228 results about "Radiofrequency generator" patented technology

Embodiments of the disclosure include apparatus (e.g., plasma processing systems) and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a method for waveform generation, which generally includes delivering a radio frequency (RF) waveform at a frequency for a first period of time using a RF generator and then halting the delivery of the RF waveform for a second period of time, and delivering a pulsed voltage waveform at a first voltage for at least a portion of a third period of time using a pulser, wherein the delivery of the pulsed voltage waveform overlaps with the delivery of the RF waveform during a portion of the second period of time.

A system having the low frequency RF generator is described. The low frequency RF has an operating frequency range between 10 kilohertz (kHz) and 330 kHz. The low frequency RF generator generates an RF signal. The system further includes an impedance matching circuit coupled to the low frequency RF generator for receiving the RF signal. The impedance matching circuit modifies an impedance of the RF signal to output a modified RF signal. The system includes a plasma chamber coupled to the RF generator for receiving the modified RF signal. The plasma chamber includes a chuck having a dielectric layer and a base metal layer. The dielectric layer is located on top of the base metal layer. The dielectric layer has a bottom surface, and the base metal layer has a top surface. The base metal layer has a porous plug and the bottom surface of the dielectric layer has a portion that is in contact with the porous plug.

The invention relates to the technical field of radio frequency generator circuits, and provides a phase-locking frequency-stabilizing multi-core control radio frequency system, which processes I / Q signals and constructs a multi-core task allocation and cooperation mechanism through a digital baseband processing module, and performs pre-distortion processing and system scheduling. The double-closed-loop control module is used for stabilizing fundamental frequency, correcting temperature drift and compensating and adjusting frequency swing amplitude; the hybrid power amplification module is used for performing multi-stage hybrid power amplification signal processing and temperature monitoring through a driving stage and output stage combined topology; and the feedback sampling network module collects output signals in real time through a directional coupler and feeds back, adjusts and precisely controls the frequency stability according to the output signals.

The invention provides an intelligent vein closing system and a control method thereof, and belongs to the technical field of medical instruments.The intelligent vein closing system comprises a radio frequency generator host and a closing catheter, and the radio frequency generator host is used for generating and controlling output of radio frequency energy; the closed catheter comprises a handle, a catheter body and a heating working end which are connected in sequence, and the handle is detachably connected with the radio frequency generator host; wherein an infusion pump is integrated on the radio frequency generator host, and the infusion pump is used for infusing swelling liquid to a surgical site and is controlled by a control unit in the radio frequency generator host; a pressure sensor array is arranged outside the heating working end of the closed catheter and used for detecting the attaching pressure between the heating working end and the blood vessel wall in real time. The device is high in integration, and vein closing effectiveness, stability and treatment consistency are improved.

A system for monitoring glucose concentration that includes a sample holder configured to contain a sample and a radio frequency transmitter configured to emit microwave radiation through the sample. The radio frequency transmitter comprising a radio frequency generator and a first antenna. The radio frequency receiver is configured to receive microwave radiation transmitted from the radio frequency transmitter and passed through the sample, and convert the microwave radiation passed through the sample to an analog signal. The radio frequency receiver comprising a second antenna. The system also includes an analog readout circuit configured to receive the analog signal and process the analog signal into a modified analog signal, and a digital signal processing circuit configured to receive the modified analog signal, convert the modified analog signal into a digital signal, and determine the glucose concentration of the sample from the digital signal.

Methods, systems, and media for feedback control systems for impedance matching are described. A computer program product for an impedance matching and power distribution network is disclosed. The computer program product may comprise computer-executable instructions which may cause obtaining, at a present time, present values of variable reactances associated with a station of a process chamber, wherein the variable reactances are associated with a first feedback control system for performing impedance matching for the process chamber, and wherein frequency tuning is being performed on an RF generator of the process chamber in association with a second feedback control system for performing impedance matching for the process chamber. The instructions may cause determining updated values of the variable reactances for the station to be utilized in connection with the first feedback control system based at least in part on an error associated with the second feedback control system.

Embodiments of the present disclosure provide a system for fast impedance tuning. The system includes a radio frequency (RF) generator to generate power, a plasma chamber to receive the power from the RF generator and a RF matching network inserted between the RF generator and the plasma chamber configured to match a plasma load impedance to a RF generator impedance using a solid state based variable capacitor. The RF matching network includes a bias circuit that applies a reverse bias to the solid state based variable capacitor to control a capacitance value of the solid state based variable capacitor. The plasma load impedance is matched with the RF generator impedance when pulsed voltage, multi-level pulsing, or RF match ignition tuning is applied.

A radio-frequency generator, including a power amplifier module including a power amplifier, a pickup module connected to an output of the power amplifier to generate a pickup signal, and an output configured to be connected to the respective output of the amplifier and configured to output a radio-frequency output signal. The radio-frequency generator includes a measurement module configured to receive the pickup signal and to generate a measurement signal based on the one pickup signal; and a radio-frequency signal generation module configured to generate two or more carrier signals of different frequency, and to provide a drive signal as input to the power amplifier module, and a regulation module configured to receive the measurement signal, and to regulate the power of the radio-frequency output signal based on the measurement signal.

Some embodiments are directed to a method of processing a substrate in a plasma processing system. The method generally includes tuning a first capacitor and a second capacitor of a tuning circuit to match a first impedance corresponding to a first stage of a waveform, while a frequency of a radio frequency (RF) generator is preset to a first frequency; tuning a third capacitor of the tuning circuit and the frequency of the RF generator to match a second impedance corresponding to a second stage of the waveform, wherein the frequency of the RF generator is tuned to a second frequency; recording setting values of the first frequency and the second frequency that match different impedances at different stages of the waveform; and switching between the first frequency and the second frequency to match the different impedances at the different stages of the waveform.

The invention discloses a structure for improving plasma stability. The structure comprises a radio frequency generator, a matcher, a discharge adjusting resistor and a plasma load structure. The output end of the radio frequency generator is connected with the input end of the matcher, the output end of the matcher is connected with the first end of the discharge adjusting resistor, and the second end of the discharge adjusting resistor is connected with the plasma load structure. The discharge adjusting resistor is used for providing a discharge adjusting voltage in direct proportion to a discharge current when the discharge current is generated in the plasma load structure, so that the discharge voltage on the plasma load structure is reduced, and the plasma stability is improved. The invention further discloses a method for improving plasma stability. According to the invention, the discharge voltage of the plasma can be controlled, so that the plasma discharge is stable, the arc generation probability is reduced, and the product process and the productivity can be improved.

A surgical hub is for use with a surgical instrument configured to deliver therapeutic energy to tissue at a surgical site of a surgical procedure. The surgical hub comprises: a hub enclosure, comprising a docking station including a docking port comprising data and power contacts; and a combo generator module removably retainable in the docking station. The combo generator module comprises: an ultrasonic energy generator component; a radio frequency (RF) energy generator component; a smoke evacuation component; and a connection port. At least one of the ultrasonic energy generator component and the radio frequency (RF) generator component are couplable to the surgical instrument through the connection port. The combo generator module further comprises at least one smoke evacuation component, configured to evacuate smoke generated by an application of therapeutic energy to the tissue by the surgical instrument.

Various systems, devices, and methods for tissue penetration are disclosed. The system includes an ablation element that penetrates tissue and a radiofrequency generator that delivers energy to the ablation element. The radiofrequency generator may have two modes: a cutting or insertion mode and an ablation or coagulation mode. The cutting or insertion mode is used to cut or penetrate tissue by providing a voltage or power modulation for cutting or softening tissue contacted by the ablation element. The ablation or coagulation mode is used to ablate or coagulate tissue.

The utility model discloses Chinese herbal medicine processing equipment which comprises a controller, a rack and a material conveying mechanism capable of conveying Chinese herbal medicine, the head end of the material conveying mechanism is provided with a material receiving part, and the tail end of the material conveying mechanism is provided with a material taking part; the rack is arranged between the material receiving part and the material taking part in the conveying direction of the Chinese herbal medicine materials, the material conveying mechanism penetrates through the rack, and a high-temperature treatment cavity and a low-temperature cooling cavity are sequentially formed in the rack in the conveying direction of the Chinese herbal medicine materials; a radio frequency generator is arranged in the high-temperature treatment cavity, a cooling device is arranged in the low-temperature cooling cavity, and real-time monitoring devices in communication connection with the controller are arranged in the high-temperature treatment cavity and the low-temperature cooling cavity respectively. The Chinese herbal medicine treatment equipment can safely and efficiently realize mildew-proof and insect-killing treatment on Chinese herbal medicines.

The present invention relates to a treatment apparatus and a method of controlling the same. There are provided a treatment apparatus, including a handpiece, an RF generator generating RF energy, an insertion unit configured to advance and retract toward one direction of the handpiece, selectively inserted into a tissue, and electrically connected to the RF generator to transfer the RF energy to the inside of the tissue, and a substance storage unit receiving a therapeutic substance therein and detachably installed on one side of the handpiece to transfer the substance to the inside of the tissue by the advancing operation of the insertion unit and a method of controlling the same.

Systems and methods for multi-level pulsing are described. The systems and methods include generating four or more states. During each of the four or more states, a radio frequency (RF) generator generates an RF signal. The RF signal has four or more power levels, and each of the four or more power levels corresponds to the four or more states. The multi-level pulsing facilitates a finer control in processing a substrate.

The invention provides a gain control method, a storage medium and a radio frequency generator, and the method is applied to the technical field of radio frequency, and comprises the steps: determining a target analog gain control parameter and a target digital gain control parameter according to a target power proportion in a radio frequency output instruction when the radio frequency output instruction is received; and performing digital domain gain modulation based on the target digital gain control parameter and a radio frequency signal parameter in the radio frequency output instruction to obtain a digital radio frequency waveform, converting the digital radio frequency waveform into an analog radio frequency waveform, and performing analog domain gain modulation on the analog radio frequency waveform based on the target analog gain control parameter to obtain a target radio frequency signal.

Embodiments of the present disclosure provide a system for fast impedance tuning. The system includes a radio frequency (RF) generator to generate power, a plasma chamber to receive the power from the RF generator and a RF matching network inserted between the RF generator and the plasma chamber configured to match a plasma load impedance to a RF generator impedance using a solid state based variable capacitor. The RF matching network includes a bias circuit that applies a reverse bias to the solid state based variable capacitor to control a capacitance value of the solid state based variable capacitor. The plasma load impedance is matched with the RF generator impedance when pulsed voltage, multi-level pulsing, or RF match ignition tuning is applied.

An electrosurgical unit configured to regulate a RF input signal applied to an electrosurgical device, the electrosurgical unit including a PWM circuit to produce a DC voltage responsive to a control signal; an RF waveform generator configured to generate an RF waveform based at least in part on the DC voltage; a transformer configured to transform the RF waveform to the RF input signal in a forward direction across the isolation barrier and transform a leakage current to a feedback current in a reverse direction across the isolation barrier; and a control circuit configured to generate the control signal based at least in part on the first input signal and the second input signal, the control signal controlling a pulse width modulation of the PWM circuit to produce the RF input signal.

The skin treatment device of the present invention comprises: a radio frequency (RF) generator for generating RF energy; an electrode for transmitting the RF energy to a skin tissue of a user; a measurement unit for measuring a forward RF voltage caused by the RF energy and a reverse RF voltage caused by the RF energy reflected to the RF generator; and a controller for calculating a skin impedance and an RF energy efficiency of the user based on the measured forward RF voltage and the reverse RF voltage, and controlling an output of the RF generator based on the calculated skin impedance and the RF energy efficiency.

A radiofrequency, RF, generator, in particular for a plasma application, including at least one cooling element having an upper surface and a lower surface; at least one DC power supply; at least one power stage to amplify an RF signal and connected to the upper surface of the at least one cooling element, wherein the power stage include one or more power amplifiers; a driver to supply the power amplifier of the at least one power stage and connected to the upper surface of the at least one cooling element; wherein the at least one DC power supply is connected by a busbar with the power amplifier and the driver, wherein a DC voltage Vbusbar is supplied to the power amplifier and the driver via the busbar; and wherein the busbar comprises a damping network including a plurality of capacitors connected between ground and the busbar and configured to shape transients on Vbusbar.

Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.

The invention discloses a radio frequency generator, semiconductor processing equipment and a use method, and the radio frequency generator comprises a capacitor; the positive electrode of the high-voltage power supply is connected with the first polar plate of the capacitor, and the negative electrode of the high-voltage power supply is connected with the second polar plate of the capacitor; after the capacitor is charged, a direct-current voltage signal is output, and the voltage value of the direct-current voltage signal is greater than 1KV; the anode of the first switch is connected with the load, and the cathode is connected with the second pole plate; the first switch is switched off and switched on at a preset frequency so as to convert the direct-current voltage signal into a first high-frequency high-voltage pulse signal and apply the first high-frequency high-voltage pulse signal to a load; the preset frequency is not less than 400KHZ, and the rated voltage of the first switch is greater than 1KV; the positive electrode of the first diode is connected with a connecting line of the first switch and the load, and the negative electrode is connected with the first potential contact; the first diode is used for releasing a first reverse voltage generated on the connecting line when the first switch is switched off.

Surgical equipment including controllers, RF generators, and surgical devices for use with ablating tissue. More specifically, surgical equipment that includes a plurality of segmented electrode pairs operatively coupled to a controller, where the controller is configured to determine, based upon impedance calculations, for each of the segmented electrode pairs whether to power the segmented electrode pairs individually or power at least some of the segmented electrode pairs as a group.

1. The name of this design product: Radiofrequency trocar. 2. Purpose of the product with this design: Connect to a temperature-controlled radio frequency generator to perform radio frequency coagulation or stimulation on the patient's analgesic area through high-frequency current, loosen compressed nerve tissue and block the transmission of pain signals, so as to achieve the purpose of treating or relieving the patient's pain. 3. The key point of the design of this product lies in its shape. 4. The picture or photo that best illustrates the design points: Stereoscopic drawing 2. 5. As can be seen from the stereograms 1 and 2, the right view and bottom view are omitted.

The invention discloses an impedance matching network, an impedance matching control system and an impedance matching method. An impedance matching network for a plasma process is described. The impedance matching network includes an input port connectable to the radio frequency generator module. The impedance matching network includes an output port connectable to a load. The impedance matching network includes a transmission circuit, wherein the transmission circuit connects the output port to the input port. The transmission circuit includes a first transmission line and a second transmission line, where the first transmission line is electrically connected to the input port, and where the second transmission line is electrically connected to the output port. The impedance matching network includes a first impedance matching module, wherein the first impedance matching module is configured to connect at least one reactance to the transmission circuit. The impedance matching network comprises a coupling element through which the first transmission line and the second transmission line are coupled to each other, and wherein the coupling element provides an inductive coupling between the first transmission line and the second transmission line.

The present disclosure relates to a plasma generation system, particularly applicable to a system for semiconductor processing using plasma. The plasma generation system according to the present disclosure includes an arc suppression device coupled to an RF generator. The arc device includes a switch that is engaged based on a trigger signal. Additionally, the arc device includes a power dissipator that is engaged by the set of switches to dissipate stored and delivered energy when the set of switches is engaged. The arc suppression device further includes an impedance transformer coupled to the power dissipator to perform impedance transformation, which reduces the reflection coefficient at the input end of the device when the switch is engaged with the power dissipator. The plasma generation system also includes a matching network coupled to the radio frequency generator and a plasma chamber coupled to the matching network.

A plasma processing apparatus includes: a plasma processing chamber; a substrate support disposed in the plasma processing chamber; a source RF generator coupled to the plasma processing chamber, and configured to generate a pulse source RF signal including a plurality of source cycles; and a bias RF generator coupled to the substrate support, and configured to generate a pulse bias RF signal. A transition timing to the bias operating state in each bias cycle is delayed with respect to a transition timing to the source operating state in a corresponding source cycle, the source non-operating period overlaps with the bias non-operating period, and the bias operating period in each bias cycle overlaps with the source operating period in the next source cycle.

The utility model discloses a radio frequency generator, and relates to the technical field of radio frequency. Comprising a generator shell, a front baffle is installed on one side of the generator shell, a rear cover plate is fixedly connected to the side, opposite to the front baffle, of the generator shell, a water cooling plate is jointly and fixedly connected between the front baffle and the rear cover plate, and two symmetrically-distributed water connectors are arranged on the surface of the rear cover plate. As the basis of a direct current part and a radio frequency part of the radio frequency generator, the water-cooling pipe is arranged in the water-cooling plate and is communicated with the outside through the water joints, and cooling water is injected into the water-cooling plate through one water joint in the operation process of the radio frequency generator, so that the water-cooling plate is cooled. And the cooling water absorbing heat flows out from the other water joint, so that the working environment in the radio frequency generator is kept at a relatively stable working temperature, and the service life of precise components in the radio frequency generator is prolonged.

An impedance matching network for plasma processes includes an input port being connectable to a radio frequency (RF) generator circuit, an output port being connectable to a load, and a transmission circuit. The transmission circuit connects the output port to the input port. The transmission circuit includes a first transmission line and a second transmission line, wherein the first transmission line is electrically connected to the input port, and wherein the second transmission line is electrically connected to the output port. The impedance matching network further includes a first impedance matching circuit configured to connect at least one reactance to the transmission circuit. The impedance matching network further includes a coupling element, wherein the first transmission line and the second transmission line are coupled to each other by the coupling element, and wherein the coupling element provides an inductive coupling between the first transmission line and the second transmission line.

A method and apparatus for processing a substrate are provided. For example, a matching network comprises a first sensor operably connected to the input of the matching network and an RF generator capable of operating at a first frequency, and a second sensor operably connected to the output of the matching network and a plasma processing chamber. The first and second sensors are configured to measure impedance during the pulse-on time of the RF generator. A variable capacitor is connected to the first and second sensors. A controller is configured to adjust at least one variable capacitor of the matching network during the pulse-on time of the RF generator based on an impedance value measured during at least one of the pulse-on or pulse-off states of a pulse voltage waveform generator connected to the matching network, or an RF signal from another RF generator capable of operating at a second frequency different from the first frequency.