The invention relates to a multi-stage
magnetic field straight
pipe magnetic filtration and pulsed bias compounded electrical arc
ion plating method, and belongs to the technical field of material surface treatments. In the prior art,
plasma transmission efficiency is low and pulsed bias can not completely remove large particles due to applying of
magnetic filtration on an arc source. A purpose of the present invention is to solve problems in the prior art. The method comprises: 1, connecting a workpiece to a pulsed bias power supply, connecting an electrical arc
ion plating target source to a target power supply, and connecting a multi-stage
magnetic field straight
pipe magnetic filtration device in front of the target source; 2, carrying out thin film deposition, wherein work gas is introduced until achieving 0.01-10 Pa when a pressure in a
vacuum chamber is less than 10<-2> Pa, the pulsed bias power supply is opened, a pulsed bias amplitude value, frequency and a duty ratio are adjusted, the target power supply is opened,
plasma is generated, the multi-stage
magnetic field straight
pipe magnetic
filtration device is opened, removal of large particles and efficient transmission of the
plasma in the magnetic
filtration device are achieved, process parameters are adjusted, and a thin film with no
large particle defect is rapidly produced; and 3, adopting a single-stage magnetic field to combine
direct current / pulsed bias to obtain a thin film with a certain thickness.