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62 results about "Plasma beam" patented technology

Numerical control cutting equipment for heat exchanger tube nest and high-precision cutting method of numerical control cutting equipment

The invention relates to the technical field of cutting equipment, and provides heat exchanger tube nest numerical control cutting equipment and a high-precision cutting method.The heat exchanger tube nest numerical control cutting equipment comprises a base, a first supporting plate, a second supporting plate and a third supporting plate are arranged on the base in the length direction of the base, and the first supporting plate is slidably connected to the base; the second supporting plate and the third supporting plate are both fixed to the base. According to the vertical cutting device, a second rotating disc is accurately controlled to rotate through a third driving mechanism, the second rotating disc rotates to drive a stop lever to move in a limiting groove, a support is pushed to rotate with a third hinged shaft as the center, and the spraying direction of a plasma spraying gun is tangent to the tube wall of the tube nest; when plasma is cut, a reflecting surface is formed on the inner wall of the other side, so that plasma hedging is caused, the plasma beam is jetted in the tangential direction through tangent angle cutting, the hedging phenomenon is avoided, the cutting gap is controlled, and the cutting precision is improved compared with a traditional mode.
Owner:HUBEI YOUCHENG THERMAL EQUIP CO LTD

Cascade sheet of annular pseudo three-dimensional topological optimization micro-channel

The invention discloses a cascade sheet of an annular pseudo three-dimensional topological optimization micro-channel, which relates to the technical field of fusion reactors and comprises a cover plate, a heat-resistant ring, a heat sink assembly and a water inlet and outlet assembly. When the cascade piece works, a high-density plasma beam passes through a plasma discharge channel in the middle of the heat-resistant ring, and the heat-resistant ring can restrain the plasma beam and maintain the stability of an electric arc; meanwhile, after entering the heat sink assembly through the water inlet pipe, a cooling medium is shunted to the manifold shunting ring through the water isolation ring, then enters the water inlet area and a water inlet channel in the water inlet area, then enters the topological optimization micro-channel through the micro-channel water inlet flow channel for enhanced heat exchange, then is converged into the water outlet channel through the micro-channel water outlet flow channel, and flows out of the water outlet pipe; a large amount of thermal load deposited on the inner wall of the plasma discharge channel is taken away. The heat dissipation effect of the cascading sheet is remarkably improved, and the rapid and efficient cooling requirement of the cascading sheet in a high heat load scene can be met.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES +1

Room temperature vacuum pressure bonding device

The utility model relates to a room temperature vacuum pressure bonding device which comprises a vacuum cavity, the wall surface of the vacuum cavity is respectively provided with a first through hole and a second through hole, the first through hole is connected with a plasma generating assembly, the second through hole is connected with a vacuum generating assembly, and the vacuum generating assembly vacuumizes the interior of the vacuum cavity. Activating the wafer in the vacuum cavity through a plasma generation assembly; an air cylinder is fixed to the outer top wall face of the vacuum cavity, an output guide rod of the air cylinder extends into the vacuum cavity and is connected with the bonding pressing head, an operation table is fixed to the inner bottom wall face of the vacuum cavity, and an operation arm mechanism is installed in the vacuum cavity in a matched mode. By arranging the plasma generating assembly, the plasma beam can be emitted into the vacuum cavity, so that plasma bombardment activation is carried out on the wafer, the wafer can be bonded at the room temperature without heating the wafer, energy consumption is reduced, production time is greatly shortened, and production efficiency is effectively improved.
Owner:SUZHOU MEMSTOOLS SEMICON TECH CO LTD

Pole piece processing device and method, pole piece, battery monomer, secondary battery and power utilization device

The embodiment of the invention provides a pole piece processing device and method, a pole piece, a battery monomer, a secondary battery and an electric device, in the pole piece processing device, the pole piece comprises a current collector and a film layer arranged on the surface of at least one side of the current collector, and the device comprises a plasma heating module used for applying a plasma beam to the film layer, the power P of the plasma heating module is greater than or equal to 1kW and less than or equal to 25kW; and the conveying module is used for conveying the rolled pole piece to the plasma heating module along the feeding direction. The treatment device can improve the wettability of the pole piece and reduce the expansion rate of the pole piece.
Owner:CONTEMPORARY AMPEREX TECHNOLOGY CO LTD

Plasma beam injection system in chromium plating machine

The invention relates to the technical field of plasma injection, and discloses a plasma beam injection system in a chromium plating machine, which comprises an electroplating bin, a bin door matched with the electroplating bin is arranged on one side of the surface of the electroplating bin, and a workpiece clamping mechanism is arranged in the electroplating bin and is used for clamping and fixing a workpiece and driving the workpiece to rotate while revolving. Plasma beam emitting mechanisms are arranged on the two sides of the inner wall of the electroplating bin and used for emitting plasma beams. According to the plasma spraying device, the plasma beam can cover the surface of the workpiece without dead angles, the problems of spraying leakage and stacked spraying caused by single movement are effectively avoided, a bidirectional spraying pattern can be formed, the coating uniformity and the coating bonding strength are improved, and therefore the spraying requirement of the workpiece can be better met.
Owner:ZHANGJIAGANG MEIAN METAL PROD TECH CO LTD

Soil drill processing equipment

A soil sampling drill machining device comprises a main protection gas nozzle and a lower protection gas nozzle, the bottom of the main protection gas nozzle is connected with the lower protection gas nozzle, a plasma beam generation mechanism is arranged in the main protection gas nozzle and comprises a main plasma beam generation device and an auxiliary cooling device, the main plasma beam generation device is located in the main protection gas nozzle, and the auxiliary cooling device is located in the main protection gas nozzle. The main plasma beam generating device sprays high-speed ion beams to the welding connector to complete welding operation, an auxiliary cooling device is arranged on the side face of the main plasma beam generating device and cools the main plasma beam generating device, and an auxiliary air spraying mechanism is arranged on the side face of the main protection air nozzle and cools the main plasma beam generating device. And the auxiliary air injection mechanism conducts auxiliary cleaning and cooling operation on the welding seam, and a tungsten electrode adjusting mechanism is arranged at the top of the main protection air nozzle and adjusts the plasma arc generation position.
Owner:HEILONGJIANG ACAD OF AGRI SCI

Heat conditioning through deflection / reflection / absorption of electromagnetic waves

ActiveUS12621921B2Artificial satellitesMachines/enginesSolar lightAbsorption (electromagnetic radiation)
A system for heat conditioning an area of Earth includes an Earth-orbiting satellite. The satellite includes a power supply, a precursor gas supply, and one or more double helicon plasma beam generators coupled to the power supply and the gas supply and configured to generate a plasma and further configured with a magnetic nozzle to maintain a shape of the beam; therefore, the top surface area of the beam is maximized. The generated plasma provides enhanced electromagnetic waves absorption, reflection, and deflection of incoming solar light and electromagnetic radiation, thereby reducing the heat striking the area of the Earth.
Owner:KADDOURA ALI

An insulating surface electrospray printing device and method based on real-time plasma treatment

The present application belongs to the technical field of curved surface electronic Wiener manufacturing, and discloses an insulating surface electroblotting device and method based on real-time plasma processing, which comprises an electroblotting assembly and a plasma assembly, wherein the electroblotting assembly and the plasma assembly work synchronously; the electroblotting assembly is used for conveying ink to a nozzle to form a jetting jet; the plasma assembly is used for processing an insulating surface by adopting a ring-shaped plasma beam to inject a polarized group into the insulating surface, and the polarized group generates a negative polarity charge under the action of an electroblotting electric field, and at the same time, residual charges of ink liquid and polarized charges of the insulating surface are neutralized to realize stable jetting and deposition of ink jets / drops on the insulating surface. The present application solves the printing and forming problem of a complex microstructure of an insulating substrate.
Owner:HUAZHONG UNIV OF SCI & TECH

Pole piece processing device and control system and control method thereof

The embodiment of the invention provides a pole piece processing device and a control system and method thereof. The processing device comprises a plasma heater, and the plasma heater is used for applying plasma beams to the surface of a pole piece; the control system comprises a measuring module used for measuring environment information of the processing device; and the control module is used for adjusting working parameters of the processing device according to the environment information. The control system provided by the invention can enable the processing device to perform plasma processing on the pole piece more flexibly and accurately, helps to improve the quality of the pole piece, and is beneficial to improve the electrochemical performance of the battery.
Owner:CONTEMPORARY AMPEREX TECHNOLOGY CO LTD

A method of offline analysis of powder ionization conditions

This application discloses a method for offline analysis of powder ionization conditions, comprising the following steps: placing a silicon wafer on a target plate of a plasma device; generating a plasma beam under preset powder ionization conditions using the plasma device; injecting powder into the plasma device so that the plasma beam bombards the powder until powder injection is complete; detecting whether a first condition and a second condition are met, wherein the first condition includes at least 70% of the powder injected into the plasma device ablation and brightening upon bombardment by the plasma beam and / or forming a coating on the silicon wafer; the second condition includes the coating containing chemical bonds formed by elements of the powder and / or detecting spectral lines generated by ionization of the powder upon bombardment by the plasma beam. If the first and second conditions are met, the powder is determined to be effectively ionized. Otherwise, the powder is determined to be ineffectively ionized. The method of this application can obtain basic research data on the boronization of boron powder.
Owner:BEIJING XINAO FUSION ENERGY TECHNOLOGY CO LTD

A Mass Spectrometry Ionization Method Based on Tesla Coil Principle

This invention discloses a mass spectrometry ionization method based on the Tesla coil principle. It utilizes a Tesla coil to generate a micro-plasma beam, which serves as the ion source. Liquid samples are desorbed and introduced into the micro-plasma beam region for ionization, or gas samples are directly introduced into the micro-plasma beam region for ionization. This invention, by creatively using a Tesla coil-generated micro-plasma beam as the ion source, not only achieves strong ionization capability and good ionization effect on volatile gas samples and low-polarity or non-polar liquid samples, but also requires sample volumes as low as picoliters to microliters, exhibits good solvent compatibility and strong salt resistance, and further possesses advantages such as simple operation, low cost, ease of implementation, and broad applicability.
Owner:SHANGHAI INST OF ORGANIC CHEM CHINESE ACAD OF SCI

Plasma cleaning of a substrate

The utility model discloses a kind of plasma cleaning plate, including bottom plate, bottom plate is provided with cathode, the surface of bottom plate is opened with at least one cathode groove, cathode groove is U shape, by the cathode groove design is U-shaped curved surface, the contact area of cathode and anode is significantly increased 30%-50%, current density distribution is optimized, make ionization area more concentrated and uniform, greatly improve the energy density of plasma arc and atmosphere dissociation degree, and, plasma can be maintained in lower temperature state in generation and effect process, unnecessary heat loss is reduced, to realize the effect of energy saving, at least one row of array distribution's plasma cleaning hole is equipped in cathode groove, and staggered distribution design is adopted, so that plasma beam is ejected at different angles and positions, form interlaced covering jet field, not only significantly improve cleaning efficiency, make cleaning process more efficient, can also ensure that cleaning has no dead angle, more comprehensive.
Owner:DONGGUAN CHANGAN ZHUNLIANG ELECTRONIC EQUIPMENT FACTORY

Burner heads and electric flame stoves that can automatically switch between long and short arcs

This invention discloses a burner head and electric flame stove capable of automatically switching between long and short arcs, including a burner head top shell, a burner head bottom shell, a cathode nozzle, a ceramic tube, an anode needle, an adjustable speed air intake device, and a circuit board. The inner wall of the cathode nozzle adopts a multi-segment conical surface superposition structure, which can disperse the radial tension of the electric field, making the electric field lines more concentrated in the axial direction and effectively forming a rigid plasma beam; the bottom of the multi-segment conical surface provides a smooth transition channel for airflow and suppresses shock wave generation; the bottom of the anode needle is provided with a funnel-shaped mounting groove, and the spring guide needle elastically abuts against the mounting groove. The funnel-shaped structure has an automatic centering function, which can achieve reliable contact between the spring guide needle and the anode needle without precise calibration, ensuring the stability of the electrical connection. For high-power electric flame stoves with hundreds of electrode needles, this structure can greatly simplify the installation process, improve installation efficiency, and reduce the installation failure rate.
Owner:YINENG ELECTRIC FLAME TECH (SHENZHEN) CO LTD

Method for preparing nano-aluminum lithium material and adsorbent by laminar plasma beam

This invention discloses a method for preparing nano-aluminum-based lithium materials and adsorbents using laminar plasma beams, belonging to the field of lithium-ion adsorption technology. This invention provides a simple, relatively mild, and highly repeatable method for preparing nano-aluminum-based lithium materials and adsorbents using plasma beams. In this invention, aluminum hydroxide and lithium chloride are mixed in a molar ratio of 2:1 to 1.3, and then evaporated and condensed by a plasma beam in a sealed space protected by an inert gas to obtain nano-aluminum-based lithium materials. These materials are then granulated with resin to obtain the adsorbent. This invention uses the controllable laminar arc heat generated by the plasma beam as a heat source, achieving physical high-temperature vaporization and simultaneous rapid condensation to form Al(OH)₂. 3 The nanomaterials with uniformly distributed LiCl molecules maximize the specific surface area of ​​the aluminum-based lithium adsorbent, resulting in superior adsorption capacity. This invention is produced in a fully enclosed manner under normal pressure, offering advantages such as safety, zero emissions, energy saving, environmental protection, short process, and continuous, efficient, and stable preparation.
Owner:NANCHONG SOUTHWEST PETROLEUM UNIV DESIGN & RES INST CO LTD

Temperature control method and system for plasma generator

The invention relates to the technical field of plasma generator temperature control, and discloses a temperature control method and system for a plasma generator, parallel and adjacent copper wires are divided into a plurality of wire clusters according to an adjustable interval, a heat conduction distance calculation strategy is executed, a plasma beam is used for irradiating a single copper wire, and a heat conduction distance calculation strategy is executed. Calculating the heat conduction distance of the copper wire based on a set temperature threshold value; executing a routing segmentation rectangular cleaning strategy, designing a rectangular area of the plasma beam according to a routing track, dividing a rectangular irradiation area on the routing track, and controlling a moving mode of the plasma beam; executing a component bypassing irradiation strategy, selecting an entrance point and an exit point on the boundary of the rectangular irradiation area, constructing a path diagram according to the electronic components, and calculating an optimal path; and executing a cross wiring cluster irradiation strategy, planning a component gap irradiated by the two plasma beams according to the direction of the wiring cluster, controlling heat transfer, and avoiding generation of a local overheating or supercooling phenomenon of the circuit board.
Owner:江苏神州半导体科技股份有限公司

New energy relay shell and additive mixing manufacturing method thereof

The invention relates to the technical field of new energy automobile accessories, in particular to a new energy relay shell and an additive mixing manufacturing method thereof. Performing array printing on the outer surface of the functional skeleton to generate a preset directional deformation assembly, and performing integrated printing in the functional skeleton to generate a three-dimensional variable cross-section arc extinguishing flow channel; scanning and activating the surface of the functional skeleton by adopting a plasma beam, and then depositing a silane coupling agent layer; putting the functional framework into an injection mold, and injecting a thermoplastic engineering plastic melt into the mold; the pressure of the mold cavity is maintained until the temperature of the injection molding layer is reduced to be lower than the crystallization temperature, the deformed preset directional deformation assembly is fastened through the volume shrinkage rate of the injection molding layer, the thin plate is induced to be directionally bent through the heat flow deformation technology, and dynamic mechanical counterforce balance is formed through the rebound potential energy of the thin plate and the shrinkage force of the injection molding layer. And the IP67 protection requirement of the high-voltage relay of the new energy automobile is met.
Owner:JIAXING DONGXIN MOULD TECH CO LTD

A method for depositing tantalum carbide composite coatings

The present invention discloses a method for depositing a tantalum carbide composite coating, comprising five steps: S1: generating a powder composition signal; S2: based on the powder composition signal, pre-depositing a tantalum carbide transition layer on the substrate surface and curing it through heat treatment to form a transition layer interface signal; S3: based on the transition layer interface signal, activating a three-layer combined atmosphere protection system comprising overall cavity atmosphere protection, flame annular gas curtain protection, and substrate back cooling protection, generating an oxygen concentration monitoring signal and a protective gas flow control signal, and simultaneously generating a coating thickness signal; S4: based on the coating thickness signal, switching the thermal spraying gun to a low-power plasma beam mode to form a densified coating signal; S5: changing the proportion of carbon powder in the composite powder, repeating steps S3 and S4 at least once, and outputting the final coating signal. The tantalum carbide composite coating deposition method of the present invention can solve the problems of low bonding strength, easy oxidation, and high porosity of existing thermally sprayed tantalum carbide coatings.
Owner:ZHEJIANG LIUFANG CARBON TECH CO LTD

Remote plasma generator power supply voltage scheduling method

The invention relates to the technical field of plasma generator voltage scheduling, and discloses a remote plasma generator power supply voltage scheduling method, which comprises the following steps: executing a heat conduction distance calculation strategy, irradiating a single copper wire by using a plasma beam, and calculating the thermal diffusion length along the copper wire based on the initial temperature of a circuit board; a rectangular grouping irradiation strategy is executed, the rectangular cleaning areas are grouped according to the thermal diffusion length, plasma generators at the two ends are controlled to irradiate at the initial power, and the temperature of each rectangular cleaning area in the group is measured; executing a proportional estimation temperature judgment strategy, irradiating the rectangular cleaning areas by using a plasma beam, and estimating the temperature of each rectangular cleaning area; executing a power scheduling control strategy, remotely scheduling the power supply voltage of the two plasma generators to control the output power, and adjusting the single cleaning duration to complete the cleaning task; and an inter-group switching control strategy is executed, the plasma generator is remotely controlled to irradiate the rectangular cleaning area between different groups, and the process quality and the production efficiency are improved.
Owner:江苏神州半导体科技股份有限公司

A high heat load material irradiation damage test platform of a plasma beam source

PendingCN122631522AMaterials testingCompact toroid
This invention relates to the field of materials testing equipment technology, and more particularly to a high-heat-load material irradiation damage testing platform using a plasma beam source. The technical solution includes a vacuum chamber, a compact ring plasma beam generator, a high-voltage repetition-rate power supply, a vacuum pump assembly, and a target plate positioning mechanism. This invention eliminates assembly errors from separate components through an integrated rigid connection between the compact ring plasma beam generator and the vacuum chamber; allows for stepless adjustment of the target plate using a movable slide rail to adapt to different irradiation distances; and utilizes a high-voltage repetition-rate power supply in conjunction with a three-section coaxial gun structure to generate a plasma beam matching fusion reactor operating conditions. The entire testing process is completed sequentially on the same platform, solving the technical problems of low positioning accuracy, poor operating condition matching, and cumbersome assembly and adjustment in traditional testing platforms. This achieves improved accuracy, efficiency, and operating condition fit for plasma-based material irradiation damage testing.
Owner:INST OF ENERGY HEFEI COMPREHENSIVE NAT SCI CENT (ANHUI ENERGY LAB)

Electrosurgical apparatus with flexible shaft

An electrosurgical apparatus is provided including a connector, a flexible shaft, and a distal tip. The connector may further be coupled to an electrosurgical generator and gas supply. The distal tip of the electrosurgical apparatus may be grasped by a grasping tool, such that the orientation and position of the distal tip relative to the shaft may be manipulated to achieve a plurality of positions. The electrosurgical apparatus provides electrosurgical energy and inert gas to an electrode within the distal tip of the electrosurgical apparatus to generate a plasma beam. In one aspect, the distal tip is configured as a sheath that is extendable and retractable over the electrode to expose the electrode when the sheath is in a first position and conceal or cover the electrode when the sheath is in a second position.
Owner:APYX MEDICAL CORP

Direct-current arc plasma cracking biomass liquid fuel device

The invention relates to the technical field of biomass cracking, and discloses a direct-current arc plasma cracking biomass liquid fuel device which comprises a plasma generator, and the bottom of a reaction cavity is connected with a quenching cavity; the bottom of the reaction cavity is provided with a cracking product outlet communicated with the quenching cavity; a carrier gas conveying assembly is arranged on the upper portion of the outer end face of the plasma generator and used for conveying carrier gas into the plasma generator, a first water cooling assembly is arranged in the middle of the outer end of the plasma generator and used for cooling water circulation, and a magnetic control assembly is arranged on the lower portion of the outer end face of the plasma generator and used for controlling the magnetic field intensity. According to the device, the surrounding type electromagnetic coil is arranged on the periphery of the anode, the plasma beam is restrained by generating an axial or radial magnetic field, the whole plasma area is covered, and the shape and movement of plasma are effectively controlled under the condition that other arc working parameters are not changed; the instability of arc plasma is weakened through the arc stabilizing force of the external magnetic field.
Owner:KUNMING UNIV OF SCI & TECH

Normal-pressure plasma discharge device

The utility model provides a normal-pressure plasma discharge device. The normal-pressure plasma discharge device comprises a device body, an air inlet, an outlet and a dielectric electrode, a columnar containing cavity is formed in the device body, a dielectric electrode is installed in the columnar containing cavity, and a plurality of cooling holes are formed in the dielectric electrode. The gas inlet is formed in one side, close to the process gas input source, of the device body, and the gas inlet is communicated with the columnar accommodating cavity; an outlet is formed in the side, close to the to-be-treated workpiece, of the device body, is formed in the axial direction of the columnar containing cavity in a slit shape and communicates with the columnar containing cavity. According to the device, the plurality of cooling holes are formed in the dielectric electrode, heat generated in the discharging process can be taken away in time, and performance reduction or damage caused by overheating of the electrode is avoided. The outlet is formed in the axial direction of the columnar containing cavity in a slit shape, wide plasma beams can be generated, a larger area can be covered in the working process of the device, and compared with a narrow-beam plasma processing mode, the processing efficiency is remarkably improved.
Owner:OKSUN TECH

Multi-sample plasma irradiation sample table and irradiation sample fixing support thereof

The invention relates to the technical field of plasmas, and discloses a multi-sample plasma irradiation sample table and an irradiation sample fixing bracket thereof. The irradiation sample fixing support comprises a base, an installation assembly, a probe and a cooling assembly, the base is provided with a plurality of installation faces which are sequentially arranged around a rotating axis and connected, and the base can rotate around the rotating axis so that the different installation faces can directly face plasma beams. Therefore, a probe or different samples installed on the base through the first installation assembly or the second installation assembly can directly face the plasma beam, and plasma irradiation is achieved. Multiple samples can be irradiated without repeatedly destroying vacuum, so that the experiment efficiency is improved; meanwhile, plasma parameters of an irradiation area can be measured through the probe, and the experiment accuracy is improved. The multi-sample plasma irradiation sample table comprises a rotating mechanism and an irradiation sample fixing support, and the rotating mechanism drives the base to rotate so that the probe or different samples can directly face plasma beams.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES +1

Plasma ion source device with digital energy-level control and ionization control method

PendingUS20260253855A1Gas phaseMass analyzer
Disclosed are a plasma ion source device with digital energy-level control and an ionization control method. The plasma main module and the sample injector face the plasma beam region, the digital-controlled module is located beside the plasma main module and controls the plasma main module. The method feeds the configured solution or gas sample into the sample injector and then ejects gas-phase substances, the arbitrary waveform generator control panel inputs control waveform to the plasma torch tube to emit plasma to the plasma beam region, and the gas-phase substances collide with electrons / ions in the plasma to form gas-phase ions, which are then detected by a mass spectrometer.
Owner:ZHEJIANG UNIV

Method and system for monitoring sputtering yield of material in real time

The invention discloses a method and system for monitoring the sputtering yield of a material in real time, and belongs to the technical field of interaction of plasmas and materials. The method comprises the following steps: generating and guiding a plasma beam to continuously bombard the surface of a to-be-tested material by using a plasma generating device; collecting characteristic optical emission spectral line intensity data of specific atoms generated by sputtering on the surface of the to-be-detected material in real time; acquiring plasma ion saturation current data for bombarding the surface of the to-be-detected material in real time; based on the characteristic optical emission spectral line intensity data and the photon emission efficiency, the sputtering particle flow density of specific atoms is calculated in real time; calculating the plasma ion flux density in real time based on the plasma ion saturation current data and the effective collection area of the probe; and calculating and outputting the sputtering yield in real time according to the ratio of the sputtering particle flow density to the plasma ion flux density. According to the embodiment of the invention, the sputtering yield generated by the material can be monitored in real time, and the accuracy of the obtained sputtering yield is effectively improved.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES

Aromatic ester compound detection device based on mass spectrum ion source and application

The invention discloses an aromatic ester compound detection device based on a mass spectrum ion source and application. The detection device comprises an electrospray assembly and a low-temperature plasma beam assembly, the front end of a metal capillary in the electrospray assembly extends out of a main pipe of an insulating medium pipe by 4-12 cm, and an outer electrode in the low-temperature plasma beam assembly is 5-13 mm away from an outlet of the main pipe of the insulating medium pipe; an included angle between the low-temperature plasma beam assembly and the horizontal reference plane is 120-160 degrees, and an included angle between the low-temperature plasma beam assembly and the electrospray assembly is 45-90 degrees, so that the electro-liquid drop spray generated by the electrospray assembly is formed under the synergistic effect of the low-temperature plasma beam generated by the low-temperature plasma beam assembly; therefore, the plasma beam can better hit the surface of the sample, and ions can be effectively released from liquid drops. Therefore, the detection device can improve the detection sensitivity of the aromatic ester compounds, can be applied to rapid detection of food, traditional Chinese medicinal materials and Baijiu adulteration, and has the advantages of high automation and low price.
Owner:ZHENGZHOU TOBACCO RES INST OF CNTC

Atmospheric pressure plasma surface treatment device

The invention relates to the technical field of workpiece surface cleaning treatment, in particular to an atmospheric pressure plasma surface treatment device which comprises a first plasma generation mechanism, a second plasma generation mechanism, a third plasma generation mechanism and a conveying belt. The mounting positions of the plasma generation mechanism I, the plasma generation mechanism II and the plasma generation mechanism III are obliquely arranged; the distances between the bottom ends of the first plasma generation mechanism, the second plasma generation mechanism and the third plasma generation mechanism and the top face of the conveying belt are equal. The plasma cleaning device is matched with a conveying belt, so that multiple plasma beams can completely cover the surface of a workpiece to be cleaned, meanwhile, two adjacent plasma beams do not interfere with each other, the whole device can clean the workpiece to be cleaned in a large area, cleaning dead corners can be avoided, and the cleaning efficiency is improved. And it is guaranteed that each position under the large cleaning area has a good cleaning effect.
Owner:GANNAN NORMAL UNIV

Directional controllable growth method of high-purity polycrystalline silicon

The invention discloses a directional controllable growth method of high-purity polycrystalline silicon, which relates to the technical field of material science and engineering, and comprises the following steps: realizing impurity atomic-scale control and non-contact smelting through a four-order synergistic process, performing electromagnetic suspension melting on industrial silicon materials in an inert coating crucible (1420-1450 DEG C, less than or equal to), separating melt from the inner wall of the crucible, and thoroughly blocking an oxygen-carbon pollution source; plasma targeted impurity removal is conducted, specifically, pulse plasma beams (50-200 W / cm, 10-30 min) with the ratio of 4: 1 are adopted for bombarding the surface of the melt, and boron and phosphorus impurities are removed through in-situ gasification; magnetic field coupling directional solidification is conducted, the axial temperature gradient is controlled to be 30-50 DEG C / cm, the solidification rate is controlled to be 0.5-2 cm / h, a transverse alternating magnetic field (0.1-0.5 T, 5-20 Hz) is overlaid to inhibit dendritic crystal deflection, and impurities are driven to be enriched towards the top; and 10-15% of an enrichment layer at the top is cut off, so that a high-purity silicon ingot with oxygen less than or equal to 0.1 ppm, carbon less than or equal to 0.1 ppm and boron phosphorus less than or equal to 0.05 ppb is obtained, and the standard of a 3nm chip substrate is met.
Owner:SUZHOU XINJING ARTIFICIAL INTELLIGENCE TECH RES & DEV CO LTD

Method and system for real-time monitoring of sputter yield of a material

The application discloses a method and system for monitoring sputtering yield of material in real time, and belongs to the technical field of plasma and material interaction. The method comprises the following steps: generating and guiding a plasma beam to continuously bombard the surface of a material to be measured by using a plasma generating device; collecting the intensity data of a characteristic optical emission spectrum line of a specific atom generated by sputtering on the surface of the material to be measured in real time; collecting the saturation current data of plasma ions bombarding the surface of the material to be measured in real time; calculating the sputtering particle flow density of the specific atom in real time based on the intensity data of the characteristic optical emission spectrum line and the photon emission efficiency; calculating the plasma ion flux density in real time based on the saturation current data of the plasma ions and the effective collection area of a probe; and calculating and outputting the sputtering yield in real time according to the ratio of the sputtering particle flow density to the plasma ion flux density. The embodiment of the application can monitor the sputtering yield generated by the material in real time, and effectively improve the accuracy of the obtained sputtering yield.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES

Pole piece cleaning device and pole piece slitting system

The utility model relates to the technical field of battery pole piece processing, and provides a pole piece cleaning device and a pole piece slitting system.The pole piece cleaning device comprises a plasma generator, a laser generator and a first image acquisition device, the plasma generator is used for generating plasma jet flow, the laser generator is connected with the plasma generator, and the first image acquisition device is connected with the laser generator. The laser generator is located on an ejection path of the plasma jet, the plasma jet and a laser beam generated by the laser generator are used for cleaning the surface of the pole piece, and the first image acquisition device is used for acquiring a surface image of the cleaned pole piece. The laser beam can melt the burrs, the melted burrs are more easily removed by the plasma jet, under the mutual cooperation of the laser beam and the plasma beam, the burr removal effect can be improved, the situation that the burrs on the surface of the pole piece are not thoroughly treated is avoided, the risk of short circuit in a battery cell is reduced, and the safety and cycle life of the battery are improved.
Owner:CONTEMPORARY AMPEREX TECHNOLOGY CO LTD