47 results about "Cathodic arc deposition" patented technology

A method for repairing cracks in a metal part comprising the steps of providing a metal part having a crack, cleaning the crack to remove an oxide layer, depositing a repair alloy via at least one of cathodic arc deposition and low pressure plasma spraying to cover the crack, and heating the part at a temperature and pressure sufficient to close the crack.

A recording medium, comprising:(a) a substrate having at least one surface;(b) a stacked plurality of thin film layers on the at least one surface and including at least one magnetic or magneto-optical (MO) recording layer; and(c) a protective overcoat layer on an outer surface of an outermost layer of the layer stack, comprising:(i) a first sub-layer layer (c1) of undoped tetrahedral amorphous carbon (ta-C) formed by filtered cathodic arc deposition (FCAD) on the outer surface of the outermost layer of the stacked plurality of thin film layers and having a high mass density of carbon (C) atoms greater than about 2.5 gms / cm3; and(ii) a second sub-layer (c2) of nitrogen-doped tetrahedral amorphous carbon (ta-C:N) formed by FCAD on the undoped ta-C layer and having a high mass density of carbon (C) atoms greater than about 2.0 gms / cm3.

The present invention provides a coated cutting tool comprising a substrate and a coating, where the coating comprises at least one compound layer deposited by cathodic arc deposition, which has a thickness of 10-30 [mu]m characterized in that the coating has internal stress ranges from low tensile stresses, lower than 0.2GPa, to compressive stresses, lower than 3GPa.

A method for applying a coating by a cathodic is provided. The method includes the steps of: a) providing a cathodic arc coater that includes a power source and utilizes a disk-shaped cathode, the cathode having an evaporative surface extending between a first end surface and a second end surface, wherein the evaporative surface has an area; b) determining a maximum acceptable power density for the evaporative surface; and c) applying a magnitude of electrical current from the power source to the cathode, wherein the electrical current magnitude divided by the area is equal to or less than the maximum acceptable power density for the evaporative surface.

The invention discloses a method for preparing Metal carbide-inlaid Diamond-like Carbon (MC / DLC) films with the thicknesses larger than 30 micrometers, belongs to the field of preparation of hard abrasion-resistant coatings, and particularly relates to a technology for preparing MC / DLC thick films by the aid of magnetic filter plasma deposition processes.MC / DLC thick film structures comprise ion injection pinning layers, metal transition layers and the MC / DLC films.The method has the advantages that the DC / DLC films prepared by the aid of ion injection technologies, magnetic filter technologies and cathodic arc deposition technologies are high in binding force, the arc current intensity, the magnetic field intensity of bent pipes and the gas inflow of gas with carbon are controlled in deposition procedures, accordingly, the thicknesses, the hardness, the rub resistance and the abrasion resistance of the MC / DLC thick films can be optimized, and the high-quality MC / DLC thick films can be prepared by the aid of the method; magnetic filter plasma deposition equipment for implementing the method has proprietary intellectual property rights and is easy to operate, processes are mature, the MC / DC films can be produced on a large scale, and the method is suitable for deposition application to high-hardness abrasion-resistant coatings in all industrial components such as bearings of cutters.

The invention relates to a method for preparing a metal sulfide DLC composite film. The method is characterized by comprising the following steps: firstly using the ultrasonic washing technology to remove the surface contamination layer of a basal body; using the inert gas ion beam generated by an ion source to carry out the ion beam bombardment washing on the surface of the basal body; using themetal ion generated by a cathodic arc source to carry out the metal ion bombardment washing on the surface of the basal body under the high workpiece negative bias condition; using the cathodic arc deposition or ion beam assisted magnetron sputtering technology to prepare a gradient transition layer; using the ion beam deposition on an intermediate layer and magnetron sputtering technology to synthesize a doped DLC film doped with at least one metal element of W, Mo and Fe; and finally obtaining the high-sulfur metal sulfide / DLC composite film by using the ion vulcanization, wherein the ion beam deposition is realized by introducing carbonaceous gas to the ion source, and sulfureous gas is used as the sulfur source.

The invention discloses a method for preparing an aluminum-nitrogen co-doped diamond-like composite film. Two dual-excitation energy source cathode arc coating devices with different characteristics are configured by adopting an ion source-assisted cathode arc deposition technology, one dual-excitation energy source cathode arc coating device adopts a direct-current arc evaporation cathode sourceand is used for installing an aluminum target, and the other dual-excitation energy source cathode arc coating device adopts a pulsed arc evaporation cathode source and is used for installing a graphite target; nitrogen gas is taken as reaction gas in the deposition process, nitrogen gas (N2) is ionized into ionic nitrogen (N<+>) through an ion source, the aluminum target installed on the direct-current arc evaporation cathode source and the graphite target installed on the pulsed arc evaporation cathode source achieve sputtering deposition on the surface of a workpiece by rotating the workpiece, and the component-controllable aluminum-nitrogen co-doped diamond-like composite film is obtained. According to the method for preparing the aluminum-nitrogen co-doped diamond-like composite film,the film is doped with N in an ion mode, and hard aluminum nitride (AlN) and metal Al nanocrystalline particles are promoted to be formed in the diamond-like composite film; and the diamond-like composite film has the advantages of being smooth in surface, high in hardness and toughness and low in stress.

The invention relates to a method and an apparatus for applying metallic, ceramic or composite thin film coatings onto parts, components and tools (e.g. gas turbine engine compressor blades or cutting tools) by a cathodic arc deposition technique. The method and the apparatus allows for a continually changing structure of the applied film by nanoimplanting atoms, molecules, compounds or other chemical species and structures of different materials thus coating a substrate during a single process. Furthermore, during the same process it allows for creating a coating with specific parameters as required. For instance: hardness, smoothness, corrosion resistance, erosion resistance.

A sensor for measuring electrochemical corrosion potential includes an electrical conductor, a metal-oxide layer disposed on the electrical conductor, and a zirconia-containing layer disposed on the metal-oxide layer, wherein the zirconia-containing layer is disposed about the electrical conductor using thermal spraying, wire arc, ion plasma cathodic arc deposition, laser ablation, chemical vapor deposition, physical vapor deposition, electroplating, electroless plating, electrochemical oxidation, chemical oxidation, electrophoretic deposition, or radio-frequency sputtering.