasma particles permeate into a chemical agent adjacent to the plasma particles through micro-convection motion and are coagulated on chemical agent particles to transmit energy to the chemical agent particles, so that a chemical reaction is induced, and the chemical agent particles can be ignited. The metal thin film serves as the bridge, a traditional technology of the electric detonator is changed, the defects such as welding spot pseudo soldering, welding splashes and the like in a bridge manufacturing technology of the traditional technology are overcome, initiating explosive devices can be miniaturized and are low in energy consumption, high in safety and high in reliability, and a brand new technological approach is provided for development of initiating explosive devices. The ignition method, structure and manufacturing method for the electric detonator are simple, easy to conduct and ideal in use effect.