71 results about "Radiofrequency generator" patented technology

Some embodiments are directed to a method of processing a substrate in a plasma processing system. The method generally includes tuning a first capacitor and a second capacitor of a tuning circuit to match a first impedance corresponding to a first stage of a waveform, while a frequency of a radio frequency (RF) generator is preset to a first frequency; tuning a third capacitor of the tuning circuit and the frequency of the RF generator to match a second impedance corresponding to a second stage of the waveform, wherein the frequency of the RF generator is tuned to a second frequency; recording setting values of the first frequency and the second frequency that match different impedances at different stages of the waveform; and switching between the first frequency and the second frequency to match the different impedances at the different stages of the waveform.

An electrosurgical unit configured to regulate a RF input signal applied to an electrosurgical device, the electrosurgical unit including a PWM circuit to produce a DC voltage responsive to a control signal; an RF waveform generator configured to generate an RF waveform based at least in part on the DC voltage; a transformer configured to transform the RF waveform to the RF input signal in a forward direction across the isolation barrier and transform a leakage current to a feedback current in a reverse direction across the isolation barrier; and a control circuit configured to generate the control signal based at least in part on the first input signal and the second input signal, the control signal controlling a pulse width modulation of the PWM circuit to produce the RF input signal.

A radiofrequency, RF, generator, in particular for a plasma application, including at least one cooling element having an upper surface and a lower surface; at least one DC power supply; at least one power stage to amplify an RF signal and connected to the upper surface of the at least one cooling element, wherein the power stage include one or more power amplifiers; a driver to supply the power amplifier of the at least one power stage and connected to the upper surface of the at least one cooling element; wherein the at least one DC power supply is connected by a busbar with the power amplifier and the driver, wherein a DC voltage Vbusbar is supplied to the power amplifier and the driver via the busbar; and wherein the busbar comprises a damping network including a plurality of capacitors connected between ground and the busbar and configured to shape transients on Vbusbar.

Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.

The invention discloses an impedance matching network, an impedance matching control system and an impedance matching method. An impedance matching network for a plasma process is described. The impedance matching network includes an input port connectable to the radio frequency generator module. The impedance matching network includes an output port connectable to a load. The impedance matching network includes a transmission circuit, wherein the transmission circuit connects the output port to the input port. The transmission circuit includes a first transmission line and a second transmission line, where the first transmission line is electrically connected to the input port, and where the second transmission line is electrically connected to the output port. The impedance matching network includes a first impedance matching module, wherein the first impedance matching module is configured to connect at least one reactance to the transmission circuit. The impedance matching network comprises a coupling element through which the first transmission line and the second transmission line are coupled to each other, and wherein the coupling element provides an inductive coupling between the first transmission line and the second transmission line.

An impedance matching network for plasma processes includes an input port being connectable to a radio frequency (RF) generator circuit, an output port being connectable to a load, and a transmission circuit. The transmission circuit connects the output port to the input port. The transmission circuit includes a first transmission line and a second transmission line, wherein the first transmission line is electrically connected to the input port, and wherein the second transmission line is electrically connected to the output port. The impedance matching network further includes a first impedance matching circuit configured to connect at least one reactance to the transmission circuit. The impedance matching network further includes a coupling element, wherein the first transmission line and the second transmission line are coupled to each other by the coupling element, and wherein the coupling element provides an inductive coupling between the first transmission line and the second transmission line.

A method and apparatus for processing a substrate are provided. For example, a matching network comprises a first sensor operably connected to the input of the matching network and an RF generator capable of operating at a first frequency, and a second sensor operably connected to the output of the matching network and a plasma processing chamber. The first and second sensors are configured to measure impedance during the pulse-on time of the RF generator. A variable capacitor is connected to the first and second sensors. A controller is configured to adjust at least one variable capacitor of the matching network during the pulse-on time of the RF generator based on an impedance value measured during at least one of the pulse-on or pulse-off states of a pulse voltage waveform generator connected to the matching network, or an RF signal from another RF generator capable of operating at a second frequency different from the first frequency.

This invention discloses a hydrogen isotope permeation research device based on radio frequency plasma, belonging to the field of hydrogen isotope permeation research technology. The device includes a quartz tube, one end of which is connected to an inlet unit, and the other end has a fixed flange with a gas venting channel. A permeation tube is detachably and sealed to the fixed flange, and the inner cavity of the permeation tube is connected to a permeation flux detection unit. A tubular furnace corresponding to the permeation tube and a coupling coil electrically connected to a radio frequency generator are fitted around the quartz tube. The device also includes an in-situ reverse cleaning unit that can replace the permeation flux detection unit and a plasma diagnostic unit that can replace the permeation tube. This invention uses a radio frequency plasma source, which has high plasma density and a wide parameter adjustment range, effectively processing combined hydrogen isotopes. The in-situ reverse cleaning unit improves the permeation flux and operational stability. The modular structure provides strong engineering scalability and can support the systematic research and engineering development of ultrapermeation pumps.

Systems and methods for controlling a processing rate at an edge region of a plasma chamber are described. One of the systems includes a first radio frequency (RF) generator that generates a first RF signal. A first matching circuit outputs a first modified RF signal upon receiving the first RF signal. The system includes a plasma chamber having a substrate support and an upper electrode extension. The first impedance matching circuit provides the first modified RF signal to the substrate support. The upper electrode is coupled to a ground potential or to a floating potential. The system includes a second RF generator that generates a second RF signal. A second impedance matching circuit outputs a second modified RF signal upon receiving the second RF signal. The second impedance matching circuit provides the second modified RF signal to the upper electrode extension.

Devices, systems, and methods are claimed for the treatment of premature ejaculation using neuromodulation, e.g., via radio frequency (RF) or ultrasound (US) energy to disrupt neural function at the dorsal penile nerves or pelvic floor. In one embodiment, a device for the non-invasive prevention or treatment of premature ejaculation is disclosed, the device being applicable externally to a penis of an individual, the device comprising: at least one radiofrequency (RF) generator configured to generate RF energy; at least one RF electrode suitable for placement on a target penile surface of the penis proximate to at least one dorsal penile nerve; and at least one control circuit connected to the RF generator, wherein the at least one control circuit is operable to cause the RF energy to selectively affect the at least one dorsal penile nerve to prolong ejaculation time.

The invention provides metal gate high dielectric constant layer material DPN equipment and process, the equipment comprises a cavity and a resonance coil arranged on the cavity, the cavity is provided with an air inlet, the resonance coil is connected with an RF radio frequency generator, and the RF radio frequency generator outputs radio frequency power with duty ratio. Nitrogen atoms can be prevented from penetrating through the high-dielectric-constant layer to enter the lower-layer device area as much as possible.

A system for pulsing a top low frequency (LF) radio frequency (RF) generator is described. The system includes a main LF RF generator that generates a first RF signal and is coupled to a lower electrode of a plasma chamber. The top LF RF generator generates a second RF signal and is coupled to a top electrode of the plasma chamber. The system includes a waveform controller coupled to the main LF RF generator and the top LF RF generator. The waveform controller receives a pulse repetition rate and a first duty cycle of the first RF signal, controls the top LF RF generator to apply the pulse repetition rate to the second RF signal, and controls the top LF RF generator to have a second duty cycle that is greater than the first duty cycle.

A substrate processing system includes a vacuum transfer module and a plurality of process modules defining respective processing chambers. The plurality of process modules includes a first row of the process modules arranged on a first side of the vacuum transfer module and a second row of the process modules arranged on a second side of the vacuum transfer module opposite the first side. Each of the plurality of process modules includes a gas box arranged above the process module and configured to selectively supply at least one gas and / or gas mixture into the processing chamber of the process module and a radio frequency (RF) generator configured to generate RF power to create plasma within the processing chamber. The RF generator is arranged above the process module and the gas box and the RF generator are arranged side-by-side above the process module.

The invention discloses a radio frequency assisted freezing system which comprises a radio frequency generation module, a radio frequency processing module, a low-temperature freezing module and an optical fiber temperature measurement module, the radio frequency generation module can provide stable pulse radio frequency signals and comprises a radio frequency generator, a relay pulse generator and an impedance matcher, and the relay pulse generator and the impedance matcher are electrically connected with the radio frequency generator. The radio frequency processing module is used for providing a radio frequency action space for food and comprises a radio frequency processing device, the low-temperature freezing module can provide freezing cooling capacity for the system and comprises a low-temperature refrigerator, the impedance matcher and the radio frequency processing device are arranged in the low-temperature refrigerator, and the optical fiber temperature measuring module is arranged on the outer side of the low-temperature refrigerator; and the optical fiber temperature measurement module is used for accurately monitoring the food temperature. Through the synergistic effect of the radio frequency field and low-temperature freezing, the crystallization process of water molecules in the food can be effectively interfered, the food is promoted to generate an obvious supercooling phenomenon, a large number of ice nucleuses are formed at the temperature lower than the freezing point in an explosive mode finally, and the final quality of the frozen food is greatly improved.

This application provides a system for performing radiofrequency ablation surgery, relating to the field of medical device technology. The system includes a puncture surgery navigation and positioning subsystem for puncture positioning and navigation, and a radiofrequency ablation device electrically connected to the puncture surgery navigation and positioning subsystem. The puncture surgery navigation and positioning subsystem includes a positioning manipulator with a restraint at its front end. The radiofrequency ablation device includes a radiofrequency electrode needle and a radiofrequency generator electrically connected to each other. The puncture surgery navigation and positioning subsystem is configured to send a first trigger signal to the radiofrequency generator when it detects that the radiofrequency electrode needle, inserted through the restraint, has reached the puncture target point. This causes the radiofrequency generator to output radiofrequency current through the radiofrequency electrode needle based on the first trigger signal, acting on the ablation target. This technical solution improves the overall efficiency of radiofrequency ablation surgery.

An impedance matching network comprising an input port connectable to a radio frequency (RF) generator circuit and an output port connectable to a load. A transmission line is connected between the output port to the input port. The impedance matching network comprises an impedance matching circuit comprising a primary circuit, a secondary circuit, at least one inductance, at least one reactance, and a switching circuit. The primary circuit is connected to the transmission line or is arranged in the transmission line. The secondary circuit comprises the at least one reactance. The at least one inductance is configured to couple the primary circuit with the secondary circuit. The switching circuit is configured to selectively electrically connect or disconnect the secondary circuit.

A method for controlling a power factor of a medical system including an RF generator connected to provide an RF output to an high frequency (HF) ablation catheter. A phase angle of the RF output provided to the HF ablation catheter is monitored. The phase angle of the RF output includes a phase difference between an output current and an output voltage. The phase angle is compared to a threshold. A capacitance of a capacitor bank connected in-series with the HF ablation catheter is selectively adjusted when the phase angle exceeds the threshold.

The utility model discloses a high -performance microwave ablation electrode with magnetic navigation device, including treatment mechanism, cooling mechanism and succession mechanism, the treatment mechanism includes handle, ablation needle who is penetrated in the handle one end, is embedded in the radio frequency generator of handle other end, ablation needle is connected with radio frequency generator, cooling mechanism, the cooling mechanism includes the annular cooling cavity of being opened in the handle inside, with two circulating water pipes of annular cooling cavity inside intercommunication, with the physiological saline bottle no.

1. The name of the design product: Radio Frequency Generator (RFP10013). 2. The use of the design product: The design product is mainly used for generating plasma to realize key processes such as etching, thin film deposition, cleaning, and other semiconductor applications. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.

The application discloses a bidirectional ablation control system and a control method, and the system comprises: an ablation control system comprising a radio frequency generator for generating a radio frequency signal of a preset frequency required by radio frequency ablation; an ablation electrode array for emitting the radio frequency signal to a lesion to be ablated in a biological tissue; a low-temperature cooling device for realizing refrigeration and adjusting the temperature of the biological tissue close to the ablation electrode array region; a data acquisition unit for acquiring a target ablation depth and a target protection depth, and acquiring a cooling medium temperature and a tissue control point temperature; and a control unit for ablation of the lesion to be ablated according to the target ablation depth and the target protection depth. The temperature generated during ablation of the ablation electrode array is controlled by the low-temperature cooling device, so that the surface layer tissue close to the electrode can be protected and the deep layer lesion can be heated at the same time, and the thickness of the surface layer tissue to be protected and the thickness of the deep layer tissue to be heated can be adjusted by control parameters to realize individualized and accurate treatment effect.

Devices, systems, and methods are claimed for the treatment of premature ejaculation using neuromodulation, e.g., via radio frequency (RF) or ultrasound (US) energy to disrupt neural function at the dorsal penile nerves or pelvic floor. In one embodiment, a device for the non-invasive prevention or treatment of premature ejaculation is disclosed, the device being applicable externally to a penis of an individual, the device comprising: at least one radiofrequency (RF) generator configured to generate RF energy; at least one RF electrode suitable for placement on a target penile surface of the penis proximate to at least one dorsal penile nerve; and at least one control circuit connected to the RF generator, wherein the at least one control circuit is operable to cause the RF energy to selectively affect the at least one dorsal penile nerve to prolong ejaculation time.

A substrate processing system includes a processing chamber and an RF generator configured to generate RF power. A matching network is connected to the RF generator. N spiral coils are connected to the matching network and include M turns, where N and M are integers greater than 1. The N spiral coils are wound symmetrically around an outer surface of the processing chamber. The N spiral coils are connected in parallel to the matching network.

The application discloses a kind of control device and system of radio frequency microneedle interval needle body movement synchronous energy output, device includes: main controller according to preset path control XY axis horizontal movement mechanism and move microneedle array to target target point coordinate, after confirming in place, lock XY axis horizontal movement mechanism;Control Z axis lifting mechanism drives microneedle array and vertically pierces into skin to preset depth;Before radio frequency energy output, real-time detection loop biological impedance value carries out handshake verification, only when biological impedance value is in effective coupling interval, trigger radio frequency generator and output energy;During the whole energy output process, XY axis horizontal movement mechanism is kept in locked state;After energy output ends, control Z axis lifting mechanism vertically withdraws, and after microneedle array is separated from skin, release lock and execute next position movement.Effective solution skin mechanical damage problem, and the risk of empty firing or burn due to lack of contact detection, significantly improve the precision, uniformity and safety of treatment.

A substrate processing system for processing substrates in a processing chamber includes a matching network, a tuning circuit, and a controller. The matching network receives a first RF signal having a first frequency from an RF generator and impedance matches the input of the matching network to the output of the RF generator. The tuning circuit, unlike the matching network, includes circuit components having a first impedance. The tuning circuit receives the output of the matching network and outputs a second RF signal to a first electrode on the substrate support. The controller determines a target impedance for the circuit components and, based on the target impedance, signals the RF generator to adjust the first frequency of the first RF signal received by the matching network to a second frequency, thereby changing the first impedance of the circuit components to match the target impedance.

System (1) for drying of dielectric products (99) comprising: a first array (10) of first electrodes (100), wherein the first array (10) is arranged along a first plane (P1), which extends along a first direction (L1) and a second direction (L2), a second array (20) of second electrodes (200), wherein the second array (20) is arranged along a second plane (P2), which extends along the first direction (L1) and the second direction (L2), and wherein the first plane (P1) is spaced apart from the second plane (P2) along a third direction (L3), and wherein each of the first electrodes (100) is spaced apart from its corresponding second electrode (200) along the third direction (L3), forming a plurality of pairs (300) of the first electrode (100) and the second electrode (200). The system (1) further comprises a plurality of radio-frequency generators (30) adapted to produce radio frequency signals of specific and adjustable amplitude and preselected frequency, wherein each of the plurality of radio-frequency generators (30) is electrically coupled to one pair (300) of the first electrode (100) and the second electrode (200).

Devices, systems, and methods are claimed for the treatment of male urinary frequency disorders using volumetric tissue heating, e.g., via radiofrequency (RF) or ultrasound (US) energy applied to pelvic floor tissue or penile tissue. In one embodiment, a device for the non-invasive treatment of urinary frequency disorders is disclosed, the device being applicable externally to a perineal region of a male individual, the device comprising: at least one radiofrequency (RF) generator configured to generate RF energy; at least one RF electrode suitable for placement on a target perineal surface; and at least one control circuit connected to the RF generator, wherein the at least one control circuit is operable to cause the RF energy to selectively heat a portion of a urethra, a portion of one or more pelvic floor muscles, a portion of a prostate gland, or a portion of a urinary bladder.

Embodiments of the disclosure include apparatus (e.g., plasma processing systems) and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a method for waveform generation, which generally includes delivering a radio frequency (RF) waveform at a frequency for a first period of time using a RF generator and then halting the delivery of the RF waveform for a second period of time, and delivering a pulsed voltage waveform at a first voltage for at least a portion of a third period of time using a pulser, wherein the delivery of the pulsed voltage waveform overlaps with the delivery of the RF waveform during a portion of the second period of time.

The invention discloses a control method and system for synchronous energy output of intermittent needle body movement of a radio frequency microneedle, and the method comprises the steps: a main controller controls an XY-axis horizontal movement mechanism to move a microneedle array to a target point coordinate according to a preset path, and locks the XY-axis horizontal movement mechanism after confirming that the microneedle array is in place; controlling the Z-axis lifting mechanism to drive the microneedle array to vertically pierce into the skin to a preset depth; before radio frequency energy is output, a biological impedance value of a loop is detected in real time for handshake verification, and a radio frequency generator is triggered to output energy only when the biological impedance value is in an effective coupling interval; in the whole energy output process, the X-axis and Y-axis horizontal moving mechanism is kept in a locked state; and after energy output is finished, the Z-axis lifting mechanism is controlled to vertically withdraw, and after the microneedle array is separated from the skin, locking is relieved, and next-position movement is executed. The problem of mechanical injury of the skin is solved, the risk of empty hitting or burning caused by lack of contact detection is avoided, and the accuracy, uniformity and safety of treatment are remarkably improved.

To correct uniformity in a processing speed of a substrate when the substrate is processed in a plasma chamber.SOLUTION: An impedance matching box housing is described. The impedance matching box housing includes an impedance matching circuit having an input coupled to a radio frequency (RF) generator. The impedance matching circuit has an output coupled to the first RF strap. The match network housing includes a uniformity control circuit coupled in parallel with a portion of the first RF strap to modify uniformity in a processing rate of the substrate when the substrate is processed in the plasma chamber.SELECTED DRAWING: Figure 4A