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4492 results about "Recipe" patented technology

A recipe is a set of instructions that describes how to prepare or make something, especially a dish of prepared food. The term recipe is also used in medicine or in information technology (e.g., user acceptance). A doctor will usually begin a prescription with recipe, Latin for take, usually abbreviated as Rx or the equivalent symbol (℞).

System and method for automated dietary planning

A novel system and methodology for dietary and medical treatment planning wherein meals and treatment plans are specifically individualized for a user according to a number of unique characteristics associated with that user. These characteristics are provided to the system of the present invention and one or more resulting meal plans and/or therapies are generated. According to the present invention, particular dieter specific characteristics that may be considered in developing the meal plan include daily caloric limitations and or recommendations, daily nutritional requirements including minimum and maximum vitamin, mineral, water, and electrolyte intake as well as specific genetic characteristics concerning the individual. Dieter food preferences and other factors may also be considered. The system of the present invention uses this dieter specific information to generate one or more meal plans for that dieter in connection with an ingredient, food, supplement, drug and recipe database containing a universe of foods, supplements, and drugs available for generating meals and treatment plans in accordance with the diet. The system of the present invention may function as a standalone application or it may be web-based wherein users may access the application on a server accessible through the internet or some other public or private network.
Owner:MOSHER MICHELE L

Preparation and characterization of formulations in a high throughput mode

The invention is an automated robotic system for the production and testing of formulations at a very high throughput. It is an integrated system of hardware and software capable of preparing and evaluating hundreds of emulsions per day. The system can formulate aqueous solutions (SL), oil in water emulsions (EW), suspo-emulsions (SE), micro capsule suspensions (CS), micro-emulsions (ME), and suspension concentrates (SC) at the 1 ml to 25 ml scale. The system can process emulsions rapidly in an automated way and enable very flexible formulation recipes to be introduced. The system allows chemists to generate experimental samples of varying recipe and method to be conducted in parallel with projected throughput of up to 1200 formulations processed and characterized per day. Materials and consumables can be distributed from storage storage systems to the work stations where dispensing of ingredients in various states can be performed, including solids, liquids, gels, pastes, suspensions and waxes. The emulsions formed can be characterized using methods including phase diagnosis, turbidity analysis, viscosity and particle sizing using automated test equipment. An integrated module can also perform Tank Mix Compatibility testing in high throughput mode. The modular system allows future processes and tests to be added, either to a station, or as a new station. The software capability includes tracking of processes from start to finish and the integration of analytical data with the as-designed and as-formulated experimental results.
Owner:SYNGENTA LTD

Method and apparatus for controlling photolithography overlay registration

A method for controlling a photolithography process includes providing a wafer having a first grating structure and a second grating structure overlying the first grating structure; illuminating at least a portion of the first and second grating structures with a light source; measuring light reflected from the illuminated portion of the first and second grating structures to generate a reflection profile; determining an overlay error between the first and second grating structures based on the reflection profile; and determining at least one parameter of an operating recipe for a photolithography stepper based on the determined overlay error. A processing line includes a photolithography stepper, a first metrology tool, and a controller. The photolithography stepper is adapted to process wafers in accordance with an operating recipe. The first metrology tool is adapted to receive a wafer having a first grating structure and a second grating structure overlying the first grating structure. The metrology tool includes a light source, a detector, and a data processing unit. The light source is adapted to illuminate at least a portion of the first and second grating structures. The detector is adapted to measure light reflected from the illuminated portion of the first and second grating structures to generate a reflection profile. The data processing unit is adapted to determine an overlay error between the first and second grating structures based on the reflection profile. The controller is adapted to determine at least one parameter of the operating recipe of the photolithography stepper based on the determined overlay error.
Owner:FULLBRITE CAPITAL PARTNERS
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